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JPS52139376A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS52139376A
JPS52139376A JP5680276A JP5680276A JPS52139376A JP S52139376 A JPS52139376 A JP S52139376A JP 5680276 A JP5680276 A JP 5680276A JP 5680276 A JP5680276 A JP 5680276A JP S52139376 A JPS52139376 A JP S52139376A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
mesa
etching
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5680276A
Other languages
Japanese (ja)
Inventor
Katsuya Okumura
Akira Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5680276A priority Critical patent/JPS52139376A/en
Publication of JPS52139376A publication Critical patent/JPS52139376A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To form a clean film on mesa faces in an atmosphere of mixed gases of O2 or N2 after mesa-etching of a Si substrate and produce pellets of good electric characteristics.
COPYRIGHT: (C)1977,JPO&Japio
JP5680276A 1976-05-18 1976-05-18 Production of semiconductor device Pending JPS52139376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5680276A JPS52139376A (en) 1976-05-18 1976-05-18 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5680276A JPS52139376A (en) 1976-05-18 1976-05-18 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS52139376A true JPS52139376A (en) 1977-11-21

Family

ID=13037519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5680276A Pending JPS52139376A (en) 1976-05-18 1976-05-18 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS52139376A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5530890A (en) * 1978-08-21 1980-03-04 Westinghouse Electric Corp Method of controlling characteristics of semiconductor device
JPS5792833A (en) * 1980-12-01 1982-06-09 Toshiba Corp Manufacture of semiconductor device
JPS5896412A (en) * 1981-12-04 1983-06-08 Fujitsu Ltd Manufacture for piezo-electric vibrator
JPH02137325A (en) * 1988-11-18 1990-05-25 Fuji Electric Co Ltd Passivation treatment method for amorphous silicon surface
WO2003077306A1 (en) * 2002-03-08 2003-09-18 Sankan Electric Co., Ltd. Semiconductor device and its manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5530890A (en) * 1978-08-21 1980-03-04 Westinghouse Electric Corp Method of controlling characteristics of semiconductor device
JPS5792833A (en) * 1980-12-01 1982-06-09 Toshiba Corp Manufacture of semiconductor device
JPS5896412A (en) * 1981-12-04 1983-06-08 Fujitsu Ltd Manufacture for piezo-electric vibrator
JPH02137325A (en) * 1988-11-18 1990-05-25 Fuji Electric Co Ltd Passivation treatment method for amorphous silicon surface
WO2003077306A1 (en) * 2002-03-08 2003-09-18 Sankan Electric Co., Ltd. Semiconductor device and its manufacturing method

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