JPH11228577A - Production of high-purity spiroglycol - Google Patents
Production of high-purity spiroglycolInfo
- Publication number
- JPH11228577A JPH11228577A JP10028480A JP2848098A JPH11228577A JP H11228577 A JPH11228577 A JP H11228577A JP 10028480 A JP10028480 A JP 10028480A JP 2848098 A JP2848098 A JP 2848098A JP H11228577 A JPH11228577 A JP H11228577A
- Authority
- JP
- Japan
- Prior art keywords
- spiroglycol
- parts
- solvent
- compound
- hours
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000002904 solvent Substances 0.000 claims abstract description 24
- -1 amide compound Chemical class 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- 125000001424 substituent group Chemical group 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 21
- 238000001953 recrystallisation Methods 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract description 45
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract description 39
- 229920005668 polycarbonate resin Polymers 0.000 abstract description 12
- 239000004431 polycarbonate resin Substances 0.000 abstract description 12
- 150000001491 aromatic compounds Chemical class 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 8
- 230000003287 optical effect Effects 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 abstract description 8
- 238000011084 recovery Methods 0.000 abstract description 6
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000004033 plastic Substances 0.000 abstract description 3
- 229920003023 plastic Polymers 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 21
- 239000012046 mixed solvent Substances 0.000 description 19
- 238000004040 coloring Methods 0.000 description 15
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000001291 vacuum drying Methods 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- JJMOMMLADQPZNY-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanal Chemical compound OCC(C)(C)C=O JJMOMMLADQPZNY-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 150000004650 carbonic acid diesters Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003507 refrigerant Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 238000005809 transesterification reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- OKIRBHVFJGXOIS-UHFFFAOYSA-N 1,2-di(propan-2-yl)benzene Chemical compound CC(C)C1=CC=CC=C1C(C)C OKIRBHVFJGXOIS-UHFFFAOYSA-N 0.000 description 2
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002605 large molecules Chemical class 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 238000011085 pressure filtration Methods 0.000 description 2
- ODLMAHJVESYWTB-UHFFFAOYSA-N propylbenzene Chemical compound CCCC1=CC=CC=C1 ODLMAHJVESYWTB-UHFFFAOYSA-N 0.000 description 2
- 239000012429 reaction media Substances 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- 125000003003 spiro group Chemical group 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VIDOPANCAUPXNH-UHFFFAOYSA-N 1,2,3-triethylbenzene Chemical compound CCC1=CC=CC(CC)=C1CC VIDOPANCAUPXNH-UHFFFAOYSA-N 0.000 description 1
- SZURZHQMGVKJLV-UHFFFAOYSA-N 1,2-ditert-butylbenzene Chemical compound CC(C)(C)C1=CC=CC=C1C(C)(C)C SZURZHQMGVKJLV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DVOVBGJJSFSOPZ-UHFFFAOYSA-N 2-acetamidopropanamide Chemical compound NC(=O)C(C)NC(C)=O DVOVBGJJSFSOPZ-UHFFFAOYSA-N 0.000 description 1
- DTJBXPXTAAIRLR-UHFFFAOYSA-N 5-tert-butyl-2,4,8,10-tetraoxaspiro[5.5]undecane Chemical compound CC(C)(C)C1OCOCC11COCOC1 DTJBXPXTAAIRLR-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- XFTIKWYXFSNCQF-UHFFFAOYSA-N N,N-dipropylformamide Chemical compound CCCN(C=O)CCC XFTIKWYXFSNCQF-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- QQGNLKJAIVSNCO-UHFFFAOYSA-N N-butylformamide Chemical compound CCCCNC=O QQGNLKJAIVSNCO-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000006359 acetalization reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005575 aldol reaction Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- MSZJEPVVQWJCIF-UHFFFAOYSA-N butylazanide Chemical compound CCCC[NH-] MSZJEPVVQWJCIF-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- YKOQQFDCCBKROY-UHFFFAOYSA-N n,n-diethylpropanamide Chemical compound CCN(CC)C(=O)CC YKOQQFDCCBKROY-UHFFFAOYSA-N 0.000 description 1
- IFTIBNDWGNYRLS-UHFFFAOYSA-N n,n-dipropylacetamide Chemical compound CCCN(C(C)=O)CCC IFTIBNDWGNYRLS-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010689 synthetic lubricating oil Substances 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
Landscapes
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はスピログリコールを
精製して高純度の3,9−ビス(2−ヒドロキシ−1,
1−ジメチルエチル)−2,4,8,10−テトラオキ
サスピロ[5.5]ウンデカンを製造する方法に関する
ものである。3,9−ビス(2−ヒドロキシ−1,1−
ジメチルエチル)−2,4,8,10−テトラオキサス
ピロ[5.5]ウンデカンは下記の化学構造を有し、本
明細書では以下、この化合物をスピログリコールとい
う。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for purifying spiroglycol to obtain highly pure 3,9-bis (2-hydroxy-1,1).
The present invention relates to a method for producing (1-dimethylethyl) -2,4,8,10-tetraoxaspiro [5.5] undecane. 3,9-bis (2-hydroxy-1,1-
(Dimethylethyl) -2,4,8,10-tetraoxaspiro [5.5] undecane has the following chemical structure, and this compound is hereinafter referred to as spiroglycol in the present specification.
