JPH10284755A - Photocoupler - Google Patents
PhotocouplerInfo
- Publication number
- JPH10284755A JPH10284755A JP9200797A JP9200797A JPH10284755A JP H10284755 A JPH10284755 A JP H10284755A JP 9200797 A JP9200797 A JP 9200797A JP 9200797 A JP9200797 A JP 9200797A JP H10284755 A JPH10284755 A JP H10284755A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- light
- substrate
- led chip
- emitting element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000000853 adhesive Substances 0.000 abstract description 8
- 230000008878 coupling Effects 0.000 abstract description 5
- 238000010168 coupling process Methods 0.000 abstract description 5
- 238000005859 coupling reaction Methods 0.000 abstract description 5
- 238000009413 insulation Methods 0.000 abstract description 3
- 239000012777 electrically insulating material Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 description 13
- 230000001070 adhesive effect Effects 0.000 description 6
- 229910052594 sapphire Inorganic materials 0.000 description 6
- 239000010980 sapphire Substances 0.000 description 6
- 238000010292 electrical insulation Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229910002601 GaN Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000005253 cladding Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910002704 AlGaN Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- -1 gallium nitride compound Chemical class 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は発光素子と受光素子
とを電気的に絶縁してパッケージ内に収納し、2つの回
路間を電気的に絶縁しながら光で結合するフォトカプラ
に関する。さらに詳しくは、その組立てを簡単に行うこ
とができる構造のフォトカプラに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocoupler in which a light emitting element and a light receiving element are electrically insulated and housed in a package, and two circuits are electrically insulated while being electrically insulated. More specifically, the present invention relates to a photocoupler having a structure that can be easily assembled.
【0002】[0002]
【従来の技術】従来のこの種のフォトカプラは、たとえ
ば図4に示されるように、発光素子チップ(以下、LE
Dチップという)31がリードフレームの第1のリード
32にダイボンディングされてその一方の電極が電気的
に接続されると共に、他方の電極が金線33などにより
第2のリード34にワイヤボンディングされて形成され
る発光素子部35と、受光素子チップ(以下、PDチッ
プという)36が第3のリード37にダイボンディング
されてその一方の電極が電気的に接続されると共に、他
方の電極が金線38などにより第4のリード39にワイ
ヤボンディングされて形成される受光素子部40とを対
向させて、その対向部が透明樹脂41により固定される
と共に、周囲が不透明樹脂などからなるパッケージ42
により覆われることにより形成されている。2. Description of the Related Art A conventional photocoupler of this type is, for example, as shown in FIG.
A D chip 31 is die-bonded to a first lead 32 of the lead frame, one electrode of which is electrically connected, and the other electrode is wire-bonded to a second lead 34 by a gold wire 33 or the like. The light emitting element portion 35 formed by the above method and a light receiving element chip (hereinafter, referred to as a PD chip) 36 are die-bonded to a third lead 37 so that one electrode is electrically connected and the other electrode is gold. A light receiving element portion 40 formed by wire bonding to a fourth lead 39 with a wire 38 or the like is opposed to the light receiving element portion 40, and the opposed portion is fixed by a transparent resin 41, and a package 42 made of an opaque resin or the like is provided around the portion.
It is formed by being covered by.
【0003】このフォトカプラを製造するには、1枚の
リードフレームを用いた簡単な製法のものでも、1枚の
リードフレームの一面側にLEDチップ31およびPD
チップ36をそれぞれダイボンディングし、そしてワイ
ヤボンディングした後に発光素子部35または受光素子
部40側のリードを折り曲げて相互に対向させなければ
ならない。そしてその後に対向部に透明樹脂をポッティ
ングなどにより充填してからその周囲をモールドしなけ
ればならない。In order to manufacture this photocoupler, a simple manufacturing method using one lead frame can be achieved by using an LED chip 31 and a PD on one surface of one lead frame.
