JPH10279669A - Epoxy resin hardener - Google Patents
Epoxy resin hardenerInfo
- Publication number
- JPH10279669A JPH10279669A JP8981497A JP8981497A JPH10279669A JP H10279669 A JPH10279669 A JP H10279669A JP 8981497 A JP8981497 A JP 8981497A JP 8981497 A JP8981497 A JP 8981497A JP H10279669 A JPH10279669 A JP H10279669A
- Authority
- JP
- Japan
- Prior art keywords
- alkylbenzene
- aldehyde
- phenol
- represented
- epoxy resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 26
- 229920000647 polyepoxide Polymers 0.000 title claims description 26
- 239000004848 polyfunctional curative Substances 0.000 title abstract 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 150000004996 alkyl benzenes Chemical class 0.000 claims abstract description 32
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 claims abstract description 22
- 150000001299 aldehydes Chemical class 0.000 claims abstract description 21
- 239000003377 acid catalyst Substances 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 150000002430 hydrocarbons Chemical group 0.000 claims abstract description 4
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 3
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 3
- 150000002367 halogens Chemical class 0.000 claims abstract description 3
- 229920005989 resin Polymers 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 13
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 claims description 11
- 150000002989 phenols Chemical class 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004429 atom Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 238000006068 polycondensation reaction Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 238000005452 bending Methods 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 33
- 239000000203 mixture Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 229960001755 resorcinol Drugs 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003172 aldehyde group Chemical group 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- YGHRJJRRZDOVPD-UHFFFAOYSA-N 3-methylbutanal Chemical compound CC(C)CC=O YGHRJJRRZDOVPD-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- -1 amine compounds Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- XSXWOBXNYNULJG-UHFFFAOYSA-N 2-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound CC(C)(C)CC(C)(C)C1=CC=CC=C1O XSXWOBXNYNULJG-UHFFFAOYSA-N 0.000 description 1
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 1
- SWZVJOLLQTWFCW-UHFFFAOYSA-N 2-chlorobenzene-1,3-diol Chemical compound OC1=CC=CC(O)=C1Cl SWZVJOLLQTWFCW-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000000397 acetylating effect Effects 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229940118056 cresol / formaldehyde Drugs 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical class OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000012156 elution solvent Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000012966 insertion method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、エポキシ樹脂との
硬化反応において良好な硬化性を示し、かつ耐熱性に優
れ、低応力で耐湿性に優れる半導体封止材用として好適
なフェノール・アルキルベンゼン・アルデヒド樹脂を主
成分とするエポキシ樹脂硬化剤に関する。[0001] The present invention relates to a phenol-alkylbenzene-containing compound which exhibits good curability in a curing reaction with an epoxy resin, and has excellent heat resistance, low stress and excellent moisture resistance. The present invention relates to an epoxy resin curing agent containing an aldehyde resin as a main component.
【0002】[0002]
【従来の技術】従来より、エポキシ樹脂の硬化剤とし
て、酸無水物、アミン系化合物、イミダゾール化合物、
ノボラック型フェノール樹脂等が使用されてきたが、近
年、半導体封止材用エポキシ樹脂の硬化剤としては、硬
化後のエポキシ樹脂の成形性、耐熱性、耐湿性、電気特
性が優れていることからノボラック型フェノール樹脂が
広く利用されている。2. Description of the Related Art Conventionally, acid anhydrides, amine compounds, imidazole compounds,
Novolak-type phenolic resins have been used, but in recent years, as a curing agent for epoxy resins for semiconductor encapsulants, because of the excellent moldability, heat resistance, moisture resistance, and electrical properties of cured epoxy resins, Novolak phenolic resins are widely used.
【0003】しかし近年、集積回路の高集積化に伴いチ
ップが大型化し、また実装法が挿入法から表面実装に変
化するとともに、パッケージも小型、薄型化してきてい
る。即ち、大型チップが薄いパッケージに封止された状
態で従来以上に高温にさらされる為、パッケージクラッ
クの問題が発生し、封止材に一層の低応力化、耐湿性向
上が要求されてきた。[0003] In recent years, however, chips have become larger in size with higher integration of integrated circuits, the mounting method has changed from the insertion method to surface mounting, and packages have become smaller and thinner. That is, since a large chip is exposed to a higher temperature than before in a state in which it is sealed in a thin package, a problem of a package crack occurs, and further reduction in stress and improvement in moisture resistance of the sealing material have been required.
【0004】封止材の低応力化、耐湿性向上の為に、硬
化剤としてキシレン変性フェノール樹脂の使用(特開昭
59−105017号公報)、含フッ素ノボラックの使
用(特開昭64−74215号公報)等が検討された。
また、4−アルキルフェノールあるいは4−アリールフ
ェノールのジメチロール誘導体とフェノールを縮合させ
てエポキシ樹脂硬化剤用のポリヒドロキシ化合物を製造
する方法も公開されている(特開昭62−119220
号公報)。しかしながら、これらは、応力は低下しても
強度も低下してしまったり、いずれもエポキシ樹脂封止
材用硬化剤としては充分満足のいくものではなかった。In order to lower the stress and improve the moisture resistance of the sealing material, use of a xylene-modified phenol resin as a curing agent (Japanese Patent Application Laid-Open No. 59-105017) and use of a fluorine-containing novolak (Japanese Patent Application Laid-Open No. 64-74215). No.) was considered.
