JPS5331581A - Coating method of tube inside by ion beam - Google Patents
Coating method of tube inside by ion beamInfo
- Publication number
- JPS5331581A JPS5331581A JP10629376A JP10629376A JPS5331581A JP S5331581 A JPS5331581 A JP S5331581A JP 10629376 A JP10629376 A JP 10629376A JP 10629376 A JP10629376 A JP 10629376A JP S5331581 A JPS5331581 A JP S5331581A
- Authority
- JP
- Japan
- Prior art keywords
- coating method
- ion beam
- tube inside
- small diameter
- diameter tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To uniformly coat the inside of long small diameter tube, by providing freely revolvable magnet, giving revolving magnetic field to ion beams, irradiated on the outer circumference of long small diameter tube and moving it.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10629376A JPS5331581A (en) | 1976-09-07 | 1976-09-07 | Coating method of tube inside by ion beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10629376A JPS5331581A (en) | 1976-09-07 | 1976-09-07 | Coating method of tube inside by ion beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5331581A true JPS5331581A (en) | 1978-03-24 |
JPS5515546B2 JPS5515546B2 (en) | 1980-04-24 |
Family
ID=14429996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10629376A Granted JPS5331581A (en) | 1976-09-07 | 1976-09-07 | Coating method of tube inside by ion beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5331581A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58144472A (en) * | 1982-02-22 | 1983-08-27 | Hitachi Ltd | Ion plating device |
JP2008223112A (en) * | 2007-03-15 | 2008-09-25 | Stanley Electric Co Ltd | Plasma processing equipment |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4973385A (en) * | 1972-11-15 | 1974-07-16 | ||
JPS5016120U (en) * | 1973-06-13 | 1975-02-20 | ||
JPS5036381A (en) * | 1973-08-04 | 1975-04-05 |
-
1976
- 1976-09-07 JP JP10629376A patent/JPS5331581A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4973385A (en) * | 1972-11-15 | 1974-07-16 | ||
JPS5016120U (en) * | 1973-06-13 | 1975-02-20 | ||
JPS5036381A (en) * | 1973-08-04 | 1975-04-05 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58144472A (en) * | 1982-02-22 | 1983-08-27 | Hitachi Ltd | Ion plating device |
JPH0125824B2 (en) * | 1982-02-22 | 1989-05-19 | Hitachi Ltd | |
JP2008223112A (en) * | 2007-03-15 | 2008-09-25 | Stanley Electric Co Ltd | Plasma processing equipment |
Also Published As
Publication number | Publication date |
---|---|
JPS5515546B2 (en) | 1980-04-24 |
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