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JPS53114348A - Measuring method for diffusion depth of semiconductor substrate - Google Patents

Measuring method for diffusion depth of semiconductor substrate

Info

Publication number
JPS53114348A
JPS53114348A JP2798877A JP2798877A JPS53114348A JP S53114348 A JPS53114348 A JP S53114348A JP 2798877 A JP2798877 A JP 2798877A JP 2798877 A JP2798877 A JP 2798877A JP S53114348 A JPS53114348 A JP S53114348A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
measuring method
diffusion depth
diffusion layer
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2798877A
Other languages
Japanese (ja)
Inventor
Ichiro Takei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2798877A priority Critical patent/JPS53114348A/en
Publication of JPS53114348A publication Critical patent/JPS53114348A/en
Pending legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To make it possible to measure the thickness of a diffusion layer accurately by the apreading-resistance or staining method, by forming an insulating film of the diffusion layer and by grinding its section slantingly.
COPYRIGHT: (C)1978,JPO&Japio
JP2798877A 1977-03-16 1977-03-16 Measuring method for diffusion depth of semiconductor substrate Pending JPS53114348A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2798877A JPS53114348A (en) 1977-03-16 1977-03-16 Measuring method for diffusion depth of semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2798877A JPS53114348A (en) 1977-03-16 1977-03-16 Measuring method for diffusion depth of semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS53114348A true JPS53114348A (en) 1978-10-05

Family

ID=12236204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2798877A Pending JPS53114348A (en) 1977-03-16 1977-03-16 Measuring method for diffusion depth of semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS53114348A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60220944A (en) * 1984-04-18 1985-11-05 Rohm Co Ltd Evaluation method for semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60220944A (en) * 1984-04-18 1985-11-05 Rohm Co Ltd Evaluation method for semiconductor device

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