【化3】 Embedded image
【0002】スピログリコールは、ウレタン、エステ
ル、チオール、エーテル化合物等の低分子化合物の合成
原料として、また、ポリウレタン、ポリエステル、ポリ
エーテルポリオール、ポリカーボネート、エポキシ樹脂
等の高分子化合物の重合原料として、更には合成潤滑
油、架橋剤、反応性希釈剤、可塑剤、接着剤、改質剤、
酸化防止剤、光安定剤等の原料として、また光硬化性、
耐薬品性、耐熱性、耐摩耗性、耐衝撃性樹脂の原料とし
て有用である。Spiroglycol is used as a raw material for synthesizing low molecular weight compounds such as urethane, ester, thiol and ether compounds, and as a raw material for polymerizing high molecular weight compounds such as polyurethane, polyester, polyether polyol, polycarbonate and epoxy resin. Are synthetic lubricating oils, crosslinking agents, reactive diluents, plasticizers, adhesives, modifiers,
As a raw material for antioxidants, light stabilizers, etc.
It is useful as a raw material for chemical resistance, heat resistance, abrasion resistance and impact resistance resin.
【0003】中でも、スピログリコール、ビスフェノー
ル類、炭酸ジエステルの重縮合によって得られる共重合
ポリカーボネート樹脂は、透明性、光学物性バランスに
優れ、各種レンズ、プリズム、光ディスク基板などのプ
ラスチック光学材料として好適に利用できるものであ
る。[0003] Among them, copolymerized polycarbonate resins obtained by polycondensation of spiroglycol, bisphenols and carbonic acid diester have excellent balance of transparency and optical properties, and are suitably used as plastic optical materials such as various lenses, prisms and optical disk substrates. You can do it.
【0004】[0004]
【従来の技術】スピログリコールは、ヒドロキシピバル
アルデヒドとペンタエリスリトールとのアセタール化反
応によって製造される。例えば、反応媒体にトルエン、
キシレンなどの溶媒を用いて共沸脱水しながら反応を行
う方法(米国特許第2945008号)、濃塩酸にペン
タエリスリトールを溶解した後ヒドロキシピバルアルデ
ヒドを徐々に添加しながら反応を行う方法(特開昭48
−96590号)、反応媒体に水を用いる方法(米国特
許第3092640号)、反応媒体に有機溶媒を用いる
方法(特開平7−215979号)等が開示されてい
る。2. Description of the Related Art Spiroglycol is produced by an acetalization reaction between hydroxypivalaldehyde and pentaerythritol. For example, toluene,
A method in which the reaction is carried out while azeotropically dehydrating using a solvent such as xylene (US Pat. No. 2,945,008), a method in which pentaerythritol is dissolved in concentrated hydrochloric acid, and then the reaction is carried out while gradually adding hydroxypivalaldehyde (Japanese Patent Application Laid-Open No. H11-163,837). Showa 48
JP-A-96590), a method using water as a reaction medium (U.S. Pat. No. 3,092,640), a method using an organic solvent as a reaction medium (JP-A-7-215979), and the like.
【0005】しかしながら、いずれの方法によって得ら
れたスピログリコールも、未精製のまま原料として使用
すると製品の着色、物性低下等を引き起こす場合があ
る。中でも、未精製スピログリコール(以下、粗スピロ
グリコールと称する)をビスフェノール類および炭酸ジ
エステルとエステル交換反応させた場合、得られる共重
合ポリカーボネート樹脂が著しく着色するという難点が
あり、レンズ、光ディスク基板等の光学材料として外観
上好ましくない。[0005] However, spiroglycol obtained by any of the methods, when used as a raw material without purification, may cause coloration of the product, deterioration of physical properties, and the like. Above all, when unpurified spiroglycol (hereinafter, referred to as crude spiroglycol) is subjected to a transesterification reaction with bisphenols and carbonic acid diester, there is a problem that the obtained copolymerized polycarbonate resin is significantly colored. It is not preferable in appearance as an optical material.
【0006】肉眼で識別困難な程度に着色の少ない共重
合ポリカーボネート樹脂を得るためには、粗スピログリ
コールを精製して用いる必要がある。精製法としては、
蒸留法、昇華法、再結晶法、溶媒抽出法等が代表的な精
製法である。しかし、蒸留法、昇華法、溶媒抽出法では
粗スピログリコールの精製が不十分で共重合ポリカーボ
ネート樹脂の着色を防ぎきれない。また、再結晶法で
は、メタノール、ジオキサン、N,N−ジメチルホルム
アミド等の極性溶媒を用いることにより着色の少ない共
重合ポリカーボネート樹脂を与える高純度のスピログリ
コールを得ることが可能であるが、溶媒使用量が多い、
あるいはスピログリコール回収率が低い、あるいは多回
数の再結晶操作を要する等の難点があり、工業的に多大
の精製コストを要するという問題点を有する。かかる問
題点を解決するような、溶媒使用量が少なく、かつスピ
ログリコール回収率の高い再結晶溶媒系は見いだされて
いなかった。[0006] In order to obtain a copolymerized polycarbonate resin with less coloring to the extent that it is difficult to identify with the naked eye, it is necessary to purify and use crude spiroglycol. As a purification method,
Distillation, sublimation, recrystallization, solvent extraction and the like are typical purification methods. However, in the distillation method, the sublimation method and the solvent extraction method, the purification of the crude spiroglycol is insufficient, and the coloring of the copolymerized polycarbonate resin cannot be prevented. In the recrystallization method, it is possible to obtain a high-purity spiroglycol that gives a copolymer polycarbonate resin with less coloring by using a polar solvent such as methanol, dioxane, or N, N-dimethylformamide. Large amount,
Alternatively, there is a problem that the recovery rate of spiroglycol is low, or a large number of recrystallization operations are required, and there is a problem that a large purification cost is required industrially. A recrystallization solvent system that solves such a problem and uses a small amount of solvent and has a high spiroglycol recovery rate has not been found.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的は、従来
技術における上記したような課題を解決し、溶媒使用量
が少なく、かつスピログリコール回収率が高い再結晶溶
媒を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems in the prior art and to provide a recrystallization solvent which uses a small amount of solvent and has a high spiroglycol recovery rate.