After the chips 36 are respectively die-bonded and wire-bonded, the leads on the light emitting element section 35 or the light receiving element section 40 side must be bent to face each other. After that, the opposing portion must be filled with a transparent resin by potting or the like, and then the periphery thereof must be molded.
【0004】[0004]
【発明が解決しようとする課題】従来のフォトカプラ
は、大量生産用にリードフレームを用いるものでも、前
述のように、発光素子部および受光素子部を形成した後
に、その一方のリードを折り曲げて両者を対向させなけ
ればならない。この発光素子部および受光素子部はそれ
ぞれその表面側にワイヤボンディングの金線などが出っ
張っており、それらが接触しないようにする必要があ
る。そのため組立工程が非常に複雑で、工数増となり、
コストダウンに限界がある。Even if a conventional photocoupler uses a lead frame for mass production, as described above, after forming a light emitting element portion and a light receiving element portion, one of the leads is bent. Both must be opposed. Each of the light emitting element portion and the light receiving element portion has a gold wire for wire bonding protruding on its surface side, and it is necessary to prevent them from coming into contact with each other. As a result, the assembly process is very complicated, and the man-hour is increased.
There is a limit to cost reduction.
【0005】さらに、前述のように、発光素子部と受光
素子部との対向部には金線が出っ張っており、また、そ
の間に充填する透明樹脂の絶縁性が充分ではなく、また
組立精度の点から、その対向間隔を狭くするのに限界が
あり、0.5mm以下にすることができない。そのた
め、両者間の間隔が大きくなり、光の授受の効率が低下
してより大きな輝度の発光素子を必要として発光素子の
消費電流が大きくなると共に、素子の小形化の制約を受
けるという問題がある。Further, as described above, a gold wire protrudes from the opposing portion of the light emitting element portion and the light receiving element portion, and the insulating property of the transparent resin filled therebetween is not sufficient, and the assembling accuracy is low. From the point of view, there is a limit in narrowing the facing distance, and the distance cannot be reduced to 0.5 mm or less. Therefore, there is a problem in that the distance between the two becomes large, the efficiency of light transmission and reception is reduced, a light emitting element with higher luminance is required, the current consumption of the light emitting element is increased, and miniaturization of the element is restricted. .
【0006】本発明はこのような問題を解決するために
なされたもので、組立てを非常に簡単にすることができ
ると共に、光の結合効率を向上させて輝度の低い発光素
子でも充分に両者を結合させることができ、安価、か
つ、小形で効率のよいのフォトカプラを提供することを
目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and can greatly simplify the assembling and improve the light coupling efficiency so that even a light emitting element with low luminance can be sufficiently used. An object of the present invention is to provide an inexpensive, compact, and efficient photocoupler that can be coupled.
【0007】[0007]
【課題を解決するための手段】本発明によるフォトカプ
ラは、基板上に発光部を形成する半導体層が積層され、
該基板が前記発光部により発光する光を透過する材料か
らなる発光素子チップと、前記発光素子チップの発光す
る光を受光し得る受光素子チップとからなり、前記発光
素子チップが前記受光素子チップの表面に該受光素子チ
ップと電気的に絶縁して直接接着されている。In a photocoupler according to the present invention, a semiconductor layer forming a light emitting portion is laminated on a substrate,
The substrate includes a light emitting element chip made of a material that transmits light emitted by the light emitting unit, and a light receiving element chip capable of receiving light emitted by the light emitting element chip, wherein the light emitting element chip is a light emitting element chip. It is directly adhered to the surface of the light receiving element chip while being electrically insulated therefrom.
【0008】その結果、発光素子部と受光素子部とを一
定間隙を有するように対向させる必要がなく、ただ積み
重ねて接着すればよいため組立てが非常に容易になると
共に、発光素子部と受光素子部とが殆ど接した状態にな
っており両者間の光の結合効率が向上する。As a result, it is not necessary to oppose the light emitting element portion and the light receiving element portion so as to have a fixed gap, and it is only necessary to stack and bond the light emitting element portion and the light receiving element portion. The portions are almost in contact with each other, and the efficiency of light coupling between the two is improved.
