JPH10224015A - Method and apparatus for manufacturing circuit forming substrate - Google Patents
Method and apparatus for manufacturing circuit forming substrateInfo
- Publication number
- JPH10224015A JPH10224015A JP2648697A JP2648697A JPH10224015A JP H10224015 A JPH10224015 A JP H10224015A JP 2648697 A JP2648697 A JP 2648697A JP 2648697 A JP2648697 A JP 2648697A JP H10224015 A JPH10224015 A JP H10224015A
- Authority
- JP
- Japan
- Prior art keywords
- substrate material
- substrate
- hole
- circuit
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】
【課題】 小型電子機器等に用いられる回路形成基板の
製造方法において、高品質の穴加工をレーザー加工の高
速性を失うことなく実現し、低コストで信頼性の高い回
路形成基板の製造方法を提供することを目的とする。
【解決手段】 レーザー9を基板材料6上に照射して、
貫通穴10を形成する際に穴壁面に硬く脆い変質部11
や加工粉12が基板材料6の表面に付着するのを高周波
振動板13を基板材料6に近づけて振動させ、基板材料
6を振動させて変質部11および加工粉12の除去加工
を行うことにより、良好な穴形状を持つ基板材料6が得
られる。
PROBLEM TO BE SOLVED: To provide a high-quality hole processing without losing the speed of laser processing in a method of manufacturing a circuit forming substrate used for a small electronic device, etc., and to realize a low-cost and highly reliable circuit. An object of the present invention is to provide a method for manufacturing a formed substrate. SOLUTION: A laser 9 is irradiated on a substrate material 6,
Hard and brittle altered portion 11 on the hole wall surface when forming through hole 10
The high-frequency vibrating plate 13 is caused to adhere to the surface of the substrate material 6 by vibrating the high-frequency vibrating plate 13 close to the substrate material 6, and the substrate material 6 is vibrated to remove the deteriorated portion 11 and the processing powder 12. Thus, a substrate material 6 having a good hole shape can be obtained.
Description
【0001】[0001]
【発明の属する技術分野】本発明は回路形成基板の製造
方法およびその製造装置に関するものである。[0001] 1. Field of the Invention [0002] The present invention relates to a method for manufacturing a circuit board and an apparatus for manufacturing the same.
【0002】[0002]
【従来の技術】近年の電子機器の小型化・高密度化に伴
って、電子部品を搭載する回路形成基板も従来の片面基
板から両面、多層基板の採用が進み、より多くの回路を
基板上に集積可能な高密度回路形成基板の開発が行われ
ている。2. Description of the Related Art With the recent miniaturization and high-density of electronic equipment, circuit-forming boards on which electronic components are mounted have been increasingly adopted from conventional single-sided boards to double-sided, multi-layer boards. Development of a high-density circuit formation substrate that can be integrated in a semiconductor device is underway.
【0003】高密度回路形成基板においては、従来広く
用いられてきたドリル加工による基板への穴(スルーホ
ール)加工に代わって、より高速で微細な加工が可能な
レーザー加工法の採用が検討されている(たとえば、Y.
Yamanaka et al., ExcimerLaser Processing In The M
icroelectronics Fields等)。また、レーザーによる微
細な穴加工と導電性ペースト等の接続手段を用いて層間
接続を行う回路形成基板も提案されている(特開平6−
268345号公報等)。In the case of high-density circuit-forming substrates, the use of a laser processing method capable of higher-speed and finer processing has been studied instead of drilling (through-hole) processing on a substrate by drilling, which has been widely used in the past. (For example, Y.
Yamanaka et al., ExcimerLaser Processing In The M
icroelectronics Fields etc.). In addition, a circuit forming substrate has been proposed in which interlayer connection is performed by using fine hole processing by a laser and a connection means such as a conductive paste (Japanese Patent Application Laid-Open No. Hei 6-1994).
No. 268345).
【0004】しかし、レーザーによる穴加工ではレーザ
ーにより加工対象を局所的に加熱し昇華させて穴を形成
するため図5(a)に示すように貫通穴2の内部に基板
材料1の変質部3が残る、さらに加熱された基板材料1
が加工粉4となって貫通穴2の内部および基板材料1の
表面に付着する。また、基板材料1として一般に用いら
れるガラス繊維織布と熱硬化性樹脂あるいは芳香族ポリ
アミド繊維(以後アラミドと記載)不織布と熱硬化性樹
脂に代表されるような複合材料に対してレーザーを用い
た場合には複合された各々の材料によって加工レートが
異なるため、図5(b)に示すように貫通穴2の内壁に
は著しい凹凸が生じる。さらに、基板材料1の中にアラ
ミドなどの繊維5を完全に均一に分布させることは実際
には困難で、等しいエネルギー量のレーザーパルスによ
って加工を行った場合でも貫通穴2のサイズは局所的な
繊維密度の影響を受ける。However, in the hole drilling by laser, the object to be processed is locally heated and sublimated by the laser to form a hole, and as shown in FIG. Remains, further heated substrate material 1
Becomes the processing powder 4 and adheres to the inside of the through hole 2 and the surface of the substrate material 1. Further, a laser was used for a composite material represented by a glass fiber woven fabric and a thermosetting resin or an aromatic polyamide fiber (hereinafter referred to as aramid) nonwoven fabric and a thermosetting resin which are generally used as the substrate material 1. In this case, since the processing rate is different depending on each of the combined materials, remarkable unevenness is generated on the inner wall of the through hole 2 as shown in FIG. Further, it is actually difficult to completely and uniformly distribute the fibers 5 such as aramid in the substrate material 1, and even if the processing is performed by a laser pulse having an equal energy amount, the size of the through hole 2 is locally limited. Affected by fiber density.
【0005】その結果、加工後の貫通穴2の直径はレー
ザーによる加工エネルギーを最適化した場合について
も、目的の値に対してかなりばらつきをもつものとな
る。As a result, the diameter of the through hole 2 after processing has a considerable variation from the target value even when the processing energy by the laser is optimized.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、基板材
料1に穴加工を行う目的は前述したように、基板の表裏
あるいは内層に形成された回路を相互に接続するためで
あり、穴加工を行った後にめっき、導電ペーストの充填
などの接続手段の形成が行われる。However, as described above, the purpose of forming a hole in the substrate material 1 is to interconnect circuits formed on the front and back surfaces or the inner layer of the substrate. Thereafter, connection means such as plating and filling of a conductive paste are formed.
