JPS54108701A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS54108701A JPS54108701A JP1428178A JP1428178A JPS54108701A JP S54108701 A JPS54108701 A JP S54108701A JP 1428178 A JP1428178 A JP 1428178A JP 1428178 A JP1428178 A JP 1428178A JP S54108701 A JPS54108701 A JP S54108701A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1428178A JPS54108701A (en) | 1978-02-10 | 1978-02-10 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1428178A JPS54108701A (en) | 1978-02-10 | 1978-02-10 | Photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54108701A true JPS54108701A (en) | 1979-08-25 |
Family
ID=11856697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1428178A Pending JPS54108701A (en) | 1978-02-10 | 1978-02-10 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54108701A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61272746A (en) * | 1985-05-28 | 1986-12-03 | Asahi Glass Co Ltd | Photomask blank and photomask |
WO2007069417A1 (en) * | 2005-12-12 | 2007-06-21 | Asahi Glass Company, Limited | Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank |
-
1978
- 1978-02-10 JP JP1428178A patent/JPS54108701A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61272746A (en) * | 1985-05-28 | 1986-12-03 | Asahi Glass Co Ltd | Photomask blank and photomask |
JPS6363896B2 (en) * | 1985-05-28 | 1988-12-08 | ||
WO2007069417A1 (en) * | 2005-12-12 | 2007-06-21 | Asahi Glass Company, Limited | Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank |
US7736821B2 (en) | 2005-12-12 | 2010-06-15 | Asahi Glass Company, Limited | Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank |
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