JPH11286569A - Resin composition - Google Patents
Resin compositionInfo
- Publication number
- JPH11286569A JPH11286569A JP8909398A JP8909398A JPH11286569A JP H11286569 A JPH11286569 A JP H11286569A JP 8909398 A JP8909398 A JP 8909398A JP 8909398 A JP8909398 A JP 8909398A JP H11286569 A JPH11286569 A JP H11286569A
- Authority
- JP
- Japan
- Prior art keywords
- group
- monomer
- polymer
- meth
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 21
- 239000000178 monomer Substances 0.000 claims abstract description 67
- 229920000642 polymer Polymers 0.000 claims abstract description 38
- 239000000203 mixture Substances 0.000 claims abstract description 21
- 229920003023 plastic Polymers 0.000 claims abstract description 21
- 239000004033 plastic Substances 0.000 claims abstract description 21
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 14
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 10
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 238000010526 radical polymerization reaction Methods 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 20
- 238000005187 foaming Methods 0.000 abstract description 11
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 8
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract description 5
- BRTMLDAYGUXKNK-UHFFFAOYSA-N [3-(benzotriazol-2-yl)-4-hydroxyphenyl]methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 BRTMLDAYGUXKNK-UHFFFAOYSA-N 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- 229930195733 hydrocarbon Natural products 0.000 abstract 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 23
- -1 amine compound Chemical class 0.000 description 22
- 238000000034 method Methods 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 239000000049 pigment Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 8
- 229920000178 Acrylic resin Polymers 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000004383 yellowing Methods 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 5
- 239000004814 polyurethane Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 239000004088 foaming agent Substances 0.000 description 4
- 239000000499 gel Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- VCYCUECVHJJFIQ-UHFFFAOYSA-N 2-[3-(benzotriazol-2-yl)-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 VCYCUECVHJJFIQ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000010097 foam moulding Methods 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- 150000001565 benzotriazoles Chemical class 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 2
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- 125000004825 2,2-dimethylpropylene group Chemical group [H]C([H])([H])C(C([H])([H])[H])(C([H])([H])[*:1])C([H])([H])[*:2] 0.000 description 1
- CHLIEYMSXLYEBR-UHFFFAOYSA-N 2-(2-phosphonooxyphenyl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=CC=C1OP(O)(O)=O CHLIEYMSXLYEBR-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- DKGRYCORPZAPKP-UHFFFAOYSA-N 2-[3-(4-tert-butylbenzotriazol-2-yl)-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound OC1=C(C=C(C=C1)CCOC(C(=C)C)=O)N1N=C2C(=N1)C=CC=C2C(C)(C)C DKGRYCORPZAPKP-UHFFFAOYSA-N 0.000 description 1
- OFLPBAZQIRUWFV-UHFFFAOYSA-N 2-[3-(5-chlorobenzotriazol-2-yl)-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=C(O)C(N2N=C3C=C(Cl)C=CC3=N2)=C1 OFLPBAZQIRUWFV-UHFFFAOYSA-N 0.000 description 1
- UIBLWXYRKDJRSG-UHFFFAOYSA-N 2-[3-(5-cyanobenzotriazol-2-yl)-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=C(O)C(N2N=C3C=C(C=CC3=N2)C#N)=C1 UIBLWXYRKDJRSG-UHFFFAOYSA-N 0.000 description 1
- ABNWZMSOVWRPJN-UHFFFAOYSA-N 2-[3-(benzotriazol-2-yl)-5-tert-butyl-2-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC(C(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O ABNWZMSOVWRPJN-UHFFFAOYSA-N 0.000 description 1
- FVBOXNUYGKJKAI-UHFFFAOYSA-N 2-[3-(benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(C)(C)C1=CC(CCOC(=O)C(=C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O FVBOXNUYGKJKAI-UHFFFAOYSA-N 0.000 description 1
- OYCNXTHAUBNJSK-UHFFFAOYSA-N 2-[3-tert-butyl-5-(4-tert-butylbenzotriazol-2-yl)-4-hydroxyphenoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(C)(C)C1=CC(OCCOC(=O)C(=C)C)=CC(N2N=C3C(=CC=CC3=N2)C(C)(C)C)=C1O OYCNXTHAUBNJSK-UHFFFAOYSA-N 0.000 description 1
- SAOSFCLPXMYGNW-UHFFFAOYSA-N 2-[4-hydroxy-3-(5-methoxybenzotriazol-2-yl)phenyl]ethyl 2-methylprop-2-enoate Chemical compound N1=C2C=C(OC)C=CC2=NN1C1=CC(CCOC(=O)C(C)=C)=CC=C1O SAOSFCLPXMYGNW-UHFFFAOYSA-N 0.000 description 1
- NFNKFDXXDFHBIN-UHFFFAOYSA-N 2-[4-hydroxy-3-(5-nitrobenzotriazol-2-yl)phenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=C(O)C(N2N=C3C=C(C=CC3=N2)[N+]([O-])=O)=C1 NFNKFDXXDFHBIN-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 125000004819 2-methylbutylene group Chemical group [H]C([H])([H])C([H])(C([H])([H])[*:1])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- KARGMXZXPAWXQJ-UHFFFAOYSA-N 3-[3-(benzotriazol-2-yl)-4-hydroxyphenyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 KARGMXZXPAWXQJ-UHFFFAOYSA-N 0.000 description 1
- MEJAPGGFIJZHEJ-UHFFFAOYSA-N 5-acetamido-1,3,4-thiadiazole-2-sulfonyl chloride Chemical class CC(=O)NC1=NN=C(S(Cl)(=O)=O)S1 MEJAPGGFIJZHEJ-UHFFFAOYSA-N 0.000 description 1
- FRTQVKXQJAQXQY-UHFFFAOYSA-N 6-[3-(benzotriazol-2-yl)-4-hydroxyphenyl]hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 FRTQVKXQJAQXQY-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 239000004604 Blowing Agent Substances 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical class CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- AUNAPVYQLLNFOI-UHFFFAOYSA-L [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O Chemical compound [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O AUNAPVYQLLNFOI-UHFFFAOYSA-L 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- VJRITMATACIYAF-UHFFFAOYSA-N benzenesulfonohydrazide Chemical compound NNS(=O)(=O)C1=CC=CC=C1 VJRITMATACIYAF-UHFFFAOYSA-N 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000012674 dispersion polymerization Methods 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- IAJNXBNRYMEYAZ-UHFFFAOYSA-N ethyl 2-cyano-3,3-diphenylprop-2-enoate Chemical compound C=1C=CC=CC=1C(=C(C#N)C(=O)OCC)C1=CC=CC=C1 IAJNXBNRYMEYAZ-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000002649 leather substitute Substances 0.000 description 1
- 239000003562 lightweight material Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000006078 metal deactivator Substances 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- ALIFPGGMJDWMJH-UHFFFAOYSA-N n-phenyldiazenylaniline Chemical compound C=1C=CC=CC=1NN=NC1=CC=CC=C1 ALIFPGGMJDWMJH-UHFFFAOYSA-N 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002832 nitroso derivatives Chemical class 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Landscapes
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、発泡成形したとき
の外観や手触りなどの風合いを維持しつつ耐候性を向上
させる樹脂組成物に関するものである。より詳しくは、
特定の構造を有する紫外線吸収性単量体と不飽和単量体
とを繰り返し単位として含んだ重合体を発泡プラスチッ
ク基材中に添加することによって、発泡後の成形品の外
観や手触りなどの風合いを維持しながら、耐候性を向上
させる樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition which improves the weather resistance while maintaining the appearance and feel when foamed and formed. More specifically,
By adding to the foamed plastic substrate a polymer containing a UV-absorbing monomer having a specific structure and an unsaturated monomer as a repeating unit, the appearance and texture of the molded article after foaming The present invention relates to a resin composition that improves weather resistance while maintaining the following.
