JPH11168064A - Stage driving method, stage equipment, and aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a stage equipment in which moment, deforming force, etc., are hardly generated at restraining of vibration which accompany vibration of a movable part. SOLUTION: A surface plate 3 is retained on a base 1 via an vibration proof table 2A or the like. An X-stage constituted of a Y-guide bar carrying a member 5, a Y-guide bar 6, etc., is arranged movably along an X-guide bar 4 on the surface plate 3. The X-stage is driven in the X-direction by using X-axis linear motors 10A, 10B. Stators 12A, 12B of the X-axis linear motor 10A, 10B are retained on the surface plate 3, so as to be movable in the X-direction by the use of direct moving guides 13A, 13B. By the use of X-damping members 36A, 36B attached on a damping frame 35 fixed on the base 1, a damping force which cancels the reaction force at driving the X-stage is applied to the stators 12A. 12B.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a stage device having an anti-vibration function for precisely positioning an object to be processed and a method of driving the same, for example, a semiconductor device, a liquid crystal display device, and the like.
It is also suitable for use in an exposure apparatus used for transferring a mask pattern onto a substrate such as a wafer in a lithography process for manufacturing a thin film magnetic head or the like, or a precision machine tool or a precision measuring instrument. .

[0002]

2. Description of the Related Art For example, when a semiconductor device or the like is manufactured, a reticle pattern as a mask is transferred onto a wafer (or a glass plate or the like) coated with a resist as a photosensitive substrate. An exposure apparatus of a reduced projection type has been used. In such a batch exposure type exposure apparatus, a wafer stage capable of stepping in two orthogonal directions is used as an apparatus for moving each shot area of a wafer to a predetermined exposure position.

Recently, attention has been paid to a step-and-scan type reduced projection type exposure apparatus which performs exposure by synchronously scanning a reticle and a wafer with respect to a projection optical system.
In such a scanning exposure type exposure apparatus, together with a wafer stage that performs stepping in two orthogonal directions and continuously moves at a constant speed in the scanning direction, it can continuously move at a constant speed in the scanning direction and can move in the non-scanning direction. A reticle stage that can be moved by a small amount and that can be rotated by a small angle around an axis perpendicular to the moving surface is used.

The main body of the exposure apparatus including these stages is provided with a vibration isolating table including a highly elastic air spring or coil spring and an oil damper as an attenuator in order to cut off vibration from the floor. It is generally supported by FIG. 12 shows a schematic configuration of a conventional wafer stage for an exposure apparatus. In FIG. 12, a base plate 72 is supported on a base 70 via a plurality of anti-vibration tables 71A and 71B. The X stage 73 is movable upward along a direction parallel to the plane of the paper of FIG.
Is placed. The X stage 73 is driven by a drive motor 74 fixed on the surface plate 72 in the X direction via a feed screw 75, and is driven on the X stage 73 by a feed screw system in the Y direction orthogonal to the X direction. A stage 76 is mounted.

In this case, when the X stage 73 starts to be driven in the X direction, for example, a thrust F indicated by a solid line arrow acts on the X stage 73, and the thrust F is applied to the surface plate 72 via the drive motor 74. A reaction force -F indicated by a dotted arrow acts as a reaction. Therefore, the surface plate 72 is displaced in the direction of the reaction and vibration is generated. Therefore, conventionally, as disclosed in, for example, Japanese Patent Application Laid-Open No. 58-68118, an actuator 77 for applying a braking force D in the X direction to the surface plate 72 on the base 70 is installed,
When the stage 73 is accelerated or decelerated, a force having the same magnitude as the reaction acting on the surface plate 72 in the opposite direction is applied from the actuator 77 to the surface plate 72 (that is, the braking force D is made equal to the thrust F).
Thus, a method of preventing the vibration of the surface plate 72 has been proposed.

In the case where a linear motor is used as a drive motor, the linear motor is fixed in order to prevent a reaction from acting on the surface plate via the stator when the linear motor is driven. US Pat. No. 5,528,11 discloses a method of fixing a child on the base 70 (floor) side.
No. 8 discloses it.

[0007]

In the prior art as described above, as shown in FIG. 12, in the method of applying a braking force to the surface plate 72 via an actuator 77, the surface
Since the position of the reaction force −F acting on the (drive motor 74) and the position of the braking force D applied to the platen 72 from the actuator 77 are significantly different, a moment that causes the platen 72 to rotate or deform And deformation force. The large amplitude component of these moments and deformation forces is
1A and 71B cause a vibration mode in which the air springs (or coil springs) and the like are deformed.
A, 71B itself reduces to a considerable extent.
However, the remaining small-amplitude vibration is becoming a non-negligible amount in applications requiring stability of about several nm, such as a semiconductor exposure apparatus.

In such a structure where the position of the reaction force -F and the position of the braking force D are greatly different from each other, in order to minimize the remaining small-amplitude vibration, the X-stage 7 is required.
It is desirable that the drive characteristics of the third drive motor 74 and the actuator 77 for applying a braking force from the outside almost completely match. The drive characteristics are mainly the linearity of the magnitude of the generated thrust with respect to the thrust command value, and the time delay from when the thrust command is issued until the thrust is generated. However, in the method of FIG. 12, since the drive motor 74 and the actuator 77 have greatly different mechanisms, it is difficult to almost completely match the drive characteristics.
It was difficult to reduce the small amplitude vibration.

In the prior art, the method of fixing the stator of the linear motor on the base side does not excite the vibration mode that deforms the surface plate and the exposure apparatus main body as in the former method. There is a disadvantage that the mechanism becomes large and the stage device becomes large as a whole, and that the arrangement of a length measuring system, a sensor, and the like provided in the stage device is greatly restricted.

In the conventional stage apparatus shown in FIG.
Since the position of the X stage 73 (drive motor 74) is constant in the direction (Y direction) perpendicular to the plane of FIG. 12, even when the position (X coordinate) of the X stage 73 changes, the actuator 77 does not Can be suppressed to some extent. On the other hand, for the Y stage 76, the X stage 73
, The position in the X direction changes following the change in the position of X stage 73.
To suppress vibration during acceleration and deceleration of the stage 76, X
It is necessary to provide a vibration damping mechanism on the stage 73. However, when the vibration damping mechanism is provided on the X stage 73 as described above, there are inconveniences such as an increase in the size of the X stage 73 and deterioration of the driving characteristics of the X stage 73.

