JPH10340836A - Developing apparatus and developing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a developing apparatus and a developing method capable of uniform development at a low cost. SOLUTION: At the time of development, a substrate 100 is held in a standstill state by a substrate-holding part 1. While a developer ejection nozzle 11 is moved from a position on one side outside of the substrate 100 to the position on the other side outside of the substrate 100, passing through the substrate 100 along a rinsing liquid ejection nozzle 12, a developer is supplied onto the substrate 100 by the developer ejection nozzle 11. Thereafter, while the developer ejection nozzle 11 is moved from the position on the one side, outside the substrate 100 to the position on the other side, outside of the substrate 100 passing through the substrate 100 along with the rinsing liquid ejection nozzle 12, the rinsing liquid is supplied onto the substrate 100 by a rinsing liquid ejection nozzle 16.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a developing apparatus and a developing method for performing a developing process by supplying a developing solution to a photosensitive film on a substrate.

[0002]

2. Description of the Related Art A developing device is used for developing a photosensitive film formed on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a substrate for an optical disk.

[0003] For example, a rotary developing device includes a rotation holding unit that holds a substrate horizontally and rotates it around a vertical axis, and a developer discharge nozzle that supplies a developer to the surface of the substrate. The developer discharge nozzle is attached to the tip of a nozzle arm rotatably provided in a horizontal plane, and can move between a position above the substrate and a standby position.

[0004] During the developing process, the developing solution is supplied to the photosensitive film on the substrate after the developing solution discharge nozzle moves from the standby position to above the substrate. The supplied developer is spread over the entire surface of the substrate by the rotation of the substrate, and comes into contact with the photosensitive film. The development of the photosensitive film is performed by stopping the substrate for a certain period of time in a state in which the developer is held on the substrate by the surface tension (a liquid level). When the supply of the developer is completed, the developer discharge nozzle moves to a standby position retreated from above the substrate by the rotation of the nozzle arm.

[0005]

However, in the above-described conventional rotary developing device, the photosensitive film on the substrate is subjected to a large impact when the rotating substrate is exposed to the developing solution at the start of discharge. Bubbles are generated in the developer by the impact, and minute bubbles remaining on the surface of the photosensitive film may cause development defects. Further, the photosensitive film may be damaged by the impact of the developer at the start of the discharge.

Therefore, the developer is supplied to the substrate by moving the developer discharge nozzle linearly from one end to the other end of the substrate while discharging the developer from the developer discharge nozzle having the slit-shaped discharge port. Developing methods have been proposed. According to this developing method, the photosensitive film on the substrate is not impacted, and the developer is uniformly supplied on the substrate. However, since the developer discharge nozzle is moved linearly on the substrate, a difference occurs in the development time on the substrate. Thereby,
The uniformity of development in the substrate surface is deteriorated, and the uniformity of the pattern line width after development is reduced.

An object of the present invention is to provide a developing apparatus and a developing method capable of performing uniform developing processing at low cost.

[0008]

Means for Solving the Problems and Effects of the Invention

A developing device according to a first aspect of the present invention includes a substrate holding means for holding a substrate in a horizontal position, a developing solution discharging nozzle for discharging a developing solution, and a rinsing liquid discharging for discharging a rinsing liquid for stopping development. A nozzle and moving means for moving the developer discharge nozzle together with the rinse liquid discharge nozzle from one position outside the substrate held stationary by the substrate holding means to a position on the other side outside the substrate by passing over the substrate; It is provided with.

In the developing device according to the first aspect of the present invention, the developer discharge nozzle moves together with the rinse liquid discharge nozzle from one position outside the stationary substrate to the other side outside the substrate by passing over the substrate. .

In this case, the development can be stopped by supplying the rinsing liquid onto the substrate by the rinsing liquid discharging nozzle after supplying the developing liquid onto the substrate by the developing liquid discharging nozzle. Therefore, the development time on the substrate can be made uniform. In addition, since the developer discharge nozzle moves on the substrate together with the rinse liquid discharge nozzle, the configuration of the moving means is simple and small, and space is saved. As a result, uniform development processing can be performed at low cost.

A developing device according to a second aspect of the present invention is the developing device according to the first aspect, wherein the developing solution discharge nozzle comprises:
The developer is discharged substantially linearly in a direction substantially perpendicular to the moving direction by the moving means with a width equal to or larger than the diameter of the substrate, and the rinsing liquid discharge nozzle is substantially perpendicular to the moving direction by the moving means with a width larger than the diameter of the substrate. The rinse liquid is discharged substantially linearly in the direction.

In this case, the developer can be uniformly supplied onto the substrate by one scanning of the developer discharge nozzle, and the consumption of the developer is reduced. Further, the rinse liquid can be uniformly supplied onto the substrate by one scan of the rinse liquid discharge nozzle, and the consumption of the rinse liquid is reduced.

A developing device according to a third aspect of the present invention is the developing device according to the first or second aspect, wherein the moving means moves the developing solution discharge nozzle together with the rinse liquid discharge nozzle on the substrate in one direction. After the developing solution is discharged by the developing solution discharging nozzle, the developing device further includes control means for discharging the rinsing liquid by the rinsing liquid discharging nozzle while moving the developing solution discharging nozzle in one direction together with the rinsing liquid discharging nozzle by the moving means. Things.

In this case, after the developing solution discharge nozzle is scanned in one direction, the rinsing solution discharging nozzle is scanned in the same direction, so that the supply of the developing solution by the developing solution discharging nozzle to the rinsing solution The time until the supply of the rinse liquid by the discharge nozzle becomes equal. As a result, the developing time becomes uniform in the substrate surface, and the line width uniformity of the developed pattern is improved.

