[go: up one dir, main page]

JPH09293221A - Magnetic head slider and method of manufacturing the same - Google Patents

Magnetic head slider and method of manufacturing the same

Info

Publication number
JPH09293221A
JPH09293221A JP10548296A JP10548296A JPH09293221A JP H09293221 A JPH09293221 A JP H09293221A JP 10548296 A JP10548296 A JP 10548296A JP 10548296 A JP10548296 A JP 10548296A JP H09293221 A JPH09293221 A JP H09293221A
Authority
JP
Japan
Prior art keywords
air bearing
slider
bearing surface
magnetic head
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10548296A
Other languages
Japanese (ja)
Inventor
Taku Toyoguchi
卓 豊口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10548296A priority Critical patent/JPH09293221A/en
Publication of JPH09293221A publication Critical patent/JPH09293221A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

(57)【要約】 【課題】 スライダ部の浮上面と略直交する空気流出端
側の端面に、磁気ヘッド素子部が形成され、この磁気ヘ
ッド素子部が素子保護膜で覆われた磁気ヘッドスライダ
であって、スペーシングロスが小さい磁気ヘッドスライ
ダを実現すること、並びに、上記磁気ヘッドスライダを
作製するのに最適な製造方法を実現することを目的とす
る。 【解決手段】 浮上時に、素子保護膜73の浮上面上の
磁気ヘッド素子位置での浮上量が、スライダ部71及び
素子保護膜73の各浮上面上の空気流出端位置近傍での
浮上量と略等しくなるように、素子保護膜73部分の浮
上面を加工する。この時、素子保護膜73若しくはスラ
イダ部71の少なくとも一方の温度を制御することによ
り、スライダ部71の浮上面に対して素子保護膜73の
浮上面をラップ板から退く方向又は近づく方向に変位さ
せ、素子保護膜73の浮上面を所望の形状にラッピング
する。
Kind Code: A1 A magnetic head slider in which a magnetic head element portion is formed on an end surface on the air outflow end side substantially orthogonal to an air bearing surface of a slider portion, and the magnetic head element portion is covered with an element protective film. It is an object of the present invention to realize a magnetic head slider having a small spacing loss, and an optimum manufacturing method for manufacturing the magnetic head slider. When flying, the flying height at the magnetic head element position on the air bearing surface of the element protection film 73 is the same as the flying height near the air outflow end position on each air bearing surface of the slider portion 71 and the element protection film 73. The air bearing surface of the element protection film 73 is processed so as to be substantially equal. At this time, by controlling the temperature of at least one of the element protection film 73 and the slider portion 71, the air bearing surface of the element protection film 73 is displaced in the direction of receding from or approaching the air bearing surface of the slider portion 71. The air bearing surface of the element protection film 73 is lapped into a desired shape.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、磁気ディスク装置
等に用いられる磁気ヘッドスライダ、更に詳しくは、ス
ライダ部の浮上面と略直交する空気流出端側の端面に、
磁気ヘッド素子部が形成され、この磁気ヘッド素子部が
素子保護膜で覆われた磁気ヘッドスライダ、並びに、上
記磁気ヘッドスライダの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head slider used in a magnetic disk device or the like, and more specifically, to an air outflow end side surface of the slider portion which is substantially orthogonal to the air bearing surface.
The present invention relates to a magnetic head slider in which a magnetic head element portion is formed and the magnetic head element portion is covered with an element protection film, and a method for manufacturing the magnetic head slider.

【0002】[0002]

【従来の技術】磁気ディスク装置の小型化に伴い、磁気
ヘッドスライダの小型化も進められてきた。小型化に適
する磁気ヘッドスライダとしては、例えば、磁気抵抗効
果型ヘッド(MRヘッド;MRはmagnetoresistiveの
略)を再生用のヘッドとし、薄膜ヘッドを記録用のヘッ
ドとして組み合わせた、複合型の磁気ヘッドをスライダ
部の浮上面と略直交する空気流出端側の端面に形成した
ものが知られている。
2. Description of the Related Art With the miniaturization of magnetic disk devices, miniaturization of magnetic head sliders has also been promoted. A magnetic head slider suitable for miniaturization is, for example, a composite magnetic head in which a magnetoresistive head (MR head; MR is an abbreviation for magnetoresistive) is used as a reproducing head and a thin film head is combined as a recording head. It is known that the slider is formed on the end face on the air outflow end side that is substantially orthogonal to the air bearing surface of the slider portion.

【0003】図5はこの磁気ヘッドスライダの一例の主
要部を示す図、図6は図5中の磁気抵抗効果素子部及び
導体層を示す平面図である。これらの図において、10
はディスク(磁気記録媒体)のトラック、20はディス
クへの情報の記録を行う薄膜ヘッドでなる記録ヘッド
部、30は情報の読み出しを行う磁気抵抗効果型ヘッド
でなる再生ヘッド部である。記録ヘッド部20は、Ni
Fe等でなる下部磁極(上部シールド層)21と、トラ
ックとの対向部分が一定間隔をもって下部磁極21と対
向したNiFe等でなる上部磁極22と、これら磁極2
1,22を励磁し、記録ギャップ部分にて、ディスクの
記録トラック10に情報の記録を行わせるコイル23等
から構成される。尚、コイル23周辺の空間には、Al
23等でなる非磁性絶縁層24が隙間なく設けられてい
る。
FIG. 5 is a view showing a main part of an example of this magnetic head slider, and FIG. 6 is a plan view showing a magnetoresistive effect element part and a conductor layer in FIG. In these figures, 10
Is a track of a disk (magnetic recording medium), 20 is a recording head section which is a thin film head for recording information on the disk, and 30 is a reproducing head section which is a magnetoresistive head for reading information. The recording head unit 20 is made of Ni
A lower magnetic pole (upper shield layer) 21 made of Fe or the like, an upper magnetic pole 22 made of NiFe or the like facing the lower magnetic pole 21 at a portion facing the track at a constant interval, and these magnetic poles 2
It is composed of a coil 23 and the like for exciting information on the recording track 10 of the disc by exciting the recording medium 1 and 22 at the recording gap portion. In the space around the coil 23, Al
A nonmagnetic insulating layer 24 made of 2 O 3 or the like is provided without any gap.