In view of the above, the present invention provides a stage driving method that does not easily generate a moment, a deformation force, and the like when suppressing the vibration accompanying the driving of the movable portion, and a stage device using the driving method. As a first object. Further, the present invention provides a stage driving method capable of greatly reducing vibration accompanying driving of a movable portion without using a large vibration damping mechanism,
A second object is to provide a stage device using the driving method.

Further, the present invention provides a stage device capable of suppressing vibration generated in one moving direction without significantly affecting the other moving direction when driving the movable portion in two intersecting directions. This is the third purpose. Still another object of the present invention is to provide an exposure apparatus having such a stage device.

[0013]

According to the stage driving method of the present invention, a movable table (5, 6, 8) movably mounted on a surface plate (3) in a predetermined direction is attached to the surface plate (3). Non-contact type driving means (10A, 10B)
And a stage driving method using a surface plate (3) in which the stators (12A, 12B) of the non-contact type driving means are driven.
When a thrust is applied to the movable table in the predetermined direction while being movably supported with respect to the movable table, a braking force is applied to the stator.

In the present invention, as the non-contact type driving means, a linear motor including a mover and a stator, a driving device for generating a thrust including Lorentz force, and the like can be used. An object to be processed such as a wafer is placed on the movable table. When the movable table is driven by the non-contact type driving means, the braking member controls the stator so as to cancel the reaction (reaction force) generated in the stator (12A, 12B). Give power. At this time, since the reaction and the braking force act on substantially the same straight line, a moment and a deformation force are not easily generated, and even if the timing and magnitude of the reaction and the braking force are slightly shifted, the stator (12A , 12B) is the surface plate (3)
, And there is no force acting on the surface plate (3) or the like to cause rotation or the like.

In this case, based on the command values of the position and the moving speed of the movable table, a feedforward system
A braking force may be applied to the stator.
This increases the response speed. Next, the first stage device according to the present invention comprises a surface plate (3) and a movable table (5, 5) movably mounted on the surface plate in a predetermined direction.
6, 8) and non-contact type driving means (10A, 10A) for driving the movable table in the predetermined direction with respect to the surface plate.
B), wherein the stators (12A, 12B) of the non-contact type driving means are movably supported on the surface plate in a predetermined direction, and are controlled with respect to the stator. Braking member (35, 36A, 36B; 3)
5A, 64A, 64B, 65) are provided on a predetermined base (1).

According to the present invention, when the movable table is driven, the braking member moves the movable table so that the reaction (reaction force) generated in the stator (12A, 12B) is canceled. By applying the braking force, the stage driving method of the present invention can be used. At this time, since the reaction and the braking force act on substantially the same straight line, a moment and a deformation force are not easily generated, and even if the timing and magnitude of the reaction and the braking force are slightly shifted, the stator (12A , 12
Since B) is movable with respect to the surface plate (3), no force that causes rotation or the like acts on the surface plate (3) or the like. Therefore, the driving characteristics of the braking member may be different from the driving characteristics of the non-contact type driving means. In this sense, as the braking member, a passive braking member such as a ball joint or a viscoelastic joint may be used in addition to the electromagnetic active braking member.

That is, when the active braking member is used as in the former case, as an example, the stators (12A, 12B) of the non-contact type driving means move in a predetermined direction with respect to the surface plate (3). The braking member provided on the base includes a frame (35) provided on the base and a non-contact type driving means mounted on the frame. Stator (12A, 1
2B) and a thrust generator (36A, 36B) for applying a braking force consisting of an electromagnetic force to the thrust generator.
When the movable table is driven via the non-contact type driving means, a thrust that substantially cancels a reaction force acting on the stator (12A, 12B) is generated as the braking force.

On the other hand, when a passive braking member is used as in the latter case, as an example, the stators (12A, 12B) of the non-contact type driving means move in a predetermined direction with respect to the surface plate (3). The braking member provided on the base includes a frame (35A) provided on the base and a fixing member for fixing the non-contact type driving means mounted on the frame. Child (12A, 1
2B) and a passive brake (64A, 64B, 65) for applying a mechanical braking force to the mechanical brake. Thus, there is no need to use a large vibration damping mechanism.

The second stage apparatus according to the present invention comprises a surface plate (3) and a first movable table (5, 6, 8) mounted on the surface plate so as to be movable in a first direction. A second movable table (7, 14, 15) movably installed in a second direction intersecting the first direction with respect to the first movable table, and a platen (3). The first
(10A, 10B) for driving the movable table in the first direction, and non-contact type driving means for driving the second movable table in the second direction with respect to the first movable table (26A, 26B), a movable member (32) attached to the first movable table and moving with the first movable table in the first direction, and a predetermined base. (1) A braking member (33, 34A) fixed on the top to apply a thrust to the movable member (32) in the second direction over the range of movement of the movable member (32) in the first direction. , 34B)
And with.

According to the present invention, a workpiece such as a wafer is placed on the second movable table, and the second movable table is placed on the second movable table.
The position of the movable table changes two-dimensionally. That is, as the position of the first movable table in the first direction changes, the position of the second movable table in the first direction also changes. According to the present invention, the movable member (32) is attached to the first movable table, and a braking force is applied to the movable member (32) from the outside in the second direction, so that the movable member (32) is mounted on the first movable table. Vibration of the second movable table in the second direction can be suppressed without substantially affecting the movement.

In this case, one example of the braking member is a fixed member (33) arranged to face the movable member (32) over the entire moving range of the movable member (32) in the first direction. A movable member (32) and a fixed member (33)
And a thrust which substantially cancels a reaction force acting on the movable member (32) when driving the second movable table via the non-contact type driving means. Thereby, the vibration in the second direction is actively suppressed.

A first exposure apparatus according to the present invention includes a projection optical system for projecting a pattern formed on an illuminated mask onto a substrate mounted on the first stage apparatus of the present invention as a substrate stage. Through the projection. Next, the second exposure apparatus according to the present invention illuminates a mask mounted on the first stage apparatus of the present invention as a mask stage, and illuminates a pattern formed on the mask with a substrate through a projection optical system. This is to project onto the substrate on the stage.