Also disclosed is a method for producing a polyhydroxy compound for an epoxy resin curing agent by condensing a phenol with a dimethylol derivative of a 4-alkylphenol or a 4-arylphenol (JP-A-62-119220).
No.). However, these materials have reduced strength even if the stress is reduced, and none of them has been sufficiently satisfactory as a curing agent for an epoxy resin sealing material.
【0005】[0005]
【発明が解決しようとする課題】本発明の目的は、半導
体封止材用エポキシ樹脂硬化剤として利用でき、エポキ
シ樹脂との硬化反応において良好な硬化性を示し、かつ
耐熱性に優れ、低応力で耐湿性に優れる半導体封止材を
与えるフェノール・アルキルベンゼン・アルデヒド樹脂
を主成分とするエポキシ樹脂硬化剤を提供することにあ
る。SUMMARY OF THE INVENTION An object of the present invention is to provide an epoxy resin curing agent for a semiconductor encapsulant, exhibiting good curability in a curing reaction with an epoxy resin, and having excellent heat resistance and low stress. An object of the present invention is to provide an epoxy resin curing agent containing a phenol / alkylbenzene / aldehyde resin as a main component, which provides a semiconductor encapsulant having excellent moisture resistance.
【0006】[0006]
【課題を解決するための手段】本発明は、一般式(1)
で示されるアルキルベンゼン類(X)と一般式(2)で
示されるアルデヒド類(Y1)を酸触媒の存在下で反応
させたアルキルベンゼン・アルデヒド樹脂(A)と、一
般式(3)、又は(3)及び(4)で示されるフェノー
ル類(Z)を、重量比が1≦(Z)/(A)≦20で酸
触媒の存在下重縮合させた後、更に一般式(2)で示さ
れるアルデヒド類(Y2)を反応させてなるフェノール
・アルキルベンゼン・アルデヒド樹脂を主成分とするエ
ポキシ樹脂硬化剤である。According to the present invention, there is provided a compound represented by the general formula (1):
An alkylbenzene-aldehyde resin (A) obtained by reacting an alkylbenzene (X) represented by the formula (X) with an aldehyde (Y1) represented by the formula (2) in the presence of an acid catalyst, and a compound represented by the formula (3) or (3) ) And (4) are polycondensed in the presence of an acid catalyst at a weight ratio of 1 ≦ (Z) / (A) ≦ 20, and then further represented by the general formula (2) An epoxy resin curing agent containing a phenol / alkylbenzene / aldehyde resin as a main component obtained by reacting an aldehyde (Y2).
【化1】 (式中、R1 は、炭素数1〜8のアルキル基を表し、そ
れらは互いに同一であっても異なっていてもよい。mは
1〜4の整数。) R2−CHO (2) (式中、R2 は、水素又は炭素数1〜7の1価の炭化水
素基を表す。Y1とY2は互いに同一であっても異なっ
ていてもよい。)Embedded image (In the formula, R 1 represents an alkyl group having 1 to 8 carbon atoms, which may be the same or different, and m is an integer of 1 to 4.) R 2 —CHO (2) ( In the formula, R 2 represents hydrogen or a monovalent hydrocarbon group having 1 to 7 carbon atoms. Y 1 and Y 2 may be the same or different from each other.)
【化3】 Embedded image
【化4】 (式中、R3 は、水素、炭素数1〜8のアルキル基、ア
ルケニル基、ハロゲンの中から選択される原子又は基を
表し、それらは互いに同一であっても異なっていてもよ
い。nは1〜3の整数。)Embedded image (In the formula, R 3 represents an atom or a group selected from hydrogen, an alkyl group having 1 to 8 carbon atoms, an alkenyl group, and a halogen, which may be the same or different. Is an integer of 1 to 3.)