【0004】再生ヘッド部30は、例えばAMRヘッド
(AMRは anisotropic magnetoresistiveの略)等で
もって構成されるものであり、その磁気抵抗効果素子部
30A上には、磁気抵抗効果素子部30Aにセンス電流
を供給するための一対の導体層31が記録トラック幅に
相応する間隔をもって設けられている。
The reproducing head section 30 is composed of, for example, an AMR head (AMR is an abbreviation for anisotropic magnetoresistive) or the like. On the magnetoresistive effect element section 30A, a sense current is supplied to the magnetoresistive effect element section 30A. A pair of conductor layers 31 for supplying the magnetic field are provided at intervals corresponding to the recording track width.

【0005】記録ヘッド部20と再生ヘッド部30の積
層状態を図7を用いて説明する。図7は図5における磁
気ヘッドをディスク側から見たときのギャップ近傍の積
層構造を示す断面図である。図7において、25はヘッ
ド基板で、スライダ部を形成するものである。このヘッ
ド基板25上には、Al23等でなる非磁性絶縁層2
6、NiFe等でなる下部シールド層27、Al23
でなる非磁性絶縁層28が、この順序で形成されて、ヘ
ッド基板25側の素子保護膜を構成している。
The stacked state of the recording head section 20 and the reproducing head section 30 will be described with reference to FIG. FIG. 7 is a sectional view showing a laminated structure in the vicinity of the gap when the magnetic head in FIG. 5 is viewed from the disk side. In FIG. 7, reference numeral 25 is a head substrate which forms a slider portion. The non-magnetic insulating layer 2 made of Al 2 O 3 or the like is formed on the head substrate 25.
6, the lower shield layer 27 made of NiFe or the like, and the non-magnetic insulating layer 28 made of Al 2 O 3 or the like are formed in this order to form an element protective film on the head substrate 25 side.

【0006】再生ヘッド部30の磁気抵抗効果素子部3
0Aは、この非磁性絶縁層28上に形成されている。仮
に、再生ヘッド部30の磁気抵抗効果素子部30AをA
MRヘッドでもって構成するのであれば、例えば、ソフ
トアジャセント層、Ta等の非磁性中間層、NiFe等
の磁気抵抗層、FeMn等のBCS層が非磁性絶縁層2
8上に順次形成されている。この磁気抵抗効果素子部3
0A上には、磁気抵抗効果素子部30Aにセンス電流を
供給するために、一対の導体層31が記録トラック幅に
相応する間隔をもって形成されている。
The magnetoresistive effect element section 3 of the reproducing head section 30.
0A is formed on the nonmagnetic insulating layer 28. If the magnetoresistive effect element section 30A of the reproducing head section 30 is
In the case of the MR head, for example, a soft adjusting layer, a non-magnetic intermediate layer such as Ta, a magnetoresistive layer such as NiFe, and a BCS layer such as FeMn are used as the non-magnetic insulating layer 2.
8 are sequentially formed. This magnetoresistive effect element section 3
On the 0A, a pair of conductor layers 31 are formed at intervals corresponding to the recording track width in order to supply a sense current to the magnetoresistive effect element section 30A.

【0007】更に、磁気抵抗効果素子部30A及び導体
層31上には、非磁性絶縁層32が形成され、この上に
前述の記録ヘッド部20が形成されている。即ち、Ni
Fe等でなる下部磁極(上部シールド層)21、コイル
23(図7中には現れない)、Al23等でなる非磁性
絶縁層24、NiFe等でなる上部磁極22が、この順
序で形成されている。そして最後に記録ヘッド部20の
表面を覆うため、上部磁極22の外側に素子保護膜33
が形成されている。
Further, a nonmagnetic insulating layer 32 is formed on the magnetoresistive effect element section 30A and the conductor layer 31, and the above-described recording head section 20 is formed on this. That is, Ni
A lower magnetic pole (upper shield layer) 21 made of Fe or the like, a coil 23 (not shown in FIG. 7), a nonmagnetic insulating layer 24 made of Al 2 O 3 or the like, and an upper magnetic pole 22 made of NiFe or the like are arranged in this order. Has been formed. Finally, in order to cover the surface of the recording head portion 20, the element protection film 33 is formed on the outer side of the upper magnetic pole 22.
Are formed.

【0008】上記構成の磁気ヘッドを製造するに際して
は、図8に示すように、多数の磁気ヘッド1を、二次
元的配列でもって円板状のウエハ(ヘッド基板)2上に
成膜するウエハ工程と、複数の磁気ヘッド1が直線状
に配列されたブロック3をウエハ2から切り出す切り出
し工程と、ブロック単位で磁気抵抗効果型ヘッドの素
子高さや薄膜ヘッドのギャップ深さを所定の値にするた
め、浮上面(ラップ面3a)の加工を行うと共に、機械
研削又はイオンミリング等によりレール4の形成を行う
加工工程と、この加工工程終了後のブロックを分割し
て個々の磁気ヘッドを作製する分割工程とを経る。
In manufacturing the magnetic head having the above structure, as shown in FIG. 8, a large number of magnetic heads 1 are formed on a disk-shaped wafer (head substrate) 2 in a two-dimensional arrangement. Steps, a step of cutting out a block 3 in which a plurality of magnetic heads 1 are linearly arranged from the wafer 2, and the element height of the magnetoresistive head and the gap depth of the thin film head are set to predetermined values in block units. Therefore, an air bearing surface (lap surface 3a) is processed, and a processing step of forming the rail 4 by mechanical grinding or ion milling, and a block after the processing step is divided into individual magnetic heads. It goes through a dividing process.

