JPH11246726A - Fluoropolymer composition and method for obtaining thin film - Google Patents
Fluoropolymer composition and method for obtaining thin filmInfo
- Publication number
- JPH11246726A JPH11246726A JP10345792A JP34579298A JPH11246726A JP H11246726 A JPH11246726 A JP H11246726A JP 10345792 A JP10345792 A JP 10345792A JP 34579298 A JP34579298 A JP 34579298A JP H11246726 A JPH11246726 A JP H11246726A
- Authority
- JP
- Japan
- Prior art keywords
- fluorinated
- fluorine
- polymer
- thin film
- ring structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は主鎖に含フッ素環構
造を有しかつ非晶質である含フッ素重合体を特定の含フ
ッ素溶媒に溶解してなる含フッ素重合体組成物に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluorine-containing polymer composition obtained by dissolving an amorphous fluorine-containing polymer having a fluorine-containing ring structure in the main chain thereof in a specific fluorine-containing solvent.
【0002】[0002]
【従来の技術】ポリテトラフルオロエチレン、テトラフ
ルオロエチレン/パーフルオロ(アルキルビニルエーテ
ル)共重合体、テトラフルオロエチレン/ヘキサフルオ
ロプロピレン共重合体に代表されるパーフルオロ重合体
は一般に耐熱性、耐薬品性が高く、屈折率や誘電率が小
さいという優れた特徴がある。しかし、これらの含フッ
素重合体は一般に溶媒に不溶である。2. Description of the Related Art Perfluoropolymers represented by polytetrafluoroethylene, tetrafluoroethylene / perfluoro (alkyl vinyl ether) copolymer and tetrafluoroethylene / hexafluoropropylene copolymer generally have heat resistance and chemical resistance. And a small refractive index and a small dielectric constant. However, these fluoropolymers are generally insoluble in solvents.
【0003】WO96/22356には非晶質のテトラ
フルオロエチレン共重合体をC5 F11OCH3 、C5 F
11OC2 H5 、C8 F17OCH3 などの溶媒に溶解また
は分散させてコーティング組成物とすることが記載され
ている。しかし、非晶質のテトラフルオロエチレン共重
合体をこれらの溶媒に溶解させた例が一切なく、非晶質
のテトラフルオロエチレン共重合体がこれらの溶媒に溶
解するかどうか不明である。WO 96/22356 discloses amorphous tetrafluoroethylene copolymers such as C 5 F 11 OCH 3 and C 5 F
It describes dissolving or dispersing in a solvent such as 11 OC 2 H 5 and C 8 F 17 OCH 3 to obtain a coating composition. However, there is no example in which an amorphous tetrafluoroethylene copolymer is dissolved in these solvents, and it is unclear whether the amorphous tetrafluoroethylene copolymer is dissolved in these solvents.
【0004】これに対して、特公平8−22929など
に見られる、主鎖に含フッ素脂肪族環構造を有する含フ
ッ素重合体は、その環構造の立体的な効果により重合体
の結晶化が阻害されるため非晶質である。この含フッ素
重合体はパーフルオロ重合体であっても、特定のパーフ
ルオロ溶媒、たとえばパーフルオロ(2−ブチルテトラ
ヒドロフラン)に溶解するため、この含フッ素重合体の
パーフルオロ溶媒溶液からピンホールのない含フッ素重
合体の薄膜を形成できるなどの利点がある。On the other hand, a fluorine-containing polymer having a fluorinated aliphatic ring structure in the main chain, which is found in Japanese Patent Publication No. 22229/1996, has a problem that the polymer is crystallized due to the steric effect of the ring structure. It is amorphous because it is inhibited. Even if the fluorinated polymer is a perfluoropolymer, it is dissolved in a specific perfluorosolvent, for example, perfluoro (2-butyltetrahydrofuran), so that there is no pinhole from the perfluorosolvent solution of the fluorinated polymer. There are advantages such as the ability to form a fluoropolymer thin film.
【0005】[0005]
【発明が解決しようとする課題】近年、地球環境保護意
識が高まり、特にオゾン層保護の観点から特定のフルオ
ロクロロカーボンの使用が禁止され、さらには地球温暖
化の観点から炭酸ガスやパーフルオロカーボン類の使用
および排出制限が望まれつつある。In recent years, awareness of global environmental protection has increased, and in particular, the use of specific fluorochlorocarbons has been banned from the viewpoint of protection of the ozone layer, and further, from the viewpoint of global warming, carbon dioxide and perfluorocarbons have been banned. There is a growing need for use and emission limits.
【0006】特にパーフルオロカーボン類などのパーフ
ルオロ化合物は、その強い赤外線吸収能と、大気中での
著しく長い寿命から、地球温暖化への寄与率がきわめて
高いといわれている。一例を挙げるとパーフルオロヘキ
サンの大気中での寿命の推算値は数百年〜数千年といわ
れている。このようなパーフルオロ化合物は長期にわた
り赤外線を吸収し、大地からの放射熱を蓄積するため、
地球温暖化への影響は大きいと考えられる。[0006] In particular, perfluoro compounds such as perfluorocarbons are said to have a very high contribution to global warming due to their strong infrared absorbing ability and extremely long life in the atmosphere. For example, the estimated lifetime of perfluorohexane in the atmosphere is said to be hundreds to thousands of years. Such perfluoro compounds absorb infrared rays for a long time and accumulate radiant heat from the earth,
The impact on global warming is considered to be significant.
【0007】本発明は、このような事情のもとで、地球
温暖化への寄与率が低い溶媒に「主鎖に含フッ素環構造
を有しかつ非晶質である含フッ素重合体」(以下、含フ
ッ素環構造含有重合体と略す)を溶解してなる含フッ素
重合体組成物を提供することを目的とする。Under such circumstances, the present invention relates to a solvent having a low contribution to global warming: a fluorine-containing polymer having a fluorine-containing ring structure in its main chain and being amorphous. Hereinafter, it is intended to provide a fluorinated polymer composition obtained by dissolving a fluorinated ring structure-containing polymer).
【0008】[0008]
【課題を解決するための手段】本発明は、含フッ素環構
造含有重合体を、一般式R1 −O−R2 (R1 はエーテ
ル結合を有してもよい炭素数5〜12の直鎖状または分
岐状のポリフルオロアルキル基であり、R2 は炭素数1
〜5の直鎖状または分岐状のアルキル基である。)で表
される含フッ素溶媒に溶解してなる含フッ素重合体組成
物である。According to the present invention, a polymer having a fluorinated ring structure is prepared by reacting a polymer having a general formula R 1 —O—R 2 (R 1 is a straight chain having 5 to 12 carbon atoms which may have an ether bond). A chain or branched polyfluoroalkyl group, wherein R 2 has 1 carbon atom;
To 5 linear or branched alkyl groups. This is a fluorinated polymer composition dissolved in a fluorinated solvent represented by the formula (1).
【0009】本発明における含フッ素溶媒は、一般式R
1 −O−R2 (R1 はエーテル結合を有してもよい炭素
数5〜12の直鎖状または分岐状のポリフルオロアルキ
ル基であり、R2 は炭素数1〜5の直鎖状または分岐状
のアルキル基である。)で表される含フッ素溶媒であ
る。The fluorinated solvent of the present invention has a general formula R
1 -OR 2 (R 1 is a linear or branched polyfluoroalkyl group having 5 to 12 carbon atoms which may have an ether bond, and R 2 is a linear Or a branched alkyl group).
