JPH0943592A - Color liquid crystal display element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make it possible to obviate the degradation in display grade by scattering and transmitting of light by spacers and to improve the contrast of display in particular by adopting the constitution in which color filters have the spacers formed by laminating colored layers consisting of three primary colors on a black matrix and that an active matrix substrate has insulating films in the parts of the color filters in contact with these spacers. SOLUTION: The color filters are formed by providing the surface of the transparent substrate 1 which is one substrate with the black matrix 2 and further, arranging the colored layers 3 to 5 consisting of the three primary colors thereon. A liquid crystal layer 8 is held by a pair of the substrates 1, 13, of which the one substrate is the active matrix substrate 13 including thin- film transistors or thin-film diodes, etc. The color filters of this color liquid crystal display element have the spacers formed by the lamination of the colored layers 3 to 5 consisting of the three primary colors on the black matrix 2 and the active matrix substrate 13 have the insulating films 1 in the parts in contact with the spacers of the color filters.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a color liquid crystal display device using a color filter having a spacer function.

[0002]

2. Description of the Related Art A conventional color liquid crystal display device generally has a thin film transistor (T) as shown in FIG. 2 in order to maintain the thickness (cell gap) of a liquid crystal layer.
Plastic beads or glass fibers are used as spacers between an electrode substrate provided with FT) and a plurality of scanning electrodes and the substrate on the color filter side. Since spacers such as plastic beads are scattered here,
The position (in-plane position) between the electrode substrate and the substrate on the color filter side is not determined.

JP-A-56-140324, JP-A-63-
82405, JP-A-4-93924, and JP-A-5-196.
In 946, a liquid crystal display element using a structure in which colored layers forming a color filter are stacked as a spacer is proposed.

[0004]

In a color liquid crystal display device using plastic beads or the like as a spacer, the position of the spacer such as the plastic beads is not fixed, and the liquid crystal is scattered or transmitted by the spacer located on the pixel. There is a problem that the display quality of the display element is degraded.

A liquid crystal display element in which spacers such as plastic beads are scattered and used has the following other problems. That is, since the spacer is spherical or rod-shaped and comes in contact with a point or line during cell crimping,
There was a drawback that the alignment film and the transparent electrode were damaged, and display defects were likely to occur. Further, there is a disadvantage that the liquid crystal is contaminated by the damage of the alignment film and the transparent electrode, and the voltage is easily lowered.

In addition, since a step of uniformly dispersing the spacers is required or the particle size distribution of the spacers needs to be controlled with high precision, a liquid crystal display element having stable display quality can be provided by a simple method. It was difficult to get.

To solve these problems, Japanese Patent Application Laid-Open No.
40324, JP-A-63-82405, JP-A-4-93
924, JP-A-5-196946 describes two colors or three colors.
It has been proposed to use a structure in which colored layers of colors are overlapped as a spacer. The thickness (cell gap) of the liquid crystal layer actually obtained by these disclosed techniques is the thickness of one or two colored layers, and it is difficult to obtain a liquid crystal display element having a sufficient cell gap. Even if the cell gap can be maintained with the thickness of one layer or two layers, satisfactory reliability such as deterioration of durability of the ITO film formed on the color filter due to thickening of the colored layer is achieved. It was difficult to obtain a liquid crystal display device having

Further, in practice, the transparent conductive film is uniformly formed on the spacer having a structure in which the colored layers are superposed, and it is very close to the transparent conductive film and the circuit on the side of the active matrix substrate which is the counter substrate. There is a problem that there is a large risk of electrical short-circuiting due to close contact with and contact with a thin alignment film.

In view of the above problems, the present invention realizes a sufficient cell gap and avoids the risk of conduction between the spacer of the color filter and the active matrix substrate,
It is an object of the present invention to provide a liquid crystal display device that overcomes the above-mentioned conventional drawbacks.

[0010]

In order to achieve the above object, the color liquid crystal display element of the present invention has the following constitution.