【0002】[0002]
【従来の技術】例えば熱可塑性樹脂系塗膜などの耐候性
を向上させる目的で樹脂組成物に低分子量の紫外線吸収
剤を添加することがこれまで一般的に行われてきたが、
当該樹脂組成物から低分子量の紫外線吸収剤がブリード
アウトして所期の目的が十分に発揮できないといった問
題が生じていた。そこで、ブリードアウトを防止するた
めに、紫外線吸収剤として重合性二重結合を有するもの
を用い、これらを単独重合あるいは共重合させて紫外線
吸収剤を高分子化しそのブリードアウトを抑制する手段
が採られていた。たとえば、特開平7−90184号公
報には、重量平均分子量が1000〜45000 の紫外線吸収性
重合体と合成樹脂とを含有する耐光性樹脂組成物、特開
平7−10954号公報には、紫外線吸収性基を側鎖に
有する特定構造のポリウレタン、特開平6−25646
2号公報には、ヒンダードアミン系化合物を分子中に含
むポリウレタンがそれぞれ開示されている。2. Description of the Related Art For the purpose of improving the weather resistance of, for example, a thermoplastic resin-based coating film, it has been common practice to add a low molecular weight ultraviolet absorber to a resin composition.
There has been a problem that the low molecular weight ultraviolet absorber bleeds out of the resin composition and the intended purpose cannot be sufficiently exhibited. Therefore, in order to prevent bleed-out, a means having a polymerizable double bond is used as an ultraviolet absorber, and these are homopolymerized or copolymerized to polymerize the ultraviolet absorber to suppress bleed-out. Had been. For example, JP-A-7-90184 discloses a light-resistant resin composition containing a UV-absorbing polymer having a weight-average molecular weight of 1,000 to 45,000 and a synthetic resin. JP-A-7-10954 discloses an ultraviolet-absorbing resin composition. Polyurethane having a specific structure having a functional group in a side chain, JP-A-6-25646
No. 2 discloses a polyurethane containing a hindered amine compound in a molecule.
【0003】[0003]
【発明が解決しようとする課題】確かに、紫外線吸収性
単量体や紫外線安定性単量体を繰返し単位として含むこ
れら重合体を熱可塑性樹脂組成物に添加することによっ
て、紫外線吸収剤や紫外線安定剤のブリードアウトとい
った問題はある程度解消できる様になってきた。しか
し、発泡成形されるような発泡プラスチック基材の場合
は、かかる重合体によって成形後の成形品の外観や手触
りといった風合いが阻害されるのではないかという懸念
が生じる。Indeed, by adding a polymer containing a UV-absorbing monomer or a UV-stable monomer as a repeating unit to a thermoplastic resin composition, a UV absorber or a UV-absorbing monomer can be obtained. Problems such as bleed-out of stabilizers can be solved to some extent. However, in the case of a foamed plastic substrate which is foam-molded, there is a concern that such a polymer may hinder the appearance and feel of the molded article after molding.
【0004】発泡成形品の耐候性を向上させる技術とし
ては、例えば特公平2−10178号公報では、ハロゲ
ン化炭化水素を発泡剤として使用するポリウレタンフォ
ーム成形品の製造方法においてホウ素など遊離ハロゲン
捕捉物質を加えて耐候性を改善させることが提案されて
いる。しかしこれら化合物は一般的に低分子化合物であ
るため、加工時に揮発したり成形品からブリードアウト
するといった問題がある。As a technique for improving the weather resistance of a foam molded article, for example, Japanese Patent Publication No. 2-10178 discloses a method for producing a polyurethane foam molded article using a halogenated hydrocarbon as a foaming agent. It has been proposed to improve the weather resistance by the addition of a metal. However, since these compounds are generally low molecular compounds, there are problems such as volatilization during processing and bleeding out of molded articles.
【0005】[0005]
【課題を解決するための手段】本発明者らは上記問題を
解決するため、鋭意検討した結果、発泡プラスチック基
材中に特定構造を有する紫外線吸収性単量体と特定の不
飽和単量体とを単量体成分として用いた重合体を添加し
ておけば、発泡成形後の成形品の外観や手触りなどの風
合いを損ねることなく、しかも耐候性が著しく向上する
ことを見い出し、本発明を完成するに至った。すなわち
本発明の樹脂組成物は、発泡プラスチック基材中に、下
記一般式(1)および(2)で表される紫外線吸収性単
量体の少なくとも一方と下記式(3)で表される不飽和
単量体を含む単量体組成物をラジカル重合してなる含む
重合体を含有することを特徴とする。Means for Solving the Problems The inventors of the present invention have conducted intensive studies to solve the above problems, and as a result, have found that an ultraviolet absorbing monomer having a specific structure and a specific unsaturated monomer have a specific structure in a foamed plastic substrate. If a polymer using as a monomer component is added, it is found that the weather resistance is significantly improved without impairing the appearance and feel of the molded article after foam molding, and furthermore, the present invention It was completed. That is, the resin composition of the present invention contains at least one of the UV-absorbing monomers represented by the following general formulas (1) and (2) and a resin represented by the following formula (3) in a foamed plastic substrate. It is characterized by containing a polymer obtained by radical polymerization of a monomer composition containing a saturated monomer.
【0006】[0006]
【化4】 Embedded image
【0007】(式中、R1 は水素原子または炭素数1〜
8の炭化水素基を表し、R2 は低級アルキレン基を表
し、R3 は水素原子またはメチル基を表し、Xは水素原
子、ハロゲン、炭素数1〜8の炭化水素基、低級アルコ
キシ基、シアノ基またはニトロ基を表す。)(Wherein, R 1 is a hydrogen atom or a group having 1 to 1 carbon atoms)
8 represents a hydrocarbon group, R 2 represents a lower alkylene group, R 3 represents a hydrogen atom or a methyl group, X represents a hydrogen atom, a halogen, a hydrocarbon group having 1 to 8 carbon atoms, a lower alkoxy group, a cyano group, Represents a group or a nitro group. )
【0008】[0008]
【化5】 Embedded image
【0009】(式中、R4 は低級アルキレン基を表し、
R5 は水素原子またはメチル基を表す。)Wherein R 4 represents a lower alkylene group;
R 5 represents a hydrogen atom or a methyl group. )
【0010】[0010]
【化6】 Embedded image
【0011】(式中、R6 は水素原子またはメチル基を
表し、Zは炭素数が4以上の炭化水素基を表す。)(In the formula, R 6 represents a hydrogen atom or a methyl group, and Z represents a hydrocarbon group having 4 or more carbon atoms.)
【0012】以下、本発明の内容を詳述する。本発明の
樹脂組成物は、一般式(1)および(2)で表される紫
外線吸収性単量体と、さらに一般式(3)で表される単
量体を含む単量性組成物をラジカル重合してなる重合体
を含有するので、耐候性の点において著しい効果を奏す
る。また作用機構は今のところ十分には解明されていな
いが、当該重合体を発泡プラスチック基材に添加するこ
とにより、発泡成形品の外観や手触りを損なうことなく
優れた耐候性が付与される。もちろん紫外線吸収性単量
体を単量体の一成分として用いた重合体は、紫外線吸収
剤を高分子として取り込んだものであることから、紫外
線吸収剤がブリードアウトすることはない。Hereinafter, the contents of the present invention will be described in detail. The resin composition of the present invention comprises a monomer composition containing an ultraviolet absorbing monomer represented by the general formulas (1) and (2) and a monomer represented by the general formula (3). Since it contains a polymer obtained by radical polymerization, it has a remarkable effect in terms of weather resistance. Although the mechanism of action has not been fully elucidated so far, by adding the polymer to a foamed plastic substrate, excellent weather resistance can be imparted without impairing the appearance and feel of the foamed molded article. Of course, the polymer using the ultraviolet absorbing monomer as one component of the monomer is obtained by incorporating the ultraviolet absorbing agent as a polymer, so that the ultraviolet absorbing agent does not bleed out.