【0009】磁気抵抗効果型ヘッドの素子高さ(図5の
磁気抵抗効果素子部30Aの上下方向の幅)や薄膜ヘッ
ドのギャップ深さ(図5の記録ギャップ10部分の上下
方向の幅)は、磁気ヘッドの特性に重要な影響を与える
ため、浮上面の加工はラッピングにより正確に行う。こ
こで、ラッピングとは、工作物とラップ板との間にダイ
ヤモンドスラリー等の微細な粒子をラップ剤として供給
し、適当なラップ圧力の下に工作物とラップ板とを相対
運動させ、ラップ剤粒子の切刃によって工作物を微小量
ずつ削り取って、工作物表面を滑らかに且つ寸法精度よ
く加工する精密加工法の一種である。
The element height of the magnetoresistive head (vertical width of the magnetoresistive element portion 30A in FIG. 5) and the gap depth of the thin film head (vertical width of the recording gap 10 portion in FIG. 5) are Since the characteristics of the magnetic head are affected significantly, the air bearing surface is accurately processed by lapping. Here, the lapping is performed by supplying fine particles such as diamond slurry as a lapping agent between the workpiece and the lapping plate, and by relatively moving the workpiece and the lapping plate under an appropriate lapping pressure, This is a type of precision machining method that grinds the work piece in minute amounts by the cutting edge of the particles to machine the work piece surface smoothly and with high dimensional accuracy.

【0010】[0010]

【発明が解決しようとする課題】ところで、スライダ部
と素子保護膜とはその材料が異なるために、加工性にお
いても相違があり、上記浮上面形成時に通常のラッピン
グを行うと、ラップ面に段差が生じる。一般にスライダ
部よりも素子保護膜の方がラップ仕上げ量(加工量)が
大きく、凹むことになる。
By the way, since the slider portion and the element protection film are made of different materials, there is a difference in workability as well. If ordinary lapping is performed when the air bearing surface is formed, a step is formed on the lap surface. Occurs. In general, the lapping amount (working amount) of the element protective film is larger than that of the slider portion, and the element protective film is dented.

【0011】図9はこの段差が生じた磁気ヘッドスライ
ダの浮上姿勢を示す図である。図9から明らかなよう
に、段差が大きいと、素子保護膜51(前述の素子保護
膜33に相当)の浮上面上の磁気ヘッド素子位置(前述
の磁気抵抗効果型ヘッドの磁気抵抗効果素子部30A先
端や薄膜ヘッドの記録ギャップ先端に相当。言い換えれ
ば、磁気ヘッド素子部の先端)での浮上量H1が、スラ
イダ部52の浮上面上の空気流出端位置での浮上量H2
よりもかなり大きくなる。
FIG. 9 is a diagram showing the flying posture of the magnetic head slider in which this step is generated. As is clear from FIG. 9, when the step is large, the magnetic head element position on the air bearing surface of the element protective film 51 (corresponding to the element protective film 33 described above) (the magnetoresistive effect element portion of the magnetoresistive head described above). It corresponds to the tip of 30A or the tip of the recording gap of the thin film head (in other words, the flying height H1 at the magnetic head element portion) is the flying height H2 at the air outflow end position on the air bearing surface of the slider portion 52.
Will be much larger than

【0012】ここで、感度上は、磁気ヘッドスライダを
ディスク面に限りなく近づけることが好ましい。しか
し、クラッシュとの関係で、最低確保すべき浮上量があ
る。図9の構成では、浮上量H2をこの最低浮上量に等
しく選ぶことになる。従って、図9の構成では、大きな
スペーシングロス(H1−H2)が生じ、磁気ヘッド素
子部53の先端とディスク面60との実質の間隔(浮上
量H1)も大きくなり、感度低下を招くことになる。
Here, in terms of sensitivity, it is preferable to bring the magnetic head slider as close as possible to the disk surface. However, in relation to the crash, there is a minimum amount of levitation to secure. In the configuration of FIG. 9, the flying height H2 is selected to be equal to this minimum flying height. Therefore, in the configuration of FIG. 9, a large spacing loss (H1−H2) occurs, the substantial distance between the tip of the magnetic head element portion 53 and the disk surface 60 (flying amount H1) also increases, and the sensitivity is lowered. become.

【0013】一方、加工時間を犠牲にしてラップ圧力を
極端に小さくし、段差が生じないようにゆっくりと加工
した場合でも、スペーシングロスによる感度低下は生じ
る。図10はこのようにして得た磁気ヘッドスライダの
浮上姿勢を示す図である。図10から明らかなように、
この場合、素子保護膜51の浮上面上の空気流出端の角
部が突出しており、素子保護膜51の浮上面上の磁気ヘ
ッド素子位置での浮上量H1が、素子保護膜51の浮上
面上の空気流出端の角部での浮上量H3よりもかなり大
きくなっている。
On the other hand, even if the lapping pressure is extremely reduced at the sacrifice of the machining time and the machining is performed slowly so as not to cause a step, the sensitivity is lowered due to the spacing loss. FIG. 10 is a diagram showing the flying posture of the magnetic head slider thus obtained. As is clear from FIG.
In this case, the corner of the air outflow end on the air bearing surface of the element protection film 51 is projected, and the flying height H1 at the magnetic head element position on the air bearing surface of the element protection film 51 is the air bearing surface of the element protection film 51. It is considerably larger than the flying height H3 at the corner of the upper air outflow end.

