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JPS52116177A - Laser beam exposure unit - Google Patents

Laser beam exposure unit

Info

Publication number
JPS52116177A
JPS52116177A JP3396376A JP3396376A JPS52116177A JP S52116177 A JPS52116177 A JP S52116177A JP 3396376 A JP3396376 A JP 3396376A JP 3396376 A JP3396376 A JP 3396376A JP S52116177 A JPS52116177 A JP S52116177A
Authority
JP
Japan
Prior art keywords
laser beam
exposure unit
beam exposure
sensitive resin
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3396376A
Other languages
Japanese (ja)
Other versions
JPS561778B2 (en
Inventor
Nobuhiko Eguchi
Masaharu Takahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3396376A priority Critical patent/JPS52116177A/en
Publication of JPS52116177A publication Critical patent/JPS52116177A/en
Publication of JPS561778B2 publication Critical patent/JPS561778B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To eliminate occurrence of quality deterioration of sensitive resin and thus to realize exposure for the pattern of extremely thin width, by giving exposure to the sensitive resin with use of laser beam which had passed through the lens focal point.
COPYRIGHT: (C)1977,JPO&Japio
JP3396376A 1976-03-26 1976-03-26 Laser beam exposure unit Granted JPS52116177A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3396376A JPS52116177A (en) 1976-03-26 1976-03-26 Laser beam exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3396376A JPS52116177A (en) 1976-03-26 1976-03-26 Laser beam exposure unit

Publications (2)

Publication Number Publication Date
JPS52116177A true JPS52116177A (en) 1977-09-29
JPS561778B2 JPS561778B2 (en) 1981-01-16

Family

ID=12401135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3396376A Granted JPS52116177A (en) 1976-03-26 1976-03-26 Laser beam exposure unit

Country Status (1)

Country Link
JP (1) JPS52116177A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05154925A (en) * 1992-06-01 1993-06-22 Osaka Prefecture Optically shaping method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05154925A (en) * 1992-06-01 1993-06-22 Osaka Prefecture Optically shaping method

Also Published As

Publication number Publication date
JPS561778B2 (en) 1981-01-16

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