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JPH11160229A - Concentration measuring cell - Google Patents

Concentration measuring cell

Info

Publication number
JPH11160229A
JPH11160229A JP9330054A JP33005497A JPH11160229A JP H11160229 A JPH11160229 A JP H11160229A JP 9330054 A JP9330054 A JP 9330054A JP 33005497 A JP33005497 A JP 33005497A JP H11160229 A JPH11160229 A JP H11160229A
Authority
JP
Japan
Prior art keywords
processing liquid
concentration
processing
flow path
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9330054A
Other languages
Japanese (ja)
Inventor
Tomonori Ojimaru
友則 小路丸
Yusuke Muraoka
祐介 村岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP9330054A priority Critical patent/JPH11160229A/en
Publication of JPH11160229A publication Critical patent/JPH11160229A/en
Pending legal-status Critical Current

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  • Testing Or Calibration Of Command Recording Devices (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Optical Measuring Cells (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)

Abstract

PROBLEM TO BE SOLVED: To stably and correctly measure the concentration of a process liquid flowing in a process liquid feed pipe. SOLUTION: A concentration measuring cell 1 is provided with an inflow opening 2 through which a process liquid enters, an outflow opening 3 through which the process liquid flows out, a passage part 4 sending the process liquid between the inflow opening 2 and outflow opening 3, and a measurement light- passing part 5 formed at the passage part 4 to pass a measurement light SL for measuring the concentration of the process liquid through the process liquid flowing in the passage part 4. In order to measure the concentration of the process liquid which is a mixture of deionized water and one or more chemical solutions, the concentration measurement cell 1 is detachably installed in the middle of a process liquid feed pipe 30 where the process liquid flows, with the inflow opening 2 and outflow opening 3 positioned respectively at the upstream and downstream sides. A stirring part 6 for stirring the process liquid sent from the inflow opening 2 to the passage part 4 is set between the inflow opening 2 and the measurement light-passing part 5 in the passage part 4.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えば、基板処理
などに用いられる、純水と1種類以上の薬液とを混合し
た処理液の濃度(処理液内の薬液の濃度)を測定するた
めに、その処理液が流される処理液送液管の管路途中に
着脱自在に介装される濃度測定用セルに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for measuring the concentration of a processing solution obtained by mixing pure water and at least one type of chemical solution (concentration of the chemical solution in the processing solution), for example, used for substrate processing. The present invention also relates to a concentration measuring cell which is removably interposed in the middle of a processing liquid feed pipe through which the processing liquid flows.

【0002】[0002]

【従来の技術】純水と1種類以上の薬液とを混合した処
理液を用いて基板処理を行う基板処理装置は、図11に
示すように、純水と1種類以上の薬液とを混合する処理
液混合部10と、処理液混合部10で混合された処理液
を用いて基板に処理を施す基板処理部20と、処理液混
合部10で混合された処理液を基板処理部20に送液す
る処理液送液管30などを備えている。
2. Description of the Related Art As shown in FIG. 11, a substrate processing apparatus for processing a substrate by using a processing solution obtained by mixing pure water and one or more chemicals mixes pure water with one or more chemicals. The processing liquid mixing section 10, a substrate processing section 20 for processing a substrate using the processing liquid mixed in the processing liquid mixing section 10, and a processing liquid mixed in the processing liquid mixing section 10 are sent to the substrate processing section 20. A liquid supply pipe 30 for treating liquid is provided.

【0003】この種の装置では、基板処理部20に供給
する処理液の濃度調節をフィードバック制御によって行
ったり、基板処理部20に供給する処理液の濃度を監視
したりするために、処理液送液管30に流れている処理
液の濃度の測定が行われる。
In this type of apparatus, the concentration of the processing liquid supplied to the substrate processing section 20 is adjusted by feedback control, or the concentration of the processing liquid supplied to the substrate processing section 20 is monitored. The concentration of the processing liquid flowing in the liquid pipe 30 is measured.

【0004】この処理液の濃度測定のために、処理液送
液管30の管路途中に、濃度測定用セル100が介装さ
れる。従来の濃度測定用セル100は、処理液を流入す
る流入口101と、処理液を流出する流出口102と、
流入口101と流出口102との間で処理液を流す流路
部103と、流路部103に形成され、処理液の濃度を
測定するための測定光SLを、流路部103内を流れる
処理液内に透過させる測定光透過部104とを備えて構
成されている。
In order to measure the concentration of the processing solution, a concentration measuring cell 100 is interposed in the middle of the processing solution feed pipe 30. A conventional concentration measuring cell 100 includes an inlet 101 for flowing a processing solution, an outlet 102 for flowing a processing solution,
A flow path portion 103 through which the processing liquid flows between the inflow port 101 and the outflow port 102, and a measurement light SL formed in the flow path section 103 for measuring the concentration of the processing liquid flows through the flow path section 103. And a measuring light transmitting unit 104 that transmits the processing liquid.

【0005】この濃度測定用セル100が、処理液送液
管30の管路途中に介装された状態で、測定光透過部1
04に測定光SLを照射する投光部41と、測定光透過
部104を流れる処理液を透過した測定光SLを受光す
る受光部42とが、測定光透過部104を挟んで対向配
備され、受光部42で受光された透過光が濃度計40に
送られ、濃度計40において、受光部42で受光された
透過光の強度(光量)に基づき、処理液の濃度が求めら
れる。
[0005] In a state where the concentration measuring cell 100 is interposed in the middle of the processing solution feed pipe 30, the measuring light transmitting section 1
A light projecting unit 41 that irradiates the measuring light SL onto the light receiving unit 04 and a light receiving unit 42 that receives the measuring light SL that has passed through the processing liquid flowing through the measuring light transmitting unit 104 are provided to face each other with the measuring light transmitting unit 104 interposed therebetween. The transmitted light received by the light receiving unit 42 is sent to the densitometer 40, and the concentration meter 40 calculates the concentration of the processing liquid based on the intensity (light amount) of the transmitted light received by the light receiving unit 42.