【0008】[0008]
【課題を解決するための手段】本発明者らは、スピログ
リコールの再結晶法による精製において、溶媒使用量が
少なく、かつスピログリコール回収率が高い再結晶溶媒
について鋭意検討を重ねた結果、酸アミドのアルキル置
換体(以下アミド化合物と称する。)と芳香族化合物と
からなる溶媒を再結晶溶媒として用いることにより上記
課題を解決しうることを見いだし本発明に到達した。Means for Solving the Problems In purifying spiroglycol by the recrystallization method, the present inventors have conducted intensive studies on a recrystallization solvent that uses a small amount of solvent and has a high spiroglycol recovery rate. The present inventors have found that the above problem can be solved by using a solvent comprising an alkyl-substituted amide (hereinafter referred to as an amide compound) and an aromatic compound as a recrystallization solvent, and have reached the present invention.
【0009】すなわち、本発明は、下記一般式(1)で
示されるアミド化合物の少なくとも一種と下記一般式
(2)で示される芳香族化合物の少なくとも一種とから
なる溶媒を再結晶溶媒として用いることを特徴とするも
のである。That is, the present invention uses a solvent comprising at least one amide compound represented by the following general formula (1) and at least one aromatic compound represented by the following general formula (2) as a recrystallization solvent. It is characterized by the following.
【化4】 Embedded image
【化5】 Embedded image
【0010】[0010]
【発明の実施の形態】上記式(1)で示されるアミド化
合物として、具体的には、ホルムアミド、アセトアミ
ド、プロピオンアミド、ブチルアミド、N−メチルホル
ムアミド、N−ブチルホルムアミド、N−メチルアセト
アミド、N−メチルプロピオンアミド、N,N−ジメチ
ルホルムアミド、N,N−ジメチルアセトアミド、N,
N−ジメチルプロピオンアミド、N,N−ジエチルホル
ムアミド、N,N−ジエチルアセトアミド、N,N−ジ
エチルプロピオンアミド、N,N−ジプロピルホルムア
ミド、N,N−ジプロピルアセトアミド、N,N−メチ
ルエチルホルムアミド等が例示され、中でもN,N−ジ
メチルホルムアミド、N,N−ジメチルアセトアミドが
好適に使用される。BEST MODE FOR CARRYING OUT THE INVENTION As the amide compound represented by the above formula (1), specifically, formamide, acetamido, propionamide, butylamide, N-methylformamide, N-butylformamide, N-methylacetamido, N-methylacetamido Methylpropionamide, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylacetamide
N-dimethylpropionamide, N, N-diethylformamide, N, N-diethylacetamide, N, N-diethylpropionamide, N, N-dipropylformamide, N, N-dipropylacetamide, N, N-methylethyl Formamide and the like are exemplified. Among them, N, N-dimethylformamide and N, N-dimethylacetamide are preferably used.
【0011】上記式(2)で示される芳香族化合物とし
て、具体的には、ベンゼン、トルエン、キシレン、トリ
メチルベンゼン、テトラメチルベンゼン、エチルベンゼ
ン、ジエチルベンゼン、トリエチルベンゼン、n−プロ
ピルベンゼン、イソプロピルベンゼン、ジ−n−プロピ
ルベンゼン、ジイソプロピルベンゼン、n−ブチルベン
ゼン、ジ−tert−ブチルベンゼン、モノクロロベン
ゼン、テトラリン等が例示され、中でもトルエン、キシ
レンが好適に使用される。Specific examples of the aromatic compound represented by the above formula (2) include benzene, toluene, xylene, trimethylbenzene, tetramethylbenzene, ethylbenzene, diethylbenzene, triethylbenzene, n-propylbenzene, isopropylbenzene and diisopropylbenzene. -N-propylbenzene, diisopropylbenzene, n-butylbenzene, di-tert-butylbenzene, monochlorobenzene, tetralin and the like are exemplified, and among them, toluene and xylene are preferably used.
【0012】本発明において用いられる溶媒は、上記ア
ミド化合物の少なくとも一種と芳香族化合物の少なくと
も一種とからなり、各々二種以上を混合して用いてもよ
い。The solvent used in the present invention comprises at least one of the above-mentioned amide compounds and at least one of the aromatic compounds, and two or more of each may be used as a mixture.
【0013】本発明においては、上記アミド化合物と芳
香族化合物との重量比(芳香族化合物/アミド化合物)
が10/90〜90/10である混合溶媒を用いる。重
量比が10/90より小さい場合には、混合溶媒の使用
量が多くなり好ましくない。また、重量比が90/10
より大きい場合には、スピログリコールの回収率が低く
なるため、また不純物を十分にとりきれないため好まし
くない。より好ましい、アミド化合物と芳香族化合物と
の重量比は20/80〜80/20である。In the present invention, the weight ratio of the amide compound to the aromatic compound (aromatic compound / amide compound)
Is from 10/90 to 90/10. If the weight ratio is less than 10/90, the amount of the mixed solvent used is undesirably large. The weight ratio is 90/10
If it is larger, the recovery rate of spiroglycol is low, and impurities cannot be sufficiently removed, which is not preferable. More preferably, the weight ratio of the amide compound to the aromatic compound is from 20/80 to 80/20.
【0014】再結晶操作は、粗スピログリコールを混合
溶媒に加熱溶解後、冷却する公知の方法により実施され
る。The recrystallization operation is carried out by a known method in which crude spiroglycol is dissolved in a mixed solvent by heating and then cooled.
