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JPS52124873A - Method of deflecting charged particle beam - Google Patents

Method of deflecting charged particle beam

Info

Publication number
JPS52124873A
JPS52124873A JP4172676A JP4172676A JPS52124873A JP S52124873 A JPS52124873 A JP S52124873A JP 4172676 A JP4172676 A JP 4172676A JP 4172676 A JP4172676 A JP 4172676A JP S52124873 A JPS52124873 A JP S52124873A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
deflecting charged
deflecting
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4172676A
Other languages
Japanese (ja)
Other versions
JPS5851384B2 (en
Inventor
Hidekazu Gotou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP51041726A priority Critical patent/JPS5851384B2/en
Publication of JPS52124873A publication Critical patent/JPS52124873A/en
Publication of JPS5851384B2 publication Critical patent/JPS5851384B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Welding Or Cutting Using Electron Beams (AREA)
  • Details Of Television Scanning (AREA)
  • Electron Beam Exposure (AREA)
JP51041726A 1976-04-13 1976-04-13 Deflection method of charged particle beam Expired JPS5851384B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51041726A JPS5851384B2 (en) 1976-04-13 1976-04-13 Deflection method of charged particle beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51041726A JPS5851384B2 (en) 1976-04-13 1976-04-13 Deflection method of charged particle beam

Publications (2)

Publication Number Publication Date
JPS52124873A true JPS52124873A (en) 1977-10-20
JPS5851384B2 JPS5851384B2 (en) 1983-11-16

Family

ID=12616415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51041726A Expired JPS5851384B2 (en) 1976-04-13 1976-04-13 Deflection method of charged particle beam

Country Status (1)

Country Link
JP (1) JPS5851384B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725700A (en) * 1980-06-10 1982-02-10 Philips Nv Linear accelerator
JPS585954A (en) * 1981-07-03 1983-01-13 Hitachi Ltd dynamic focus correction device
JPS585955A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Dynamic deflection astigmatism correcting device
JPS58147948A (en) * 1982-02-26 1983-09-02 Jeol Ltd Electrooptic system for scanning electron microscope or the like
JPS6298544A (en) * 1985-10-25 1987-05-08 Hitachi Ltd Charged particle beam device
JPH10172879A (en) * 1996-12-06 1998-06-26 Canon Inc Electron beam aligner and method of manufacturing device using the aligner
US5910611A (en) * 1987-04-09 1999-06-08 Union Carbide Chemicals & Plastics Technology Corporation Aqueous alkanolamines using an electrodialysis cell with an ion exchange membrane
WO2023094795A1 (en) * 2021-11-25 2023-06-01 Aquasium Technology Limited Electron beam deflector

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725700A (en) * 1980-06-10 1982-02-10 Philips Nv Linear accelerator
JPH0546120B2 (en) * 1980-06-10 1993-07-13 Philips Nv
JPS585954A (en) * 1981-07-03 1983-01-13 Hitachi Ltd dynamic focus correction device
JPS585955A (en) * 1981-07-03 1983-01-13 Hitachi Ltd Dynamic deflection astigmatism correcting device
JPS6338827B2 (en) * 1981-07-03 1988-08-02 Hitachi Seisakusho Kk
JPS6338826B2 (en) * 1981-07-03 1988-08-02 Hitachi Seisakusho Kk
JPS58147948A (en) * 1982-02-26 1983-09-02 Jeol Ltd Electrooptic system for scanning electron microscope or the like
JPH0234144B2 (en) * 1982-02-26 1990-08-01 Nippon Electron Optics Lab
JPS6298544A (en) * 1985-10-25 1987-05-08 Hitachi Ltd Charged particle beam device
US5910611A (en) * 1987-04-09 1999-06-08 Union Carbide Chemicals & Plastics Technology Corporation Aqueous alkanolamines using an electrodialysis cell with an ion exchange membrane
JPH10172879A (en) * 1996-12-06 1998-06-26 Canon Inc Electron beam aligner and method of manufacturing device using the aligner
WO2023094795A1 (en) * 2021-11-25 2023-06-01 Aquasium Technology Limited Electron beam deflector

Also Published As

Publication number Publication date
JPS5851384B2 (en) 1983-11-16

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