JPS5214278B2 - - Google Patents
Info
- Publication number
- JPS5214278B2 JPS5214278B2 JP5211175A JP5211175A JPS5214278B2 JP S5214278 B2 JPS5214278 B2 JP S5214278B2 JP 5211175 A JP5211175 A JP 5211175A JP 5211175 A JP5211175 A JP 5211175A JP S5214278 B2 JPS5214278 B2 JP S5214278B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46637474A | 1974-05-02 | 1974-05-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50151997A JPS50151997A (en) | 1975-12-06 |
| JPS5214278B2 true JPS5214278B2 (en) | 1977-04-20 |
Family
ID=23851510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5211175A Expired JPS5214278B2 (en) | 1974-05-02 | 1975-05-01 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5214278B2 (en) |
| BE (1) | BE828670A (en) |
| DE (3) | DE2559833C2 (en) |
| FR (1) | FR2269551B1 (en) |
| GB (2) | GB1516511A (en) |
Cited By (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61242615A (en) * | 1985-04-18 | 1986-10-28 | Nippon Air Filter Kk | Process and device for collecting dust |
| EP0410606A2 (en) | 1989-07-12 | 1991-01-30 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
| JPH0347573A (en) * | 1989-07-12 | 1991-02-28 | Ishigaki Kiko Kk | Method and apparatus for classifying fine powder |
| EP0629613A3 (en) * | 1993-06-18 | 1995-06-21 | Nippon Kayaku Kk | Novel onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product. |
| EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| EP1615073A1 (en) | 2004-07-06 | 2006-01-11 | Fuji Photo Film Co., Ltd. | Photosensitive composition and image recording method using the same |
| EP1662318A1 (en) | 1999-03-09 | 2006-05-31 | Fuji Photo Film Co., Ltd. | 1,3-dihydro-1-oxo-2H-indene derivative |
| EP1701213A2 (en) | 2005-03-08 | 2006-09-13 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| EP1707352A1 (en) | 2005-03-31 | 2006-10-04 | Fuji Photo Film Co., Ltd. | Method of producing a planographic printing plate |
| EP1728838A1 (en) | 2005-05-31 | 2006-12-06 | Fuji Photo Film Co., Ltd. | Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same |
| EP1955850A2 (en) | 2007-02-07 | 2008-08-13 | FUJIFILM Corporation | Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method |
| EP1955858A1 (en) | 2007-02-06 | 2008-08-13 | FUJIFILM Corporation | Undercoat solution, ink-jet recording method and ink-jet recording device |
| EP1964893A1 (en) | 2007-02-26 | 2008-09-03 | FUJIFILM Corporation | Ink composition, inkjet recording method, printed material, and ink set |
| EP1975211A1 (en) | 2007-03-30 | 2008-10-01 | FUJIFILM Corporation | Ink composition and image recording method and image recorded matter using same |
| EP1975213A1 (en) | 2006-07-03 | 2008-10-01 | FUJIFILM Corporation | Ink composition, injet recording method, printed material, and process for producing lithographic printing plate |
| EP1975160A1 (en) | 2007-03-30 | 2008-10-01 | Fujifilm Corporation | Polymerizable compound, polymer, ink composition, printed articles and inkjet recording method |
| EP1988136A1 (en) | 2007-03-01 | 2008-11-05 | FUJIFILM Corporation | Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate |
| EP2042572A1 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Ink composition, inkjet recording method, printed material, and process for producing molded printed material |
| EP2042335A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Inkjet recording method |
| EP2042243A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Coater and ink-jet recording device using the same |
| EP2088176A1 (en) | 2008-02-07 | 2009-08-12 | FUJIFILM Corporation | Ink composition, inkjet recording method, printed material, and molded printed material |
| EP2093265A1 (en) | 2008-02-25 | 2009-08-26 | FUJIFILM Corporation | Inkjet ink composition, and inkjet recording method and printed material employing same |
| EP2100925A2 (en) | 2008-03-11 | 2009-09-16 | FUJIFILM Corporation | Pigment composition, ink composition, printed article, inkjet recording method and polyallylamine derivative |
| EP2105478A1 (en) | 2008-03-26 | 2009-09-30 | FUJIFILM Corporation | Inkjet recording method and inkjet recording system |
| EP2169021A1 (en) | 2008-09-25 | 2010-03-31 | Fujifilm Corporation | Ink composition, inkjet recording method, and printed material |
