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JPS5364769A - Method of removing organic material - Google Patents

Method of removing organic material

Info

Publication number
JPS5364769A
JPS5364769A JP12465077A JP12465077A JPS5364769A JP S5364769 A JPS5364769 A JP S5364769A JP 12465077 A JP12465077 A JP 12465077A JP 12465077 A JP12465077 A JP 12465077A JP S5364769 A JPS5364769 A JP S5364769A
Authority
JP
Japan
Prior art keywords
organic material
removing organic
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12465077A
Other languages
Japanese (ja)
Inventor
Eichi Kapuran Reon
Esu Bisuwanasan Nangabaramu
Emu Tsuimaaman Suteiibun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5364769A publication Critical patent/JPS5364769A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP12465077A 1976-11-19 1977-10-19 Method of removing organic material Pending JPS5364769A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74319076A 1976-11-19 1976-11-19

Publications (1)

Publication Number Publication Date
JPS5364769A true JPS5364769A (en) 1978-06-09

Family

ID=24987844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12465077A Pending JPS5364769A (en) 1976-11-19 1977-10-19 Method of removing organic material

Country Status (4)

Country Link
US (1) UST973008I4 (en)
JP (1) JPS5364769A (en)
DE (1) DE2747669A1 (en)
FR (1) FR2371705A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011520142A (en) * 2008-05-01 2011-07-14 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド Low pH mixture for removal of high density implanted resist

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG183744A1 (en) 2007-08-20 2012-09-27 Advanced Tech Materials Composition and method for removing ion-implanted photoresist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE277834C (en) *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011520142A (en) * 2008-05-01 2011-07-14 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド Low pH mixture for removal of high density implanted resist

Also Published As

Publication number Publication date
UST973008I4 (en) 1978-08-01
FR2371705A1 (en) 1978-06-16
DE2747669A1 (en) 1978-05-24
FR2371705B1 (en) 1980-12-19

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