【0006】濃度計40で求められた処理液の濃度はコ
ントローラ50に与えられる。コントローラ50は、入
力部55から入力される処理条件(レシピ)に従って処
理し得るように、濃度計40から与えられる処理液の濃
度に基づき、基板処理部20に供給する処理液の濃度調
節をフィードバック制御によって行ったり、基板処理部
20に供給する処理液の濃度を監視したりする。
The concentration of the processing solution obtained by the concentration meter 40 is given to a controller 50. The controller 50 feeds back the concentration adjustment of the processing liquid supplied to the substrate processing unit 20 based on the concentration of the processing liquid supplied from the densitometer 40 so that the processing can be performed according to the processing condition (recipe) input from the input unit 55. The control is performed or the concentration of the processing liquid supplied to the substrate processing unit 20 is monitored.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、この種
の処理液混合部10は、混合管12に流れている純水
に、薬液を導入することで純水と薬液とを混合するもの
であるため、混合管12内で純水と薬液とが十分に混ぜ
合わされずに処理液送液管30に流出される。一方で、
従来の濃度測定用セル100は、流入口101から流入
された処理液(純水と薬液とが十分に混ぜ合わされてい
ない処理液)がそのまま測定光透過部104を流れるの
で、測定光透過部104を流れる処理液内の薬液の混合
率が経時的に変動し、図12(a)に示すように、濃度
計40で求められる処理液の濃度は変動して安定しない
ことがあった。このような現象は、濃度測定用セル10
0を処理液混合部10に近づけて介装するに従ってより
顕著に現れる。
However, this type of processing liquid mixing section 10 mixes pure water and a chemical by introducing a chemical into pure water flowing through a mixing pipe 12. Then, the pure water and the chemical liquid are not sufficiently mixed in the mixing pipe 12 and flow out to the processing liquid supply pipe 30. On the other hand,
In the conventional concentration measuring cell 100, the processing liquid (the processing liquid in which pure water and the chemical solution are not sufficiently mixed) flowing from the inflow port 101 flows through the measuring light transmitting section 104 as it is. In some cases, the mixing ratio of the chemical solution in the processing liquid flowing through the liquid varies with time, and as shown in FIG. 12A, the concentration of the processing liquid obtained by the densitometer 40 may fluctuate and become unstable. Such a phenomenon is caused by the concentration measuring cell 10.
0 appears more prominently as the processing solution mixing unit 10 is disposed closer to the processing solution mixing unit 10.

【0008】また、例えば、図12(b)に示すよう
に、処理液送液管30の配設の関係などで、処理液混合
部10と濃度測定用セル100との間で、処理液送液管
30に屈曲部31などが形成されるような場合には、処
理液送液管30に流れる処理液の偏流などに起因して、
図12(c)に示すように、濃度計40で求められる処
理液の濃度は、さらに実際の濃度からシフトされること
もあった。
Further, as shown in FIG. 12B, for example, due to the arrangement of the processing liquid feed pipe 30, the processing liquid is sent between the processing liquid mixing section 10 and the concentration measuring cell 100. In the case where the bent portion 31 or the like is formed in the liquid tube 30, due to the uneven flow of the processing liquid flowing through the processing liquid liquid feeding tube 30,
As shown in FIG. 12C, the concentration of the processing solution obtained by the densitometer 40 may be further shifted from the actual concentration.

【0009】上述したように、濃度計40で処理液の濃
度が安定的に、さらに正確に求められないと、コントロ
ーラ50が、基板処理部20に供給する処理液の濃度を
監視する際に、現在の処理液の濃度が適正範囲に入って
いるか否かを正しく判断できず、処理不良などの発生を
未然に防止できなくなる。また、濃度計40から与えら
れる処理液の濃度に基づき、基板処理部20に供給する
処理液の濃度調節をフィードバック制御によって行う場
合、コントローラ50は、混合管12に導入する薬液の
導入流量を調節する制御を処理液混合部10に対して行
うが、濃度計40で処理液の濃度が安定的に、さらに正
確に求められないと、コントローラ50が処理液混合部
10に対して行う制御が不安定になり、その結果、処理
液内の純水に対する薬液の混同比率、すなわち、処理液
の濃度のバラツキが大きくなり、均一な処理が行えなく
なる。
As described above, if the concentration of the processing liquid is not stably and accurately obtained by the densitometer 40, the controller 50 monitors the concentration of the processing liquid supplied to the substrate processing unit 20 when monitoring the concentration of the processing liquid. It is not possible to correctly determine whether the current concentration of the processing liquid is within the appropriate range, and it becomes impossible to prevent the occurrence of processing defects and the like. When the concentration of the processing solution supplied to the substrate processing unit 20 is adjusted by feedback control based on the concentration of the processing solution provided from the densitometer 40, the controller 50 adjusts the introduction flow rate of the chemical solution introduced into the mixing pipe 12. However, if the concentration of the processing liquid is not stably and accurately obtained by the densitometer 40, the control performed by the controller 50 on the processing liquid mixing section 10 is improper. As a result, the mixing ratio of the chemical liquid to the pure water in the processing liquid, that is, the concentration of the processing liquid becomes large, and uniform processing cannot be performed.

【0010】本発明は、このような事情に鑑みてなされ
たものであって、濃度測定用セルの介装位置や処理液送
液管の配設状態などに影響されずに、処理液の濃度を安
定的にかつ正確に測定することができる濃度測定用セル
を提供することを目的とする。
The present invention has been made in view of such circumstances, and is not affected by the interposition position of the concentration measuring cell and the arrangement state of the processing liquid feed pipe, and the like. It is an object of the present invention to provide a concentration measurement cell capable of stably and accurately measuring the concentration.

【0011】[0011]

【課題を解決するための手段】本発明は、このような目
的を達成するために、次のような構成をとる。すなわ
ち、本発明は、処理液を流入する流入口と、処理液を流
出する流出口と、前記流入口と前記流出口との間で処理
液を流す流路部と、前記流路部に形成され、処理液の濃
度を測定するための測定光を、前記流路部内を流れる処
理液内に透過させる測定光透過部と、を備え、純水と1
種類以上の薬液とを混合した処理液の濃度を測定するた
めに、その処理液が流される処理液送液管の管路途中
に、前記流入口を上流側に、前記流出口を下流側にして
着脱自在に介装される濃度測定用セルにおいて、前記流
入口から前記流路部に流入された処理液を撹拌する撹拌
部を、前記流路部内の前記流入口と前記測定光透過部と
の間に設けたことを特徴とするものである。
The present invention has the following configuration in order to achieve the above object. That is, the present invention provides an inflow port for inflow of the processing liquid, an outflow port for outflow of the processing liquid, a flow path section for flowing the processing liquid between the inflow port and the outflow port, and a flow path formed in the flow path section. A measurement light transmitting section for transmitting measurement light for measuring the concentration of the processing liquid into the processing liquid flowing through the flow path section.
In order to measure the concentration of the processing liquid mixed with more than one type of chemical liquid, in the middle of the line of the processing liquid supply pipe through which the processing liquid flows, the inlet is on the upstream side, and the outlet is on the downstream side. In the concentration measurement cell that is detachably interposed, a stirring unit that stirs the processing liquid that has flowed from the inflow port into the flow path unit, the inflow port in the flow path unit and the measurement light transmission unit, It is characterized by being provided between.