【0015】溶解槽はジャケット、攪拌機付きの容器を
用いるのが好ましい。溶解槽材質はグラスライニング、
鉄、ステンレス鋼等安価な材質が用いられるが、鉄分の
混入を防ぐためにはグラスライニングもしくはステンレ
ス鋼が好ましい。As the dissolving tank, it is preferable to use a vessel equipped with a jacket and a stirrer. Dissolution tank material is glass lining,
Inexpensive materials such as iron and stainless steel are used, but glass lining or stainless steel is preferable in order to prevent mixing of iron.
【0016】溶解方法は、粗スピログリコールをアミド
系溶媒に加熱溶解後、芳香族炭化水素系溶媒を添加する
方法、あるいは粗スピログリコールを芳香族炭化水素系
溶媒に加熱懸濁させながらアミド系溶媒を添加する方
法、あるいは粗スピログリコールをあらかじめ調製した
混合溶媒に加熱溶解する方法がとられる。溶解後の溶液
温度は、再結晶収率を上げるためには50〜150℃で
あることが好ましく、より好ましくは70〜110℃で
ある。The dissolving method is a method in which crude spiroglycol is dissolved in an amide-based solvent by heating and then an aromatic hydrocarbon-based solvent is added. Or a method in which crude spiroglycol is dissolved by heating in a mixed solvent prepared in advance. The temperature of the solution after dissolution is preferably from 50 to 150 ° C, more preferably from 70 to 110 ° C, in order to increase the recrystallization yield.
【0017】結晶の析出は、粗スピログリコールを完全
に溶解させた後、室温もしくは室温以下になるまで冷却
する方法により行う。冷却方法は、静置でも攪拌しなが
らでもよいが、工業操作上は攪拌しながらであることが
好ましい。冷媒は用いても用いなくてもよい。冷媒を用
いる場合には冷媒温度は−10〜40℃であることが好
ましい。冷却時間は結晶を充分析出させるためには2時
間以上であるのが好ましく、より好ましくは6時間以上
である。The precipitation of the crystals is performed by completely dissolving the crude spiroglycol and then cooling the mixture to room temperature or below room temperature. The cooling method may be either standing or stirring, but it is preferable to stir in industrial operation. A refrigerant may or may not be used. When a refrigerant is used, the temperature of the refrigerant is preferably -10 to 40C. The cooling time is preferably 2 hours or more, and more preferably 6 hours or more, in order to sufficiently precipitate crystals.
【0018】混合溶媒使用量は、再結晶によって析出す
る粗スピログリコールのスラリー濃度が10〜50重量
%となるように選択する。スラリー濃度が10%未満の
場合、再結晶1回あたりの粗スピログリコールの収量が
小さくなり効率が悪くなる。スラリー濃度が50%を越
えると攪拌が困難になり、また、結晶同士の付着に伴う
母液抱き込みの量が多くなるため洗浄が困難になり好ま
しくない。The amount of the mixed solvent used is selected so that the slurry concentration of the crude spiroglycol precipitated by recrystallization is 10 to 50% by weight. If the slurry concentration is less than 10%, the yield of crude spiroglycol per recrystallization is small, resulting in poor efficiency. If the slurry concentration exceeds 50%, stirring becomes difficult, and the amount of mother liquor entrapped due to the attachment of crystals increases, which makes cleaning difficult, which is not preferable.
【0019】結晶の濾過は、自然濾過、加圧濾過、減圧
濾過から選択される公知の方法により行われる。フィル
ターはメッシュが0.5〜20μmのものが好適に用い
られ、材質は紙、布、ガラス、テフロン、セラミックス
等が用いられる。得られたケーキは、母液を充分除去
し、結晶の純度を向上させるために洗浄することが望ま
しい。洗浄は、再結晶に用いた混合溶媒もしくは再結晶
に用いた混合溶媒より芳香族炭化水素系溶媒を多くした
貧溶媒を用い、再結晶に用いた溶媒量の1/20〜2倍
の洗浄溶媒量で1〜5回行うのが好ましい。The filtration of the crystals is performed by a known method selected from natural filtration, pressure filtration, and reduced pressure filtration. A filter having a mesh of 0.5 to 20 μm is suitably used, and paper, cloth, glass, Teflon, ceramics or the like is used as a material. The obtained cake is desirably washed in order to sufficiently remove the mother liquor and improve the purity of the crystals. Washing is performed using a mixed solvent used for recrystallization or a poor solvent in which an aromatic hydrocarbon solvent is larger than the mixed solvent used for recrystallization, and a washing solvent 1/20 to 2 times the amount of the solvent used for recrystallization. It is preferably carried out 1 to 5 times in an amount.
【0020】所望の純度のスピログリコールを得るため
に、上記の再結晶操作を2回以上繰り返してもよい。In order to obtain spiroglycol having a desired purity, the above-mentioned recrystallization operation may be repeated twice or more.
【0021】得られたケーキから乾燥操作により溶媒を
除去する。乾燥は、常圧乾燥もしくは真空乾燥で行わ
れ、常圧乾燥では乾燥温度80〜120℃、真空乾燥で
は乾燥温度60〜100℃、1mmHgの条件で行われ
る。乾燥機には、棚段型乾燥機、コニカル乾燥機等が用
いられる。スピログリコールと直接接触する部分の材質
は、グラスライニングもしくはステンレス鋼であること
が好ましい。The solvent is removed from the obtained cake by a drying operation. Drying is performed under normal pressure drying or vacuum drying. Atmospheric pressure drying is performed at a drying temperature of 80 to 120 ° C, and vacuum drying is performed at a drying temperature of 60 to 100 ° C and 1 mmHg. As the dryer, a shelf-type dryer, a conical dryer, or the like is used. The material of the portion that comes into direct contact with spiroglycol is preferably glass lining or stainless steel.
