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JPS5357774A - Dielectric insulated and isolated substrate and its production - Google Patents

Dielectric insulated and isolated substrate and its production

Info

Publication number
JPS5357774A
JPS5357774A JP13172776A JP13172776A JPS5357774A JP S5357774 A JPS5357774 A JP S5357774A JP 13172776 A JP13172776 A JP 13172776A JP 13172776 A JP13172776 A JP 13172776A JP S5357774 A JPS5357774 A JP S5357774A
Authority
JP
Japan
Prior art keywords
production
isolated substrate
dielectric insulated
substrate
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13172776A
Other languages
Japanese (ja)
Inventor
Yushi Kase
Sadao Yasuda
Tsukasa Masuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13172776A priority Critical patent/JPS5357774A/en
Publication of JPS5357774A publication Critical patent/JPS5357774A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)

Abstract

PURPOSE:Curving of a substrate is prevented by laminating poly-Si containing a slight amount of O2 and CVD oxide films on the thick oxide film on the V-grooves of the Si substrate surface and finally covering the surface with a CVD oxide film.
JP13172776A 1976-11-04 1976-11-04 Dielectric insulated and isolated substrate and its production Pending JPS5357774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13172776A JPS5357774A (en) 1976-11-04 1976-11-04 Dielectric insulated and isolated substrate and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13172776A JPS5357774A (en) 1976-11-04 1976-11-04 Dielectric insulated and isolated substrate and its production

Publications (1)

Publication Number Publication Date
JPS5357774A true JPS5357774A (en) 1978-05-25

Family

ID=15064775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13172776A Pending JPS5357774A (en) 1976-11-04 1976-11-04 Dielectric insulated and isolated substrate and its production

Country Status (1)

Country Link
JP (1) JPS5357774A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661054U (en) * 1979-10-17 1981-05-23
JPS63182836A (en) * 1987-01-24 1988-07-28 Matsushita Electric Works Ltd Manufacture of dielectric isolation substrate
JP2009240469A (en) * 2008-03-31 2009-10-22 Fujifilm Corp Radiation irradiator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661054U (en) * 1979-10-17 1981-05-23
JPS63182836A (en) * 1987-01-24 1988-07-28 Matsushita Electric Works Ltd Manufacture of dielectric isolation substrate
JP2009240469A (en) * 2008-03-31 2009-10-22 Fujifilm Corp Radiation irradiator

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