【0012】[0012]

【作用】本発明の作用は次のとおりである。純水と1種
類以上の薬液とを混合した処理液が流される処理液送液
管の管路途中に、流入口を上流側に、流出口を下流側に
して濃度測定用セルが介装される。本発明に係る濃度測
定用セルは、流入口から流路部に流入された処理液を撹
拌する撹拌部が、流路部内の流入口と測定光透過部との
間に設けられているので、処理液送液管を流れてきて流
入口から流路部に流入された処理液は、撹拌部で撹拌さ
れた後、測定光透過部に流されることになる。従って、
純水と薬液とが十分に混ぜ合わされていない処理液が流
入口から流路部内に流入されたとしても、測定光透過部
に流れるときには、純水と薬液とが十分に混ぜ合わされ
ていることになり、濃度測定用セルの介装位置や処理液
送液管の配設状態などに影響されずに、処理液の濃度を
安定的にかつ正確に測定することができる。
The operation of the present invention is as follows. A concentration measuring cell is interposed in the middle of the processing liquid feed pipe through which a processing liquid in which pure water and one or more chemical liquids are mixed is flowed, with the inlet being on the upstream side and the outlet being on the downstream side. You. Since the concentration measurement cell according to the present invention is provided with a stirrer that stirs the processing liquid that has flowed into the flow channel from the flow inlet, between the flow inlet and the measurement light transmitting unit in the flow channel, The processing liquid flowing through the processing liquid supply pipe and flowing into the flow path from the inlet is agitated by the agitation unit and then flows to the measurement light transmitting unit. Therefore,
Even if the processing liquid in which the pure water and the chemical liquid are not sufficiently mixed is introduced into the flow path from the inlet, when the pure water and the chemical liquid are sufficiently mixed when flowing into the measurement light transmitting section. In other words, the concentration of the processing liquid can be stably and accurately measured without being affected by the position of the concentration measurement cell and the arrangement of the processing liquid supply pipe.

【0013】[0013]

【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を説明する。図1は本発明に係る濃度測定用セ
ルが適用される基板処理装置の一例の構成を示す図であ
る。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a configuration of an example of a substrate processing apparatus to which a concentration measuring cell according to the present invention is applied.

【0014】この基板処理装置は、複数枚の基板Wを処
理液に浸漬して同時に処理する処理槽21を備えたバッ
チ式の装置であり、その全体的な構成は、図11で説明
した通り、純水と1種類以上の薬液とを混合する処理液
混合部10で混合された処理液が、処理液送液管30を
介して基板処理部20に送液され、基板処理部20で、
処理液混合部10から送液された処理液を用いて基板W
に処理を施すように構成されている。
This substrate processing apparatus is a batch type apparatus provided with a processing tank 21 for immersing a plurality of substrates W in a processing liquid and simultaneously processing the substrates. The overall configuration is as described with reference to FIG. The processing liquid mixed in the processing liquid mixing unit 10 that mixes pure water and one or more types of chemicals is sent to the substrate processing unit 20 via the processing liquid feed pipe 30, and the substrate processing unit 20
Using the processing liquid sent from the processing liquid mixing unit 10, the substrate W
Is configured to be processed.

【0015】処理液混合部10は、純水供給管11と混
合管12とを備えている。混合管12は、純水供給管1
1と処理液送液管30とを接続するように、これら各管
11、30の間に介装されている。純水供給管11には
純水供給弁13が介装され、この純水供給弁13を操作
することによって、混合管12に対する純水の供給とそ
の停止とが切り換えられる。なお、混合管12に純水が
供給されるとき、純水の供給流量が常に一定になるよう
に構成されている。混合管12には、薬液導入弁14を
介して薬液供給管15が接続され、各薬液導入弁14を
操作することで、混合管12に対する各薬液の導入とそ
の停止とが切り換えられる。各薬液導入弁14は、例え
ば、流量調節が任意に行える流量調節弁で構成され、混
合管12への薬液の導入流量を適宜に調節できるように
構成されている。これにより、混合管12において、純
水と1種類以上の薬液とを任意の混合比率で混合でき、
処理液の濃度(処理液内の薬液の濃度)を任意に変更す
ることができる。
The processing liquid mixing section 10 includes a pure water supply pipe 11 and a mixing pipe 12. The mixing pipe 12 is a pure water supply pipe 1
1 and a processing solution feed pipe 30 are interposed between the pipes 11 and 30 so as to connect the pipes 1 and 30 to each other. The pure water supply pipe 11 is provided with a pure water supply valve 13, and by operating the pure water supply valve 13, the supply of pure water to the mixing pipe 12 and the stop thereof are switched. When pure water is supplied to the mixing tube 12, the supply flow rate of pure water is always constant. A chemical solution supply pipe 15 is connected to the mixing pipe 12 via a chemical solution introduction valve 14, and by operating each of the chemical solution introduction valves 14, the introduction and stop of each chemical solution into the mixing pipe 12 is switched. Each chemical solution introduction valve 14 is configured, for example, as a flow rate control valve that can arbitrarily adjust the flow rate, and is configured so that the flow rate of the chemical solution introduced into the mixing pipe 12 can be appropriately adjusted. Thereby, in the mixing tube 12, pure water and one or more kinds of chemicals can be mixed at an arbitrary mixing ratio,
The concentration of the processing solution (the concentration of the chemical solution in the processing solution) can be arbitrarily changed.

【0016】コントローラ50は、入力部55から入力
された処理条件(レシピ)に従って、純水供給弁13や
各薬液導入弁14を操作し、純水と、指定された1種類
以上の薬液とを、指定された混合比率(処理液濃度)で
混合した処理液を基板処理部20に供給したり、純水の
みを処理液として基板処理部20に供給したり、処理液
(純水及び薬液)の基板処理部20への供給を停止した
りする制御を、指定された処理順序で行う。このとき、
処理液混合部10から流出され、処理液送液管30に流
れている処理液の濃度が濃度計40で測定され、その測
定値(処理液送液管30に流れている現在の処理液の濃
度)に基づき、コントローラ50は、例えば、指定され
た濃度にするように、フィードバック制御で薬液導入弁
14の操作量を調節制御し、処理液の濃度が指定された
濃度に調節された後は、その濃度に維持されているか否
かを監視する。
The controller 50 operates the pure water supply valve 13 and each chemical liquid introduction valve 14 in accordance with the processing conditions (recipe) input from the input unit 55, and converts the pure water and one or more specified chemical liquids. A processing liquid mixed at a specified mixing ratio (processing liquid concentration) is supplied to the substrate processing section 20, a pure water alone is supplied to the substrate processing section 20 as a processing liquid, or a processing liquid (pure water and chemical liquid) is supplied. The control for stopping the supply to the substrate processing unit 20 is performed in a designated processing order. At this time,
The concentration of the processing liquid flowing out of the processing liquid mixing unit 10 and flowing into the processing liquid feed pipe 30 is measured by the densitometer 40, and the measured value (the current processing liquid flowing through the processing liquid feed pipe 30) is measured. Based on the concentration, for example, the controller 50 controls the operation amount of the chemical solution introduction valve 14 by feedback control so as to obtain the designated concentration, and after the concentration of the processing liquid is adjusted to the designated concentration. And monitor whether it is maintained at that concentration.

【0017】基板処理部20に備えられた処理槽21
は、槽下部に処理液注入管22が取り付けられている。
処理液送液管30と処理液注入管22とが接続され、処
理液注入管22から処理槽21内に処理液が供給され
て、処理槽1内に処理液の上昇液流が形成可能に構成さ
れている。そして、処理槽1内の余分な処理液を槽上部
から溢れ出させて、処理槽1の外周上部に設けられたオ
ーバーフロー槽23で回収して排出することで、処理槽
1内の処理液の置換なども行えるようになっている。
Processing tank 21 provided in substrate processing section 20
Has a processing liquid injection pipe 22 attached to the lower part of the tank.
The processing liquid feed pipe 30 and the processing liquid injection pipe 22 are connected, and the processing liquid is supplied from the processing liquid injection pipe 22 into the processing tank 21 so that a rising liquid flow of the processing liquid can be formed in the processing tank 1. It is configured. Then, the excess processing liquid in the processing tank 1 overflows from the upper part of the processing tank, and is collected and discharged in the overflow tank 23 provided on the outer peripheral upper part of the processing tank 1, whereby the processing liquid in the processing tank 1 is discharged. Substitution can also be performed.