【0022】[0022]
【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明は以下の実施例に何らの制約を受けるもの
ではない。なお、部は重量部を示し、スピログリコール
純度はガスクロマトグラフィーの単純面積百分率、重量
平均分子量(Mw)はGPCによって測定したスチレン
換算分子量、YIはイエローインデックスの略で着色の
度合いを示す(小さいほど着色が少ない)。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited by the following examples. The parts are parts by weight, the purity of spiroglycol is the percentage of simple area by gas chromatography, the weight average molecular weight (Mw) is the molecular weight in terms of styrene measured by GPC, and YI is the abbreviation of yellow index, which indicates the degree of coloring (small) Less coloring).
【0023】製造例(粗スピログリコールの合成) トリエチルアミンを触媒としてイソブチルアルデヒドと
ホルムアルデヒドとを反応させて得られたアルドール反
応生成液から65℃、300mmHgの条件で未反応の
イソブチルアルデヒド、トリエチルアミンを留去し、ヒ
ドロキシピバルアルデヒド57.8%を含有する反応液
を得た。このヒドロキシピバルアルデヒド液1260部
にペンタエリスリトール463部、35%塩酸80部お
よび水2500部を添加し、反応温度80〜85℃、攪
拌速度400rpmの一定条件下で3時間反応を行っ
た。反応終了後、スラリーを10%炭酸水素ナトリウム
水溶液で中和し、濾過後ケーキを水1500部で洗浄し
た。その後80℃で12時間真空乾燥を行い、粗スピロ
グリコール848部を得た(ペンタエリスリトール基準
収率82.0%、純度95.0%)。以下の実施例、比
較例ではすべてこの粗スピログリコールを用いた。Production Example (Synthesis of Crude Spiroglycol) Unreacted isobutyraldehyde and triethylamine are distilled off from an aldol reaction product solution obtained by reacting isobutyraldehyde and formaldehyde with triethylamine as a catalyst at 65 ° C. and 300 mmHg. Thus, a reaction solution containing 57.8% of hydroxypivalaldehyde was obtained. 463 parts of pentaerythritol, 80 parts of 35% hydrochloric acid and 2500 parts of water were added to 1260 parts of the hydroxypivalaldehyde solution, and the reaction was carried out at a reaction temperature of 80 to 85 ° C. and a stirring speed of 400 rpm for 3 hours. After the completion of the reaction, the slurry was neutralized with a 10% aqueous solution of sodium hydrogen carbonate, and after filtration, the cake was washed with 1500 parts of water. Thereafter, vacuum drying was performed at 80 ° C. for 12 hours to obtain 848 parts of crude spiroglycol (82.0% based on pentaerythritol, purity 95.0%). This crude spiroglycol was used in all of the following Examples and Comparative Examples.
【0024】実施例1 粗スピログリコール100部を、N,N−ジメチルホル
ムアミド100部、トルエン100部よりなる混合溶媒
に添加し97℃に加熱し溶解させた。これを室温で自然
放冷し、12時間静置して結晶を析出させた。得られた
結晶を濾過し、N,N−ジメチルホルムアミド6.3
部、トルエン6.3部よりなる混合溶媒で4回洗浄した
後、80℃で6時間真空乾燥した。回収された精製スピ
ログリコールは86部、純度99.0%であった。Example 1 100 parts of crude spiroglycol was added to a mixed solvent consisting of 100 parts of N, N-dimethylformamide and 100 parts of toluene, and the mixture was heated to 97 ° C. and dissolved. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The obtained crystals were filtered and N, N-dimethylformamide 6.3.
The mixture was washed four times with a mixed solvent consisting of 6.3 parts of toluene and 6.3 parts of toluene, and then vacuum-dried at 80 ° C. for 6 hours. 86 parts of the purified spiroglycol thus recovered was 99.0% pure.
【0025】上記精製スピログリコール30.4部、
2,2−ビス(4−ヒドロキシフェニル)プロパン2
2.8部、ジフェニルカーボネート43.3部、炭酸水
素ナトリウム5*10−5部を攪拌機および留出装置付
きの反応器に仕込み窒素雰囲気下180℃に加熱し30
分間攪拌した。その後、減圧度を150mmHgに調整
すると同時に60℃/hrの速度で200℃まで昇温を
行い、40分間その温度に保持してエステル交換反応を
行った。更に、75℃/hrの速度で235℃まで昇温
し、10分間その温度で保持した後、1時間かけて減圧
度を1mmHg以下とした。合計6時間攪拌下反応を行
い、反応終了後反応器内部に窒素を吹き込み常圧に戻し
共重合ポリカーボネート樹脂を取り出した。Mw=57
000であった。 この共重合ポリカーボネートを厚さ
3mm、直径40mmの円盤にプレス成形しYI値を測
定したところ2.08であり、肉眼で着色を識別するこ
とは困難であった。30.4 parts of the above purified spiroglycol,
2,2-bis (4-hydroxyphenyl) propane 2
2.8 parts, 43.3 parts of diphenyl carbonate and 5 * 10-5 parts of sodium bicarbonate were charged into a reactor equipped with a stirrer and a distilling apparatus, and heated to 180 ° C. under a nitrogen atmosphere to obtain 30 parts.