【0014】図10の磁気ヘッドスライダでは、この角
部の浮上量H3を上記最低浮上量と等しく選ぶことにな
る。従って、大きなスペーシングロス(H1−H3)が
生じ、磁気ヘッド素子部53の先端とディスク面60と
の実質の間隔が大きくなり、感度低下を招くことにな
る。尚、図10の場合、角部がディスク面に当接するた
め、ディスクの磨耗が激しいという問題もある。
In the magnetic head slider of FIG. 10, the flying height H3 at this corner is selected to be equal to the above minimum flying height. Therefore, a large spacing loss (H1 to H3) occurs, the substantial distance between the tip of the magnetic head element portion 53 and the disk surface 60 becomes large, and the sensitivity is lowered. In addition, in the case of FIG. 10, since the corners contact the disk surface, there is also a problem that the disk is heavily worn.

【0015】本発明は、上記問題点に鑑みてなされたも
ので、第1の課題は、スペーシングロスが小さい磁気ヘ
ッドスライダを実現することにあり、第2の課題は、ス
ペーシングロスが小さい磁気ヘッドスライダを作製する
のに最適な磁気ヘッドスライダの製造方法を実現するこ
とにある。
The present invention has been made in view of the above problems. A first problem is to realize a magnetic head slider having a small spacing loss, and a second problem is a small spacing loss. It is to realize a method of manufacturing a magnetic head slider that is most suitable for manufacturing a magnetic head slider.

【0016】[0016]

【課題を解決するための手段】上記第1の課題を解決す
る磁気ヘッドスライダに関する本発明は、スライダ部の
浮上面と略直交する空気流出端側の端面に、磁気ヘッド
素子部が形成され、この磁気ヘッド素子部が素子保護膜
で覆われた磁気ヘッドスライダにおいて、浮上時に、前
記スライダ部及び前記素子保護膜の各浮上面上の空気流
出端位置近傍での浮上量が、前記素子保護膜の浮上面上
の磁気ヘッド素子位置での浮上量と略等しくなるよう
に、前記素子保護膜部分の浮上面を加工したことを特徴
とするものである。
SUMMARY OF THE INVENTION The present invention relates to a magnetic head slider that solves the above-mentioned first problem, in which a magnetic head element portion is formed on an end face on the air outflow end side which is substantially orthogonal to the air bearing surface of the slider portion. In the magnetic head slider in which the magnetic head element portion is covered with an element protective film, when flying, the flying height near the air outflow end position on each air bearing surface of the slider portion and the element protective film is the element protective film. The air bearing surface of the element protective film portion is processed so as to be approximately equal to the flying height at the position of the magnetic head element on the air bearing surface.

【0017】本発明の磁気ヘッドスライダでは、磁気ヘ
ッドスライダの浮上時に、スライダ部及び素子保護膜の
各浮上面上の空気流出端位置近傍での浮上量が、素子保
護膜の浮上面上の磁気ヘッド素子位置での浮上量と略等
しくなる。このため、磁気ヘッドスライダとしての最低
浮上量と素子保護膜の浮上面上の磁気ヘッド素子位置で
の浮上量とが略等しくなり、スペーシングロスがほとん
どなくなる。よって、磁気ヘッド素子部の先端とディス
ク面との間隔を小さくでき、スペーシングロスによる感
度低下を避けることができる。
In the magnetic head slider according to the present invention, when the magnetic head slider is flying, the flying height in the vicinity of the air outflow end position on each air bearing surface of the slider portion and the element protection film is determined by the magnetic force on the air bearing surface of the element protection film. It is almost equal to the flying height at the head element position. Therefore, the minimum flying height of the magnetic head slider and the flying height at the magnetic head element position on the air bearing surface of the element protection film become substantially equal, and spacing loss is almost eliminated. Therefore, it is possible to reduce the distance between the tip of the magnetic head element and the disk surface, and avoid a decrease in sensitivity due to spacing loss.

【0018】素子保護膜部分の浮上面をスライダ部の浮
上面に対して傾斜した略平面とすれば、素子保護膜部分
の浮上面の加工が容易になる。上記第2の課題を解決す
る磁気ヘッドスライダの製造方法に関する第1の発明
は、スライダ部の浮上面と略直交する空気流出端側の端
面に、磁気ヘッド素子部が形成され、この磁気ヘッド素
子部が素子保護膜で覆われた磁気ヘッドスライダの製造
方法であって、前記スライダ部及び前記素子保護膜の両
浮上面をラッピングする工程を含む磁気ヘッドスライダ
の製造方法において、前記スライダ部及び前記素子保護
膜の材料として、線膨張係数が異なるものを選択すると
共に、前記スライダ部及び前記素子保護膜の両浮上面を
ラッピングする工程時に、前記素子保護膜若しくは前記
スライダ部の少なくとも一方の温度を制御することによ
り、前記スライダ部の浮上面に対して前記素子保護膜の
浮上面をラップ板から退く方向に変位させ、この状態
で、前記スライダ部及び前記素子保護膜の両浮上面をラ
ッピングすることを特徴とするものである。
If the air bearing surface of the element protective film portion is formed into a substantially flat surface inclined with respect to the air bearing surface of the slider portion, the air bearing surface of the element protective film portion can be easily processed. A first invention relating to a method of manufacturing a magnetic head slider that solves the above-mentioned second problem, wherein a magnetic head element portion is formed on an end face on the air outflow end side that is substantially orthogonal to the air bearing surface of the slider portion. A method of manufacturing a magnetic head slider, a portion of which is covered with an element protection film, comprising: lapping both air bearing surfaces of the slider portion and the element protection film. As the material of the element protection film, those having different linear expansion coefficients are selected, and at the time of lapping both the air bearing surfaces of the slider portion and the element protection film, the temperature of at least one of the element protection film and the slider portion is controlled. By controlling, the air bearing surface of the element protection film is displaced in the direction of receding from the lap plate with respect to the air bearing surface of the slider portion, In, and is characterized in that wrapping both air bearing surface of the slider section and the element protecting film.