【0018】図2は、枚葉式の基板処理装置の構成例を
示している。この装置の基板処理部20には、1枚の基
板Wを水平姿勢に保持して鉛直方向の軸芯回りで回転さ
せるスピンチャック25や、スピンチャック25に保持
された基板Wに処理液を噴出供給するノズル26などを
備えている。
FIG. 2 shows an example of the configuration of a single wafer type substrate processing apparatus. The substrate processing unit 20 of this apparatus spins one substrate W in a horizontal position and rotates the substrate W about a vertical axis, and ejects a processing liquid to the substrate W held by the spin chuck 25. A nozzle 26 for supply is provided.

【0019】図2の装置では、処理液送液管30のノズ
ル26近くに、処理液送液管30を流れてくる処理液を
ノズル26に流す状態と排液ドレイン27に流す状態と
で切換え可能な切換え弁28が介装されている。非処理
時には、切換え弁28は排液ドレイン27側に切り換え
られ、処理液混合部10からは純水のみが流出されてい
て、処理液送液管30を流れてくる純水を排液ドレイン
27に流すようにしている。そして、純水と薬液とを混
合するときには、濃度計40からの処理液の濃度に基づ
き、コントローラ50は、例えば、入力部55から入力
されたレシピで指定された濃度にするように、フィード
バック制御により、薬液導入弁14の操作量を調節制御
していく。そして、処理液の濃度が指定された濃度にな
ると、その濃度の処理液が濃度計測位置から切換え弁2
8に到達するのに要する十分な時間が経過した後、切換
え弁28をノズル26側に切り換えて、ノズル26から
基板Wへ所定濃度の処理液を噴出供給して基板Wを処理
する。そして、例えば、コントローラ50は、ノズル2
6から基板Wへ処理液を噴出供給している間、処理液の
濃度が指定された濃度に維持されているか否かを監視す
る。ノズル26から基板Wへの処理液の供給時間が経過
すると、切換え弁28を排液ドレイン27側に切り換
え、混合管12への薬液の導入を停止するように薬液導
入弁14を操作して、上述した非処理状態に戻す。
In the apparatus shown in FIG. 2, the state in which the processing liquid flowing through the processing liquid feed pipe 30 flows to the nozzle 26 and the state in which the processing liquid flows to the drain 27 near the nozzle 26 of the processing liquid feed pipe 30 are switched. A possible switching valve 28 is provided. At the time of non-processing, the switching valve 28 is switched to the drainage drain 27 side, and only the pure water is flowing out of the processing liquid mixing unit 10, and the pure water flowing through the processing liquid feed pipe 30 is discharged to the drainage drain 27. It is flowing to. Then, when mixing the pure water and the chemical solution, the controller 50 performs feedback control based on the concentration of the processing solution from the densitometer 40, for example, to the concentration specified by the recipe input from the input unit 55. Thus, the operation amount of the chemical solution introduction valve 14 is adjusted and controlled. When the concentration of the processing liquid reaches the specified concentration, the processing liquid of the concentration is switched from the concentration measurement position to the switching valve 2.
After a lapse of a sufficient time required to reach No. 8, the switching valve 28 is switched to the nozzle 26 side, and the processing liquid having a predetermined concentration is jetted and supplied from the nozzle 26 to the substrate W to process the substrate W. Then, for example, the controller 50
While ejecting and supplying the processing liquid from 6 to the substrate W, it is monitored whether or not the concentration of the processing liquid is maintained at the specified concentration. When the supply time of the processing liquid from the nozzle 26 to the substrate W elapses, the switching valve 28 is switched to the drainage drain 27 side, and the chemical liquid introduction valve 14 is operated so as to stop the introduction of the chemical liquid into the mixing tube 12. Return to the non-processing state described above.

【0020】図1や図2などの装置において、処理液送
液管30に流れている処理液の濃度を濃度計40で測定
するために、処理液送液管30の管路途中に濃度測定用
セル1が介装される。
In the apparatus shown in FIGS. 1 and 2, in order to measure the concentration of the processing liquid flowing through the processing liquid feed pipe 30 with the concentration meter 40, the concentration is measured in the middle of the processing liquid feed pipe 30. Cell 1 is interposed.

【0021】本発明に係る濃度測定用セル1は、図1な
いし図3に示すように、処理液を流入する流入口2と、
処理液を流出する流出口3と、流入口2と流出口3との
間で処理液を流す流路部4と、流路部4に形成され、処
理液の濃度を測定するための測定光SLを、流路部4内
を流れる処理液内に透過させる測定光透過部5とを備
え、さらに、流入口2から流路部4に流入された処理液
を撹拌する撹拌部(具体的な構成は後述する)6を、流
路部4内の流入口2と測定光透過部5との間に設けてい
る。なお、図3(a)は本発明の一実施形態に係る濃度
測定用セルの拡大正面図であり、図3(b)は正面から
見た縦断面図、図3(c)は、図3(a)のA−A矢視
断面図である。また、図3以下では、処理液の流れを二
点鎖線の矢印で示す。
As shown in FIGS. 1 to 3, the concentration measuring cell 1 according to the present invention includes an inlet 2 through which a processing solution flows,
An outlet 3 for flowing the processing liquid, a flow path 4 for flowing the processing liquid between the inlet 2 and the outlet 3, and a measuring light formed in the flow path 4 for measuring the concentration of the processing liquid. A measurement light transmitting section 5 for transmitting the SL into the processing liquid flowing through the flow path section 4; and a stirring section (specifically, a stirring section for stirring the processing liquid flowing into the flow path section 4 from the inflow port 2). The configuration 6 will be described later) 6 is provided between the inflow port 2 in the flow path unit 4 and the measurement light transmitting unit 5. FIG. 3A is an enlarged front view of the concentration measuring cell according to one embodiment of the present invention, FIG. 3B is a longitudinal sectional view seen from the front, and FIG. FIG. 3A is a cross-sectional view taken along line AA of FIG. In FIG. 3 and subsequent figures, the flow of the processing liquid is indicated by a two-dot chain line arrow.

【0022】この濃度測定用セル1は、流入口2側の端
部と、流出口3側の端部にそれぞれ継手部7a、7bが
設けられ、処理液送液管30の管路途中に着脱自在に介
装できるように構成されている。濃度測定用セル1を処
理液送液管30の管路途中に介装する場合は、流入口2
を上流(処理液混合部10)側に、流出口3を下流(基
板処理部20)側にして介装される。
The concentration measuring cell 1 is provided with joints 7a and 7b at the end on the inlet 2 side and the end on the outlet 3 side, respectively. It is configured so that it can be interposed freely. When the concentration measuring cell 1 is interposed in the middle of the processing liquid feed pipe 30, the inlet 2
On the upstream side (processing liquid mixing section 10) side and the outlet 3 on the downstream side (substrate processing section 20) side.