【0007】本発明で使用されるアルキルベンゼン類
(X)としては、トルエン、キシレン、メシチレン、ク
メン等があげられ、アルデヒド類(Y1、Y2)との反
応性の良いm−キシレンが特に好ましい。アルデヒド類
(Y1、Y2)はアルデヒド基を1個有する炭化水素で
アルデヒド基以外の炭素数が0〜7であり、ホルムアル
デヒド、アセトアルデヒド、プロピオンアルデヒド、ブ
チルアルデヒド、イソブチルアルデヒド、イソバレルア
ルデヒド、ベンズアルデヒド等があげられ、エポキシ樹
脂との硬化時に架橋密度が高くなるホルムアルデヒドが
特に好ましい。なお、アルデヒド基以外の炭素数が8以
上では立体障害が大きく、エポキシ基と水酸基との硬化
反応を阻害し、樹脂組成物の硬化性の低下、或いは硬化
物のガラス転移温度が低下する。フェノール類(Z)と
しては、レゾルシン、カテコール、ハイドロキノン、メ
チルレゾルシン、クロロレゾルシン等の2価フェノール
類、フェノール、クレゾール、t−ブチルフェノール、
t−オクチルフェノール、アリルフェノール等の1価フ
ェノール類があげられるが、本発明においては、2価フ
ェノール類を必ず含むものとする。この中で、水酸基当
量と軟化点、及び溶液粘度とのバランスが良い樹脂を与
えるレゾルシン、又は2価フェノール類とフェノールの
併用が好ましい。また以上にあげたアルキルベンゼン類
(X)、アルデヒド類(Y1、Y2)及びフェノール類
(Z)はそれぞれ一例であり、特に限定されるものでは
ない。またこれらは反応に際して単独でも混合して用い
てもよい。The alkylbenzenes (X) used in the present invention include toluene, xylene, mesitylene, cumene and the like, and m-xylene having a high reactivity with aldehydes (Y1, Y2) is particularly preferred. Aldehydes (Y1, Y2) are hydrocarbons having one aldehyde group and have 0 to 7 carbon atoms other than aldehyde group, and include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, isobutyraldehyde, isovaleraldehyde, benzaldehyde and the like. Formaldehyde, which increases the crosslink density when cured with an epoxy resin, is particularly preferred. When the number of carbon atoms other than the aldehyde group is 8 or more, steric hindrance is large, and the curing reaction between the epoxy group and the hydroxyl group is inhibited, and the curability of the resin composition is lowered or the glass transition temperature of the cured product is lowered. Examples of the phenols (Z) include dihydric phenols such as resorcin, catechol, hydroquinone, methyl resorcin, chlororesorcin, phenol, cresol, t-butylphenol,
Monohydric phenols such as t-octylphenol and allylphenol are mentioned, but in the present invention, dihydric phenols are necessarily included. Of these, resorcinol, which gives a resin having a good balance between the hydroxyl equivalent, the softening point, and the solution viscosity, or a combination of dihydric phenols and phenol is preferable. The above-mentioned alkylbenzenes (X), aldehydes (Y1, Y2) and phenols (Z) are merely examples, and are not particularly limited. These may be used alone or as a mixture during the reaction.
【0008】本発明中のアルキルベンゼン・アルデヒド
樹脂は、アルキルベンゼン類(X)とアルデヒド類(Y
1)を硫酸などの酸触媒の存在下で反応することにより
容易に得ることができる。またm−キシレン・ホルムア
ルデヒド樹脂などは、三菱瓦斯化学(株)から「ニカノ
ール」という商品名で市販されており、容易に入手する
こともできる。The alkylbenzene-aldehyde resin in the present invention comprises an alkylbenzene (X) and an aldehyde (Y
1) can be easily obtained by reacting in the presence of an acid catalyst such as sulfuric acid. Further, m-xylene / formaldehyde resin and the like are commercially available from Mitsubishi Gas Chemical Co., Ltd. under the trade name "Nicanol" and can be easily obtained.
【0009】本発明のフェノール・アルキルベンゼン・
アルデヒド樹脂は、アルキルベンゼン類(X)とアルデ
ヒド類(Y1)を酸触媒の存在下で反応させたアルキル
ベンゼン・アルデヒド樹脂(A)と、フェノール類
(Z)を酸触媒の存在下重縮合させた後、更にアルデヒ
ド類(Y2)を反応させて得ることができる。(A)と
(Z)の重縮合時には必要に応じて有機溶媒を用いても
よい。有機溶媒としてはアセトン、メチルエチルケト
ン、メチルイソブチルケトン等のケトン類や、メタノー
ル、エタノール、プロパノール、ブタノール等のアルコ
ール類があげられるが特に限定されるものではない。ま
た単独でも混合して用いてもよい。The phenol / alkylbenzene of the present invention
The aldehyde resin is obtained by polycondensing an alkylbenzene-aldehyde resin (A) obtained by reacting an alkylbenzene (X) with an aldehyde (Y1) in the presence of an acid catalyst and a phenol (Z) in the presence of an acid catalyst. And further reacted with an aldehyde (Y2). At the time of polycondensation of (A) and (Z), an organic solvent may be used as necessary. Examples of the organic solvent include ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, and alcohols such as methanol, ethanol, propanol and butanol, but are not particularly limited. They may be used alone or as a mixture.
【0010】一例としてm−キシレンとホルムアルデヒ
ドを酸触媒存在下で反応させて得られるm−キシレン・
ホルムアルデヒド樹脂と、レゾルシンを酸触媒存在下で
重縮合させた後、更にホルムアルデヒドを反応させて得
られるレゾルシン・m−キシレン・ホルムアルデヒド樹
脂の代表構造を一般式(5)に示すが、本発明はこの例
示した構造に限定されるものではない。As an example, m-xylene. Obtained by reacting m-xylene with formaldehyde in the presence of an acid catalyst.
A typical structure of a resorcin-m-xylene-formaldehyde resin obtained by polycondensing formaldehyde resin and resorcinol in the presence of an acid catalyst and then reacting with formaldehyde is shown in the general formula (5). It is not limited to the illustrated structure.