[0023]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. In this embodiment, the present invention is applied to a wafer stage of a projection exposure apparatus for manufacturing a semiconductor device. FIG. 1 shows a schematic configuration of a projection exposure apparatus of the present embodiment, and FIG. 2 shows a configuration of a wafer stage of the projection exposure apparatus. First, in FIG. 1, a rectangular flat platen 3 is supported on a flat base 1 via four anti-vibration tables 2A to 2D (2C and 2D are not shown in the drawing). . The anti-vibration tables 2A and 2B are each composed of an air spring (or coil spring) having a large elasticity and an oil damper as a vibration damper.
Vibration from the floor is not transmitted to the surface plate 3 by 2B or the like. The resonance frequency of the surface plate 3 and the mechanism of the projection exposure apparatus on the whole is about several Hz. The surface of the surface plate 3 is a plane having an extremely good flatness, and the surface is held almost in parallel with a horizontal surface in a stationary state. Hereinafter, the surface of the surface plate 3 is perpendicular to the plane of FIG. The description will be made by taking the X axis, the Y axis in a direction parallel to the plane of FIG. 1, and the Z axis in a direction perpendicular to the surface of the surface plate 3.

In this case, an X guide bar 4 provided with a guide surface for an X stage is fixed on the surface of the surface plate 3 along the X direction. Further, a first Y guide bar carrier 5 is arranged movably in the X direction along the surfaces of the X guide bar 4 and the surface plate 3, and is parallel to the Y guide bar carrier 5 along the surface of the surface plate 3. A second Y guide bar transporter 8 is disposed so as to be movable in the X direction, and a guide surface for a Y stage is provided along the Y direction to connect the Y guide bar transporters 5 and 8. A guide bar 6 is erected, and an X stage is composed of the Y guide bar transporters 5 and 8 and the Y guide bar 6.

In this case, on the bottom surface and the outer surface of the first Y guide bar transporting body 5, an air ejection portion constituting an air bearing is provided. Further, a preload mechanism such as a magnet or a vacuum pocket is incorporated in the vicinity of these air ejection parts, and the first Y guide bar transporter 5 is
It can be moved in the X direction while being constrained in the Z direction and the Y direction while keeping a constant interval on the surface of the surface plate 3 and the side surface of the X guide bar 4, respectively. Similarly, the second Y guide bar transport body 8
An air ejection part constituting an air bearing and a preload mechanism such as a magnet or a vacuum pocket are also incorporated into the bottom surface of the base plate, and the Y guide bar carrier 8 is also restrained on the upper surface of the surface plate 5 while keeping a constant interval. , X direction.

Further, the X guide bar 4 is sandwiched between the Y guide bar transport body 5 and the X guide bar 4 along the X direction along the X direction.
X-axis linear motor 1
0A and the Y guide bar transporting body 5 are connected via a connecting member 9 which is provided so as to straddle the X guide bar 4.
Further, the X-axis linear motor 10A includes a mover 11A having a coil on the connecting member 9 side and a stator 12A on the surface plate 3 side in which a plurality of permanent magnets whose polarities are alternately reversed are arranged. A linear motion guide 13A is interposed between the stator 12A and the surface of the surface plate 3. FIG. 2 shows the stator 12A.
As shown by notching a part of the linear motion guide 13A,
A rail 13Ab fixed on the surface plate 3 and a plurality of sliding members 13Aa slidable on the rail 13A in the X direction via a large number of small ball bearings are provided.
Aa is fixed to the bottom surface of the stator 12A by bonding or the like. In addition, you may use the guide of a static pressure gas bearing system, etc. as 13 A of linear motion guides.

Returning to FIG. 1, an X-axis linear motor 10B arranged in the X direction is connected to the left end of the Y guide bar 6 via a connecting member 18, and the X-axis linear motor 10B is connected to the connecting member 18 side. A mover 11B having a coil and a surface plate 3
And a linear motion guide 13B which can slide the stator 12B back and forth in the X direction between the stator 12B and the surface of the surface plate 3.
Is interposed. That is, the stators 12A and 12B of the two-axis X-axis linear motors 10A and 10B of this embodiment are restrained by the linear motion guides 13A and 13B so that they cannot be displaced in the Y direction, and slide in the X direction. Supported to be able. In this case, the stators 12A and 12B
Is applied with a braking force that cancels a reaction force (reaction) at the time of driving from an X-direction braking member described later. The X-axis linear motors 10A and 10B drive the X-stage in the X-direction in a moving coil system in parallel.

In FIG. 2, a pair of X-direction restraining bearing members 7 are arranged on the side surfaces of the Y guide bar 6 with a gap of several μm so as to sandwich the Y guide bar 6 in the X direction. A Z-floating bearing plate 14 (see FIG. 1) is fixed to the bottom surface of the bearing member 7, and a sample table 15 is fixed to the upper surface of the X-direction constrained bearing member 7.
A wafer W to be exposed on which a resist is applied is held via a wafer holder (not shown). In this example, 1
The pair of X-direction constrained bearing members 7, the Z-floating bearing plate 14, and the sample stage 15 constitute a Y stage.

In this case, on the bottom surface of the Z-floating bearing plate 14 (the surface facing the surface plate 3), there are provided an air ejection portion constituting an air bearing and a preload device such as a vacuum pocket or a magnet.
The weight of the Y stage is supported in a non-contact manner by an air bearing system. The pair of X-direction constrained bearings 7 respectively eject air toward the Y guide bar 6 and balance the air pressure generated by both to move the Y stage in a non-contact manner while maintaining a constant gap to the Y guide bar 6. Constrain in the X direction. As a result, the Y stage can move in the Y direction along the Y guide bar 6 while being restrained in a non-contact manner in the X direction and the Z direction.

For driving the Y stage, a pair of X
The stators 16A and 16 each having a pair of coils parallel to the Y direction so as to connect the Y guide bar transporters 5 and 8 (see FIG. 1) to both sides of the directional constraint bearing member 7.
B, a mover 17A having a plurality of U-shaped permanent magnets is fixed to the outer surface of the X-direction constraining bearing member 7 on the + X direction side so as to sandwich the stator 16A, A mover (not shown) having a plurality of permanent magnets is fixed to the outer surface of the direction-restricted bearing member 7 so as to sandwich the stator 16B. Then, two-axis moving magnet type Y-axis linear motors 26A and 26B are constituted by the movable elements 17A and the like corresponding to the stators 16A and 16B,
The Y stage is driven in the Y direction by these Y-axis linear motors 26A and 26B.