A developing device according to a fourth aspect of the present invention is the developing device according to the first or second aspect, wherein the moving means moves the developing solution discharge nozzle together with the rinse liquid discharge nozzle on the substrate in one direction. After the developing solution is discharged by the developing solution discharge nozzle, the substrate held by the substrate holding means is rotated by 180 degrees around a vertical axis, and the developing solution discharging nozzle is moved in one direction together with the rinsing liquid discharging nozzle by the moving means. Control means for discharging the rinsing liquid by the rinsing liquid discharging nozzle while moving the rinsing liquid in the opposite direction.

In this case, after the developing solution discharge nozzle is scanned in one direction, the substrate is rotated by 180 degrees, and the rinsing solution discharging nozzle is scanned in the opposite direction. The time from the supply of the developer to the supply of the rinse liquid by the rinse liquid discharge nozzle becomes equal. As a result, the developing time becomes uniform in the substrate surface, and the line width uniformity of the developed pattern is improved.

Further, since the moving distance of the developing solution discharge nozzle and the rinsing liquid discharging nozzle is shortened, the time required for the developing process is shortened, and the operating rate of the developing device is improved.

According to a fifth aspect of the present invention, in the configuration of the third or fourth aspect of the present invention, the control means controls the developing device to supply the developing solution before the developing solution discharge nozzle reaches the substrate. The discharge of the developer by the liquid discharge nozzle is started.

In this case, since the discharge of the developing solution is started before the developing solution discharging nozzle reaches the stationary substrate, it is possible to prevent the developing solution at the start of the discharging from giving an impact to the substrate. This suppresses the generation of bubbles in the developing solution and prevents the occurrence of development defects, and also prevents the photosensitive film on the substrate from being damaged by impact.

Further, while the developing solution discharge nozzle is moving, the developing solution near the discharge port that comes into contact with air is discarded outside the substrate, and when the developing solution discharging nozzle reaches the substrate, a new developing solution is discharged from the developing solution discharging nozzle. Is supplied on a stationary substrate. This prevents development defects caused by the deteriorated developer and prevents particles of the dried developer from adhering to the substrate surface.

According to a sixth aspect of the present invention, in the configuration of the fifth aspect of the invention, the control means controls the discharge of the developer by the developer discharge nozzle after the developer discharge nozzle passes over the substrate. It is to stop.

In this case, the discharge of the developing solution is stopped after the developer discharging nozzle passes over the substrate, so that the impact of the dripping of the developing solution at the time of stopping the discharging on the substrate surface is prevented, and It is possible to prevent the impact at the time of stopping the discharge from adversely affecting the developer in the liquid reservoir. As a result, occurrence of development defects and deterioration of line width uniformity of the photosensitive film pattern after development are prevented.

Further, while the developing solution discharge nozzle passes over the substrate, new developing solution is continuously supplied, so that the developing solution is uniformly supplied onto the substrate.

[0025] The developing device according to the seventh aspect of the present invention comprises the third to sixth developing devices.
In the configuration of the developing device according to any one of the above aspects, the control means starts the discharge of the rinse liquid by the rinse liquid discharge nozzle before the rinse liquid discharge nozzle reaches the substrate when supplying the rinse liquid.

In this case, the rinsing liquid discharge is started before the rinsing liquid discharge nozzle reaches the stationary substrate, so that
It is possible to prevent the rinsing liquid at the start of the discharge from giving an impact to the substrate. This suppresses the generation of bubbles in the rinsing liquid, thereby preventing the occurrence of development defects and preventing the photosensitive film on the substrate from being damaged by impact.

Further, the rinsing liquid near the discharge port which comes into contact with air during the movement of the rinsing liquid discharge nozzle is discarded outside the substrate,
When the rinse liquid discharge nozzle reaches the substrate, a new rinse liquid is supplied from the rinse liquid discharge nozzle onto the stationary substrate. This prevents development defects from occurring due to the altered rinsing liquid and prevents particles due to the dried rinsing liquid from adhering to the substrate surface.

In the developing device according to an eighth aspect of the present invention, in the configuration of the developing device according to the seventh aspect, the control means controls the discharge of the rinse liquid by the rinse liquid discharge nozzle after the rinse liquid discharge nozzle has passed over the substrate. It is to stop.

In this case, since the discharge of the rinse liquid is stopped after the rinse liquid discharge nozzle has passed over the substrate, it is possible to prevent the dripping of the rinse liquid at the time of stopping the discharge from applying an impact to the substrate surface. It is possible to prevent the impact at the time of stopping the discharge from adversely affecting the developer in the liquid reservoir. As a result, occurrence of development defects and deterioration of line width uniformity of the photosensitive film pattern after development are prevented.

Further, while the rinsing liquid discharge nozzle passes over the substrate, new rinsing liquid is continuously supplied.
The rinsing liquid is uniformly supplied on the substrate.

The developing device according to the ninth invention comprises the first to eighth developing devices.
In the configuration of the developing device according to any one of the above aspects, the discharge direction of the developer by the developer discharge nozzle is inclined from a vertically downward direction to a direction opposite to a moving direction of the developer discharge nozzle.

