JPS51112182A - Method and apparatus for generating plasma acted by magnetism to form thin film on surface of solid substrate - Google Patents
Method and apparatus for generating plasma acted by magnetism to form thin film on surface of solid substrateInfo
- Publication number
- JPS51112182A JPS51112182A JP2270076A JP2270076A JPS51112182A JP S51112182 A JPS51112182 A JP S51112182A JP 2270076 A JP2270076 A JP 2270076A JP 2270076 A JP2270076 A JP 2270076A JP S51112182 A JPS51112182 A JP S51112182A
- Authority
- JP
- Japan
- Prior art keywords
- magnetism
- thin film
- solid substrate
- generating plasma
- form thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005389 magnetism Effects 0.000 title 1
- 239000007787 solid Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CS143675A CS176690B1 (ja) | 1975-03-04 | 1975-03-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51112182A true JPS51112182A (en) | 1976-10-04 |
Family
ID=5348709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2270076A Pending JPS51112182A (en) | 1975-03-04 | 1976-03-04 | Method and apparatus for generating plasma acted by magnetism to form thin film on surface of solid substrate |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS51112182A (ja) |
CS (1) | CS176690B1 (ja) |
DE (1) | DE2606937A1 (ja) |
NL (1) | NL7602116A (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2587729B1 (fr) * | 1985-09-24 | 1988-12-23 | Centre Nat Rech Scient | Procede et dispositif de traitement chimique, notamment de traitement thermochimique et de depot chimique dans un plasma homogene de grand volume |
CH671407A5 (ja) * | 1986-06-13 | 1989-08-31 | Balzers Hochvakuum | |
JP2805009B2 (ja) * | 1988-05-11 | 1998-09-30 | 株式会社日立製作所 | プラズマ発生装置及びプラズマ元素分析装置 |
JP2546405B2 (ja) * | 1990-03-12 | 1996-10-23 | 富士電機株式会社 | プラズマ処理装置ならびにその運転方法 |
-
1975
- 1975-03-04 CS CS143675A patent/CS176690B1/cs unknown
-
1976
- 1976-02-20 DE DE19762606937 patent/DE2606937A1/de active Pending
- 1976-03-01 NL NL7602116A patent/NL7602116A/xx not_active Application Discontinuation
- 1976-03-04 JP JP2270076A patent/JPS51112182A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
NL7602116A (nl) | 1976-09-07 |
CS176690B1 (ja) | 1977-06-30 |
DE2606937A1 (de) | 1976-09-23 |
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