JPH10319226A - Electrode plate for color display device and color display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain an electrode plate for a color display device improved in an inorg. conductive thin film characteristic while high chemical resistance is maintained. SOLUTION: This electrode plate is formed by arranging a tight adhesive layer consisting of a compd. of at least any among the oxide, nitride and oxynitride of metals between color filters and the transparent conductive film thereof and forming the layers where the color filters are at least partly carbonized on the surface of the transparent conductive film side of the color filters. In such a case, the tight adhesive layer is disposed between the org. protective, film and the transparent conductive film and the surface of the org. protective film on the transparent conductive film side is provided with the layer where the org. protective film is at least partly carbonized. At least partially carbonized layer acts to protect the ground surface. The tight adhesive layer acts to tightly adhere the carbonized layer and the transparent electrodes. Further, the at least partially carbonized layer of the color filters or the org. protective film acts to protect the ground surface.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode plate for a color display device which is excellent in chemical resistance, adhesion, and fine workability.

[0002]

2. Description of the Related Art An electrode plate used for a color display device includes:
In general, a color filter made of an organic resin is formed on a glass substrate, and a transparent protective film made of the same organic resin is applied on top of it, and then a transparent inorganic transparent electrode is formed. Have been. In general, the wiring of the transparent electrode is obtained by forming a uniform transparent conductive film once and then obtaining a desired wiring shape by wet etching.

[0003]

In the case of performing wiring processing by the above-mentioned wet etching, since various chemicals are used, a color filter or a transparent organic protective film, which is a base of the transparent conductive film, is attacked by the chemicals. Problem occurs. In addition, since an inorganic thin film is formed on an organic resin, it is very difficult to have sufficient adhesiveness to withstand predetermined processing.

[0004] For this reason, conventionally, chemical resistance and adhesion have been improved by forming another thin film (generally, a silicon dioxide thin film) between a color filter or an organic protective film and an inorganic conductive thin film. However, a silicon dioxide thin film is generally formed by an RF sputtering method, but a low film formation rate is an industrial disadvantage. In addition, since the color filter or the organic protective film is physically and chemically damaged by the RF-plasma before film formation, it is a main cause of instability in producing an electrode plate in a later process.

In order to solve these problems, there has been proposed a method of improving the chemical resistance without using a silicon dioxide thin film by partially carbonizing a color filter or an organic protective film. If the process proceeds excessively, the adhesiveness becomes poor, and a desired shape cannot be obtained at the time of forming a wiring by wet etching.

In addition, since the inorganic conductive thin film is formed directly on the organic resin, the inorganic conductive thin film is affected by impurities such as moisture generated from the organic resin during the film formation, and a sheet showing the conductivity of the inorganic conductive thin film. There was a problem that the resistance value increased.

An object of the present invention is to improve adhesion while maintaining high chemical resistance. Another object of the present invention is to obtain a desired shape at the time of forming an electrode using wet etching while maintaining high chemical resistance at the time of manufacturing an electrode plate for a color display device. Another object of the present invention is to provide an electrode plate for a color display device in which the adhesion is improved while maintaining high chemical resistance and the characteristics of the inorganic conductive thin film are improved, and a color display device using the electrode plate. It is.

[0008]

The above object of the present invention is achieved by the following constitution. That is, in an electrode plate for a color display device in which a transparent conductive film is formed on a color filter, a metal oxide, a nitride, and / or an oxynitride compound is formed between the color filter and the transparent conductive film. An electrode plate for a color display device, comprising a layer in which the color filter is at least partially carbonized on the surface of the color filter on the transparent conductive film side, or

An organic protective film formed for the purpose of protecting the color filter is formed on the color filter, and a transparent conductive film is formed on the organic protective film. And an adhesive layer made of at least one compound of a metal oxide, a nitride, and an oxynitride between the transparent conductive film and the transparent conductive film. 1 is an electrode plate for a color display device having a layer in which a film is at least partially carbonized.

[0010] The present invention also includes a color display device using the electrode plate. The color filter of the present invention is generally a gelatin formed by a pigment dispersion method or a printing method,
It is formed using a natural polymer such as casein or glue or an acrylic synthetic resin as a material, but any resin may be used as long as it is a transparent resin regardless of a film forming method or a coloring method. Further, the organic protective film of the present invention is a synthetic resin such as an acrylic resin, an epoxy resin, or a polyimide resin, but if it is a transparent film,
Any resin may be used regardless of the film forming method or coloring method.

