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JPS4989717A - - Google Patents

Info

Publication number
JPS4989717A
JPS4989717A JP14114573A JP14114573A JPS4989717A JP S4989717 A JPS4989717 A JP S4989717A JP 14114573 A JP14114573 A JP 14114573A JP 14114573 A JP14114573 A JP 14114573A JP S4989717 A JPS4989717 A JP S4989717A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14114573A
Other languages
Japanese (ja)
Other versions
JPS5827215B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00315393A external-priority patent/US3850679A/en
Priority claimed from US315394A external-priority patent/US3888649A/en
Application filed filed Critical
Publication of JPS4989717A publication Critical patent/JPS4989717A/ja
Publication of JPS5827215B2 publication Critical patent/JPS5827215B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/217—FeOx, CoOx, NiOx
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/219—CrOx, MoOx, WOx
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP48141145A 1972-12-15 1973-12-14 Coating equipment Expired JPS5827215B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US00315393A US3850679A (en) 1972-12-15 1972-12-15 Chemical vapor deposition of coatings
US315394A US3888649A (en) 1972-12-15 1972-12-15 Nozzle for chemical vapor deposition of coatings

Publications (2)

Publication Number Publication Date
JPS4989717A true JPS4989717A (en) 1974-08-27
JPS5827215B2 JPS5827215B2 (en) 1983-06-08

Family

ID=26979870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48141145A Expired JPS5827215B2 (en) 1972-12-15 1973-12-14 Coating equipment

Country Status (8)

Country Link
JP (1) JPS5827215B2 (en)
BE (1) BE808675A (en)
DE (1) DE2361702B2 (en)
FR (1) FR2210675B1 (en)
GB (1) GB1454379A (en)
IT (1) IT1000509B (en)
NL (1) NL7314476A (en)
SE (1) SE409322B (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54127424A (en) * 1978-03-08 1979-10-03 Gordon Roy Gerald Improved deposition method
JPS62227091A (en) * 1986-03-28 1987-10-06 Nippon Kokan Kk <Nkk> Chemical vapor deposition method in continuous treatment line
JP2014122424A (en) * 2012-12-20 2014-07-03 Samsung Display Co Ltd Vapor deposition apparatus, deposition method using the same, and method of manufacturing organic light-emitting display apparatus
WO2016067379A1 (en) * 2014-10-29 2016-05-06 東芝三菱電機産業システム株式会社 Apparatus for injecting gas into film formation apparatus
WO2016067381A1 (en) * 2014-10-29 2016-05-06 東芝三菱電機産業システム株式会社 Gas jetting device
US11731154B2 (en) 2017-03-31 2023-08-22 Arkema Inc. Modular hood for coating glass containers including removable dividers for affecting air flow through the hood

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1524326A (en) * 1976-04-13 1978-09-13 Bfg Glassgroup Coating of glass
CH628600A5 (en) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro PROCESS FOR CONTINUOUSLY DEPOSITING, ON THE SURFACE OF A SUBSTRATE CARRIED AT HIGH TEMPERATURE, A LAYER OF A SOLID MATERIAL AND INSTALLATION FOR THE IMPLEMENTATION OF THIS PROCESS.
US4419570A (en) * 1980-03-03 1983-12-06 Societa Italiana Vetro - Siv - S.P.A. Heating glass pane
US4668538A (en) * 1984-07-10 1987-05-26 Westinghouse Electric Corp. Processes for depositing metal compound coatings
FR2581056B1 (en) * 1985-04-24 1987-06-05 Saint Gobain Vitrage COATING OF THE GLASS MANUFACTURED IN A FLOATING PLANT WITH PYROLISABLE POWDER COMPOUNDS
JPH09169545A (en) 1995-12-21 1997-06-30 Th Goldschmidt Ag Method for pyrolytically forming layer comprising tin oxide doped with antimony oxide and lowering transmittance on glass or glass ceramic and composition therefor
CN116573864B (en) * 2023-07-13 2023-11-07 沧州四星玻璃股份有限公司 Glass tube surface protection layer forming process and device
CN118060114B (en) * 2024-04-19 2024-07-05 中国空气动力研究与发展中心超高速空气动力研究所 Full-automatic spraying device of thermosensitive paint

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54127424A (en) * 1978-03-08 1979-10-03 Gordon Roy Gerald Improved deposition method
JPS62227091A (en) * 1986-03-28 1987-10-06 Nippon Kokan Kk <Nkk> Chemical vapor deposition method in continuous treatment line
JP2014122424A (en) * 2012-12-20 2014-07-03 Samsung Display Co Ltd Vapor deposition apparatus, deposition method using the same, and method of manufacturing organic light-emitting display apparatus
US10944082B2 (en) 2012-12-20 2021-03-09 Samsung Display Co., Ltd. Vapor deposition apparatus
JPWO2016067381A1 (en) * 2014-10-29 2017-04-27 東芝三菱電機産業システム株式会社 Gas injection device
JPWO2016067379A1 (en) * 2014-10-29 2017-04-27 東芝三菱電機産業システム株式会社 Gas injection device for film forming equipment
WO2016067381A1 (en) * 2014-10-29 2016-05-06 東芝三菱電機産業システム株式会社 Gas jetting device
CN107075677A (en) * 2014-10-29 2017-08-18 东芝三菱电机产业系统株式会社 Gas injection apparatus
CN107075676A (en) * 2014-10-29 2017-08-18 东芝三菱电机产业系统株式会社 For the gas injection apparatus of film formation device
CN107075676B (en) * 2014-10-29 2019-08-02 东芝三菱电机产业系统株式会社 For the gas injection apparatus of film formation device
CN107075677B (en) * 2014-10-29 2019-08-02 东芝三菱电机产业系统株式会社 Gas injection device
US10676825B2 (en) 2014-10-29 2020-06-09 Toshiba Mitsubishi-Electric Industrial Systems Corporation Gas jetting apparatus for film formation apparatus
WO2016067379A1 (en) * 2014-10-29 2016-05-06 東芝三菱電機産業システム株式会社 Apparatus for injecting gas into film formation apparatus
US11007497B2 (en) 2014-10-29 2021-05-18 Toshiba Mitsubishi-Electric Industrial Systems Corporation Gas jetting apparatus
US11731154B2 (en) 2017-03-31 2023-08-22 Arkema Inc. Modular hood for coating glass containers including removable dividers for affecting air flow through the hood

Also Published As

Publication number Publication date
FR2210675B1 (en) 1978-05-12
SE409322B (en) 1979-08-13
AU6071373A (en) 1975-03-27
DE2361702A1 (en) 1974-07-04
BE808675A (en) 1974-06-14
IT1000509B (en) 1976-04-10
JPS5827215B2 (en) 1983-06-08
DE2361702B2 (en) 1976-05-13
FR2210675A1 (en) 1974-07-12
NL7314476A (en) 1974-06-18
GB1454379A (en) 1976-11-03

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