【0009】前述の発光素子チップと受光素子チップと
の電気的絶縁性は、たとえば前記受光素子チップの表面
に前記発光素子チップの発光する光を透過する絶縁膜が
形成されたり、前記発光素子チップの基板が電気的絶縁
性基板からなることにより、そのまま接着剤などにより
接着しても得られる。The electrical insulation between the light emitting element chip and the light receiving element chip is, for example, that an insulating film that transmits light emitted by the light emitting element chip is formed on the surface of the light receiving element chip, Since the substrate is made of an electrically insulating substrate, it can be obtained even if the substrate is directly adhered with an adhesive or the like.
【0010】[0010]
【発明の実施の形態】つぎに、図面を参照しながら本発
明のフォトカップラについて説明をする。Next, a photocoupler of the present invention will be described with reference to the drawings.
【0011】本発明のフォトカプラは、図1にその一実
施形態の概略図が示されるように、LEDチップ1の基
板がその上に積層される発光部で発光する光を透過させ
る材料からなっていると共に、そのLEDチップ1がP
Dチップ2上に相互に電気的に絶縁されるように接着し
て設けられていることに特徴がある。すなわち、図1に
示される例では、LEDチップ1が、サファイア基板上
にチッ化ガリウム系化合物半導体が積層された青色系の
LEDチップからなり、PDチップ2の上にLEDチッ
プ1から発光する光を透過させる接着剤4などにより接
着されることにより形成されている。The photocoupler of the present invention, as shown in FIG. 1, is a schematic view of one embodiment of the present invention, in which the substrate of the LED chip 1 is made of a material that transmits light emitted by a light emitting portion laminated thereon. And the LED chip 1 is P
It is characterized in that it is provided on the D chip 2 by bonding so as to be electrically insulated from each other. That is, in the example shown in FIG. 1, the LED chip 1 is a blue LED chip in which a gallium nitride-based compound semiconductor is laminated on a sapphire substrate, and light emitted from the LED chip 1 on a PD chip 2. It is formed by bonding with an adhesive 4 or the like that transmits light.
【0012】LEDチップ1は、たとえば図2にその断
面構造が示されるように、サファイア基板11上にたと
えばn形のGaNおよび/またはAlGaN系(Alと
Gaの比率が種々変わり得ることを意味する、以下同
じ)化合物半導体がエピタキシャル成長されたn形層
(クラッド層)13と、バンドギャップエネルギーがク
ラッド層のそれよりも小さくなる材料、たとえばInG
aN系(InとGaの比率が種々変わり得ることを意味
する、以下同じ)化合物半導体からなる活性層14と、
たとえばp形のGaNおよび/またはAlGaN系化合
物半導体からなるp形層(クラッド層)15とが積層さ
れ、その表面のp形層15に電気的に接続してp側電極
18が、積層された半導体層の一部がエッチングされて
露出するn形層13と電気的に接続してn側電極19が
それぞれ設けられることにより、形成されている。な
お、通常のLEDチップ1は、その上面側から光を取り
出すため、p側電極18は光を遮らないように小さく形
成され、電流をLEDチップの全体に広げるために、p
形層15の表面に光を通す薄い金属膜からなる電流拡散
層が設けられることがあるが、本発明では、基板11の
裏面側に出る光を利用するため、p形層の表面の全面に
オーミックコンタクトが取れる電極金属を厚く設けるこ
とができる。あるいは透明電極の上に絶縁膜およびAl
などの反射膜を形成してもよい。このLEDチップ1の
サファイア基板11は透明で、青色系の光を透過させる
と共に、電気的絶縁性が良好であるため、直接PDチッ
プ2上に接着しても両者間の電気的絶縁性を充分に得る
ことができる。The LED chip 1 has, for example, an n-type GaN and / or AlGaN-based (the ratio of Al to Ga can be variously changed on a sapphire substrate 11 as shown in the sectional structure of FIG. 2, for example. An n-type layer (cladding layer) 13 on which a compound semiconductor is epitaxially grown, and a material whose band gap energy is smaller than that of the cladding layer, for example, InG
an active layer 14 made of an aN-based (which means that the ratio of In to Ga can be varied, the same applies hereinafter) compound semiconductor;
For example, a p-type layer (cladding layer) 15 made of p-type GaN and / or an AlGaN-based compound semiconductor is laminated, and a p-side electrode 18 is laminated by being electrically connected to the p-type layer 15 on the surface thereof. It is formed by providing n-side electrodes 19 electrically connected to the n-type layer 13 which is partially exposed by etching the semiconductor layer. In the ordinary LED chip 1, the p-side electrode 18 is formed to be small so as not to block the light in order to extract light from the upper surface side.