【0007】高密度回路形成基板では穴および接続手段
のサイズは非常に微小なものであるため、前述したよう
な貫通穴2の内部の変質部3、基板材料1に付着した加
工粉4、貫通穴2の内壁の凹凸等の穴加工品質は接続手
段の信頼性に重大な影響を与える。In the high-density circuit forming substrate, the size of the hole and the connecting means is very small, so that the altered portion 3 inside the through hole 2, the processing powder 4 attached to the substrate material 1, The hole processing quality such as the unevenness of the inner wall of the hole 2 has a significant effect on the reliability of the connection means.
【0008】また、導電ペーストの充填等を行う際に
は、充填方式、導電ペーストの粘度、基板材料の厚み等
と共に貫通穴の直径は重要な管理項目であり、設計値よ
りも直径が小さい場合には充填が不十分になってしまう
可能性がある。When filling the conductive paste, the diameter of the through hole is an important management item together with the filling method, the viscosity of the conductive paste, the thickness of the substrate material, and the like. May be insufficiently filled.
【0009】一方、導電ペーストの充填不十分を防止す
るためにレーザーのエネルギーを大きく設定して設計値
よりも直径が大きくなった場合には、隣接する回路との
絶縁不良等の問題が懸念される。On the other hand, if the laser energy is set to a large value to prevent insufficient filling of the conductive paste and the diameter becomes larger than a designed value, there is a concern that problems such as poor insulation with an adjacent circuit may occur. You.
【0010】このように、高密度回路形成基板における
基板材料への穴加工は設計値に対する穴直径ばらつきの
許容範囲は非常に狭いものである。As described above, when a hole is formed in a substrate material in a high-density circuit forming substrate, an allowable range of a variation in a hole diameter with respect to a design value is very narrow.
【0011】穴加工品質を高めるためには、低い加工エ
ネルギーのレーザーを多数回照射する方法や、本来のレ
ーザーパルスの後にクリーニング用の低エネルギーレー
ザーパルスを照射する方法があるが、加工スピード(単
位時間当たりに加工できる穴数)の点で満足できるもの
ではない。In order to improve the hole processing quality, there are a method of irradiating a laser with a low processing energy many times and a method of irradiating a low energy laser pulse for cleaning after an original laser pulse. The number of holes that can be machined per hour) is not satisfactory.
【0012】本発明は高品質の穴加工をレーザー加工の
高速性を失うことなく実現し、低コストで信頼性の高い
回路形成基板の製造方法およびその製造装置を提供する
ことを目的とする。SUMMARY OF THE INVENTION It is an object of the present invention to provide a low-cost and highly-reliable method for manufacturing a circuit-forming substrate, which realizes high-quality drilling without losing the speed of laser processing, and an apparatus for manufacturing the same.
【0013】[0013]
【課題を解決するための手段】上記課題を解決するため
に本発明の回路形成基板の製造方法は、単一あるいは複
数の材質より構成される基板材料に貫通あるいは非貫通
の穴加工を行う穴形成工程と、前記穴形成工程にて形成
された貫通あるいは非貫通の穴に回路形成基板の表面に
形成される回路または内部に形成される回路を相互に接
続する接続手段を形成する工程を含み、前記穴形成工程
がレーザーを前記基板材料に照射し第1段階の貫通ある
いは非貫通の穴形状を形成する工程と、前記工程により
前記基板材料表面および前記第1段階の貫通あるいは非
貫通の穴形状内壁に形成された変質部や前記工程中ある
いは工程後に基板材料より遊離した後に前記基板材料に
再付着した粉状ないし塊状の変質物質の少なくとも一方
あるいは両方を前記基板材料を振動させることにより前
記基板材料より選択的に除去し、所望の貫通あるいは非
貫通の穴形状を得るものである。In order to solve the above-mentioned problems, a method of manufacturing a circuit forming substrate according to the present invention is directed to a method of forming a through hole or a non-through hole in a substrate material composed of a single material or a plurality of materials. Forming step, and a step of forming connecting means for mutually connecting a circuit formed on the surface of the circuit forming substrate or a circuit formed therein to the through or non-through hole formed in the hole forming step. A step of irradiating the substrate material with a laser to form a first-stage penetrating or non-penetrating hole shape in the hole forming step; At least one or both of the altered part formed on the inner wall of the shape and the powdery or massive alteration substance which is released from the substrate material during or after the process and is reattached to the substrate material is removed. Selectively removing from the substrate material by vibrating the substrate material, thereby obtaining a desired penetration or non-penetration of hole shape.
【0014】この方法によれば、高品質の穴加工をレー
ザー加工の高速性を失うことなく実現し、低コストで信
頼性の高い回路形成基板を提供できるものである。According to this method, high-quality drilling can be realized without losing the speed of laser processing, and a low-cost and highly reliable circuit board can be provided.
【0015】[0015]
【発明の実施の形態】本発明の請求項1に記載の発明
は、単一あるいは複数の材質より構成される基板材料に
貫通あるいは非貫通の穴加工を行う穴形成工程と、前記
穴形成工程にて形成された貫通あるいは非貫通の穴に回
路形成基板の表面に形成される回路または内部に形成さ
れる回路を相互に接続する接続手段を形成する工程を含
み、前記穴形成工程がレーザーを前記基板材料に照射し
第1段階の貫通あるいは非貫通の穴形状を形成する工程
と、前記工程により前記基板材料表面および前記第1段
階の貫通あるいは非貫通の穴形状内壁に形成された変質
部や前記工程中あるいは工程後に基板材料より遊離した
後に前記基板材料に再付着した粉状ないし塊状の変質物
質の少なくとも一方あるいは両方を前記基板材料を振動
させることにより前記基板材料より選択的に除去し、所
望の貫通あるいは非貫通の穴形状を得る工程からなるこ
とを特徴とする回路形成基板の製造方法としたものであ
り、レーザーにより形成される第1段階の穴形状は穴形
状内壁に形成された変質部および基板材料に再付着した
加工粉等を含んでいても、その後に除去が行われるとい
う作用を有する。DETAILED DESCRIPTION OF THE INVENTION According to the first aspect of the present invention, there is provided a hole forming step of forming a penetrating or non-through hole in a substrate material composed of a single or a plurality of materials, and the hole forming step. Forming a connection means for interconnecting a circuit formed on the surface of the circuit-forming substrate or a circuit formed therein in the through-hole or non-through-hole formed in the step, wherein the hole forming step includes using a laser. Irradiating the substrate material to form a first-stage penetrating or non-penetrating hole shape; and an altered portion formed in the surface of the substrate material and the first-stage penetrating or non-penetrating hole shape by the process. By vibrating the substrate material by vibrating the substrate material at least one or both of the powdery or lump-like alteration substance which has re-adhered to the substrate material after being released from the substrate material during or after the process. A method for manufacturing a circuit forming substrate, comprising a step of selectively removing from a substrate material to obtain a desired penetrating or non-penetrating hole shape. Even if the shape includes the altered portion formed on the inner wall of the hole and the processing powder re-adhered to the substrate material, it has the effect of being removed thereafter.