The partially carbonized layer referred to in the present invention does not necessarily need to be a layer that is uniformly carbonized. If the layer has a chemical resistance higher than a required level, the carbonized layer is not suitable. It may have a uniform thickness. The thickness of the carbonized layer may satisfy a certain level of chemical resistance, but an extremely thick carbonized layer is not preferable because the carbonized layer significantly reduces the transmittance.

There are various means for forming such at least partially carbonized layers. For example, a method in which a color filter layer or an organic protective layer formed on the color filter layer is exposed to DC-plasma or RF-plasma for a short time immediately before forming the adhesion layer, There is a method of irradiating the layer or the organic protective layer formed on the color filter layer with ions.

In the present invention, it is desirable to use ion irradiation which can easily control the conditions for forming the carbonized layer. Specific examples of the gas used for ion irradiation include a mixed gas of oxygen and argon and argon. , Oxygen is most preferred. Accelerating voltage 100-2000V, irradiation time 30-2
Irradiation conditions of 00 seconds, especially 400 to 1000 V, 30 to 60 seconds are preferred. These conditions are expressed as an ion energy density of 0.01 to 500 W · sec / c.
m ² , especially 1 to 50 W · sec / cm ² , means that it is optimal.

The degree of carbonization of the carbonized layer required in the present invention has a predetermined range, and if carbonization proceeds excessively, the degree of carbonization between the adjacent layers that can withstand various treatments in the production process of the color filter is considered. Adhesion is poor.

In the carbonized layer of the present invention, for example, the ratio (Ic-c) of the signal (Ic-c) caused by the CC bond to the signal (Icoo) caused by the carboxyl group in the carbonized layer by X-ray photoelectron spectroscopy. Ic-c / Icoo) is greater than that in the uncarbonized interior. Further, the carbonized layer can be formed by collision of gas ions including oxygen ions or argon ions.

The main component of the adhesion layer comprising at least one compound of the metal oxide, nitride and oxynitride of the present invention is silicon dioxide, alumina, silicon nitride, silicon oxynitride, titanium oxide, zirconium oxide, etc. Formed from a single substance or a mixture of

Further, as the transparent conductive film which can be used in the present invention, ITO, tin oxide, zinc oxide doped with aluminum, gold having a low electric resistance,
It is also possible to use a film in which a noble metal such as silver or copper is sandwiched between transparent conductive oxide films such as ITO or indium oxide or zinc oxide doped with aluminum.

Further, it is not contrary to the gist of the present invention to interpose an intermediate layer between the layers for the purpose of improving the optical characteristics and the like without changing the electrical characteristics. The electrode plate for a color display device of the present invention has a cross section shown in FIGS.

Further, in the electrode plate for a color display device of the present invention, a layer at least partially carbonized between the color filter and the adhesion layer or between the organic protective film and the adhesion layer functions to protect the base. The adhesion layer works to make the carbonized layer and the transparent electrode adhere to each other. Further, at least a partially carbonized layer of the color filter or organic protective film moves to protect the substrate.

[0020]

Embodiments of the present invention will be described below in detail. Example 1 A color filter made of gelatin was formed on a glass substrate to produce a glass substrate with a color filter. Trimetic anhydride was added as a curing agent to polyglycidyl methacrylate, which is an acrylic organic resin, and the solution was applied on the glass substrate with a color filter by a spin coating method and baked at 200 ° C. for 1 hour.

When the surface of the organic protective film produced by the above method was measured by X-ray photoelectron spectroscopy, the detected ratio of the carbon amount to the oxygen amount on the pole surface (C / O) was 1.
47. Also, as a result of analyzing the signal of the detected C1s orbit, the signal (Ic-c) defined for the CC coupling is obtained.
And the ratio (Ic) of the signal (Icoo) defined for the COO coupling
-c / Icoo) was 4.93. The transmittance of the glass substrate provided with an organic protective film was measured to be 78%.