A current diffusion layer made of a thin metal film that transmits light may be provided on the surface of the p-type layer 15. However, in the present invention, since light emitted to the back side of the substrate 11 is used, the entire surface of the p-type layer is used. An electrode metal from which an ohmic contact can be made can be provided thick. Alternatively, an insulating film and Al
A reflective film such as a reflective film may be formed. The sapphire substrate 11 of the LED chip 1 is transparent, transmits blue light, and has good electrical insulation. Therefore, even if the LED chip 1 is directly adhered onto the PD chip 2, the electrical insulation between the two is sufficient. Can be obtained.
【0013】PDチップ2は、その上にLEDチップ1
が接着された状態の斜視図が図3に示されるように、た
とえばn形のシリコンなどからなる半導体基板21と、
その半導体基板21にp形のドーパントの拡散などによ
り形成されるp形領域22とにより、pn接合が形成さ
れたフォトダイオードで、そのn形層(半導体基板2
1)およびp形領域22にそれぞれ電気的に接続してn
側電極23およびp側電極24が設けられることにより
形成されている。そしてこの両電極23、24を介して
pn接合に逆バイアスが印加された状態で光が照射され
ると電流が流れる。このPDチップ2は、フォトダイオ
ードでなくてもフォトトランジスタなどの他の受光素子
チップを使用することができる。The PD chip 2 has an LED chip 1 thereon.
As shown in FIG. 3, a semiconductor substrate 21 made of n-type silicon or the like,
A photodiode in which a pn junction is formed by a p-type region 22 formed by diffusion of a p-type dopant in the semiconductor substrate 21 and the n-type layer (semiconductor substrate 2).
1) and n electrically connected to the p-type region 22 respectively.
It is formed by providing the side electrode 23 and the p-side electrode 24. When light is irradiated in a state where a reverse bias is applied to the pn junction via the electrodes 23 and 24, a current flows. This PD chip 2 can use another light receiving element chip such as a phototransistor, instead of a photodiode.
【0014】このPDチップ2が図1に示されるよう
に、リードフレームの第1のリード3aの先端のダイパ
ッド3e上にダイボンディングされ、その表面にLED
チップ1がたとえば透明なエポキシ樹脂などからなる接
着剤4により接着されている。PDチップ2のn側電極
23はダイボンディングによりリード3aと電気的に接
続され、p側電極24は金線5などにより第2のリード
3bとワイヤボンディングにより電気的に接続されて受
光素子部6を構成している。また、LEDチップ1のn
側電極19およびp側電極18もそれぞれ第3および第
4のリード3c、3dと金線5などによりワイヤボンデ
ィングがなされ、発光素子部7を構成している。そし
て、外部から受光素子部6に光が入らないようにするた
め、この周囲全体が不透明なエポキシ樹脂などによりモ
ールドされて図示しないパッケージが形成されることに
より、本発明のフォトカプラが形成される。As shown in FIG. 1, this PD chip 2 is die-bonded on a die pad 3e at the tip of a first lead 3a of a lead frame, and an LED is mounted on the surface thereof.