【0019】この製造方法では、素子保護膜若しくはス
ライダ部の少なくとも一方の温度を制御し、スライダ部
の浮上面に対して素子保護膜の浮上面をラップ板から退
く方向に変位させた状態で、スライダ部及び素子保護膜
の両浮上面をラッピングする。このため、仮にラッピン
グ圧力を高くして加工速度を高めても、スライダ部の浮
上面に対する素子保護膜の浮上面の段差の発生を低減さ
せることができる。
In this manufacturing method, the temperature of at least one of the element protective film and the slider portion is controlled, and the air bearing surface of the element protective film is displaced with respect to the air bearing surface of the slider portion in the direction of receding from the lap plate. Lapping is performed on both the air bearing surface of the slider portion and the element protection film. Therefore, even if the lapping pressure is increased to increase the processing speed, it is possible to reduce the occurrence of a step on the air bearing surface of the element protection film with respect to the air bearing surface of the slider portion.

【0020】上記第2の課題を解決する磁気ヘッドスラ
イダの製造方法に関する第2の発明は、スライダ部の浮
上面と略直交する空気流出端側の端面に、磁気ヘッド素
子部が形成され、この磁気ヘッド素子部が素子保護膜で
覆われた磁気ヘッドスライダの製造方法であって、前記
スライダ部及び前記素子保護膜の両浮上面をラッピング
する工程を含む磁気ヘッドスライダの製造方法におい
て、前記スライダ部及び前記素子保護膜の材料として、
線膨張係数が異なるものを選択すると共に、前記スライ
ダ部及び前記素子保護膜の両浮上面をラッピングする工
程時に、前記素子保護膜若しくは前記スライダ部の少な
くとも一方の温度を制御することにより、前記スライダ
部の浮上面に対して前記素子保護膜の浮上面をラップ板
に近づく方向に変位させ、この状態で、前記スライダ部
及び前記素子保護膜の両浮上面をラッピングすることを
特徴とするものである。
A second invention relating to a method of manufacturing a magnetic head slider that solves the above-mentioned second problem is such that a magnetic head element portion is formed on an end face on the air outflow end side which is substantially orthogonal to an air bearing surface of a slider portion. A method of manufacturing a magnetic head slider having a magnetic head element portion covered with an element protective film, comprising: lapping both air bearing surfaces of the slider portion and the element protective film. As a material of the part and the element protective film,
By selecting those having different linear expansion coefficients, and controlling the temperature of at least one of the element protection film and the slider section during the step of lapping both the air bearing surfaces of the slider section and the element protection film, the slider The air bearing surface of the element protection film is displaced in the direction of approaching the lap plate with respect to the air bearing surface of the portion, and in this state, both air bearing surfaces of the slider portion and the element protection film are lapped. is there.

【0021】この製造方法では、素子保護膜若しくはス
ライダ部の少なくとも一方の温度を制御し、スライダ部
の浮上面に対して素子保護膜の浮上面をラップ板に近づ
く方向に変位させた状態で、スライダ部及び素子保護膜
の両浮上面をラッピングする。このため、素子保護膜の
浮上面の加工において、空気流出端側部分をより多くラ
ッピングすることができる。
In this manufacturing method, the temperature of at least one of the element protective film and the slider portion is controlled, and the air bearing surface of the element protective film is displaced with respect to the air bearing surface of the slider portion in a direction approaching the lap plate. Lapping is performed on both the air bearing surface of the slider portion and the element protection film. Therefore, in processing the air bearing surface of the element protective film, the air outflow end side portion can be more lapped.

【0022】上記第2の課題を解決する磁気ヘッドスラ
イダの製造方法に関する第3の発明は、スライダ部の浮
上面と略直交する空気流出端側の端面に、磁気ヘッド素
子部が形成され、この磁気ヘッド素子部が素子保護膜で
覆われた磁気ヘッドスライダの製造方法であって、前記
スライダ部及び前記素子保護膜の両浮上面をラッピング
する工程を含む磁気ヘッドスライダの製造方法におい
て、前記スライダ部及び前記素子保護膜の材料として、
線膨張係数が異なるものを選択すると共に、前記スライ
ダ部及び前記素子保護膜の両浮上面をラッピングする工
程を少なくとも二段構成とし、一段目のラッピング工程
では、前記素子保護膜若しくは前記スライダ部の少なく
とも一方の温度を制御することにより、前記スライダ部
の浮上面に対して前記素子保護膜の浮上面をラップ板か
ら退く方向に変位させ、この状態で、前記スライダ部及
び前記素子保護膜の両浮上面をラッピングし、二段目の
ラッピング工程では、前記素子保護膜若しくは前記スラ
イダ部の少なくとも一方の温度を制御することにより、
前記スライダ部の浮上面に対して前記素子保護膜の浮上
面をラップ板に近づく方向に変位させ、この状態で、前
記スライダ部及び前記素子保護膜の両浮上面をラッピン
グすることを特徴とするものである。
According to a third aspect of the present invention relating to a method of manufacturing a magnetic head slider that solves the above-mentioned second problem, a magnetic head element portion is formed on an end face on the air outflow end side which is substantially orthogonal to the air bearing surface of the slider portion. A method of manufacturing a magnetic head slider having a magnetic head element portion covered with an element protective film, comprising: lapping both air bearing surfaces of the slider portion and the element protective film. As a material of the part and the element protective film,
In addition to selecting those having different linear expansion coefficients, the step of lapping both the air bearing surfaces of the slider portion and the element protective film is made into at least two stages, and in the first step of lapping, the element protective film or the slider portion is formed. By controlling the temperature of at least one of the sliders, the air bearing surface of the element protection film is displaced with respect to the air bearing surface of the slider portion in the direction of receding from the lap plate. Lapping the air bearing surface, in the second lapping step, by controlling the temperature of at least one of the element protective film or the slider portion,
The air bearing surface of the element protection film is displaced with respect to the air bearing surface of the slider portion in a direction approaching the lap plate, and in this state, both air bearing surfaces of the slider portion and the element protection film are lapped. It is a thing.

