JPS5154770A - KISOSEICHOHO - Google Patents
KISOSEICHOHOInfo
- Publication number
- JPS5154770A JPS5154770A JP12859374A JP12859374A JPS5154770A JP S5154770 A JPS5154770 A JP S5154770A JP 12859374 A JP12859374 A JP 12859374A JP 12859374 A JP12859374 A JP 12859374A JP S5154770 A JPS5154770 A JP S5154770A
- Authority
- JP
- Japan
- Prior art keywords
- kisoseichoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12859374A JPS5154770A (en) | 1974-11-08 | 1974-11-08 | KISOSEICHOHO |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12859374A JPS5154770A (en) | 1974-11-08 | 1974-11-08 | KISOSEICHOHO |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5154770A true JPS5154770A (en) | 1976-05-14 |
Family
ID=14988585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12859374A Pending JPS5154770A (en) | 1974-11-08 | 1974-11-08 | KISOSEICHOHO |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5154770A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5791526A (en) * | 1980-11-28 | 1982-06-07 | Fujitsu Ltd | Heating method for substrate surface in vacuum container |
JPS57202739A (en) * | 1981-06-05 | 1982-12-11 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
US4371587A (en) * | 1979-12-17 | 1983-02-01 | Hughes Aircraft Company | Low temperature process for depositing oxide layers by photochemical vapor deposition |
JPS59216630A (en) * | 1983-05-24 | 1984-12-06 | Semiconductor Energy Lab Co Ltd | Optical cvd apparatus |
US4623426A (en) * | 1982-06-22 | 1986-11-18 | Hughes Aircraft Company | Low temperature process for depositing epitaxial layers |
-
1974
- 1974-11-08 JP JP12859374A patent/JPS5154770A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4371587A (en) * | 1979-12-17 | 1983-02-01 | Hughes Aircraft Company | Low temperature process for depositing oxide layers by photochemical vapor deposition |
JPS5791526A (en) * | 1980-11-28 | 1982-06-07 | Fujitsu Ltd | Heating method for substrate surface in vacuum container |
JPS57202739A (en) * | 1981-06-05 | 1982-12-11 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS6326540B2 (en) * | 1981-06-05 | 1988-05-30 | Mitsubishi Electric Corp | |
US4623426A (en) * | 1982-06-22 | 1986-11-18 | Hughes Aircraft Company | Low temperature process for depositing epitaxial layers |
JPS59216630A (en) * | 1983-05-24 | 1984-12-06 | Semiconductor Energy Lab Co Ltd | Optical cvd apparatus |
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