The chip 1 is bonded with an adhesive 4 made of, for example, a transparent epoxy resin. The n-side electrode 23 of the PD chip 2 is electrically connected to the lead 3a by die bonding, and the p-side electrode 24 is electrically connected to the second lead 3b by wire bonding or the like by wire bonding. Is composed. Also, n of the LED chip 1
The side electrode 19 and the p-side electrode 18 are also wire-bonded with the third and fourth leads 3c and 3d and the gold wire 5 to constitute the light emitting element section 7. Then, in order to prevent light from entering the light receiving element portion 6 from the outside, the entire periphery is molded with an opaque epoxy resin or the like to form a package (not shown), thereby forming the photocoupler of the present invention. .
【0015】本発明によれば、LEDチップ1の基板が
たとえばサファイアなどのLEDチップで発光する光を
透過する材料からなっている。そのため、LEDチップ
1で発光する光は基板の裏面に出て、接着剤4を経てP
Dチップ2に入り受光される。一方、前述の例ではLE
Dチップ1の基板がサファイアなどの電気的絶縁性材料
からなっているため、直接PDチップ2上に接着されて
も両者間の電気的絶縁性は非常に高く保持される。その
ため、両者を離間させて対向させる必要がなく、また、
リードフレームを折り曲げる必要もないため、ワイヤ同
士の接触の心配もなく、組立てが非常に容易になる。し
かも、LEDチップ1とPDチップ2との間に間隙を有
してその間に樹脂などが充填されないため、LEDチッ
プ1とPDチップ2の結合効率が向上し、輝度の小さい
LEDチップ1でも充分に結合すると共に、全体の高さ
を低くすることができ、コンパクトになる。According to the present invention, the substrate of the LED chip 1 is made of a material such as sapphire that transmits light emitted by the LED chip. Therefore, the light emitted from the LED chip 1 exits to the back surface of the substrate and passes through the adhesive 4
The light enters the D chip 2 and is received. On the other hand, in the above example, LE
Since the substrate of the D chip 1 is made of an electrically insulating material such as sapphire, the electrical insulation between the two is kept very high even if the substrate is directly adhered to the PD chip 2. Therefore, there is no need to separate them and face each other.
Since there is no need to bend the lead frame, there is no need to worry about contact between wires, and assembly becomes very easy. Moreover, since there is a gap between the LED chip 1 and the PD chip 2 and the space between the LED chip 1 and the PD chip 2 is not filled with resin or the like, the coupling efficiency between the LED chip 1 and the PD chip 2 is improved, and even the LED chip 1 having a small luminance can be sufficiently used. At the same time, the overall height can be reduced, and the device becomes compact.
【0016】前述の例では、LEDチップの基板が絶縁
性基板であったが、LEDチップで発光する光を透過す
れば絶縁性基板でなくてもよい。この場合、PDチップ
との電気的絶縁性を得るために、両者の接着剤に絶縁性
の良い物を使用したり、PDチップの表面に充分に絶縁
性が得られると共に、LEDチップの光を透過するポリ
イミドなどの絶縁膜が設けられてもよい。この場合、フ
ォトカプラに使用する数十〜100V程度を確保するに
は、通常の絶縁材料耐圧の理論値が20MV/m程度
で、理論値の数倍程度の厚さが必要となるため、最低1
0μm以上の厚い膜が必要となり、20μm厚以上ある
ことが好ましい。In the above-described example, the substrate of the LED chip is an insulating substrate. However, the substrate may not be an insulating substrate as long as light emitted by the LED chip is transmitted. In this case, in order to obtain electrical insulation from the PD chip, a material having good insulation may be used for both adhesives. An insulating film such as a transparent polyimide may be provided. In this case, in order to secure about several tens to 100 V used for the photocoupler, the theoretical value of the normal withstand voltage of the insulating material is about 20 MV / m, and a thickness several times the theoretical value is required. 1
A thick film having a thickness of 0 μm or more is required, and preferably a thickness of 20 μm or more.
