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JPS5346283A - Character exposure apparatus - Google Patents

Character exposure apparatus

Info

Publication number
JPS5346283A
JPS5346283A JP12033676A JP12033676A JPS5346283A JP S5346283 A JPS5346283 A JP S5346283A JP 12033676 A JP12033676 A JP 12033676A JP 12033676 A JP12033676 A JP 12033676A JP S5346283 A JPS5346283 A JP S5346283A
Authority
JP
Japan
Prior art keywords
exposure apparatus
character exposure
automatically performing
character
characters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12033676A
Other languages
Japanese (ja)
Inventor
Takao Kawanabe
Hiroyuki Ibe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12033676A priority Critical patent/JPS5346283A/en
Publication of JPS5346283A publication Critical patent/JPS5346283A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To facilitate the formation of symbols to be provided on semiconductor wafers, etc. by automatically performing the selection of characters with a memory device and a control device and also automatically performing the exposure of the selected characters to a photo mask.
COPYRIGHT: (C)1978,JPO&Japio
JP12033676A 1976-10-08 1976-10-08 Character exposure apparatus Pending JPS5346283A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12033676A JPS5346283A (en) 1976-10-08 1976-10-08 Character exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12033676A JPS5346283A (en) 1976-10-08 1976-10-08 Character exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59074965A Division JPS6016423A (en) 1984-04-16 1984-04-16 Character code formation

Publications (1)

Publication Number Publication Date
JPS5346283A true JPS5346283A (en) 1978-04-25

Family

ID=14783729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12033676A Pending JPS5346283A (en) 1976-10-08 1976-10-08 Character exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5346283A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589319A (en) * 1981-07-10 1983-01-19 Hitachi Ltd pattern exposure equipment
JPS594106A (en) * 1982-06-30 1984-01-10 日本電気株式会社 Controller for electronic part sealing plate
JPS62189469A (en) * 1986-02-14 1987-08-19 Rohm Co Ltd Information setting mask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS589319A (en) * 1981-07-10 1983-01-19 Hitachi Ltd pattern exposure equipment
JPH0263285B2 (en) * 1981-07-10 1990-12-27 Hitachi Ltd
JPS594106A (en) * 1982-06-30 1984-01-10 日本電気株式会社 Controller for electronic part sealing plate
JPS62189469A (en) * 1986-02-14 1987-08-19 Rohm Co Ltd Information setting mask

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