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JPS5294137A - Electron beam sensitive material - Google Patents

Electron beam sensitive material

Info

Publication number
JPS5294137A
JPS5294137A JP1108376A JP1108376A JPS5294137A JP S5294137 A JPS5294137 A JP S5294137A JP 1108376 A JP1108376 A JP 1108376A JP 1108376 A JP1108376 A JP 1108376A JP S5294137 A JPS5294137 A JP S5294137A
Authority
JP
Japan
Prior art keywords
electron beam
sensitive material
beam sensitive
derivative
prepare
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1108376A
Other languages
Japanese (ja)
Other versions
JPS5857095B2 (en
Inventor
Kenichi Kawashima
Junji Sato
Konoe Miura
Chihiro Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Mitsubishi Chemical Corp
Original Assignee
Fujitsu Ltd
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Mitsubishi Chemical Industries Ltd filed Critical Fujitsu Ltd
Priority to JP51011083A priority Critical patent/JPS5857095B2/en
Publication of JPS5294137A publication Critical patent/JPS5294137A/en
Publication of JPS5857095B2 publication Critical patent/JPS5857095B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Macromonomer-Based Addition Polymer (AREA)
  • Fax Reproducing Arrangements (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To prepare an electron beam sensitive material for manufacturing a semiconductor device reacting by electron beams with high sensitivity, by adding a specific polymer having an ether bond in the main or side chain and cinnamic acid (derivative) in its recurring unit.
COPYRIGHT: (C)1977,JPO&Japio
JP51011083A 1976-02-04 1976-02-04 electron beam sensitive material Expired JPS5857095B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51011083A JPS5857095B2 (en) 1976-02-04 1976-02-04 electron beam sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51011083A JPS5857095B2 (en) 1976-02-04 1976-02-04 electron beam sensitive material

Publications (2)

Publication Number Publication Date
JPS5294137A true JPS5294137A (en) 1977-08-08
JPS5857095B2 JPS5857095B2 (en) 1983-12-19

Family

ID=11768070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51011083A Expired JPS5857095B2 (en) 1976-02-04 1976-02-04 electron beam sensitive material

Country Status (1)

Country Link
JP (1) JPS5857095B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101015112B1 (en) 2004-07-12 2011-02-16 코오롱인더스트리 주식회사 Photosensitive resin composition with improved adhesion and tentability

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101015112B1 (en) 2004-07-12 2011-02-16 코오롱인더스트리 주식회사 Photosensitive resin composition with improved adhesion and tentability

Also Published As

Publication number Publication date
JPS5857095B2 (en) 1983-12-19

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