| EP2216378A1 (en) | 2009-02-05 | 2010-08-11 | Fujifilm Corporation | Nonaqueous ink, image-recording method, image-recording apparatus and recorded article |
| EP2216377A1 (en) | 2009-02-09 | 2010-08-11 | FUJIFILM Corporation | Ink composition, and inkjet recording method |
| EP2230285A1 (en) | 2009-03-19 | 2010-09-22 | Fujifilm Corporation | Ink composition, inkjet recording method, printed material, and process for producing molded printed material |
| EP2230284A1 (en) | 2009-03-17 | 2010-09-22 | Fujifilm Corporation | Ink composition and inkjet recording method |
| EP2236570A2 (en) | 2009-03-31 | 2010-10-06 | Fujifilm Corporation | Ink composition, ink composition for inkjet recording, inkjet recording method, and printed article obtained by inkjet recording method |
| EP2239295A2 (en) | 2009-04-06 | 2010-10-13 | Shin-Etsu Chemical Co., Ltd. | Radiation-curable silicone composition |
| EP2298841A1 (en) | 2009-09-18 | 2011-03-23 | FUJIFILM Corporation | Ink composition, and inkjet recording method |
| EP2311918A1 (en) | 2009-09-29 | 2011-04-20 | FUJIFILM Corporation | Ink composition, and inkjet recording method |
| EP2644664A1 (en) | 2012-03-29 | 2013-10-02 | Fujifilm Corporation | Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article |
| WO2014136923A1 (en) | 2013-03-07 | 2014-09-12 | 富士フイルム株式会社 | Inkjet ink composition, inkjet recording method, printed matter and method of producing formed printed matter |
| EP2842763A2 (en) | 2013-08-30 | 2015-03-04 | Fujifilm Corporation | Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set |
| US9416220B2 (en) | 2012-05-18 | 2016-08-16 | Cmet Inc. | Resin composition for optical stereolithography |
Families Citing this family (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| AU517415B2 (en) * | 1976-07-09 | 1981-07-30 | General Electric Company | Curable polymer composition |
| US4108747A (en) * | 1976-07-14 | 1978-08-22 | General Electric Company | Curable compositions and method for curing such compositions |
| US4090936A (en) | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
| US4101513A (en) * | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| US4102687A (en) * | 1977-02-14 | 1978-07-25 | General Electric Company | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
| GB1604954A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB1596000A (en) * | 1977-09-14 | 1981-08-19 | Gen Electric | Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials |
| US4246298A (en) * | 1979-03-14 | 1981-01-20 | American Can Company | Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application |
| US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4319974A (en) * | 1980-04-21 | 1982-03-16 | General Electric Company | UV Curable compositions and substrates treated therewith |
| JPS57125212A (en) | 1981-01-27 | 1982-08-04 | Toshiba Corp | Photo-polymerizable composition |
| US4387216A (en) | 1981-05-06 | 1983-06-07 | Ciba-Geigy Corporation | Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants |
| DE3135636A1 (en) | 1981-09-09 | 1983-03-17 | Basf Ag, 6700 Ludwigshafen | CURABLE EPOXY RESINS |
| GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
| JPS61190524A (en) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | Energy ray-curable composition |
| JPS61261365A (en) * | 1985-05-14 | 1986-11-19 | Nippon Oil Co Ltd | Photo-curable coating composition |
| DE3604580A1 (en) * | 1986-02-14 | 1987-08-20 | Basf Ag | CURABLE MIXTURES CONTAINING N-SULFONYLAMINOSULFONIUM SALTS AS CATIONICALLY EFFECTIVE CATALYSTS |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US5399596A (en) * | 1988-03-03 | 1995-03-21 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
| US4882201A (en) * | 1988-03-21 | 1989-11-21 | General Electric Company | Non-toxic aryl onium salts, UV curable coating compositions and food packaging use |
| US4871786A (en) * | 1988-10-03 | 1989-10-03 | Minnesota Mining And Manufacturing Company | Organic fluoride sources |
| US5047568A (en) * | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
