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JPH11243166A - Resin-sealed semiconductor device - Google Patents

Resin-sealed semiconductor device

Info

Publication number
JPH11243166A
JPH11243166A JP4224298A JP4224298A JPH11243166A JP H11243166 A JPH11243166 A JP H11243166A JP 4224298 A JP4224298 A JP 4224298A JP 4224298 A JP4224298 A JP 4224298A JP H11243166 A JPH11243166 A JP H11243166A
Authority
JP
Japan
Prior art keywords
resin
lead frame
heat sink
semiconductor device
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4224298A
Other languages
Japanese (ja)
Inventor
Masahiko Maeda
賢彦 前田
Takeshi Iwaida
武 岩井田
Sumi Nagatomo
寿美 永友
Yoshinari Ikeda
良成 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP4224298A priority Critical patent/JPH11243166A/en
Publication of JPH11243166A publication Critical patent/JPH11243166A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a resin-encapsulated semiconductor device which is enhanced in reliability by a method, wherein the semiconductor device is improved so as to enhance dielectric strength between a lead frame mounted with a semiconductor chip and a heat sink, while restraining a heat dissipating path between the lead frame and the heat sink low in thermal resistance. SOLUTION: A resin-encapsulated semiconductor device consists of a semiconductor chip 1, a lead frame 2 mounted with the semiconductor chip 1, and a heat sink 3 arranged on the die pad 2a of the lead frame 2 through the intermediary of a narrow insulating space, wherein these members are sealed up with molding resin 4 into a single piece. At least, either the die pad 2a of the lead frame 2 or the heat sink 3, for instance, a projection 3a protruding toward the die pad 2a is provided to the heat sink 3, the edge face and peripheral surface of the projection 3a are covered with an insulating resin layer 7, the lead frame 2 is superimposed on the heat sink 3, and the lead frame 2, the heat sink 3, and their surroundings are encapsulated with molding resin.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、パワースイッチ
ング素子に適用するIGBTなどのパワーモジュールを
対象としたヒートシンク付きの樹脂封止型半導体装置に
関する。
The present invention relates to a resin-sealed semiconductor device with a heat sink for a power module such as an IGBT applied to a power switching element.

【0002】[0002]

【従来の技術】頭記の樹脂封止型半導体装置として、図
8で示すように半導体チップ1をマウントして所定のワ
イヤボンディングを施したリードフレーム2と、該リー
ドフレーム2のダイパッド部(半導体チップを搭載する
アイランド)2aの裏面側に対向配置した放熱用のヒー
トシンク3との周域を成形樹脂4で一体に封止してパッ
ケージングした構成のものが公知である。
2. Description of the Related Art As a resin-encapsulated semiconductor device described above, a lead frame 2 on which a semiconductor chip 1 is mounted and subjected to predetermined wire bonding as shown in FIG. There is known a configuration in which a peripheral region of a heat sink 3 for heat radiation disposed opposite to a back surface of an island (chip mounting) 2a is integrally sealed with a molding resin 4 and packaged.

【0003】また、特に樹脂パッケージに複数の半導体
チップを組み込んだモジュールでは、電圧印加を受ける
半導体チップ1とヒートシンク(接地側)3との間を電
気的に絶縁するために、図示のようにリードフレーム2
のダイパッド2aとヒートシンク3との間を隔離した上
で、この部分に成形樹脂4を充填して所要の絶縁耐力を
確保するようにしている。この場合に、リードフレーム
2とヒートシンク3との間の伝熱抵抗を極力抑えて高い
放熱性を得るには、両者間の間隔は所要の絶縁耐力を保
てる範囲でできる限り小さく、例えば100〜300μ
m程度の狭隘な間隔に抑えるようにする必要がある。
In particular, in a module in which a plurality of semiconductor chips are incorporated in a resin package, leads are electrically connected between the semiconductor chip 1 to which a voltage is applied and the heat sink (ground side) 3 as shown in the drawing. Frame 2
After separating the die pad 2a from the heat sink 3, the molding resin 4 is filled in this portion to secure required dielectric strength. In this case, in order to minimize the heat transfer resistance between the lead frame 2 and the heat sink 3 and obtain high heat dissipation, the interval between the two is as small as possible within a range that can maintain the required dielectric strength, for example, 100 to 300 μm.
It is necessary to keep the distance as narrow as about m.

【0004】しかしながら、リードフレーム2とこれに
対向するヒートシンク3との間の間隔をμmオーダーの
狭隘な間隔にすると、成形金型にリードフレーム2,ヒ
ートシンク3をインサートして樹脂封止を行う際に、リ
ードフレーム2とヒートシンク3とが接触したり、モー
ルド中に金型のキャビティ内を流動する成形樹脂の流れ
でリードフレーム2がヒートシンク3に接触して短絡状
態になったり、接触しないまでも間隔が狭まって所要の
絶縁耐圧が確保できないことがある。
However, if the space between the lead frame 2 and the heat sink 3 facing the lead frame 2 is set to a narrow space of the order of μm, the lead frame 2 and the heat sink 3 are inserted into a molding die to perform resin sealing. When the lead frame 2 comes into contact with the heat sink 3 or the lead frame 2 comes into contact with the heat sink 3 due to the flow of the molding resin flowing in the cavity of the mold during molding, and the lead frame 2 is short-circuited. In some cases, the required insulation withstand voltage cannot be ensured due to a narrow interval.