【0010】R1 の炭素数が4以下であると含フッ素環
構造含有重合体を溶解し難く、R1の炭素数が13以上
の場合は工業的に入手困難であるため、R1 の炭素数は
5〜12の範囲から選定される。R1 の炭素数は、6〜
10が好ましく、6〜7および9〜10がより好まし
い。[0010] The number of carbon atoms of R 1 is hardly dissolved is the fluorinated cyclic structure-containing polymer with 4 or less, the number of carbon atoms of R 1 is the case of 13 or more is industrially hard to obtain, the R 1 carbon The number is selected from the range of 5-12. The carbon number of R 1 is 6 to
10 is preferred, and 6-7 and 9-10 are more preferred.
【0011】ポリフルオロアルキル基とは、アルキル基
の水素原子の2個以上がフッ素原子に置換された基であ
り、アルキル基の水素原子のすべてがフッ素原子に置換
されたパーフルオロアルキル基、およびアルキル基の水
素原子の2個以上がフッ素原子に置換されかつアルキル
基の水素原子の1個以上がフッ素原子以外のハロゲン原
子に置換された基を含むものである。フッ素原子以外の
ハロゲン原子としては塩素原子が好ましい。A polyfluoroalkyl group is a group in which two or more hydrogen atoms of an alkyl group are substituted with fluorine atoms, a perfluoroalkyl group in which all hydrogen atoms of the alkyl group are substituted with fluorine atoms, and It includes a group in which two or more hydrogen atoms of an alkyl group are substituted with a fluorine atom and one or more hydrogen atoms of an alkyl group are substituted with a halogen atom other than a fluorine atom. As a halogen atom other than a fluorine atom, a chlorine atom is preferable.
【0012】ポリフルオロアルキル基としては、対応す
るアルキル基の水素原子の数にして60%以上がフッ素
原子に置換された基が好ましく、より好ましくは80%
以上である。さらに好ましいポリフルオロアルキル基は
パーフルオロアルキル基である。The polyfluoroalkyl group is preferably a group in which 60% or more of the hydrogen atoms of the corresponding alkyl group have been substituted with fluorine atoms, more preferably 80%.
That is all. More preferred polyfluoroalkyl groups are perfluoroalkyl groups.
【0013】R1 がエーテル結合を有する場合、エーテ
ル結合の数が多すぎると溶解性を阻害するため、R1 中
のエーテル結合は1〜3個が好ましく、1〜2個がより
好ましい。R2 の炭素数が6以上であると含フッ素環構
造含有重合体の溶解性を著しく阻害する。R2 の好まし
い例はメチル基またはエチル基である。When R 1 has an ether bond, if the number of ether bonds is too large, solubility will be impaired. Therefore, the number of ether bonds in R 1 is preferably 1 to 3, more preferably 1 or 2. When the carbon number of R 2 is 6 or more, the solubility of the polymer having a fluorinated ring structure is significantly inhibited. Preferred examples of R 2 are a methyl group and an ethyl group.
【0014】含フッ素溶媒の分子量は、大きすぎると含
フッ素重合体組成物の粘度を上昇させるだけでなく、含
フッ素環構造含有重合体の溶解性も低下するため、10
00以下が好ましい。また、含フッ素環構造含有重合体
の溶解性を高めるために含フッ素溶媒のフッ素含有量は
60〜80重量%が好ましい。好ましい含フッ素溶媒と
して、下記のものが例示できる。If the molecular weight of the fluorinated solvent is too large, not only will the viscosity of the fluorinated polymer composition increase, but also the solubility of the fluorinated ring structure-containing polymer will decrease.
00 or less is preferable. The fluorine content of the fluorinated solvent is preferably from 60 to 80% by weight in order to enhance the solubility of the fluorinated ring structure-containing polymer. Preferred examples of the fluorinated solvent include the following.
【0015】[0015]
【化1】F(CF2 )5 OCH3 、F(CF2 )6 OC
H3 、F(CF2 )7 OCH3 、F(CF2 )8 OCH
3 、F(CF2 )9 OCH3 、F(CF2 )10OCH
3 、H(CF2 )6 OCH3 、(CF3 )2 CF(OC
H3 )CFCF2 CF3 、F(CF2 )3 OCF(CF
3 )CF2 OCH3 、F(CF2 )3 OCF(CF3 )
CF2 OCF(CF3 )CF2 OCH3 、F(CF2 )
8 OCH2 CH2 CH3 、(CF3 )2 CFCF2 CF
2 OCH3 、F(CF2 )2 O(CF2 )4 OCH2 C
H3 。## STR1 ## F (CF 2 ) 5 OCH 3 , F (CF 2 ) 6 OC
H 3 , F (CF 2 ) 7 OCH 3 , F (CF 2 ) 8 OCH
3 , F (CF 2 ) 9 OCH 3 , F (CF 2 ) 10 OCH
3 , H (CF 2 ) 6 OCH 3 , (CF 3 ) 2 CF (OC
H 3 ) CFCF 2 CF 3 , F (CF 2 ) 3 OCF (CF
3 ) CF 2 OCH 3 , F (CF 2 ) 3 OCF (CF 3 )
CF 2 OCF (CF 3 ) CF 2 OCH 3 , F (CF 2 )
8 OCH 2 CH 2 CH 3 , (CF 3 ) 2 CFCF 2 CF
2 OCH 3 , F (CF 2 ) 2 O (CF 2 ) 4 OCH 2 C
H 3.
【0016】本発明における含フッ素溶媒の大気中での
推定寿命の一例を挙げると、F(CF2 )5 OCH3 お
よびF(CF2 )5 OCH2 CH3 の場合で約1〜5年
である。本発明における含フッ素溶媒としては、F(C
F2 )6 OCH3 、F(CF2 )7 OCH3 、F(CF
2 )8 OCH3 、F(CF2 )9 OCH3 およびF(C
F2 )10OCH3 が好ましく、F(CF2 )6 OCH
3 、F(CF2 )7 OCH3 、F(CF2 )9 OCH3
およびF(CF2 )10OCH3 が特に好ましい。An example of the estimated life of the fluorine-containing solvent in the air in the present invention is about 1 to 5 years for F (CF 2 ) 5 OCH 3 and F (CF 2 ) 5 OCH 2 CH 3. is there. As the fluorinated solvent in the present invention, F (C
F 2 ) 6 OCH 3 , F (CF 2 ) 7 OCH 3 , F (CF
2 ) 8 OCH 3 , F (CF 2 ) 9 OCH 3 and F (C
F 2 ) 10 OCH 3 is preferred, and F (CF 2 ) 6 OCH
3 , F (CF 2 ) 7 OCH 3 , F (CF 2 ) 9 OCH 3
And F (CF 2 ) 10 OCH 3 are particularly preferred.
【0017】本発明における含フッ素溶媒としては、前
述の一般式R1 −O−R2 で表される含フッ素溶媒を1
種単独で用いてもよく、適宜2種以上を併用してもよ
い。また、前述の一般式R1 −O−R2 で表される含フ
ッ素溶媒と他の溶媒との混合溶媒であってもよい。この
場合の他の溶媒としては単独では含フッ素環構造含有重
合体を溶解しえない溶媒も使用できる。As the fluorinated solvent in the present invention, the fluorinated solvent represented by the aforementioned general formula R 1 —O—R 2 is used.
Species may be used alone or in combination of two or more. Further, it may be a mixed solvent of the fluorinated solvent represented by the above general formula R 1 -O-R 2 and another solvent. In this case, as the other solvent, a solvent that alone cannot dissolve the polymer having a fluorinated ring structure can be used.