| DE3902114A1 (en) * | 1989-01-25 | 1990-08-02 | Basf Ag | RADIATION-SENSITIVE, ETHYLENICALLY UNSATURATED, COPOLYMERIZABLE SULFONIUM SALTS AND METHOD FOR THE PRODUCTION THEREOF |
| DE3933420C1 (en) * | 1989-10-06 | 1991-03-07 | Th. Goldschmidt Ag, 4300 Essen, De | |
| JP2697937B2 (en) * | 1989-12-15 | 1998-01-19 | キヤノン株式会社 | Active energy ray-curable resin composition |
| KR960000980B1 (en) * | 1990-03-27 | 1996-01-15 | 가부시기가이샤 히다찌 세이사꾸쇼 | Adhesive agent for substrate of electroless plating printed |
| US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
| DE4027438C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp. |
| DE4027437C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds. |
| US5354590A (en) * | 1991-02-16 | 1994-10-11 | Canon Kabushiki Kaisha | Optical recording medium |
| US5166126A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Color filter array element with protective overcoat layer and method of forming same |
| US5166125A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Method of forming color filter array element with patternable overcoat layer |
| US5466845A (en) * | 1992-06-12 | 1995-11-14 | Wacker-Chemie Gmbh | Sulfonium salts and process for their preparation |
| GB9309275D0 (en) * | 1993-05-05 | 1993-06-16 | Smith & Nephew | Orthopaedic material |
| EP0927726B1 (en) | 1996-09-19 | 2004-11-10 | Nippon Soda Co., Ltd. | Photocatalytic composition |
| JPH1087963A (en) * | 1996-09-20 | 1998-04-07 | Japan Synthetic Rubber Co Ltd | Resin composition and fibrous material molding die |
| JP3786480B2 (en) * | 1996-10-14 | 2006-06-14 | Ｊｓｒ株式会社 | Photocurable resin composition |
| JP3626302B2 (en) * | 1996-12-10 | 2005-03-09 | Ｊｓｒ株式会社 | Photocurable resin composition |
| JP3765896B2 (en) | 1996-12-13 | 2006-04-12 | Ｊｓｒ株式会社 | Photocurable resin composition for optical three-dimensional modeling |
| FR2794126B1 (en) * | 1999-05-26 | 2003-07-18 | Gemplus Card Int | NOVEL ADHESIVE AND CONDUCTIVE COMPOSITION, CONNECTION METHOD, METHOD FOR CONSTITUTING ELECTRICAL OR ELECTRONIC COMPONENTS, USE OF SUCH COMPOSITION, CONDUCTIVE ELEMENT |
| JP2003073481A (en) | 2001-09-06 | 2003-03-12 | Brother Ind Ltd | Active energy ray-curable composition, ink containing the same, and printer using the ink |
| JP2003105077A (en) | 2001-09-28 | 2003-04-09 | Brother Ind Ltd | Active energy ray-curable composition, ink containing the same, and printer using the ink |
| JP4701231B2 (en) * | 2002-02-13 | 2011-06-15 | 富士フイルム株式会社 | Negative resist composition for electron beam, EUV or X-ray and pattern forming method using the same |
| EP1481973B1 (en) | 2002-03-04 | 2008-12-31 | Wako Pure Chemical Industries, Ltd. | Heterocycle-bearing onium salts |
| EP1348727A3 (en) | 2002-03-29 | 2003-12-03 | Brother Kogyo Kabushiki Kaisha | Image-receiving layer composition and overcoat layer composition for ink-jet recording |
| JP4533639B2 (en) * | 2003-07-22 | 2010-09-01 | 富士フイルム株式会社 | SENSITIVE COMPOSITION, COMPOUND, AND PATTERN FORMING METHOD USING THE SENSITIVE COMPOSITION |
| JP2007254454A (en) * | 2006-02-23 | 2007-10-04 | Fujifilm Corp | Sulfonium salt, curable composition, ink composition, ink jet recording method, printed matter, lithographic printing plate production method, and lithographic printing plate |
| TW200838967A (en) | 2007-02-02 | 2008-10-01 | Jsr Corp | Composition for radiation-curable adhesive, composite, and method for producing the composite |
| JP5208573B2 (en) | 2008-05-06 | 2013-06-12 | サンアプロ株式会社 | Sulfonium salt, photoacid generator, photocurable composition and cured product thereof |
| EP2399905B1 (en) | 2009-02-20 | 2014-01-22 | San-Apro Limited | Sulfonium salt, photo-acid generator, and photosensitive resin composition |
| IN2012DN03022A (en) | 2009-10-01 | 2015-07-31 | Hitachi Chemical Co Ltd | |
| US10566105B2 (en) | 2010-04-22 | 2020-02-18 | Hitachi Chemical Company, Ltd. | Method for producing charge transport film |
| JP5622564B2 (en) | 2010-06-30 | 2014-11-12 | 富士フイルム株式会社 | Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device |
| KR101959107B1 (en) | 2012-10-18 | 2019-03-15 | 산아프로 가부시키가이샤 | Sulfonium salt, photoacid generator, curable composition, and resist composition |
| KR102047349B1 (en) | 2012-12-07 | 2019-11-21 | 디에스피 고쿄 후도 ＆ 케미카루 가부시키가이샤 | Novel sulfonium salt compound, method for producing same, and photoacid generator |