【0005】そこで、特公平3−63822号公報で
は、図9で示すようにリードフレーム2に半導体チップ
1をマウントしてワイヤボンディングを施した仮組立の
状態でその周域(リードフレーム2の下面を露呈させて
おく)を成形樹脂5で1回目の封止を行い、続く2回目
の樹脂封止ではヒートシンク3を含めて前記の仮組立体
を成形樹脂4で一体に封止するようにしている。さら
に、1回目の樹脂封止の際に樹脂ブロックの下面(リー
ドフレーム2の裏面側)に突起5aを同時に成形してお
き、2回目の樹脂封止では前記の仮組立体を突起5aを
介してヒートシンク3の上に重ね合わせて成形樹脂4に
より封止し、この樹脂封止によりリードフレーム2とヒ
ートシンク3との間に樹脂4で充填された狭隘な絶縁間
隔を確保するようにした構成のものも知られている。
In Japanese Patent Publication No. 3-63822, a semiconductor chip 1 is mounted on a lead frame 2 as shown in FIG. Is first sealed with a molding resin 5, and in the subsequent second resin sealing, the temporary assembly including the heat sink 3 is integrally sealed with the molding resin 4. I have. Further, at the time of the first resin sealing, the projections 5a are simultaneously formed on the lower surface of the resin block (the back side of the lead frame 2), and at the second resin sealing, the temporary assembly is interposed via the projections 5a. The heat sink 3 is overlaid on the heat sink 3 and sealed with a molding resin 4. By this resin sealing, a narrow insulating space filled with the resin 4 is secured between the lead frame 2 and the heat sink 3. Things are also known.

【0006】また、前記方法とは別に、この発明と同一
出願人より先に提案した特願平9−271809号の樹
脂封止型半導体装置では、図10で示すようにリードフ
レーム2とヒートシンク3との間に、固定手段として両
面接着テープなどの絶縁シートを用いた絶縁スペーサ6
を介在して所要の絶縁間隔を保持し、この組立て状態で
成形金型にインサートして成形樹脂4により封止するよ
うにしている。
Separately from the above method, the resin-encapsulated semiconductor device of Japanese Patent Application No. 9-271809 previously proposed by the same applicant as the present invention has a lead frame 2 and a heat sink 3 as shown in FIG. And an insulating spacer 6 using an insulating sheet such as a double-sided adhesive tape as a fixing means.
A required insulation interval is maintained with the interposition of the resin, and the assembly is inserted into a molding die in this assembled state and sealed with the molding resin 4.

【0007】[0007]

【発明が解決しようとする課題】前記した構成によれ
ば、樹脂ブロックから下方に突き出した樹脂突起5a
(図9参照),あるいは絶縁スペーサ6(図10参照)
の介在により、リードフレーム2のダイパッド部2aと
ヒートシンク3との間に成形樹脂4で充填された狭隘な
絶縁間隔が保持できるものの、一方では前記した樹脂突
起5a,絶縁スペーサ6と成形樹脂4との間の界面に起
因して次に記すような絶縁耐力低下の問題が派生する。
According to the above construction, the resin projection 5a projecting downward from the resin block.
(See FIG. 9) or insulating spacer 6 (See FIG. 10)
, A narrow insulating space filled with the molding resin 4 can be maintained between the die pad portion 2a of the lead frame 2 and the heat sink 3, but on the other hand, the resin protrusion 5a, the insulating spacer 6, and the molding resin 4 The interface described below causes a problem of a decrease in dielectric strength as described below.

【0008】すなわち、リードフレーム2(高電圧側)
とこれに対向するヒートシンク3(接地側)との間にま
たがり、狭隘な絶縁間隔内に封止用の成形樹脂4と樹脂
突起5a,あるいは絶縁スペーサ6が複合材の形で併存
していると、複合材の界面に沿って貫通絶縁破壊が生じ
易くなる。この界面の絶縁破壊特性については、論文
「エポキシ注型レジンと埋込物の界面の絶縁破壊特性」
(門谷建蔵,他4名:昭和60年電気学会東京支部大会
の講演予稿論文集に掲載)にも述べられており、その破
壊電圧は樹脂間の界面長さが短い程小さくなり、特に誘
電率が異なる異種樹脂間の界面では不平等な電界集中に
より発生するトリーイング絶縁破壊の影響も受け、これ
により樹脂単独の絶縁耐力と較べて破壊電圧が約30%
も大きく低下するようになる。
That is, the lead frame 2 (high voltage side)
When the molding resin 4 for sealing and the resin protrusions 5a or the insulating spacers 6 coexist in a narrow insulating space between the heat sink 3 and the heat sink 3 (ground side) opposed thereto. In addition, through dielectric breakdown easily occurs along the interface of the composite material. Regarding the dielectric breakdown characteristics of this interface, see the paper "Dielectric breakdown characteristics of the interface between epoxy cast resin and embedded material."
(Kenya Kadoya, 4 others: published in the proceedings of the lecture meeting of the Institute of Electrical Engineers of Japan, Tokyo Section Meeting). The interface between different resins with different ratios is also affected by treeing dielectric breakdown caused by unequal electric field concentration, which results in a breakdown voltage of about 30% compared to the dielectric strength of the resin alone.
Is also greatly reduced.

【0009】かかる点、図9,図10の構成では、リー
ドフレーム2とヒートシンク3とが狭隘な絶縁間隔を隔
てて平坦面同士で対向している。したがって、リードフ
レーム2とヒートシンク3との間にまたがる異種樹脂間
の界面長さは、狭隘な絶縁間隔に相応して僅か100〜
300μm程度である。したがって、このままでは半導
体装置の通電に伴い樹脂間の界面に沿ってリードフレー
ム2とヒートシンク3との間に貫通絶縁破壊が発生して
絶縁不良を引き起こすおそれがある。
In this respect, in the configurations shown in FIGS. 9 and 10, the lead frame 2 and the heat sink 3 face each other on a flat surface with a narrow insulating space. Therefore, the interface length between the different kinds of resins extending between the lead frame 2 and the heat sink 3 is only 100 to 100 in accordance with the narrow insulation interval.
It is about 300 μm. Therefore, if the semiconductor device is energized as it is, through insulation breakdown may occur between the lead frame 2 and the heat sink 3 along the interface between the resins along with the interface between the resins, which may cause insulation failure.