That is, the present invention is a color filter in which one substrate is provided with a black matrix on a transparent substrate, and a plurality of colored layers of three primary colors are further arranged thereon.
In a color liquid crystal display device having a structure in which a liquid crystal layer is sandwiched by a pair of substrates, the other substrate is an active matrix substrate including a thin film transistor or a thin film diode, a color liquid crystal display device characterized by satisfying the following: is there.

(A) The color filter has a spacer formed by stacking colored layers of three primary colors on a black matrix.

(B) The active matrix substrate has an insulating film at a portion in contact with the spacer of the color filter.

[0014]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below.

The color filter used in the liquid crystal display device of the present invention comprises a black matrix provided on a transparent substrate, and a plurality of colored layers of three primary colors arranged on the black matrix. The color filter is composed of a large number of picture elements, with a pixel covered by each colored layer of three primary colors as one picture element. The black matrix referred to here indicates a light shielding area arranged between pixels, and is provided to improve the display contrast of the liquid crystal display element.

The transparent substrate used in the color filter of the present invention is not particularly limited, and inorganic glass such as quartz glass, borosilicate glass, aluminosilicate glass, silica-coated soda lime glass, and the like, An organic plastic film or sheet is preferably used.

A black matrix made of a light-shielding agent is provided on this transparent substrate, but a resin black matrix made of a resin and a light-shielding agent can be preferably used.

As the light-shielding agent for the black matrix,
In addition to metal oxides such as carbon black, titanium oxide, iron tetroxide, and chromium oxide, metal sulfides, and metals, red, blue,
A mixture of green pigments and the like can be used. Among them, carbon black is particularly preferable because of its excellent light shielding properties. Since carbon black having a good dispersion and a small particle size mainly exhibits a brownish color tone, it is preferable to mix a pigment having a complementary color with the carbon black to make it an achromatic color.

The resin used for the black matrix is not particularly limited, but it is a photosensitive or non-photosensitive resin such as epoxy resin, acrylic resin, urethane resin, polyester resin, polyimide resin, polyolefin resin and gelatin. The above materials are preferably used. The resin for the black matrix is preferably a resin having higher heat resistance than the resin used for the pixel and the protective film, and a polyimide resin is preferably a resin having resistance to the organic solvent used in the process after the formation of the black matrix. Resins are particularly preferably used.

The polyimide resin is not particularly limited, but a polyimide precursor (n = 1 to 2) containing a structural unit represented by the general formula (1) as a main component is usually imidized by heating or a suitable catalyst. Those that are converted are preferably used.

[0021]

Embedded image Further, the polyimide resin may contain a bond other than the imide bond such as an amide bond, a sulfone bond, an ether bond, and a carbonyl bond, in addition to the imide bond.

In the general formula (1), R ₁ is at least 2
It is a trivalent or tetravalent organic group having one or more carbon atoms. From the viewpoint of heat resistance, R ₁ is preferably a trivalent or tetravalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocycle, and having 6 to 30 carbon atoms. Examples of R ₁ include phenyl group, biphenyl group, terphenyl group, naphthalene group, perylene group, diphenyl ether group, diphenylsulfone group, diphenylpropane group, benzophenone group, biphenyltrifluoropropane group, cyclobutyl group, cyclopentyl group, and the like. However, the present invention is not limited to these.

R ₂ is a divalent organic group having at least 2 carbon atoms, but from the viewpoint of heat resistance, R ₂ contains a cyclic hydrocarbon, an aromatic ring or an aromatic heterocycle, and A divalent group having 6 to 30 carbon atoms is preferable. Examples of R ₂ include phenyl group, biphenyl group, terphenyl group, naphthalene group, perylene group, diphenyl ether group, diphenyl sulfone group, diphenylpropane group, benzophenone group, biphenyltrifluoropropane group, diphenylmethane group, dicyclohexylmethane group, etc. Examples include, but are not limited to: In the polymer having the structural unit (1) as a main component, R ₁ and R ₂ may each be composed of one type of them, or may be a copolymer composed of two or more types of each. . Further, in order to improve the adhesiveness to the substrate, it is preferable to copolymerize bis (3-aminopropyl) tetramethyldisiloxane having a siloxane structure as the diamine component as long as the heat resistance is not reduced.