In this case, the flow of the developer in the direction of movement of the developer discharge nozzle on the substrate surface is suppressed, and the flow of the developer in the direction opposite to the direction of movement is induced. By suppressing the flow of the developing solution in the moving direction, the developing solution is prevented from flowing ahead of the developing solution discharge nozzle in the moving direction, and the uniformity of the developing solution is improved. In addition, since the flow of the developer in the direction opposite to the moving direction is induced, minute bubbles in the developer, called microbubbles, are prevented from adhering to the substrate surface, and the development due to the adhesion of the minute bubbles is prevented. The occurrence of defects is suppressed.

The developing device according to a tenth aspect of the present invention is the developing device according to the first to ninth aspects, wherein the rinsing liquid discharge direction of the rinsing liquid discharge nozzle from the rinsing liquid discharge nozzle is set in a direction perpendicular to the downward direction. It is tilted in the opposite direction.

In this case, the flow of the rinsing liquid in the direction of movement of the rinsing liquid discharge nozzle on the substrate surface is suppressed, and the flow of the rinsing liquid in the direction opposite to the moving direction is induced. Since the flow of the rinsing liquid in the moving direction is suppressed, the rinsing liquid is prevented from flowing irregularly ahead of the rinsing liquid discharge nozzle in the moving direction, so that the development is stopped linearly. And the uniformity of development is improved. In addition, the rinsing effect is improved by inducing the flow of the rinsing liquid in the direction opposite to the moving direction.

According to an eleventh aspect of the present invention, in the developing device according to any one of the first to tenth aspects,
The developer discharge nozzle and the rinse liquid discharge nozzle each have a slit-shaped discharge port arranged in a horizontal direction, and the moving means moves the developer discharge nozzle and the rinse liquid discharge nozzle in a direction substantially perpendicular to the slit-shaped discharge port. It is moved in a straight line.

Thus, the developing solution and the rinsing solution can be uniformly supplied to the entire surface of the substrate with a small consumption.

According to a twelfth aspect of the present invention, there is provided a developing method for supplying a developing solution from a developing solution discharge nozzle onto a substrate held in a stationary state by a substrate holding means. Moving the developing solution discharge nozzle together with the rinsing liquid discharging nozzle from one side outside the substrate to the other side outside the substrate while discharging the developing solution, and rinsing from the rinsing liquid discharging nozzle Moving the developing solution discharge nozzle together with the rinsing liquid discharge nozzle from one side or the other side outside the substrate to the other side or one side outside the substrate while discharging the liquid. .

In the developing method according to the present invention, after the developing solution is supplied to the substrate by the developing solution discharge nozzle, the rinsing liquid is supplied to the substrate by the rinsing solution discharging nozzle to stop the development. Therefore, the development time on the substrate can be made uniform. Also,
Since the developer discharge nozzle moves on the substrate together with the rinse liquid discharge nozzle, the structure of the means for moving the developer discharge nozzle and the rinse liquid discharge nozzle becomes simple and compact,
Space saving is achieved. As a result, uniform development processing can be performed at low cost.

[0039]

FIG. 1 is a plan view of a developing device according to an embodiment of the present invention. FIG.
FIG. 3 is a sectional view taken along line X-Y of FIG.
It is a line sectional view.

As shown in FIGS. 2 and 3, the developing device includes a substrate holding unit 1 for holding the substrate 100 in a horizontal posture by suction.
Is provided. The substrate holding unit 1 is fixed to a tip of a rotating shaft 3 of a motor 2 and is configured to be rotatable around a vertical axis. Around the substrate holding portion 1, a circular inner cup 4 is provided so as to freely move up and down so as to surround the substrate 100. A square outer cup 5 is provided around the inner cup 4.

As shown in FIG. 1, standby pots 6 and 7 are arranged on both sides of the outer cup 5, respectively.
A guide rail 8 is disposed on one side of the guide rail.
The nozzle arm 9 is provided so as to be movable in the scanning direction A and the opposite direction along the guide rail 8 by the arm driving unit 10. On the other side of the outer cup 5, a rinsing liquid discharge nozzle 12 for discharging pure water as a rinsing liquid for cleaning is provided rotatably in the direction of arrow R.

The nozzle arm 9 has a developing solution discharge nozzle 11 having a slit-like discharge port 15 (see FIG. 3) at the lower end.
Are mounted perpendicular to the guide rail 8. A rinse liquid discharge nozzle 16 for stopping development is attached to the developer discharge nozzle 11. Thereby, the developer discharge nozzle 11 can move in a straight line along the scanning direction A from the position of the standby pot 6 to the position of the standby pot 7 from the position of the standby pot 6 together with the rinse liquid discharge nozzle 16. I have. As shown in FIG. 3, the developer discharge nozzle 1
1 is configured to be rotatable in the direction of arrow Q.

As shown in FIG. 2, the developing solution discharge nozzle 11
Is supplied with a developer by a developer supply system 12. The rinsing liquid discharge nozzle 16 has a rinsing liquid supply system 17.
Supplies a rinse liquid for stopping the development. In this embodiment, pure water is used as a rinsing liquid for stopping the development. The control unit 13 controls the rotation operation of the motor 2, the scanning of the developer discharge nozzle 11 by the arm drive unit 10, the developer discharge nozzle 1
1 controls the discharge of the developer from the nozzle 1 and the discharge of the rinse liquid from the rinse liquid discharge nozzle 16.

In this embodiment, the substrate holding unit 1 corresponds to a substrate holding unit, the arm driving unit 10 corresponds to a moving unit, and the control unit 13 corresponds to a control unit.

FIG. 4 is a schematic sectional view of the developing solution discharge nozzle 11 and the rinsing solution discharge nozzle 16. FIG. 5 is a view showing a slit-shaped discharge port 15 of the developer discharge nozzle 11;
FIG. 6 is a front view of the rinsing liquid discharge nozzle 16.

