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JPS49114888A - - Google Patents

Info

Publication number
JPS49114888A
JPS49114888A JP49017468A JP1746874A JPS49114888A JP S49114888 A JPS49114888 A JP S49114888A JP 49017468 A JP49017468 A JP 49017468A JP 1746874 A JP1746874 A JP 1746874A JP S49114888 A JPS49114888 A JP S49114888A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49017468A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49114888A publication Critical patent/JPS49114888A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photovoltaic Devices (AREA)
JP49017468A 1973-02-13 1974-02-13 Pending JPS49114888A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/331,739 US3949463A (en) 1973-02-13 1973-02-13 Method of applying an anti-reflective coating to a solar cell

Publications (1)

Publication Number Publication Date
JPS49114888A true JPS49114888A (ja) 1974-11-01

Family

ID=23295179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49017468A Pending JPS49114888A (ja) 1973-02-13 1974-02-13

Country Status (10)

Country Link
US (1) US3949463A (ja)
JP (1) JPS49114888A (ja)
BE (1) BE810945A (ja)
CA (1) CA1019053A (ja)
DE (1) DE2406339A1 (ja)
FR (1) FR2217804B1 (ja)
GB (1) GB1452635A (ja)
IT (1) IT1004951B (ja)
NL (1) NL7401987A (ja)
SE (1) SE391608B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884468A (ja) * 1981-11-12 1983-05-20 Mitsubishi Electric Corp 太陽電池の製造方法

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4347264A (en) * 1975-09-18 1982-08-31 Solarex Corporation Method of applying contacts to a silicon wafer and product formed thereby
DE2637616A1 (de) * 1976-08-20 1978-02-23 Siemens Ag Filter fuer fotodetektoren
US4448487A (en) * 1976-09-16 1984-05-15 International Business Machines Corporation Photon energy conversion
US4105471A (en) * 1977-06-08 1978-08-08 Arco Solar, Inc. Solar cell with improved printed contact and method of making the same
US4165241A (en) * 1977-06-08 1979-08-21 Atlantic Richfield Company Solar cell with improved printed contact and method of making the same
US4147564A (en) * 1977-11-18 1979-04-03 Sri International Method of controlled surface texturization of crystalline semiconductor material
JPS5593225A (en) * 1979-01-10 1980-07-15 Hitachi Ltd Forming method of minute pattern
US4246043A (en) * 1979-12-03 1981-01-20 Solarex Corporation Yttrium oxide antireflective coating for solar cells
US4278704A (en) * 1980-01-30 1981-07-14 Rca Corporation Method for forming an electrical contact to a solar cell
US4359487A (en) * 1980-07-11 1982-11-16 Exxon Research And Engineering Co. Method for applying an anti-reflection coating to a solar cell
US4328260A (en) * 1981-01-23 1982-05-04 Solarex Corporation Method for applying antireflective coating on solar cell
FR2499318A1 (fr) * 1981-02-04 1982-08-06 Radiotechnique Compelec Procede de realisation d'une diode optoelectronique au gaalas et diode obtenue par ce procede
DE3131958A1 (de) * 1981-08-13 1983-02-24 Solarex Corp., 14001 Rockville, Md. Verfahren zur bildung eines antireflektionsueberzuges auf der oberflaeche von sonnenenergiezellen.
US5427629A (en) * 1983-07-11 1995-06-27 The United States Of America As Represented By The Secretary Of The Air Force Coverplate for silicon solar cells
DE69636016T2 (de) * 1995-01-23 2006-11-09 National Institute Of Advanced Industrial Science And Technology, Independent Administrative Institution Verharen zur Herstellung einer Lichtempfangsvorrichtung
US6774300B2 (en) * 2001-04-27 2004-08-10 Adrena, Inc. Apparatus and method for photovoltaic energy production based on internal charge emission in a solid-state heterostructure
US6740469B2 (en) * 2002-06-25 2004-05-25 Brewer Science Inc. Developer-soluble metal alkoxide coatings for microelectronic applications
JP2009515369A (ja) * 2005-11-07 2009-04-09 アプライド マテリアルズ インコーポレイテッド 光電池接触部及び配線の形成
DE102006031300A1 (de) * 2006-06-29 2008-01-03 Schmid Technology Systems Gmbh Verfahren zur Dotierung von Siliziummaterial für Solarzellen, entsprechend dotiertes Siliziummaterial und Solarzelle
US8163185B1 (en) * 2008-03-31 2012-04-24 Western Digital (Fremont), Llc Method and apparatus for lifting off photoresist beneath an overlayer
WO2010077622A1 (en) * 2008-12-08 2010-07-08 Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University Electrical devices including dendritic metal electrodes
US20110068423A1 (en) * 2009-09-18 2011-03-24 International Business Machines Corporation Photodetector with wavelength discrimination, and method for forming the same and design structure
US9960312B2 (en) 2010-05-25 2018-05-01 Kurt H. Weiner Apparatus and methods for fast chemical electrodeposition for fabrication of solar cells
US8343327B2 (en) * 2010-05-25 2013-01-01 Reel Solar, Inc. Apparatus and methods for fast chemical electrodeposition for fabrication of solar cells
CN102832261A (zh) * 2011-06-13 2012-12-19 无锡尚德太阳能电力有限公司 包含新型减反射层的薄膜太阳能电池及其制造方法
US8969122B2 (en) 2011-06-14 2015-03-03 International Business Machines Corporation Processes for uniform metal semiconductor alloy formation for front side contact metallization and photovoltaic device formed therefrom
US9577134B2 (en) * 2013-12-09 2017-02-21 Sunpower Corporation Solar cell emitter region fabrication using self-aligned implant and cap
JP6722514B2 (ja) * 2016-05-27 2020-07-15 株式会社アストロスケール 捕獲プレート、宇宙用装置及び捕獲方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3361594A (en) * 1964-01-02 1968-01-02 Globe Union Inc Solar cell and process for making the same
US3533850A (en) * 1965-10-13 1970-10-13 Westinghouse Electric Corp Antireflective coatings for solar cells
US3672987A (en) * 1969-12-23 1972-06-27 Westinghouse Electric Corp Masked photocathode and method of making same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884468A (ja) * 1981-11-12 1983-05-20 Mitsubishi Electric Corp 太陽電池の製造方法

Also Published As

Publication number Publication date
FR2217804B1 (ja) 1978-02-03
CA1019053A (en) 1977-10-11
GB1452635A (en) 1976-10-13
NL7401987A (ja) 1974-08-15
AU6530074A (en) 1975-08-07
SE391608B (sv) 1977-02-21
FR2217804A1 (ja) 1974-09-06
BE810945A (fr) 1974-08-13
US3949463A (en) 1976-04-13
IT1004951B (it) 1976-07-20
DE2406339A1 (de) 1974-08-22

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