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JPS55130149A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS55130149A
JPS55130149A JP3687779A JP3687779A JPS55130149A JP S55130149 A JPS55130149 A JP S55130149A JP 3687779 A JP3687779 A JP 3687779A JP 3687779 A JP3687779 A JP 3687779A JP S55130149 A JPS55130149 A JP S55130149A
Authority
JP
Japan
Prior art keywords
alpha ray
chip
layer
recess
fabricating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3687779A
Other languages
Japanese (ja)
Other versions
JPS6136709B2 (en
Inventor
Hisao Katsuto
Kanji Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3687779A priority Critical patent/JPS55130149A/en
Publication of JPS55130149A publication Critical patent/JPS55130149A/en
Publication of JPS6136709B2 publication Critical patent/JPS6136709B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W42/25
    • H10W70/682
    • H10W72/01515
    • H10W72/075
    • H10W72/07551
    • H10W72/50
    • H10W90/756

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Semiconductor Memories (AREA)

Abstract

PURPOSE:To reduce the thickness of a resin layer and simplify the steps of fabricating a semiconductor device by coating an alpha ray shield resin on the active region of a semiconductor chip and forming an alpha ray shield on the inner surface of a recess of a cap of a package. CONSTITUTION:An active region feasible to erroneously operate by an alpha ray irradiation is formed normally in a depth of approx. 4-5mum of a semiconductor chip 14. An alpha ray shield resin layer 15 made of polyimide resin to coat the active region of the surface of the chip 14 is coated on the chip 14. The thickness of the layer 16 may be 30-50mum. An alpha ray shield 20 made of high purity such as higher than 99.999% is secured through an adhesive layer 19 to coat the entire inner surface of the recess 17a of a ceramic insulating cap 17 facing with the chip 14 on the recess 17a. Since the shield 20 is thus formed, the thickness of the layer 16 may be reduced to a degree readily fabricating a semiconductor device and the steps of fabricating the device may be simplified.
JP3687779A 1979-03-30 1979-03-30 Semiconductor device Granted JPS55130149A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3687779A JPS55130149A (en) 1979-03-30 1979-03-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3687779A JPS55130149A (en) 1979-03-30 1979-03-30 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS55130149A true JPS55130149A (en) 1980-10-08
JPS6136709B2 JPS6136709B2 (en) 1986-08-20

Family

ID=12482004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3687779A Granted JPS55130149A (en) 1979-03-30 1979-03-30 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS55130149A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61107119A (en) * 1984-10-30 1986-05-26 Hamamatsu Photonics Kk Silicon photocell using ceramic container
US4630095A (en) * 1980-03-31 1986-12-16 Vlsi Technology Research Association Packaged semiconductor device structure including getter material for decreasing gas from a protective organic covering
US4727221A (en) * 1985-11-15 1988-02-23 Nec Corporation Semiconductor memory device
US4761335A (en) * 1985-03-07 1988-08-02 National Starch And Chemical Corporation Alpha-particle protection of semiconductor devices
US5264726A (en) * 1989-07-21 1993-11-23 Nec Corporation Chip-carrier

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4630095A (en) * 1980-03-31 1986-12-16 Vlsi Technology Research Association Packaged semiconductor device structure including getter material for decreasing gas from a protective organic covering
JPS61107119A (en) * 1984-10-30 1986-05-26 Hamamatsu Photonics Kk Silicon photocell using ceramic container
US4761335A (en) * 1985-03-07 1988-08-02 National Starch And Chemical Corporation Alpha-particle protection of semiconductor devices
US4727221A (en) * 1985-11-15 1988-02-23 Nec Corporation Semiconductor memory device
US5264726A (en) * 1989-07-21 1993-11-23 Nec Corporation Chip-carrier

Also Published As

Publication number Publication date
JPS6136709B2 (en) 1986-08-20

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