As shown in FIG. 4, the developing solution discharge nozzle 11
Has a developer supply port 19 and a slit-shaped discharge port 15. The slit width t of the slit-shaped discharge port 15 shown in FIG. 5 is 0.05 to 0.5 mm, and is 0.1 mm in this embodiment.
It is. Further, the discharge width L of the slit-shaped discharge port 15 is set to be equal to or larger than the diameter of the substrate 100 to be processed. This slit-shaped discharge port 15 is arranged perpendicular to the scanning direction A of the developer discharge nozzle 11.

A rinse liquid discharge nozzle 16 is attached to the side wall of the developer discharge nozzle 11. As shown in FIG. 6, the rinsing liquid discharge nozzle 16 is formed of a tubular member 20, and a slit-shaped discharge port 18 is provided on a peripheral wall thereof. The rinsing liquid is supplied from both ends of the tubular member 20, as indicated by arrows. Discharge width W of slit-like discharge port 18
Is set to be equal to or larger than the diameter of the substrate 100 to be processed. This slit-shaped discharge port 1
Reference numeral 8 is arranged perpendicular to the scanning direction A of the developer discharge nozzle 11.

FIG. 7 is a side view showing the direction in which the developing solution is discharged by the developing solution discharging nozzle 11. As shown in FIG. 7, at the time of supplying the developing solution, the developing solution discharging nozzle 11 causes the discharging direction B of the developing solution to be inclined at an angle α from the normal direction of the substrate (vertically downward) to the side opposite to the scanning direction A. Can be tilted. The inclination angle α is in the range of 0 to 30 °, and is 20 in the present embodiment.
° set.

Further, the developing solution discharge nozzle 11 has a slit-like discharge port 15 with respect to the upper surface of the substrate 100 of 0.2 to 5.0 mm, more preferably 0.2 to 1.
Scanning is performed so as to keep an interval of 0 mm. In this embodiment,
Slit-shaped discharge port 15 of developer discharge nozzle 11 and substrate 1
00 is set to 0.3 ± 0.1 mm.

FIG. 8 is a side view showing the direction in which the rinsing liquid is discharged by the rinsing liquid discharge nozzle 16. As shown in FIG. 8, at the time of supplying the rinsing liquid, the developer discharging nozzle 11
The discharge direction C of the rinse liquid from the rinse liquid discharge nozzle 16 is inclined from the normal direction of the substrate (vertically downward) to the side opposite to the scanning direction A by an angle β. The inclination angle β is 10
It is within the range of 60 °, and is set to 30 ° in this embodiment.

Next, a first example of the operation of the developing device of FIG. 1 will be described with reference to FIG. During the development process, the substrate 10
0 is held in a stationary state by the substrate holding unit 1.

First, as shown in FIG. 9A, during standby, the developing solution discharge nozzle 11 is moved to the position P in the standby pot 6.
Waiting for 0. At the time of supplying the developing solution, the developing solution discharge nozzle 11 moves up in the scanning direction A after rising, and descends at the scanning start position P <b> 1 in the outer cup 5.

Thereafter, the developer discharge nozzle 11 starts scanning at a predetermined scanning speed from the scanning start position P1. At this time, the developer is not yet discharged from the developer discharge nozzle 11. In this embodiment, the scanning speed is 10 to 500 m
m / sec.

After the start of the scanning of the developing solution discharging nozzle 11, the slit-shaped discharging port 15 of the developing solution discharging nozzle 11
Before reaching the upper side, the discharge of the developer by the developer discharge nozzle 11 is started at a predetermined flow rate at the discharge start position P2.
In the present embodiment, the discharge flow rate of the developer is 1.5 L / min.

The developer discharge nozzle 11 scans the substrate 100 from the discharge start position P2 in the scanning direction A while discharging the developer.
To move linearly. Thus, the developer is continuously supplied to the entire surface of the substrate 100. The supplied developer is held on the substrate 100 by surface tension.

After the developer discharge nozzle 11 has passed over the substrate 100, the discharge of the developer by the developer discharge nozzle 11 is stopped at the discharge stop position P3 off the substrate 100. When the developer discharge nozzle 11 reaches the scan stop position P4 in the outer cup 5, the developer discharge nozzle 1
1 is stopped.

Thereafter, the developing solution discharge nozzle 11 rises at the scanning stop position P4, and then moves to the position P of the other standby pot 7.
5 and descends into the standby pot 7.

In the standby pot 7, the developer discharging nozzle 1
The developer adhering to the tip of 1 is washed and washed with a washing and washing nozzle (not shown), and thereafter, the remaining water droplets are suctioned and removed by a suction nozzle (not shown). The standby pots 6 and 7 are surrounded by side walls so that water droplets generated in these processes do not scatter on the substrate being processed (see FIG. 3).

As shown in FIG. 9B, the state in which the developer is held on the substrate 100 is maintained for a predetermined time (for example, about 60 seconds).
While maintaining, the development of a photosensitive film such as a photoresist film on the substrate 100 is advanced. At this time, the substrate 100 is usually kept stationary, but by rotating the substrate holding unit 1 by the motor 2, a very low speed (approximately 5 rpm or less) that does not cause uneven development due to the flow of the developing solution on the substrate 100 is generated. ), The substrate 100 may be rotated or intermittently rotated.
When the substrate 100 is rotated, it is necessary that the orientation of the substrate 100 at the start of the next rinsing liquid supply process is the same as that at the time of supplying the developing solution in FIG.

