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JPS5374379A - Correction filter for illuminance distribution - Google Patents

Correction filter for illuminance distribution

Info

Publication number
JPS5374379A
JPS5374379A JP14976476A JP14976476A JPS5374379A JP S5374379 A JPS5374379 A JP S5374379A JP 14976476 A JP14976476 A JP 14976476A JP 14976476 A JP14976476 A JP 14976476A JP S5374379 A JPS5374379 A JP S5374379A
Authority
JP
Japan
Prior art keywords
illuminance distribution
correction filter
illuminance
filter
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14976476A
Other languages
Japanese (ja)
Other versions
JPS5625017B2 (en
Inventor
Koji Igarashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14976476A priority Critical patent/JPS5374379A/en
Publication of JPS5374379A publication Critical patent/JPS5374379A/en
Publication of JPS5625017B2 publication Critical patent/JPS5625017B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To correct uneven illuminance distribution on the surface of the object to be illuminated, by inserting a filter between the light source and the object and controlling the transmission amount in accordance with the illuminance.
COPYRIGHT: (C)1978,JPO&Japio
JP14976476A 1976-12-15 1976-12-15 Correction filter for illuminance distribution Granted JPS5374379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14976476A JPS5374379A (en) 1976-12-15 1976-12-15 Correction filter for illuminance distribution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14976476A JPS5374379A (en) 1976-12-15 1976-12-15 Correction filter for illuminance distribution

Publications (2)

Publication Number Publication Date
JPS5374379A true JPS5374379A (en) 1978-07-01
JPS5625017B2 JPS5625017B2 (en) 1981-06-10

Family

ID=15482218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14976476A Granted JPS5374379A (en) 1976-12-15 1976-12-15 Correction filter for illuminance distribution

Country Status (1)

Country Link
JP (1) JPS5374379A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6325640A (en) * 1986-07-18 1988-02-03 Oak Seisakusho:Kk Optical system for projecting parallel light
WO2016192917A1 (en) * 2015-06-02 2016-12-08 Asml Netherlands B.V. Filter, method of formation thereof, and image sensor

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5934931A (en) * 1982-08-23 1984-02-25 Nissan Shatai Co Ltd Mounting structure for automotive exhaust system
US4766405A (en) * 1987-04-14 1988-08-23 Allied Corporation Dynamic energy absorber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6325640A (en) * 1986-07-18 1988-02-03 Oak Seisakusho:Kk Optical system for projecting parallel light
WO2016192917A1 (en) * 2015-06-02 2016-12-08 Asml Netherlands B.V. Filter, method of formation thereof, and image sensor

Also Published As

Publication number Publication date
JPS5625017B2 (en) 1981-06-10

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