【0023】図に示す濃度測定用セル1は、流路部4の
径が処理液送液管30の径よりも大きくなるように構成
しているが、処理液送液管30の径が比較的大きい場合
には、流路部4の径をその処理液送液管30と略同径
に、すなわち、濃度測定用セル1全体を円柱状の管で構
成してもよい。
The cell 1 for concentration measurement shown in FIG. 1 is configured such that the diameter of the flow path portion 4 is larger than the diameter of the processing liquid feed pipe 30. When the diameter of the flow path section 4 is substantially larger, the diameter of the flow path section 4 may be substantially the same as that of the processing liquid feed pipe 30, that is, the entire concentration measuring cell 1 may be formed of a cylindrical pipe.

【0024】流路部4の外周面には、円筒状の凹部4a
が2つ、互いに対向するように形成されている。そし
て、これら凹部4aの底面4bで挟まれる比較的幅dが
狭い領域を測定光透過部5としている。濃度計40で
は、処理液内を透過する際の、処理液での測定光SLの
吸収量(処理液内を透過した透過光の強度)によって、
処理液の濃度を求めている。従って、測定光透過部4の
幅dが広すぎると、測定光SLの吸収量が多くなり過ぎ
て、処理液の濃度が測定できなくなるので、測定光透過
部4の幅dを比較的狭くするように構成している。この
測定光透過部4の幅(各底面4b間の距離)dや、各底
面4bの厚みtは、予め決められた寸法になるように製
作されている。
A cylindrical concave portion 4a is formed on the outer peripheral surface of the flow path portion 4.
Are formed so as to face each other. A region having a relatively small width d sandwiched between the bottom surfaces 4b of the concave portions 4a is defined as a measurement light transmitting portion 5. In the densitometer 40, depending on the absorption amount of the measuring light SL in the processing liquid when transmitting through the processing liquid (the intensity of the transmitted light transmitted through the processing liquid).
I want the concentration of the processing solution. Therefore, if the width d of the measurement light transmitting portion 4 is too wide, the absorption amount of the measurement light SL becomes too large, and the concentration of the processing liquid cannot be measured. Therefore, the width d of the measurement light transmitting portion 4 is made relatively narrow. It is configured as follows. The width (distance between the bottom surfaces 4b) d of the measurement light transmitting portion 4 and the thickness t of each bottom surface 4b are manufactured to have predetermined dimensions.

【0025】濃度測定用セル1が、処理液送液管30の
管路途中に介装された状態で、上記2つの凹部4aのう
ちの一方の凹部4aには、測定光透過部5に測定光SL
を照射する投光部41が配設され、また、他方の凹部4
aには、測定光透過部5を流れる処理液を透過した測定
光SLを受光する受光部42が配設されて、測定光透過
部5を挟んで投光部41と受光部42とが対向配備され
る。受光部42で受光された透過光が濃度計40に送ら
れ、濃度計40において、受光部42で受光された透過
光の強度(光量)に基づき、処理液の濃度が求められ
る。
In a state where the concentration measuring cell 1 is interposed in the middle of the processing solution feed pipe 30, one of the two recesses 4a has a measuring light transmitting portion 5 for measuring. Light SL
Is provided, and the other concave portion 4 is provided.
a, a light receiving unit 42 for receiving the measurement light SL transmitted through the processing liquid flowing through the measurement light transmitting unit 5 is provided, and the light projecting unit 41 and the light receiving unit 42 face each other with the measurement light transmitting unit 5 interposed therebetween. Be deployed. The transmitted light received by the light receiving unit 42 is sent to the densitometer 40, and the concentration meter 40 calculates the concentration of the processing liquid based on the intensity (light amount) of the transmitted light received by the light receiving unit 42.

【0026】なお、図3では、濃度計40内に設けられ
た図示しない光源からの所定光量の測定光SLを導く光
ファイバ43の先端部と、透過光を濃度計40に導く光
ファイバ44の先端部とを図示しない取り付け治具など
によって各凹部4aに取り付けて、光ファイバ43の照
射端を投光部41、光ファイバ44の入射端を受光部4
2としているが、各凹部4aに投光器と受光器を直接取
り付け、受光器で受光した透過光の光電変換結果を電気
信号で濃度計40に与えるように構成してもよい。
In FIG. 3, a tip of an optical fiber 43 for guiding a predetermined amount of measurement light SL from a light source (not shown) provided in the densitometer 40 and an optical fiber 44 for guiding transmitted light to the densitometer 40 are shown. The distal end is attached to each recess 4a by a mounting jig (not shown) or the like, and the irradiation end of the optical fiber 43 is set to the light projecting section 41 and the incident end of the optical fiber 44 is set to the light receiving section
Although the number is 2, the light projector and the light receiver may be directly attached to each of the recesses 4a, and the photoelectric conversion result of the transmitted light received by the light receiver may be given to the densitometer 40 by an electric signal.

【0027】上記流路部4のうち、凹部4aの底面4b
内の測定光SLが通過する部分(測定光通過部分4c)
以外の部分は、流路部4に流す処理液内の薬液に対する
耐薬性の材料であれば、透光性材料(例えば、石英やサ
ファイアなど)で形成しても、透光性でない材料(耐薬
性がある樹脂材料など)で形成してもよい。一方、上記
測定光通過部分4cは、流路部4に流す処理液内の薬液
に対する耐薬性があり、かつ、計測光SLを通過させる
ために透光性の材料(例えば、石英やサファイアなど)
で形成されている。なお、上記測定光通過部分4cが薬
液で浸食されて、その厚みtが変動すると、上記測定光
通過部分4cでの測定光SLの吸収量が経時的に変動す
るので、常に正確な濃度測定を実現できなくなる。従っ
て、少なくとも、上記測定光通過部分4cは、透光性が
あり耐薬性が高いサファイアなどで形成するのが好まし
い。また、純水を流して測定系のキャリブレーションを
行って経時的な変動を補正してもよい。
The bottom surface 4b of the concave portion 4a in the flow path portion 4
Portion through which the measuring light SL passes (measuring light passing portion 4c)
The other parts are made of a light-transmitting material (for example, quartz or sapphire) or a non-light-transmitting material (chemical-resistant material) as long as the material is resistant to chemicals in the processing liquid flowing through the flow path unit 4. Resin material having a property). On the other hand, the measurement light passing portion 4c has chemical resistance to a chemical solution in the processing liquid flowing through the flow path portion 4 and has a light-transmitting material (for example, quartz or sapphire) for transmitting the measurement light SL.
It is formed with. When the measurement light passing portion 4c is eroded by the chemical solution and the thickness t changes, the absorption amount of the measurement light SL in the measurement light passing portion 4c changes with time. It cannot be realized. Therefore, it is preferable that at least the measurement light passage portion 4c is formed of sapphire or the like which is translucent and has high chemical resistance. Alternatively, the measurement system may be calibrated by flowing pure water to correct the fluctuation over time.