Specific examples of the polymer containing the structural unit (1) as a main component include pyromellitic dianhydride, 3, 3
′, 4,4′-Benzophenonetetracarboxylic dianhydride 3,3 ′, 4,4′-biphenyltrifluoropropanetetracarboxylic dianhydride 3,3 ′, 4,4′-
Biphenyl sulfone tetracarboxylic acid dianhydride, 2,
At least one carboxylic acid dianhydride selected from the group consisting of 3,5, -tricarboxycyclopentylacetic acid dianhydride and the like, and paraphenylenediamine, 3,3'-diaminodiphenyl ether, 4,4 ' -Diaminodiphenyl ether, 3,4 'diaminodiphenyl ether, 3,3
Polyimide synthesized from one or more diamines selected from the group of '-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodicyclohexylmethane, 4,4'-diaminodiphenylmethane Precursors, but are not limited thereto.
These polyimide precursors are synthesized by a known method, that is, by selectively combining tetracarboxylic dianhydride and diamine and reacting them in a solvent.

When the resin for the black matrix is polyimide, the black paste solvent is usually N-methyl-2-pyrrolidone, N, N-dimethylacetamide,
An amide-based polar solvent such as N, N-dimethylformamide and a lactone-based polar solvent such as γ-butyrolactone are preferably used.

As a method of dispersing a light-shielding agent such as carbon black or a complementary color pigment with respect to carbon black,
For example, there is a method in which a light-shielding agent, a dispersant, and the like are mixed in the polyimide precursor solution and then dispersed in a disperser such as a three-roll mill, a sand grinder, and a ball mill, but the method is not particularly limited. In addition, various additives may be added for improving the dispersibility of carbon black, or for improving applicability and leveling property.

The method for producing the resin black matrix is as follows:
After the black paste is applied and dried on the transparent substrate, patterning is performed. As a method for applying the black paste, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, or the like is preferably used, after which heat drying (semi-cure) is performed using an oven or a hot plate. To do. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

When the resin is a non-photosensitive resin, the black paste coating film thus obtained is formed of a positive photoresist film on the resin, and then the resin is a photosensitive resin. In some cases, exposure / development is performed as it is or after the oxygen barrier film is formed. If necessary, remove the positive photoresist or oxygen barrier film,
Further, it is heated and dried (this cure). When the polyimide-based resin is obtained from the precursor, the curing conditions are slightly different depending on the coating amount, but it is generally heating at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a black matrix is formed on the transparent substrate.

The film thickness of the resin black matrix used in the present invention is preferably 0.5 to 1.5 μm, more preferably 0.8 μm to 1.2 μm. As described later, the thickness of the resin black matrix is important in securing the cell gap of the liquid crystal display element. When the thickness is smaller than 0.5 μm, it becomes difficult to secure a sufficient cell gap, It is not preferable because the light-shielding property becomes insufficient. When the thickness is more than 1.5 μm, the light-shielding property can be secured, but the flatness of the color filter is easily sacrificed, and a step is easily generated. When a surface step is formed, even if a transparent conductive film or a liquid crystal alignment film is formed on the color filter, the step is hardly reduced, and the alignment process due to the rubbing of the liquid crystal alignment film becomes uneven or the cell gap varies. If so, the display quality of the liquid crystal display element deteriorates. To reduce the surface step, it is effective to provide a transparent protective film on the colored layer, but it is disadvantageous in that the structure of the color filter becomes complicated and the manufacturing cost increases.