During this time, the developer discharge nozzle 11 moves up in the standby pot 7, moves in the direction opposite to the scanning direction A, and descends at the next scanning start position R 1 in the outer cup 5. In this case, the lower end of the developing solution discharge nozzle 11 is placed on the substrate 10 so that the developing solution discharging nozzle 11 and the rinsing solution discharging nozzle 16 do not contact the developing solution held on the substrate 100.
It is desirable to move it in a state where it is separated from the surface 0 by about 3 mm or more.

Thereafter, as shown in FIG. 9C, the developing solution discharge nozzle 11 starts scanning at a predetermined scanning speed in the scanning direction A from the scanning start position R1 together with the rinse liquid discharging nozzle 16. At this point, the rinsing liquid has not yet been discharged from the rinsing liquid discharging nozzle 16.

After the scanning of the developing solution discharge nozzle 11 is started, the slit-shaped discharge port 18 of the rinse solution discharge nozzle 16
Before reaching zero, the rinsing liquid discharge nozzle 16 starts rinsing liquid discharge at a predetermined flow rate at the discharge start position R2. The discharge flow rate of the rinsing liquid is the same as or slightly larger than the discharge flow rate of the developer. In this embodiment, the discharge flow rate of the rinsing liquid is 3.0 L / min.

The developing solution discharge nozzle 11 discharges the rinsing liquid from the rinsing liquid
To move on the substrate 100 linearly in the scanning direction A. Thus, the rinsing liquid is continuously supplied to the entire surface of the substrate 100, and the developing process is stopped.

In this case, the distance between the developer discharging nozzle 11 and the rinsing liquid discharging nozzle 16 and the surface of the substrate 100 is
Although not particularly limited, it is desirable that the lower end of the developing solution discharge nozzle 11 be separated from the substrate 100 by 3 mm or more so that the developing solution discharging nozzle 11 and the rinsing solution discharging nozzle 16 do not contact the developing solution held on the substrate 100. Thus, contamination of the developer on the substrate 100 is avoided.

After the developing solution discharging nozzle 11 has passed over the substrate 100, the rinsing solution discharging nozzle 16 stops discharging the rinsing liquid at the discharging stop position R3 where the rinsing liquid discharging nozzle 16 is off the substrate 100. Then, when the developing solution discharge nozzle 11 reaches the scanning stop position R4 in the outer cup 5, the scanning of the developing solution discharge nozzle 11 is stopped.

Thereafter, the developer discharge nozzle 11 moves up in the scanning direction A after moving up in the scanning stop position R4, and descends into the standby pot 6 at the position of the standby pot 6.

Since the supply of the rinsing liquid by the rinsing liquid discharge nozzle 16 is intended to stop the development, the substrate 1
It is not necessary to replace all of the developer on top with the rinse solution. That is, when the rinsing liquid is supplied to the substrate 100, the normality of the developing liquid is diluted with the rinsing liquid and quickly decreases. Therefore, when a rinsing liquid is supplied to the developing liquid on the substrate 100, the developing reaction of a photosensitive film such as a photoresist film sensitive to a change in concentration is immediately stopped. The developing solution remaining on the substrate 100 and the resist components dissolved in the developing solution are washed in the next process of FIG.

Further, in order to make the development processing time uniform over the entire surface of the substrate 100, the supply of the rinsing liquid shown in FIG. 9C is performed at the same speed as the supply of the developer shown in FIG. Preferably, the rinsing liquid discharge nozzle 16 is scanned. However, the rinsing liquid discharge nozzle 1 in FIG.
The scanning speed of the developing solution discharge nozzle 1 in FIG.
The scanning speed of the rinsing liquid discharge nozzle 16 need not be exactly the same as the first scanning speed, and may be adjusted in accordance with the development result.

Next, as shown in FIG.
The substrate 100 is rotated at a rotational speed of about 1000 rpm, and pure water is supplied from the rinse liquid discharge nozzle 12 for cleaning to the substrate 1.
The substrate 100 is supplied to the central portion and the peripheral portion of the substrate 100 to clean the surface of the substrate 100 for a certain time.

Finally, as shown in FIG. 9E, the supply of the rinsing liquid by the rinsing liquid discharge nozzle 12 is stopped, and the substrate 100 is rotated by the motor 2 at a high speed of about 4000 rpm or more. Shake off the substrate 1
Dry 00.

The scan start position R1, discharge start position R2, discharge stop position R3, and scan stop position R4 in the rinsing liquid supply process of FIG.
(A) the scanning start position P1 in the developer supply process;
The discharge start position P2, the discharge stop position P3, and the scan stop position P4 do not need to coincide with each other, and these positions are considered in consideration of the landing positions of the developer from the developer discharge nozzle 11 and the rinse liquid from the rinse liquid discharge nozzle 16. May be adjusted as needed.

The scanning start position P1 and the ejection start position P
2, the order of the discharge stop position P3 and the scan stop position P4, the order of the scan start position R and the discharge start position R2, and the order of the discharge stop position R3 and the scan stop position R4 are not limited to the above examples. It may be simultaneous with each other.