The glass substrate on which the organic protective film has been formed by the above method is introduced into a vacuum chamber, and oxygen ions are then applied to the organic protective film for 100 seconds at an ion energy density of 20 Wsec / cm ² and an acceleration voltage of 1000 V. Irradiated. Thereafter, the substrate was taken out, and the surface of the organic protective film was measured by X-ray photoelectron spectroscopy. As a result, the C / O was 2.23, which was larger than that before ion irradiation. In addition, as a result of analyzing the signal of the detected C1s orbit, Ic-c / I
The coo was 19.7, which was larger than before ion irradiation. The transmittance of the glass substrate provided with an organic protective film was measured to be 74%.

After confirming the above fact, a glass substrate having an organic protective film formed on a color filter by the same method was introduced into a vacuum chamber. Thereafter, an ion energy density of 20 · Wsec / cm ² and an acceleration voltage of 1000 are applied to the organic protective film.
Under the condition of V, oxygen ions were irradiated for 100 seconds. Immediately thereafter, a silicon dioxide film (adhesion layer of the present invention) was formed to a thickness of 10 nm by an electron beam evaporation method, and an indium oxide-tin oxide transparent conductive film (hereinafter, ITO) was formed by a sputtering method using DC plasma.

When the sheet resistance of this sample was measured with a commercially available sheet resistance meter, it was 6.7 Ω / □. After the sample was taken out of the vacuum chamber, it was immersed in a 10% by weight aqueous solution of potassium hydroxide at 40 ° C., and no ITO peeling occurred even after immersion for 60 minutes or more. The electrode plate formed by the above method is wet-etched for 10 minutes using an aqueous solution of hydrochloric acid and iron chloride to form an electrode plate.
When an electrode was formed at a line pitch of 20 μm / space pitch of 20 μm, an electrode having a predetermined shape could be obtained.

Example 2 A color filter made of gelatin was formed on a glass substrate to prepare a glass substrate with a color filter. Trimetic anhydride was added as a curing agent to polyglycidyl methacrylate, which is an acrylic organic resin, and the solution was applied on the glass substrate with a color filter by a spin coating method and baked at 200 ° C. for 1 hour.

When the surface of the organic protective film produced by the above method was measured by X-ray photoelectron spectroscopy, the ratio of the amount of carbon to the amount of oxygen detected on the pole surface (C / O) was 1.
47. As a result of analyzing the detected signal of the C1s orbit, the signal (Ic-c) defined for the CC bond and CO
Signal (Icoo) ratio (Ic-c /
(Icoo) was 4.93.

The transmittance of the glass substrate provided with an organic protective film was measured to be 78%. The glass substrate on which the organic protective film is formed by the above method is introduced into a vacuum chamber, and then the ion energy density of 20 · Wsec / c is applied to the organic protective film.
30 m ² and an acceleration voltage of 100 V.
Irradiated for seconds. Thereafter, the substrate was taken out, and the surface of the organic protective film was measured by X-ray photoelectron spectroscopy. As a result, the C / O was 2.95, which was larger than that before ion irradiation. As a result of analyzing the signal of the detected C1s orbit, Ic
-c / Icoo = 22.3, which was larger than before ion irradiation. The transmittance of this glass substrate provided with an organic protective film was measured to be 73%.

After confirming the above fact, a glass substrate having an organic protective film formed on a color filter by the same method was introduced into a vacuum chamber. Thereafter, an ion energy density of 20 · Wsec / cm ² and an acceleration voltage of 100 V are applied to the organic protective film.
Irradiated with argon ions for 30 seconds under the conditions described above. Immediately thereafter, a silicon dioxide film (the adhesion layer of the present invention) was formed to a thickness of 10 nm by an electron beam evaporation method, and immediately thereafter, ITO was formed by a sputtering method using DC plasma. When the sheet resistance of this sample was measured with a commercially available sheet resistance meter, it was 7.0 Ω / □. After the sample was taken out of the vacuum chamber, it was immersed in a 10% by weight aqueous solution of potassium hydroxide at 40 ° C., and no ITO peeling occurred even after immersion for 60 minutes or more.

With respect to the electrode plate formed by the above method,
When an electrode having a 70 μm line / 20 μm space pitch was formed by wet etching for 10 minutes using an aqueous solution of hydrochloric acid and iron chloride, an electrode having a predetermined shape could be obtained.