The light-shielding property of the resin black matrix is represented by an OD value (common logarithm of reciprocal of transmittance),
In order to improve the display quality of the liquid crystal display element, it is preferably 2.5 or more, more preferably 3.0 or more. The preferred range of the thickness of the resin black matrix has been described above, but the upper limit of the OD value should be determined in relation to this.

The reflectance of the resin black matrix is the reflectance (Y value) which is luminosity-corrected in the visible region of 400 to 700 nm in order to reduce the influence of reflected light and improve the display quality of the liquid crystal display element. It is preferably 2% or less, more preferably 1% or less. Usually, (20 to 200) μm × (20 to 300) μ is provided between the resin black matrices.
m openings are provided, and a plurality of colored layers of three primary colors are arranged so as to cover at least the openings.

The colored layer forming the color filter includes at least three primary colors. That is, when color display is performed by the additive method, red (R), green (G), blue (B)
When the color display is performed by the subtractive color method, the three primary colors of cyan (C), magenta (M), and yellow (Y) are selected. Generally, a picture element for color display can be formed by using an element including these three primary colors as one unit. For the coloring layer, a resin colored with a coloring agent is used.

As the colorant used in the colored layer, organic pigments, inorganic pigments, dyes, etc. can be preferably used.
Further, various additives such as an ultraviolet absorber, a dispersant, and a leveling agent may be added. As the organic pigment, phthalocyanine-based, aziraki-based, condensed azo-based, quinacridone-based, anthraquinone-based, perylene-based, and perinone-based pigments are preferably used.

The resin used for the colored layer is preferably a photosensitive or non-photosensitive material such as epoxy resin, acrylic resin, urethane resin, polyester resin, polyimide resin, polyolefin resin, gelatin or the like. It is preferable to disperse or dissolve the colorant in these resins for coloring. As the photosensitive resin, there are types such as a photodecomposable resin, a photocrosslinkable resin and a photopolymerizable resin, and particularly, a monomer, an oligomer or a polymer having an ethylenically unsaturated bond and an initiator which generates a radical by ultraviolet rays. A photosensitive composition, a photosensitive polyamic acid composition, and the like are preferably used. As the non-photosensitive resin, those which can be developed with the above-mentioned various polymers are preferably used. However, heat-resistant resins capable of withstanding such heat in the process of forming a transparent conductive film and the process of manufacturing a liquid crystal display device are preferably used. Is preferable, and a resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display device is preferable. Therefore, a polyimide resin is particularly preferably used.

As a method for forming the colored layer, patterning is performed after the colored paste is applied and dried on the substrate on which the resin black matrix is formed. As a method of obtaining a colored paste by dispersing or dissolving the colorant, after mixing the resin and the colorant in a solvent, three-roll, sand grinder, there is a method of dispersing in a dispersing machine such as a ball mill, The method is not particularly limited.

As a method for applying the colored paste, as in the case of the black paste, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar or the like is preferably used, and then, an oven or a hot method is used. Heat drying (semi-cure) using a plate.
The conditions for the semi-cure vary depending on the resin used, the solvent and the coating amount of the paste, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes. When the resin is a non-photosensitive resin, the colored paste film thus obtained is formed after forming a positive photoresist film thereon, or when the resin is a photosensitive resin. Exposure / development is performed as it is or after forming an oxygen barrier film. If necessary, the positive photoresist or the oxygen blocking film is removed, and the film is dried by heating (this cure). The curing conditions vary depending on the resin, but when a polyimide resin is obtained from the precursor, it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a patterned colored layer is formed on the substrate on which the black matrix is formed.

After the colored layer of the first color is formed over the entire surface of the substrate on which the resin black matrix is formed as described above, unnecessary portions are removed by photolithography to obtain a desired colored layer of the first color. Form a pattern. In this case, the colored layer is left at least in the portion covering the opening of the resin black matrix and in the portion where the spacer is formed by laminating the colored layer. The same operation is repeated for the second color and the third color to form a colored layer such that one colored layer remains on the opening of the resin black matrix and three colored layers remain on the spacer. The coloring layer on the opening and the coloring layer forming the spacer may be continuous or separated. However, when the ITO film formed on the color filter is disconnected between the coloring layer and the spacer on the opening to prevent conduction between the color filter side and the counter substrate, the coloring layer and the spacer on the opening are formed. It is preferable that the color layer is separated and fractionated.