【0023】この製造方法では、一段目のラッピング工
程において、素子保護膜若しくはスライダ部の少なくと
も一方の温度を制御し、スライダ部の浮上面に対して素
子保護膜の浮上面をラップ板から退く方向に変位させた
状態で、スライダ部及び素子保護膜の両浮上面をラッピ
ングする。このラッピング時に、仮にラッピング圧力を
高くして加工速度を高めても、スライダ部の浮上面に対
する素子保護膜の浮上面の段差を発生させることなく、
加工を進めることができる。
In this manufacturing method, in the first lapping step, the temperature of at least one of the element protective film and the slider portion is controlled so that the air bearing surface of the element protective film is retracted from the lap plate with respect to the air bearing surface of the slider portion. The slider and the air bearing surface of the element protective film are lapped in the state of being displaced. At the time of this lapping, even if the lapping pressure is increased to increase the processing speed, a step on the air bearing surface of the element protection film with respect to the air bearing surface of the slider portion is not generated.
Processing can proceed.

【0024】続く二段目のラッピング工程においては、
素子保護膜若しくはスライダ部の少なくとも一方の温度
を制御し、スライダ部の浮上面に対して素子保護膜の浮
上面をラップ板に近づく方向に変位させた状態で、スラ
イダ部及び素子保護膜の両浮上面をラッピングする。こ
の工程では、素子保護膜の浮上面の加工に関し、空気流
出端側部分をより多くラッピングする。
In the subsequent second lapping step,
While controlling the temperature of at least one of the element protection film and the slider part and displacing the air bearing surface of the element protection film toward the wrap plate with respect to the air bearing surface of the slider part, both the slider part and the element protection film are Lapping the air bearing surface. In this step, regarding the processing of the air bearing surface of the element protection film, the air outflow end side portion is more lapped.

【0025】従って、一段目及び二段目のラッピング工
程を経ることで、スライダ部の浮上面に対する素子保護
膜の浮上面の段差を発生させることなく、しかも、素子
保護膜の浮上面の加工に関し空気流出端側部分をより多
くラッピングできる。よって、素子保護膜部分の浮上面
がスライダ部の浮上面に対して傾斜した略平面となり、
浮上時には、素子保護膜の浮上面上の磁気ヘッド素子位
置での浮上量が、スライダ部及び素子保護膜の各浮上面
上の空気流出端位置近傍での浮上量と略等しい磁気ヘッ
ドスライダを作製できる。
Therefore, by performing the lapping process of the first step and the second step, the step of the air bearing surface of the element protective film with respect to the air bearing surface of the slider portion is not generated, and the air bearing surface of the element protective film is processed. It is possible to wrap more of the air outflow end side portion. Therefore, the air bearing surface of the element protective film portion becomes a substantially flat surface inclined with respect to the air bearing surface of the slider portion,
When flying, a magnetic head slider is manufactured in which the flying height of the element protection film at the magnetic head element position on the air bearing surface is approximately the same as the flying height near the air outflow end position on the slider surface and each air bearing surface of the element protecting film. it can.

【0026】ここで、スライダ部及び素子保護膜の浮上
面をラップ板に押し付けるラップ圧力を、一段目のラッ
ピング工程の方が二段目のラッピング工程よりも単位時
間当たりのラップ仕上げ量が高くなるように選択すれ
ば、一段目のラッピング工程の加工時間を短くできると
共に、二段目のラッピング工程で予期しない段差が生じ
てしまう事態を避けることができる。
Here, the lapping pressure for pressing the air bearing surface of the slider portion and the element protective film against the lapping plate is higher in the lapping process per unit time in the first lapping process than in the second lapping process. With such selection, it is possible to shorten the processing time of the first lapping process and avoid the situation where an unexpected step is generated in the second lapping process.

【0027】[0027]

【実施の形態】先ず、本発明の磁気ヘッドスライダに関
する実施の形態例を図面を用いて説明する。図1は本発
明に係る磁気ヘッドスライダの実施の形態例における浮
上姿勢を概略的に示す図、図2は本発明に係る磁気ヘッ
ドスライダの実施の形態例を示す斜視図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS First, an embodiment of a magnetic head slider according to the present invention will be described with reference to the drawings. FIG. 1 is a diagram schematically showing a flying posture in an embodiment of a magnetic head slider according to the present invention, and FIG. 2 is a perspective view showing an embodiment of a magnetic head slider according to the present invention.

【0028】これらの図において、スライダ部71の浮
上面と略直交する空気流出端側の端面には、磁気ヘッド
素子部72が形成され、この磁気ヘッド素子部72が素
子保護膜73で覆われている。スライダ部71及び素子
保護膜73のディスク面80との対向面である浮上面に
は、ディスクの回転によって生じる空気流の方向に沿っ
て浮上力発生用サイドレール74,75が設けられ、更
にこのサイドレール74,75間の空気流入端側に、浮
上力発生用センタレール76が設けられている。各レー
ル74,75,76の浮上面の空気流入端側の部分は、
傾斜面74a,75a,76aとなっている。
In these figures, a magnetic head element portion 72 is formed on the end face on the air outflow end side which is substantially orthogonal to the air bearing surface of the slider portion 71, and this magnetic head element portion 72 is covered with an element protection film 73. ing. On the air bearing surface, which is the surface of the slider portion 71 and the element protection film 73 that faces the disk surface 80, levitation force generating side rails 74 and 75 are provided along the direction of the air flow generated by the rotation of the disk. A levitation force generating center rail 76 is provided on the air inflow end side between the side rails 74 and 75. The air inflow end side portion of the air bearing surface of each rail 74, 75, 76 is
The inclined surfaces 74a, 75a, 76a are formed.