Stirred for minutes. Thereafter, the degree of vacuum was adjusted to 150 mmHg, and at the same time, the temperature was raised to 200 ° C. at a rate of 60 ° C./hr, and the transesterification reaction was performed while maintaining the temperature for 40 minutes. Further, the temperature was raised to 235 ° C. at a rate of 75 ° C./hr and maintained at that temperature for 10 minutes, and then the degree of pressure reduction was reduced to 1 mmHg or less over 1 hour. The reaction was carried out with stirring for a total of 6 hours. After the reaction was completed, nitrogen was blown into the reactor to return to normal pressure, and the copolymerized polycarbonate resin was taken out. Mw = 57
000. This copolymerized polycarbonate was press-molded into a disk having a thickness of 3 mm and a diameter of 40 mm, and the YI value was measured. As a result, it was 2.08, and it was difficult to identify coloring with the naked eye.
【0026】実施例2 粗スピログリコール100部を、N,N−ジメチルアセ
トアミド65部、トルエン150部よりなる混合溶媒に
添加し104℃に加熱し溶解させた。これを室温で自然
放冷し、12時間静置して結晶を析出させた。得られた
結晶を濾過し、N,N−ジメチルアセトアミド4.0
部、トルエン9.4部よりなる混合溶媒で4回洗浄した
後、80℃で12時間真空乾燥した。回収された精製ス
ピログリコールは91部、純度99.2%であった。Example 2 100 parts of crude spiroglycol was added to a mixed solvent consisting of 65 parts of N, N-dimethylacetamide and 150 parts of toluene, and dissolved by heating to 104 ° C. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The resulting crystals were filtered and N, N-dimethylacetamide 4.0
And 4 times with a mixed solvent consisting of 9.4 parts of toluene and 9.4 parts of toluene, followed by vacuum drying at 80 ° C. for 12 hours. The recovered spiroglycol was 91 parts and had a purity of 99.2%.
【0027】上記精製スピログリコールを実施例1と全
く同様に反応させ、得られた共重合ポリカーボネート樹
脂(Mw=59400)を全く同様の形状に成形してY
I値を測定したところ2.04であり、肉眼で着色を識
別することは困難であった。。The above purified spiroglycol was reacted in exactly the same manner as in Example 1, and the obtained copolymerized polycarbonate resin (Mw = 59400) was molded into exactly the same shape to form Y.
When the I value was measured, it was 2.04, and it was difficult to identify coloring with the naked eye. .
【0028】実施例3 粗スピログリコール100部を、N,N−ジメチルホル
ムアミド100部、キシレン50部よりなる混合溶媒に
添加し99℃に加熱し溶解させた。これを室温で自然放
冷し、12時間静置して結晶を析出させた。得られた結
晶を濾過し、N,N−ジメチルホルムアミド6.3部、
キシレン3.1部よりなる混合溶媒で4回洗浄した後、
80℃で6時間真空乾燥した。回収された精製スピログ
リコールは82部、純度98.8%であった。上記精製
スピログリコールを実施例1と全く同様に反応させ、得
られた共重合ポリカーボネート樹脂(Mw=5900
0)を全く同様の形状に成形してYI値を測定したとこ
ろ2.15であり、肉眼で着色を識別することは困難で
あった。。Example 3 100 parts of crude spiroglycol was added to a mixed solvent consisting of 100 parts of N, N-dimethylformamide and 50 parts of xylene, and the mixture was heated to 99 ° C. and dissolved. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The obtained crystals were filtered, and 6.3 parts of N, N-dimethylformamide was added.
After washing four times with a mixed solvent consisting of 3.1 parts of xylene,
Vacuum dried at 80 ° C. for 6 hours. The recovered spiroglycol was 82 parts and had a purity of 98.8%. The purified spiroglycol was reacted in exactly the same manner as in Example 1 to obtain a copolymerized polycarbonate resin (Mw = 5900).
No. 0) was molded in exactly the same shape and the YI value was measured. As a result, it was 2.15, and it was difficult to identify coloring with the naked eye. .
【0029】比較例1 粗スピログリコール100部を、N,N−ジメチルホル
ムアミド100部、2−ブタノン100部よりなる混合
溶媒に添加し93℃に加熱し溶解させた。これを室温で
自然放冷し、12時間静置して結晶を析出させた。得ら
れた結晶を濾過し、N,N−ジメチルホルムアミド6.
3部、2−ブタノン6.3部よりなる混合溶媒で4回洗
浄した後、80℃で6時間真空乾燥した。回収された精
製スピログリコールは88部、純度98.5%であっ
た。上記精製スピログリコールを実施例1と全く同様に
反応させ、得られた共重合ポリカーボネート樹脂(Mw
=58800)を全く同様の形状に成形してYI値を測
定したところ3.16であり、肉眼でもはっきりと着色
が認められた。Comparative Example 1 100 parts of crude spiroglycol was added to a mixed solvent consisting of 100 parts of N, N-dimethylformamide and 100 parts of 2-butanone, and the mixture was heated to 93 ° C. and dissolved. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The obtained crystals are filtered and N, N-dimethylformamide6.
After washing four times with a mixed solvent consisting of 3 parts and 6.3 parts of 2-butanone, the resultant was vacuum-dried at 80 ° C. for 6 hours. The recovered spiroglycol was 88 parts and had a purity of 98.5%. The purified spiroglycol was reacted in exactly the same manner as in Example 1, and the resulting copolymerized polycarbonate resin (Mw
= 58800) was molded into the exact same shape, and the YI value was measured. The YI value was 3.16, and coloring was clearly observed with the naked eye.
