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JPS536026A - Amendment of mask substrate - Google Patents

Amendment of mask substrate

Info

Publication number
JPS536026A
JPS536026A JP8016876A JP8016876A JPS536026A JP S536026 A JPS536026 A JP S536026A JP 8016876 A JP8016876 A JP 8016876A JP 8016876 A JP8016876 A JP 8016876A JP S536026 A JPS536026 A JP S536026A
Authority
JP
Japan
Prior art keywords
amendment
mask substrate
substrate
amend
scratches
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8016876A
Other languages
Japanese (ja)
Other versions
JPS6036579B2 (en
Inventor
Kimio Yanagida
Katsuyuki Arii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP51080168A priority Critical patent/JPS6036579B2/en
Publication of JPS536026A publication Critical patent/JPS536026A/en
Publication of JPS6036579B2 publication Critical patent/JPS6036579B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G03C11/06—Smoothing; Renovating; Roughening; Matting; Cleaning; Lubricating; Flame-retardant treatments

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To amend the scratches of the substrate and improve the yield of the product, by forming a protective film on the surface opposite to a pattern side and polishing this.
JP51080168A 1976-07-06 1976-07-06 How to repair mask board Expired JPS6036579B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51080168A JPS6036579B2 (en) 1976-07-06 1976-07-06 How to repair mask board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51080168A JPS6036579B2 (en) 1976-07-06 1976-07-06 How to repair mask board

Publications (2)

Publication Number Publication Date
JPS536026A true JPS536026A (en) 1978-01-20
JPS6036579B2 JPS6036579B2 (en) 1985-08-21

Family

ID=13710783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51080168A Expired JPS6036579B2 (en) 1976-07-06 1976-07-06 How to repair mask board

Country Status (1)

Country Link
JP (1) JPS6036579B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60233103A (en) * 1984-05-07 1985-11-19 Shin Etsu Chem Co Ltd Polymerization of vinyl monomers
WO2005124455A1 (en) * 2004-06-22 2005-12-29 Hoya Corporation Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask
JP2006039525A (en) * 2004-06-22 2006-02-09 Hoya Corp Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask
JP2010170011A (en) * 2009-01-26 2010-08-05 Hoya Corp Method of correcting photomask
CN110161800A (en) * 2019-04-26 2019-08-23 信利光电股份有限公司 A kind of light shield damage rehabilitation method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60233103A (en) * 1984-05-07 1985-11-19 Shin Etsu Chem Co Ltd Polymerization of vinyl monomers
WO2005124455A1 (en) * 2004-06-22 2005-12-29 Hoya Corporation Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask
JP2006039525A (en) * 2004-06-22 2006-02-09 Hoya Corp Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask
US7862960B2 (en) 2004-06-22 2011-01-04 Hoya Corporation Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
US8039178B2 (en) 2004-06-22 2011-10-18 Hoya Corporation Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
JP2010170011A (en) * 2009-01-26 2010-08-05 Hoya Corp Method of correcting photomask
CN110161800A (en) * 2019-04-26 2019-08-23 信利光电股份有限公司 A kind of light shield damage rehabilitation method

Also Published As

Publication number Publication date
JPS6036579B2 (en) 1985-08-21

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