JPS5295975A - Prevention of leak of impurity in manufacturing semiconductor unit - Google Patents
Prevention of leak of impurity in manufacturing semiconductor unitInfo
- Publication number
- JPS5295975A JPS5295975A JP1226176A JP1226176A JPS5295975A JP S5295975 A JPS5295975 A JP S5295975A JP 1226176 A JP1226176 A JP 1226176A JP 1226176 A JP1226176 A JP 1226176A JP S5295975 A JPS5295975 A JP S5295975A
- Authority
- JP
- Japan
- Prior art keywords
- impurity
- leak
- prevention
- manufacturing semiconductor
- semiconductor unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012535 impurity Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000002265 prevention Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Landscapes
- Element Separation (AREA)
Abstract
PURPOSE: To prevent leak of impurity in single surface collector diffusion by forming at least two layers of SiO2 film and forming the first layer at a temperature which will not cause diffusion of the impurity.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1226176A JPS5295975A (en) | 1976-02-09 | 1976-02-09 | Prevention of leak of impurity in manufacturing semiconductor unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1226176A JPS5295975A (en) | 1976-02-09 | 1976-02-09 | Prevention of leak of impurity in manufacturing semiconductor unit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5295975A true JPS5295975A (en) | 1977-08-12 |
Family
ID=11800419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1226176A Pending JPS5295975A (en) | 1976-02-09 | 1976-02-09 | Prevention of leak of impurity in manufacturing semiconductor unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5295975A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60160119A (en) * | 1984-01-30 | 1985-08-21 | Rohm Co Ltd | Manufacture of semiconductor device |
-
1976
- 1976-02-09 JP JP1226176A patent/JPS5295975A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60160119A (en) * | 1984-01-30 | 1985-08-21 | Rohm Co Ltd | Manufacture of semiconductor device |
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