【0010】この発明は上記の点にかんがみなされたも
のであり、リードフレームとヒートシンクとの間の伝熱
抵抗を低く抑えて高い放熱性を得つつ、一方では両者間
に高い絶縁耐力が確保できるように改良した高信頼性の
樹脂封止型半導体装置を提供することを目的とする。
[0010] The present invention has been made in view of the above points, and it is possible to obtain a high heat dissipation property by suppressing a heat transfer resistance between a lead frame and a heat sink, while ensuring a high dielectric strength between them. It is an object of the present invention to provide a highly reliable resin-encapsulated semiconductor device improved as described above.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するため
に、この発明では樹脂封止型半導体装置を次記のように
構成するものとする。 (1) 請求項1の発明では、半導体チップと、半導体チッ
プをマウントしたリードフレームと、該リードフレーム
のダイパッド部の裏面側に狭隘な絶縁間隔を隔てて対向
配置したヒートシンクとからなり、これら各部材を成形
樹脂で一体に封止した樹脂封止型半導体装置において、
リードフレームのダイパッド部,ヒートシンクの少なく
とも一方の部材に、対向部材に向けて膨出する凸部を形
成するとともに、該凸部の端面,および周面を絶縁樹脂
層で覆い、ヒートシンクの上にリードフレームを重ね合
わせた状態でその周域を成形樹脂により封止するものと
し、ここでの具体的な態様として、前記の絶縁樹脂層
を、凸部の表面に絶縁間隔に相応した厚さを有する良伝
熱性の接着性絶縁シートを被覆して形成する(請求項
2),あるいは凸部の表面に絶縁間隔に相応した厚さに
良伝熱性の液状樹脂をコーティングして形成する(請求
項3)。
In order to achieve the above object, in the present invention, a resin-sealed semiconductor device is constructed as follows. (1) According to the first aspect of the present invention, a semiconductor chip, a lead frame on which the semiconductor chip is mounted, and a heat sink opposed to each other with a narrow insulating space on the back surface side of the die pad portion of the lead frame are provided. In a resin-sealed semiconductor device in which members are integrally sealed with a molding resin,
At least one of the die pad portion of the lead frame and the heat sink has a convex portion bulging toward the facing member, and the end surface and the peripheral surface of the convex portion are covered with an insulating resin layer. In a state in which the frames are overlapped, the peripheral area thereof is sealed with a molding resin, and as a specific embodiment, the insulating resin layer has a thickness corresponding to the insulating interval on the surface of the projection. It is formed by coating an adhesive insulating sheet having good heat conductivity (Claim 2), or by coating a liquid resin having good heat conductivity on the surface of the projection to a thickness corresponding to the insulation interval (Claim 3). ).

【0012】上記構成によれば、半導体チップをマウン
トしたリードフレームのダイパッド部とヒートシンクと
の間の放熱経路となる狭隘な絶縁間隔(50〜300μ
m)が凸部の端面領域に形成されており、これに対して
半導体チップの放熱に殆ど関与しない凸部から外れた領
域では、リードフレームとヒートシンクとの間の間隔が
拡大(例えば500〜2000μm)する。そして、こ
の凸部の端面,周面を均質な良伝熱性の絶縁樹脂で覆
い、その外周側を成形樹脂で封止することにより、絶縁
樹脂/封止樹脂間の界面が間隔の拡大した領域に形成さ
れ、狭隘な絶縁間隔の領域内には界面が存在しなくな
る。
According to the above configuration, a narrow insulation space (50-300 μm) serving as a heat radiation path between the die pad portion of the lead frame on which the semiconductor chip is mounted and the heat sink.
m) is formed in the end face region of the convex portion, whereas in the region deviated from the convex portion which hardly contributes to heat dissipation of the semiconductor chip, the distance between the lead frame and the heat sink is increased (for example, 500 to 2000 μm). ). Then, the end face and the peripheral face of the convex portion are covered with a uniform insulating resin having good heat conductivity, and the outer peripheral side is sealed with a molding resin. And no interface is present in the region of the narrow insulation gap.

【0013】これにより、リードフレームとヒートシン
クとの間の放熱経路領域での熱抵抗を低く抑えつつ、一
方ではリードフレームとヒートシンクの間にまたがる樹
脂間の界面の長さが大きくなるので、界面に起因する絶
縁破壊電圧が高まって絶縁耐力が増強される。 (2) また、請求項4の発明では、半導体チップと、半導
体チップをマウントしたリードフレームと、該リードフ
レームのダイパッド部の裏面側に狭隘な絶縁間隔を隔て
て対向配置したヒートシンクとからなり、リードフレー
ムのダイパッド部とヒートシンクとの間に絶縁間隔保持
用の絶縁スペーサを介在させた上で、前記絶縁間隔を含
めて前記各部材を成形樹脂で封止した樹脂封止型半導体
装置において、リードフレームのダイパッド部,ヒート
シンクの少なくとも一方の部材に、対向部材に向けて膨
出する凸部を形成するとともに、前記の絶縁スペーサを
凸部の外側位置に配してヒートシンクとリードフレーム
との間に介挿し、この状態で成形樹脂により封止して構
成するもるものとし、ここでの具体的な態様として、前
記の絶縁スペーサに接着性絶縁シート,ないし硬化済の
樹脂片を用い(請求項5)、さらには前記凸部の周面,
およびリードフレームのダイパッド部とこれに対向する
ヒートシンクとの間の狭隘な絶縁間隔を成形樹脂とは別
な良伝熱性の絶縁樹脂層で封止する(請求項6)などの
構成がある。
Accordingly, while the thermal resistance in the heat radiation path region between the lead frame and the heat sink is kept low, the length of the interface between the resin extending between the lead frame and the heat sink is increased. The resulting dielectric breakdown voltage is increased and the dielectric strength is enhanced. (2) Further, according to the invention of claim 4, the semiconductor chip, a lead frame on which the semiconductor chip is mounted, and a heat sink opposed to the back side of the die pad portion of the lead frame with a narrow insulating interval, In a resin-sealed semiconductor device in which an insulating spacer for maintaining an insulating interval is interposed between a die pad portion of a lead frame and a heat sink, and each of the members including the insulating interval is sealed with a molding resin, At least one member of the die pad portion of the frame and the heat sink is formed with a convex portion bulging toward the facing member, and the insulating spacer is disposed outside the convex portion to provide a space between the heat sink and the lead frame. It is assumed that the insulating spacer is inserted and sealed in this state by molding resin. An adhesive insulating sheet or a cured resin piece is used (Claim 5).
In addition, there is a configuration in which a narrow insulating space between a die pad portion of a lead frame and a heat sink opposed to the die pad portion is sealed with a good heat conductive insulating resin layer different from the molding resin.