FIG. 10 is a side view showing the scanning of the developing solution discharge nozzle 11 on the substrate 100. As described above, the discharge direction of the developer is inclined from the vertically downward direction in the direction opposite to the scanning direction A, so that the flow of the developer in the scanning direction A on the surface of the substrate 100 is suppressed, and the scanning direction A
The flow of the developer in the opposite direction is induced. Scan direction A
By suppressing the flow of the developing solution to the developing solution, the developing solution is prevented from flowing ahead of the developing solution discharge nozzle 11 in the scanning direction A, and the uniformity of development is improved. By inducing the flow of the developing solution in the direction opposite to the scanning direction A, fine bubbles in the developing solution called microbubbles are prevented from adhering to the surface of the photosensitive film on the substrate 100, and The occurrence of defects is suppressed.

FIG. 11 is a side view showing scanning of the rinse liquid discharge nozzle 16 on the substrate 100. Since the discharge direction of the rinsing liquid is inclined from the vertically downward direction to the direction opposite to the scanning direction A as described above, the flow of the rinsing liquid in the scanning direction A on the surface of the substrate 100 is suppressed, and In this case, the flow of the rinsing liquid in the opposite direction is induced. By suppressing the flow of the rinsing liquid in the scanning direction A,
Since the rinsing liquid is prevented from flowing irregularly prior to the side in the scanning direction A, the development is stopped linearly, and the uniformity of the development is improved. Also, the flow of the rinsing liquid in the direction opposite to the scanning direction A is induced,
The rinsing effect is improved.

Next, a second example of the operation of the developing device of FIG. 1 will be described with reference to FIG. The developer supply process shown in FIG. 12A is the same as the developer supply process shown in FIG.

As shown in FIG. 12B, the state in which the developing solution is held on the substrate 100 is maintained for a certain period of time, and the development proceeds. During this time, the substrate 100 is moved by the motor 2 in FIG.
Rotate 180 ° from the state of 2 (a). At this time, the rotation speed of the substrate 100 is preferably about 5 rpm or less so that the developer does not flow. Further, the developer discharging nozzle 11 moves up in the standby pot 7, then moves in the scanning direction D opposite to the scanning direction A at the time of supplying the developer, and descends at the scanning start position R1.

In this case, since the scanning direction D of the rinsing liquid discharge nozzle 16 is opposite to that in the case of FIG. 9C, the developing liquid is discharged so that the rinsing liquid discharge direction is also opposite to that of FIG. 9C. The ejection nozzle 11 is inclined to the opposite side.

Thereafter, as shown in FIG. 12C, the developing solution discharge nozzle 11 is moved from the scanning start position R1 to the scanning direction D.
The scanning is started at a predetermined scanning speed. At this point, the rinsing liquid has not yet been discharged from the rinsing liquid discharging nozzle 16.

After the start of the scanning of the developing solution discharging nozzle 11, the slit-shaped discharging port 18 of the rinsing solution discharging nozzle 16
Before reaching zero, the rinsing liquid discharge nozzle 16 starts rinsing liquid discharge at a predetermined flow rate at the discharge start position R2.

The developer discharge nozzle 11 discharges the rinsing liquid from the rinsing liquid discharge nozzle 16 while discharging the rinse start position R2.
To move on the substrate 100 linearly in the scanning direction D. Thus, the rinsing liquid is continuously supplied to the entire surface of the substrate 100, and the developing process is stopped.

After the developing solution discharging nozzle 11 has passed over the substrate 100, the rinsing liquid discharging nozzle 16 stops discharging the rinsing liquid at the discharging stop position R3 where the rinsing liquid discharging nozzle 16 is off the substrate 100. Then, when the developing solution discharge nozzle 11 reaches the scanning stop position R4 in the outer cup 5, the scanning of the developing solution discharge nozzle 11 is stopped.

Thereafter, the developer discharge nozzle 11 moves up to the position of the standby pot 6 after rising at the scanning stop position R4, and descends into the standby pot 6. The cleaning process of FIG. 12D and the drying process of FIG.
Same as (e).

In the developing device of the present embodiment, the discharge of the developing solution is started before the developing solution discharging nozzle 11 reaches the stationary substrate 100.
The impact on zero is avoided. Thereby, generation of bubbles in the developer is suppressed, and generation of development defects is prevented.

During the movement of the developing solution discharge nozzle 11, the developing solution in the vicinity of the slit-shaped discharge port 15 which comes into contact with air is discarded outside the substrate 100, and the developing solution discharging nozzle 11
At the time when the developer reaches 0, a new developer is supplied from the developer discharge nozzle 11 onto the stationary substrate 100. This prevents development defects caused by the deteriorated developer and prevents particles of the dried developer from adhering to the surface of the photosensitive film on the substrate 100.

Further, the developing solution discharge nozzle 11 is horizontally and linearly moved in parallel with the slit-shaped discharge port 15 and the upper surface of the substrate 100 on the substrate 100 on which the developing solution discharge nozzle 11 is stationary.
Since the strip-shaped developer formed in the slit-shaped discharge port 15 continuously contacts the surface of the substrate 100, the developer is uniformly supplied to the entire surface of the substrate 100 without applying an impact to the surface of the substrate 100.

Further, the developing solution discharge nozzle 11 is
Since the supply of the developer is continued until the developer passes above, an adverse effect on the developer in the liquid pool due to the impact at the time of stopping the discharge is prevented. As a result, the occurrence of development defects is suppressed, and the line width uniformity of the photosensitive film pattern after development is improved.

Further, the developing solution discharge nozzle 11 is
Since the discharge of the developer is stopped after passing over, the impact of the dripping of the developer at the time of stopping the discharge on the photosensitive film on the substrate 100 is prevented. Therefore, occurrence of development defects and deterioration of line width uniformity of the photosensitive film pattern are prevented.