Example 3 A color filter made of gelatin was formed on a glass substrate to produce a glass substrate with a color filter. When the surface of the color filter produced by the above method was measured by X-ray photoelectron spectroscopy, the ratio of the amount of carbon to the amount of oxygen detected on the extreme surface (C / O) was 1.02. As a result of analyzing the signal of the detected C1s orbit, C-
Ratio (Ic-c / Icoo) of the signal (Ic-c) specified for the C-coupling and the signal (Icoo) specified for the COO-coupling
Was 4.22. The transmittance of this glass substrate provided with a color filter was 78%.

The glass substrate on which the color filter has been formed by the above method is introduced into a vacuum chamber, and then the ion energy density of 20 · Wsec / c is applied to the color filter.
m ² and acceleration voltage of 1000 V
Irradiated for seconds. Thereafter, the substrate was taken out, and the surface of the color filter was measured by X-ray photoelectron spectroscopy.
O was 2.30, which was larger than before ion irradiation. As a result of analyzing the signal of the detected C1s orbit, I
cc / Icoo was 6.31, which was larger than before ion irradiation. The transmittance of the glass substrate provided with a color filter was 74%.

After confirming the above fact, the glass substrate on which the color filter was formed by the same method was introduced into a vacuum chamber. After that, the accelerating voltage is 1000 for the color filter.
Under the condition of V, oxygen ions were irradiated for 100 seconds. Immediately thereafter, a silicon dioxide film (the adhesion layer of the present invention) was formed to a thickness of 10 nm by using an electron beam evaporation method, and immediately thereafter, ITO was formed by a sputtering method using DC plasma. After the sample was taken out of the vacuum chamber and immersed in a 10% by weight aqueous solution of potassium hydroxide at 40 ° C., no ITO peeling occurred at all even when immersed for 60 minutes or more.

According to the above-described method, an electrode having a predetermined shape was formed with a 70 μm line / 20 μm space pitch by wet etching for 10 minutes using an aqueous solution of hydrochloric acid and iron chloride on the formed electrode plate. I got it.

Examples 4 to 9 By the same method as in Examples 1 to 3, in order to confirm the difference in patterning property due to the presence or absence of silicon dioxide (the adhesion layer of the present invention), ion irradiation and film formation of silicon dioxide were performed. The effect of the presence / absence was evaluated on the patterning property of ITO film formation.

Table 1 below shows the difference in patterning property depending on the presence or absence of silicon dioxide.

[Table 1]

* The patterning property is 70 μm by wet etching for 10 minutes using hydrochloric acid and an aqueous solution of iron chloride.
Judgment was made based on the line shape when an electrode was formed at m lines / 20 μm space pitch. * If the electrode pattern was formed correctly (◎), the electrode pattern with slight dripping at the end was accepted (○),
Those that are partially missing are judged as rejected (合格 or ×). * The alkali resistance was evaluated by immersing in a 10% by weight aqueous solution of potassium hydroxide at 40 ° C. for 30 minutes to determine whether peeling occurred. When no peeling was observed visually (◎), when slight film floating (bulge) was observed, it was judged as pass (○), and when the film was clearly peeled, it was judged as failed (△ or ×). I do.

From Table 1, it can be seen that the presence of silicon dioxide also stably improved the patterning property without being affected by the underlayer. Example 10 A color filter made of gelatin was formed on a glass substrate to prepare a glass substrate with a color filter. Trimetic anhydride was added as a curing agent to polydisyl methacrylate, which is an acrylic organic resin, and applied to the above glass substrate with a color filter by a spin coating method, followed by baking at 200 ° C. for 1 hour.

When the surface of the organic protective film produced by the above method was measured by X-ray photoelectron spectroscopy, the ratio of the amount of carbon to the amount of oxygen on the pole surface (C / O) was 1.
47. As a result of analyzing the detected signal of the C1s orbit, the signal (Ic-c) defined for the CC bond and CO
The ratio (Ic-c /
(Icoo) was 4.93. The transmittance of the glass substrate provided with an organic protective film was measured to be 78%.

According to the above-mentioned method, the glass substrate on which the organic protective film is formed is introduced into a vacuum chamber, and then the organic protective film is exposed to oxygen ions at an ion energy density of 20 Wsec / cm ² and an acceleration voltage of 1000 V for 100 ions. Irradiated for seconds. Thereafter, the substrate was taken out, and the surface of the organic protective film was measured by X-ray photoelectron spectroscopy. As a result, C / O was 1.35, which was larger than that before ion irradiation. As a result of analyzing the signal of the detected C1s orbit, Ic-c / Icoo was obtained.
Was 19.7, which was larger than before ion irradiation. The transmittance of the glass substrate provided with an organic protective film was measured to be 74%.