【0014】この構成によれば、封止樹脂/絶縁スペー
サ間の界面が狭隘な絶縁間隔から外れて凸部外周域の間
隔の拡大した領域に形成され、狭隘な絶縁間隔の領域内
には界面が存在しなくなる。したがって、前項(1) の構
成と同様に界面長が増大して高い絶縁耐力が確保される
ようになる。
According to this structure, the interface between the sealing resin and the insulating spacer is formed in a region where the gap between the outer peripheral region of the convex portion and the narrow insulating interval is deviated from the narrow insulating interval. Will no longer exist. Therefore, the interface length is increased and the high dielectric strength is ensured, as in the configuration of the above item (1).

【0015】[0015]

【発明の実施の形態】以下、この発明の実施の形態を図
1〜図7に示す実施例に基づいて説明する。なお、図示
実施例において図8〜図10に対応する同一部材には同
じ符号が付してある。 〔実施例1〕図1はこの発明の請求項1に対応する実施
例を示すものである。この実施例の半導体装置は、基本
的に図8に示した従来構成と同様であるが、特にヒート
シンク3には、リードフレーム2のダイパッド部2aと
対向して半導体チップ1の直下面域にリードフレーム2
の裏面に向けて膨出する凸部3aが形成されており、こ
の凸部3aの端面(頂面),および周面を絶縁樹脂層7
で覆った上で、凸部3aの上に半導体チップ1をマウン
トしたリードフレーム2を搭載し、この状態で各部材の
周域が成形樹脂4で封止された構造になる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the embodiments shown in FIGS. In the illustrated embodiment, the same reference numerals are given to the same members corresponding to FIGS. [Embodiment 1] FIG. 1 shows an embodiment corresponding to claim 1 of the present invention. The semiconductor device of this embodiment is basically the same as the conventional configuration shown in FIG. 8, but in particular, the heat sink 3 is provided with a lead in the area directly under the semiconductor chip 1 facing the die pad portion 2a of the lead frame 2. Frame 2
A convex portion 3a bulging toward the back surface of the convex portion 3a is formed, and an end surface (top surface) and a peripheral surface of the convex portion 3a
Then, the lead frame 2 on which the semiconductor chip 1 is mounted is mounted on the projection 3a, and in this state, the peripheral area of each member is sealed with the molding resin 4.

【0016】ここで、図示の組立構造では、リードフレ
ーム2のダイパッド部2aとヒートシンク3の凸部3a
との間の伝熱経路として機能する狭隘な絶縁間隔dは5
0〜300μm程度に設定するものとして、この絶縁間
隔dに相応した厚さをもった伝熱性の高い接着性絶縁シ
ートを凸部3aの端面,周面を継ぎ目なく覆うように被
着するか、あるいは液状樹脂(カチオン重合エポキシ系
樹脂)として無機フィラー(結晶性シリカなど)を混合
して熱伝導率を高めたエポキシ樹脂(λ=3〜3.5W
/mK)を凸部3aの端面,周面にコーティングして絶
縁樹脂層7を形成している。また、凸部3aの高さhは
100μm〜2mmに設定し、凸部3aの外周域ではリ
ードフレーム2とヒートシンク3との間の間隔がd+h
に拡大するようにしている。
Here, in the illustrated assembly structure, the die pad portion 2a of the lead frame 2 and the convex portion 3a of the heat sink 3
The narrow insulation distance d that functions as a heat transfer path between
Assuming that the thickness is set to about 0 to 300 μm, a highly heat-conductive adhesive insulating sheet having a thickness corresponding to the insulation interval d is applied so as to seamlessly cover the end surface and the peripheral surface of the convex portion 3a, or Alternatively, an epoxy resin ([lambda] = 3 to 3.5 W) having an increased thermal conductivity by mixing an inorganic filler (such as crystalline silica) as a liquid resin (cationically polymerized epoxy resin).
/ MK) on the end surface and the peripheral surface of the convex portion 3a to form the insulating resin layer 7. The height h of the projection 3a is set to 100 μm to 2 mm, and the distance between the lead frame 2 and the heat sink 3 is d + h in the outer peripheral area of the projection 3a.
To expand.

【0017】かかる構成によれば、リードフレーム2と
ヒートシンク3との間にまたがる成形樹脂4/絶縁樹脂
層7間の界面が凸部3aの外周側に形成され、その界面
長(d+h)は狭隘な絶縁間隔dに較べて6〜10倍に
拡大する。これにより、リードフレーム2とヒートシン
ク3との間の伝熱抵抗を増大させることなく、成形樹脂
4/絶縁樹脂層7間の界面に起因して電圧印加時に生じ
る貫通絶縁破壊が起きにくくなり、従来構造と較べて絶
縁耐力が向上する。
According to this structure, the interface between the molding resin 4 and the insulating resin layer 7 extending between the lead frame 2 and the heat sink 3 is formed on the outer peripheral side of the projection 3a, and the interface length (d + h) is narrow. It is 6 to 10 times larger than the insulating distance d. As a result, through dielectric breakdown which occurs at the time of voltage application due to the interface between the molding resin 4 and the insulating resin layer 7 does not easily occur without increasing the heat transfer resistance between the lead frame 2 and the heat sink 3, The dielectric strength is improved as compared with the structure.