Further, the discharge of the rinse liquid is started before the rinse liquid discharge nozzle 16 reaches the stationary substrate 100, and the discharge of the rinse liquid is stopped after the rinse liquid discharge nozzle 16 has passed over the substrate 100. Therefore, an adverse effect on the developing solution in the liquid pool due to the impact at the start of discharge and at the stop of discharge is prevented. As a result, uneven development and development defects are further suppressed.

Further, since the discharge direction of the developer is inclined in the direction opposite to the scanning direction A, the flow of the developer in the scanning direction A on the surface of the substrate 100 is suppressed, and The flow of the developer in the opposite direction is induced. Thereby, the uniformity of development is improved, and the occurrence of development defects is prevented.

Further, since the discharge direction of the rinsing liquid is inclined in the direction opposite to the scanning direction, the flow of the rinsing liquid in the scanning direction on the surface of the substrate 100 is suppressed, and the rinsing liquid flows in the direction opposite to the scanning direction. Of the rinse liquid is induced. Thereby, the uniformity of development is improved, and the rinsing effect is improved.

In particular, in the example of FIG. 12, after the supply of the developing solution, the substrate 100 is rotated by 180 ° to perform the rinsing process, so that the developing solution discharging nozzle 11 and the rinsing liquid discharging nozzle 16 move on the substrate 100. Fewer times. As a result, while the developer discharge nozzle 11 and the rinse liquid discharge nozzle 16 pass over the substrate 100, the developer adhered to the tip of the developer discharge nozzle 11 or the rinse liquid adhered to the rinse liquid discharge nozzle 16 is deposited on the substrate 100. It is possible to prevent a development defect from occurring by dropping and prevent particles from adhering to the substrate 100. Also, the developer discharge nozzle 1
Since the moving time of the nozzle 1 and the rinsing liquid discharge nozzle 16 is reduced, the operating rate of the developing device is improved.

FIG. 13 is a front view showing another example of the rinsing liquid discharge nozzle. Rinse liquid discharge nozzle 16 shown in FIG.
Is composed of a tubular member 21 and is provided with a plurality of pore-shaped discharge ports 22 arranged in a line on the side wall thereof. The plurality of ejection ports 22 are arranged in a direction perpendicular to the scanning direction A.

FIG. 14 is a view showing still another example of the rinsing liquid discharge nozzle. The rinse liquid discharge nozzle 16 in FIG. 14 has a discharge port 23 for discharging the rinse liquid in a fan shape.

As described above, the rinsing liquid discharge nozzle 16 does not require as uniform discharge as the developing liquid discharge nozzle 11 and does not require temperature adjustment. What is necessary is just a structure which can discharge.

FIG. 15 is a schematic sectional view showing an example of a common nozzle in which a rinsing liquid discharging nozzle is integrated with a developing liquid discharging nozzle.

In the common nozzle 30 shown in FIG. 15, the nozzle main body 31 is provided with a developer supply port 32 and a slit discharge port 33 for the developer, and a rinse liquid supply port 34 and a slit discharge port 35 for the rinse liquid. . The developer supply port 32 is connected to the developer supply system 12 of FIG. The rinse liquid supply port 34 is connected to the rinse liquid supply system 17 of FIG.

According to the common nozzle 30, since the developing solution discharge nozzle and the rinsing liquid discharge nozzle are integrated, the space can be saved.

FIG. 16 is a schematic sectional view showing another example of a common nozzle in which a rinsing liquid discharging nozzle is integrated with a developing liquid discharging nozzle.

In the common nozzle 30 shown in FIG. 16, the nozzle body 40 has a common supply port 41 for the developer and the rinsing liquid.
Further, a slit-shaped discharge port 42 common to the developing solution and the rinsing liquid is provided. The supply port 41 is connected to a three-way valve 44 via a pipe 43. One port of the three-way valve 44 is connected to the developer supply system 12 of FIG. 2 through a pipe 45, and the other port is connected to the rinse liquid supply system 17 of FIG. The three-way valve 44 can switch between a state in which the developer is supplied and the rinsing liquid is stopped, a state in which the developer is stopped and the rinsing liquid is supplied, and a state in which the developer and the rinsing liquid are stopped.

According to the common nozzle 30, since the developing solution discharging nozzle and the rinsing liquid discharging nozzle are integrated, the space can be saved and the piping can be simplified.

When the common nozzle 30 shown in FIGS. 15 and 16 is used, the nozzle can be cleaned with a rinsing liquid. As shown in FIG. 17, with the common nozzle 30 fitted in the V-shaped block 50 in the standby pot 6,
The rinsing liquid is discharged from the common nozzle 30. Thereby,
The common nozzle 30 can be washed with the rinsing liquid.
At the center of the V-shaped block 50, there is formed a hole 51 for removing a drop of a developing solution or a rinsing liquid that falls from the tip of the common nozzle. A discharge port (drain) is provided between the inner surface of the standby pot 6 and the outer peripheral surface of the V-shaped block 50.

As described above, by using the rinsing liquid discharged from the common nozzle 30 for nozzle cleaning, it is not necessary to provide a facility for nozzle cleaning, and space can be saved.

[Brief description of the drawings]

FIG. 1 is a plan view of a developing device according to an embodiment of the present invention.

FIG. 2 is a sectional view taken along line XX of a main part of the developing device of FIG.

FIG. 3 is a sectional view taken along line YY of a main part of the developing device of FIG.

FIG. 4 is a schematic sectional view of a developer discharge nozzle and a rinse liquid discharge nozzle.