【化5】 (式中、kは0〜10の整数)Embedded image (Where k is an integer of 0 to 10)
【0011】本発明中、(A)と(Z)の重量比が1≦
(Z)/(A)≦20であれば所望の特性が得られ、特
に1.2≦(Z)/(A)≦7.0が好ましい。(Z)
/(A)<1では、フェノール・アルキルベンゼン・ア
ルデヒド樹脂中のフェノール類の比率が小さくなり、エ
ポキシ樹脂組成物の硬化性、成形性が著しく低下する。
(Z)/(A)>20ではフェノール・アルキルベンゼ
ン・アルデヒド樹脂中のアルキルベンゼン・アルデヒド
樹脂の比率が小さくなり、硬化物のゴム領域での低弾性
率、低吸水性、リードフレーム等の金属類及びシリコン
チップとの高接着性といったアルキルベンゼン・アルデ
ヒド樹脂の効果を十分に発揮できない。In the present invention, the weight ratio between (A) and (Z) is 1 ≦
If (Z) / (A) ≦ 20, desired characteristics can be obtained, and particularly preferably 1.2 ≦ (Z) / (A) ≦ 7.0. (Z)
When / (A) <1, the ratio of phenols in the phenol / alkylbenzene / aldehyde resin is reduced, and the curability and moldability of the epoxy resin composition are significantly reduced.
In the case of (Z) / (A)> 20, the ratio of the alkylbenzene-aldehyde resin in the phenol-alkylbenzene-aldehyde resin becomes small, and the cured product has a low elastic modulus in the rubber region, low water absorption, metals such as a lead frame, and the like. The effect of the alkylbenzene / aldehyde resin, such as high adhesiveness to the silicon chip, cannot be fully exhibited.
【0012】フェノール・アルキルベンゼン・アルデヒ
ド樹脂の水酸基当量は70〜150g/eqが好まし
く、特に90〜130g/eqが好ましい。水酸基当量
が70g/eq未満では、軟化点、溶液粘度が低く、吸
湿による常温保管性の低下や作業性の問題が懸念され
る。150g/eqを越えると、エポキシ基とフェノー
ル性水酸基との架橋点間距離が大きくなり、硬化性の低
下、或いは硬化物のガラス転移温度が低下する恐れがあ
る。The hydroxyl equivalent of the phenol / alkylbenzene / aldehyde resin is preferably from 70 to 150 g / eq, particularly preferably from 90 to 130 g / eq. If the hydroxyl group equivalent is less than 70 g / eq, the softening point and the solution viscosity are low, and there is a concern that the room temperature storage property may be deteriorated due to moisture absorption and the workability may be problematic. When it exceeds 150 g / eq, the distance between the crosslinking points between the epoxy group and the phenolic hydroxyl group becomes large, and there is a possibility that the curability may decrease or the glass transition temperature of the cured product may decrease.
【0013】フェノール・アルキルベンゼン・アルデヒ
ド樹脂の軟化点は60〜120℃が好ましく、特に75
〜95℃が好ましい。軟化点が60℃未満では、常温で
液状または半固形状であり、作業性の問題や硬化性の低
下、或いは硬化物のガラス転移温度が低下する恐れがあ
る。120℃を越えると、エポキシ樹脂との混合時に充
分溶融せず、均一分散が容易でないので硬化性及び成形
性が低下し、更に不均一な成形品となりやすい。The softening point of the phenol / alkylbenzene / aldehyde resin is preferably from 60 to 120 ° C.
~ 95 ° C is preferred. If the softening point is lower than 60 ° C., the composition is in a liquid or semi-solid state at room temperature, and there is a possibility that the workability may deteriorate, the curability may decrease, or the glass transition temperature of the cured product may decrease. If it exceeds 120 ° C., it does not melt sufficiently when mixed with the epoxy resin, and uniform dispersion is not easy, so that the curability and moldability are reduced, and a nonuniform molded article is liable to be formed.
【0014】フェノール・アルキルベンゼン・アルデヒド
樹脂の溶液粘度は20〜90μm2/sが好ましく、特
に30〜60μm2 /sが好ましい。溶液粘度が20μ
m2/s未満では、樹脂中の硬化反応に関与しない低分
子量成分が多く、硬化性の低下あるいは硬化物のガラス
転移温度が低下する恐れがある。90μm2 /sを越え
ると、溶融粘度が高く流動性が低下し、充填不良等の成
形性不良が発生する。[0014] The solution viscosity of a phenol-alkylbenzene aldehyde resin is preferably 20~90μm 2 / s, in particular 30 to 60 m 2 / s are preferred. Solution viscosity 20μ
If it is less than m 2 / s, there are many low molecular weight components which do not participate in the curing reaction in the resin, and there is a possibility that the curability may decrease or the glass transition temperature of the cured product may decrease. If it exceeds 90 μm 2 / s, the melt viscosity is high and the fluidity is reduced, and poor moldability such as poor filling occurs.
【0015】フェノール・アルキルベンゼン・アルデヒ
ド樹脂の重量平均分子量は400〜3000が好まし
く、特に600〜1500が好ましい。重量平均分子量
が400未満では、常温で液状または半固形状であり、
作業性の問題や硬化性の低下、或いは硬化物のガラス転
移温度が低下する恐れがある。3000を越えると、溶
融粘度が高く流動性が低下し、充填不良等の成形性不良
が発生する。The weight average molecular weight of the phenol / alkylbenzene / aldehyde resin is preferably from 400 to 3000, particularly preferably from 600 to 1500. If the weight average molecular weight is less than 400, it is liquid or semi-solid at room temperature,
There is a possibility that the workability is reduced, the curability is lowered, or the glass transition temperature of the cured product is lowered. If it exceeds 3,000, the melt viscosity is high and the fluidity is reduced, and poor moldability such as poor filling occurs.