【0013】[0013]
【発明の実施の形態】本発明で使用する発泡プラスチッ
ク基材としては、ポリウレタン、スチロール樹脂、塩化
ビニル樹脂、ポリエチレン、酢酸繊維素、ポリビニルア
ルコール、フェノール樹脂、ユリア樹脂、エポキシ樹
脂、ケイ素樹脂、ポリプロピレン、ポリエステル、アク
リル樹脂、尿素樹脂、ポリアミド、エチレン−酢酸ビニ
ル共重合体、ブタジエン−アクリロニトリル共重合体、
ブタジエン−アクリロニトリル−スチレン共重合体など
を言い、発泡剤などを用いて発泡させる場合には、それ
ら発泡剤を含めて本発明では発泡プラスチック基材と言
う。DESCRIPTION OF THE PREFERRED EMBODIMENTS Foamed plastic substrates used in the present invention include polyurethane, styrene resin, vinyl chloride resin, polyethylene, cellulose acetate, polyvinyl alcohol, phenolic resin, urea resin, epoxy resin, silicon resin, and polypropylene. , Polyester, acrylic resin, urea resin, polyamide, ethylene-vinyl acetate copolymer, butadiene-acrylonitrile copolymer,
The term "butadiene-acrylonitrile-styrene copolymer" refers to a foamed plastic substrate in the present invention when foaming is carried out using a foaming agent or the like.
【0014】発泡剤としては、炭酸アンモニウム、重炭
酸ソーダなどの無機化合物;2,2' −アゾイソブチロ
ニトリル、アゾヘキサヒドロベンゾニトリル、アゾジカ
ルボン酸アミド、ジアゾアミノベンゼンなどのアゾ化合
物;ベンゼンスルホヒドラジド、ベンゼン−1,3−ジ
スルホヒドラジド、ジフェニルスルホン−3,3' −ジ
スルホヒドラジドなどのスルホヒドラジド化合物;N,
N' −ジニトロソペンタメチレンテトラミン、N,N'
−ジニトロソ−N,N' −ジメチルテレフタルアミドな
どのニトロソ化合物;テレフタルアジド、パラ−ter
t−ブチルベンズアジドなどのアジド化合物などが挙げ
られる。Examples of the blowing agent include inorganic compounds such as ammonium carbonate and sodium bicarbonate; azo compounds such as 2,2'-azoisobutyronitrile, azohexahydrobenzonitrile, azodicarboxylic amide, and diazoaminobenzene; benzenesulfohydrazide N, Sulfohydrazide compounds such as benzene-1,3-disulfohydrazide, diphenylsulfone-3,3′-disulfohydrazide;
N'-dinitrosopentamethylenetetramine, N, N '
Nitroso compounds such as -dinitroso-N, N'-dimethylterephthalamide; terephthalazide, para-ter;
Azide compounds such as t-butylbenzazide and the like can be mentioned.
【0015】本発明における前記一般式(1)で表され
る紫外線吸収性単量体は、式中、R 1 は水素原子または
炭素数1〜8の炭化水素基で構成され、R2 は低級アル
キレン基で構成され、R3 は水素原子またはメチル基で
構成され、Xは水素原子、ハロゲン、炭素数1〜8の炭
化水素基、低級アルコキシ基、シアノ基またはニトロ基
で構成されるベンゾトリアゾール類である。In the present invention, the compound is represented by the general formula (1).
The ultraviolet absorbing monomer represented by the formula: 1 Is a hydrogen atom or
A hydrocarbon group having 1 to 8 carbon atoms;Two Is lower al
Composed of a kylene group;Three Is a hydrogen atom or a methyl group
X is a hydrogen atom, a halogen, a carbon having 1 to 8 carbons.
Hydride group, lower alkoxy group, cyano group or nitro group
And benzotriazoles.
【0016】上記式中、R1 で表される置換基として
は、例えば水素原子、メチル基、エチル基、プロピル
基、イソプロピル基、ブチル基、イソブチル基、ter
t−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、
オクチル基などの鎖式炭化水素基;シクロプロピル基、
シクロペンチル基、シクロヘキシル基、シクロヘプチル
基、シクロオクチル基などの脂環式炭化水素基;フェニ
ル基、トリル基、キシリル基、ベンジル基、フェネチル
基などの芳香族炭化水素基であり、R2 で表される置換
基は、具体的には炭素数1〜6のアルキレン基であっ
て、メチレン基、エチレン基、プロピレン基、ブチレン
基、ペンチレン基、ヘキシレン基などの直鎖状アルキレ
ン基及び2−メチルプロピレン基、2,2−ジメチルプ
ロピレン基、2−メチルブチレン基、2,2−ジメチル
ブチレン基、2,3−ジメチルブチレン基などの分枝鎖
状アルキレン基であり、Xで表される置換基は、水素;
フッソ、塩素、シュウ素、ヨウ素などのハロゲン;メチ
ル基、エチル基、プロピル基、イソプロピル基、ブチル
基、イソブチル基、tert−ブチル基、ペンチル基、
ヘキシル基、ヘプチル基、オクチル基などの鎖式炭化水
素基:シクロプロピル基、シクロペンチル基、シクロヘ
キシル基、シクロヘプチル基、シクロオクチル基などの
脂環式炭化水素基:フェニル基、トリル基、キシリル
基、ベンジル基、フェネチル基などの芳香族炭化水素
基;メトキシ基、エトキシ基、プロポキシ基、ブトキシ
基、ペントキシ基、ヘプトキシ基など炭素数1〜6の低
級アルコキシ基;シアノ基;ニトロ基である。In the above formula, examples of the substituent represented by R 1 include a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group,
t-butyl group, pentyl group, hexyl group, heptyl group,
A chain hydrocarbon group such as an octyl group; a cyclopropyl group,
A cyclopentyl group, a cyclohexyl group, a cycloheptyl group, an alicyclic hydrocarbon group such as cyclooctyl group; a phenyl group, a tolyl group, a xylyl group, a benzyl group, an aromatic hydrocarbon group such as a phenethyl group, Table by R 2 The substituent is specifically an alkylene group having 1 to 6 carbon atoms, such as a linear alkylene group such as a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group and a hexylene group, and 2-methyl. A branched alkylene group such as a propylene group, a 2,2-dimethylpropylene group, a 2-methylbutylene group, a 2,2-dimethylbutylene group, a 2,3-dimethylbutylene group, and a substituent represented by X Is hydrogen;
Halogens such as fluorine, chlorine, oxine and iodine; methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl,
Chain hydrocarbon groups such as hexyl group, heptyl group and octyl group: alicyclic hydrocarbon groups such as cyclopropyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group: phenyl group, tolyl group, xylyl group Benzyl, phenethyl and the like; aromatic hydrocarbon groups such as methoxy, ethoxy, propoxy, butoxy, butoxy, pentoxy, heptoxy and the like; lower alkoxy groups having 1 to 6 carbon atoms; cyano groups; nitro groups.