【0018】〔実施例2〕図2は先記実施例1の応用実
施例を示すものである。この実施例においては、図1と
は逆にリードフレーム2のダイパッド部2aにヒートシ
ンク3に向けて膨出する凸部2bを形成し、かつこの凸
部2bの端面,周面を絶縁樹脂層7で封止した上で両者
の間に半導体チップ1の放熱経路となる狭隘な絶縁間隔
を確保するようにしている。ここで、絶縁樹脂層7で覆
われた絶縁間隔d,および凸部2bの高さhは実施例1
と同様に設定されており、これによりリードフレーム2
とヒートシンク3との間で高い放熱性と高い絶縁耐力が
確保できる。
[Embodiment 2] FIG. 2 shows an applied embodiment of Embodiment 1 described above. In this embodiment, a projection 2b bulging toward the heat sink 3 is formed on the die pad 2a of the lead frame 2 in a direction opposite to FIG. Then, a narrow insulation space serving as a heat radiation path of the semiconductor chip 1 is secured between them. Here, the insulating interval d covered by the insulating resin layer 7 and the height h of the convex portion 2b are the same as those in the first embodiment.
Is set in the same manner as described above.
High heat dissipation and high dielectric strength can be secured between the heat sink 3 and the heat sink 3.

【0019】〔実施例3〕図3は実施例2とさらに異な
る応用実施例を示すものであり、この実施例において
は、リードフレーム2のダイパッド2aの裏面,および
ヒートシンク3の上面にそれぞれ向かい合う凸部2b,
3aが形成されており、かつ凸部2b,3aの端面,周
面を絶縁樹脂層7で封止した上で、凸部2bと3aの端
面を重ね合わせて両者間に半導体チップ1の放熱経路と
なる狭隘な絶縁間隔を保持するようにしてリードフレー
ム2とヒートシンク3との間で高い放熱性と高い絶縁耐
力を確保するようにしている。
[Embodiment 3] FIG. 3 shows an application embodiment which is further different from Embodiment 2, in which a convex surface facing a back surface of a die pad 2a of a lead frame 2 and an upper surface of a heat sink 3 respectively. Part 2b,
3a are formed, and the end surfaces and the peripheral surfaces of the protrusions 2b and 3a are sealed with an insulating resin layer 7. Then, the end surfaces of the protrusions 2b and 3a are overlapped and a heat radiation path of the semiconductor chip 1 is provided therebetween. By maintaining a narrow insulation interval, high heat dissipation and high dielectric strength between the lead frame 2 and the heat sink 3 are ensured.

【0020】また、前記した実施例2,3に適用するリ
ードフレーム2の変形例を図4(a)〜(c) に示す。ここ
で、図4(a),(b) はダイパッド部2aを断面U字状に屈
曲加工して凸部2bを形成した両持ち,片持ち梁構造の
リードフレームを、また図4(c) は肉厚な凸部2bの片
側から梁を突き出した片持ち梁構造のリードフレームを
示し、凸部2bの端面,および周面を絶縁樹脂層7で覆
っている。
FIGS. 4A to 4C show modified examples of the lead frame 2 applied to the second and third embodiments. Here, FIGS. 4 (a) and 4 (b) show a doubly supported, cantilevered lead frame in which a die pad portion 2a is bent into a U-shaped cross section to form a convex portion 2b. Denotes a cantilevered lead frame in which a beam protrudes from one side of the thick convex portion 2b. The end surface and the peripheral surface of the convex portion 2b are covered with an insulating resin layer 7.

【0021】さらに、図5(a),(b) は実施例1に適用す
るヒートシンク3の変形例を示すものであり、図5(a)
は凸部3aがヒートシンク3の端部に片寄して形成した
構造を、図5(b) はヒートシンク3をリードフレームの
ダイパッド部2aに対応した大きさとして、その端面,
周面を絶縁樹脂層7で覆った構造である。 〔実施例4〕図6はこの発明の請求項4に対応する実施
例を示すものである。この実施例においては、ヒートシ
ンク3の上面側にリードフレーム2のダイパッド部2a
に向けて先記した実施例1と同様に凸部3aが膨出形成
されており、さらに凸部3aよりも外周側の位置(例え
ば四隅)にパッド状の絶縁スペーサ6を配し、この絶縁
スペーサ6を介してリードフレームのダイパッド部2a
とヒートシンク3との間に放熱経路となる狭隘な絶縁間
隔を確保している。そして、この組立て状態で成形樹脂
4により各部材の間を封止し、リードフレーム2とヒー
トシンク3との間の狭隘な絶縁隙間を樹脂4で充填す
る。
FIGS. 5A and 5B show a modification of the heat sink 3 applied to the first embodiment.
FIG. 5B shows a structure in which the convex portion 3a is offset to the end of the heat sink 3, and FIG. 5B shows a structure in which the heat sink 3 is sized to correspond to the die pad portion 2a of the lead frame.
It has a structure in which the peripheral surface is covered with an insulating resin layer 7. [Embodiment 4] FIG. 6 shows an embodiment corresponding to claim 4 of the present invention. In this embodiment, the die pad portion 2a of the lead frame 2 is provided on the upper surface side of the heat sink 3.
In the same manner as in the first embodiment described above, a convex portion 3a is formed in a bulging manner, and pad-like insulating spacers 6 are arranged at positions (for example, four corners) on the outer peripheral side of the convex portion 3a. Die pad portion 2a of the lead frame via spacer 6
A narrow insulation space serving as a heat dissipation path is secured between the heat sink 3 and the heat sink 3. Then, in this assembled state, the members are sealed with the molding resin 4, and the narrow insulating gap between the lead frame 2 and the heat sink 3 is filled with the resin 4.

