JPH09306365A - Processing method of film on face panel surface of cathode-ray tube - Google Patents

Abstract

PROBLEM TO BE SOLVED: To chemically remove a film in a condition where an explosion-proof band is still installed, and prevent generation of a pinhole and a pit at reproducing time by removing a multilayer film by soaking it in an alkali hydroxide solution. SOLUTION: In a cathode-ray tube(CRT) 1, in the final stage when an explosion-proof band 7 or the like is installed, a surface of a face panel 2 is coated with a reflection preventive film 6. Next, the film 6 is inspected, and when it is defective, a film 6 process to remove the film 6 is started, and an alkali hydroxide solution 12 is heated and agitated so that a temperature becomes 60 deg.C to 70 deg.C±2 deg.C in a solution tank 10, and is put at a constant temperature. Next, a film 6 part coating panel 2 surface of the CRT is soaked in the solution 12, and the film 6 is soaked for a prescribed preset time, and is dissolved and removed. Therefore, removing work of the film 6 is easily automated, and since the film 6 is chemically dissolved, a pit defective is wholly eliminated, and a fraction defective at reproducing time can be reduced to 5% or less to conventional 20% to 30%.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of treating a cathode ray tube face panel surface suitable for removing an antireflection film or the like formed on the front surface of the face panel of the cathode ray tube.

[0002]

2. Description of the Related Art Conventionally, a cathode ray tube (hereinafter referred to as CRT).
A CR that has a functional film bonded to the front face of the face panel for the purpose of antistatic, antireflection, antifouling, etc., and various films are produced by spin coating or sputtering.
T is widely used.

As such an antireflection and antistatic film, as shown in FIG. 3, titanium dioxide (TiO 2) of the first layer is directly formed on the face panel 2 of the CRT 1 by the sputtering method.
₂ ) 3, second layer of silicon dioxide (SiO ₂ ) 4, third
Layer 6 of titanium dioxide 3, 4th layer of transparent film (ITO) 5, layer 5 of titanium dioxide 3 and layer 6 of silicon dioxide 4 6
The layer as a whole is coated to a thickness of about 0.3 μm. Incidentally, the ITO 5 is given conductivity and functions as an antistatic film, and the titanium dioxide 3 and the silicon dioxide 4 are
Is multilayer-coated to function as the antireflection film 6 from the light source.

The inspection of the optical characteristics and appearance of the CRT coated with the antireflection film 6 as described above is conducted in the CRT manufacturing process. However, since these inspections are conducted in the final process after the assembly of the CRT, the CRT is explosion proof. It is in the final state with a band for use attached.

If the result of inspecting such a CRT is out of the standard, the antireflection film 6 coated on the CRT 1 is ground and the CRT 1 is reused.
CRT1 can be easily peeled off in the case of functional films, etc.
The anti-reflection film 6 coated on the front surface of the face panel by the direct sputtering method or the like is such that the particles such as TiO ₂ firmly intrude into the inner surface of the glass of the face panel and the entire film is hard. Grinding work was performed to remove the produced film.

[0006]

[Problems to be Solved by the Invention] As described above, the CRT 1
When the produced film sputtered on the top is ground and reused, the abrasive is made into a slurry form and dropped onto the face panel surface when polishing with a manual polisher.
The RT1 has an explosion-proof band wound around the face panel so that it surrounds the face panel. Therefore, the slurry of the abrasive during buffing flows between the band and the side surface of the face panel of the CRT1, Even if this was washed, there was a problem that it was difficult to remove.

In order to regenerate the CRT in which the film produced by such polishing is ground, the antireflection film is produced again by the direct sputtering or spin coating method. In the direct sputtering method, the vacuum chamber is used. In the above, the antireflection film 6 as the above-mentioned generation film is sputtered, and in the spin coating method, the reproduction CRT is rotated at a high speed. Therefore, abrasive particles for polishing which are interposed between the side surface of the CRT face panel and the explosion-proof band are ejected, A pinhole or the like is generated at the time of forming a film to cause a defective film to be formed, and the defective rate at the time of regenerating the film is extremely poor at 20% to 30%. Further, there is a problem that it takes a long time of about 50 to 60 minutes per machine to grind the generated film.

Further, cerium oxide powder is used as the polishing agent, but sputtered metal adheres strongly to the glass surface of the face panel during buffing, so that a defective portion called a hole-like pit is formed on the glass surface of the face panel. There was also a problem that it could not be reused due to the occurrence of.

Further, if the explosion-proof band is cut after polishing, the entire CRT is washed, and the explosion-proof band is tightened again, the yield of the defective rate of the regenerated film is improved but the manufacturing cost is greatly increased. Become.

