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JPS5312274A - Production of mask for x-ray exposure - Google Patents

Production of mask for x-ray exposure

Info

Publication number
JPS5312274A
JPS5312274A JP8595676A JP8595676A JPS5312274A JP S5312274 A JPS5312274 A JP S5312274A JP 8595676 A JP8595676 A JP 8595676A JP 8595676 A JP8595676 A JP 8595676A JP S5312274 A JPS5312274 A JP S5312274A
Authority
JP
Japan
Prior art keywords
mask
production
ray exposure
high molecular
backing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8595676A
Other languages
Japanese (ja)
Other versions
JPS5444636B2 (en
Inventor
Masao Sadamura
Tetsuo Yamaji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP8595676A priority Critical patent/JPS5312274A/en
Publication of JPS5312274A publication Critical patent/JPS5312274A/en
Publication of JPS5444636B2 publication Critical patent/JPS5444636B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To make backing to the thickness that cannot be obtained with a film alone and increase X-ray transmissivity by forming an extremely thin heat resistant high molecular film on a semiconductor substrate, then partically removing the substrate and using the high molecular film as the backing for transmission of X-rays.
COPYRIGHT: (C)1978,JPO&Japio
JP8595676A 1976-07-21 1976-07-21 Production of mask for x-ray exposure Granted JPS5312274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8595676A JPS5312274A (en) 1976-07-21 1976-07-21 Production of mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8595676A JPS5312274A (en) 1976-07-21 1976-07-21 Production of mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS5312274A true JPS5312274A (en) 1978-02-03
JPS5444636B2 JPS5444636B2 (en) 1979-12-27

Family

ID=13873189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8595676A Granted JPS5312274A (en) 1976-07-21 1976-07-21 Production of mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5312274A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688137A (en) * 1979-12-21 1981-07-17 Fujitsu Ltd X-ray transfer mask
JPS5892732U (en) * 1981-12-16 1983-06-23 株式会社日立製作所 Soft X-ray lithography mask
JPS59116749A (en) * 1982-12-11 1984-07-05 ユ−ロジル・エレクトロニツク・ゲ−エムベ−ハ− Radiation mask for x ray lithography and manufacture thereof
JPS6169133A (en) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing process of soft x-ray
JPS62151737U (en) * 1987-02-25 1987-09-26
JPS62151736U (en) * 1987-02-25 1987-09-26
JPH0473765A (en) * 1990-07-16 1992-03-09 Toshiba Corp X-ray transmission film and its manufacture

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5155675A (en) * 1974-11-11 1976-05-15 Fujitsu Ltd Etsukususenkaisetsu nyoru ichiawasehoho
JPS52117558A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method
JPS52117557A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5155675A (en) * 1974-11-11 1976-05-15 Fujitsu Ltd Etsukususenkaisetsu nyoru ichiawasehoho
JPS52117558A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method
JPS52117557A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688137A (en) * 1979-12-21 1981-07-17 Fujitsu Ltd X-ray transfer mask
JPS5892732U (en) * 1981-12-16 1983-06-23 株式会社日立製作所 Soft X-ray lithography mask
JPS59116749A (en) * 1982-12-11 1984-07-05 ユ−ロジル・エレクトロニツク・ゲ−エムベ−ハ− Radiation mask for x ray lithography and manufacture thereof
JPS6169133A (en) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing process of soft x-ray
JPS62151737U (en) * 1987-02-25 1987-09-26
JPS62151736U (en) * 1987-02-25 1987-09-26
JPH0473765A (en) * 1990-07-16 1992-03-09 Toshiba Corp X-ray transmission film and its manufacture

Also Published As

Publication number Publication date
JPS5444636B2 (en) 1979-12-27

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