In FIG. 2, the sample stage 15 above the X-direction constrained bearing member 7 in the Y stage can correct the position in the Z direction (focus position) and the inclination angles around the X axis and the Y axis. An X-axis movable mirror 19 is provided at the end in the −X direction and the end in the + Y direction on the sample table 15.
The movable mirror 19Y for the X and Y axes is fixed. Also,
Two-axis X-axis laser interferometers 21XA and 21XA attached to a support member 25 fixed to a side surface of the surface plate 3 in the -X direction.
A laser beam is radiated from 1XB to moving mirror 19X in parallel with the X axis, and X coordinates XW1 and XW2 of moving mirror 19X (sample stage 15) are measured by laser interferometers 21XA and 21XB. For example, one X coordinate XW1 is the sample stage 1
The rotation angle of the sample table 15 is calculated from the difference between the two X coordinates XW1 and XW2.

A laser beam from the Y-axis laser interferometer 21Y attached to the support member 25 is reflected by a mirror 20 attached to an optical system support frame (not shown) attached to the support member 25. The moving mirror 19Y is irradiated in parallel with the Y axis, and the Y coordinate YW of the moving mirror 19Y (sample stage 15) is measured by the laser interferometer 21Y.

Referring back to FIG. 1, a projection optical system PL and a reticle R are sequentially arranged above the wafer W.
Is supported by a column (not shown) fixed to the surface plate 3, and the reticle R is mounted on the reticle base 2 fixed to the column.
3 is held on a reticle stage 22 movably mounted on the reticle stage 3. In addition, a fly-eye lens, a variable field stop (reticle blind), and a condenser for equalizing the illuminance distribution of exposure light from an exposure light source installed outside the chamber in which the projection exposure apparatus is housed, for example, at the top of the column An illumination optical system 24 composed of a lens or the like is arranged, and at the time of exposure, the exposure light IL from the illumination optical system 24 illuminates the pattern area of the reticle R with, for example, a rectangular illumination area elongated in the X direction. As the exposure light IL, excimer laser light such as KrF (wavelength 248 nm) or ArF (wavelength 193 nm), and further soft X-rays can be used in addition to bright lines such as i-line of a mercury lamp.

A laser interferometer (not shown) for measuring the two-dimensional position of the reticle stage 22 is also provided. The main interferometer 51 controls the measured values of the laser interferometer and the operation of the entire apparatus. The stage control system 52 controls the operation of the reticle stage 22 by a linear motor system in accordance with the instruction of (1). Similarly, the laser interferometer 21XA of FIG.
The measured values of 21XB and 21Y are also used in the stage control system 52 of FIG.
The stage control system 52 is supplied to the wafer stage side in accordance with the measurement value and a command from the main control system 51.
The operation of the X-axis linear motors 10A and 10B and the two-axis Y-axis linear motors 26A and 26B is controlled. That is,
At the time of exposure, when exposure to one shot area on the wafer W is completed, the X-axis linear motors 10A and 10B and the Y-axis linear motors 26A and 26B are stepped to move the next shot area to the scanning start position. Thereafter, by driving the Y-axis linear motors 26A and 26B at a constant speed and simultaneously driving the reticle stage 22, the reticle R and the wafer W are projected with respect to the projection optical system PL in the Y direction as a speed ratio. The operation of synchronous scanning is repeated in a step-and-scan manner, and exposure is performed on each shot area of the wafer W. Note that the present invention is also applicable to a case where a batch exposure method such as a stepper is used instead of the step-and-scan method as in this example as the projection exposure apparatus.

Now, as shown in FIG. 2, the sample stage 15 (wafer W) of the wafer stage of this embodiment has a biaxial X-axis in the X direction.
It is driven by the axis linear motors 10A and 10B, and is also driven in the Y direction by two Y-axis linear motors 26A and 26B. When the sample table 15 is driven, for example, in the X direction, the corresponding X-axis linear motors 10A, 10A
A thrust proportional to the target acceleration (including the case of deceleration) is applied to the movers 11A and 11B of 0B. At this time, the thrust and the direction are reversed by a reaction, and a force of the same magnitude (hereinafter, referred to as “ The corresponding stator 12A,
Work on 12B. Similarly, when the sample stage 15 is driven in the Y direction, a thrust proportional to the target acceleration is applied to the movers 17A and the like of the corresponding Y-axis linear motors 26A and 26B, and the thrust and the direction are reversed. A reaction force of the same magnitude acts on the corresponding stator 16A, 16B. Therefore, if there is no braking mechanism, those reaction forces are applied to the stators 12A and 12A.
B, or 16A, 16B, acts on the platen 3 to generate vibration, and the vibration remains even after the acceleration / deceleration of the sample table 15 is completed, and the positioning accuracy of the sample table 15 or constant speed control during scanning exposure is performed. The nature will deteriorate.

In order to prevent such deterioration in positioning accuracy and constant speed controllability, the wafer stage of the projection exposure apparatus of this embodiment is provided with X-axis and Y-axis braking mechanisms. First, as shown in FIG. 2, a part of the X-axis braking mechanism includes a stator 12A of the X-axis linear motors 10A and 10B.
Linear motion guide 13 movable in the direction in which the reaction force 12B is generated
A, 13B. Further, a braking frame 35 is fixed to a side surface of the base 1 in the −X direction, and the braking frame 35 includes
At the ends of the stators 12A and 12B in the −X direction, the stator 1
Convex portions 35a and 35b facing upper surfaces of 2A and 12B
Are provided on the bottom surfaces of the convex portions 35a and 35b, respectively.
X braking member 36 having a coil having substantially the same configuration as movers 11A and 11B of X-axis linear motors 10A and 10B.
A and 36B are fixed, and X braking members 36A and 36B
Are U-shaped stators 12A and 12B, respectively.
Is inserted into the inside of the unit without contact. Linear motion guide 1 above
3A, 13B, brake frame 35, and X brake member 36
An X-axis braking mechanism is constituted by A and 36B, and the X-braking members 36A and 36B generate a desired braking force on the stators 12A and 12B by a linear motor system.