【0017】前記一般式(1)で表される紫外線吸収性
単量体としては、例えば2−[2'−ヒドロキシ−5'
−(メタクリロイルオキシメチル)フェニル]−2H−
ベンゾトリアゾール、2−[2' −ヒドロキシ−5' −
(メタクリロイルオキシエチル)フェニル]−2H−ベ
ンゾトリアゾール、2−[2' −ヒドロキシ−5' −
(メタクリロイルオキシプロピル)フェニル]−2H−
ベンゾトリアゾール、2−[2' −ヒドロキシ−5' −
(メタクリロイルオキシヘキシル)フェニル]−2H−
ベンゾトリアゾール、2−[2' −ヒドロキシ−3' −
tert−ブチル−5' −(メタクリロイルオキシエチ
ル)フェニル]−2H−ベンゾトリアゾール、2−
[2' −ヒドロキシ−5' −tert−ブチル−3' −
(メタクリロイルオキシエチル)フェニル]−2H−ベ
ンゾトリアゾール、2−[2' −ヒドロキシ−5' −
(メタクリロイルオキシエチル)フェニル]−5−クロ
ロ−2H−ベンゾトリアゾール、2−[2' −ヒドロキ
シ−5' −(メタクリロイルオキシエチル)フェニル]
−5−メトキシ−2H−ベンゾトリアゾール、2−
[2' −ヒドロキシ−5' −(メタクリロイルオキシエ
チル)フェニル]−5−シアノ−2H−ベンゾトリアゾ
ール、2−[2' −ヒドロキシ−5' −(メタクリロイ
ルオキシエチル)フェニル]−tert−ブチル−2H
−ベンゾトリアゾール、2−[2' −ヒドロキシ−5'
−(メタクリロイルオキシエチル)フェニル]−5−ニ
トロ−2H−ベンゾトリアゾールなどが挙げられるが、
特にこれらに限定されるものではない。一般式(1)で
表されるこれら紫外線吸収性単量体は一種類のみを用い
てもよく、また二種類以上を適宜混合して用いてもよ
い。Examples of the ultraviolet absorbing monomer represented by the general formula (1) include 2- [2'-hydroxy-5 '
-(Methacryloyloxymethyl) phenyl] -2H-
Benzotriazole, 2- [2'-hydroxy-5'-
(Methacryloyloxyethyl) phenyl] -2H-benzotriazole, 2- [2'-hydroxy-5'-
(Methacryloyloxypropyl) phenyl] -2H-
Benzotriazole, 2- [2'-hydroxy-5'-
(Methacryloyloxyhexyl) phenyl] -2H-
Benzotriazole, 2- [2'-hydroxy-3'-
tert-butyl-5 ′-(methacryloyloxyethyl) phenyl] -2H-benzotriazole, 2-
[2′-hydroxy-5′-tert-butyl-3′-
(Methacryloyloxyethyl) phenyl] -2H-benzotriazole, 2- [2'-hydroxy-5'-
(Methacryloyloxyethyl) phenyl] -5-chloro-2H-benzotriazole, 2- [2′-hydroxy-5 ′-(methacryloyloxyethyl) phenyl]
-5-methoxy-2H-benzotriazole, 2-
[2′-Hydroxy-5 ′-(methacryloyloxyethyl) phenyl] -5-cyano-2H-benzotriazole, 2- [2′-hydroxy-5 ′-(methacryloyloxyethyl) phenyl] -tert-butyl-2H
-Benzotriazole, 2- [2'-hydroxy-5 '
-(Methacryloyloxyethyl) phenyl] -5-nitro-2H-benzotriazole and the like,
It is not particularly limited to these. One kind of these ultraviolet absorbing monomers represented by the general formula (1) may be used alone, or two or more kinds thereof may be appropriately mixed and used.
【0018】また前記一般式(2)で表される紫外線吸
収性単量体は、式中、R4 で表される置換基は低級アル
キレン基で構成され、R5 で表される水素原子またはメ
チル基で構成されるベンゾトリアゾール類である。In the ultraviolet absorbing monomer represented by the general formula (2), a substituent represented by R 4 is a lower alkylene group, and a hydrogen atom represented by R 5 or Benzotriazoles composed of a methyl group.
【0019】上記式中、R4 で表される置換基は、具体
的には炭素数2または3のアルキレン基であって、エチ
レン基、トリメチレン基、プロピレン基などを挙げるこ
とができる。In the above formula, the substituent represented by R 4 is specifically an alkylene group having 2 or 3 carbon atoms, such as an ethylene group, a trimethylene group and a propylene group.
【0020】前記一般式(2)で表される紫外線吸収性
単量体としては、例えば、2−〔2' ヒドロキシ−5'
−(β−メタクリロイルオキシエトキシ)−3' −te
rt−ブチルフェニル〕−4−tert−ブチル−2H
−ベンゾトリアゾールが挙げられるが、特にこれに限定
されるものではない。一般式(2)で表されるこれら紫
外線吸収性単量体は一種類のみを用いてもよく、また二
種類以上を適宜混合してもよい。The UV-absorbing monomer represented by the general formula (2) includes, for example, 2- [2'hydroxy-5 '
-(Β-methacryloyloxyethoxy) -3′-te
rt-butylphenyl] -4-tert-butyl-2H
-Benzotriazole, but is not particularly limited thereto. Only one kind of these ultraviolet absorbing monomers represented by the general formula (2) may be used, or two or more kinds may be appropriately mixed.
【0021】本発明に係る一般式(3)に表される不飽
和単量体は、式中、R6 で示される置換基が水素原子ま
たはメチル基で構成され、Zで示される置換基が炭素数
4以上の炭化水素基で構成される不飽和単量体である。In the unsaturated monomer represented by the general formula (3) according to the present invention, the substituent represented by R 6 is a hydrogen atom or a methyl group, and the substituent represented by Z is It is an unsaturated monomer composed of a hydrocarbon group having 4 or more carbon atoms.
【0022】上記式中、Zで表される置換基はシクロヘ
キシル基、メチルシクロヘキシル基、シクロドデシル基
などの炭素数4以上の脂環式炭化水素基;ブチル基、イ
ソブチル基、tert−ブチル基、2−エチルヘキシル
基、ヘプチル基、オクチル基、ノニル基、デシル基、ウ
ンデシル基、ドデシル基、ペンタデシル基、オクタデシ
ル基など炭素数4以上の直鎖または分枝鎖のアルキル
基;ボルニル基、イソボルニル基、の炭素数4以上の多
環式炭化水素基である。In the above formula, the substituent represented by Z is an alicyclic hydrocarbon group having 4 or more carbon atoms such as a cyclohexyl group, a methylcyclohexyl group, a cyclododecyl group; a butyl group, an isobutyl group, a tert-butyl group; 2-ethylhexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, pentadecyl group, octadecyl group or other linear or branched alkyl group having 4 or more carbon atoms; bornyl group, isobornyl group, Is a polycyclic hydrocarbon group having 4 or more carbon atoms.
【0023】本発明に係る一般式(3)に表される不飽
和単量体として好ましくは、例えばシクロヘキシル(メ
タ)アクリレート、メチルシクロヘキシル(メタ)アク
リレート、シクロドデシル(メタ)アクリレート、te
rt−ブチルシクロヘキシル(メタ)アクリレート、イ
ソブチル(メタ)アクリレート、tert−ブチル(メ
タ)アクリレート、ラウリル(メタ)アクリレート、イ
ソボルニル(メタ)アクリレート、ステアリル(メタ)
アクリレート、2−エチルヘキシル(メタ)アクリレー
トなどが挙げられ、これらの一種または二種以上が使用
できる。The unsaturated monomer represented by the general formula (3) according to the present invention is preferably, for example, cyclohexyl (meth) acrylate, methylcyclohexyl (meth) acrylate, cyclododecyl (meth) acrylate, te
rt-butylcyclohexyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, lauryl (meth) acrylate, isobornyl (meth) acrylate, stearyl (meth)
Acrylate, 2-ethylhexyl (meth) acrylate and the like can be mentioned, and one or more of these can be used.
