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JPS5398782A - Positioning method for exposure unit - Google Patents

Positioning method for exposure unit

Info

Publication number
JPS5398782A
JPS5398782A JP16025476A JP16025476A JPS5398782A JP S5398782 A JPS5398782 A JP S5398782A JP 16025476 A JP16025476 A JP 16025476A JP 16025476 A JP16025476 A JP 16025476A JP S5398782 A JPS5398782 A JP S5398782A
Authority
JP
Japan
Prior art keywords
positioning method
exposure unit
positioning
patterning
shrinkage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16025476A
Other languages
Japanese (ja)
Inventor
Koji Igarashi
Shunsuke Matsuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16025476A priority Critical patent/JPS5398782A/en
Publication of JPS5398782A publication Critical patent/JPS5398782A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To make accurate the patterning, by correcting the shift of position at positioning with mark, through expansion and shrinkage after controlling the temperature of mask or wafer.
COPYRIGHT: (C)1978,JPO&Japio
JP16025476A 1976-12-29 1976-12-29 Positioning method for exposure unit Pending JPS5398782A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16025476A JPS5398782A (en) 1976-12-29 1976-12-29 Positioning method for exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16025476A JPS5398782A (en) 1976-12-29 1976-12-29 Positioning method for exposure unit

Publications (1)

Publication Number Publication Date
JPS5398782A true JPS5398782A (en) 1978-08-29

Family

ID=15711019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16025476A Pending JPS5398782A (en) 1976-12-29 1976-12-29 Positioning method for exposure unit

Country Status (1)

Country Link
JP (1) JPS5398782A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53139980A (en) * 1977-05-11 1978-12-06 Philips Nv Method of and device for producing microminiature solid state device
JPS5593224A (en) * 1979-01-08 1980-07-15 Perkin Elmer Corp Device for matching temperature compensating position
JPS55123131A (en) * 1979-03-16 1980-09-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposer for mask alignment
JPS59132127A (en) * 1983-01-19 1984-07-30 Toshiba Corp Method and apparatus for forming resist pattern
JPS59132619A (en) * 1983-01-19 1984-07-30 Toshiba Corp Method and apparatus for forming resist pattern
JPS59132618A (en) * 1983-01-19 1984-07-30 Toshiba Corp Method and apparatus for forming resist pattern
US5329126A (en) * 1991-03-22 1994-07-12 Canon Kabuhiki Kaisha Apparatus and process for vacuum-holding an object

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53139980A (en) * 1977-05-11 1978-12-06 Philips Nv Method of and device for producing microminiature solid state device
JPS5593224A (en) * 1979-01-08 1980-07-15 Perkin Elmer Corp Device for matching temperature compensating position
JPS55123131A (en) * 1979-03-16 1980-09-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposer for mask alignment
JPS59132127A (en) * 1983-01-19 1984-07-30 Toshiba Corp Method and apparatus for forming resist pattern
JPS59132619A (en) * 1983-01-19 1984-07-30 Toshiba Corp Method and apparatus for forming resist pattern
JPS59132618A (en) * 1983-01-19 1984-07-30 Toshiba Corp Method and apparatus for forming resist pattern
JPH0480531B2 (en) * 1983-01-19 1992-12-18 Tokyo Shibaura Electric Co
US5329126A (en) * 1991-03-22 1994-07-12 Canon Kabuhiki Kaisha Apparatus and process for vacuum-holding an object
US5680428A (en) * 1991-03-22 1997-10-21 Canon Kabushiki Kaisha Process for holding an object

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