The present invention is intended to provide a method for treating a CRT face surface forming film, which solves the above problems.
The problem is to provide a method of treating a formed film that can chemically remove the formed film while the explosion-proof band is still attached, and can regenerate the formed film without generation of pinholes or pits during reproduction.

[0011]

SUMMARY OF THE INVENTION The present invention is a method for treating a film formed on a face of a cathode ray tube, wherein the film formed on the face panel of the cathode ray tube is sputtered. The membrane is soaked in a solution of alkali hydroxide to remove it.

According to the above-described CRT face panel surface generation film processing apparatus, the generation film 6 for the antireflection film coated on the face panel surface of the CRT can be chemically removed, and the space between the side surface of the face panel and the explosion-proof band can be reduced. Since the abrasive particles of the polishing agent do not enter the pits, pits are not formed on the glass surface of the face panel, and pinholes are not generated in the regenerated film, the yield at the time of regenerating the generated film is significantly improved. You can

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION The method for treating a cathode ray tube face panel surface formed film according to the present invention will be described in detail below with reference to FIGS. FIG. 1 is an overall configuration diagram showing the produced film processing method of this example, and FIG. 2 is a process explanatory diagram of this example.

Prior to the description of FIG. 1 showing the method of treating the produced film of the present example, the flow of the whole process for removing the produced film (antireflection film) 6 of the CRT and reproducing it will be explained with reference to FIG. To do.

In a color CRT, an explosion-proof band 7 (see FIG. 1)
At the final stage of mounting (see FIG. 3) or the like, the antireflection film 6 described with reference to FIG. 3 is coated on the surface of the face panel 2 by a sputtering method or the like.

Thus, step S in FIG.₁Production film indicated by
Step when the coating such as sputtering is completed
S_TwoThe production film 6 is inspected.
S _ThreeThe product is in the shipping state as shown in
Up S_FourThe production film for removing the production film 6 of this example as shown in
In the processing step, first, step S_FourIn the solution tank like
Hydrolyze so that the temperature is about 60 ° C to 70 ° C ± 2 ° C.
The alkaline solution is heated and stirred to keep the temperature constant.

Next, the produced film 6 portion coated on the surface of the face panel of the CRT 1 is immersed in an alkali hydroxide solution as in step S ₅ .

Next, a predetermined set time, for example, 30 minutes to 4
In a state where the generation film 6 coated on the face panel of the CRT is immersed for 0 minutes to dissolve and remove the generation film 6, the next step S ₇ is to carry out the face panel 2 of the CRT.
Rinse the surface with water.

Further, as in step S ₈ , the surface of the face panel 2 is lightly wiped with a cloth containing cerium oxide or the like, and in step S ₉ , the face panel surface is inspected.
If the inspection result is bad, it is discarded as in step S ₁₀ , but if it is determined to be a good product, the process returns to step S ₁ and the process of coating the face film surface with the generated film 6 again is performed. The CRT will be played back.

Formed film 6 in the above-mentioned alkali hydroxide solution
A processing method for removing the will be described with reference to FIG.

The CRT 1 judged as defective in FIG. 1 is brought onto the solution tank 10 via the suspension moving device 8.

In the CRT 1, as shown in FIG. 1, the surface of the face panel 2 is coated with a generation film 6 as an antireflection film, and an explosion-proof band 7 is provided near the seal line between the face panel and the funnel. Since the band 7 made of metal is surrounded so as to apply an internal pressure to the alkali hydroxide solution 12 injected into the solution tank 10.
Alkali hydroxide solution 1 to prevent corrosion
2 is covered with a mask plate 11, and in the center of the mask plate 11, the alkali hydroxide solution 12 extends to the face panel surface of the CRT 1 or to the vicinity of the skirt portion of the face panel.
A through hole 11a that can project inside is bored.

Alkali hydroxide solution (hereinafter referred to as solution) 1
A heater 13 is inserted in the unit 2. This heater 13
A coil portion 13a formed by winding a glass tube or the like that is not corroded by the solution 12 in a coil shape is disposed inside the solution 12, and its inlet and outlet are connected to a steam source 14.

Further, a stirring blade of a stirrer 15 for making the temperature of the solution 12 in the solution tank 10 uniform is inserted into the solution 12 and stirred by the motor 16. 17 is the same solution 1
2 is a temperature sensor for detecting the temperature inside. Needless to say, the stirring blade and the temperature sensor 17 are selected from materials that are not corroded by the solution 12.

The above-described motor 16, temperature sensor 17, and steam source 14 are microcomputers (hereinafter CPUs).
18). That is, the motor 16 for the agitator 15 is controlled by the motor drive circuit 19 via the CPU 18. Similarly, the steam of the steam source 14 is supplied to the heater 13
The steam drive circuit 22 for injecting or stopping
The temperature control circuit 21, which is controlled by the PU 18 and controls the temperature of the steam source 14 or the heater 13, is also CP.
It is designed to be controlled by U18.

With the above-described structure, the removal work of the formed film 6 is easier to automate than the conventional manual work by buffing, and since the formed film 6 is chemically dissolved, there is no pit defect. Therefore, the defective rate during the recycling process is 20% of the conventional rate.
It was possible to make it 5% or less with respect to 30%.

Examples of the above-mentioned alkali hydroxide solution 12 will be described below. Example 1 Sodium hydroxide (N
As for the concentration of aOH) in water, the normality is set to 10 N (normal), the temperature is set to 60 ° C. ± 2 ° C., heating and constant temperature are performed, and CR is applied from the through hole 11 a of the mask 11 of the solution tank 10.
The coating portion of the T face panel 2 on which the generation film 6 is formed is immersed to dissolve and remove the generation film 6. The time required to complete the process at this time was 30 minutes.

Example 2 Potassium hydroxide (KO) was used as the above-mentioned alkali hydroxide solution.
As for the concentration of H) in water, the normality is set to 15 N (normal), the temperature is set to 70 ° C. ± 2 ° C., heating and thermostatting are performed, and the through hole 11a of the mask 11 of the solution tank 10 causes the CRT face panel 2 The coating portion on which the generation film 6 is formed is immersed to dissolve and remove the generation film 6. The time required to complete the process at this time was 40 minutes.

In the above, as the alkali hydroxide solution, Na
OH or KOH was used, but the normality is about 10N, which is an economical concentration. Explaining in the case of NaOH, the reaction becomes very slow and takes a long time at a concentration of 9 N or less in normality, and the production film 6 remains unusable in practice. Further, when the normality is 16N or more, the glass breaks on the face panel surface and the reaction hardly changes, so that the normal use concentration range is normality 10N to 15N (superposition%).
It is preferable to use NaOH in a ratio of 30 to 40% with respect to water.

Further, the temperature of the solution also becomes a major factor for dissolving the production film 6, and it is necessary to constantly stir and heat by controlling the temperature at about ± 2 ° C., and if the solution temperature is 50 ° C. or less, the reaction becomes extremely slow. The workability is poor, and it is necessary to keep at least 60 ° C. or higher. On the contrary, when the temperature is too high, the service life of the solution is drastically shortened. That is, the reaction is fast, but glass breakage occurs due to the temperature difference, so the optimum temperature is 60 ° C to 7 ° C.
0 ° C is an economical temperature.

Further, the immersion time in the solution is largely influenced by the adhesive force of the produced film coated on the surface of the face panel of the color CRT1 to be treated, but it is usually 30 minutes to 4 minutes.
It was found that it takes about 0 minutes.

Since the present invention is configured as described above, the formed film can be chemically removed while the explosion-proof band 7 is attached, and the automation is easy, and the pit defect and the pin at the time of reproduction can be prevented. It is possible to prevent the occurrence of holes.

In the above-mentioned embodiment, the case where one solution tank is provided has been described. However, since the time required for removing the formed film is nearly 40 minutes, a plurality of solution tanks are arranged in parallel in order to improve the capacity. It is clear that it can be processed.

[0034]

EFFECTS OF THE INVENTION According to the method of treating a generated film on the surface of a cathode ray tube face panel of the present invention, pit defects after removal of the generated film and pinholes during reproduction are eliminated, automation is easy, and the defect rate is 5% or less. You get something that can be reduced.

[Brief description of drawings]

FIG. 1 is an explanatory view of a method for treating a generated film on a face panel surface of a cathode ray tube according to the present invention.

FIG. 2 is a process explanatory diagram of a method for processing a generated film on a cathode ray tube face panel surface of the present invention.

FIG. 3 is an explanatory diagram of a conventional antireflection film.

[Explanation of symbols]

1 CRT, 2 face panel, 6 generation film (antireflection film), 10 solution tank, 11 mask, 12
Alkali hydroxide solution, 13 heater, 15 stirrer

Claims (3)

[Claims] 1. A method of treating a produced film on a face panel surface of a cathode ray tube, wherein the produced film on the face panel surface of the cathode ray tube is removed by sputtering. The method for treating a produced film on a face panel surface of a cathode ray tube, which comprises immersing the film in the solution to remove it. 2. The cathode ray tube according to claim 1, wherein the normality of the concentration of the alkali hydroxide contained in water is 10 to 15 N (normal) and the liquid temperature is 60 ° to 70 °. A method for treating a generated film on a face panel surface. 3. The method for treating a formed film on a face panel surface of a cathode ray tube according to claim 1, wherein the alkali hydroxide solution is a sodium hydroxide solution or a potassium hydroxide solution. .