【0024】また上記単量体以外のその他の共重合可能
な不飽和単量体は、紫外線吸収性単量体及び特定の不飽
和単量体を単量体成分として用いた重合体に要求される
各種物性を損なわないものであれば使用できる。具体的
には、(メタ)アクリル酸、クロトン酸、イタコン酸、
マレイン酸、無水マレイン酸などのカルボキシル基含有
不飽和単量体;2−(メタ)アクリロイルオキシエチル
アシッドホスフェート、2−(メタ)アクリロイルオキ
シプロピルアシッドホスフェート、2−(メタ)アクリ
ロイルオキシ−3−クロロプロピルアシッドホスフェー
ト、2−メタクリロイルオキシエチルフェニルリン酸な
どの酸性リン酸エステル系不飽和単量体;ヒドロキシエ
チル(メタ)アクリレート、ヒドロキシプロピル(メ
タ)アクリレート、カプロラクトン変性ヒドロキシ(メ
タ)アクリレート(例えば、ダイセル化学工業株式会社
製;商品名「プラクセルFM」、フタル酸とプロピレン
グリコールとから得られるポリエステルジオールのモノ
(メタ)アクリレートなどの水酸基含有単量体;メチル
(メタ)アクリレート、エチル(メタ)アクリレート、
プロピル(メタ)アクリレート、イソプロピル(メタ)
アクリレートなどの、(メタ)アクリル酸低級アルキル
エステル;グリシジル(メタ)アクリレートなどのエポ
キシ基含有不飽和単量体;(メタ)アクリルアミド、
N,N' −ジメチルアミノチル(メタ)アクリレート、
ビニルピリジン、ビニルイミダゾールなどの含窒素不飽
和単量体;塩化ビニル、塩化ビニリデンなどのハロゲン
含有不飽和単量体;スチレン、α−メチルスチレン、ビ
ニルトルエンなどの芳香族不飽和単量体;酢酸ビニルな
どのビニルエステル;ビニルエーテルなどが挙げられる
が、特にこれらに限定されるものではない。その他単量
体は必要に応じて一種類のみを用いてもよく、また二種
以上を用いてもよい。Further, other copolymerizable unsaturated monomers other than the above-mentioned monomers are required for a polymer using a UV-absorbing monomer and a specific unsaturated monomer as a monomer component. Any material that does not impair various physical properties can be used. Specifically, (meth) acrylic acid, crotonic acid, itaconic acid,
Carboxyl group-containing unsaturated monomers such as maleic acid and maleic anhydride; 2- (meth) acryloyloxyethyl acid phosphate, 2- (meth) acryloyloxypropyl acid phosphate, 2- (meth) acryloyloxy-3-chloro Acidic phosphate unsaturated monomers such as propyl acid phosphate and 2-methacryloyloxyethylphenylphosphoric acid; hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, caprolactone-modified hydroxy (meth) acrylate (for example, Daicel Manufactured by Chemical Industry Co., Ltd .; trade name "Placcel FM"; hydroxyl-containing monomers such as mono (meth) acrylate of polyester diol obtained from phthalic acid and propylene glycol; methyl (meth) acrylate , Ethyl (meth) acrylate,
Propyl (meth) acrylate, isopropyl (meth)
(Meth) acrylic acid lower alkyl esters such as acrylates; epoxy group-containing unsaturated monomers such as glycidyl (meth) acrylate; (meth) acrylamide;
N, N'-dimethylaminotyl (meth) acrylate;
Nitrogen-containing unsaturated monomers such as vinylpyridine and vinylimidazole; halogen-containing unsaturated monomers such as vinyl chloride and vinylidene chloride; aromatic unsaturated monomers such as styrene, α-methylstyrene and vinyltoluene; acetic acid Vinyl esters such as vinyl; vinyl ether; and the like, but are not particularly limited thereto. As the other monomer, only one kind may be used as needed, or two or more kinds may be used.
【0025】各種単量体の使用量は、特に限定されるも
のではないが、一般式(1)、(2)で表される紫外線
吸収性単量体の合計使用量は、樹脂組成物の固形分に対
して0.1〜20wt%とすることが望まれる。より好
ましい範囲について述べると、下限側として好ましくは
0.5wt%、さらに好ましくは1wt%である。他方
上限側として好ましくは15wt%、さらに好ましくは
10wt%である。紫外線吸収性単量体の合計使用量が
0.1wt%よりも少ない場合は、発泡生成物の耐候性
が不十分となり、20wt%よりも多い場合は、発泡成
形品の外観や肌触りなどの風合いを阻害するおそれがあ
る。また、単量体組成物に対しては0.5〜90wt%
とすることが望まれる。より好ましい範囲について述べ
ると、下限側として好ましくは3wt%、さらに好まし
くは5wt%である。他方上限側として好ましくは85
wt%、さらに好ましくは80wt%である。紫外線吸
収性単量体の合計含有量が0.5wt%よりも少ない場
合は、発泡成形品の耐候性が不十分となり、90wt%
よりも多い場合は、未反応単量体の発生とそれら未反応
単量体の溶出が生ずるおそれがある。The amounts of the various monomers used are not particularly limited, but the total amount of the UV-absorbing monomers represented by the general formulas (1) and (2) depends on the amount of the resin composition. It is desired that the content be 0.1 to 20% by weight based on the solid content. Describing a more preferable range, the lower limit is preferably 0.5 wt%, more preferably 1 wt%. On the other hand, the upper limit is preferably 15% by weight, more preferably 10% by weight. If the total amount of the UV-absorbing monomer is less than 0.1 wt%, the weather resistance of the foamed product becomes insufficient, and if it is more than 20 wt%, the appearance and feel of the foamed molded product are felt. May be hindered. Moreover, 0.5 to 90 wt% with respect to the monomer composition.
It is desired that Describing a more preferable range, the lower limit is preferably 3 wt%, more preferably 5 wt%. On the other hand, the upper limit is preferably 85
wt%, more preferably 80 wt%. If the total content of the UV-absorbing monomer is less than 0.5 wt%, the weather resistance of the foam molded article becomes insufficient, and 90 wt%.
If the amount is larger than the above range, unreacted monomers may be generated and the unreacted monomers may be eluted.
【0026】一般式(3)で表される不飽和単量体の使
用量は、樹脂組成物の固形分に対して0.5〜50wt
%とすることが望まれる。より好ましい範囲について述
べると、下限側として好ましくは1wt%、さらに好ま
しくは3wt%である。他方上限側として好ましくは4
0wt%、さらに好ましくは30wt%である。また単
量体組成物に対しては5〜99wt%とすることが望ま
れる。より好ましい範囲について述べると、下限側とし
て好ましくは10wt%、さらに好ましくは15wt%
である。他方上限側として好ましくは95wt%、さら
に好ましくは90wt%である。5wt%よりも少ない
と、発泡性形後の成形品の外観や肌触りなどの風合いが
不十分となり、他方99wt%よりも多いと、発泡成形
品の耐候性が不十分となるおそれがあるからである。The amount of the unsaturated monomer represented by the general formula (3) is 0.5 to 50 wt% based on the solid content of the resin composition.
% Is desired. Describing a more preferable range, the lower limit is preferably 1 wt%, more preferably 3 wt%. On the other hand, the upper limit is preferably 4
0 wt%, more preferably 30 wt%. It is desired that the content be 5 to 99% by weight based on the monomer composition. To describe a more preferable range, the lower limit is preferably 10 wt%, more preferably 15 wt%.
It is. On the other hand, the upper limit is preferably 95% by weight, more preferably 90% by weight. If the amount is less than 5 wt%, the appearance and feel of the molded product after foaming will be insufficient, and if it is more than 99 wt%, the weather resistance of the foamed product may be insufficient. is there.
【0027】上記単量体の混合方法は、特に限定される
ものではなく、従来公知の混合方法が採用され得る。The method of mixing the monomers is not particularly limited, and a conventionally known mixing method can be employed.
【0028】また単量体組成物を共重合させる際の重合
方法は、特に限定されるものではなく、従来公知の重合
方法が採用され得る。例えば、溶液重合、分散重合、懸
濁重合、乳化重合などの重合方法が使用できる。溶液重
合法を用いて単量体組成物を重合させる場合に用いるこ
とができる溶媒としては、トルエン、キシレン、その他
高沸点の芳香族系溶媒;酢酸ブチル、酢酸エチル、セロ
ソルブアセテートなどのエステル系溶媒;アセトン、メ
チルエチルケトン、メチルイソブチルケトンなどのケト
ン系溶媒;ジメチルホルミアミドなどが挙げられる。も
ちろん使用し得る溶媒がこれら溶媒に限定されるもので
はない。これら溶媒は一種のみを使用してもよいし、二
種以上を混合して使用してもよい。なお、溶媒の使用量
は生成物の濃度などを考慮し適宜定めればよい。The polymerization method for copolymerizing the monomer composition is not particularly limited, and a conventionally known polymerization method can be employed. For example, polymerization methods such as solution polymerization, dispersion polymerization, suspension polymerization, and emulsion polymerization can be used. Solvents that can be used when polymerizing the monomer composition using the solution polymerization method include toluene, xylene, and other high-boiling aromatic solvents; butyl acetate, ethyl acetate, and ester solvents such as cellosolve acetate. Ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone; and dimethylformamide. Of course, the solvents that can be used are not limited to these solvents. These solvents may be used alone or in combination of two or more. The amount of the solvent used may be appropriately determined in consideration of the concentration of the product and the like.