FIG. 5 is a view showing a slit-shaped discharge port of a developer discharge nozzle.

FIG. 6 is a front view of a rinse liquid discharge nozzle.

FIG. 7 is a side view illustrating a direction in which a developer is discharged by a developer discharge nozzle.

FIG. 8 is a side view showing a direction in which a rinse liquid is discharged by a rinse liquid discharge nozzle.

FIG. 9 is a diagram for explaining a first example of the operation of the developing device of FIG. 1;

FIG. 10 is a side view showing scanning of a developer discharge nozzle on a substrate.

FIG. 11 is a side view showing scanning of a rinsing liquid discharge nozzle on a substrate.

FIG. 12 is a view for explaining a second example of the operation of the developing device in FIG. 1;

FIG. 13 is a front view showing another example of the rinse liquid discharge nozzle.

FIG. 14 is a view showing still another example of the rinse liquid discharge nozzle.

FIG. 15 is a schematic sectional view showing an example of a common nozzle.

FIG. 16 is a schematic sectional view showing another example of the common nozzle.

FIG. 17 is a schematic sectional view of a standby pot.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate holding | maintenance part 4 Inner cup 5 Outer cup 6,7 Standby spot 8 Guide rail 9 Nozzle arm 10 Nozzle drive part 11 Developer discharge nozzle 12 Developer supply system 13 Control part 15 Slit-form discharge port 16 Rinse liquid discharge nozzle 17 Rinse Liquid supply system 18 Slit-shaped discharge port 30 Common nozzle

Claims (12)

[Claims] 1. A substrate holding means for holding a substrate in a horizontal position, a developing solution discharging nozzle for discharging a developing solution, a rinsing liquid discharging nozzle for discharging a rinsing liquid for stopping development, and Moving means for moving the developing solution discharge nozzle together with the rinse liquid discharge nozzle from a position on one side outside the substrate held in a stationary state to a position on the other side outside the substrate by passing over the substrate. A developing device, characterized in that: 2. The developing solution discharging nozzle discharges the developing solution substantially linearly in a direction substantially perpendicular to a moving direction of the moving means with a width equal to or larger than the diameter of the substrate. 2. The developing device according to claim 1, wherein the rinsing liquid is discharged substantially linearly in a direction substantially perpendicular to a moving direction of the moving means with a width equal to or larger than the diameter of the substrate. 3. The method according to claim 1, wherein the moving means moves the developing solution discharge nozzle together with the rinsing liquid discharging nozzle on the substrate in one direction while discharging the developing solution by the developing solution discharging nozzle. 3. The developing device according to claim 1, further comprising control means for discharging the rinse liquid by the rinse liquid discharge nozzle while moving the developer discharge nozzle together with the rinse liquid discharge nozzle in the one direction. apparatus. 4. The method according to claim 1, wherein the moving means moves the developing solution discharge nozzle together with the rinsing liquid discharging nozzle in one direction on the substrate and discharges the developing solution by the developing solution discharging nozzle. The substrate held by the nozzle is rotated by 180 degrees around a vertical axis, and the rinsing liquid discharging nozzle is moved by the moving means in the direction opposite to the one direction together with the rinsing liquid discharging nozzle. 3. The developing device according to claim 1, further comprising a control unit configured to discharge the rinsing liquid by the control unit. 5. The method according to claim 3, wherein the control unit starts discharging the developing solution by the developing solution discharging nozzle before the developing solution discharging nozzle reaches the substrate when supplying the developing solution. Or the developing device according to 4. 6. The method according to claim 5, wherein the control unit stops the discharge of the developer by the developer discharge nozzle after the developer discharge nozzle passes over the substrate.
The developing device as described in the above. 7. The method according to claim 6, wherein the control unit supplies a rinsing liquid.
7. The developing device according to claim 3, wherein the rinsing liquid discharge nozzle starts rinsing liquid discharge before the rinsing liquid discharge nozzle reaches the substrate. 8. The developing apparatus according to claim 7, wherein said control means stops the discharge of the rinse liquid by the rinse liquid discharge nozzle after the rinse liquid discharge nozzle has passed over the substrate. 9. The discharge direction of the developer by the developer discharge nozzle is tilted from a vertically downward direction to a direction opposite to a moving direction of the developer discharge nozzle.
9. The developing device according to any one of 8. 10. The rinsing liquid discharge nozzle according to claim 1, wherein a rinsing liquid discharge direction of the rinsing liquid discharge nozzle is inclined from a vertically downward direction to a direction opposite to a moving direction of the rinsing liquid discharge nozzle. Developing device. 11. The developing solution discharging nozzle and the rinsing solution discharging nozzle each have a slit-shaped discharging port arranged in a horizontal direction, and the moving unit includes a developing solution discharging nozzle and the rinsing solution discharging nozzle. The developing device according to claim 1, wherein the developing device is moved linearly in a direction substantially perpendicular to the slit-shaped discharge port. 12. A developing method for supplying a developing solution from a developing solution discharging nozzle onto a substrate held in a stationary state by a substrate holding means, wherein the developing solution is discharged from the developing solution discharging nozzle onto the substrate. Moving the developing solution discharging nozzle together with the rinsing liquid discharging nozzle from one position outside the substrate to a position on the other side outside the substrate by passing over the substrate; and rinsing the rinsing liquid from the rinsing liquid discharging nozzle. Moving the developing solution discharge nozzle together with the rinse liquid discharge nozzle from a position on one side or the other side outside the substrate to a position on the other side or one side outside the substrate while discharging the developer. And a developing method.