【0016】請求項2に記載の発明は、基板材料を振動
させることによって穴内部から除去される変質部あるい
は変質物質の総和が所望の穴形状に対する体積比で平均
1%以上であることを特徴とするものであり、除去によ
って取り除くことができる物質量が十分であるためレー
ザーの加工エネルギーを必要最小限にすることができる
という作用を有する。According to a second aspect of the present invention, the total amount of altered portions or altered substances removed from the inside of the hole by vibrating the substrate material is 1% or more in average by volume ratio to the desired hole shape. Since the amount of the substance that can be removed by the removal is sufficient, the laser processing energy can be minimized.
【0017】請求項3に記載の発明は、基板材料がシー
ト状補強材に熱硬化性樹脂を含浸させたシート状複合材
料からなるものであり、複合材料に対してレーザーを用
いた場合に生じる穴内壁の著しい凹凸を次の除去工程で
取り除くことができる作用を有する。According to a third aspect of the present invention, the substrate material is made of a sheet-like composite material in which a sheet-like reinforcing material is impregnated with a thermosetting resin, and is generated when a laser is used for the composite material. It has the effect of removing significant irregularities on the inner wall of the hole in the next removal step.
【0018】請求項4に記載の発明は、シート状複合材
料の両面あるいは片面に高分子フィルムを接着して基板
材料としたものであり、レーザーの加工エネルギーが必
要最小限にとどめることができるために、穴周辺部にお
ける高分子フィルムの熱収縮が低減できる作用を有す
る。According to a fourth aspect of the present invention, a polymer material is bonded to both sides or one side of a sheet-like composite material to form a substrate material, and laser processing energy can be minimized. In addition, it has the effect of reducing the thermal shrinkage of the polymer film in the periphery of the hole.
【0019】請求項5に記載の発明は、熱硬化性樹脂が
未硬化分を含むいわゆるBステージであるものであり、
補強材よりも著しく加工レートの大きなBステージ樹脂
のレーザー加工時のダメージを低減できる作用を有す
る。According to a fifth aspect of the present invention, the thermosetting resin is a so-called B stage including an uncured component,
This has the effect of reducing damage during laser processing of a B-stage resin having a significantly higher processing rate than a reinforcing material.
【0020】請求項6に記載の発明は、補強材がガラス
繊維織布あるいは不織布であるものであり、熱硬化性樹
脂とガラス繊維の加工レートの差による穴内壁の凹凸を
低減できる作用を有する。According to a sixth aspect of the present invention, the reinforcing material is a glass fiber woven fabric or a non-woven fabric, and has an effect of reducing unevenness of the inner wall of the hole due to a difference in processing rate between the thermosetting resin and the glass fiber. .
【0021】請求項7に記載の発明は、補強材がアラミ
ド繊維織布あるいは不織布であるものであり、熱硬化性
樹脂とアラミド繊維の加工レートの差による穴内壁の凹
凸を低減できる作用を有する。According to a seventh aspect of the present invention, the reinforcing material is a woven or non-woven aramid fiber, and has an effect of reducing unevenness of the inner wall of the hole due to a difference in processing rate between the thermosetting resin and the aramid fiber. .
【0022】請求項8に記載の発明は、基板材料に直接
高周波振動子を接触させることにより基板材料を加振す
るものであり、振動の伝達効率が良いという作用を有す
る。The eighth aspect of the present invention vibrates the substrate material by directly contacting the high-frequency vibrator with the substrate material, and has an effect that vibration transmission efficiency is high.
【0023】請求項9に記載の発明は、高周波振動子あ
るいは振動板から音波を基板材料に放射することにより
基板材料を加振するものであり、基板材料に伝達される
振動エネルギーを均一化しやすい作用を有する。According to a ninth aspect of the present invention, the substrate material is vibrated by radiating sound waves from the high-frequency vibrator or the diaphragm to the substrate material, and the vibration energy transmitted to the substrate material is easily made uniform. Has an action.
【0024】請求項10に記載の発明は、液体中に高周
波振動子あるいは振動板および基板材料を浸漬するもの
であり、気体中より振動エネルギーの伝搬効率が良く、
除去加工にて基板材料から除去した物質を液体とともに
回収することが容易であるという作用を有する。According to a tenth aspect of the present invention, a high-frequency vibrator or a vibrating plate and a substrate material are immersed in a liquid.
This has the effect that the substance removed from the substrate material by the removal processing can be easily collected together with the liquid.
【0025】請求項11に記載の発明は、液体が水ある
いは精製された純水であるものであり、工程のランニン
グコストが安価で蒸発した液体の回収装置が不要である
という作用を有する。According to the eleventh aspect of the present invention, the liquid is water or purified pure water, and has an effect that the running cost of the process is low and a device for collecting the evaporated liquid is unnecessary.
【0026】請求項12に記載の発明は、液体が有機溶
剤であるものであり、除去加工後の基板材料の乾燥が容
易にできる作用を有する。According to a twelfth aspect of the present invention, the liquid is an organic solvent, and has an effect of easily drying the substrate material after the removal processing.
【0027】請求項13に記載の発明は、接続手段を形
成する工程中に基板材料に形成された穴に導電粒子を含
有するペーストを充填するものであり、穴内壁が凹凸の
少ない形状で加工粉の付着も無いことから、ペーストの
穴への充填性が良いという作用を有する。According to a thirteenth aspect of the present invention, the hole formed in the substrate material is filled with a paste containing conductive particles during the step of forming the connecting means, and the inner wall of the hole is processed with a shape having little unevenness. Since there is no adhesion of powder, it has an effect that the filling property of the paste into the hole is good.