【0018】他の溶媒として、たとえばF(CF2 )4
OCH3 、F(CF2 )4 OC2 H5 などの本発明にお
ける含フッ素溶媒以外の含フッ素エーテル類、ヘキサン
などの炭化水素類、クロロホルムなどのヒドロクロロカ
ーボン類、ジクロロペンタフルオロプロパンなどのヒド
ロクロロフルオロカーボン類、メタキシレンヘキサフル
オリド、ベンゾトリフルオリドなどの含フッ素芳香族炭
化水素類、メタノール、エタノール、(パーフルオロヘ
キシル)エタノール、ペンタフルオロプロパノールなど
のアルコール類が併用できる。これら他の溶媒の混合割
合は含フッ素環構造含有重合体の濃度によって適宜選定
されるが、含フッ素溶媒100重量部に対して0.1〜
50重量部が好ましく、1〜30重量部がより好まし
い。As other solvents, for example, F (CF 2 ) 4
In the present invention, fluorinated ethers other than the fluorinated solvent such as OCH 3 and F (CF 2 ) 4 OC 2 H 5 , hydrocarbons such as hexane, hydrochlorocarbons such as chloroform, and hydrochlorocarbons such as dichloropentafluoropropane. Fluorine-containing aromatic hydrocarbons such as chlorofluorocarbons, meta-xylene hexafluoride and benzotrifluoride, and alcohols such as methanol, ethanol, (perfluorohexyl) ethanol and pentafluoropropanol can be used in combination. The mixing ratio of these other solvents is appropriately selected depending on the concentration of the fluorinated ring structure-containing polymer.
It is preferably 50 parts by weight, more preferably 1 to 30 parts by weight.
【0019】本発明における含フッ素環構造含有重合体
としては、含フッ素脂肪族環構造(含フッ素イミド環構
造などを含む)、含フッ素トリアジン環構造または含フ
ッ素芳香族環構造を主鎖に有する含フッ素重合体が例示
されるが、なかでも含フッ素脂肪族環構造を主鎖に有す
る含フッ素重合体が好ましく、そのうち含フッ素脂肪族
エーテル環構造を主鎖に有するものがさらに好ましい。The polymer having a fluorine-containing ring structure in the present invention has a fluorine-containing aliphatic ring structure (including a fluorine-containing imide ring structure), a fluorine-containing triazine ring structure or a fluorine-containing aromatic ring structure in the main chain. Although a fluorinated polymer is exemplified, a fluorinated polymer having a fluorinated aliphatic ring structure in the main chain is preferable, and a fluorinated polymer having a fluorinated aliphatic ether ring structure in the main chain is more preferable.
【0020】「主鎖に含フッ素環構造を有する」とは、
環を構成する炭素原子の1個以上が主鎖を構成する炭素
連鎖中の炭素原子であり、かつ環を構成する炭素原子の
少なくとも一部にフッ素原子またはフッ素含有基が結合
している構造を有することを意味する。"Having a fluorine-containing ring structure in the main chain"
A structure in which at least one carbon atom constituting a ring is a carbon atom in a carbon chain constituting a main chain, and a fluorine atom or a fluorine-containing group is bonded to at least a part of the carbon atoms constituting the ring. Means to have.
【0021】主鎖に含フッ素脂肪族環構造を有する含フ
ッ素重合体としては、含フッ素環構造を有する単量体を
重合して得られるものや、2個以上の重合性二重結合を
有する含フッ素単量体を環化重合して得られる、主鎖に
含フッ素脂肪族環構造を有する重合体が好適である。Examples of the fluoropolymer having a fluorinated aliphatic ring structure in the main chain include those obtained by polymerizing a monomer having a fluorinated ring structure and those having two or more polymerizable double bonds. A polymer obtained by cyclopolymerizing a fluorine-containing monomer and having a fluorine-containing aliphatic ring structure in the main chain is preferable.
【0022】含フッ素環構造を有する単量体を重合して
得られる、主鎖に含フッ素脂肪族環構造を有する重合体
は、特公昭63−18964などにより知られている。
すなわち、パーフルオロ(2,2−ジメチル−1,3−
ジオキソール)などの含フッ素環構造を有する単量体を
単独重合することにより、またはこのような単量体をテ
トラフルオロエチレン、クロロトリフルオロエチレン、
パーフルオロ(メチルビニルエーテル)などの含フッ素
環構造を有しないラジカル重合性単量体と共重合するこ
とにより、主鎖に含フッ素脂肪族環構造を有する重合体
が得られる。A polymer having a fluorinated aliphatic ring structure in the main chain obtained by polymerizing a monomer having a fluorinated ring structure is known from JP-B-63-18964.
That is, perfluoro (2,2-dimethyl-1,3-
Dioxole) by homopolymerizing a monomer having a fluorinated ring structure such as tetrafluoroethylene, chlorotrifluoroethylene,
By copolymerizing with a radical polymerizable monomer having no fluorinated ring structure such as perfluoro (methyl vinyl ether), a polymer having a fluorinated aliphatic ring structure in the main chain can be obtained.
【0023】また、2個以上の重合性二重結合を有する
含フッ素単量体を環化重合して得られる、主鎖に含フッ
素脂肪族環構造を有する重合体は、特開昭63−238
111や特開昭63−238115などにより知られて
いる。すなわち、パーフルオロ(アリルビニルエーテ
ル)やパーフルオロ(ブテニルビニルエーテル)などの
2個以上の重合性二重結合を有し環化重合し得る含フッ
素単量体を環化重合することにより、またはこのような
単量体をテトラフルオロエチレン、クロロトリフルオロ
エチレン、パーフルオロ(メチルビニルエーテル)など
の環化重合しないラジカル重合性単量体と共重合するこ
とにより、主鎖に含フッ素脂肪族環構造を有する重合体
が得られる。A polymer having a fluorinated aliphatic ring structure in the main chain obtained by cyclopolymerization of a fluorinated monomer having two or more polymerizable double bonds is disclosed in 238
111 and JP-A-63-238115. That is, by subjecting a fluorinated monomer having two or more polymerizable double bonds, such as perfluoro (allyl vinyl ether) or perfluoro (butenyl vinyl ether), capable of undergoing cyclopolymerization to cyclopolymerization, or Such a monomer is copolymerized with a radically polymerizable monomer such as tetrafluoroethylene, chlorotrifluoroethylene, or perfluoro (methyl vinyl ether) that does not undergo cyclization polymerization to form a fluorinated aliphatic ring structure in the main chain. Is obtained.
【0024】また、パーフルオロ(2,2−ジメチル−
1,3−ジオキソール)などの含フッ素環構造を有する
単量体とパーフルオロ(アリルビニルエーテル)やパー
フルオロ(ブテニルビニルエーテル)などの2個以上の
重合性二重結合を有し環化重合し得る含フッ素単量体と
を共重合することによっても、主鎖に含フッ素脂肪族環
構造を有する重合体が得られる。In addition, perfluoro (2,2-dimethyl-
A monomer having a fluorinated ring structure such as 1,3-dioxole) and two or more polymerizable double bonds such as perfluoro (allyl vinyl ether) and perfluoro (butenyl vinyl ether) are subjected to cyclopolymerization. By copolymerizing the obtained fluorine-containing monomer, a polymer having a fluorine-containing aliphatic ring structure in the main chain can be obtained.
【0025】主鎖に含フッ素脂肪族環構造を有する重合
体は、この重合体の全重合単位に対して主鎖に含フッ素
脂肪族環構造を有する重合単位を20モル%以上、好ま
しくは40モル%以上含有するものが、透明性や機械的
特性などの面から好ましい。In the polymer having a fluorinated aliphatic ring structure in the main chain, polymerized units having a fluorinated aliphatic ring structure in the main chain are at least 20 mol%, preferably 40 mol%, based on all polymerized units of the polymer. Those containing at least mol% are preferred in terms of transparency and mechanical properties.