【0030】比較例3 粗スピログリコール100部を、N,N−ジメチルホル
ムアミド120部、酢酸エチル100部よりなる混合溶
媒に添加し95℃に加熱し溶解させた。これを室温で自
然放冷し、12時間静置して結晶を析出させた。得られ
た結晶を濾過し、N,N−ジメチルホルムアミド7.5
部、酢酸エチル6.3部よりなる混合溶媒で4回洗浄し
た後、80℃で6時間真空乾燥した。回収された精製ス
ピログリコールは88部、純度98.5%であった。Comparative Example 3 100 parts of crude spiroglycol was added to a mixed solvent consisting of 120 parts of N, N-dimethylformamide and 100 parts of ethyl acetate, and the mixture was heated to 95 ° C. and dissolved. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The crystals obtained are filtered and N, N-dimethylformamide 7.5.
After washing four times with a mixed solvent consisting of 6.3 parts of ethyl acetate and 6.3 parts of ethyl acetate, the resultant was vacuum-dried at 80 ° C. for 6 hours. The recovered spiroglycol was 88 parts and had a purity of 98.5%.
【0031】上記精製スピログリコールを実施例1と全
く同様に反応させ、得られた共重合ポリカーボネート樹
脂(Mw=55500)を全く同様の形状に成形してY
I値を測定したところ3.00であり、肉眼でもはっき
りと着色が認められた。The purified spiroglycol was reacted in exactly the same manner as in Example 1, and the resulting copolycarbonate resin (Mw = 55500) was molded into exactly the same shape.
When the I value was measured, it was 3.00, and coloring was clearly observed with the naked eye.
【0032】比較例4 粗スピログリコール100部を、N,N−ジメチルホル
ムアミド100部に添加し108℃に加熱し溶解させ
た。これを室温で自然放冷し、12時間静置して結晶を
析出させた。得られた結晶を濾過し、N,N−ジメチル
ホルムアミド6.3部で4回洗浄した後、80℃で6時
間真空乾燥した。回収された精製スピログリコールは7
7部、純度98.4%であった。上記精製スピログリコ
ールを実施例1と全く同様に反応させ、得られた共重合
ポリカーボネート樹脂(Mw=55700)を全く同様
の形状に成形してYI値を測定したところ3.23であ
り、肉眼でもはっきりと着色が認められた。Comparative Example 4 100 parts of crude spiroglycol was added to 100 parts of N, N-dimethylformamide and heated to 108 ° C. for dissolution. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The obtained crystals were filtered, washed four times with 6.3 parts of N, N-dimethylformamide, and dried in vacuo at 80 ° C. for 6 hours. The recovered purified spiro glycol is 7
7 parts, purity 98.4%. The purified spiroglycol was reacted in exactly the same manner as in Example 1, and the obtained copolymerized polycarbonate resin (Mw = 55700) was molded in exactly the same shape, and the YI value was measured. Clear coloring was observed.
【0033】比較例5 粗スピログリコール40部を、N,N−ジメチルホルム
アミド20部、トルエン500部よりなる混合溶媒に添
加し105℃に加熱し溶解させた。これを室温で自然放
冷し、12時間静置して結晶を析出させた。混合溶媒
は、アミド系極性溶媒量が10%未満であるため全体量
が多くなりスラリー濃度は10%以下となった。得られ
た結晶を濾過し、N,N−ジメチルホルムアミド1.3
部、トルエン31.3部よりなる混合溶媒で4回洗浄し
た後、80℃で6時間真空乾燥した。回収された精製ス
ピログリコールは33部、純度99.0%であった。Comparative Example 5 40 parts of crude spiroglycol was added to a mixed solvent consisting of 20 parts of N, N-dimethylformamide and 500 parts of toluene, and dissolved by heating to 105 ° C. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. Since the amount of the amide-based polar solvent was less than 10%, the total amount of the mixed solvent was large, and the slurry concentration was 10% or less. The obtained crystals were filtered and N, N-dimethylformamide 1.3
After washing four times with a mixed solvent consisting of 31.3 parts of toluene and 31.3 parts of toluene, vacuum drying was performed at 80 ° C. for 6 hours. The recovered spiroglycol was 33 parts and had a purity of 99.0%.
【0034】上記精製スピログリコールを実施例1と全
く同様に反応させ、得られた共重合ポリカーボネート樹
脂(Mw=59000)を全く同様の形状に成形してY
I値を測定したところ2.10であり、肉眼で着色を識
別することは困難であった。。The purified spiroglycol was reacted in exactly the same manner as in Example 1, and the resulting copolycarbonate resin (Mw = 59000) was molded into the same shape as Y
When the I value was measured, it was 2.10, and it was difficult to identify coloring with the naked eye. .
【0035】比較例6 粗スピログリコール160部を、メタノール1560部
に添加し60℃に加熱し溶解させた。これを室温で自然
放冷し、12時間静置して結晶を析出させた。得られた
結晶を濾過し、メタノール100部で4回洗浄した後、
64℃で6時間真空乾燥した。回収された精製スピログ
リコールは68部、純度99.0%であった。Comparative Example 6 160 parts of crude spiroglycol was added to 1560 parts of methanol and heated at 60 ° C. to dissolve. This was allowed to cool naturally at room temperature, and allowed to stand for 12 hours to precipitate crystals. The obtained crystals were filtered and washed four times with 100 parts of methanol.
Vacuum dried at 64 ° C. for 6 hours. The recovered purified spiro glycol was 68 parts and had a purity of 99.0%.
【0036】上記精製スピログリコールを実施例1と全
く同様に反応させ、得られた共重合ポリカーボネート樹
脂(Mw=54900)を全く同様の形状に成形してY
I値を測定したところ3.19であり、肉眼でもはっき
りと着色が認められた。The purified spiroglycol was reacted in exactly the same manner as in Example 1, and the resulting copolycarbonate resin (Mw = 54900) was molded into exactly the same shape.
When the I value was measured, it was 3.19, and coloring was clearly observed with the naked eye.