【0029】また単量体組成物を共重合させる際には重
合開始剤を用いる。重合開始剤としては、たとえば2,
2' −アゾビス−(2−メチルブチロニトリル)、te
rt−ブチルパーオキシ−2−エチルヘキサノエート、
2,2' −アゾビスイソブチロニトリル、ベンゾイルパ
ーオキサイド、ジ−tert−ブチルパーオキサイドな
どの通常のラジカル重合開始剤が挙げられる。重合開始
剤の使用量は、要求される重合体の特性値などから適宜
決定されるべきものであり、特に限定はない。When copolymerizing the monomer composition, a polymerization initiator is used. As the polymerization initiator, for example, 2,
2'-azobis- (2-methylbutyronitrile), te
rt-butylperoxy-2-ethylhexanoate,
Examples include ordinary radical polymerization initiators such as 2,2'-azobisisobutyronitrile, benzoyl peroxide, and di-tert-butyl peroxide. The amount of the polymerization initiator to be used should be appropriately determined from the required characteristic values of the polymer and the like, and is not particularly limited.
【0030】反応温度は、特に限定されるものではない
が、室温〜200℃の範囲が好ましく、40〜140℃
がより好ましい。なお反応時間は、用いる単量体組成物
の組成や重合開始剤の種類などに応じて、重合反応が完
結するように適宜設定すればよい。The reaction temperature is not particularly limited, but is preferably in the range of room temperature to 200 ° C, and is preferably 40 to 140 ° C.
Is more preferred. The reaction time may be appropriately set according to the composition of the monomer composition to be used, the type of the polymerization initiator, and the like so that the polymerization reaction is completed.
【0031】生成された重合体は、溶液状態のまま発泡
プラスチック基材中に混合してもよいし、乾燥された粉
末状体で発泡プラスチック基材中に混合してもよいが、
発泡前に混合させることが望ましい。The produced polymer may be mixed with the foamed plastic substrate in a solution state, or may be mixed with the foamed plastic substrate as a dried powder.
It is desirable to mix before foaming.
【0032】発泡プラスチック基材中への当該重合体の
添加は、樹脂組成物の固形分に対して0.1〜50wt
%となるように行うのがよい。より好ましい範囲につい
て述べると、下限側として好ましくは1wt%、さらに
好ましくは3wt%である。他方上限側として好ましく
は45wt%、さらに好ましくは30wt%である。
0.1wt%よりも少ないと、発泡成形品の耐候性が不
十分となり、50wt%よりも多いと、発泡成形品の風
合いや力学特性の低下を招くおそれがあるからである。The addition of the polymer to the foamed plastic substrate is 0.1 to 50 wt.% Based on the solid content of the resin composition.
%. Describing a more preferable range, the lower limit is preferably 1 wt%, more preferably 3 wt%. On the other hand, the upper limit is preferably 45 wt%, more preferably 30 wt%.
If the amount is less than 0.1 wt%, the weather resistance of the foam molded article becomes insufficient, and if it is more than 50 wt%, the texture and mechanical properties of the foam molded article may be reduced.
【0033】また発泡剤の分解温度を制御するために、
無機塩や金属石けん、有機及び無機酸類などの発泡促進
剤、有機酸やハロゲン化有機酸、有機酸の無水物、多価
アルコール、窒素化合物、イオウ化合物、リン酸塩、ス
ズ化合物などの発泡抑制剤が必要により、発泡プラスチ
ック基材中に添加することができる。In order to control the decomposition temperature of the foaming agent,
Foaming accelerators such as inorganic salts, metallic soaps, organic and inorganic acids, organic acids, halogenated organic acids, anhydrides of organic acids, polyhydric alcohols, nitrogen compounds, sulfur compounds, phosphates, tin compounds, etc. If necessary, an agent can be added to the foamed plastic substrate.
【0034】樹脂組成物を発泡させる方法としては、気
体混入法や発泡剤分解法、溶剤気散法、化学反応法など
が適用できる。As a method for foaming the resin composition, a gas mixing method, a foaming agent decomposition method, a solvent diffusion method, a chemical reaction method and the like can be applied.
【0035】発泡成形としては、ブロック成形、板状成
形、金型成形などいずれの成形も可能であり、これらに
は通常の射出、押出、圧縮、真空成形などの適用が可能
である。As foam molding, any molding such as block molding, plate molding, and die molding is possible, and ordinary injection, extrusion, compression, vacuum molding and the like can be applied to these.
【0036】本発明の樹脂組成物を用いた発泡プラスチ
ックは、合成皮革や自動車内装用シート、農業用シー
ト、クッション材、断熱材、吸音材、軽量材、包装材な
ど従来の発泡プラスチックが用いられてきたあらゆる用
途に好適に使用できる。特に耐候性が格段に向上したこ
とから屋外で使用する材料に好適に使用できる。As the foamed plastic using the resin composition of the present invention, conventional foamed plastics such as synthetic leather, automobile interior sheets, agricultural sheets, cushioning materials, heat insulating materials, sound absorbing materials, lightweight materials, and packaging materials are used. It can be suitably used for all kinds of applications. Particularly, since the weather resistance is remarkably improved, it can be suitably used for a material used outdoors.
【0037】本発明の樹脂組成物は、使用に際し種々の
添加剤を含んでもよい。添加剤としては、例えば、塗料
などの被膜形成用組成物に一般に使用されるレベリング
剤;黄鉛、モリブデートオレンジ、紺青、カドミウム系
顔料、チタン白、複合酸化物顔料、透明酸化鉄、カーボ
ンブラック、環式高級顔料、溶性アゾ顔料、銅フタロシ
アニン顔料、染付顔料、顔料中間体などの顔料;顔料分
散剤;抗酸化剤;粘性改質剤;金属不活性化剤;過酸化
物分解剤;充填剤;補強剤;可塑剤;潤滑剤;防食剤;
防錆剤;蛍光性増白剤;有機・無機防炎剤;滴下防止
剤;溶融流改質剤;静電防止剤などが挙げられる。The resin composition of the present invention may contain various additives when used. As an additive, for example, a leveling agent generally used in a film forming composition such as a paint; graphite, molybdate orange, navy blue, cadmium-based pigment, titanium white, composite oxide pigment, transparent iron oxide, carbon black Pigments such as cyclic high-grade pigments, soluble azo pigments, copper phthalocyanine pigments, dyed pigments, pigment intermediates; pigment dispersants; antioxidants; viscosity modifiers; metal deactivators; Filler; reinforcing agent; plasticizer; lubricant; anticorrosive;
Rust inhibitors; fluorescent brighteners; organic and inorganic flame retardants; anti-dripping agents; melt flow modifiers;
【0038】[0038]
【実施例】以下、実施例および比較例によって本発明を
さらに詳細に説明するが、本発明はこれらにより何ら限
定されるものではない。なお特に断りのない限り、実施
例および比較例に記載された「部」は重量部を、「%」
は「重量%」を示すものとする。The present invention will be described in more detail with reference to the following Examples and Comparative Examples, but the present invention is not limited thereto. Unless otherwise specified, "parts" described in Examples and Comparative Examples are parts by weight and "%"
Represents "% by weight".
【0039】(樹脂組成物の合成) 合成例1 攪拌機、滴下口、温度計、冷却管および窒素ガス導入口
を備えた0.5リットルのフラスコにジメチルホルムア
ミド30部、2−[2' −ヒドロキシ−5' −(メタク
リロイルオキシエチル)フェニル]−2H−ベンゾトリ
アゾール40部を仕込み、滴下槽には2−[2' −ヒド
ロキシ−5' −(メタクリロイルオキシエチル)フェニ
ル]−2H−ベンゾトリアゾール10部、シクロヘキシ
ルメタクリレート50部、開始剤としてのtert−ブ
チルパーオキシ−2−エチルヘキサノエート8部を仕込
む。滴下槽中の混合物の40wt%をまずフラスコに加
え、窒素ガスを導入し、攪拌しながら徐々に昇温して1
20℃まで加熱した。昇温後、滴下槽の残りの混合物を
2時間かけて滴下する。滴下後さらに2時間加熱し、ア
クリル樹脂の50%溶液を得た。このアクリル樹脂の数
平均分子量は2,900であった。このアクリル樹脂を
重合体1とする。(Synthesis of Resin Composition) Synthesis Example 1 30 parts of dimethylformamide, 2- [2'-hydroxy] was placed in a 0.5-liter flask equipped with a stirrer, a dropping port, a thermometer, a cooling pipe, and a nitrogen gas inlet. -5 '-(methacryloyloxyethyl) phenyl] -2H-benzotriazole (40 parts) and 10 parts of 2- [2'-hydroxy-5'-(methacryloyloxyethyl) phenyl] -2H-benzotriazole in the dropping tank. , 50 parts of cyclohexyl methacrylate, and 8 parts of tert-butylperoxy-2-ethylhexanoate as an initiator. First, 40 wt% of the mixture in the dropping tank was added to the flask, and nitrogen gas was introduced.