【0026】上記の主鎖に含フッ素脂肪族環構造を有す
る重合体としては、具体的には下記一般式(1)〜
(4)から選ばれる繰り返し単位を有するものが好まし
い。これらの主鎖に含フッ素脂肪族環構造を有する重合
体中のフッ素原子は、一部が塩素原子で置換されていて
もよい。Specific examples of the polymer having a fluorinated aliphatic ring structure in the main chain include the following general formulas (1) to (1).
Those having a repeating unit selected from (4) are preferred. A fluorine atom in the polymer having a fluorinated aliphatic ring structure in the main chain may be partially substituted with a chlorine atom.
【0027】[0027]
【化2】 Embedded image
【0028】[一般式(1)〜(4)において、hは0
〜5の整数、iは0〜4の整数、jは0または1、h+
i+jは1〜6の整数、sは0〜5の整数、tは0〜4
の整数、uは0または1、s+t+uは1〜6の整数、
p、q、rはそれぞれ独立に0〜5の整数、p+q+r
は1〜6の整数、R3 〜R8 はそれぞれ独立にフッ素原
子、塩素原子、重水素原子またはトリフルオロメチル基
である。][In the general formulas (1) to (4), h is 0
An integer from 0 to 5, i is an integer from 0 to 4, j is 0 or 1, h +
i + j is an integer of 1 to 6, s is an integer of 0 to 5, t is 0 to 4
U is 0 or 1, s + t + u is an integer of 1 to 6,
p, q, and r are each independently an integer of 0 to 5, p + q + r
Is an integer of 1 to 6, and R 3 to R 8 are each independently a fluorine atom, a chlorine atom, a deuterium atom or a trifluoromethyl group. ]
【0029】本発明における含フッ素環構造を有する単
量体としては、下記一般式(5)〜(7)で表される化
合物から選ばれる単量体が好ましい。As the monomer having a fluorinated ring structure in the present invention, a monomer selected from the compounds represented by the following formulas (5) to (7) is preferable.
【0030】[0030]
【化3】 Embedded image
【0031】[一般式(5)〜(7)において、R9 〜
R20はそれぞれ独立にフッ素原子、塩素原子、重水素原
子またはトリフルオロメチル基であり、R11とR12、R
15とR16およびR19とR20は連結して環を形成してもよ
い。] 一般式(5)〜(7)で表される化合物の具体例として
は、式(11)〜(18)で表される化合物などが挙げ
られる。In the general formulas (5) to (7), R 9 to
R 20 is independently a fluorine atom, a chlorine atom, a deuterium atom or a trifluoromethyl group, and R 11 and R 12 , R
15 and R 16 and R 19 and R 20 may be linked to form a ring. Specific examples of the compounds represented by formulas (5) to (7) include compounds represented by formulas (11) to (18).
【0032】[0032]
【化4】 Embedded image
【0033】2個以上の重合性二重結合を有する含フッ
素単量体としては、下記一般式(8)〜(10)で表さ
れる化合物が好ましい。As the fluorine-containing monomer having two or more polymerizable double bonds, compounds represented by the following general formulas (8) to (10) are preferable.
【0034】[0034]
【化5】 CY1 Y2 =CY3 OCY4 Y5 CY6 Y7 CY8 =CY9 Y10 (8) CZ1 Z2 =CZ3 OCZ4 Z5 CZ6 =CZ7 Z8 (9) CW1 W2 =CW3 OCW4 W5 OCW6 =CW7 W8 (10)CY 1 Y 2 = CY 3 OCY 4 Y 5 CY 6 Y 7 CY 8 = CY 9 Y 10 (8) CZ 1 Z 2 = CZ 3 OCZ 4 Z 5 CZ 6 = CZ 7 Z 8 (9) CW 1 W 2 = CW 3 OCW 4 W 5 OCW 6 = CW 7 W 8 (10)
【0035】[一般式(8)〜(10)において、Y1
〜Y10、Z1 〜Z8 およびW1 〜W8は、それぞれ独立
にフッ素原子、塩素原子、重水素原子またはトリフルオ
ロメチル基である。] 一般式(8)〜(10)で表される化合物の具体例とし
ては、以下の化合物などが挙げられる。式中、Dは重水
素原子である。[In the general formulas (8) to (10), Y 1
To Y 10 , Z 1 to Z 8 and W 1 to W 8 are each independently a fluorine atom, a chlorine atom, a deuterium atom or a trifluoromethyl group. Specific examples of the compounds represented by the general formulas (8) to (10) include the following compounds. In the formula, D is a deuterium atom.
【0036】[0036]
【化6】CF2 =CFOCF2 CF2 CF=CF2 、C
F2 =CFOCD2 CF2 CF=CF2 、CF2 =CF
OCCl2 CF2 CF=CF2 、CF2 =CFOCF2
CF2 CD=CF2 、CF2 =CFOCF2 CF2 CC
l=CF2 、CF2 =CFOCF2 CFDCF=CF
2 、CF2 =CFOCF2 CFClCF=CF2 、CF
2 =CFOCF2 CF2 CF=CFCl、CF2 =CF
OCF2 CF(CF3 )CF=CF2 、CF2 =CFO
CF2 CF(CF3 )CD=CF2 、CF2 =CFOC
F2 CF(CF3 )CCl=CF2 、CF2 =CFOC
F2 CF=CF2 、CF2 =CFOCF(CF3 )CF
=CF2 、CF2 =CFOCF2 OCF=CF2 、CF
2 =CDOCF2 OCD=CF2 、CF2 =CClOC
F2 OCCl=CF2 、CF2 =CFOCD2 OCF=
CF2 、CF2 =CFOCCl2 OCF=CF2 、CF
2 =CFOC(CF3 )2 OCF=CF2 。Embedded image CF 2 CFCFOCF 2 CF 2 CF = CF 2 , C
F 2 = CFOCD 2 CF 2 CF = CF 2 , CF 2 = CF
OCCl 2 CF 2 CF = CF 2 , CF 2 = CFOCF 2
CF 2 CD = CF 2 , CF 2 = CFOCF 2 CF 2 CC
1 = CF 2 , CF 2 = CFOCF 2 CFDCF = CF
2 , CF 2 = CFOCF 2 CFClCF = CF 2 , CF
2 = CFOCF 2 CF 2 CF = CFCl, CF 2 = CF
OCF 2 CF (CF 3 ) CF = CF 2 , CF 2 = CFO
CF 2 CF (CF 3 ) CD = CF 2 , CF 2 = CFOC
F 2 CF (CF 3 ) CCl = CF 2 , CF 2 = CFOC
F 2 CF = CF 2 , CF 2 = CFOCF (CF 3 ) CF
= CF 2 , CF 2 = CFOCF 2 OCF = CF 2 , CF
2 = CDOCF 2 OCD = CF 2 , CF 2 = CClOC
F 2 OCCl = CF 2 , CF 2 = CFOCD 2 OCF =
CF 2 , CF 2 = CFOCCl 2 OCF = CF 2 , CF
2 = CFOC (CF 3) 2 OCF = CF 2.