【0028】請求項14に記載の発明は、接続手段を形
成する工程中にめっきを含むものであり、穴内壁が凹凸
の少ない形状で加工粉の付着も無いことからめっきの付
きまわり性が良いという作用を有する。The invention according to claim 14 includes plating during the step of forming the connection means, and the hole inner wall has a shape with little unevenness and there is no adhesion of processing powder, so that the throwing power of the plating is good. It has the action of:
【0029】請求項15に記載の発明は、レーザー発振
装置と、前記レーザー発振装置より導出されるレーザー
を基板材料上の所望の位置に集光する光学系と、基板材
料を固定し前記光学系と連携して動作するステージを備
えた第1の加工エリアと、基板材料を加振する高周波振
動部材と、前記高周波振動部材に高周波を供給する発振
器と、基板材料より遊離する加工くずを回収する手段を
備えた第2の加工エリアからなる回路形成基板の製造装
置としたものであり、レーザーにより形成される穴形状
は穴形状内壁に形成された変質部および基板材料に再付
着した加工粉等を含んでいても、その後に除去が行われ
るという作用を有する。According to a fifteenth aspect of the present invention, there is provided a laser oscillating device, an optical system for condensing a laser derived from the laser oscillating device at a desired position on a substrate material, and A first processing area having a stage that operates in conjunction with the above, a high-frequency vibrating member for vibrating the substrate material, an oscillator for supplying high frequency to the high-frequency vibrating member, and collecting processing debris released from the substrate material Means for manufacturing a circuit-formed substrate comprising a second processing area provided with a means, wherein a hole shape formed by a laser is a deteriorated portion formed on an inner wall of the hole shape, a processing powder reattached to a substrate material, or the like. Has the effect of being subsequently removed.
【0030】請求項16に記載の発明は、第1の加工エ
リアと第2の加工エリアを、それぞれ独立したチャンバ
とし加工対象物の搬出入のためのシャッターを前記チャ
ンバに設けたものであり、穴加工時に基板材料より発生
する加工くずが製造装置の外部に拡散することが無いと
いう作用を有する。According to a sixteenth aspect of the present invention, the first processing area and the second processing area are provided as independent chambers, and a shutter for carrying in and out the processing object is provided in the chamber. This has the effect that processing waste generated from the substrate material during drilling does not diffuse outside the manufacturing apparatus.
【0031】請求項17に記載の発明は、第1の加工エ
リアへの加工材料搬入部と第1の加工エリアと第2の加
工エリアの接続部と第2の加工エリアからの加工材料搬
出部のすべてあるいは1箇所以上にチャンバを設けたも
のであり、穴加工時に基板材料より発生する加工くずが
製造装置の外部に拡散することが無いという作用を完全
なものとすることができる。According to a seventeenth aspect of the present invention, a processing material carry-in portion to the first processing area, a connection portion between the first processing area and the second processing area, and a processing material take-out portion from the second processing area. And a chamber is provided at one or more locations, and the function that processing waste generated from the substrate material during drilling does not diffuse outside the manufacturing apparatus can be completed.
【0032】請求項18に記載の発明は、液体を滞留さ
せるチャンバを第2の加工エリアとして用い前記チャン
バに高周波振動部材を取り付けたものであり、液体とと
もに加工くずを回収しやすいという作用を有する。The invention according to claim 18 uses a chamber in which a liquid is retained as a second processing area, and a high-frequency vibration member is attached to the chamber, and has an effect of easily collecting processing waste together with the liquid. .
【0033】請求項19に記載の発明は、振動の周波数
が20キロヘルツ以上の超音波領域であるものであり、
可聴周波数よりも高い周波数を用いるため除去加工に寄
与するエネルギーが大きいという作用を有する。[0033] According to a nineteenth aspect of the present invention, the vibration frequency is in the ultrasonic range of 20 kHz or more.
Since a frequency higher than the audible frequency is used, there is an effect that a large amount of energy contributes to the removal processing.
【0034】以下、本発明の実施の形態について、図1
から図4を用いて説明する。 (実施の形態1)図1は本発明の第1の実施の形態にお
ける回路形成基板の製造方法を示す工程断面図である。
基板材料6は図1(a)に示すように熱硬化性エポキシ
樹脂7とアラミド繊維8の複合材料となっている。熱硬
化性エポキシ樹脂7は完全に硬化したものではなく、未
硬化分を含むいわゆるBステージ状態であり、基板材料
6は通常プリプレグと呼ばれるものである。Hereinafter, an embodiment of the present invention will be described with reference to FIG.
This will be described with reference to FIG. (Embodiment 1) FIG. 1 is a process sectional view showing a method of manufacturing a circuit forming substrate according to a first embodiment of the present invention.
The substrate material 6 is a composite material of a thermosetting epoxy resin 7 and an aramid fiber 8 as shown in FIG. The thermosetting epoxy resin 7 is not completely cured, but is in a so-called B-stage state including an uncured portion, and the substrate material 6 is usually called a prepreg.
【0035】次に図1(b)に示すようにレーザー9を
基板材料6上に照射して貫通穴10を形成する。その際
に基板材料6中の熱硬化性エポキシ樹脂7およびアラミ
ド繊維8は熱により昇華して周囲に飛散する。しかし、
穴壁面には昇華しきれなかった熱硬化性エポキシ樹脂7
あるいはアラミド繊維8が硬く脆い変質部11として残
る。また、熱硬化性エポキシ樹脂7と比較してアラミド
繊維8は耐熱性が高くレーザーによる加工レートが低い
ため、昇華しきれずに残りやすく穴内壁は図中に示すよ
うな凹凸形状となる。一方、周囲に飛散した熱硬化性エ
ポキシ樹脂7あるいはアラミド繊維8の一部は加工粉1
2となって基板材料6の表面あるいは貫通穴10の内部
に付着する。Next, as shown in FIG. 1B, a laser 9 is irradiated onto the substrate material 6 to form a through hole 10. At that time, the thermosetting epoxy resin 7 and the aramid fiber 8 in the substrate material 6 are sublimated by heat and scattered around. But,
Thermosetting epoxy resin 7 that could not be sublimated on the hole wall
Alternatively, the aramid fiber 8 remains as a hard and brittle deteriorated portion 11. Further, since the aramid fiber 8 has a higher heat resistance and a lower processing rate by a laser as compared with the thermosetting epoxy resin 7, the aramid fiber 8 is likely to remain without being sublimated completely, and the inner wall of the hole has an uneven shape as shown in the figure. On the other hand, a part of the thermosetting epoxy resin 7 or the aramid fiber 8 scattered around is processed powder 1
2 and adhere to the surface of the substrate material 6 or the inside of the through hole 10.