The thickness of the three primary color layers is not particularly limited, but is preferably 1 to 3 μm per layer, and the total thickness of the three primary color layers in this case is 3 to 9 μm.
Becomes If the total film thickness is less than 3 μm, a sufficient cell gap cannot be obtained, and if it exceeds 9 μm, it is difficult to uniformly apply the colored layer, and further, the transparent conductive film formed on the color filter. Is unfavorable because it reduces the reliability.

When the cell gap is maintained by using the color filter of the present invention, R, G, and
When B is selected, the film thickness of G + B + Bk (resin black matrix) for R, and B + R + Bk for G
The film thickness of R + G + Bk for B corresponds to the cell gap in the liquid crystal display device. In the case of increasing the dispersibility of the coloring agent in the paste for forming the coloring layer or improving the leveling property for the purpose of uniform application, the height of the spacer formed by stacking the coloring layers of the three primary colors is determined by the pixel. It is smaller than the sum of the film thicknesses of the three primary color layers in the portion. That is, the cell gap becomes smaller than the film thickness of G + B + Bk for R, similarly becomes smaller than the film thickness of B + R + Bk for G, and smaller than R + G + Bk for B.

The spacers formed by stacking the colored layers of the three primary colors in the present invention are formed on the resin black matrix, and the area and the location of the spacers face the color filter when a liquid crystal display device is produced. It is greatly affected by the structure of the active matrix substrate. It if there is no restriction of the transparent electrode substrate facing Therefore, the area and location of the spacer is not particularly limited, considering the size of the pixel, the area per single spacer is 10μm ² ~1000μm ² Is preferred. When it is smaller than 10 μm ² , it is difficult to form and stack a precise pattern, and when it is larger than 1000 μm ² , it becomes difficult to completely arrange it on the black matrix depending on the shape of the spacer portion.

Further, according to the present invention, the active matrix substrate has an insulating film at a portion in contact with the spacer of the color filter. The transparent conductive film is evenly formed on the spacers, and the transparent conductive film and circuit on the active matrix substrate side, which is the counter substrate, come close to and come in contact with the extremely thin alignment film to cause an electrical short circuit. The danger is great. The insulating film at the portion in contact with the spacer is selected from an inorganic oxide or polymer having a high resistance value. Examples of the inorganic oxide include SiNx (silicon nitride) and Si
O ₂ (silicon oxide), Al ₂ O ₃ (alumina), TaOx (tantalum oxide), MoOx (molybdenum oxide), Cr ₂ O ₃ (chromium oxide), TiO ₂ (titania), ZrO ₂ (zirconia), CeO ₂ (Cerium oxide), MgO (magnesium oxide), BeO (beryllium oxide), etc., and the polymer may be polyimide, epoxy resin, acrylic resin, or any other so long as it is insoluble in the liquid crystal.

The insulating film at the portion in contact with the spacer is T
It is installed during the process of forming the FT or in a process separately provided. The installation position of the insulating film can be arbitrarily selected except the opening for display. It may be installed on the TFT, on the wiring, or avoiding them, but the insulating area should be larger than the area of the spacer so as not to conduct even if the position is slightly displaced.

By installing the insulating film on the active matrix substrate side as described above, the risk of conduction between the spacer of the color filter and the active matrix substrate can be more surely avoided.

Next, the color liquid crystal display device of the present invention will be described.