【0037】本発明の含フッ素重合体組成物中の含フッ
素重合体の濃度は0.01〜50重量%が好ましく、
0.1〜20重量%がより好ましい。含フッ素溶媒に含
フッ素環構造含有重合体が溶解されてなる本発明の含フ
ッ素重合体組成物を基材上に塗布し、含フッ素溶媒を乾
燥させることにより基材上に含フッ素環構造含有重合体
の薄膜を形成できる。薄膜の厚みは通常0.01〜50
μmの範囲から選定される。基材については、あらゆる
形状、材質に適用できる。薄膜が反射防止膜の場合、そ
の基材としては、ポリメチルメタクリレート、ポリカー
ボネート、ポリエチレンテレフタレートなどが好まし
い。含フッ素溶媒の乾燥温度は基材の耐熱温度により適
宜選択されるが、50〜150℃が好ましく、70〜1
20℃がより好ましい。膜厚むらを防ぐために、除電雰
囲気下に薄膜形成することが好ましい。The concentration of the fluoropolymer in the fluoropolymer composition of the present invention is preferably 0.01 to 50% by weight,
0.1-20% by weight is more preferred. The fluorinated polymer composition of the present invention in which the fluorinated solvent is dissolved in a fluorinated solvent is coated on a substrate, and the fluorinated solvent is dried to dry the fluorinated solvent. A polymer thin film can be formed. The thickness of the thin film is usually 0.01 to 50
It is selected from the range of μm. The substrate can be applied to all shapes and materials. When the thin film is an antireflection film, the substrate is preferably polymethyl methacrylate, polycarbonate, polyethylene terephthalate, or the like. The drying temperature of the fluorinated solvent is appropriately selected depending on the heat-resistant temperature of the substrate, but is preferably 50 to 150 ° C.,
20 ° C. is more preferred. In order to prevent unevenness in film thickness, it is preferable to form a thin film under a static elimination atmosphere.
【0038】含フッ素溶媒に含フッ素環構造含有重合体
が溶解されてなる本発明の含フッ素重合体組成物を基材
上に塗布し、含フッ素溶媒を乾燥させることにより基材
上に含フッ素環構造含有重合体の薄膜を形成した後、含
フッ素環構造含有重合体の薄膜を基材から剥離すること
により含フッ素環構造含有重合体の薄膜を得ることがで
きる。薄膜の厚みは通常0.01〜50μmの範囲から
選定される。基材としては、薄膜を基材から剥離しやす
く、耐熱温度が高いことからガラスが好ましい。含フッ
素溶媒の乾燥温度は基材の耐熱温度により適宜選択され
るが、含フッ素溶媒の沸点以上が好ましい。好ましい乾
燥温度は50〜200℃であり、より好ましくは70〜
150℃である。膜厚むらを防ぐために、除電雰囲気下
に薄膜形成することが好ましい。基材からの薄膜剥離
は、含フッ素環構造含有重合体を溶かさない極性溶媒
中、特に水中で行うことが好ましい。A fluorinated polymer composition of the present invention in which a fluorinated ring structure-containing polymer is dissolved in a fluorinated solvent is applied on a substrate, and the fluorinated solvent is dried to form a fluorinated solvent on the substrate. After forming the thin film of the ring-containing polymer, the thin film of the fluorine-containing polymer can be obtained by peeling the thin film of the fluorine-containing polymer from the substrate. The thickness of the thin film is usually selected from the range of 0.01 to 50 μm. As the substrate, glass is preferable because the thin film is easily peeled from the substrate and has a high heat resistance temperature. The drying temperature of the fluorinated solvent is appropriately selected depending on the heat resistant temperature of the substrate, but is preferably equal to or higher than the boiling point of the fluorinated solvent. Preferred drying temperature is 50-200 ° C, more preferably 70-200 ° C.
150 ° C. In order to prevent unevenness in film thickness, it is preferable to form a thin film under a static elimination atmosphere. The peeling of the thin film from the substrate is preferably performed in a polar solvent that does not dissolve the polymer having a fluorinated ring structure, particularly in water.
【0039】厚みが0.1μm以下の薄膜を形成する場
合、膜厚偏差が小さい均一な薄膜が得られることから、
前述の一般式R1 −O−R2 で表される含フッ素溶媒は
R1が炭素数6〜7のポリフルオロアルキル基であるも
のが好ましい。厚みが1μm以上の薄膜を形成する場
合、膜厚偏差が小さい均一な薄膜が得られることから、
前述の一般式R1 −O−R2 で表される含フッ素溶媒は
R1 が炭素数9〜12のポリフルオロアルキル基である
ものが好ましい。When a thin film having a thickness of 0.1 μm or less is formed, a uniform thin film having a small thickness deviation can be obtained.
The fluorinated solvent represented by the aforementioned general formula R 1 —O—R 2 is preferably one in which R 1 is a polyfluoroalkyl group having 6 to 7 carbon atoms. When a thin film having a thickness of 1 μm or more is formed, a uniform thin film having a small thickness deviation is obtained.
The fluorinated solvent represented by the aforementioned general formula R 1 —O—R 2 is preferably one in which R 1 is a polyfluoroalkyl group having 9 to 12 carbon atoms.
【0040】薄膜の形成方法としては、ロールコート
法、キャスト法、ディップ法、スピンコート法、水上キ
ャスト法、ダイコート法、ラングミュア・ブロジェット
法などが挙げられる。基材と含フッ素重合体の接着性向
上のために、含フッ素重合体組成物中にシラン系、エポ
キシ系、チタン系、アルミニウム系などのカップリング
剤を含フッ素アルコールとともに配合したり、シランカ
ップリング剤のオリゴマーなどを配合してもよい。Examples of the method for forming a thin film include a roll coating method, a casting method, a dipping method, a spin coating method, a casting method on water, a die coating method, a Langmuir-Blodgett method, and the like. In order to improve the adhesion between the substrate and the fluoropolymer, a silane-based, epoxy-based, titanium-based, aluminum-based, etc. An oligomer of a ring agent or the like may be blended.
【0041】得られた薄膜は基材上に密着させたまま
で、または、基材から剥離して、使用できる。薄膜の用
途としては、光学分野、電気分野における保護コートが
挙げられ、この場合の基材としては、磁気ディスク基
板、光ファイバ、鏡、太陽電池、光ディスク、タッチパ
ネル、感光および定着ドラム、フィルムコンデンサ、ガ
ラス窓用の各種フィルムなどが挙げられる。The obtained thin film can be used while being kept in close contact with the substrate or peeled off from the substrate. Examples of the use of the thin film include a protective coat in the optical field and the electric field, and as the base material in this case, a magnetic disk substrate, an optical fiber, a mirror, a solar cell, an optical disk, a touch panel, a photosensitive and fixing drum, a film capacitor, Various films for glass windows and the like can be mentioned.
【0042】また、コーティング型光導波路材料、電線
被覆材、撥インク剤(たとえば塗装用、インクジェット
プリンタなどの印刷機器用)、レンズ材料、半導体素子
用接着剤(たとえばLOC(リードオンチップ)テープ
用接着剤、ダイボンド用接着剤、ペリクル膜固定用接着
剤)、半導体用保護コート(たとえばバッファコート
膜、パッシベーション膜、半導体素子α線遮蔽膜、防湿
コート剤)、層間絶縁膜(たとえば半導体素子用、液晶
表示体用、多層配線板用)、光学薄膜(ペリクル膜(K
rFエキシマレーザー用、ArFエキシマレーザー
用)、ディスプレイ用反射防止膜、レジスト用反射防止
膜)などに使用できる。Also, a coating type optical waveguide material, an electric wire covering material, an ink repellent (for coating, for printing equipment such as an ink jet printer), a lens material, an adhesive for a semiconductor element (for example, for LOC (lead-on-chip) tape) Adhesive, die bonding adhesive, pellicle film fixing adhesive, semiconductor protective coat (eg, buffer coat film, passivation film, semiconductor element α-ray shielding film, moisture-proof coat agent), interlayer insulating film (eg, for semiconductor element, For liquid crystal display, for multilayer wiring board, optical thin film (pellicle film (K
(for rF excimer laser, for ArF excimer laser), antireflection film for display, antireflection film for resist) and the like.
