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JPS5283062A - Photoetching method - Google Patents

Photoetching method

Info

Publication number
JPS5283062A
JPS5283062A JP15812675A JP15812675A JPS5283062A JP S5283062 A JPS5283062 A JP S5283062A JP 15812675 A JP15812675 A JP 15812675A JP 15812675 A JP15812675 A JP 15812675A JP S5283062 A JPS5283062 A JP S5283062A
Authority
JP
Japan
Prior art keywords
photoetching method
photoetching
rays
fine powder
heavy metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15812675A
Other languages
Japanese (ja)
Other versions
JPS5837980B2 (en
Inventor
Katsuhiro Fujino
Junji Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50158126A priority Critical patent/JPS5837980B2/en
Publication of JPS5283062A publication Critical patent/JPS5283062A/en
Publication of JPS5837980B2 publication Critical patent/JPS5837980B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: The use of X-rays in photoetching is made possible by adding fine powder of heavy metal to a sensitive resin having specific sensitive groups.
COPYRIGHT: (C)1977,JPO&Japio
JP50158126A 1975-12-30 1975-12-30 Photo etching information Expired JPS5837980B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50158126A JPS5837980B2 (en) 1975-12-30 1975-12-30 Photo etching information

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50158126A JPS5837980B2 (en) 1975-12-30 1975-12-30 Photo etching information

Publications (2)

Publication Number Publication Date
JPS5283062A true JPS5283062A (en) 1977-07-11
JPS5837980B2 JPS5837980B2 (en) 1983-08-19

Family

ID=15664847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50158126A Expired JPS5837980B2 (en) 1975-12-30 1975-12-30 Photo etching information

Country Status (1)

Country Link
JP (1) JPS5837980B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138634A (en) * 1981-02-20 1982-08-27 Hitachi Ltd X-ray sensitive resin and formation of ultrathin line pattern using this resin
US9261784B2 (en) 2011-07-08 2016-02-16 Asml Netherlands B.V. Lithographic patterning process and resists to use therein

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6067800A (en) * 1983-09-22 1985-04-18 Koji Torii Lateral overflow preventer for syphon system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138634A (en) * 1981-02-20 1982-08-27 Hitachi Ltd X-ray sensitive resin and formation of ultrathin line pattern using this resin
US9261784B2 (en) 2011-07-08 2016-02-16 Asml Netherlands B.V. Lithographic patterning process and resists to use therein
JP2018025823A (en) * 2011-07-08 2018-02-15 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic patterning process and resist used in the process

Also Published As

Publication number Publication date
JPS5837980B2 (en) 1983-08-19

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