【0037】[0037]
【発明の効果】本発明により、着色性の不純物の少ない
スピログリコールが効率的に安価に得られるようにな
り、低分子化合物の合成原料から高分子化合物の合成原
料まで幅広い用途に利用可能となる。特に、スピログリ
コールとビスフェノール類と炭酸ジエステルとをエステ
ル交換反応させて得られる共重合ポリカーボネート樹脂
においては、着色が著しく低減されるため、各種レン
ズ、光ディスク基板などの外観、特に色調の重要視され
るプラスチック光学材料として幅広い用途に利用するこ
とが可能になる。According to the present invention, spiroglycol having less coloring impurities can be efficiently and inexpensively obtained, and can be used in a wide range of applications from raw materials for synthesizing low molecular weight compounds to raw materials for synthesizing high molecular weight compounds. . In particular, in the copolycarbonate resin obtained by transesterification of spiroglycol, bisphenols, and carbonic acid diester, coloring is significantly reduced, so that the appearance of various lenses and optical disk substrates, especially the color tone, is regarded as important. It can be used for a wide range of applications as a plastic optical material.
Claims (4)
示される化合物の少なくとも一種と下記一般式(2)で
示される化合物の少なくとも一種とからなる溶媒に溶解
した後、再結晶化することを特徴とする高純度スピログ
リコールの製造方法。 【化1】 (R1 ,R2 およびR3 は各々水素原子または炭素数4
以下のアルキル基である。) 【化2】 (R4 は水素原子、ハロゲン原子または炭素数4以下の
アルキル基で環を形成していても良い。mは置換基数を
表し、0〜4の整数である。)(1) dissolving spiroglycol in a solvent comprising at least one compound represented by the following general formula (1) and at least one compound represented by the following general formula (2), followed by recrystallization; A method for producing high-purity spiroglycol, characterized by comprising: Embedded image (R 1 , R 2 and R 3 are each a hydrogen atom or a carbon atom 4
These are the following alkyl groups. ) (R 4 may form a ring with a hydrogen atom, a halogen atom or an alkyl group having 4 or less carbon atoms. M represents the number of substituents and is an integer of 0 to 4.)
ヒドロキシ−1,1−ジメチルエチル)−2,4,8,
10−テトラオキサスピロ[5.5]ウンデカンである
請求項1記載の方法。2. The method of claim 1, wherein the spiroglycol is 3,9-bis (2-
Hydroxy-1,1-dimethylethyl) -2,4,8,
The method according to claim 1, which is 10-tetraoxaspiro [5.5] undecane.
くとも1種と上記一般式(2)で示される化合物の少な
くとも1種との重量比〔(1)/(2)〕が20/80
〜80/20である請求項1記載の方法。3. A weight ratio [(1) / (2)] of at least one compound represented by the above general formula (1) to at least one compound represented by the above general formula (2) is 20 /. 80
2. The method of claim 1, wherein the ratio is ~ 80/20.
に溶解した後、冷却して再結晶化する請求項1記載の方
法。4. The method according to claim 1, wherein the spiroglycol is dissolved in a solvent at 50 to 150 ° C., and then cooled and recrystallized.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10028480A JPH11228577A (en) | 1998-02-10 | 1998-02-10 | Production of high-purity spiroglycol |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10028480A JPH11228577A (en) | 1998-02-10 | 1998-02-10 | Production of high-purity spiroglycol |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11228577A true JPH11228577A (en) | 1999-08-24 |
Family
ID=12249829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10028480A Pending JPH11228577A (en) | 1998-02-10 | 1998-02-10 | Production of high-purity spiroglycol |
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Country | Link |
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JP (1) | JPH11228577A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002161097A (en) * | 2000-11-24 | 2002-06-04 | Sumitomo Chem Co Ltd | Method for producing hydroxyphenylpropionate |
US6623564B2 (en) | 2000-02-22 | 2003-09-23 | Panac Industries, Inc. | Method of recovering synthetic substrates |
JP2005187425A (en) * | 2003-12-26 | 2005-07-14 | Mitsubishi Gas Chem Co Inc | Method for producing spiroglycol |
JP2011162604A (en) * | 2010-02-05 | 2011-08-25 | Teijin Chem Ltd | Method for producing polycarbonate resin having low photoelastic constant |
US8110282B2 (en) * | 2005-08-18 | 2012-02-07 | Toray Industries, Inc. | Laminated film and molded body |
-
1998
- 1998-02-10 JP JP10028480A patent/JPH11228577A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6623564B2 (en) | 2000-02-22 | 2003-09-23 | Panac Industries, Inc. | Method of recovering synthetic substrates |
JP2002161097A (en) * | 2000-11-24 | 2002-06-04 | Sumitomo Chem Co Ltd | Method for producing hydroxyphenylpropionate |
JP4626048B2 (en) * | 2000-11-24 | 2011-02-02 | 住友化学株式会社 | Process for producing hydroxyphenylpropionic acid ester |
JP2005187425A (en) * | 2003-12-26 | 2005-07-14 | Mitsubishi Gas Chem Co Inc | Method for producing spiroglycol |
JP4645032B2 (en) * | 2003-12-26 | 2011-03-09 | 三菱瓦斯化学株式会社 | Method for producing spiroglycol |
US8110282B2 (en) * | 2005-08-18 | 2012-02-07 | Toray Industries, Inc. | Laminated film and molded body |
US8404335B2 (en) | 2005-08-18 | 2013-03-26 | Toray Industries, Inc. | Laminated film and molded body |
JP2011162604A (en) * | 2010-02-05 | 2011-08-25 | Teijin Chem Ltd | Method for producing polycarbonate resin having low photoelastic constant |
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