FIG. 5 shows a detailed configuration of the stage control system 52 shown in FIG. 1. In FIG. 5, the stage control system 52 includes a wafer stage drive system 53, a reticle stage drive system 54, and various drivers. And Then, the three-axis laser interferometer 21XA on the wafer stage side,
The measured values of 21XB and 21Y are transferred to the wafer stage drive system 53.
The main control system 51 further supplies command values such as a target position and a moving speed of the wafer stage (sample stage 15) to the wafer stage drive system 53. In response to these pieces of information, the wafer stage drive system 53 controls the X-axis linear motors 10A, 10B and the Y-axis linear motors 26A, 2A of FIG.
6B, the thrust generated by the driver 55A, 55B, 56
A, 56B. The wafer stage drive system 5
3 supplies the synchronization information to the reticle stage drive system 54, and the reticle stage drive system 54 drives the reticle stage in synchronization with the wafer stage.

Drivers 55A and 55 on the wafer stage side
B and 56A, 56B supply driving current to the coils of the movers 11A, 11B and the coils of the stators 16A, 16B so as to generate the set thrust. At this time, the information of the X-axis thrust to the X-axis drivers 55A and 55B is also supplied to the X-axis braking drivers 57A and 57B, and the drivers 57A and 57B are provided with the coils of the corresponding X braking members 36A and 36B. And a current for generating a thrust in the same direction as the X-axis thrust and in the opposite direction.

FIG. 6 is a simplified side view of the wafer stage of FIG. 2 viewed in the −Y direction. In FIG. 6, the X-axis is used to temporarily drive the sample stage 15 of FIG. 2 in the + X direction. Thrust F in the X direction on the mover 11A of the linear motor 10A
When XA is applied, a reaction force -FXA (reaction force FXA directed in the -X direction) acts on the corresponding stator 12A.
At the same time, the braking force DXA acting on the stator 12A from the X braking member 36A becomes a thrust FXA in the X direction having the same magnitude in the opposite direction to the reaction force. No force acts and the stator 12A remains stationary. In particular, in this example, since the reaction force -FXA and the braking force DXA are substantially on the same straight line, no moment or force for deforming the stator 12A is generated, and the acceleration or deceleration of the movable element 11A is not generated. There is no generation of minute vibration or the like.

Further, even if the timing at which the braking force is applied to the stator 12A by the X braking member 36A slightly deviates from the timing at which the thrust is applied to the mover 11A, Even if the magnitude of the braking force applied to the stator 12A by the X braking member 36A slightly differs from the magnitude of the generated reaction force, the stator 12A is displaced in the X direction by the linear motion guide 13A. No vibration occurs in the board 3. Therefore, the surface plate 3 is stationary regardless of the acceleration / deceleration of the X stage (movable elements 11A and 11B), and the position control and speed control of the X stage are performed with high accuracy.

Referring back to FIG. 2, the X-axis linear motors 10A, 10A
In a period in which 0B is not driven, as an example, usually X
The stators 11A, 11B are controlled by the braking members 36A, 36B.
Should be kept still. Although not shown, an optical or capacitance type encoder that roughly detects the relative position of the stators 12A and 12B and the surface plate 3 in the X direction is arranged. The measured values are also supplied to the wafer stage drive system 53 in FIG. When the relative positions of the stators 12A, 12B and the platen 3 in the X direction are out of a predetermined target range during a period in which the X-axis linear motors 10A, 10B are not driven, for example, the wafer stage control is performed. The system 53 drives the X braking members 36A and 36B via a control line (not shown) so that the relative position falls within the target range. As a result, the positions of the stators 12A and 12B do not gradually shift.

Next, the braking mechanism for the Y axis will be described.
First, as shown in FIG.
Mover 3 having a coil on connecting member 9 moving in
2 is fixed, and a stator 33 having a U-shaped cross section is arranged along the X direction so as to cover the distal end portion of the mover 32 in a non-contact manner, and the stator 33 is provided on the side surface of the base 1 in the + Y direction. It is fixed to the two fixed braking frames 34A and 34B. The mover 32 and the stator 33 constitute a Y braking motor 31 as a Y-axis braking mechanism.
The stator 33 is arranged so as to cover the mover 32 in the entire movement range of the mover 32 in the X direction, as shown by cutting out a part of 3.

FIG. 3A is a partially cutaway plan view showing the Y brake motor 31 including the mover 32 and the stator 33 of FIG. 1, and FIG. 3B is a side view of FIG. As shown in FIG. 3 (b), the stator 33 has one of three yokes 37, 38A and 38B fixed in a U-shape so that the polarity is inverted in the Y direction. Permanent magnet 39A, 39
B is fixed, and the permanent magnets 39C and 39D are fixed to the other inner surface with the polarity attracting the permanent magnets 39A and 39B so as to face the permanent magnets 39A and 39B. Therefore, the direction of the magnetic flux generated between one pair of the permanent magnets 39A and 39C is the same as that of the other one.
The direction of the magnetic flux generated between the pair of permanent magnets 39B and 39D is opposite to that of the movable element 3 between these two pairs of permanent magnets.
2 are inserted in a non-contact manner.

As shown in FIG. 3A, inside the mover 32, a coil 32a is wound a plurality of times in a rectangular shape. In this case, the current IY flowing through the coil 32a is opposite to each other in the + X direction or the -X direction between one pair of permanent magnets 39A and 39C and between another pair of permanent magnets 39B and 39D. It is assumed that a braking force DY consisting of Lorentz force is applied to the mover 32 in the Y direction between the permanent magnets 39A and 39C.
/ 2 acts on the mover 32 even between the permanent magnets 39B and 39D, the braking force DY /
2 works. Since the Lorentz force is proportional to the current IY, the direction and magnitude of the DY braking force can be arbitrarily controlled in total by controlling the current IY.

For this reason, in FIG. 5, information on the thrust supplied from the wafer stage drive system 53 to the Y-axis drivers 56A and 56B is also supplied to the driver 58. The driver 58 has a braking force DY composed of the Lorentz force.
Is the mover 1 of the two-axis Y-axis linear motors 26A and 26B.
By the total value FY of thrust given to 6A and 16B,
The current I supplied to the coil 32a of the mover 32 is opposite to the direction of the reaction force acting on the mover 32 and has the same magnitude.
Set Y.