【0016】これらの特性は、アルキルベンゼン類とア
ルデヒド類の配合割合、反応温度、反応時間、アルキル
ベンゼン・アルデヒド樹脂とフェノール類の配合割合、
反応温度、反応時間、更にアルデヒド類の配合割合、反
応温度、反応時間等を適宜選択することにより、調製す
ることができる。These characteristics are based on the mixing ratio of alkylbenzenes and aldehydes, the reaction temperature, the reaction time, the mixing ratio of alkylbenzene-aldehyde resins and phenols,
It can be prepared by appropriately selecting the reaction temperature, the reaction time, the mixing ratio of the aldehydes, the reaction temperature, the reaction time, and the like.
【0017】本発明において、フェノール・アルキルベ
ンゼン・アルデヒド樹脂は単独で用いても良いが、他の
1種以上のエポキシ樹脂硬化剤と併せて用いてもよい。
他のエポキシ樹脂硬化剤としては、フェノール・ホルム
アルデヒド樹脂、クレゾール・ホルムアルデヒド樹脂、
フェノール・ジシクロペンタジエン樹脂、フェノール・
アルキルベンゼン樹脂等があげられるが、特に限定され
るものではなく、添加割合は所望の要求に合わせて適宜
設定することができる。In the present invention, the phenol / alkylbenzene / aldehyde resin may be used alone, or may be used in combination with one or more other epoxy resin curing agents.
Other epoxy resin curing agents include phenol / formaldehyde resin, cresol / formaldehyde resin,
Phenol / dicyclopentadiene resin, phenol /
Examples thereof include an alkylbenzene resin and the like, but are not particularly limited, and the addition ratio can be appropriately set according to desired requirements.
【0018】なお、本発明においてフェノール・アルキ
ルベンゼン・アルデヒド樹脂の特性値の測定は下記の方
法に従って行ったものである。In the present invention, the characteristic values of the phenol / alkylbenzene / aldehyde resin are measured according to the following method.
【0019】水酸基当量は、試料をピリジンと過剰量の
無水酢酸でアセチル化し、試料に消費される無水酢酸よ
り発生する酢酸を、水酸化ナトリウム水溶液で滴定する
ことにより求めた。The hydroxyl equivalent was determined by acetylating a sample with pyridine and an excess amount of acetic anhydride, and titrating acetic acid generated from acetic anhydride consumed by the sample with an aqueous sodium hydroxide solution.
【0020】軟化点は、JIS K 7234に記載の
環球法により求めた。The softening point was determined by the ring and ball method described in JIS K 7234.
【0021】溶液粘度は25℃下、試料/エタノール=
5/5の溶液を用いて JIS Z8803に記載の方
法で求めた。Solution viscosity at 25 ° C., sample / ethanol =
It was determined by the method described in JIS Z8803 using a 5/5 solution.
【0022】重量平均分子量は東ソー製GPCカラム
(G1000HXL:1本、(G2000HXL:2
本、G3000HXL:1本)を用い、流量1.0ml
/分、溶出溶媒テトラヒドロフラン、カラム温度40℃
の分析条件でGPC測定し、標準ポリスチレンにより換
算して求めた。The weight-average molecular weight was measured using a GPC column manufactured by Tosoh (G1000HXL: 1, G2000HXL: 2).
Bottle, G3000HXL: 1 bottle), flow rate 1.0 ml
/ Min, elution solvent tetrahydrofuran, column temperature 40 ° C
GPC measurement was performed under the following analysis conditions, and the values were determined by conversion with standard polystyrene.
【0023】[0023]
【実施例】以下、本発明を実施例により説明する。本発
明はこれらの実施例によって限定されるものではなく、
実施例及び比較例に記載されている「部」及び「%」
は、すべて「重量部」及び「重量%」を示す。The present invention will be described below with reference to examples. The present invention is not limited by these examples,
"Parts" and "%" described in Examples and Comparative Examples
Represents "parts by weight" and "% by weight".
【0024】製造例1 キシレン・ホルムアルデヒド樹脂(三菱瓦斯化学(株)
製ニカノールG)30部、レゾルシン90部、メチルイ
ソブチルケトン30部、およびパラトルエンスルホン酸
0.1部の混合物を徐々に加熱し100℃で2時間反応
後、さらにホルムアルデヒド37%水溶液22部を徐々
に添加し100℃で1時間反応させた。これにメチルイ
ソブチルケトン110部を加え均一溶液としてから、イ
オン交換水100部を加え10分間攪拌後静置し、有機
層と水層に分離させた。このうち水層部を除去し、イオ
ン性不純物を系外へ取り除いた。この後蒸留工程によ
り、縮合水、未反応レゾルシン等を除去することによ
り、水酸基当量92g/eq、軟化点88℃、溶液粘度
37μm2 /s、重量平均分子量1150のフェノール
・アルキルベンゼン・アルデヒド樹脂80部を得た。Production Example 1 Xylene / formaldehyde resin (Mitsubishi Gas Chemical Co., Ltd.)
