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JPS5244174A - Plasma treatment device - Google Patents

Plasma treatment device

Info

Publication number
JPS5244174A
JPS5244174A JP11976975A JP11976975A JPS5244174A JP S5244174 A JPS5244174 A JP S5244174A JP 11976975 A JP11976975 A JP 11976975A JP 11976975 A JP11976975 A JP 11976975A JP S5244174 A JPS5244174 A JP S5244174A
Authority
JP
Japan
Prior art keywords
treatment device
plasma treatment
pressure
plasma
plasmas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11976975A
Other languages
Japanese (ja)
Other versions
JPS5341505B2 (en
Inventor
Takashi Tsuchimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11976975A priority Critical patent/JPS5244174A/en
Priority to GB41345/76A priority patent/GB1550853A/en
Priority to US05/729,987 priority patent/US4123316A/en
Publication of JPS5244174A publication Critical patent/JPS5244174A/en
Publication of JPS5341505B2 publication Critical patent/JPS5341505B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To make the pressure in a plasma treating chamber lower than the pressure in a plasma generating chamber, thereby transferring plasmas in an ionized state with a coaxial magnetic field.
COPYRIGHT: (C)1977,JPO&Japio
JP11976975A 1975-10-06 1975-10-06 Plasma treatment device Granted JPS5244174A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11976975A JPS5244174A (en) 1975-10-06 1975-10-06 Plasma treatment device
GB41345/76A GB1550853A (en) 1975-10-06 1976-10-05 Apparatus and process for plasma treatment
US05/729,987 US4123316A (en) 1975-10-06 1976-10-06 Plasma processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11976975A JPS5244174A (en) 1975-10-06 1975-10-06 Plasma treatment device

Publications (2)

Publication Number Publication Date
JPS5244174A true JPS5244174A (en) 1977-04-06
JPS5341505B2 JPS5341505B2 (en) 1978-11-04

Family

ID=14769726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11976975A Granted JPS5244174A (en) 1975-10-06 1975-10-06 Plasma treatment device

Country Status (1)

Country Link
JP (1) JPS5244174A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma
JPS5779621A (en) * 1980-11-05 1982-05-18 Mitsubishi Electric Corp Plasma processing device
JPS57206021A (en) * 1981-05-04 1982-12-17 Optical Coating Laboratory Inc Method and device for forming and utilizing active molecular beam
JPS60257130A (en) * 1984-06-01 1985-12-18 Res Dev Corp Of Japan Formation of thin film using radical beam
WO1997008361A1 (en) * 1995-08-29 1997-03-06 Komatsu Ltd. Surface treatment apparatus using gas jet
JP2003524285A (en) * 2000-02-24 2003-08-12 シーシーアール ゲゼルシャフト ミト ベシュレンクテル ハフツング ベーシッヒツングステクノロジー RF plasma source
US9822278B2 (en) 2010-06-01 2017-11-21 Dyflex Corporation One-component type polyurethane resin composition for preventing detachment of concrete pieces and tiles and method for preventing detachment of concrete pieces and tiles using same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5184580A (en) * 1975-01-22 1976-07-23 Tokyo Shibaura Electric Co GASUETSU CHINGUSOCHI

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5184580A (en) * 1975-01-22 1976-07-23 Tokyo Shibaura Electric Co GASUETSU CHINGUSOCHI

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma
JPS6243335B2 (en) * 1980-05-02 1987-09-12 Nippon Telegraph & Telephone
JPS5779621A (en) * 1980-11-05 1982-05-18 Mitsubishi Electric Corp Plasma processing device
JPH0343774B2 (en) * 1980-11-05 1991-07-03 Mitsubishi Electric Corp
JPS57206021A (en) * 1981-05-04 1982-12-17 Optical Coating Laboratory Inc Method and device for forming and utilizing active molecular beam
JPS60257130A (en) * 1984-06-01 1985-12-18 Res Dev Corp Of Japan Formation of thin film using radical beam
JPH0231491B2 (en) * 1984-06-01 1990-07-13 Shingijutsu Kaihatsu Jigyodan
WO1997008361A1 (en) * 1995-08-29 1997-03-06 Komatsu Ltd. Surface treatment apparatus using gas jet
JP2003524285A (en) * 2000-02-24 2003-08-12 シーシーアール ゲゼルシャフト ミト ベシュレンクテル ハフツング ベーシッヒツングステクノロジー RF plasma source
JP5000061B2 (en) * 2000-02-24 2012-08-15 シーシーアール ゲゼルシャフト ミト ベシュレンクテル ハフツング ベーシッヒツングステクノロジー RF plasma source
US9822278B2 (en) 2010-06-01 2017-11-21 Dyflex Corporation One-component type polyurethane resin composition for preventing detachment of concrete pieces and tiles and method for preventing detachment of concrete pieces and tiles using same

Also Published As

Publication number Publication date
JPS5341505B2 (en) 1978-11-04

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