【0029】この磁気ヘッドスライダは、浮上時に、ス
ライダ部71及び素子保護膜73の各浮上面上の空気流
出端位置近傍での浮上量が、素子保護膜73の浮上面上
の磁気ヘッド素子位置での浮上量と略等しくなるよう
に、素子保護膜73部分の浮上面が加工されている。
In this magnetic head slider, when flying, the flying height near the air outflow end position on each air bearing surface of the slider portion 71 and the element protection film 73 is determined by the magnetic head element position on the air bearing surface of the element protection film 73. The air bearing surface of the element protection film 73 is processed so as to be substantially equal to the flying height in the above.

【0030】ここでは、加工の容易さを考慮し、素子保
護膜73部分の浮上面がスライダ部71の浮上面に対し
て傾斜した略平面となっている。従って、、素子保護膜
73部分の浮上面の、スライダ部71の浮上面に対する
傾斜角が、磁気ヘッドスライダの浮上角と等しく、素子
保護膜73部分の浮上面はディスク80と平行になって
いる。
Here, in consideration of ease of processing, the air bearing surface of the element protection film 73 is a substantially flat surface inclined with respect to the air bearing surface of the slider portion 71. Therefore, the inclination angle of the air bearing surface of the element protective film 73 with respect to the air bearing surface of the slider portion 71 is equal to the flying angle of the magnetic head slider, and the air bearing surface of the element protective film 73 portion is parallel to the disk 80. .

【0031】上記構成の磁気ヘッドスライダでは、磁気
ヘッドスライダの浮上時に、素子保護膜73の浮上面上
の磁気ヘッド素子位置での浮上量H1が、スライダ部7
1及び素子保護膜73の各浮上面上の空気流出端位置近
傍での浮上量と等しくなる。このため、前述の磁気ヘッ
ドスライダとしての最低浮上量と素子保護膜の浮上面上
の磁気ヘッド素子位置での浮上量H1とが略等しくな
り、スペーシングロスがなくなる。よって、磁気ヘッド
素子部72の先端とディスク面80との間隔(浮上量H
1)を小さくでき、スペーシングロスによる感度低下を
避けることができる。
In the magnetic head slider having the above structure, when the magnetic head slider is flying, the flying height H1 at the magnetic head element position on the air bearing surface of the element protection film 73 is determined by the slider portion 7.
1 and the flying height of the element protection film 73 in the vicinity of the air outflow end position on each air bearing surface. Therefore, the minimum flying height of the magnetic head slider and the flying height H1 at the magnetic head element position on the air bearing surface of the element protection film become substantially equal to each other, and spacing loss is eliminated. Therefore, the distance between the tip of the magnetic head element portion 72 and the disk surface 80 (flying height H
1) can be made small, and sensitivity deterioration due to spacing loss can be avoided.

【0032】以上示した形態例は、素子保護膜73部分
の浮上面の、スライダ部71の浮上面に対する傾斜角
が、磁気ヘッドスライダの浮上角と等しい場合である
が、両者が正確に一致している必要はなく、略等しけれ
ばよい。例えば、磁気ヘッド素子位置での浮上量H1と
スライダ部71の空気流出端での浮上量H2との差H1
−H2が数nm以内に収まる場合であれば、十分にスペー
シングロスによる感度低下を避けることができる。
In the embodiment shown above, the inclination angle of the air bearing surface of the element protective film 73 portion with respect to the air bearing surface of the slider portion 71 is equal to the flying angle of the magnetic head slider, but they are exactly the same. It does not have to be, and it is sufficient if they are approximately equal. For example, the difference H1 between the flying height H1 at the magnetic head element position and the flying height H2 at the air outflow end of the slider portion 71.
If -H2 is within a few nm, it is possible to sufficiently avoid sensitivity deterioration due to spacing loss.

【0033】従って、素子保護膜73部分の浮上面の、
スライダ部71の浮上面に対する傾斜角が、磁気ヘッド
スライダの浮上角よりやや大きくなるように加工しても
よい。この場合、磁気ヘッド素子位置での浮上量H1は
スライダ部71の空気流出端での浮上量H2より大きく
なるが、両者の差H1−H2が数nm以内(この程度の差
では、浮上量H1と浮上量H2は略等しいと言える)で
あれば、スペーシングロスも小さく、且つ、ディスク上
の異常突起等と磁気ヘッド素子部72との直接の接触に
よる磁気ヘッド素子部72の損傷の発生を避けることも
でき、むしろ望ましい。
Therefore, the air bearing surface of the element protective film 73 is
The slider 71 may be processed so that the inclination angle with respect to the air bearing surface is slightly larger than the flying angle of the magnetic head slider. In this case, the flying height H1 at the magnetic head element position becomes larger than the flying height H2 at the air outflow end of the slider portion 71, but the difference H1-H2 between them is within several nm (with this difference, the flying height H1 And the flying height H2 are substantially equal to each other), the spacing loss is small, and the magnetic head element portion 72 is not damaged due to direct contact between the magnetic head element portion 72 and an abnormal protrusion on the disk. It can be avoided, but rather desirable.