【0022】ここで、ヒートシンク3の凸部3aの高さ
hを100μm〜2mm、狭隘な絶縁間隔dを50〜3
00μmとして、スペーサ6の高さHをh+dに設定す
る。なお、絶縁スペーサ6には、両面に接着剤を塗布し
た絶縁シート、あるいは硬化済の樹脂片(この樹脂片は
成形樹脂4,先記の実施例1〜3で述べた絶縁樹脂層7
と同種,あるいは異種の樹脂)を用いる。
Here, the height h of the protrusion 3a of the heat sink 3 is set to 100 μm to 2 mm, and the narrow insulation interval d is set to 50 to 3 mm.
The height H of the spacer 6 is set to h + d. The insulating spacer 6 has an insulating sheet coated with an adhesive on both sides or a cured resin piece (this resin piece is a molding resin 4, the insulating resin layer 7 described in the first to third embodiments).
Same or different resin).

【0023】かかる構成により、成形樹脂4で封止した
組立状態では、成形樹脂4と絶縁スペーサ6との間の界
面が凸部3aより外れた間隔拡大域に形成されることに
なり、図10に示した従来構造と較べて、リードフレー
ム2とヒートシンク3との間にまたがる成形樹脂4/絶
縁スペーサ6間の界面長が6〜10倍に増加する。これ
により、封止樹脂4/絶縁スペーサ6間の界面に起因し
て電圧印加時に生じる貫通絶縁破壊が起きにくくなり、
従来構造と較べて絶縁耐力が向上する。
With such a configuration, in the assembled state in which the molding resin 4 is sealed, the interface between the molding resin 4 and the insulating spacer 6 is formed in a region where the interval is deviated from the convex portion 3a. The interface length between the molding resin 4 and the insulating spacer 6 extending between the lead frame 2 and the heat sink 3 is increased 6 to 10 times as compared with the conventional structure shown in FIG. This makes it difficult for through dielectric breakdown to occur when a voltage is applied due to the interface between the sealing resin 4 and the insulating spacer 6,
The dielectric strength is improved as compared with the conventional structure.

【0024】なお、前記の凸部はヒートシンク側に形成
するほか、リードフレームのダイパッド部の裏面側に形
成して実施することもできる。 〔実施例5〕次に、先記の実施例4に対するいくつかの
応用実施例を図7(a) 〜(c) に示す。すなわち、図6の
実施例では、リードフレーム2のダイパッド部2aとヒ
ートシンク3の凸部3aとの間の狭隘な絶縁間隔を含め
て全体を成形樹脂4で封止するようにしている。これに
対して、この実施例では凸部3aの周面域を含めてリー
ドフレーム2との間の狭隘間隔が成形樹脂4による封止
とは別に良伝熱性の絶縁樹脂層7で封止されている。な
お、この絶縁樹脂層7は先述の実施例1で述べた液状樹
脂をコーティングして形成することができる。
The above-mentioned convex portion may be formed on the back surface side of the die pad portion of the lead frame, instead of being formed on the heat sink side. [Embodiment 5] Next, FIGS. 7 (a) to 7 (c) show some applications of the embodiment 4 described above. That is, in the embodiment of FIG. 6, the entire structure including the narrow insulating space between the die pad portion 2a of the lead frame 2 and the convex portion 3a of the heat sink 3 is sealed with the molding resin 4. On the other hand, in this embodiment, the narrow space between the lead frame 2 and the peripheral surface area of the projection 3a is sealed with the insulating resin layer 7 having good heat conductivity separately from the sealing with the molding resin 4. ing. The insulating resin layer 7 can be formed by coating the liquid resin described in the first embodiment.

【0025】ここで、図7(a) は絶縁樹脂層7が凸部3
aの頂面,および周面域に形成されており、図7(b) で
は絶縁樹脂層7が絶縁スペーサ6の内側まで充填され、
図7(c) では絶縁樹脂層7が絶縁スペーサ6の外側域に
まで充填されている。
Here, FIG. 7A shows that the insulating resin layer 7 is
7A, the insulating resin layer 7 is filled up to the inside of the insulating spacer 6 in FIG.
In FIG. 7C, the insulating resin layer 7 is filled up to the region outside the insulating spacer 6.

【0026】[0026]

【発明の効果】以上述べたようにこの発明によれば、半
導体チップと、半導体チップをマウントしたリードフレ
ームと、該リードフレームのダイパッド部の裏面側に狭
隘な絶縁間隔を隔てて対向配置したヒートシンクとから
なり、これら各部材を一体に成形樹脂で封止した樹脂封
止型半導体装置において、 (1) リードフレームのダイパッド部,ヒートシンクの少
なくとも一方の部材に、対向部材に向けて膨出する凸部
を形成するとともに、該凸部の端面,および周面を絶縁
樹脂層で覆い、ヒートシンクの上にリードフレームを重
ね合わせた状態でその周域を成形樹脂により封止する。
As described above, according to the present invention, a semiconductor chip, a lead frame on which the semiconductor chip is mounted, and a heat sink opposed to each other on the back side of the die pad portion of the lead frame with a narrow insulating space therebetween. In a resin-encapsulated semiconductor device in which each of these members is integrally sealed with a molding resin, (1) at least one of a die pad portion of a lead frame and a heat sink protrudes toward an opposing member. While forming a portion, the end surface and the peripheral surface of the convex portion are covered with an insulating resin layer, and the peripheral region is sealed with a molding resin in a state where the lead frame is overlaid on the heat sink.