A mixture of 30 parts of Nicanol G), 90 parts of resorcinol, 30 parts of methyl isobutyl ketone, and 0.1 part of paratoluenesulfonic acid was gradually heated and reacted at 100 ° C. for 2 hours. Then, 22 parts of a 37% aqueous formaldehyde solution were gradually added. And reacted at 100 ° C. for 1 hour. To this was added 110 parts of methyl isobutyl ketone to form a homogeneous solution, 100 parts of ion-exchanged water was added, and the mixture was stirred for 10 minutes and allowed to stand to separate into an organic layer and an aqueous layer. Of these, the aqueous layer was removed, and ionic impurities were removed outside the system. In the subsequent distillation step, condensed water, unreacted resorcin, and the like are removed to obtain 80 parts of a phenol / alkylbenzene / aldehyde resin having a hydroxyl equivalent of 92 g / eq, a softening point of 88 ° C., a solution viscosity of 37 μm 2 / s, and a weight average molecular weight of 1150. I got
【0025】製造例2 キシレン・ホルムアルデヒド樹脂(三菱瓦斯化学(株)
製ニカノールG)30部、レゾルシン60部、フェノー
ル40部、およびパラトルエンスルホン酸0.1部の混
合物を実施例1と同様に反応して、水酸基当量112g
/eq、軟化点86℃、溶液粘度33μm2 /s、重量
平均分子量980のフェノール・アルキルベンゼン・ア
ルデヒド樹脂94部を得た。Production Example 2 Xylene / formaldehyde resin (Mitsubishi Gas Chemical Co., Ltd.)
A mixture of 30 parts of Nicanol G), 60 parts of resorcin, 40 parts of phenol, and 0.1 part of paratoluenesulfonic acid was reacted in the same manner as in Example 1 to obtain a hydroxyl equivalent of 112 g.
/ Eq, a softening point of 86 ° C., a solution viscosity of 33 μm 2 / s, and 94 parts of a phenol-alkylbenzene-aldehyde resin having a weight average molecular weight of 980 were obtained.
【0026】製造例3 キシレン・ホルムアルデヒド樹脂(三菱瓦斯化学(株)
製ニカノールG)35部、カテコール20部、オルソク
レゾール80部、およびパラトルエンスルホン酸0.1
部の混合物を実施例1と同様に反応して、水酸基当量1
30g/eq、軟化点85℃、溶液粘度42μm2 /
s、重量平均分子量1270のフェノール・アルキルベ
ンゼン・アルデヒド樹脂110部を得た。Production Example 3 Xylene / formaldehyde resin (Mitsubishi Gas Chemical Co., Ltd.)
Nicanol G) 35 parts, catechol 20 parts, orthocresol 80 parts, and paratoluenesulfonic acid 0.1
Part of the mixture was reacted in the same manner as in Example 1 to give a hydroxyl equivalent of 1
30 g / eq, softening point 85 ° C., solution viscosity 42 μm 2 /
As a result, 110 parts of a phenol / alkylbenzene / aldehyde resin having a weight average molecular weight of 1270 was obtained.
【0027】比較製造例1 キシレン・ホルムアルデヒド樹脂(三菱瓦斯化学(株)
製ニカノールG)100部、レゾルシン10部、メチル
イソブチルケトン20部、およびパラトルエンスルホン
酸0.1部の混合物を実施例1と同様に反応して、水酸
基当量160g/eq、軟化点127℃、溶液粘度96
μm2 /s、重量平均分子量3150のフェノール・ア
ルキルベンゼン・アルデヒド樹脂99部を得た。Comparative Production Example 1 Xylene / formaldehyde resin (Mitsubishi Gas Chemical Co., Ltd.)
A mixture of 100 parts of Nicanol G), 10 parts of resorcinol, 20 parts of methyl isobutyl ketone, and 0.1 part of paratoluenesulfonic acid was reacted in the same manner as in Example 1 to obtain a hydroxyl equivalent of 160 g / eq, a softening point of 127 ° C, Solution viscosity 96
99 parts of a phenol / alkylbenzene / aldehyde resin having a μm 2 / s and a weight average molecular weight of 3150 were obtained.
【0028】比較製造例2 キシレン・ホルムアルデヒド樹脂(三菱瓦斯化学(株)
製ニカノールG)3部、レゾルシン70部、ハイドロキ
ノン30部、メチルイソブチルケトン30部、およびパ
ラトルエンスルホン酸0.1部の混合物を実施例1と同
様に反応して、水酸基当量68g/eq、軟化点59
℃、溶液粘度24μm2 /s、重量平均分子量380の
フェノール・アルキルベンゼン・アルデヒド樹脂55部
を得た。Comparative Production Example 2 Xylene / formaldehyde resin (Mitsubishi Gas Chemical Co., Ltd.)