【0043】本発明の含フッ素重合体組成物を用いるこ
とにより、ピンホールなどの欠陥がなく、透明であり、
屈折率が低く、耐熱性、耐薬品性に優れているなど、含
フッ素環構造含有重合体の特性を損なうことなく薄膜化
できる。By using the fluoropolymer composition of the present invention, the composition is transparent without defects such as pinholes,
A thin film can be formed without impairing the properties of the fluorine-containing ring structure-containing polymer, such as a low refractive index and excellent heat resistance and chemical resistance.
【0044】[0044]
【実施例】「例1(含フッ素環構造含有重合体の合成
例)」パーフルオロ(ブテニルビニルエーテル)35
g、イオン交換水150g、分子量調節剤としてメタノ
ール6gおよび重合開始剤として((CH3 )2 CHO
COO)2 90mgを、内容積200mlの耐圧ガラス
製オートクレーブに入れた。系内を3回窒素で置換した
後、40℃で22時間懸濁重合を行って、開始剤に起因
する末端基を有する非晶質重合体を得た。この重合体を
空気中で320℃で60分間熱処理し、水洗、乾燥を行
った。その結果、前記末端基がカルボキシル基に変換さ
れた含フッ素環構造含有重合体(以下、重合体Aとい
う)を33g得た。EXAMPLES "Example 1 (Synthesis example of a polymer containing a fluorinated ring structure)" perfluoro (butenyl vinyl ether) 35
g, 150 g of ion-exchanged water, 6 g of methanol as a molecular weight regulator, and ((CH 3 ) 2 CHO as a polymerization initiator.
90 mg of (COO) 2 was placed in a pressure-resistant glass autoclave having an internal volume of 200 ml. After the inside of the system was replaced with nitrogen three times, suspension polymerization was performed at 40 ° C. for 22 hours to obtain an amorphous polymer having a terminal group due to an initiator. This polymer was heat-treated at 320 ° C. for 60 minutes in air, washed with water and dried. As a result, 33 g of a polymer having a fluorinated ring structure in which the terminal group was converted to a carboxyl group (hereinafter, referred to as polymer A) was obtained.
【0045】重合体Aの赤外分光分析により、1811
cm-1と1773cm-1にカルボキシル基に起因する吸
収ピークが確認された。重合体Aの固有粘度[η]は、
パーフルオロ(2−ブチルテトラヒドロフラン)中30
℃で0.35であった。重合体Aのガラス転移点は10
8℃であり、室温ではタフで透明なガラス状の重合体で
あった。また10%熱分解温度は465℃であり、光線
透過率は95%以上と高かった。According to the infrared spectroscopic analysis of the polymer A, 1811 was obtained.
absorption peak attributable to a carboxyl group in cm -1 and 1773cm -1 were observed. The intrinsic viscosity [η] of the polymer A is
30 in perfluoro (2-butyltetrahydrofuran)
It was 0.35 at ° C. The glass transition point of polymer A is 10
The temperature was 8 ° C, and at room temperature, it was a tough and transparent glassy polymer. The 10% thermal decomposition temperature was 465 ° C., and the light transmittance was as high as 95% or more.
【0046】「例2(含フッ素環構造含有重合体の合成
例)」パーフルオロ(ブテニルビニルエーテル)35
g、イオン交換水150g、分子量調整剤としてメタノ
ール6gおよび重合開始剤として((CH3 )2 CHO
COO)2 90mgを、内容積200mlの耐圧ガラス
製圧ガラス製オートクレーブに入れた。系内を3回窒素
で置換した後、40℃で22時間懸濁重合を行って、含
フッ素環構造含有重合体(以下、重合体Bという)を2
8g得た。Example 2 (Synthesis Example of Fluorine-Containing Ring Structure-Containing Polymer) Perfluoro (butenyl vinyl ether) 35
g, 150 g of ion-exchanged water, 6 g of methanol as a molecular weight regulator, and ((CH 3 ) 2 CHO as a polymerization initiator.
90 mg of (COO) 2 was placed in a pressure-resistant glass autoclave having an internal volume of 200 ml. After purging the system three times with nitrogen, suspension polymerization was performed at 40 ° C. for 22 hours to obtain a fluorinated ring structure-containing polymer (hereinafter referred to as polymer B).
8 g were obtained.
【0047】重合体Bの固有粘度[η]は、パーフルオ
ロ(2−ブチルテトラヒドロフラン)中30℃で0.3
5であった。重合体Bのガラス転移点は108℃であ
り、室温ではタフで透明な非晶質重合体であった。また
10%熱分解温度は465℃であった。光線透過率は9
5%以上と高く、屈折率は1.34と低かった。The intrinsic viscosity [η] of the polymer B is 0.3 in perfluoro (2-butyltetrahydrofuran) at 30 ° C.
It was 5. The glass transition point of the polymer B was 108 ° C., and it was a tough and transparent amorphous polymer at room temperature. The 10% thermal decomposition temperature was 465 ° C. Light transmittance is 9
The refractive index was as high as 5% or more, and the refractive index was as low as 1.34.
【0048】「例3(比較例)」1gの重合体Aと99
gのF(CF2 )3 OCH3 をガラス製フラスコ中に入
れ、30℃にて24時間加熱撹拌した。その結果、重合
体Aは膨潤するのみで溶解しなかった。Example 3 (Comparative Example) 1 g of polymer A and 99
g of F (CF 2 ) 3 OCH 3 was placed in a glass flask and heated and stirred at 30 ° C. for 24 hours. As a result, Polymer A only swelled and did not dissolve.
【0049】「例4(比較例)」1gの重合体Aと99
gのF(CF2 )4 OCH3 をガラス製フラスコ中に入
れ、40℃にて24時間加熱撹拌した。その結果、重合
体Aは一部溶解するものの、膨潤した重合体Aが残存
し、完全に溶解しなかった。Example 4 (Comparative Example) 1 g of polymer A and 99
g of F (CF 2 ) 4 OCH 3 was placed in a glass flask and heated and stirred at 40 ° C. for 24 hours. As a result, although the polymer A partially dissolved, the swollen polymer A remained and did not completely dissolve.
【0050】「例5(実施例)」1gの重合体Aと99
gのF(CF2 )6 OCH3 をガラス製フラスコ中に入
れ、40℃にて24時間加熱撹拌した。その結果、無色
透明で濁りのない均一な溶液を得た。この溶液を用いて
片面平均反射率4%のポリメチルメタクリレート板上に
引き上げ速度200mm/minでディップコートした
後、80℃にて1時間加熱処理することにより、ポリメ
チルメタクリレート板上に0.1μmの均一で透明な膜
が得られた。この膜の膜厚偏差は1%未満であった。こ
のポリメチルメタクリレート板の片面平均反射率は1.
0%となった。このポリメチルメタクリレート板は低反
射フィルタとして使用できる。"Example 5 (Example)" 1 g of polymer A and 99
g of F (CF 2 ) 6 OCH 3 was placed in a glass flask and heated and stirred at 40 ° C. for 24 hours. As a result, a colorless, transparent, turbid, uniform solution was obtained. Using this solution, dip coating was performed on a polymethyl methacrylate plate having a single-sided average reflectance of 4% at a pulling rate of 200 mm / min, followed by heat treatment at 80 ° C. for 1 hour to form 0.1 μm on the polymethyl methacrylate plate. Was obtained. The thickness deviation of this film was less than 1%. The average reflectance of one side of this polymethyl methacrylate plate was 1.