The color liquid crystal display element of the present invention is shown in FIG. 1, which is prepared by making the color filter and the transparent electrode substrate face each other. The color filter may be provided with a transparent protective film on the colored layer, if necessary, but the structure becomes complicated, which is disadvantageous when considering the manufacturing cost. Further, a transparent electrode such as an ITO film is formed on the color filter.
The transparent electrode substrate facing the color filter is IT
A transparent electrode such as an O film is patterned and provided on the transparent substrate. In addition to the transparent electrode, a thin film transistor (TFT) element or a thin film diode (TF) is provided on the transparent electrode substrate.
The TFT liquid crystal display element or the TFD liquid crystal display element can be prepared by providing the insulating portion of the present invention together with the D) element, the scanning line, the signal line and the like. A liquid crystal alignment film is provided on the color filter having a transparent electrode and the transparent electrode substrate, and is subjected to an alignment process such as rubbing. After the alignment treatment, the color filter and the transparent electrode substrate are attached to each other using a sealant, and liquid crystal is injected through the injection port provided in the seal portion, and then the injection port is sealed. The module is completed by mounting an IC driver or the like after attaching the polarizing plate to the outside of the substrate.

The color liquid crystal display device of the present invention is used for a display screen of a personal computer, a word processor, an engineering workstation, a navigation system, a liquid crystal television, a video and the like, and is also suitable for a liquid crystal projection which provides a clear image. Used for.

Hereinafter, the present invention will be described in more detail with reference to preferred embodiments, but the efficacy of the present invention is not limited by the embodiments used.

[0048]

【Example】

(Preparation of resin black matrix) 3,3 ', 4,4'
-Biphenyltetracarboxylic dianhydride, 4,4'-diaminodiphenyl ether, and bis (3-aminopropyl) tetramethyldisiloxane with N-methyl-2
The reaction was carried out using pyrrolidone as a solvent to obtain a polyimide precursor (polyamic acid) solution.

A carbon black mill base having the following composition was dispersed at 7000 rpm for 30 minutes using a homogenizer, and the glass beads were filtered to prepare a black paste.

Carbon Black Mill Base Carbon Black (MA100, manufactured by Mitsubishi Kasei Co., Ltd.) 4.6 parts Polyimide precursor solution 24.0 parts N-methylpyrrolidone 61.4 parts Glass beads 90.0 parts 300 × 350 mm size Non-alkali glass (manufactured by Nippon Electric Glass Co., Ltd., OA-2) substrate was coated with a black paste using a spinner, and was placed in an oven at 135 ° C.
For 20 minutes. Subsequently, a positive type resist (Shipley “Microposit” RC100 30cp) was applied by a spinner and dried at 90 ° C. for 10 minutes. The resist film thickness is 1.
The thickness was 5 μm. Exposure machine PLA-501 manufactured by Canon Inc.
Using F, exposure was performed through a photomask.

Then, an aqueous solution containing 2% by weight of tetramethylammonium hydroxide at 23 ° C. was used as a developer.
The substrate was dipped in a developing solution, and at the same time, the substrate was oscillated so as to reciprocate once in a width of 10 cm for 5 seconds, so that the positive resist was developed and the polyimide precursor was etched at the same time. The development time was 60 seconds. After that, remove the positive resist with methyl cellosolve acetate, and
After curing at 300 ° C. for 30 minutes, a resin black matrix substrate was obtained. The film thickness of the resin black matrix is 0.9
0 μm, and the OD value was 3.0. The reflectance (Y value) at the interface between the resin black matrix and the glass substrate was 1.2%.

(Preparation of Colored Layer) Next, as the red, green and blue pigments, a dianthraquinone pigment represented by Color index No. 65300 Pigment Red 177, Color Index No. 74265, respectively.
A phthalocyanine green pigment represented by Pigment Green 36 and a phthalocyanine blue pigment represented by Color Index No. 74160 Pigment Blue 15-4 were prepared. Each of the above pigments was mixed and dispersed in a polyimide precursor solution, and red,
Green and blue colored pastes were obtained. First, apply a blue paste on a resin black matrix substrate,
For 10 minutes with hot air and semi-cure at 120 ° C. for 20 minutes. After this, a positive resist (Shipley "Microposit" R
C100 30cp) was applied by a spinner and dried at 80 ° C for 20 minutes. Exposure is performed using a mask, and an alkali developer (Shiple
The substrate was dipped in y "Microposit" 351), and the positive resist was developed and the polyimide precursor was etched at the same time while shaking the substrate. After that, the positive resist is peeled off with methylcellosolve acetate,
Furthermore, it was cured at 300 ° C. for 30 minutes. The film thickness of the colored pixel portion was 2.0 μm. By this patterning, the first step of the spacer was formed on the resin black matrix together with the formation of the blue pixel.

After washing with water, the second step of the spacer was formed on the resin black matrix in the same manner as the formation of the red pixel. The film thickness of the red pixel portion was 1.8 μm.

After washing with water, the third step of the spacer was formed on the resin black matrix in the same manner as the formation of the green pixel to prepare a color filter. The film thickness of the green pixel portion was 1.9 μm.

The area of the spacer portions provided on the resin black matrix by stacking the colored layers was about 100 μm ² . The height of the spacer (thickness of three colored layers on the resin black matrix) is 5.0 μm.
Which is lower than the total thickness (5.7 μm) of the colored layers. The spacer was provided in the screen at a rate of one per pixel. Also, spacers were provided on a part of the frame formed of a resin black matrix around the screen by color overlapping at the same density as in the screen.

(Production of Color Liquid Crystal Display Element) An ITO film was formed as a mask on the above color filter by a sputtering method. The thickness of the ITO film was 1500 angstroms, and the surface resistance was 20 Ω / □. This ITO
A polyimide-based alignment film was provided on the film, and a rubbing treatment was performed. On the other hand, a transparent electrode substrate provided with a TFT (thin film transistor) element was prepared as follows.

First, chromium was vacuum deposited on a transparent non-alkali glass substrate (OA-2, manufactured by Nippon Electric Glass Co., Ltd.) to form a film, and the gate electrode was patterned by a photoetching method. Next, a silicon nitride film (SiNx) having a thickness of about 5000 angstroms was formed by plasma CVD to form an insulating film. Subsequently, an amorphous silicon film (a-Si) and SiNx as an etching stopper film layer were continuously formed.
Then, SiNx of the etching stopper layer was patterned by a photoetching method. At this time, the portion contacting the spacer was not etched, and the area per one was left to be about 250 μm ² . Film formation and patterning of n + a-Si for obtaining an ohmic contact, and further, film formation and patterning of a transparent electrode (ITO) serving as a display electrode. At this time, the portion contacting the spacer was etched to form a portion where the underlying SiNx was exposed without the transparent electrode having an area of about 250 μm ² . In addition, the entire surface of aluminum as the wiring material is deposited,
When the drain electrode and the source electrode were formed by the photo-etching method, aluminum having a surface area of about 250 μm ² which was a portion in contact with the spacer was vapor-deposited on the exposed portion of SiNx and was removed by etching. Using the drain electrode and the source electrode as masks, the n + a-Si in the channel portion was removed by etching to complete the TFT.

Finally, similarly to the color filter, a polyimide type alignment film was provided and subjected to rubbing treatment.

After a color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together with a sealant, liquid crystal was injected through an injection port provided in the seal part. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning to normal pressure. After the liquid crystal was injected, the injection port was sealed, and a polarizing plate was bonded to the outside of the substrate to form a cell. The obtained liquid crystal display element had good display quality.

[0060]

According to the color filter of the present invention, a spacer formed by laminating colored layers is provided on a resin black matrix, and an insulating portion is provided on the active matrix side. When created, the following effects can be obtained.

(1) Since the spacer does not exist on the pixel portion, the display quality is not deteriorated due to the scattering and transmission of light by the spacer, and the display contrast is particularly improved.

(2) Since the spacers come into contact with the transparent electrode substrates facing each other on the surface, the alignment film and the transparent electrode are less damaged, and a display with few defects can be obtained.

(3) The step of spraying spacers is not necessary, and the manufacturing process of the liquid crystal display device is simplified.

(4) It is not necessary to control the particle size distribution of the spacer with high accuracy, and the liquid crystal display device can be easily manufactured.

(5) Since the cell gap is maintained by the resin black matrix and the film thickness of two colored layers, a liquid crystal display device having a sufficient cell gap can be obtained.

(6) The durability of the ITO film on the color filter is good.

(7) The risk of electrical short circuit between the transparent (common) electrode on the color filter and the transparent electrode or circuit on the active matrix substrate side through the ITO on the spacer can be avoided.

[Brief description of drawings]

FIG. 1 is a sectional view of a color liquid crystal display device using a color filter obtained according to the present invention.

FIG. 2 is a sectional view of a conventional color liquid crystal display device.

[Explanation of symbols]

 Reference Signs List 1, 13: transparent substrate (glass substrate) 2: resin black matrix 3: colored layer (B) 4: colored layer (R) 5: colored layer (G) 6: transparent electrode 7, 9: alignment film 8: liquid crystal 10 … Pixel electrode 11… Insulating film 12… Attached electrode for liquid crystal drive circuit 14 Chromium black matrix 15 Protective film 16… Plastic beads

Claims (12)

[Claims] 1. A color filter in which one substrate is provided with a black matrix on a transparent substrate, and a plurality of colored layers composed of three primary colors are further arranged on the black matrix, and the other substrate is equipped with a thin film transistor or a thin film diode. A color liquid crystal display device having a structure in which a liquid crystal layer is sandwiched between a pair of substrates which are active matrix substrates, wherein the following are satisfied. (A) The color filter has a spacer formed by stacking colored layers of three primary colors on a black matrix. (B) The active matrix substrate has an insulating film at a portion in contact with the spacer of the color filter. 2. The color liquid crystal display element according to claim 1, wherein the black matrix is a resin black matrix in which a light shielding agent is dispersed in a resin. 3. The color liquid crystal display element according to claim 2, wherein the resin forming the black matrix is polyimide. 4. The thickness of the black matrix is 0.5 to
The color liquid crystal display device according to claim 1, which has a thickness of 1.5 μm. 5. The color liquid crystal display device according to claim 1, wherein the black matrix has an OD value of 2.5 or more. 6. The color liquid crystal display device according to claim 1, wherein the reflectance of the black matrix is 2% or less. 7. The sum of the film thicknesses of the colored layers of the three primary colors is
The color liquid crystal display device according to claim 1, having a thickness of 3 to 9 µm. 8. A color liquid crystal display device according to claim 1, wherein the colored layers of the three primary colors are made of polyimide. 9. An area of spacers formed by stacking colored layers of three primary colors is 10 μm ^{2 to} 1000 per unit.
The color liquid crystal display element according to claim 1, wherein the color liquid crystal display element has a thickness of μm ² . 10. The color liquid crystal display device according to claim 1, wherein the insulating film at the portion where the active matrix substrate is in contact with the spacer of the color filter is made of at least one inorganic oxide selected from the following group. SiNx
(Silicon nitride), SiO ₂ (silicon oxide), Al ₂ O ₃ (alumina), TaOx (tantalum oxide), MoOx (molybdenum oxide), C
r ₂ O ₃ (chromium oxide), TiO ₂ (titania), ZrO ₂ (zirconia), CeO ₂ (cerium oxide), MgO (magnesium oxide), Be
O (beryllium oxide) 11. The color liquid crystal display device according to claim 1, wherein the insulating film at the portion where the active matrix substrate is in contact with the spacer of the color filter is made of a polymer. 12. The color liquid crystal display device according to claim 11, wherein the polymer forming the insulating film is polyimide.