JPS5219317B1 - - Google Patents

Info

Publication number: JPS5219317B1
Authority: JP; Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP47038798A

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1971-04-19

Filing date

1972-04-19

Publication date

1977-05-27

1972-04-19 Application filed filed Critical

1977-05-27 Publication of JPS5219317B1 publication Critical patent/JPS5219317B1/ja

Status Pending legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Microelectronics & Electronic Packaging (AREA)
Manufacturing & Machinery (AREA)
Physics & Mathematics (AREA)
Condensed Matter Physics & Semiconductors (AREA)
General Physics & Mathematics (AREA)
Computer Hardware Design (AREA)
Power Engineering (AREA)
Thermal Sciences (AREA)
Physical Vapour Deposition (AREA)
Semiconductor Integrated Circuits (AREA)
Apparatuses And Processes For Manufacturing Resistors (AREA)

JP47038798A 1971-04-19 1972-04-19 Pending JPS5219317B1 (ja)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US13517871A	1971-04-19	1971-04-19

Publications (1)

Publication Number	Publication Date
JPS5219317B1 true JPS5219317B1 (ja)	1977-05-27

Family

ID=22466901

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP47038798A Pending JPS5219317B1 (ja)	1971-04-19	1972-04-19

Country Status (10)

Country	Link
US (1)	US3737343A (ja)
JP (1)	JPS5219317B1 (ja)
BE (1)	BE782263A (ja)
CA (1)	CA952062A (ja)
DE (1)	DE2217775C3 (ja)
FR (1)	FR2133869B1 (ja)
GB (1)	GB1349046A (ja)
IT (1)	IT965772B (ja)
NL (1)	NL149548B (ja)
SE (1)	SE376931B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
LU67831A1 (ja) *	1972-10-31	1973-08-28	Siemens Ag
DE2429434B2 (de) *	1974-06-19	1979-10-04	Siemens Ag, 1000 Berlin Und 8000 Muenchen	Verfahren zur Herstellung von Widerständen und Kondensatoren in Dunnschichtschaltungen
US4042479A (en) *	1973-12-27	1977-08-16	Fujitsu Ltd.	Thin film resistor and a method of producing the same
JPS61295371A (ja) *	1985-06-24	1986-12-26	Nippon Light Metal Co Ltd	窒化アルミニウム層を有するアルミニウム材の製法
DE4114162A1 (de) *	1990-05-02	1991-11-07	Nippon Sheet Glass Co Ltd	Verfahren zur herstellung eines polykristallinen halbleiterfilms
US6335062B1 (en) *	1994-09-13	2002-01-01	The United States Of America As Represented By The Secretary Of The Navy	Reactive oxygen-assisted ion implantation into metals and products made therefrom
US6692586B2 (en)	2001-05-23	2004-02-17	Rolls-Royce Corporation	High temperature melting braze materials for bonding niobium based alloys

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US1258259A (en) *	1917-10-05	1918-03-05	Arthur C Schaffer	Headlight-controlling means for automobiles or vehicles.
GB1067831A (en) *	1964-03-11	1967-05-03	Ultra Electronics Ltd	Improvements in thin film circuits

1971
- 1971-04-19 US US00135178A patent/US3737343A/en not_active Expired - Lifetime
- 1971-11-09 CA CA127,242A patent/CA952062A/en not_active Expired
1972
- 1972-04-11 SE SE7204665A patent/SE376931B/xx unknown
- 1972-04-12 IT IT49557/72A patent/IT965772B/it active
- 1972-04-13 DE DE2217775A patent/DE2217775C3/de not_active Expired
- 1972-04-14 NL NL727205047A patent/NL149548B/xx not_active IP Right Cessation
- 1972-04-18 FR FR727213650A patent/FR2133869B1/fr not_active Expired
- 1972-04-18 BE BE782263A patent/BE782263A/xx not_active IP Right Cessation
- 1972-04-18 GB GB1784372A patent/GB1349046A/en not_active Expired
- 1972-04-19 JP JP47038798A patent/JPS5219317B1/ja active Pending

Also Published As

Publication number	Publication date
DE2217775B2 (de)	1974-02-21
CA952062A (en)	1974-07-30
FR2133869B1 (ja)	1974-07-26
FR2133869A1 (ja)	1972-12-01
IT965772B (it)	1974-02-11
US3737343A (en)	1973-06-05
GB1349046A (en)	1974-03-27
SE376931B (ja)	1975-06-16
DE2217775C3 (de)	1974-10-31
DE2217775A1 (de)	1972-11-02
NL149548B (nl)	1976-05-17
NL7205047A (ja)	1972-10-23
BE782263A (fr)	1972-08-16

Publication	Publication Date	Title
ATA136472A (ja)	1973-12-15
FR2133869B1 (ja)	1974-07-26
AU2691671A (ja)	1972-09-28
AU2941471A (ja)	1972-11-30
AU2485671A (ja)	1972-08-03
AU3005371A (ja)	1972-12-21
AU2564071A (ja)	1972-08-24
AU3025871A (ja)	1973-01-04
AU2654071A (ja)	1972-09-21
AU3038671A (ja)	1973-01-04
AU2473671A (ja)	1972-08-03
AR202997Q (ja)	1975-08-08
AU2684171A (ja)	1971-07-15
AU1109576A (ja)	1976-04-29
AU2588771A (ja)	1972-08-31
AU2577671A (ja)	1972-08-24
AU2963771A (ja)	1972-12-07
AU2503871A (ja)	1972-08-10
AU2399971A (ja)	1972-07-06
AU2415871A (ja)	1972-07-13
AU2455871A (ja)	1972-07-27
AU2486471A (ja)	1972-08-03
AU2456871A (ja)	1972-08-17
AR199640Q (ja)	1974-09-23
AU2485370A (ja)	1972-08-03