[go: up one dir, main page]

JPS54123877A - Baking unit - Google Patents

Baking unit

Info

Publication number
JPS54123877A
JPS54123877A JP3157978A JP3157978A JPS54123877A JP S54123877 A JPS54123877 A JP S54123877A JP 3157978 A JP3157978 A JP 3157978A JP 3157978 A JP3157978 A JP 3157978A JP S54123877 A JPS54123877 A JP S54123877A
Authority
JP
Japan
Prior art keywords
mirror
circular
mask
image
band
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3157978A
Other languages
Japanese (ja)
Other versions
JPS6349367B2 (en
Inventor
Minokichi Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP3157978A priority Critical patent/JPS54123877A/en
Priority to DE2910280A priority patent/DE2910280C2/en
Publication of JPS54123877A publication Critical patent/JPS54123877A/en
Priority to US06/116,752 priority patent/US4294538A/en
Publication of JPS6349367B2 publication Critical patent/JPS6349367B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To bake fine pattern on wafer, by converting point light source into circular light flux and radiating mask.
CONSTITUTION: The spherical mirror 1 is cut with two planes so that the tangent of the center 8 of the band spherical mirror intersects with the axis 3 in 45° and the light source is placed at the cross point 5 between the plane through the point 8 and the axis 3, then the main ray 9 bends at right angle at the mirror 2 and the circular image is caused on the curved plane 10. Taking the band mirror as R, circular arc image is formed on the plate having the slit S1 opening in circular shape by using the band spherical mirror R1 and the reflection mirror M1, and the shape on the mask MK is adjusted by adjusting S1. Further, two point image is caused on the screen VS with the light source and the mirror Ro via the reflection mirror M1-band spherical mirror R2-semi- transparent mirror M3. This is aligned. The light further reaches the MK plane via the reflection mirror M4-band spherical mirror R3-circular arc slit S2. Further, the image which passes through the equal magnification optical system, reflects on the mask and duplicates with MK, is observed. MK and the mask are embodied, the exposure stage is moved, and baking is made with the circular slit exposure. The adjustment of observation is made by interrupting the wave length of sensed light with filter.
COPYRIGHT: (C)1979,JPO&Japio
JP3157978A 1978-03-18 1978-03-18 Baking unit Granted JPS54123877A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP3157978A JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit
DE2910280A DE2910280C2 (en) 1978-03-18 1979-03-15 Optical imaging systems
US06/116,752 US4294538A (en) 1978-03-18 1980-01-30 Image forming optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3157978A JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP63099840A Division JPS63288014A (en) 1988-04-22 1988-04-22 Printing device

Publications (2)

Publication Number Publication Date
JPS54123877A true JPS54123877A (en) 1979-09-26
JPS6349367B2 JPS6349367B2 (en) 1988-10-04

Family

ID=12335085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3157978A Granted JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit

Country Status (1)

Country Link
JP (1) JPS54123877A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
JPS58195840A (en) * 1982-05-12 1983-11-15 Hitachi Ltd Linear light source device
JPS5940532A (en) * 1982-08-30 1984-03-06 Hitachi Ltd Projection exposure method and apparatus
US5390044A (en) * 1992-06-03 1995-02-14 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5416630A (en) * 1992-06-03 1995-05-16 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4925898A (en) * 1972-03-16 1974-03-07
JPS5026561A (en) * 1973-03-09 1975-03-19

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4925898A (en) * 1972-03-16 1974-03-07
JPS5026561A (en) * 1973-03-09 1975-03-19

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111218A (en) * 1980-01-07 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection and exposuring device
JPS58195840A (en) * 1982-05-12 1983-11-15 Hitachi Ltd Linear light source device
JPH058413B2 (en) * 1982-05-12 1993-02-02 Hitachi Ltd
JPS5940532A (en) * 1982-08-30 1984-03-06 Hitachi Ltd Projection exposure method and apparatus
US5390044A (en) * 1992-06-03 1995-02-14 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5416630A (en) * 1992-06-03 1995-05-16 Matsushita Electric Industrial Co., Ltd. Circular arc illumination apparatus
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus

Also Published As

Publication number Publication date
JPS6349367B2 (en) 1988-10-04

Similar Documents

Publication Publication Date Title
JPS60232552A (en) Lighting optical system
JPS597359A (en) Lighting equipment
JPS5453867A (en) Printing device
JPS54123877A (en) Baking unit
JPS5596933A (en) Overhead projector
JPS62266513A (en) Projecting exposure optical system
JP3067491B2 (en) Projection exposure equipment
JPS533840A (en) Infrared ray dark field observation device
JPS5332753A (en) Microscope objective lens
JPS53144270A (en) Projection-type mask aligner
JPS55164304A (en) Mirror surface check unit
JPS54123876A (en) Image forming optical system
JPS5487177A (en) Component positioning unit
JPS5883836A (en) Slit for forming arc-shaped illumination light
JPS575026A (en) Light beam scanner
JPS557727A (en) Planoconvex lens
JPH04369208A (en) Projection aligner
JPS52143850A (en) Stereo image observation device
JPS54145478A (en) Relative positioning method for wafer and exposure mask
JPS6442812A (en) Production lot number exposure device
KR960006824B1 (en) Stepper aperture
JPS59218729A (en) Projection exposing device
JPS5568623A (en) Transferring device for mask pattern
JPH0294419A (en) X-ray exposure device
JPH03202148A (en) light irradiation device