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JPS54125981A - Semiconductor washing device - Google Patents

Semiconductor washing device

Info

Publication number
JPS54125981A
JPS54125981A JP3372478A JP3372478A JPS54125981A JP S54125981 A JPS54125981 A JP S54125981A JP 3372478 A JP3372478 A JP 3372478A JP 3372478 A JP3372478 A JP 3372478A JP S54125981 A JPS54125981 A JP S54125981A
Authority
JP
Japan
Prior art keywords
nozzle
uniform
right above
short time
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3372478A
Other languages
Japanese (ja)
Inventor
Akira Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3372478A priority Critical patent/JPS54125981A/en
Publication of JPS54125981A publication Critical patent/JPS54125981A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To secure the uniform washing for the whole of the semiconductor substrate with the minimum amount of the cleansing solution and in a short time by varying the nozzle shifting speed.
CONSTITUTION: Nozzle 8 attached to arm 7 features a reciprocal motion being accelerated when moving close to the turning center of substrate 4 and then retarded when moving away from the center respectively through motor driving 5 via non- stepped change gear 9. In the actual application, the nozzle shifting speed right above the turning center is set 3W4 times as high as that right above the utmost outer circumferece. As a reslut, the amount of the solution received at the unit time is almost uniform at each part on the substrate surface, thus ensuring the uniform washing effect in a short time.
COPYRIGHT: (C)1979,JPO&Japio
JP3372478A 1978-03-23 1978-03-23 Semiconductor washing device Pending JPS54125981A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3372478A JPS54125981A (en) 1978-03-23 1978-03-23 Semiconductor washing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3372478A JPS54125981A (en) 1978-03-23 1978-03-23 Semiconductor washing device

Publications (1)

Publication Number Publication Date
JPS54125981A true JPS54125981A (en) 1979-09-29

Family

ID=12394338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3372478A Pending JPS54125981A (en) 1978-03-23 1978-03-23 Semiconductor washing device

Country Status (1)

Country Link
JP (1) JPS54125981A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5790941A (en) * 1980-11-27 1982-06-05 Toshiba Corp Swing type vertical washer
JPS58122732A (en) * 1982-01-14 1983-07-21 Toshiba Corp Wafer washing method
JPS58200537A (en) * 1982-05-18 1983-11-22 Toshiba Corp Applying method for resist
JPS61131460A (en) * 1984-11-30 1986-06-19 Canon Inc Wafer cleaning device
JPS61178082A (en) * 1985-02-05 1986-08-09 沖電気工業株式会社 Spin washing method
US4636243A (en) * 1980-09-16 1987-01-13 Eli Lilly And Company Benzamides, compositions and agricultural method
JPH02275631A (en) * 1989-01-11 1990-11-09 Dainippon Screen Mfg Co Ltd Method and device for washing and treating substrate
JPH0314230A (en) * 1989-06-13 1991-01-22 Toshiba Corp Cleaning of semiconductor wafer and device therefor
JP2010067819A (en) * 2008-09-11 2010-03-25 Shibaura Mechatronics Corp Treatment device and treatment method of substrate
US8147617B2 (en) * 2004-06-04 2012-04-03 Tokyo Electron Limited Substrate cleaning method and computer readable storage medium

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636243A (en) * 1980-09-16 1987-01-13 Eli Lilly And Company Benzamides, compositions and agricultural method
JPS5790941A (en) * 1980-11-27 1982-06-05 Toshiba Corp Swing type vertical washer
JPS58122732A (en) * 1982-01-14 1983-07-21 Toshiba Corp Wafer washing method
JPS58200537A (en) * 1982-05-18 1983-11-22 Toshiba Corp Applying method for resist
JPS61131460A (en) * 1984-11-30 1986-06-19 Canon Inc Wafer cleaning device
JPS61178082A (en) * 1985-02-05 1986-08-09 沖電気工業株式会社 Spin washing method
JPH02275631A (en) * 1989-01-11 1990-11-09 Dainippon Screen Mfg Co Ltd Method and device for washing and treating substrate
JPH0314230A (en) * 1989-06-13 1991-01-22 Toshiba Corp Cleaning of semiconductor wafer and device therefor
US8147617B2 (en) * 2004-06-04 2012-04-03 Tokyo Electron Limited Substrate cleaning method and computer readable storage medium
JP2010067819A (en) * 2008-09-11 2010-03-25 Shibaura Mechatronics Corp Treatment device and treatment method of substrate

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