【0036】次に図1(c)に示すように高周波振動板
13を基板材料6に近づけて振動させる。高周波振動板
13から放射される音波エネルギーによって基板材料6
は振動し、変質部11および加工粉12が基板材料6よ
り脱落、剥離する除去が行われ、図1(d)に示すよう
な良好な穴形状を持つ基板材料6が得られる。除去加工
工程において、Bステージ状態の熱硬化性エポキシ樹脂
7やアラミド繊維8は柔軟性を持つために振動によって
ダメージを受けることはなく、硬く脆い変質部11およ
び加工粉12が選択的に除去される。Next, as shown in FIG. 1C, the high-frequency vibration plate 13 is vibrated while approaching the substrate material 6. The sound wave energy radiated from the high frequency vibration plate 13 causes the substrate material 6
Vibrates, and the deteriorated portion 11 and the processing powder 12 fall off and peel off from the substrate material 6, and the substrate material 6 having a good hole shape as shown in FIG. 1D is obtained. In the removal processing step, the thermosetting epoxy resin 7 and the aramid fiber 8 in the B-stage state are not damaged by vibration because they have flexibility, and the hard and brittle deteriorated portion 11 and the processing powder 12 are selectively removed. You.
【0037】次に図1(e)に示すように印刷等の手段
を用いて導電性ペースト14を貫通穴10に充填する。
貫通穴10は良好な形状であるために導電性ペースト1
4の充填は全く妨げられることなく、貫通穴10の内部
に完全に充填される。Next, as shown in FIG. 1E, the conductive paste 14 is filled into the through holes 10 by means such as printing.
Since the through hole 10 has a good shape, the conductive paste 1
4 is completely filled in the through hole 10 without any hindrance.
【0038】次に図1(f)に示すように金属箔15で
基板材料6を挟み込み、熱プレス装置(図示せず)を用
いて加熱加圧することにより基板材料6は成形されると
同時に導電性ペースト14によって金属箔15と金属箔
15は電気的に接続される。次に金属箔15を所望の形
状にパターンニングすることにより図1(g)に示すよ
うな回路パターン16を有する両面回路形成基板が得ら
れる。Next, as shown in FIG. 1 (f), the substrate material 6 is sandwiched between metal foils 15 and heated and pressed using a hot press device (not shown) so that the substrate material 6 is simultaneously formed and electrically conductive. Metallic foil 15 and metallic foil 15 are electrically connected by conductive paste 14. Next, the metal foil 15 is patterned into a desired shape to obtain a double-sided circuit forming substrate having a circuit pattern 16 as shown in FIG.
【0039】なお、本実施の形態では両面回路形成基板
について説明したが、工程を複数回繰り返すことにより
多層回路形成基板が得られることはいうまでもない。In this embodiment, the double-sided circuit forming substrate has been described. However, it is needless to say that a multilayer circuit forming substrate can be obtained by repeating the steps a plurality of times.
【0040】図2は熱硬化性エポキシ樹脂7とアラミド
繊維8の複合材料を用いた基板材料6に対するレーザー
による穴加工を多数回行って得られた貫通穴10の直径
と発生頻度を示す図である。図2(a)は加振による除
去加工を行わない場合であり、基板材料6上でのレーザ
ービーム径および加工エネルギーを一定にした場合にも
貫通穴10の直径は穴内壁の凹凸や付着した加工粉等に
よりばらつきを持つ。図2(b)は除去を行った場合で
ある。除去を行うことにより穴内壁の凹凸や加工粉等が
除去されるため穴直径のばらつきは著しく低減されてい
る。FIG. 2 is a diagram showing the diameter and the frequency of occurrence of through holes 10 obtained by performing a plurality of times of laser drilling on a substrate material 6 using a composite material of a thermosetting epoxy resin 7 and an aramid fiber 8. is there. FIG. 2A shows the case where the removal processing by vibration is not performed. Even when the laser beam diameter and the processing energy on the substrate material 6 are kept constant, the diameter of the through-hole 10 becomes uneven or adheres to the inner wall of the hole. Variations due to processing powder. FIG. 2B shows the case where the removal is performed. Since the removal removes irregularities on the inner wall of the hole, processing powder, and the like, variations in the hole diameter are significantly reduced.
【0041】(実施の形態2)図3は本発明の第2の実
施の形態における回路形成基板の製造方法を示す工程断
面図である。まず、図3(a)に示すように回路パター
ン16を形成した基板材料6上に絶縁層17を形成す
る。絶縁層17の材料にはエポキシ、ポリイミド等の樹
脂を用いることができる。次に図3(b)に示すように
レーザー9を照射し絶縁層17に非貫通穴18を形成す
る。非貫通穴18の下側および周囲の絶縁層17は加工
熱により変質部11となる。(Embodiment 2) FIG. 3 is a process sectional view showing a method of manufacturing a circuit forming substrate according to a second embodiment of the present invention. First, as shown in FIG. 3A, an insulating layer 17 is formed on the substrate material 6 on which the circuit pattern 16 has been formed. As a material of the insulating layer 17, a resin such as epoxy or polyimide can be used. Next, as shown in FIG. 3B, a non-through hole 18 is formed in the insulating layer 17 by irradiating a laser 9. The insulating layer 17 below and around the non-through hole 18 becomes the altered portion 11 due to the processing heat.
【0042】次に図3(c)に示すように純水19中で
基板材料6に振動を与え変質部11を除去する。除去に
おいて変質部11は完全に取り除かれ、図3(d)に示
すように回路パターン16を露出させる。除去された変
質部11は純水19の循環と共に運ばれ回収手段(図示
せず)によって回収される。次に図3(e)に示すよう
にめっき層20を無電解あるいは電解めっきにて形成す
る。次に図3(f)に示すようにめっき層20をパター
ンニングし回路パターン16とし多層の回路形成基板を
得る。Next, as shown in FIG. 3C, the substrate material 6 is vibrated in pure water 19 to remove the altered portion 11. In the removal, the altered portion 11 is completely removed, exposing the circuit pattern 16 as shown in FIG. The removed altered portion 11 is carried together with the circulation of the pure water 19 and is collected by a collecting means (not shown). Next, as shown in FIG. 3E, a plating layer 20 is formed by electroless or electrolytic plating. Next, as shown in FIG. 3 (f), the plating layer 20 is patterned to form a circuit pattern 16, thereby obtaining a multilayer circuit forming substrate.