【0027】(2) リードフレームのダイパッド部とヒー
トシンクとの間に絶縁間隔保持用の絶縁スペーサを介在
させた上で、前記絶縁間隔を含めて前記各部材を一体に
成形樹脂で封止した樹脂封止型半導体装置において、リ
ードフレームのダイパッド部,ヒートシンクの少なくと
も一方の部材に、対向部材に向けて膨出する凸部を形成
するとともに、凸部の外側に絶縁間隔保持用の絶縁スペ
ーサを配してヒートシンクとリードフレームとの間に狭
隘な絶縁間隔を保持し、この状態で成形樹脂により封止
する。
(2) A resin in which an insulating spacer for maintaining an insulating interval is interposed between a die pad portion of a lead frame and a heat sink, and the members including the insulating interval are integrally sealed with a molding resin. In a sealed type semiconductor device, at least one of a die pad portion of a lead frame and a heat sink has a convex portion bulging toward an opposing member, and an insulating spacer for maintaining an insulating interval is arranged outside the convex portion. Then, a narrow insulating space is maintained between the heat sink and the lead frame, and in this state, sealing is performed with a molding resin.

【0028】上記構成によれば、半導体チップをマウン
トしたリードフレームのダイパッド部とヒートシンクと
の間の放熱経路となる狭隘な絶縁間隔(50〜300μ
m)が凸部の端面領域に形成されており、これに対して
半導体チップの放熱に殆ど関与しない凸部の外側領域で
は、リードフレームとヒートシンクとの間の間隔が拡大
(例えば500〜2000μm)する。したがって、各
部材の全体を成形樹脂で封止した組立状態では、凸部の
周面を覆った絶縁樹脂と封止樹脂間の界面、あるいは絶
縁スペーサと封止樹脂間の界面が間隔の拡大した領域に
形成され、狭隘な絶縁間隔の領域内には絶縁耐力の弱点
となる界面が存在しなくなる。
According to the above configuration, a narrow insulation space (50 to 300 μm) serving as a heat radiation path between the die pad portion of the lead frame on which the semiconductor chip is mounted and the heat sink.
m) is formed in the end face region of the convex portion, while the space between the lead frame and the heat sink is increased (for example, 500 to 2000 μm) in the outer region of the convex portion that hardly contributes to heat dissipation of the semiconductor chip. I do. Therefore, in the assembled state in which each member is entirely sealed with the molding resin, the interface between the insulating resin and the sealing resin covering the peripheral surface of the convex portion or the interface between the insulating spacer and the sealing resin has an increased interval. An interface which is formed in a region and has a narrow insulation gap does not exist as a weak point of the dielectric strength.

【0029】これにより、リードフレームとヒートシン
クとの間の放熱経路領域での熱抵抗を低く抑えつつ、リ
ードフレームとヒートシンクの間にまたがる樹脂間の界
面に起因する貫通破壊の耐電圧を従来構造と較べて大幅
に高め、放熱性,絶縁耐力に優れた樹脂封止型半導体装
置を提供することができる。
Thus, the withstand voltage of penetration breakdown caused by the interface between the lead frame and the resin extending between the lead frame and the heat sink can be reduced while maintaining the thermal resistance in the heat radiation path region between the lead frame and the heat sink low. This makes it possible to provide a resin-encapsulated semiconductor device which is significantly improved in comparison with the above and has excellent heat dissipation and dielectric strength.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の実施例1に対応する樹脂封止型半導
体装置の構成断面図
FIG. 1 is a configuration sectional view of a resin-sealed semiconductor device according to a first embodiment of the present invention;

【図2】この発明の実施例2に対応する樹脂封止型半導
体装置の構成断面図
FIG. 2 is a configuration sectional view of a resin-sealed semiconductor device according to a second embodiment of the present invention;

【図3】この発明の実施例3に対応する樹脂封止型半導
体装置の構成断面図
FIG. 3 is a configuration sectional view of a resin-encapsulated semiconductor device according to a third embodiment of the present invention;

【図4】実施例2,3に適用するリードフレームの変形
実施例を示し、(a) 〜(c) はそれぞれ異なる実施例の断
面図
FIG. 4 shows a modified embodiment of the lead frame applied to the second and third embodiments, wherein (a) to (c) are cross-sectional views of different embodiments.

【図5】実施例1ないし4に適用するヒートシンクの変
形実施例を示し、(a),(b) はそれぞれ異なる実施例の断
面図
FIG. 5 shows a modified embodiment of the heat sink applied to the first to fourth embodiments, and (a) and (b) are cross-sectional views of different embodiments.

【図6】この発明の実施例4に対応する樹脂封止型半導
体装置の構成断面図
FIG. 6 is a configuration sectional view of a resin-sealed semiconductor device according to a fourth embodiment of the present invention;

【図7】実施例4の応用実施例である実施例5に対応す
る樹脂封止型半導体装置の構成を示し、(a) 〜(c) はそ
れぞれ異なる実施例の断面図
7A and 7B show a configuration of a resin-sealed semiconductor device corresponding to a fifth embodiment which is an applied embodiment of the fourth embodiment, and FIGS. 7A to 7C are cross-sectional views of different embodiments.

【図8】従来の樹脂封止型半導体装置の構成断面図FIG. 8 is a configuration sectional view of a conventional resin-encapsulated semiconductor device.

【図9】図8と別な従来の樹脂封止型半導体装置の構成
断面図
9 is a cross-sectional view of a configuration of another conventional resin-encapsulated semiconductor device different from FIG.

