JPS5437690A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS5437690A JPS5437690A JP10462577A JP10462577A JPS5437690A JP S5437690 A JPS5437690 A JP S5437690A JP 10462577 A JP10462577 A JP 10462577A JP 10462577 A JP10462577 A JP 10462577A JP S5437690 A JPS5437690 A JP S5437690A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- heat treatment
- resistance value
- polycrystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE: To establish the resistor uniform in the resistance value and high in the resistance value with good reproducibility, by performing heat treatment again under H2 atmosphere, after coating polycrystal Si layer selectively via the insulation film on the semiconductor substrate and activating with heat treatment at more than 700°C with ion implantation.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10462577A JPS5437690A (en) | 1977-08-30 | 1977-08-30 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10462577A JPS5437690A (en) | 1977-08-30 | 1977-08-30 | Manufacture for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5437690A true JPS5437690A (en) | 1979-03-20 |
Family
ID=14385613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10462577A Pending JPS5437690A (en) | 1977-08-30 | 1977-08-30 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5437690A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61220452A (en) * | 1985-03-27 | 1986-09-30 | Nec Corp | Manufacturing method of semiconductor device |
JPS62183090U (en) * | 1986-05-13 | 1987-11-20 | ||
US5037766A (en) * | 1988-12-06 | 1991-08-06 | Industrial Technology Research Institute | Method of fabricating a thin film polysilicon thin film transistor or resistor |
JPH04211168A (en) * | 1991-01-28 | 1992-08-03 | Seiko Epson Corp | Manufacturing method of semiconductor device |
US6974022B2 (en) | 2001-05-11 | 2005-12-13 | Nitta Corporation | Beaded conveyor belt |
-
1977
- 1977-08-30 JP JP10462577A patent/JPS5437690A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61220452A (en) * | 1985-03-27 | 1986-09-30 | Nec Corp | Manufacturing method of semiconductor device |
JPH0556661B2 (en) * | 1985-03-27 | 1993-08-20 | Nippon Electric Co | |
JPS62183090U (en) * | 1986-05-13 | 1987-11-20 | ||
US5037766A (en) * | 1988-12-06 | 1991-08-06 | Industrial Technology Research Institute | Method of fabricating a thin film polysilicon thin film transistor or resistor |
JPH04211168A (en) * | 1991-01-28 | 1992-08-03 | Seiko Epson Corp | Manufacturing method of semiconductor device |
US6974022B2 (en) | 2001-05-11 | 2005-12-13 | Nitta Corporation | Beaded conveyor belt |
US7051869B2 (en) | 2001-05-11 | 2006-05-30 | Nitta Corporation | Beaded conveyor belt |
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