【0043】本発明者の実験によれば非貫通穴18の深
さが絶縁層17の厚さの数%でも、除去加工により回路
パターン16を露出させることが可能であった。このこ
とは、体積比で表現するとほとんどの加工がレーザー加
工後の除去によって行われていることを意味する。ただ
し、レーザー加工によって生じる変質部11が回路パタ
ーン16にまで達していることが必要である。According to the experiment of the present inventor, even if the depth of the non-through hole 18 is several% of the thickness of the insulating layer 17, it is possible to expose the circuit pattern 16 by the removal processing. This means that most processing is performed by removal after laser processing in terms of volume ratio. However, it is necessary that the deteriorated portion 11 generated by the laser processing reaches the circuit pattern 16.
【0044】(実施の形態3)図4は本発明の第3の実
施の形態における回路形成基板の製造装置を示す断面図
である。チャンバ21a〜21dはそれぞれ独立してお
り、各チャンバ21a〜21d内をステージ22上に固
定された基板材料6が順次移動できるようにシャッター
23a〜23eが設けられている。また、チャンバ21
a〜21dには吸引口24a〜24dが接続されてい
る。チャンバ21bは基板材料6をレーザー加工するた
めにレーザー発振器25から光学系26を経てレーザー
9が導入されている。チャンバ21cには基板材料6に
振動を与えレーザー加工によって生じた変質部11およ
び加工粉12等を除去するための高周波振動板13が設
置されている。(Embodiment 3) FIG. 4 is a sectional view showing an apparatus for manufacturing a circuit-formed substrate according to a third embodiment of the present invention. The chambers 21a to 21d are independent of each other, and shutters 23a to 23e are provided so that the substrate material 6 fixed on the stage 22 can sequentially move in each of the chambers 21a to 21d. The chamber 21
Suction ports 24a to 24d are connected to a to 21d. In the chamber 21b, a laser 9 is introduced from a laser oscillator 25 via an optical system 26 in order to subject the substrate material 6 to laser processing. The chamber 21c is provided with a high-frequency vibration plate 13 for applying vibration to the substrate material 6 and removing the altered portion 11 and the processing powder 12 generated by the laser processing.
【0045】次に本発明の第3の実施の形態における回
路形成基板の製造装置の動作について順を追って説明す
る。まず図4中左端にあるようにステージ22上に基板
材料6を固定する。次にシャッター23aを開けステー
ジ22をチャンバ21a内に入れシャッター23aを閉
じる。次にシャッター23bを開けステージ22をチャ
ンバ21b内に入れる。次にシャッター23bを閉じ
て、チャンバ21a内にチャンバ21b内より流入した
粉塵を吸引口24aより排出する。次にチャンバ21b
内で基板材料6にレーザー加工を行う。発生した粉塵は
吸引口24bより排出される。Next, the operation of the circuit forming substrate manufacturing apparatus according to the third embodiment of the present invention will be described in order. First, the substrate material 6 is fixed on the stage 22 as shown at the left end in FIG. Next, the shutter 23a is opened, the stage 22 is put into the chamber 21a, and the shutter 23a is closed. Next, the shutter 23b is opened and the stage 22 is put into the chamber 21b. Next, the shutter 23b is closed, and the dust flowing into the chamber 21a from the inside of the chamber 21b is discharged from the suction port 24a. Next, the chamber 21b
Laser processing is performed on the substrate material 6 in the inside. The generated dust is discharged from the suction port 24b.
【0046】次にシャッター23cを開けステージ22
をチャンバ21c内に入れシャッター23cを閉じる。
次に高周波振動板13を駆動し基板材料6を振動させて
除去を行う。発生した粉塵は吸引口24cより排出され
る。次にシャッター23dを開きステージ22をチャン
バ21dに入れシャッター23dを閉じる。次に吸引口
24dよりチャンバ21cからチャンバ21dに流入し
た粉塵を排出する。次にシャッター23eを開け、ステ
ージ22をチャンバ21d外に出しシャッター23eを
閉じる。次に所望の穴加工が終了した基板材料6をステ
ージ22から取り外す。Next, the shutter 23c is opened and the stage 22 is opened.
Into the chamber 21c and close the shutter 23c.
Next, the high frequency vibration plate 13 is driven to vibrate the substrate material 6 to perform removal. The generated dust is discharged from the suction port 24c. Next, the shutter 23d is opened, the stage 22 is put into the chamber 21d, and the shutter 23d is closed. Next, the dust that has flowed into the chamber 21d from the chamber 21c is discharged from the suction port 24d. Next, the shutter 23e is opened, the stage 22 is moved out of the chamber 21d, and the shutter 23e is closed. Next, the substrate material 6 on which the desired hole processing has been completed is removed from the stage 22.
【0047】以上述べたような動作では、チャンバ21
a〜21dの外部と内部が完全に遮断され、基板材料6
もレーザー加工による変質部11や加工粉12の無い状
態で持ち出されるために加工に伴う粉塵などが外部にで
ることはなく、クリーンルーム内に本製造設備を設置す
る場合などに好都合である。In the operation described above, the chamber 21
The outside and inside of a to 21d are completely shut off, and the substrate material 6
Also, since it is carried out without the deteriorated portion 11 and the processing powder 12 due to the laser processing, dust and the like accompanying the processing do not go outside, which is convenient when the present manufacturing equipment is installed in a clean room.
【0048】なお、本実施の形態においてはチャンバの
数を4室としたがレーザー加工用と除去加工用の2室を
最低数として増減可能である。In this embodiment, the number of chambers is set to four, but the number of chambers can be increased or decreased by setting two chambers for laser processing and removal processing to the minimum number.