It became 0%. This polymethyl methacrylate plate can be used as a low reflection filter.
【0051】「例6(実施例)」1gの重合体Aと99
gのF(CF2 )8 OCH3 をガラス製フラスコ中に入
れ、40℃にて24時間加熱撹拌した。その結果、無色
透明で濁りのない均一な溶液を得た。この溶液を用いて
片面平均反射率4%のポリメチルメタクリレート板上に
引き上げ速度200mm/minでディップコートした
後、80℃にて1時間加熱処理することにより、ポリメ
チルメタクリレート板上に0.1μmの透明な膜が得ら
れた。この膜の膜厚偏差は5%であった。このポリメチ
ルメタクリレート板の片面平均反射率は1.0%であっ
た。"Example 6 (Example)" 1 g of polymer A and 99
g of F (CF 2 ) 8 OCH 3 was placed in a glass flask and heated and stirred at 40 ° C. for 24 hours. As a result, a colorless, transparent, turbid, uniform solution was obtained. Using this solution, dip coating was performed on a polymethyl methacrylate plate having a single-sided average reflectance of 4% at a pulling rate of 200 mm / min, followed by heat treatment at 80 ° C. for 1 hour to form 0.1 μm on the polymethyl methacrylate plate. Was obtained. The thickness deviation of this film was 5%. The average reflectance on one side of this polymethyl methacrylate plate was 1.0%.
【0052】「例7(実施例)」9gの重合体Bと91
gのF(CF2 )10OCH3 をガラス製フラスコ中に入
れ、50℃にて24時間加熱撹拌した。その結果、無色
透明で濁りのない均一な溶液を得た。この溶液を用いて
ガラス板上にスピン速度700rpmにて30秒スピン
コートを実施した後、80℃にて1時間、さらに180
℃にて1時間加熱処理することにより、ガラス板上に均
一で透明な膜が得られた。その後、接着剤を塗布したア
ルミニウムフレームを膜上に張り付け、ガラス板上から
この膜をはがしたところ、膜厚1μmの均一な重合体B
の自立膜がついたアルミニウムフレームができた。この
膜の膜厚偏差は1%未満であった。このフレームはペリ
クルとして使用できる。"Example 7 (Example)" 9 g of polymer B and 91
g of F (CF 2 ) 10 OCH 3 was placed in a glass flask and heated and stirred at 50 ° C. for 24 hours. As a result, a colorless, transparent, turbid, uniform solution was obtained. Using this solution, spin coating was performed on a glass plate at a spin speed of 700 rpm for 30 seconds, and then at 80 ° C. for 1 hour, and further for 180 hours.
By performing the heat treatment at 1 ° C. for 1 hour, a uniform and transparent film was obtained on the glass plate. After that, an aluminum frame coated with an adhesive was stuck on the film, and the film was peeled off from the glass plate.
An aluminum frame with a self-supporting film was obtained. The thickness deviation of this film was less than 1%. This frame can be used as a pellicle.
【0053】「例8(実施例)」9gの重合体Bと91
gのF(CF2 )8 OCH3 をガラス製フラスコ中に入
れ、50℃にて24時間加熱撹拌した。その結果、無色
透明で濁りのない均一な溶液を得た。この溶液を用いて
ガラス板上にスピン速度700rpmにて30秒スピン
コートを実施した後、80℃にて1時間、さらに180
℃にて1時間加熱処理することにより、ガラス板上に均
一で透明な膜が得られた。この膜の膜厚偏差は6%であ
った。Example 8 9 g of polymer B and 91
g of F (CF 2 ) 8 OCH 3 was placed in a glass flask and heated and stirred at 50 ° C. for 24 hours. As a result, a colorless, transparent, turbid, uniform solution was obtained. Using this solution, spin coating was performed on a glass plate at a spin speed of 700 rpm for 30 seconds, and then at 80 ° C. for 1 hour, and further for 180 hours.
By performing the heat treatment at 1 ° C. for 1 hour, a uniform and transparent film was obtained on the glass plate. The thickness deviation of this film was 6%.
【0054】「例9(実施例)」例7で得られた重合体
Aの溶液を用いて金属基板上にスピン速度700rpm
にて30秒スピンコートを実施した後、80℃にて1時
間、さらに180℃にて1時間加熱処理することによ
り、金属板上に1μmの均一な透明の膜が得られた。こ
の膜にピンホールがないことは、この薄膜の電気抵抗が
1015Ωcm以上であることから確認された。"Example 9 (Example)" Using the solution of the polymer A obtained in Example 7, a spin speed of 700 rpm was formed on a metal substrate.
After performing spin coating at 30 ° C. for 30 seconds, a heat treatment was performed at 80 ° C. for 1 hour and further at 180 ° C. for 1 hour to obtain a uniform transparent film of 1 μm on the metal plate. The absence of pinholes in this film was confirmed by the fact that the electrical resistance of this thin film was 10 15 Ωcm or more.
【0055】「例10(実施例)」重合体Bの代わり
に、非晶質であるパーフルオロ(2,2−ジメチル−
1,3−ジオキソラン)/テトラフルオロエチレン(6
5モル%/35モル%)の共重合体(デュポン社製、商
品名テフロンAF1600)9gを用い、F(CF2 )
6 OCH3 の代わりに91gの(CF3 )2 CF(OC
H3 )CFCF2 CF3を用いる以外は例5と同様にし
て、0.1μmの均一な薄膜を有するポリメチルメタク
リレート板を得た。この膜の膜厚偏差は1%未満であっ
た。このポリメチルメタクリレート板の片面平均反射率
は1.0%となった。"Example 10 (Example)" In place of polymer B, amorphous perfluoro (2,2-dimethyl-
1,3-dioxolane) / tetrafluoroethylene (6
Using 9 g of a copolymer (5 mol% / 35 mol%) (trade name: Teflon AF1600, manufactured by DuPont), F (CF 2 )
91 g of (CF 3 ) 2 CF (OC instead of 6 OCH 3
Except for using H 3 ) CFCF 2 CF 3 , a polymethyl methacrylate plate having a uniform thin film of 0.1 μm was obtained in the same manner as in Example 5. The thickness deviation of this film was less than 1%. The average reflectance on one side of this polymethyl methacrylate plate was 1.0%.
【0056】[0056]
【発明の効果】含フッ素環構造含有重合体を地球環境、
特に地球温暖化に対して影響の少ない溶媒を用いて可溶
化でき、含フッ素環構造含有重合体の薄膜を地球環境へ
の悪影響を抑制しながら形成できる。EFFECT OF THE INVENTION The fluorine-containing ring structure-containing polymer is used for the global environment,
In particular, it can be solubilized by using a solvent having little effect on global warming, and a thin film of a polymer having a fluorine-containing ring structure can be formed while suppressing adverse effects on the global environment.
Claims (7)
ある含フッ素重合体を、一般式R1−O−R2 (R1 は
エーテル結合を有してもよい炭素数5〜12の直鎖状ま
たは分岐状のポリフルオロアルキル基であり、R2 は炭
素数1〜5の直鎖状または分岐状のアルキル基であ
る。)で表される含フッ素溶媒に溶解してなる含フッ素
重合体組成物。1. An amorphous fluorine-containing polymer having a fluorine-containing ring structure in its main chain and a non-crystalline fluorine-containing polymer represented by the general formula R 1 —O—R 2 (R 1 is a carbon atom which may have an ether bond) A linear or branched polyfluoroalkyl group having 5 to 12 carbon atoms, and R 2 is a linear or branched alkyl group having 1 to 5 carbon atoms. A fluoropolymer composition comprising:
含フッ素トリアジン環構造または含フッ素芳香族環構造
を有する含フッ素重合体である請求項1に記載の含フッ
素重合体組成物。2. The fluorinated ring structure is a fluorinated aliphatic ring structure,
The fluorinated polymer composition according to claim 1, which is a fluorinated polymer having a fluorinated triazine ring structure or a fluorinated aromatic ring structure.
F(CF2 )7 OCH3 、F(CF2 )8 OCH3 、F
(CF2 )9 OCH3 またはF(CF2 )10OCH3 で
ある請求項1または2に記載の含フッ素重合体組成物。3. The method according to claim 1, wherein the fluorinated solvent is F (CF 2 ) 6 OCH 3 ,
F (CF 2 ) 7 OCH 3 , F (CF 2 ) 8 OCH 3 , F
3. The fluoropolymer composition according to claim 1, which is (CF 2 ) 9 OCH 3 or F (CF 2 ) 10 OCH 3 .
合体組成物を基材上に塗布し、含フッ素溶媒を乾燥させ
ることにより基材上に含フッ素重合体の薄膜を形成する
方法。4. A thin film of a fluoropolymer is formed on a substrate by applying the fluoropolymer composition according to claim 1, 2 or 3 on a substrate and drying the fluorinated solvent. Method.
方法。5. The method according to claim 4, wherein the thin film is an anti-reflection film.
合体組成物を基材上に塗布し、含フッ素溶媒を乾燥させ
ることにより基材上に含フッ素重合体の薄膜を形成した
後、含フッ素重合体の薄膜を基材から剥離することによ
り含フッ素重合体の薄膜を得る方法。6. A thin film of a fluoropolymer is formed on a substrate by applying the fluoropolymer composition according to claim 1, 2 or 3 on a substrate and drying the fluorinated solvent. Thereafter, a method of obtaining a fluoropolymer thin film by peeling the fluoropolymer thin film from the substrate.
方法。7. The method according to claim 6, wherein the thin film is a pellicle film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34579298A JP3968899B2 (en) | 1997-12-18 | 1998-12-04 | Fluoropolymer composition and method for obtaining thin film |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34971897 | 1997-12-18 | ||
JP9-349718 | 1997-12-18 | ||
JP34579298A JP3968899B2 (en) | 1997-12-18 | 1998-12-04 | Fluoropolymer composition and method for obtaining thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11246726A true JPH11246726A (en) | 1999-09-14 |
JP3968899B2 JP3968899B2 (en) | 2007-08-29 |
Family
ID=26578110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34579298A Expired - Lifetime JP3968899B2 (en) | 1997-12-18 | 1998-12-04 | Fluoropolymer composition and method for obtaining thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3968899B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001262171A (en) * | 2000-01-11 | 2001-09-26 | Asahi Glass Co Ltd | Fluorine-based diluting solvent |
WO2007077722A1 (en) * | 2006-01-05 | 2007-07-12 | Asahi Glass Company, Limited | Fluorine-containing polymer and fluorine-containing polymer composition containing same |
US7800003B2 (en) | 2005-07-25 | 2010-09-21 | Siemens Aktiengesellschaft | Insulator with enhanced insulating capacity |
WO2013018730A1 (en) * | 2011-07-29 | 2013-02-07 | 旭硝子株式会社 | Pellicle for lithography, photomask fitted with pellicle and exposure method |
JP2014070100A (en) * | 2012-09-27 | 2014-04-21 | Du Pont Mitsui Fluorochem Co Ltd | Amorphous-containing fluororesin composition and method of manufacturing thin film |
-
1998
- 1998-12-04 JP JP34579298A patent/JP3968899B2/en not_active Expired - Lifetime
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001262171A (en) * | 2000-01-11 | 2001-09-26 | Asahi Glass Co Ltd | Fluorine-based diluting solvent |
US7800003B2 (en) | 2005-07-25 | 2010-09-21 | Siemens Aktiengesellschaft | Insulator with enhanced insulating capacity |
WO2007077722A1 (en) * | 2006-01-05 | 2007-07-12 | Asahi Glass Company, Limited | Fluorine-containing polymer and fluorine-containing polymer composition containing same |
US8017709B2 (en) | 2006-01-05 | 2011-09-13 | Asahi Glass Company, Limited | Fluorinated polymer and fluorinated polymer composition containing it |
WO2013018730A1 (en) * | 2011-07-29 | 2013-02-07 | 旭硝子株式会社 | Pellicle for lithography, photomask fitted with pellicle and exposure method |
JPWO2013018730A1 (en) * | 2011-07-29 | 2015-03-05 | 旭硝子株式会社 | Pellicle for lithography, photomask with pellicle, and exposure processing method |
US9223200B2 (en) | 2011-07-29 | 2015-12-29 | Asahi Glass Company, Limited | Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method |
JP2014070100A (en) * | 2012-09-27 | 2014-04-21 | Du Pont Mitsui Fluorochem Co Ltd | Amorphous-containing fluororesin composition and method of manufacturing thin film |
WO2014049444A3 (en) * | 2012-09-27 | 2015-06-18 | 三井・デュポンフロロケミカル株式会社 | Amorphous fluorine-containing resin composition, and manufacturing method for thin film |
US9862852B2 (en) | 2012-09-27 | 2018-01-09 | Dupont-Mitsui Fluorochemicals Co., Ltd. | Amorphous fluorine-containing resin composition and a manufacturing method of thin films |
Also Published As
Publication number | Publication date |
---|---|
JP3968899B2 (en) | 2007-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6284379B1 (en) | Fluorine-containing polymer composition | |
JP3184220B2 (en) | Fluorinated polymer composition | |
US7244545B2 (en) | Fluorinated compound, fluoropolymer and process for its production | |
JP2952962B2 (en) | Pollution prevention equipment | |
TW500972B (en) | Pellicle | |
JP2002038075A (en) | Coating composition for part of optical apparatus or part of electrical apparatus and coating method | |
US6337379B2 (en) | Fluorine-containing polymer composition | |
JP3968899B2 (en) | Fluoropolymer composition and method for obtaining thin film | |
TW200940340A (en) | Bilayer anti-reflective films containing nanoparticles | |
EP1772468A1 (en) | Fluorine-containing compound, fluorine-containing polymer, resist composition and resist protective film composition | |
WO2021090812A1 (en) | Antenna cover base material | |
JP3029323B2 (en) | Fluoropolymer composition for coating and use thereof | |
JP2817884B2 (en) | Anti-reflective thin film | |
US5502132A (en) | Process for producing a perfluoro copolymer | |
JP3053657B2 (en) | Perfluoro copolymer, its production method, its composition and its membrane | |
JP2748413B2 (en) | Low reflection processing agent | |
JP2007086731A (en) | Composition for resist protective film | |
JP2724709B2 (en) | Cladding material for optical transmission fiber | |
CN102516459A (en) | Fluorine-containing compound, fluorine-containing polymer and fluorine-containing resin composite | |
JP2001330943A (en) | Pellicle | |
WO2004088422A1 (en) | Fluoro compound and fluoropolymer | |
JP2003313236A (en) | Method for fluorination of unstable end groups of perhalopolyfluoropolymers | |
JP2003057803A (en) | Pellicle film for lithography | |
JP2738023B2 (en) | Nonlinear optical element | |
JP2692185B2 (en) | Solar cell |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050310 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20060130 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20061213 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070116 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070306 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070515 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070528 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100615 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100615 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110615 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120615 Year of fee payment: 5 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120615 Year of fee payment: 5 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120615 Year of fee payment: 5 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130615 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130615 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140615 Year of fee payment: 7 |
|
EXPY | Cancellation because of completion of term |