Heated to 20 ° C. After the temperature rise, the remaining mixture in the dropping tank is dropped over 2 hours. After the dropwise addition, the mixture was further heated for 2 hours to obtain a 50% solution of an acrylic resin. The number average molecular weight of this acrylic resin was 2,900. This acrylic resin is referred to as polymer 1.
【0040】合成例2〜10 表1、2に示す配合比で、合成例1と同様の方法で目的
の重合体2〜10を得た。Synthesis Examples 2 to 10 At the compounding ratios shown in Tables 1 and 2, the desired polymers 2 to 10 were obtained in the same manner as in Synthesis Example 1.
【0041】[0041]
【表1】 [Table 1]
【0042】[0042]
【表2】 [Table 2]
【0043】UVA1:2−[ 2' −ヒドロキシ−5'
−(メタクリロイルオキシエチル)フェニル] −2H−
ベンゾトリアゾール UVA2:2−[ 2' −ヒドロキシ−5' −(β−メタ
クリロイルオキシエトキシ)−3' −tert−ブチル
フェニル] −4−tert−ブチル−2H−ベンゾトリ
アゾール CHMA:シクロヘキシルメタクリレート i−BMA:イソブチルメタクリレート 2EHA:2−エチルヘキシルアクリレート t−BMA:tert−ブチルメタクリレート LMA:ラウリルメタクリレート St:スチレン DMF:ジメチルホルムアミド 開始剤1:tert−ブチルパーオキシ−2−エチルヘ
キサノエート 開始剤2:2,2' −アゾビス(2−メチルブチロニト
リル)UVA1: 2- [2'-hydroxy-5 '
-(Methacryloyloxyethyl) phenyl] -2H-
Benzotriazole UVA2: 2- [2′-hydroxy-5 ′-(β-methacryloyloxyethoxy) -3′-tert-butylphenyl] -4-tert-butyl-2H-benzotriazole CHMA: cyclohexyl methacrylate i-BMA: Isobutyl methacrylate 2EHA: 2-ethylhexyl acrylate t-BMA: tert-butyl methacrylate LMA: lauryl methacrylate St: styrene DMF: dimethylformamide Initiator 1: tert-butylperoxy-2-ethylhexanoate Initiator 2: 2,2 '-Azobis (2-methylbutyronitrile)
【0044】実施例1 溶剤としてのジメチルホルムアミド中に、発泡プラスチ
ック基材としてのポリウレタン(東洋ポリマー社製「ハ
イラック1061」)が固形分として30wt%含まれ
る溶液100部に対し、重合体1が50wt%含まれる
溶液8部とジメチルホルムアミド40部とを加え、回転
式撹拌機で500rpm×30min撹拌する。脱泡
後、ガラス板に塗工する。つぎに50℃の温水中に6h
r浸漬させる。このとき溶剤が非溶剤(この場合は水)
で置換されるため重合体組成物はゲル化する。当該ゲル
化物をガラス板から取り外し、多量の水で洗浄する。そ
の後、90℃×30minで乾燥させ、厚さ5mmの高
分子多孔質体を得る。Example 1 Polymer 1 was added to 100 parts of a solution containing 30% by weight of polyurethane (“Hilac 1061” manufactured by Toyo Polymer Co., Ltd.) as a foamed plastic substrate in dimethylformamide as a solvent. 8 parts of a solution containing 50 wt% and 40 parts of dimethylformamide are added, and the mixture is stirred with a rotary stirrer at 500 rpm × 30 minutes. After defoaming, apply to glass plate. Then put in warm water of 50 ° C for 6h
d. At this time, the solvent is non-solvent (in this case, water)
, The polymer composition gels. The gel is removed from the glass plate and washed with a large amount of water. Thereafter, drying is performed at 90 ° C. for 30 minutes to obtain a porous polymer body having a thickness of 5 mm.
【0045】得られた高分子多孔質体の風合いを目視に
て下記のように評価した。また促進耐候性試験機として
のサンシャインウェザーメーターで120hr試験し、
黄変度(「△b」と記す。)を測定した。結果を表3に
示す。The texture of the obtained porous polymer was visually evaluated as follows. The test was conducted for 120 hours with a sunshine weather meter as an accelerated weather resistance tester.
The degree of yellowing (referred to as “Δb”) was measured. Table 3 shows the results.
【0046】実施例2〜15 表3および表4に示す各種材料と配合量で、実施例1と
同様の方法で高分子多孔質体を得、実施例と同様の方法
で風合い及び黄変度を測定した。結果を表3,4に示
す。Examples 2 to 15 Polymer porous bodies were obtained in the same manner as in Example 1 using the various materials and the amounts shown in Tables 3 and 4, and the texture and yellowing degree were determined in the same manner as in the Examples. Was measured. The results are shown in Tables 3 and 4.
【0047】比較例1 溶剤としてのジメチルホルムアミド中に、発泡プラスチ
ック基材としてのポリウレタン(東洋ポリマー社製「ハ
イラック1061」)が固形分として30wt%含まれ
る溶液100部に対し、ジメチルホルムアミド40部と
高分子量紫外線吸収剤(旭電化工業社製「アデカスタブ
LA−31」)1部とを加え、回転式撹拌機で500r
pm×30min撹拌する。脱泡後、ガラス板に塗工す
る。つぎに50℃の温水中に6hr浸漬させる。このと
き溶剤が非溶剤(この場合は水)で置換されるため重合
体組成物はゲル化する。当該ゲル化物をガラス板から取
り外し、多量の水で洗浄する。その後、90℃×30m
inで乾燥させ、厚さ5mmの高分子多孔質体を得る。COMPARATIVE EXAMPLE 1 40 parts of dimethylformamide was added to 100 parts of a solution containing 30 wt% of polyurethane (“Hilac 1061” manufactured by Toyo Polymer Co., Ltd.) as a foamed plastic substrate in dimethylformamide as a solvent. And 1 part of a high molecular weight ultraviolet absorber (“ADK STAB LA-31” manufactured by Asahi Denka Kogyo Co., Ltd.), and the mixture was stirred at 500 r with a rotary stirrer.
Stir at pm × 30 min. After defoaming, apply to glass plate. Next, it is immersed in 50 ° C. warm water for 6 hours. At this time, since the solvent is replaced with a non-solvent (in this case, water), the polymer composition gels. The gel is removed from the glass plate and washed with a large amount of water. After that, 90 ° C x 30m
Drying is carried out in order to obtain a polymer porous body having a thickness of 5 mm.
【0048】得られた高分子多孔質体の風合いを目視に
て下記のように評価した。また促進耐候性試験機として
のサンシャインウェザーメーターで120hr試験し、
黄変度(「△b」と記す。)を測定した。結果を表5に
示す。The texture of the obtained porous polymer body was visually evaluated as follows. The test was conducted for 120 hours with a sunshine weather meter as an accelerated weather resistance tester.
The degree of yellowing (referred to as “Δb”) was measured. Table 5 shows the results.
【0049】比較例2〜4 表5に示す各種材料と配合量で、比較例1と同様の方法
で高分子多孔質体を得、比較例と同様の方法で風合い及
び黄変度を測定した。結果を表5に示す。Comparative Examples 2 to 4 Using the various materials and amounts shown in Table 5, a polymer porous body was obtained in the same manner as in Comparative Example 1, and the hand and yellowing degree were measured in the same manner as in Comparative Example. . Table 5 shows the results.
【0050】[0050]
【表3】 [Table 3]
【0051】[0051]
【表4】 [Table 4]
【0052】ポリウレタン樹脂:東洋ポリマー社製「ハ
イラック1061」(固形分30wt% ) アクリル樹脂:ダイセル化学工業社製「セビアン−M」 酢酸セルロース:ダイセル化学工業社製「ダイセル酢酸
綿L−AC」(固形分25wt% )Polyurethane resin: "Hilac 1061" manufactured by Toyo Polymer Co., Ltd. (solid content: 30 wt%) Acrylic resin: "Sebian-M" manufactured by Daicel Chemical Industries, Ltd. Cellulose acetate: "Daicel Cotton L-AC" manufactured by Daicel Chemical Industries, Ltd. (Solid content 25wt%)
【0053】[0053]
【表5】 [Table 5]
【0054】ポリウレタン樹脂:東洋ポリマー社製「ハ
イラック1061」(固形分30wt% ) アクリル樹脂:ダイセル化学工業社製「セビアン−M」 高分子紫外線吸収剤1:旭電化工業社製「アデカスタブ
LA−31」(数平均分子量:659) 高分子紫外線安定剤1:旭電化工業社製「アデカスタブ
LA−52」(数平均分子量:847) 高分子紫外線吸収剤2:大塚化学社製「PUVA−30
M」(数平均分子量:約10000)Polyurethane resin: “Hi-Rack 1061” manufactured by Toyo Polymer Co., Ltd. (solid content: 30 wt%) Acrylic resin: “Sebian-M” manufactured by Daicel Chemical Industries, Ltd. Polymer ultraviolet absorber 1: “Adekastab LA-” manufactured by Asahi Denka Kogyo KK 31 "(number average molecular weight: 659) Polymer UV stabilizer 1:" ADEKA STAB LA-52 "manufactured by Asahi Denka Kogyo Co., Ltd. (number average molecular weight: 847) Polymer UV absorber 2:" PUVA-30 "manufactured by Otsuka Chemical Co., Ltd.
M "(number average molecular weight: about 10,000)
【0055】表3〜5から明らかなように、発泡プラス
チック基材中に、特定構造の紫外線吸収性単量体と特定
の不飽和単量体とを単量体成分として用いた重合体が含
有されている本発明の樹脂組成物を使用すると、発泡処
理後の風合いは全く損なわれることがなく、しかも促進
耐候性試験120時間後であっても黄変度はいずれの実
施例の場合も4未満と、比較例1〜3に比べはるかに優
れた耐候性を示している。一方、比較例4は黄変度が
5.5と良好な結果を示している。これは、添加した高
分子紫外線吸収剤2の数平均分子量が約10,000で
あるために、発泡過程で発泡成形品から当該吸収剤が溶
出しにくかったためと考えられる。しかし当該紫外線吸
収剤と発泡プラスチック基材との相溶性が悪いことによ
って発泡後の風合いが損なわれている。As is apparent from Tables 3 to 5, the foamed plastic base material contains a polymer using a UV-absorbing monomer having a specific structure and a specific unsaturated monomer as monomer components. When the resin composition of the present invention is used, the texture after the foaming treatment is not impaired at all, and the yellowing degree is 4 in each of the examples even after 120 hours of the accelerated weathering test. And less than that of Comparative Examples 1 to 3, indicating much better weather resistance. On the other hand, Comparative Example 4 has a good yellowing degree of 5.5, which is a good result. It is considered that this is because the number average molecular weight of the added polymeric ultraviolet absorber 2 was about 10,000, and it was difficult for the absorbent to elute from the foamed molded article during the foaming process. However, the texture after foaming is impaired due to poor compatibility between the ultraviolet absorber and the foamed plastic substrate.
【0056】[0056]
【発明の効果】発泡プラスチック基材中に特定構造を有
する紫外線吸収性単量体と特定の不飽和単量体と含む単
量体組成物をラジカル重合してなる重合体を添加した本
発明の樹脂組成物によれば、発泡成形後の成形品の外観
や手触りを損ねることなく、しかも耐候性が著しく向上
する。According to the present invention, a polymer obtained by radical polymerization of a monomer composition containing an ultraviolet absorbing monomer having a specific structure and a specific unsaturated monomer in a foamed plastic substrate is added. According to the resin composition, the weather resistance is remarkably improved without impairing the appearance and feel of the molded article after foam molding.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C08F 220:36) (C08L 101/00 33:06) ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI C08F 220: 36) (C08L 101/00 33:06)
Claims (1)
(1)および(2)で表される紫外線吸収性単量体の少
なくとも一方と下記一般式(3)で表される不飽和単量
体を含む単量体組成物をラジカル重合してなる重合体が
含有されることを特徴とする樹脂組成物。 【化1】 (式中、R1 は水素原子または炭素数1〜8の炭化水素
基を表し、R2 は低級アルキレン基を表し、R3 は水素
原子またはメチル基を表し、Xは水素原子、ハロゲン、
炭素数1〜8の炭化水素基、低級アルコキシ基、シアノ
基またはニトロ基を表す。) 【化2】 (式中、R4 は低級アルキレン基を表し、R5 は水素原
子またはメチル基を表す。) 【化3】 (式中、R6 は水素原子またはメチル基を表し、Zは炭
素数が4以上の炭化水素基を表す。)1. A foamed plastic substrate comprising at least one of an ultraviolet absorbing monomer represented by the following general formulas (1) and (2) and an unsaturated monomer represented by the following general formula (3): A resin composition comprising a polymer obtained by radical polymerization of a monomer composition containing a polymer. Embedded image (Wherein, R 1 represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a lower alkylene group, R 3 represents a hydrogen atom or a methyl group, X represents a hydrogen atom, a halogen,
Represents a hydrocarbon group having 1 to 8 carbon atoms, a lower alkoxy group, a cyano group or a nitro group. ) (In the formula, R 4 represents a lower alkylene group, and R 5 represents a hydrogen atom or a methyl group.) (In the formula, R 6 represents a hydrogen atom or a methyl group, and Z represents a hydrocarbon group having 4 or more carbon atoms.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8909398A JPH11286569A (en) | 1998-04-01 | 1998-04-01 | Resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8909398A JPH11286569A (en) | 1998-04-01 | 1998-04-01 | Resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11286569A true JPH11286569A (en) | 1999-10-19 |
Family
ID=13961277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP8909398A Withdrawn JPH11286569A (en) | 1998-04-01 | 1998-04-01 | Resin composition |
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Country | Link |
---|---|
JP (1) | JPH11286569A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002514662A (en) * | 1998-05-11 | 2002-05-21 | ファーマシア アンド ウプヨーン グロニンゲン ベスローテン フェンノートシャップ | Polymerizable hydrophilic UV absorbing monomer |
WO2007046425A1 (en) * | 2005-10-19 | 2007-04-26 | Fujifilm Corporation | Fine particle-containing composition, ink for forming colored film for display, light-blocking film for display, light-blocking material, substrate with light-blocking film, color filter, liquid crystal display element and liquid crystal display |
-
1998
- 1998-04-01 JP JP8909398A patent/JPH11286569A/en not_active Withdrawn
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002514662A (en) * | 1998-05-11 | 2002-05-21 | ファーマシア アンド ウプヨーン グロニンゲン ベスローテン フェンノートシャップ | Polymerizable hydrophilic UV absorbing monomer |
WO2007046425A1 (en) * | 2005-10-19 | 2007-04-26 | Fujifilm Corporation | Fine particle-containing composition, ink for forming colored film for display, light-blocking film for display, light-blocking material, substrate with light-blocking film, color filter, liquid crystal display element and liquid crystal display |
KR101217033B1 (en) | 2005-10-19 | 2012-12-31 | 후지필름 가부시키가이샤 | A particulate-containing composition, a color film forming ink for a display device, a light shielding film for a display device, a light shielding material, a substrate on which a light shielding film is formed, a color filter, a liquid crystal display device, and a liquid crystal display device |
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