【図10】図9とさらに別な従来の樹脂封止型半導体装
置の構成断面図
FIG. 10 is a sectional view showing the configuration of another conventional resin-encapsulated semiconductor device different from that of FIG. 9;

【符号の説明】[Explanation of symbols]

1 半導体チップ 2 リードフレーム 2a ダイパッド部 2b 凸部 3 ヒートシンク 3a 凸部 4 成形樹脂 6 絶縁スペーサ 7 絶縁樹脂層 DESCRIPTION OF SYMBOLS 1 Semiconductor chip 2 Lead frame 2a Die pad part 2b Convex part 3 Heat sink 3a Convex part 4 Molding resin 6 Insulating spacer 7 Insulating resin layer

フロントページの続き (72)発明者 池田 良成 神奈川県川崎市川崎区田辺新田1番1号 富士電機株式会社内Continuation of the front page (72) Inventor Yoshinari Ikeda 1-1, Tanabe Nitta, Kawasaki-ku, Kawasaki-shi, Kanagawa Prefecture Fuji Electric Co., Ltd.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】半導体チップと、半導体チップをマウント
したリードフレームと、該リードフレームのダイパッド
部の裏面側に狭隘な絶縁間隔を隔てて対向配置したヒー
トシンクとからなり、これら各部材を一体に成形樹脂で
封止した樹脂封止型半導体装置において、リードフレー
ムのダイパッド部,ヒートシンクの少なくとも一方の部
材に、対向部材に向けて膨出する凸部を形成するととも
に、該凸部の端面,および周面を絶縁樹脂層で覆い、ヒ
ートシンクの上にリードフレームを重ね合わせた状態で
その周域を成形樹脂により封止したことを特徴とする樹
脂封止型半導体装置。
1. A semiconductor device comprising: a semiconductor chip; a lead frame on which the semiconductor chip is mounted; and a heat sink opposed to a back surface of a die pad portion of the lead frame with a narrow insulating space therebetween, and these members are integrally formed. In a resin-sealed semiconductor device sealed with a resin, at least one of a die pad portion of a lead frame and a heat sink has a convex portion bulging toward an opposing member, and an end face and a peripheral portion of the convex portion. A resin-encapsulated semiconductor device, the surface of which is covered with an insulating resin layer, and a peripheral region thereof is sealed with a molding resin in a state where a lead frame is overlaid on a heat sink.
【請求項2】請求項1記載の半導体装置において、凸部
の表面に絶縁間隔に相応した厚さを有する良伝熱性の接
着性絶縁シートを被覆して絶縁樹脂層を形成したことを
特徴とする樹脂封止型半導体装置。
2. The semiconductor device according to claim 1, wherein an insulating resin layer is formed by covering a surface of the projection with a good heat conductive adhesive insulating sheet having a thickness corresponding to an insulating interval. Resin-encapsulated semiconductor device.
【請求項3】請求項1記載の半導体装置において、凸部
の表面に絶縁間隔に相応した厚さに良伝熱性の液状樹脂
をコーティングして絶縁樹脂層を形成したことを特徴と
する樹脂封止型半導体装置。
3. The semiconductor device according to claim 1, wherein the surface of the projection is coated with a liquid resin having good thermal conductivity to a thickness corresponding to the insulating interval to form an insulating resin layer. Stop type semiconductor device.
【請求項4】半導体チップと、半導体チップをマウント
したリードフレームと、該リードフレームのダイパッド
部の裏面側に狭隘な絶縁間隔を隔てて対向配置したヒー
トシンクとからなり、リードフレームのダイパッド部と
ヒートシンクとの間に絶縁間隔保持用の絶縁スペーサを
介在させた上で、前記絶縁間隔を含めて前記各部材を一
体に成形樹脂で封止した樹脂封止型半導体装置におい
て、リードフレームのダイパッド部,ヒートシンクの少
なくとも一方の部材に、対向部材に向けて膨出する凸部
を形成するとともに、前記絶縁スペーサを凸部の外側に
配してヒートシンクとリードフレームとの間に介挿し、
この状態で成形樹脂により封止したことを特徴とする樹
脂封止型半導体装置。
4. A semiconductor device comprising: a semiconductor chip; a lead frame on which the semiconductor chip is mounted; and a heat sink opposed to the back side of the die pad portion of the lead frame with a narrow insulating space therebetween. In a resin-encapsulated semiconductor device in which an insulating spacer for maintaining an insulation interval is interposed between the semiconductor device and each member including the insulation interval is integrally sealed with a molding resin, a die pad portion of a lead frame, On at least one member of the heat sink, a convex portion bulging toward the facing member is formed, and the insulating spacer is arranged outside the convex portion and inserted between the heat sink and the lead frame,
A resin-sealed semiconductor device characterized by being sealed with a molding resin in this state.
【請求項5】請求項4記載の半導体装置において、絶縁
スペーサに接着性絶縁シート,ないし硬化済の樹脂片を
用いたことを特徴とする樹脂封止型半導体装置。
5. The semiconductor device according to claim 4, wherein an adhesive insulating sheet or a cured resin piece is used for the insulating spacer.
【請求項6】請求項4記載の半導体装置において、凸部
の周面,およびリードフレームのダイパッド部とこれに
対向するヒートシンクとの間の狭隘な絶縁間隔を成形樹
脂とは別な良伝熱性の絶縁樹脂層で封止したことを特徴
とする樹脂封止型半導体装置。
6. The semiconductor device according to claim 4, wherein a narrow insulating space between the peripheral surface of the convex portion and the die pad portion of the lead frame and the heat sink opposed thereto is provided with a good heat transfer property different from the molding resin. A resin-encapsulated semiconductor device characterized by being sealed with an insulating resin layer.
JP4224298A 1998-02-24 1998-02-24 Resin-sealed semiconductor device Pending JPH11243166A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4224298A JPH11243166A (en) 1998-02-24 1998-02-24 Resin-sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4224298A JPH11243166A (en) 1998-02-24 1998-02-24 Resin-sealed semiconductor device

Publications (1)

Publication Number Publication Date
JPH11243166A true JPH11243166A (en) 1999-09-07

Family

ID=12630569

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4224298A Pending JPH11243166A (en) 1998-02-24 1998-02-24 Resin-sealed semiconductor device

Country Status (1)

Country Link
JP (1) JPH11243166A (en)

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