【0017】受光素子チップの表面に光を透過する絶縁
膜が形成される場合、その表面にたとえば配線をパター
ニングにより形成することができる。そのため、LED
チップの基板が半導体基板などでその上面と下面とに両
電極が設けられる場合でも、前述の絶縁膜上の配線とL
EDチップの裏面側に設けられる電極とが接触するよう
にLEDチップを接着することにより、LEDチップの
電極の接続を容易に行うことができる。したがって、L
EDチップは前述のようなサファイア基板上にチッ化ガ
リウム系化合物半導体が積層される青色系の発光素子に
限定されるものではなく、たとえば赤外線に対するGa
As基板や、赤色、緑色に対するGaP基板のような発
光する光を透過する材料からなる基板を有するすべての
発光素子を用いることができる。なお、基板に半導体な
どの導電性基板が用いられる場合でも、半導体層が積層
される表面側にn側およびp側の両電気が形成されれ
ば、その電極の接続をワイヤボンディングのみで簡単に
行える。When an insulating film that transmits light is formed on the surface of the light receiving element chip, for example, wiring can be formed on the surface by patterning. Therefore, LED
Even when the chip substrate is a semiconductor substrate or the like and both electrodes are provided on the upper and lower surfaces thereof, the wiring on the insulating film and the L
By bonding the LED chip so that the electrode provided on the back side of the ED chip is in contact with the LED chip, the electrodes of the LED chip can be easily connected. Therefore, L
The ED chip is not limited to a blue light emitting element in which a gallium nitride compound semiconductor is stacked on a sapphire substrate as described above.
All light-emitting elements having a substrate made of a material that transmits light, such as an As substrate or a GaP substrate for red and green, can be used. Even when a conductive substrate such as a semiconductor is used as the substrate, if both n-side and p-side electricity are formed on the surface on which the semiconductor layer is laminated, connection of the electrodes can be easily performed only by wire bonding. I can do it.
【0018】[0018]
【発明の効果】本発明によれば、リードフレームのダイ
パッド上に受光素子チップと発光素子チップを順次ボン
ディングするだけで、後は通常のICと同様にワイヤボ
ンディングをしてモールドするだけでフォトカプラを製
造することができる。そのため、従来のように、発光素
子部と受光素子部とを位置合せして対向させるという組
立て上の煩わしさがなくなり、組立工程が非常に容易で
短時間で製造することができる。さらに、両素子部の絶
縁性は組立上の位置合せなどに関係なく、確実に保持す
ることができるため、歩留りが向上すると共に、信頼性
も向上する。According to the present invention, a photocoupler can be formed by simply bonding a light receiving element chip and a light emitting element chip in sequence on a die pad of a lead frame, and then by wire bonding and molding in the same manner as a normal IC. Can be manufactured. Therefore, unlike the related art, the trouble of assembling the light-emitting element portion and the light-receiving element portion in alignment and facing each other is eliminated, and the assembling process is very easy and can be manufactured in a short time. Further, since the insulation properties of the two element portions can be reliably maintained irrespective of the alignment in assembling, the yield is improved and the reliability is also improved.
【0019】また、発光素子部と受光素子部とが非常に
近くなるため、発光素子と受光素子との結合効率が高く
なり、発光素子の消費電流を小さくすることができる。
さらに、両素子間の間隔を設ける必要がないため、厚さ
が薄くなりコンパクトにすることができる。Further, since the light emitting element portion and the light receiving element portion are very close to each other, the coupling efficiency between the light emitting element and the light receiving element is increased, and the current consumption of the light emitting element can be reduced.
Furthermore, since there is no need to provide an interval between the two elements, the thickness can be reduced and the device can be made compact.
【図1】本発明のフォトカプラの一実施形態のリードフ
レーム上にチップをボンディングした状態の説明図であ
る。FIG. 1 is an explanatory diagram of a state in which a chip is bonded on a lead frame of an embodiment of the photocoupler of the present invention.