【0049】[0049]
【発明の効果】以上のように本発明の回路形成基板の製
造方法および製造装置は、レーザーを前記基板材料に照
射し第1段階の貫通あるいは非貫通の穴形状を形成する
工程と、前記工程により前記基板材料の表面および前記
第1段階の貫通あるいは非貫通の穴形状内壁に形成され
た変質部や前記工程中あるいは工程後に基板材料より遊
離した後に前記基板材料に再付着した粉状ないし塊状の
変質物質の少なくとも一方あるいは両方を前記基板材料
を振動させることにより前記基板材料より選択的に除去
し、所望の貫通あるいは非貫通の穴形状を得る工程から
構成されているため、高品質の穴加工をレーザー加工の
高速性を失うことなく実現し、低コストで信頼性の高い
回路形成基板の製造方法を提供できるものである。As described above, according to the method and apparatus for manufacturing a circuit-forming substrate of the present invention, a step of irradiating a laser to the substrate material to form a first or second through-hole or non-through-hole shape is provided. The altered part formed on the surface of the substrate material and the inner wall of the through hole or non-penetration hole of the first stage, or the powdery or lumpy material which is detached from the substrate material during or after the process and then reattached to the substrate material The method comprises a step of selectively removing at least one or both of the altered substance from the substrate material by vibrating the substrate material to obtain a desired through or non-through hole shape. Processing can be realized without losing the high speed of laser processing, and a low-cost and highly reliable method for manufacturing a circuit-formed substrate can be provided.
【図1】(a)〜(g)本発明の第1の実施の形態にお
ける回路形成基板の製造方法の工程断面図FIGS. 1A to 1G are cross-sectional views illustrating steps of a method for manufacturing a circuit-formed substrate according to a first embodiment of the present invention.
【図2】(a),(b)熱硬化性エポキシ樹脂とアラミ
ド繊維の複合材料を用いた基板材料に対するレーザーに
よる穴加工を多数回行って得られた貫通穴の直径と発生
頻度を示す図FIGS. 2A and 2B are diagrams showing the diameters and occurrence frequencies of through holes obtained by performing laser drilling a substrate material using a composite material of a thermosetting epoxy resin and an aramid fiber many times;
【図3】(a)〜(f)本発明の第2の実施の形態にお
ける回路基板の製造方法の工程断面図FIGS. 3A to 3F are process cross-sectional views of a method of manufacturing a circuit board according to a second embodiment of the present invention.
【図4】本発明の第3の実施の形態における回路形成基
板の製造装置の断面図FIG. 4 is a sectional view of an apparatus for manufacturing a circuit forming substrate according to a third embodiment of the present invention.
【図5】(a),(b)従来の回路形成基板の製造方法
における穴加工部断面図5 (a) and 5 (b) are cross-sectional views of a drilled portion in a conventional method for manufacturing a circuit board.
6 基板材料 7 熱硬化性エポキシ樹脂 8 アラミド繊維 9 レーザー 10 貫通穴 11 変質部 12 加工粉 13 高周波振動板 14 導電性ペースト 15 金属箔 16 回路パターン 17 絶縁層 18 非貫通穴 19 純水 20 めっき層 21a〜21d チャンバ 22 ステージ 23a〜23e シャッター 24a〜24d 吸引口 25 レーザー発振器 26 光学系 Reference Signs List 6 substrate material 7 thermosetting epoxy resin 8 aramid fiber 9 laser 10 through hole 11 altered part 12 processing powder 13 high frequency vibration plate 14 conductive paste 15 metal foil 16 circuit pattern 17 insulating layer 18 non-through hole 19 pure water 20 plating layer 21a to 21d Chamber 22 Stage 23a to 23e Shutter 24a to 24d Suction port 25 Laser oscillator 26 Optical system
Claims (19)
基板材料に貫通あるいは非貫通の穴加工を行う穴形成工
程と、前記穴形成工程にて形成された貫通あるいは非貫
通の穴に回路形成基板の表面に形成される回路または内
部に形成される回路を相互に接続する接続手段を形成す
る工程を含み、前記穴形成工程がレーザーを前記基板材
料に照射し第1段階の貫通あるいは非貫通の穴形状を形
成する工程と、前記工程により前記基板材料表面および
前記第1段階の貫通あるいは非貫通の穴形状内壁に形成
された変質部や前記工程中あるいは工程後に基板材料よ
り遊離した後に前記基板材料に再付着した粉状ないし塊
状の変質物質の少なくとも一方あるいは両方を前記基板
材料を振動させることにより前記基板材料より選択的に
除去し、所望の貫通あるいは非貫通の穴形状を得る工程
からなる回路形成基板の製造方法。1. A step of forming a through hole or a non-through hole in a substrate material composed of a single or a plurality of materials, and forming a circuit in the through or non-through hole formed in the hole forming step. Forming a connection means for interconnecting a circuit formed on the surface of the substrate or a circuit formed inside the substrate, wherein the hole forming step includes irradiating a laser to the substrate material to pass through or pass through the first stage. Forming a hole shape, and the deformed portion formed on the surface of the substrate material and the inner wall of the penetrating or non-penetrating hole of the first stage by the process or after releasing from the substrate material during or after the process, By vibrating the substrate material, at least one or both of the powdery or massive alteration substances reattached to the substrate material are selectively removed from the substrate material, and the desired penetration Alternatively, a method for manufacturing a circuit forming substrate, comprising a step of obtaining a non-through hole shape.
部から除去される変質部あるいは変質物質の総和が所望
の穴形状に対する体積比で平均1%以上である請求項1
に記載の回路形成基板の製造方法。2. The method according to claim 1, wherein the total amount of altered portions or altered substances removed from the inside of the hole by vibrating the substrate material is 1% or more on average in a volume ratio to a desired hole shape.
3. The method for manufacturing a circuit-formed substrate according to 1.
脂を含浸させたシート状複合材料からなる請求項1また
は2に記載の回路形成基板の製造方法。3. The method according to claim 1, wherein the substrate material is a sheet-like composite material in which a sheet-like reinforcing material is impregnated with a thermosetting resin.
高分子フィルムを接着して基板材料とした請求項3に記
載の回路形成基板の製造方法。4. The method for producing a circuit-formed substrate according to claim 3, wherein a polymer film is adhered to both sides or one side of the sheet-like composite material to form a substrate material.
Bステージである請求項3または4に記載の回路形成基
板の製造方法。5. The method according to claim 3, wherein the thermosetting resin is a so-called B stage including an uncured component.
である請求項3から5のいずれかひとつに記載の回路形
成基板の製造方法。6. The method according to claim 3, wherein the reinforcing material is a glass fiber woven fabric or a nonwoven fabric.
