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JPS548465A - Etching method - Google Patents

Etching method

Info

Publication number
JPS548465A
JPS548465A JP7320277A JP7320277A JPS548465A JP S548465 A JPS548465 A JP S548465A JP 7320277 A JP7320277 A JP 7320277A JP 7320277 A JP7320277 A JP 7320277A JP S548465 A JPS548465 A JP S548465A
Authority
JP
Japan
Prior art keywords
etching
etching method
automation
progress
utilize
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7320277A
Other languages
Japanese (ja)
Inventor
Tatsumi Mizutani
Hideo Komatsu
Shinya Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7320277A priority Critical patent/JPS548465A/en
Publication of JPS548465A publication Critical patent/JPS548465A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To simply know the end of etching and to utilize it for automation, by connecting two electrode terminals on the test piece surface and by detecting the electric resistance of the material changing together with the progress of etching, in etching conductive materials.
COPYRIGHT: (C)1979,JPO&Japio
JP7320277A 1977-06-22 1977-06-22 Etching method Pending JPS548465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7320277A JPS548465A (en) 1977-06-22 1977-06-22 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7320277A JPS548465A (en) 1977-06-22 1977-06-22 Etching method

Publications (1)

Publication Number Publication Date
JPS548465A true JPS548465A (en) 1979-01-22

Family

ID=13511315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7320277A Pending JPS548465A (en) 1977-06-22 1977-06-22 Etching method

Country Status (1)

Country Link
JP (1) JPS548465A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56102009A (en) * 1980-01-21 1981-08-15 Toyo Ink Mfg Co Insulated wire
US5273610A (en) * 1992-06-23 1993-12-28 Association Institutions For Material Sciences, Inc. Apparatus and method for determining power in plasma processing
US6127237A (en) * 1998-03-04 2000-10-03 Kabushiki Kaisha Toshiba Etching end point detecting method based on junction current measurement and etching apparatus
CN103477421A (en) * 2011-11-14 2013-12-25 富士电机株式会社 Etching completion detection method and device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5384475A (en) * 1976-12-29 1978-07-25 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5384475A (en) * 1976-12-29 1978-07-25 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56102009A (en) * 1980-01-21 1981-08-15 Toyo Ink Mfg Co Insulated wire
US5273610A (en) * 1992-06-23 1993-12-28 Association Institutions For Material Sciences, Inc. Apparatus and method for determining power in plasma processing
US6127237A (en) * 1998-03-04 2000-10-03 Kabushiki Kaisha Toshiba Etching end point detecting method based on junction current measurement and etching apparatus
CN103477421A (en) * 2011-11-14 2013-12-25 富士电机株式会社 Etching completion detection method and device

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