【0028】次に、撹拌部6の具体的構成を図4ないし
図10を参照して説明する。図4は、図4(a)に示す
ような多数の小孔61aが穿設されたパンチングプレー
ト61を、流路部4内の流入口2と測定光透過部5との
間に配設したことによって撹拌部6を構成した例であ
る。この構成によれば、流入口2から流路部4に流入さ
れた処理液の一部が、パンチングプレート61の小孔6
1a以外の部分にぶつかって流れを変え、小孔61aを
通過する処理液と合流することで処理液全体が撹拌さ
れ、測定光透過部5に流れる前に純水と薬液とが混ぜ合
わされることになる。
Next, a specific configuration of the stirring section 6 will be described with reference to FIGS. FIG. 4 shows a punching plate 61 in which a number of small holes 61a are formed as shown in FIG. 4A, which is arranged between the inflow port 2 in the flow path unit 4 and the measurement light transmitting unit 5. This is an example in which the stirring unit 6 is configured. According to this configuration, a part of the processing liquid flowing into the flow path unit 4 from the inflow port 2 is
When the flow is changed by hitting a part other than 1a and merges with the processing liquid passing through the small holes 61a, the entire processing liquid is stirred, and the pure water and the chemical liquid are mixed before flowing into the measurement light transmitting unit 5. Become.

【0029】なお、図4(c)に示すように、流路部4
内の流入口2と測定光透過部5との間に、流入口2から
流路部4に流入された処理液の流れ方向に沿って、パン
チングプレート61を複数個配設してもよい。パンチン
グプレート61を複数個配設する場合には、例えば、図
4(c)、(d)に示すように、流入口2から見て、各
パンチングプレート61の小孔61aの穿設位置がずら
されるように配設すると、処理液の撹拌がより確実に行
える。
Note that, as shown in FIG.
A plurality of punching plates 61 may be provided between the inflow port 2 and the measurement light transmitting section 5 along the flow direction of the processing liquid flowing into the flow path section 4 from the inflow port 2. When a plurality of punching plates 61 are provided, for example, as shown in FIGS. 4C and 4D, the positions of the small holes 61 a of each punching plate 61 are shifted when viewed from the inlet 2. In such a case, the processing liquid can be more reliably stirred.

【0030】以下の図5ないし図9の各部材62〜65
についても同様に、流路部4内の流入口2と測定光透過
部5との間に、流入口2から流路部4に流入された処理
液の流れ方向に沿って、各部材62〜65を複数個配設
してもよい。
Each of the members 62 to 65 shown in FIGS.
Similarly, between the inflow port 2 and the measurement light transmitting section 5 in the flow path section 4, along the flow direction of the processing liquid flowing into the flow path section 4 from the inflow port 2, each member 62- A plurality of 65s may be provided.

【0031】図5は、上記パンチングプレート61に代
えて、図5(a)に示すような整流板62aを備えた整
流部材62を、流路部4内の流入口2と測定光透過部5
との間に配設したことによって撹拌部6を構成した例で
ある。この構成によれば、流入口2から流路部4に流入
された処理液が各整流板62aによって流れが整流さ
れ、その整流中に処理液全体が撹拌され、測定光透過部
5に流れる前に純水と薬液とが混ぜ合わされることにな
る。なお、整流部材62を複数個配設する場合には、例
えば、図5(c)、(d)に示すように、流入口2から
見て、各整流部材62の整流板62aの整流方向を同じ
(図5(c))にしてもよいし、各整流部材62ごとに
変えるようしてもよい。さらに、図5(e)に示すよう
に、流入口2から見て、各整流部材65の整流板65a
の配列方向がずらされるように配設してもよい。
FIG. 5 shows that a rectifying member 62 having a rectifying plate 62a as shown in FIG.
This is an example in which the agitating unit 6 is configured by being disposed between the agitating unit 6 and the agitating unit 6. According to this configuration, the flow of the processing liquid that has flowed into the flow path unit 4 from the inflow port 2 is rectified by each rectifying plate 62 a, and the entire processing liquid is agitated during the rectification before flowing into the measurement light transmitting unit 5. The pure water and the chemical are mixed together. When a plurality of rectifying members 62 are provided, for example, as shown in FIGS. 5C and 5D, the rectifying direction of the rectifying plates 62 a of each rectifying member 62 is viewed from the inlet 2. It may be the same (FIG. 5C) or may be changed for each rectifying member 62. Further, as shown in FIG. 5E, as viewed from the inflow port 2, the rectifying plates 65 a of the respective rectifying members 65.
May be arranged to be shifted.

【0032】図6は、流路部4内の流入口2と測定光透
過部5との間に、羽根車(プロペラ)63を回動自在に
取り付けたことによって撹拌部6を構成した例である。
羽根車63は、流路部4内において棒状の部材63aに
支持されて固定された固定部材63bに回動自在に取り
付けられている。この構成によれば、流入口2から流路
部4に流入された処理液の流れによって、羽根車63が
回転され、この羽根車63の回転によって処理液が撹拌
され、測定光透過部5に流れる前に純水と薬液とが混ぜ
合わされることになる。なお、図6(c)は、羽根板6
3を複数個配設した構成例である。
FIG. 6 shows an example in which an agitator 6 is formed by rotatably mounting an impeller 63 between the inflow port 2 in the flow path 4 and the measurement light transmitting section 5. is there.
The impeller 63 is rotatably attached to a fixed member 63b supported and fixed by a rod-shaped member 63a in the flow path unit 4. According to this configuration, the impeller 63 is rotated by the flow of the processing liquid flowing into the flow path unit 4 from the inflow port 2, and the processing liquid is agitated by the rotation of the impeller 63. Before flowing, the pure water and the chemical solution are mixed. FIG. 6C shows the blade plate 6.
3 is an example of a configuration in which a plurality of 3s are provided.

【0033】図7は、ねじり板64を流路部4内の流入
口2と測定光透過部5との間に配設したことによって撹
拌部6を構成した例である。この構成によれば、流入口
2から流路部4に流入された処理液に旋回流が形成され
て撹拌され、測定光透過部5に流れる前に純水と薬液と
が混ぜ合わされることになる。なお、図7(b)に示す
ように、ねじり板64に多数の小孔64aが穿設された
孔あきのねじり板64を用いれば、処理液の撹拌がより
確実に行える。また、図7では、板部材を約180°ね
じったねじり板64を図示しているが、板部材を180
°以上(例えば、360°など)ねじったねじり板64
を用いてもよいし、流入口2から流路部4に流入された
処理液の流れ方向に沿って、複数個のねじり板64を配
設してもよい。
FIG. 7 shows an example in which the agitating section 6 is configured by disposing a torsion plate 64 between the inflow port 2 in the flow path section 4 and the measuring light transmitting section 5. According to this configuration, a swirling flow is formed in the processing liquid that has flowed into the flow path unit 4 from the inflow port 2 and is agitated, and the pure water and the chemical liquid are mixed before flowing into the measurement light transmitting unit 5. . As shown in FIG. 7B, the use of a perforated torsion plate 64 in which a number of small holes 64a are formed in the torsion plate 64 allows the processing liquid to be stirred more reliably. FIG. 7 illustrates the torsion plate 64 in which the plate member is twisted by about 180 °.
° or more (eg, 360 °) twisted torsion plate 64
May be used, and a plurality of torsion plates 64 may be provided along the flow direction of the processing liquid flowing into the flow path unit 4 from the inflow port 2.