After confirming the above fact, a glass substrate having an organic protective film formed on a color filter by the same method was introduced into a vacuum chamber. Thereafter, an ion energy density of 20 · Wsec / cm ² and an acceleration voltage of 1000 are applied to the organic protective film.
Under the condition of V, oxygen ions were irradiated for 100 seconds. Immediately thereafter, silicon nitride (the adhesion layer of the present invention) was formed to a thickness of 10 nm by a reactive DC sputtering method, and an indium oxide-tin oxide transparent conductive film (hereinafter, ITO) was formed by a sputtering method using DC plasma. When the sheet resistance of this sample was measured with a commercially available sheet resistance meter, it was 6.6 Ω / □. After the sample was taken out of the vacuum chamber, it was immersed in a 10% by weight aqueous solution of potassium hydroxide at 40 ° C., and no ITO peeling occurred even after immersion for 60 minutes or more.

With respect to the electrode plate formed by the above method,
When an electrode having a 70 μm line / 20 μm space pitch was formed by wet etching for 10 minutes using an aqueous solution of hydrochloric acid and iron chloride, an electrode having a predetermined shape could be obtained.

Comparative Example 1 (without carbonized layer) A color filter made of gelatin was formed on a glass substrate to produce a glass substrate with a color filter. Trimetic anhydride was added as a curing agent to polyglycidyl methacrylate, which is an acrylic organic resin, and the solution was applied on the glass substrate with a color filter by a spin coating method and baked at 200 ° C. for 1 hour. The glass substrate with an organic protective film formed by the above method is introduced into a vacuum chamber, and a silicon dioxide thin film is formed to a thickness of 10 nm by an electron beam evaporation method.
Immediately thereafter, I was sputtered using DC plasma.
A TO film was formed. Take this sample out of the vacuum chamber,
When immersed in a 10% by weight aqueous solution of potassium hydroxide at 0 ° C., the ITO was peeled off after immersion for 10 minutes.

When the electrode plate formed by the above method was subjected to wet etching using hydrochloric acid and an aqueous solution of iron chloride for 10 minutes to form an electrode having a line pitch of 70 μm / 20 μm, an ITO film was formed during the wet etching. It has peeled off.

Comparative Example 2 (Example Without Adhesion Layer) A color filter made of gelatin was formed on a glass substrate to produce a glass substrate with a color filter. Triglycetic anhydride as a curing agent was added to polyglycidyl methacrylate, which is an acrylic organic resin, and the solution was applied on the glass substrate with a color filter by a spin coating method and baked at 200 ° C. for 1 hour. When the surface of the organic protective film produced by the above method was measured by X-ray photoelectron spectroscopy, the detected ratio of the carbon amount to the oxygen amount on the extreme surface (C / O) was 1.47. C1 to be detected
As a result of analyzing the signal of the s orbit, the signal (Ic-c) defined for the CC coupling and the signal (Ic) defined for the COO coupling
oo) and the ratio (Ic-c / Icoo) was 4.93.

The transmittance of this glass substrate provided with an organic protective film was 78%. The glass substrate on which the organic protective film is formed is introduced into a vacuum chamber by the above method, and then the ion energy density of 400 Wsec is applied to the organic protective film.
/ Cm ² and an acceleration voltage of 400 V were irradiated with argon ions for 100 seconds. Thereafter, the substrate was taken out, and the surface of the organic protective film was measured by X-ray photoelectron spectroscopy.
O was 5.22, which was larger than before ion irradiation. As a result of analyzing the signal of the detected C1s orbit, I
cc / Icoo was 30.2, which was larger than before ion irradiation. The transmittance of the glass substrate provided with an organic protective film was measured to be 68%.

After confirming the above fact, a glass substrate having an organic protective film formed on a color filter by the same method was introduced into a vacuum chamber. Thereafter, an ion energy density of 400 Wsec / cm ² and an acceleration voltage of 400 are applied to the organic protective film.
Under the condition of V, argon ions were irradiated for 100 seconds. Immediately thereafter, ITO was formed by sputtering using DC plasma.
Was formed. After removing this sample from the vacuum chamber, 40
When immersed in a 10% by weight aqueous solution of potassium hydroxide at a temperature of 60 ° C., no ITO peeling occurred even when immersed for 60 minutes or more.