いは不織布である請求項3から5のいずれかひとつに記
載の回路形成基板の製造方法。7. The method according to claim 3, wherein the reinforcing material is an aromatic polyamide fiber woven or nonwoven fabric.
ることにより基板材料を加振する請求項1から7のいず
れかひとつに記載の回路形成基板の製造方法。8. The method for manufacturing a circuit-formed substrate according to claim 1, wherein the substrate material is vibrated by directly contacting a high-frequency vibrator on the substrate material.
基板材料に放射することにより基板材料を加振する請求
項1から7のいずれかひとつに記載の回路形成基板の製
造方法。9. The method according to claim 1, wherein the substrate material is vibrated by radiating sound waves from the high-frequency vibrator or the diaphragm to the substrate material.
および基板材料を浸漬する請求項9に記載の回路形成基
板の製造方法。10. The method according to claim 9, wherein the high-frequency vibrator or the diaphragm and the substrate material are immersed in a liquid.
る請求項10に記載の回路形成基板の製造方法。11. The method according to claim 10, wherein the liquid is water or purified pure water.
載の回路形成基板の製造方法。12. The method according to claim 10, wherein the liquid is an organic solvent.
に形成された穴に導電粒子を含有するペーストを充填す
る請求項1から12のいずれかひとつに記載の回路形成
基板の製造方法。13. The method for manufacturing a circuit-formed substrate according to claim 1, wherein a paste containing conductive particles is filled into holes formed in the substrate material during the step of forming the connection means.
含む請求項1から12のいずれかひとつに記載の回路形
成基板の製造方法。14. The method according to claim 1, wherein the step of forming the connection means includes plating.
振装置より導出されるレーザーを基板材料上の所望の位
置に集光する光学系と、基板材料を固定し前記光学系と
連携して動作するステージを備えた第1の加工エリア
と、基板材料を加振する高周波振動部材と、前記高周波
振動部材に高周波を供給する発振器と、基板材料より遊
離する加工くずを回収する手段を備えた第2の加工エリ
アからなることを特徴とする回路形成基板の製造装置。15. A laser oscillating device, an optical system for condensing a laser derived from the laser oscillating device at a desired position on a substrate material, and a stage fixed to the substrate material and operated in cooperation with the optical system A first processing area comprising: a high-frequency vibrating member for vibrating the substrate material; an oscillator for supplying a high frequency to the high-frequency vibrating member; and a second means for collecting processing waste released from the substrate material. An apparatus for manufacturing a circuit board, comprising a processing area.
を、それぞれ独立したチャンバとし加工対象物の搬出入
のためのシャッターを前記チャンバに設けた請求項15
に記載の回路形成基板の製造装置。16. The apparatus according to claim 15, wherein the first processing area and the second processing area are independent chambers, and a shutter is provided in the chamber for carrying in and out the workpiece.
3. The apparatus for manufacturing a circuit-formed substrate according to claim 1.
と第1の加工エリアと第2の加工エリアの接続部と第2
の加工エリアからの加工材料搬出部のすべてあるいは1
箇所以上にチャンバを設けた請求項16に記載の回路形
成基板の製造装置。17. A processing material carry-in section into the first processing area, a connection section between the first processing area and the second processing area, and a second processing area.
All or one of the processing material unloading sections from the processing area
17. The apparatus for manufacturing a circuit-formed substrate according to claim 16, wherein a chamber is provided at more than one place.
リアとして用い、前記容器に高周波振動部材を取り付け
た請求項15から17のいずれかひとつに記載の回路形
成基板の製造装置。18. The apparatus according to claim 15, wherein a container for retaining the liquid is used as a second processing area, and a high-frequency vibration member is attached to the container.
超音波領域であることを特徴とする請求項15から18
のいずれかひとつに記載の回路形成基板の製造装置。19. The apparatus according to claim 15, wherein the frequency of the vibration is in an ultrasonic range of 20 kHz or more.
The circuit forming substrate manufacturing apparatus according to any one of the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02648697A JP3149808B2 (en) | 1997-02-10 | 1997-02-10 | Manufacturing method of circuit forming substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02648697A JP3149808B2 (en) | 1997-02-10 | 1997-02-10 | Manufacturing method of circuit forming substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10224015A true JPH10224015A (en) | 1998-08-21 |
JP3149808B2 JP3149808B2 (en) | 2001-03-26 |
Family
ID=12194842
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP02648697A Expired - Fee Related JP3149808B2 (en) | 1997-02-10 | 1997-02-10 | Manufacturing method of circuit forming substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3149808B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1109429A3 (en) * | 1999-12-17 | 2003-09-17 | Matsushita Electric Industrial Co., Ltd. | A method of manufacturing a circuit board and its manufacturing apparatus |
US8927899B2 (en) | 2004-01-29 | 2015-01-06 | Atotech Deutschland Gmbh | Method of manufacturing a circuit carrier and the use of the method |
JP2024515251A (en) * | 2021-04-08 | 2024-04-08 | フラウンホーファー-ゲゼルシャフト・ツール・フェルデルング・デル・アンゲヴァンテン・フォルシュング・アインゲトラーゲネル・フェライン | Method for producing a sheet with a double-sided structured conductive layer for electronic applications - Patents.com |
-
1997
- 1997-02-10 JP JP02648697A patent/JP3149808B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1109429A3 (en) * | 1999-12-17 | 2003-09-17 | Matsushita Electric Industrial Co., Ltd. | A method of manufacturing a circuit board and its manufacturing apparatus |
US6820331B2 (en) | 1999-12-17 | 2004-11-23 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a circuit board and its manufacturing apparatus |
US7143772B2 (en) | 1999-12-17 | 2006-12-05 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a circuit board and its manufacturing apparatus |
US8927899B2 (en) | 2004-01-29 | 2015-01-06 | Atotech Deutschland Gmbh | Method of manufacturing a circuit carrier and the use of the method |
JP2024515251A (en) * | 2021-04-08 | 2024-04-08 | フラウンホーファー-ゲゼルシャフト・ツール・フェルデルング・デル・アンゲヴァンテン・フォルシュング・アインゲトラーゲネル・フェライン | Method for producing a sheet with a double-sided structured conductive layer for electronic applications - Patents.com |
Also Published As
Publication number | Publication date |
---|---|
JP3149808B2 (en) | 2001-03-26 |
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