【0034】図8は、図9に示すような旋回流を形成す
るための多数の翼状の部材65aを有する旋回流形成部
材65を、流路部4内の流入口2と測定光透過部5との
間に配設したことによって撹拌部6を構成した例であ
る。この旋回流形成部材65は、各翼状の部材65aの
流路形成方向SYがコア部材65bの軸線方向JYに対
して傾斜されるように、各翼状の部材65aがコア部材
65aに放射状に取り付けられてる。そして、旋回流形
成部材65は、コア部材65aの軸線方向JYが、流入
口2から流路部4に流入された処理液の流れ方向に略平
行になるように、流路部4内に配設されている。この構
成によれば、図7のねじり板64と同様に、流入口2か
ら流路部4に流入された処理液に旋回流が形成されて撹
拌され、測定光透過部5に流れる前に純水と薬液とが混
ぜ合わされることになる。なお、旋回流形成部材65を
複数個配設する場合には、例えば、図8(c)に示すよ
うに、前段の旋回流形成部材65の翼状の部材65a
(65af)の配設方向と、後段の旋回流形成部材65
の翼状の部材65a(65ab)の配設方向とをずらせ
るようにしてもよい。
FIG. 8 shows a swirling flow forming member 65 having a large number of wing-like members 65a for forming a swirling flow as shown in FIG. This is an example in which the agitating unit 6 is configured by being disposed between the agitating unit 6 and the agitating unit 6. The wing-shaped members 65a are radially attached to the core member 65a such that the flow path forming direction SY of each wing-shaped member 65a is inclined with respect to the axial direction JY of the core member 65b. Te The swirling flow forming member 65 is disposed in the flow channel portion 4 such that the axial direction JY of the core member 65a is substantially parallel to the flow direction of the processing liquid flowing into the flow channel portion 4 from the inflow port 2. Has been established. According to this configuration, similarly to the torsion plate 64 of FIG. 7, a swirling flow is formed in the processing liquid that has flowed into the flow path unit 4 from the inflow port 2 and is agitated. Water and chemicals will be mixed. When a plurality of swirling flow forming members 65 are provided, for example, as shown in FIG.
(65af) and the swirl flow forming member 65 in the subsequent stage.
The arrangement direction of the wing-like members 65a (65ab) may be shifted.

【0035】図10は、石英の玉などの充填物66を、
流路部4内の流入口2と測定光透過部5との間に配設し
たことによって撹拌部6を構成した例である。充填物6
6は、網66aなどによって流路部4内の流入口2と測
定光透過部5との間に配設される。この構成によれば、
流入口2から流路部4に流入された処理液が充填物66
を通過する間に撹拌され、測定光透過部5に流れる前に
純水と薬液とが混ぜ合わされることになる。
FIG. 10 shows a filling 66 such as a quartz ball,
This is an example in which a stirring unit 6 is configured by being disposed between the inflow port 2 in the flow path unit 4 and the measurement light transmitting unit 5. Filling 6
Reference numeral 6 is disposed between the inflow port 2 in the flow path unit 4 and the measurement light transmitting unit 5 by a net 66a or the like. According to this configuration,
The processing liquid flowing into the flow path unit 4 from the inflow port 2 is filled with the filler 66.
The pure water and the chemical solution are mixed before flowing into the measurement light transmitting section 5 while passing through the measuring light transmitting section 5.

【0036】なお、例えば、パンチングプレート61の
後段に充填物66を配設するなど図4ないし図8、及び
図10の各構成を適宜に組み合わせて撹拌部6を構成し
てもよい。
Note that, for example, the agitation unit 6 may be configured by appropriately combining the respective configurations of FIGS. 4 to 8 and FIG. 10, such as disposing a filler 66 at a stage subsequent to the punching plate 61.

【0037】以上説明したように、この実施形態に係る
濃度測定用セル1を用いることによって、純水と薬液と
が十分に混ぜ合わされていない処理液が、濃度測定用セ
ル1の流入口2から流路部4内に流入されたとしても、
その処理液が測定光透過部5の上流の撹拌部6で撹拌さ
れ、測定光透過部5に流れるときには、純水と薬液とが
十分に混ぜ合わされているので、濃度測定用セル1の介
装位置や処理液送液管30の配設状態などに影響されず
に、処理液の濃度を安定的にかつ正確に測定することが
でき、処理液送液管30に流れる処理液の測定濃度に基
づいて行う処理液の濃度監視や、フィードバック制御に
よる処理液の濃度調節などを精度良く、安定的に行うこ
とができる。
As described above, by using the concentration measuring cell 1 according to this embodiment, the processing liquid in which the pure water and the chemical solution are not sufficiently mixed is supplied from the inlet 2 of the concentration measuring cell 1. Even if it flows into the flow path part 4,
When the treatment liquid is stirred by the stirring unit 6 upstream of the measurement light transmission unit 5 and flows into the measurement light transmission unit 5, the pure water and the chemical solution are sufficiently mixed. The concentration of the processing liquid can be measured stably and accurately without being affected by the position, the arrangement state of the processing liquid supply pipe 30, and the like. It is possible to accurately and stably monitor the concentration of the processing solution based on the control, and adjust the concentration of the processing solution by feedback control.

【0038】なお、本発明は、上記実施形態で説明した
濃度測定用セル1の形状に限定されず、種々の形状の濃
度測定用セルに適用することができる。例えば、上記実
施形態の濃度測定用セル1は、流路部4が流入口2から
見た断面で円形になる形状であるが、流路部4が流入口
2から見た断面で矩形などになる濃度測定用セルなどに
も本発明は同様に適用できる。
The present invention is not limited to the shape of the density measuring cell 1 described in the above embodiment, but can be applied to various shapes of density measuring cells. For example, the concentration measuring cell 1 of the above-described embodiment has a shape in which the flow path 4 is circular in cross section as viewed from the inlet 2, but the flow path 4 is rectangular in cross section as viewed from the inlet 2. The present invention can be similarly applied to a concentration measuring cell or the like.

【0039】また、本発明に係る濃度測定用セル1は、
図1、図2の構成の装置に限定されず、純水と1種類以
上の薬液とを混合した処理液を用いる基板処理装置であ
れば同様に適用することができる。
Further, the concentration measuring cell 1 according to the present invention comprises:
The present invention is not limited to the apparatus having the configuration shown in FIGS. 1 and 2 and may be applied to any substrate processing apparatus using a processing liquid obtained by mixing pure water and one or more chemicals.

【0040】[0040]

【発明の効果】以上の説明から明らかなように、本発明
によれば、流入口から流路部に流入された処理液を撹拌
する撹拌部を、流路部内の流入口と測定光透過部との間
に設けたので、純水と薬液とが十分に混ぜ合わされてい
ない処理液が流入口から流路部内に流入されたとして
も、測定光透過部に流れるときには、純水と薬液とが十
分に混ぜ合わされていることになり、濃度測定用セルの
介装位置や処理液送液管の配設状態などに影響されず
に、処理液の濃度を安定的にかつ正確に測定することが
できる。従って、本発明に係る濃度測定用セルを用いれ
ば、処理液送液管に流れる処理液の測定濃度に基づいて
行う処理液の濃度監視や、フィードバック制御による処
理液の濃度調節などを精度良く、安定的に行うことがで
きる。
As is apparent from the above description, according to the present invention, the stirring section for stirring the processing liquid flowing into the flow path from the inlet is provided with the inlet in the flow path and the measuring light transmitting section. Therefore, even if the processing liquid in which the pure water and the chemical liquid are not sufficiently mixed is flowed into the flow path from the inflow port, when the pure water and the chemical liquid flow into the measurement light transmitting part, the pure water and the chemical liquid are not mixed. This means that the concentration of the processing solution can be measured stably and accurately without being affected by the position of the concentration measurement cell and the arrangement of the processing solution feed pipe. it can. Therefore, if the concentration measuring cell according to the present invention is used, processing concentration monitoring of the processing liquid performed based on the measured concentration of the processing liquid flowing in the processing liquid supply pipe, concentration adjustment of the processing liquid by feedback control, and the like can be performed with high accuracy. It can be performed stably.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る濃度測定用セルが適用される基板
処理装置の一例の構成を示す図である。
FIG. 1 is a diagram showing a configuration of an example of a substrate processing apparatus to which a cell for concentration measurement according to the present invention is applied.

【図2】本発明に係る濃度測定用セルが適用される基板
処理装置の別の例の構成を示す図である。
FIG. 2 is a diagram showing a configuration of another example of the substrate processing apparatus to which the concentration measuring cell according to the present invention is applied.

【図3】本発明の一実施形態に係る濃度測定用セルの拡
大正面図と、正面から見た縦断面図と、A−A矢視断面
図である。
FIG. 3 is an enlarged front view, a vertical cross-sectional view as viewed from the front, and a cross-sectional view taken along the line AA of the concentration measuring cell according to one embodiment of the present invention.

【図4】撹拌部の一例の構成を示す図である。FIG. 4 is a diagram illustrating a configuration of an example of a stirring unit.

【図5】撹拌部の別の例の構成を示す図である。FIG. 5 is a diagram illustrating a configuration of another example of the stirring unit.

【図6】撹拌部のさらに別の例の構成を示す図である。FIG. 6 is a diagram illustrating a configuration of still another example of the stirring unit.

【図7】撹拌部のさらに別の例の構成を示す図である。FIG. 7 is a diagram illustrating a configuration of still another example of the stirring unit.

【図8】撹拌部のさらに別の例の構成を示す図である。FIG. 8 is a diagram showing a configuration of still another example of the stirring unit.

【図9】図8の構成例に用いる旋回流形成部材の構成を
示す図である。
9 is a diagram showing a configuration of a swirling flow forming member used in the configuration example of FIG.

【図10】撹拌部のさらに別の例の構成を示す図であ
る。
FIG. 10 is a diagram showing a configuration of still another example of the stirring unit.

【図11】従来の濃度測定用セルの構成と、それが適用
される基板処理装置の概略構成を示す図である。
FIG. 11 is a diagram showing a configuration of a conventional cell for concentration measurement and a schematic configuration of a substrate processing apparatus to which the cell is applied.

【図12】従来の濃度測定用セルの問題点を説明するた
めの図である。
FIG. 12 is a view for explaining a problem of a conventional cell for concentration measurement.

【符号の説明】[Explanation of symbols]

1:濃度測定用セル 2:流入口 3:流出口 4:流路部 5:測定光透過部 6:撹拌部 10:処理液混合部 20:基板処理部 30:処理液送液管 40:濃度計 50:コントローラ 55:入力部 61:パンチングプレート 62:整流部材 63:羽根車 64:(孔あき)ね
じり板 65:旋回流形成部材 66:充填物 SL:測定光 W:基板
1: Cell for concentration measurement 2: Inflow port 3: Outflow port 4: Flow path section 5: Measurement light transmission section 6: Stirring section 10: Processing liquid mixing section 20: Substrate processing section 30: Processing liquid supply pipe 40: Concentration Total 50: Controller 55: Input unit 61: Punching plate 62: Rectifying member 63: Impeller 64: (perforated) torsion plate 65: Swirling flow forming member 66: Filling material SL: Measurement light W: Substrate

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 処理液を流入する流入口と、 処理液を流出する流出口と、 前記流入口と前記流出口との間で処理液を流す流路部
と、 前記流路部に形成され、処理液の濃度を測定するための
測定光を、前記流路部内を流れる処理液内に透過させる
測定光透過部と、 を備え、純水と1種類以上の薬液とを混合した処理液の
濃度を測定するために、その処理液が流される処理液送
液管の管路途中に、前記流入口を上流側に、前記流出口
を下流側にして着脱自在に介装される濃度測定用セルに
おいて、 前記流入口から前記流路部に流入された処理液を撹拌す
る撹拌部を、前記流路部内の前記流入口と前記測定光透
過部との間に設けたことを特徴とする濃度測定用セル。
1. An inlet for inflowing a processing liquid, an outlet for outflowing a processing liquid, a flow path for flowing a processing liquid between the inlet and the outlet, and formed in the flow path. A measurement light transmitting unit that transmits measurement light for measuring the concentration of the processing liquid into the processing liquid flowing in the flow path unit, and a processing liquid obtained by mixing pure water and at least one chemical liquid. In order to measure the concentration, in the middle of the treatment liquid feed pipe through which the treatment liquid flows, the inlet is located upstream and the outlet is located downstream so that the concentration can be detachably mounted. In the cell, a concentration section provided with a stirrer for stirring the processing liquid flowing into the flow path section from the inflow port, between the inflow port and the measurement light transmission section in the flow path section. Measurement cell.
JP9330054A 1997-12-01 1997-12-01 Concentration measuring cell Pending JPH11160229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9330054A JPH11160229A (en) 1997-12-01 1997-12-01 Concentration measuring cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9330054A JPH11160229A (en) 1997-12-01 1997-12-01 Concentration measuring cell

Publications (1)

Publication Number Publication Date
JPH11160229A true JPH11160229A (en) 1999-06-18

Family

ID=18228273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9330054A Pending JPH11160229A (en) 1997-12-01 1997-12-01 Concentration measuring cell

Country Status (1)

Country Link
JP (1) JPH11160229A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2009145172A1 (en) * 2008-05-29 2011-10-13 日本電信電話株式会社 Flow cell and liquid feeding method
WO2018193666A1 (en) * 2017-04-21 2018-10-25 株式会社島津製作所 Flow cell and detector equipped with flow cell

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2009145172A1 (en) * 2008-05-29 2011-10-13 日本電信電話株式会社 Flow cell and liquid feeding method
US8663560B2 (en) 2008-05-29 2014-03-04 Nippon Telegraph And Telephone Corporation Flow cell and liquid delivery method
WO2018193666A1 (en) * 2017-04-21 2018-10-25 株式会社島津製作所 Flow cell and detector equipped with flow cell
JPWO2018193666A1 (en) * 2017-04-21 2019-12-12 株式会社島津製作所 Flow cell and detector equipped with the flow cell

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