A mixture of 3 parts of Nicanol G), 70 parts of resorcinol, 30 parts of hydroquinone, 30 parts of methyl isobutyl ketone, and 0.1 part of paratoluenesulfonic acid was reacted in the same manner as in Example 1 to obtain a hydroxyl equivalent of 68 g / eq, softening. Point 59
° C., a solution viscosity 24μm 2 / s, to obtain a 55 parts phenol alkylbenzene aldehyde resin having a weight average molecular weight 380.
【0029】比較製造例3 フェノール188部、37%ホルマリン121部、およ
び35%塩酸0.5部の混合物を100℃で2時間反応
後、減圧下で内温が170℃に達するまで蒸留して水と
未反応フェノールを除去し、水酸基当量104g/e
q、軟化点110℃、溶液粘度88μm2 /s、重量平
均分子量2910のフェノール樹脂190部を得た。Comparative Production Example 3 A mixture of 188 parts of phenol, 121 parts of 37% formalin and 0.5 part of 35% hydrochloric acid was reacted at 100 ° C. for 2 hours, and then distilled under reduced pressure until the internal temperature reached 170 ° C. Removal of water and unreacted phenol, hydroxyl equivalent 104g / e
q, 190 parts of a phenol resin having a softening point of 110 ° C., a solution viscosity of 88 μm 2 / s and a weight average molecular weight of 2910 were obtained.
【0030】実施例1〜5及び比較例1〜4 製造例1〜3と比較製造例1〜2で得られたフェノール
類・アルキルベンゼン・アルデヒド樹脂、比較製造例3
で得られたフェノール樹脂、あるいは、フェノール・P
−キシレングリコールジメチルエーテル重縮合物(三井
東圧(株)製XL−225LL)と、オルソクレゾール
型エポキシ樹脂(日本化薬製EOCN−1020−6
5)、2−メチルイミダゾール、溶融シリカおよびステ
アリン酸を表1の配合でロール混練し、100kg/c
m2 、175℃、10分の条件でプレス成形し、さらに
180℃、6時間、後硬化して硬化成形物を得た。この
成形物のガラス転位温度、曲げ強度、曲げ弾性率および
吸水率を測定した結果を表1に示す。Examples 1 to 5 and Comparative Examples 1 to 4 Phenols, alkylbenzenes and aldehyde resins obtained in Production Examples 1 to 3 and Comparative Production Examples 1 and 2, Comparative Production Example 3
Phenolic resin obtained from
-Xylene glycol dimethyl ether polycondensate (XL-225LL, manufactured by Mitsui Toatsu Co., Ltd.) and orthocresol type epoxy resin (EOCN-1020-6, manufactured by Nippon Kayaku)
5) Roll-kneading 2-methylimidazole, fused silica and stearic acid with the composition shown in Table 1 and adding 100 kg / c
Press molding was performed at m 2 at 175 ° C. for 10 minutes, and post-curing was further performed at 180 ° C. for 6 hours to obtain a cured molded product. Table 1 shows the results of measuring the glass transition temperature, flexural strength, flexural modulus and water absorption of this molded product.
【0031】[0031]
【表1】 [Table 1]
【0032】[0032]
【発明の効果】表1からも明らかなように、本発明のエ
ポキシ樹脂硬化剤を用いたエポキシ樹脂成形物は、耐熱
性に優れ、かつ曲げ強度が低下することなく曲げ弾性率
および吸水率が大きく低下しており、低応力で耐湿性に
すぐれたものである。また本発明のエポキシ樹脂硬化剤
は高性能な電子部品のエポキシ樹脂封止材料、エポキシ
樹脂粉体塗料、およびエポキシ樹脂積層板用などに好適
であり、電子部品の性能向上に大きく寄与するものと期
待される。As is clear from Table 1, the epoxy resin molded product using the epoxy resin curing agent of the present invention has excellent heat resistance and has a low flexural modulus and a low water absorption without a decrease in flexural strength. It is greatly reduced and has low stress and excellent moisture resistance. Further, the epoxy resin curing agent of the present invention is suitable for epoxy resin encapsulating materials for high-performance electronic components, epoxy resin powder coatings, epoxy resin laminates, and the like, and greatly contributes to improving the performance of electronic components. Be expected.