【図2】図1のPDチップおよびLEDチップ部の側面
説明図である。FIG. 2 is an explanatory side view of a PD chip and an LED chip unit of FIG. 1;
【図3】図1のPDチップおよびLEDチップ部の斜視
説明図である。FIG. 3 is an explanatory perspective view of a PD chip and an LED chip unit of FIG. 1;
【図4】従来のフォトカプラの一例の要部の断面説明図
である。FIG. 4 is an explanatory sectional view of a main part of an example of a conventional photocoupler.
1 LEDチップ 2 PDチップ 4 接着剤 1 LED chip 2 PD chip 4 Adhesive
Claims (3)
層され、該基板が前記発光部により発光する光を透過す
る材料からなる発光素子チップと、前記発光素子チップ
の発光する光を受光し得る受光素子チップとからなり、
前記発光素子チップが前記受光素子チップの表面に該受
光素子チップと電気的に絶縁して直接接着されてなるフ
ォトカプラ。A light emitting element chip formed of a material through which light emitted by the light emitting unit is transmitted; and a light emitting element chip for receiving light emitted by the light emitting element chip. Light-receiving element chip
A photocoupler in which the light emitting element chip is directly adhered to the surface of the light receiving element chip while being electrically insulated from the light receiving element chip.
子チップの発光する光を透過する絶縁膜が形成されるこ
とにより、前記発光素子チップが前記受光素子チップと
電気的に絶縁されてなる請求項1記載のフォトカプラ。2. The light-emitting element chip is electrically insulated from the light-receiving element chip by forming an insulating film that transmits light emitted by the light-emitting element chip on a surface of the light-receiving element chip. Item 7. The photocoupler according to Item 1.
性基板からなる請求項1記載のフォトカプラ。3. The photocoupler according to claim 1, wherein the substrate of the light emitting element chip comprises an electrically insulating substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9200797A JPH10284755A (en) | 1997-04-10 | 1997-04-10 | Photocoupler |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9200797A JPH10284755A (en) | 1997-04-10 | 1997-04-10 | Photocoupler |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10284755A true JPH10284755A (en) | 1998-10-23 |
Family
ID=14042413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9200797A Pending JPH10284755A (en) | 1997-04-10 | 1997-04-10 | Photocoupler |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10284755A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6657309B1 (en) | 1999-02-08 | 2003-12-02 | Rohm Co., Ltd. | Semiconductor chip and semiconductor device of chip-on-chip structure |
JP2007067414A (en) * | 2005-08-31 | 2007-03-15 | Avago Technologies Ecbu Ip (Singapore) Pte Ltd | Double mold optical coupler |
CN111162067A (en) * | 2018-11-08 | 2020-05-15 | 喆富创新科技股份有限公司 | Optical coupling structure for forming laminated pattern on wafer |
KR20220002038A (en) * | 2020-06-30 | 2022-01-06 | 닝보 쿤신 마이크로-일렉트로닉스 컴퍼니., 리미티드 | Optical coupling apparatus |
-
1997
- 1997-04-10 JP JP9200797A patent/JPH10284755A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6657309B1 (en) | 1999-02-08 | 2003-12-02 | Rohm Co., Ltd. | Semiconductor chip and semiconductor device of chip-on-chip structure |
JP2007067414A (en) * | 2005-08-31 | 2007-03-15 | Avago Technologies Ecbu Ip (Singapore) Pte Ltd | Double mold optical coupler |
CN111162067A (en) * | 2018-11-08 | 2020-05-15 | 喆富创新科技股份有限公司 | Optical coupling structure for forming laminated pattern on wafer |
KR20220002038A (en) * | 2020-06-30 | 2022-01-06 | 닝보 쿤신 마이크로-일렉트로닉스 컴퍼니., 리미티드 | Optical coupling apparatus |
JP2022013562A (en) * | 2020-06-30 | 2022-01-18 | ニンボ チュンシン マイクロ-エレクトロニクス カンパニー リミテッド | Photocoupler device |
US11525966B2 (en) | 2020-06-30 | 2022-12-13 | Ningbo Qunxin Micro-Electronics Co., Ltd | Optical coupling apparatus |
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