As a result, in FIG. 1, assuming that a thrust FY acts on the mover 17A and the like (the sample table 15) in the Y direction by the Y-axis linear motors 26A and 26B (see FIG. 2), the stators 16A and 16B ( A reaction force −F is applied to the mover 32 of the Y braking motor 31 via the connecting member 9 (see FIG. 2).
Y (the reaction force of the magnitude in the -Y direction is FY) acts. Correspondingly, the Y braking motor 31 applies a braking force DY to the mover 32 in the Y direction opposite in direction to the reaction force of the mover 32, so that the Y is applied to the mover 32 and the surface plate 3. No vibration in the direction occurs. Also in the Y-axis braking mechanism, the reaction force generated by the Y-axis linear motors 26A and 26B
Since the braking force applied by the braking motor 31 is substantially on the same plane, no large moment or deformation force is generated.

At this time, in FIG.
Even if the position in the direction changes, the mover 32 is accommodated in the stator 33, and a braking force that always cancels the reaction force in the Y direction can be applied to the mover 32. Therefore, regardless of the position of the X stage in the X direction, the surface plate 3 is stationary even when the Y stage is accelerated or decelerated in the Y direction.
As a result, position control and speed control of the sample table 15 are performed with high accuracy.

In the Y brake motor 31 shown in FIG. 3, the permanent magnet and the coil may be reversed as shown in FIG. That is, FIG. 4A is a plan view showing another configuration example of the Y braking motor 31, and FIG. 4B is a side view thereof. As shown in FIG. A permanent magnet 42A, 32A is provided on one inner surface of one of three yokes 40, 41A, 41B fixed in a U-shape so that the polarity is reversed in the Y direction.
42B is fixed, and the permanent magnets 42A and 42B
The permanent magnets 42C and 42 have polarities that attract each other so that they face each other.
D is fixed. A stator 33A long in the X direction is inserted between the two pairs of permanent magnets in a non-contact manner so as to cover the entire moving range of the mover 32A.

As shown in FIG. 4A, a coil 33Aa is wound a plurality of times in a rectangular shape inside the stator 33A. Therefore, also in this modified example, when the coil 33Aa is energized, the stator 33 is moved between the permanent magnets 42A and 42C.
Lorentz force generated in A and permanent magnets 42B, 42D
And the Lorentz force generated in the stator 33A is in the same direction, and the reaction force of the total Lorentz force acts as a braking force on the mover 32A. The mover 3 with the braking force
By canceling the reaction force FY acting on 2A, vibration in the Y direction can be suppressed.

In the above embodiment, X braking members 36A and 36B equivalent to the movers 11A and 11B of the X axis linear motors 10A and 10B are used as the X axis braking mechanism. Target stators 12A, 12B
Is connected to the surface plate 3 via the linear motion guides 13A and 13B so as to be movable in the X direction.
Even if the thrust given to the X stage from 0A and 10B and the braking force given to the stators 12A and 12B from the X braking members 36A and 36B and the amount of timing shift become large, the platen 3 retains the X force. No force in the direction acts. Therefore, a configuration having a higher degree of freedom or an inexpensive configuration can be adopted. Hereinafter, other embodiments of the X-axis braking mechanism will be described, but for convenience of description, only the mechanism that brakes the stator 12A of one X-axis linear motor 10A will be described.

[Second Embodiment] FIG. 7 shows a second embodiment of the X-axis braking mechanism, in which parts corresponding to those in FIG. The stator 12A of the X-axis linear motor 10A (see FIG. 2) is mounted on the surface plate 3 so as to be movable in the X direction via a linear motion guide 13A. A cylindrical insulator 62 extending in the X direction is fixed to an end of the stator 12A in the -X direction, and a coil 63 is wound around the insulator 62. The permanent magnet 61 is inserted in a non-contact manner, and the permanent magnet 61 is fixed to the braking frame 35A fixed on the base 1. In this example, the permanent magnet 61 and the coil 63
A voice coil motor as a braking mechanism is configured,
The voice coil motor applies a braking force FXA that cancels the reaction force −FXA acting on the stator 12A. The embodiment in which the voice coil motor is used as the X-axis braking mechanism is particularly effective when a moving magnet type linear motor is used as the X-axis driving mechanism.

[Third Embodiment] FIG. 8 shows a third embodiment of the X-axis braking mechanism, in which parts corresponding to those in FIG. An elastically deformable rod 64B made of, for example, metal extending in the X direction is fixed to the end of the stator 12A of the shaft linear motor in the -X direction, and the braking frame 35A fixed to the base 1 is also fixed.
An elastically deformable rod 64A made of, for example, metal and extending in the X direction is fixed to face the rod 64B, and a viscoelastic body 65 is interposed between the rods 64A and 64B. In this example, the rods 64A and 64B can perform a certain degree of rotation and expansion and contraction in the X direction within the range of elastic deformation, and the viscoelastic body 65 is provided with rods 64A and 6 that sandwich the rod.
It plays a role of increasing the gap between the disc-shaped tip of 4B, the position in the direction perpendicular to the X axis, and the degree of parallelism of the tip.

Therefore, when a reaction force in the -X direction acts on the stator 12A, for example, the braking frame 35A is driven by the braking mechanism including the rods 64A and 64B and the viscoelastic body 65.
And the braking force of substantially the same magnitude acts on the stator 12A in the + X direction as the reaction, and the stator 12A hardly moves in the X direction.
No vibration occurs.

In this embodiment, the rod 64 made of an elastic material is used.
When the stator 12A and the braking frame 35A are connected only by A and 64B, the floor vibration and the reaction force against the stator 12A during acceleration / deceleration of the X stage are transmitted to the braking frame 35A, and the vibration of the braking frame 35A is reversed. Stator 12A
It is transmitted to. Further, the vibration in the X direction in which the stator 12A can freely move with respect to the surface plate 3 is not transmitted to the surface plate 3, but the vibrations in the Y direction and the Z direction are transmitted to the surface plate 3. On the other hand, in the present example, the vibration components in the Y direction and the Z direction can be reduced through the viscoelastic body 65.

[Fourth Embodiment] FIG. 9 shows a fourth embodiment of the X-axis braking mechanism. In FIG. 9 where parts corresponding to those in FIG. An elastically deformable, for example, metal rod 67 extending in the X direction is connected to an end of the stator 12A of the shaft linear motor in the −X direction via a rotatable ball joint 66B.
The other end of 7 is fixed to a braking frame 35A via a rotatable ball joint 66A, and the braking frame 35A is fixed on the base 1.

Also in this example, the reaction force generated on the stator 12A is transmitted to the brake frame 35A via the rod 67 and is canceled by the reaction of the brake frame 35A, so that the stator 12A maintains a substantially stationary state. Moreover, the rod 67 is a rotatable ball joint 66A,
Since the connection is made via 66B, the vibration components in the Y and Z directions can also be reduced.

[Fifth Embodiment] FIG. 10 shows a fifth embodiment of the X-axis braking mechanism. In FIG. 10, parts corresponding to those in FIG. One end of a bellows 69 which is extendable and contractible in the X direction is fixed to an end of the stator 12A of the shaft linear motor in the −X direction, and the other end of the bellows 69 is fixed to a braking frame 35A fixed on the base 1. Further, a liquid such as oil is sealed in the bellows 69,
An intermediate portion of the bellows 69 is supported by a bellows holder 68 fixed to the surface plate 3.

In this example, when a reaction force in the X direction is applied to the stator 12A, the pressure of the liquid inside the bellows 69 changes, but the pressure of the liquid acting on the bellows 69 is balanced in the Y direction and the Z direction. Therefore, only the force in the X direction is transmitted to the braking frame 35A. Therefore, X of the stator 12A
The reaction force in the direction is not transmitted to the surface plate 3 and the stator 12
A does not move significantly in the X direction.

Next, the stage device of the above embodiment is
The present invention can be applied to a reticle stage of a projection exposure apparatus. FIG. 11 shows a modification of the projection exposure apparatus of FIG. 1. In FIG. 11, not only the wafer stage but also the reticle stage are provided with a non-contact linear motor which is an X-axis driving device. A vibration mechanism is provided to provide a braking mechanism that applies a braking force that cancels a reaction force applied to the stator when the motor is driven, thereby preventing generation of vibration.

In this case, three columns 88 are fixed at appropriate positions on the base 1, and the upper ends of these columns 88 are
Three vibration isolation tables 2 each composed of an air damper, an elastic spring or an oil damper are fixed. The lens barrel base 83 is mounted on the support post 88 via these vibration isolation tables 2. The projection optical system PL is supported by a barrel base 83, and the reticle base 103 on which the reticle stage 122 is mounted is
It is supported by a frame 84 provided on a lens barrel base 83. The wafer surface plate 3 on which the wafer stage 15 is mounted,
It is suspended and fixed to a lens barrel base 83 via a frame 86. The structure of the drive mechanism of the wafer stage 15 is as follows.
1 and 2, the same portions are denoted by the same reference numerals, and redundant description will be omitted. The illumination optical system 24 is supported by a frame 82 provided on a lens barrel base 83.

On the reticle surface plate 103, a stator 112 is provided.
X-axis linear motors 10A and 10B each including A, 112B and movers 11A and 11B are arranged. Mover 1
1A and 11B are connected to reticle stage 122 via connecting member 9. The reticle stage 122
It is guided by a linear motion guide (not shown) in the X-axis direction, and is driven by the X-axis linear motors 10A and 10B to smoothly move back and forth in the X direction. The position of the reticle stage 122 in the X direction is determined by a moving mirror 119 fixed on the reticle stage 122 and a laser interferometer supported by the reticle surface plate 103 and irradiating the moving mirror 119 with a laser beam parallel to the X axis. 121.

The stators 112A and 112B are guided by the linear motion guides 13A and 13B and can slide back and forth in the X direction. X braking members 36A and 36B that apply a braking force to the stators 112A and 112B in a non-contact manner are attached to the braking frame 35 fixed to the base 1. The reticle stage control system 54 includes the laser interferometer 12
1 and the reticle stage movers 11A and 11B and the X braking member 3 based on the output of the reticle stage 1 and the command from the main control system 51.
6A and 36B. Movable elements 11A and 11B on reticle stage side and X braking member 36
The apparatus configuration for controlling A and 36B is the same as that of the wafer stage shown in FIG. At this time, Y
Since the driving control in the direction is not performed, the mover 1 of the reticle stage corresponding to the drivers 56A and 56B in FIG.
Drivers for 1A and 11B and drivers 57A and 57B
X braking members 36A, 3 of the reticle stage corresponding to X
6B drivers are added, and these are connected to the reticle stage control system 54.

In the above apparatus, the reticle stage 1
In order to drive 22 in the + X direction, movers 11A, 11
When a thrust in the X direction is applied to B, the corresponding stator 1
A reaction force acts on 12A and 112B. At the same time, the braking force acting on the stators 112A and 112B from the X braking members 36A and 36A is a thrust in the X direction having the same magnitude in the opposite direction to the reaction force.
Without any force in the X direction acting on the stator 112.
A and 112B maintain a stationary state. At this time, since the reaction force and the braking force are substantially on the same line, no moment or force for deforming the stators 112A and 112B is generated, and a slight amount is generated when the movers 11A and 12B are accelerated or decelerated. Since no vibration or the like occurs, the reticle can be precisely driven to a desired position in the X direction. In addition,
The present invention is not limited to the above-described embodiment, and it is needless to say that various configurations can be adopted without departing from the gist of the present invention.

[0064]

According to the stage driving method of the present invention, since the stator of the non-contact type driving means is braked, the moment and the deformation force are reduced when suppressing the vibration accompanying the driving of the movable table (movable part). There is an advantage that it is difficult to generate the like. in this case,
When a braking force is applied to the stator in the feedforward system based on the command values of the position of the movable table and the moving speed, the response speed is improved.

Next, according to the first stage apparatus of the present invention and the exposure apparatus of the present invention, since the braking member for the stator of the non-contact type driving apparatus is provided, the stage driving method of the present invention can be used. . In this case, the stator of the non-contact type driving device is supported so as not to move in a direction perpendicular to the predetermined direction with respect to the surface plate, and the braking member provided on the base is provided on the base. And a thrust generator attached to the frame and applying a braking force consisting of an electromagnetic force to a stator of the non-contact type driving device, wherein the thrust generator is provided with the non-contact type driving device. When the thrust that substantially cancels the reaction force acting on the stator when the movable table is driven through is generated as the braking force, the thrust is actively used without using a large vibration damping mechanism. In addition, there is an advantage that vibration accompanying the driving of the movable portion can be greatly reduced.

On the other hand, the stator of the non-contact type driving device is
It is supported so as not to move in the direction perpendicular to the predetermined direction with respect to the surface plate, and the braking member provided on the base is
When having a frame provided on the base and a passive brake attached to the frame and applying a mechanical braking force to the stator of the non-contact type driving device, a large vibration damping mechanism is required. There is an advantage that the vibration accompanying the driving of the movable part can be greatly reduced by a passive and inexpensive braking mechanism without using it.

Further, according to the second stage device of the present invention, when the movable portion is driven in two intersecting directions, the vibration generated in one moving direction does not significantly affect the other moving direction. There is an advantage that can be suppressed. Further, there is an advantage that a moment, a deforming force, and the like are hardly generated when suppressing the vibration accompanying the driving of the second movable table (movable portion). In this case, the braking member has a fixed member arranged so as to face the movable member over the entire movement range of the movable member in the first direction, and between the movable member and the fixed member. When driving the second movable table via the non-contact type driving means, a thrust which substantially cancels a reaction force acting on the movable member is generated.
There is an advantage that even when the position in the direction changes, the vibration when the movable member is driven in the second direction in the same state is always reduced.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram showing a projection exposure apparatus used in an example of an embodiment of the present invention.

FIG. 2 is a partially cutaway perspective view showing a wafer stage of the projection exposure apparatus of FIG.

3 (a) is a partially cutaway plan view showing a Y brake motor 31 of FIG. 1, and FIG. 3 (b) is a side view of FIG. 3 (a).

4A is a plan view showing a modification of the Y braking motor 31, and FIG. 4B is a side view of FIG. 4A.

FIG. 5 shows a stage system according to an example of the embodiment;
FIG. 2 is a block diagram showing a control system of a brake mechanism.

FIG. 6 is a simplified side view of the wafer stage of FIG. 2 as viewed in the −Y direction.

FIG. 7 is a side view showing a main part of a second embodiment of an X-axis braking mechanism.

FIG. 8 is a side view showing a main part of a third embodiment of an X-axis braking mechanism.

FIG. 9 is a side view showing a main part of a fourth embodiment of an X-axis braking mechanism.

FIG. 10 is a side view showing a main part of a fifth embodiment of an X-axis braking mechanism.

FIG. 11 is a configuration diagram illustrating an exposure apparatus in which a mechanism for braking a reaction force is incorporated in a wafer stage and a reticle stage.

FIG. 12 is a simplified configuration diagram showing a conventional stage device.

[Explanation of symbols]

R: reticle, W: wafer, PL: projection optical system, 1: base, 2A to 2C: anti-vibration table, 3: platen, 4: X guide bar, 5, 8: Y guide bar carrier, 6: Y Guide bar,
7 ... X direction restraint bearing member, 9 ... Connecting member, 10
A, 10B: X-axis linear motor, 11A, 11B: mover, 12A, 12B: stator, 13A, 13B: linear guide, 15: sample table, 16A, 16B: stator, 17A
… Mover, 26A, 26B… Y-axis linear motor, 31…
Y braking motor, 32: mover, 33: stator, 36A,
36B: X braking member, 64A, 64B: Rod, 65A
... viscoelastic body

──────────────────────────────────────────────────の Continued on front page (51) Int.Cl. ⁶ Identification code FI G05D 3/10 G05D 3/10 C H01L 21/68 H01L 21/68 KB23Q 1/18 Z

Claims (10)

[Claims] 1. A stage driving method for driving a movable table mounted on a surface plate so as to be movable in a predetermined direction with respect to the surface plate using a non-contact type driving means in the predetermined direction. In a state where the stator of the non-contact type driving means is movably supported with respect to the surface plate, a braking force is applied to the stator when a thrust is applied to the movable table in the predetermined direction. Stage driving method. 2. The stage driving method according to claim 1, wherein the braking force applied to the stator is provided in a non-contact manner by an electromagnetic force. 3. The stage driving method according to claim 1, wherein a braking force is applied to the stator by a feedforward system based on a command value of a position and a moving speed of the movable table. Stage driving method. 4. A surface plate, a movable table installed movably in a predetermined direction with respect to the surface plate, and non-contact type driving means for driving the movable table in the predetermined direction with respect to the surface plate. A stage device having a fixed member that movably supports the stator of the non-contact type driving unit in the predetermined direction with respect to the surface plate and that applies a braking force to the stator. A stage device provided on a base. 5. The stage device according to claim 4, wherein the stator of the non-contact type driving means is supported so as not to move in a direction perpendicular to the predetermined direction with respect to the surface plate. The braking member provided on the base includes a thrust generator configured to apply a braking force composed of an electromagnetic force to a frame provided on the base and a stator of the non-contact type driving unit attached to the frame. Wherein the thrust generator generates, as the driving force, a thrust that substantially cancels a reaction force acting on the stator when driving the movable table via the non-contact type driving unit. A stage device characterized in that: 6. The stage device according to claim 4, wherein the stator of the non-contact type driving means is supported so as not to move in a direction orthogonal to the predetermined direction with respect to the surface plate. The braking member provided on the base, a frame provided on the base, a passive brake attached to the frame and providing a mechanical braking force to the stator of the non-contact type driving means, A stage device comprising: 7. A surface plate, a first movable table movably mounted on the surface plate in a first direction, and a first movable table intersecting the first movable table in the first direction. A second movable table installed movably in two directions, a driving device for driving the first movable table in the first direction with respect to the surface plate, and a first movable table. And a non-contact type driving means for driving the second movable table in the second direction. The stage device being attached to the first movable table, and A movable member that moves in one direction; and a thrust force in the second direction applied to the movable member over a moving range of the movable member in the first direction that is fixed on a predetermined base. A stage comprising a braking member apparatus. 8. The stage device according to claim 7, wherein the braking member is disposed so as to face the movable member over the entire moving range of the movable member in the first direction. A member for substantially canceling a reaction force acting on the movable member between the movable member and the fixed member when driving the second movable table via the non-contact type driving means. A stage device for generating a thrust. 9. An exposure apparatus, wherein a pattern formed on an illuminated mask is projected via a projection optical system onto a substrate mounted on the stage apparatus according to claim 4. 10. A pattern illuminating a mask mounted on the stage device according to claim 4, and projecting a pattern formed on the mask onto a substrate on a substrate stage via a projection optical system. Exposure equipment.