Claims (3)
ン類(X)と一般式(2)で示されるアルデヒド類(Y
1)を酸触媒の存在下で反応させたアルキルベンゼン・
アルデヒド樹脂(A)と、一般式(3)、又は(3)及
び(4)で示されるフェノール類(Z)を、重量比が1
≦(Z)/(A)≦20で酸触媒の存在下重縮合させた
後、更に一般式(2)で示されるアルデヒド類(Y2)
を反応させてなるフェノール・アルキルベンゼン・アル
デヒド樹脂を主成分とするエポキシ樹脂硬化剤。 【化1】 (式中、R1 は、炭素数1〜8のアルキル基を表し、そ
れらは互いに同一であっても異なっていてもよい。mは
1〜4の整数。) R2−CHO (2) (式中、R2 は、水素又は炭素数1〜7の1価の炭化水
素基を表す。Y1とY2は互いに同一であっても異なっ
ていてもよい。) 【化3】 【化4】 (式中、R3 は、水素、炭素数1〜8のアルキル基、ア
ルケニル基、ハロゲンの中から選択される原子又は基を
表し、それらは互いに同一であっても異なっていてもよ
い。nは1〜3の整数。)1. An alkylbenzene (X) represented by the general formula (1) and an aldehyde (Y) represented by the general formula (2)
Alkylbenzene obtained by reacting 1) in the presence of an acid catalyst;
The weight ratio of the aldehyde resin (A) and the phenols (Z) represented by the general formula (3) or (3) and (4) is 1
After polycondensation in the presence of an acid catalyst at ≦ (Z) / (A) ≦ 20, the aldehyde (Y2) further represented by the general formula (2)
An epoxy resin curing agent containing phenol, alkylbenzene and aldehyde resins as the main component. Embedded image (In the formula, R 1 represents an alkyl group having 1 to 8 carbon atoms, which may be the same or different, and m is an integer of 1 to 4.) R 2 —CHO (2) ( In the formula, R 2 represents hydrogen or a monovalent hydrocarbon group having 1 to 7 carbon atoms.Y 1 and Y 2 may be the same or different from each other.) Embedded image (In the formula, R 3 represents an atom or a group selected from hydrogen, an alkyl group having 1 to 8 carbon atoms, an alkenyl group, and a halogen, which may be the same or different. Is an integer of 1 to 3.)
ヒド樹脂の水酸基当量が70〜150g/eq、軟化点
が60〜120℃、溶液粘度が20〜90μm2 /s、
重量平均分子量が400〜3000である請求項1記載
のエポキシ樹脂硬化剤。2. A phenol / alkylbenzene / aldehyde resin having a hydroxyl equivalent of 70 to 150 g / eq, a softening point of 60 to 120 ° C., a solution viscosity of 20 to 90 μm 2 / s,
The epoxy resin curing agent according to claim 1, having a weight average molecular weight of 400 to 3000.
レンであり、アルデヒド類(Y1、Y2)が共にホルム
アルデヒドであり、フェノール類(Z)がレゾルシンで
ある請求項1又は2記載のエポキシ樹脂硬化剤。3. The epoxy resin curing according to claim 1, wherein the alkylbenzenes (X) are m-xylene, the aldehydes (Y1, Y2) are both formaldehyde, and the phenols (Z) are resorcinol. Agent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8981497A JPH10279669A (en) | 1997-04-08 | 1997-04-08 | Epoxy resin hardener |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8981497A JPH10279669A (en) | 1997-04-08 | 1997-04-08 | Epoxy resin hardener |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10279669A true JPH10279669A (en) | 1998-10-20 |
Family
ID=13981216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8981497A Pending JPH10279669A (en) | 1997-04-08 | 1997-04-08 | Epoxy resin hardener |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10279669A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006312731A (en) * | 2005-04-05 | 2006-11-16 | Hodogaya Chem Co Ltd | Method for producing ketone-modified resorcin formalin resin |
JP2006312733A (en) * | 2005-04-05 | 2006-11-16 | Hodogaya Chem Co Ltd | Resorcin-methyl ethyl ketone-formalin resin |
WO2008047613A1 (en) * | 2006-10-11 | 2008-04-24 | Nipponkayaku Kabushikikaisha | Epoxy resin, method for producing the epoxy resin, epoxy resin composition using the epoxy resin, and cured product of the epoxy resin composition |
WO2010140331A1 (en) * | 2009-06-03 | 2010-12-09 | 住友ベークライト株式会社 | Resin composition for semiconductor encapsulation, and semiconductor device |
-
1997
- 1997-04-08 JP JP8981497A patent/JPH10279669A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006312731A (en) * | 2005-04-05 | 2006-11-16 | Hodogaya Chem Co Ltd | Method for producing ketone-modified resorcin formalin resin |
JP2006312733A (en) * | 2005-04-05 | 2006-11-16 | Hodogaya Chem Co Ltd | Resorcin-methyl ethyl ketone-formalin resin |
WO2008047613A1 (en) * | 2006-10-11 | 2008-04-24 | Nipponkayaku Kabushikikaisha | Epoxy resin, method for producing the epoxy resin, epoxy resin composition using the epoxy resin, and cured product of the epoxy resin composition |
TWI414536B (en) * | 2006-10-11 | 2013-11-11 | Nippon Kayaku Kk | Epoxy resin, fabricating method thereof, epoxy resin composition by using the epoxy resin and cured product thereof |
WO2010140331A1 (en) * | 2009-06-03 | 2010-12-09 | 住友ベークライト株式会社 | Resin composition for semiconductor encapsulation, and semiconductor device |
KR20120026573A (en) * | 2009-06-03 | 2012-03-19 | 스미또모 베이크라이트 가부시키가이샤 | Resin composition for semiconductor encapsulation, and semiconductor device |
CN102449020A (en) * | 2009-06-03 | 2012-05-09 | 住友电木株式会社 | Resin composition for semiconductor encapsulation, and semiconductor device |
US8883883B2 (en) | 2009-06-03 | 2014-11-11 | Sumitomo Bakelite Co., Ltd. | Resin composition for encapsulating semiconductor and semiconductor device |
JP5708486B2 (en) * | 2009-06-03 | 2015-04-30 | 住友ベークライト株式会社 | Semiconductor sealing resin composition and semiconductor device |
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