With respect to the electrode plate formed by the above method,
When an electrode was formed at a pitch of 70 μ line / 20 μm space pitch using hydrochloric acid and an aqueous solution of iron chloride for 10 minutes, the ITO film was peeled off during wet etching.

Comparative Examples 3 to 5 Examples 5, 6, 7, 9 except that no adhesion layer was provided
The electrode plates of Comparative Examples 3, 4, 5, and 6 were obtained in exactly the same manner as described above. The performance of these electrode plates was compared with Comparative Examples 1 and 2.
The results are shown in Table 2.

[0049]

[Table 2] As shown in Table 2, when there is no carbonized layer, when there is no adhesion layer, and when carbonization is performed too much, the performance of the electrode plate is reduced. In Table 2 above, Δ of the pattern property is an evaluation as compared with the example of the present invention, and does not indicate that there is no problem in practical use.

[0050]

According to the present invention, a transparent electrode having a color filter or an organic protective film having an at least partially carbonized surface and having an adhesion layer at an interface with the color filter or the organic protective film is provided. By using an electrode plate for a display device, it is possible to dramatically improve the adhesion as compared with a case without an adhesion layer. Since the processing of the transparent electrode film having a predetermined pattern is facilitated, the electrode plate for a color display device suitable for the production of a color display device is obtained. Further, the properties of the transparent electrode can be improved as an effect of the adhesion layer, and the electrode plate for a color display device suitable for the production of a color display device can be obtained.

[Brief description of the drawings]

FIG. 1 shows an embodiment of an electrode plate for a color display device of the present invention.

FIG. 2 shows an embodiment of an electrode plate for a color display device of the present invention.

Claims (9)

[Claims] 1. An electrode plate for a color display device in which a transparent conductive film is formed on a color filter, wherein at least one of a metal oxide, a nitride, and an oxynitride is provided between the color filter and the transparent conductive film. An electrode plate for a color display device, comprising: providing an adhesion layer made of the compound of (1), and providing a layer in which the color filter is at least partially carbonized on the surface of the color filter on the transparent conductive film side. 2. A signal (Icoo) caused by a carboxyl group by X-ray photoelectron spectroscopy in a carbonized layer.
2. The electrode plate for a color display device according to claim 1, wherein the ratio (Ic-c / Icoo) of the signal (Ic-c) caused by the CC bond to that of the non-carbonized interior is larger. . 3. The electrode plate for a color display device according to claim 2, wherein the carbonized layer is formed by colliding gas ions containing oxygen ions or argon ions. 4. An organic protective film formed on the color filter for the purpose of protecting the color filter,
In an electrode plate for a color display device having a transparent conductive film formed on the organic protective film, at least one compound of a metal oxide, a nitride, and an oxynitride between the organic protective film and the transparent conductive film An electrode plate for a color display device, comprising: an adhesion layer formed of: and a layer in which the organic protective film is at least partially carbonized on the surface of the organic protective film on the transparent conductive film side. 5. A signal (Icoo) attributable to a carboxyl group by X-ray photoelectron spectroscopy in a carbonized layer.
5. The electrode plate for a color display device according to claim 4, wherein the ratio (Ic-c / Icoo) of the signal (Ic-c) caused by the CC bond to that of the non-carbonized inside is larger. . 6. The electrode plate for a color display device according to claim 5, wherein the carbonized layer is formed by bombarding gas ions containing oxygen ions or argon ions. 7. The color filter according to claim 1, wherein the color filter is a natural polymer made of any one of gelatin, casein and glue or an acrylic synthetic resin, and the organic protective film is an acrylic, epoxy or polyimide synthetic resin. The electrode plate for a color display device according to any one of claims 1 to 6. 8. The main component of an adhesion layer comprising at least one compound of a metal oxide, a nitride, and an oxynitride is silicon dioxide, silicon nitride, silicon oxynitride, titanium oxide,
8. The electrode plate for a color display device according to claim 1, wherein the electrode plate is a simple substance or a mixture of zirconium oxide. 9. A color display device using the electrode plate for a color display device according to claim 1. Description: