JPS5268080A - Apparatus for physical vacuum evaporation - Google Patents
Apparatus for physical vacuum evaporationInfo
- Publication number
- JPS5268080A JPS5268080A JP14484975A JP14484975A JPS5268080A JP S5268080 A JPS5268080 A JP S5268080A JP 14484975 A JP14484975 A JP 14484975A JP 14484975 A JP14484975 A JP 14484975A JP S5268080 A JPS5268080 A JP S5268080A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum evaporation
- physical vacuum
- cover
- vacuum
- physical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To enable to take out the electron beam effectively by putting the electron gun in the cover and making the degree of vacuum in the caover higher than that of the vacuum vessel, together with impressing negative electric potential on the cover.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14484975A JPS5268080A (en) | 1975-12-04 | 1975-12-04 | Apparatus for physical vacuum evaporation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14484975A JPS5268080A (en) | 1975-12-04 | 1975-12-04 | Apparatus for physical vacuum evaporation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5268080A true JPS5268080A (en) | 1977-06-06 |
Family
ID=15371837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14484975A Pending JPS5268080A (en) | 1975-12-04 | 1975-12-04 | Apparatus for physical vacuum evaporation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5268080A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007031783A (en) * | 2005-07-27 | 2007-02-08 | Ulvac Japan Ltd | Electron-beam irradiation device, vapor deposition apparatus and vapor deposition method |
-
1975
- 1975-12-04 JP JP14484975A patent/JPS5268080A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007031783A (en) * | 2005-07-27 | 2007-02-08 | Ulvac Japan Ltd | Electron-beam irradiation device, vapor deposition apparatus and vapor deposition method |
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