[go: up one dir, main page]

JPS5327368A - Selective etching method - Google Patents

Selective etching method

Info

Publication number
JPS5327368A
JPS5327368A JP10231576A JP10231576A JPS5327368A JP S5327368 A JPS5327368 A JP S5327368A JP 10231576 A JP10231576 A JP 10231576A JP 10231576 A JP10231576 A JP 10231576A JP S5327368 A JPS5327368 A JP S5327368A
Authority
JP
Japan
Prior art keywords
selective etching
etching method
etching
sio
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10231576A
Other languages
Japanese (ja)
Inventor
Kazunari Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10231576A priority Critical patent/JPS5327368A/en
Publication of JPS5327368A publication Critical patent/JPS5327368A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: To perform selective etching with an isotropic etching solution by selectively implanting P or As on the poly-Si layer on a SiO2 film through a mask, then utilizing the difference in the rate of etching according to the content thereof.
COPYRIGHT: (C)1978,JPO&Japio
JP10231576A 1976-08-26 1976-08-26 Selective etching method Pending JPS5327368A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10231576A JPS5327368A (en) 1976-08-26 1976-08-26 Selective etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10231576A JPS5327368A (en) 1976-08-26 1976-08-26 Selective etching method

Publications (1)

Publication Number Publication Date
JPS5327368A true JPS5327368A (en) 1978-03-14

Family

ID=14324145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10231576A Pending JPS5327368A (en) 1976-08-26 1976-08-26 Selective etching method

Country Status (1)

Country Link
JP (1) JPS5327368A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59216918A (en) * 1983-05-26 1984-12-07 Toyobo Co Ltd Twisted polyester fiber and its manufacture
JPS6189321A (en) * 1984-10-08 1986-05-07 Teijin Ltd Polyester yarn having high dyeing properties

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59216918A (en) * 1983-05-26 1984-12-07 Toyobo Co Ltd Twisted polyester fiber and its manufacture
JPH0260763B2 (en) * 1983-05-26 1990-12-18 Toyo Boseki
JPS6189321A (en) * 1984-10-08 1986-05-07 Teijin Ltd Polyester yarn having high dyeing properties

Similar Documents

Publication Publication Date Title
JPS5351970A (en) Manufacture for semiconductor substrate
JPS5394770A (en) Photo mask
JPS5327368A (en) Selective etching method
JPS51136288A (en) Photo etching using non-crystalline carchogenide glass thin film
JPS5321574A (en) Contact and separation method of photo mask
JPS52113164A (en) Removal of organic agent
JPS52131462A (en) Manufacture of semiconductor device
JPS5315766A (en) Selective etching method of platinum layer
JPS5346222A (en) Solid state pick up unit
JPS5321573A (en) Etching method
JPS5375771A (en) Manufacture for semiconductor device
JPS53133373A (en) Manufacture of semiconductor device
JPS5397374A (en) Mask producing method
JPS5382173A (en) Positioning method
JPS5245270A (en) Semiconductor device
JPS5377185A (en) Electrode formation method of semiconductor device
JPS52127768A (en) Spatter etching method
JPS52119192A (en) Semiconductor
JPS534475A (en) Etching method
JPS52179A (en) Method of fabricating semiconductor
JPS52123171A (en) Anisotropic etching method of semiconductor single crystal
JPS52154344A (en) Impurity diffusion method
JPS5210680A (en) Method of manufacturing photo-mask for photo etching
JPS52130287A (en) Integrated circuit production
JPS546782A (en) Semiconductor device and its manufacture