| KR20150127077A (en) | 2013-03-08 | 2015-11-16 | 히타치가세이가부시끼가이샤 | Treatment liquid containing ionic compound, organic electronic element, and method for producing organic electronic element |
| EP3018182A4 (en) | 2013-07-05 | 2016-12-07 | San-Apro Ltd | Photoacid generator, and resin composition for photolithography |
| WO2015076395A1 (en) | 2013-11-25 | 2015-05-28 | 和光純薬工業株式会社 | Acid- and radical-generating agent and method for generating acid and radical |
| TWI623519B (en) * | 2014-02-19 | 2018-05-11 | 日本化藥股份有限公司 | Novel compound, photoacid generator containing the compound and photosensitive resin composition containing the photoacid generator |
| JP6195413B2 (en) | 2014-03-05 | 2017-09-13 | 信越化学工業株式会社 | Radiation curable silicone composition |
| TWI673258B (en) | 2014-09-26 | 2019-10-01 | 日商東京應化工業股份有限公司 | Thiophene salt, photoacid generator, and photosensitive composition |
| JP6622210B2 (en) | 2014-11-07 | 2019-12-18 | サンアプロ株式会社 | Sulfonate compound, photoacid generator, and resin composition for photolithography |
| JP6708382B2 (en) | 2015-09-03 | 2020-06-10 | サンアプロ株式会社 | Curable composition and cured product using the same |
| JP6797911B2 (en) | 2016-06-09 | 2020-12-09 | サンアプロ株式会社 | Sulfonium salt, photoacid generator, curable composition and resist composition |
| CN108884110B (en) | 2016-06-29 | 2021-09-14 | 三亚普罗股份有限公司 | Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof |
| US11370751B2 (en) | 2016-07-28 | 2022-06-28 | San Apro Ltd. | Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof |
| WO2018110399A1 (en) | 2016-12-12 | 2018-06-21 | サンアプロ株式会社 | Photoacid generator and resin composition for photolithography |
| US11926581B2 (en) | 2018-05-25 | 2024-03-12 | San-Apro Limited | Sulfonium salt, photoacid generator, curable composition, and resist composition |
| JP7116669B2 (en) | 2018-11-22 | 2022-08-10 | サンアプロ株式会社 | Photoacid generator and resin composition for photolithography |
| EP3909943B1 (en) * | 2019-01-10 | 2025-06-04 | San-Apro Ltd. | Sulfonium salt, photoacid generator, curable composition and resist composition |
| KR20220154085A (en) | 2020-03-17 | 2022-11-21 | 산아프로 가부시키가이샤 | Sulfonium salt, photoacid generator, curable composition and resist composition |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3412046A (en) | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
-
1975
- 1975-04-16 GB GB1570175A patent/GB1516511A/en not_active Expired
- 1975-04-16 GB GB49978A patent/GB1516512A/en not_active Expired
- 1975-04-26 DE DE19752559833 patent/DE2559833C2/en not_active Expired
- 1975-04-26 DE DE19752559718 patent/DE2559718C2/en not_active Expired
- 1975-04-26 DE DE19752518652 patent/DE2518652C2/en not_active Expired
- 1975-04-30 FR FR7513519A patent/FR2269551B1/fr not_active Expired
- 1975-05-01 JP JP5211175A patent/JPS5214278B2/ja not_active Expired
- 1975-05-02 BE BE156013A patent/BE828670A/en not_active IP Right Cessation
Cited By (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61242615A (en) * | 1985-04-18 | 1986-10-28 | Nippon Air Filter Kk | Process and device for collecting dust |
| EP0410606A2 (en) | 1989-07-12 | 1991-01-30 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
| JPH0347573A (en) * | 1989-07-12 | 1991-02-28 | Ishigaki Kiko Kk | Method and apparatus for classifying fine powder |
| EP0629613A3 (en) * | 1993-06-18 | 1995-06-21 | Nippon Kayaku Kk | Novel onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product. |
| EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| EP1662318A1 (en) | 1999-03-09 | 2006-05-31 | Fuji Photo Film Co., Ltd. | 1,3-dihydro-1-oxo-2H-indene derivative |
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Also Published As
| Publication number | Publication date |
|---|---|
| JPS50151997A (en) | 1975-12-06 |
| DE2559833C2 (en) | 1983-12-22 |
| FR2269551A1 (en) | 1975-11-28 |
| DE2518652A1 (en) | 1975-11-06 |
| DE2518652C2 (en) | 1983-05-11 |
| DE2559718A1 (en) | 1977-08-18 |
| DE2559718C2 (en) | 1983-08-04 |
| GB1516511A (en) | 1978-07-05 |
| BE828670A (en) | 1975-09-01 |
| FR2269551B1 (en) | 1978-09-01 |
| GB1516512A (en) | 1978-07-05 |