[go: up one dir, main page]

JPS5478978A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5478978A
JPS5478978A JP14669877A JP14669877A JPS5478978A JP S5478978 A JPS5478978 A JP S5478978A JP 14669877 A JP14669877 A JP 14669877A JP 14669877 A JP14669877 A JP 14669877A JP S5478978 A JPS5478978 A JP S5478978A
Authority
JP
Japan
Prior art keywords
layer
thickness
mesa groove
base
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14669877A
Other languages
Japanese (ja)
Inventor
Minoru Kawakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14669877A priority Critical patent/JPS5478978A/en
Publication of JPS5478978A publication Critical patent/JPS5478978A/en
Pending legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To increase the mechanical strength, by making thin the thickness of the base layer so that no punch through is caused, greater the thickness of the emitter layer of low resistance, and thinner at the position of the mesa groove, and shallowing the mesa groove.
CONSTITUTION: The PB layer 4 and PE layer 5 are formed at the both sides of the base NB layer 1 of high specific resistivity, and the NE layer 6 is selectively formed in the layer 4. The thickness of the PB layer 5 is partially changed and it is made thin at the position 13 of the mesa groove formation. The mesa groove 10 reaching the base layer 1 from the layers 4 and 5 and the groove is coated with glass. With this construction, the ON voltage drop can be decreased without lowering the mechanical strength of the substrate.
COPYRIGHT: (C)1979,JPO&Japio
JP14669877A 1977-12-06 1977-12-06 Semiconductor device Pending JPS5478978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14669877A JPS5478978A (en) 1977-12-06 1977-12-06 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14669877A JPS5478978A (en) 1977-12-06 1977-12-06 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS5478978A true JPS5478978A (en) 1979-06-23

Family

ID=15413528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14669877A Pending JPS5478978A (en) 1977-12-06 1977-12-06 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5478978A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138984A (en) * 1974-09-30 1976-03-31 Hitachi Ltd HANDOTAISOSHINOSEIZOHOHO

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138984A (en) * 1974-09-30 1976-03-31 Hitachi Ltd HANDOTAISOSHINOSEIZOHOHO

Similar Documents

Publication Publication Date Title
JPS5477081A (en) Semiconductor device and production of the same
JPS56162864A (en) Semiconductor device
JPS5478978A (en) Semiconductor device
JPS5618463A (en) Manufacture of semiconductor device
JPS5331964A (en) Production of semiconductor substrates
JPS5478979A (en) Semiconductor device and its manufacture
JPS5285488A (en) Semiconductor resistance element
JPS5342576A (en) Production of semiconductor device
JPS5317286A (en) Production of semiconductor device
JPS6413745A (en) Oxide superconductive wiring structure
JPS5441673A (en) Semiconductor device and its manufacture
JPS54116884A (en) Semiconductor device
JPS5368970A (en) Solder electrode structure
JPS5368165A (en) Production of semiconductor device
JPS5633855A (en) Semiconductor device and its manufacture
JPS57169263A (en) Semiconductor device
JPS5419690A (en) Electrode of semiconductor devices
JPS5429587A (en) Semiconductor device
JPS551179A (en) Complementary mis integrated circuit apparatus
JPS5492180A (en) Manufacture of semiconductor device
JPS5732663A (en) Resistance element and its manufacture
JPS5360187A (en) High resistance integrated circuit element
JPS5317283A (en) Production of semiconductor device
JPS54149486A (en) Pressure-sensitive element
JPS5443464A (en) Semiconductor device