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JPS53116783A - Substrate straightening method - Google Patents

Substrate straightening method

Info

Publication number
JPS53116783A
JPS53116783A JP3184177A JP3184177A JPS53116783A JP S53116783 A JPS53116783 A JP S53116783A JP 3184177 A JP3184177 A JP 3184177A JP 3184177 A JP3184177 A JP 3184177A JP S53116783 A JPS53116783 A JP S53116783A
Authority
JP
Japan
Prior art keywords
substrate
straightening method
plate
substrate straightening
undulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3184177A
Other languages
Japanese (ja)
Inventor
Kiyoshi Ozawa
Toru Funayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3184177A priority Critical patent/JPS53116783A/en
Publication of JPS53116783A publication Critical patent/JPS53116783A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To perform straightening of substrate by plating or evaporating a specified material on one of the surfaces of a Si plate having warpage or undulation and making use of the difference in shrinkage force and coefficient of linear expansion between said plate and the Si substrate owing to the existence of the internal defects of said material.
COPYRIGHT: (C)1978,JPO&Japio
JP3184177A 1977-03-23 1977-03-23 Substrate straightening method Pending JPS53116783A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3184177A JPS53116783A (en) 1977-03-23 1977-03-23 Substrate straightening method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3184177A JPS53116783A (en) 1977-03-23 1977-03-23 Substrate straightening method

Publications (1)

Publication Number Publication Date
JPS53116783A true JPS53116783A (en) 1978-10-12

Family

ID=12342270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3184177A Pending JPS53116783A (en) 1977-03-23 1977-03-23 Substrate straightening method

Country Status (1)

Country Link
JP (1) JPS53116783A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPS59198714A (en) * 1983-04-26 1984-11-10 Fujitsu Ltd Manufacture of semiconductor element
JPS63133524A (en) * 1986-11-25 1988-06-06 Matsushita Electronics Corp X-ray mask and manufacture thereof
JPH03273611A (en) * 1990-03-23 1991-12-04 Nec Corp Mask for x-ray lithography and manufacture thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPH0319690B2 (en) * 1981-05-18 1991-03-15 Fuiritsupusu Furuuiranpenfuaburiken Nv
JPS59198714A (en) * 1983-04-26 1984-11-10 Fujitsu Ltd Manufacture of semiconductor element
JPS63133524A (en) * 1986-11-25 1988-06-06 Matsushita Electronics Corp X-ray mask and manufacture thereof
JPH03273611A (en) * 1990-03-23 1991-12-04 Nec Corp Mask for x-ray lithography and manufacture thereof

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