【0034】次に本発明の磁気ヘッドスライダの製造方
法を説明する。尚、本発明の磁気ヘッドスライダの製造
方法は、従来の製造方法と比べてラッピングの工程のみ
が異なるので、ここでは、ラッピングの工程についての
み説明する。又、磁気ヘッドスライダの製造方法に関す
る本願の発明は、.スライダ部と素子保護膜との間に
段差が生じないラッピング工程を有する発明、.素子
保護膜部分に傾斜した浮上面を形成するラッピング工程
を有する発明、.上記との発明でのラッピング工
程を前後して行う発明、の3つであるが、の発明に関
する実施の形態例を説明すれば、やの発明に関する
実施の形態例をも説明したことになる。そこで、や
に関する実施の形態例の説明は省略し、図1及び図2に
示した磁気ヘッドスライダを製造する場合を例にとっ
て、の発明に関する実施の形態例を説明する。
Next, a method of manufacturing the magnetic head slider of the present invention will be described. The manufacturing method of the magnetic head slider of the present invention is different from the conventional manufacturing method only in the lapping process, and therefore only the lapping process will be described here. Further, the invention of the present application relating to a method of manufacturing a magnetic head slider is. An invention having a lapping step in which no step is formed between the slider portion and the element protection film ,. An invention having a lapping step of forming an inclined air bearing surface in the element protective film portion ,. There are three aspects of the invention, namely, the invention in which the lapping step in the invention described above is performed before and after the lapping step. However, when the embodiment example related to the invention is described, the embodiment example related to the invention is also described. Therefore, the description of the embodiment of the invention will be omitted, and the embodiment of the invention will be described by taking the case of manufacturing the magnetic head slider shown in FIGS. 1 and 2 as an example.

【0035】図1及び図2に示した磁気ヘッドスライダ
を製造する場合、先ず、スライダ部71(この場合、図
8のブロック3の状態)及び素子保護膜73の材料とし
て、線膨張係数が異なるものを選択する。本形態例で
は、スライダ部71をAl23−TiC(線膨張係数α
1=7.5×10-6/℃)、素子保護膜73をAl23
(線膨張係数α2=5.0×10-6/℃)で構成する。
又、スライダ部71及び素子保護膜73の両浮上面をラ
ッピングする工程を少なくとも二段構成とし、一段目の
ラッピング工程では、素子保護膜73若しくはスライダ
部71の少なくとも一方の温度を制御することにより、
スライダ部71の浮上面に対して素子保護膜73の浮上
面をラップ板90から退く方向に変位させ、ラッピング
を行う。
When manufacturing the magnetic head slider shown in FIGS. 1 and 2, first, the linear expansion coefficient is different as the material of the slider portion 71 (in this case, the state of block 3 in FIG. 8) and the element protective film 73. Select one. In the present embodiment, the slider portion 71 is made of Al 2 O 3 —TiC (linear expansion coefficient α
1 = 7.5 × 10 −6 / ° C.), the element protection film 73 is Al 2 O 3
(Linear expansion coefficient α 2 = 5.0 × 10 −6 / ° C.).
In addition, the step of lapping both the air bearing surfaces of the slider portion 71 and the element protection film 73 has at least two stages, and in the first step of lapping, the temperature of at least one of the element protection film 73 and the slider portion 71 is controlled. ,
Lapping is performed by displacing the air bearing surface of the element protective film 73 with respect to the air bearing surface of the slider portion 71 in the direction of receding from the lap plate 90.

【0036】そこで、本形態例では、素子保護膜73及
びスライダ部71の加工面を常温より加熱し、図3に示
すように、素子保護膜73の浮上面がラップ板90から
退く方向に変位させている。例えば、スライダ部71の
厚みを0.3mmとした場合、常温より20℃加熱すれ
ば、素子保護膜73の浮上面の空気流出端の角部におい
て、ラップ板90から15nm退く。この状態で、スライ
ダ部71及び素子保護膜73の両浮上面をラッピングす
れば、素子保護膜73の浮上面がラップ板90から退い
ているので、仮にラッピング圧力を高くして加工速度を
高めても、スライダ部71の浮上面に対する素子保護膜
73の浮上面の段差を生じさせることなく、加工を進め
ることができる。
Therefore, in this embodiment, the processed surfaces of the element protection film 73 and the slider portion 71 are heated from room temperature, and the air bearing surface of the element protection film 73 is displaced in the direction of receding from the lap plate 90, as shown in FIG. I am letting you. For example, when the slider portion 71 has a thickness of 0.3 mm and is heated from room temperature by 20 ° C., it retreats from the lap plate 90 by 15 nm at the corner of the air outflow end of the air bearing surface of the element protection film 73. In this state, if the air bearing surfaces of the slider portion 71 and the element protective film 73 are lapped, the air bearing surface of the element protective film 73 is retracted from the lap plate 90. Therefore, the lapping pressure is temporarily increased to increase the processing speed. Also, it is possible to proceed with the processing without causing a step on the air bearing surface of the element protection film 73 with respect to the air bearing surface of the slider portion 71.

【0037】この後、二段目のラッピング工程に移る。
二段目のラッピング工程では、素子保護膜73若しくは
スライダ部71の少なくとも一方の温度を制御すること
により、スライダ部71の浮上面に対して素子保護膜7
3の浮上面をラップ板90に近づく方向に変位させてラ
ッピングを行う。そこで、本形態例では、素子保護膜7
3及びスライダ部71の加工面を常温より冷却し、図4
に示すように、一段目のラッピング工程終了後の素子保
護膜73の浮上面をラップ板90に近づけさせる。
After this, the second step of lapping is performed.
In the second lapping step, by controlling the temperature of at least one of the element protection film 73 and the slider portion 71, the element protection film 7 is formed on the air bearing surface of the slider portion 71.
Lapping is performed by displacing the air bearing surface of No. 3 toward the lap plate 90. Therefore, in the present embodiment, the element protective film 7
3 and the processed surface of the slider portion 71 are cooled from room temperature,
As shown in, the air bearing surface of the element protection film 73 after the first lapping step is brought close to the lap plate 90.

【0038】この場合、素子保護膜73の浮上面の空気
流出端ほどラップ板90に近づく。従って、この状態
で、スライダ部71及び素子保護膜73の両浮上面をラ
ッピングすると、素子保護膜73の浮上面の加工に関
し、空気流出端側部分をより多くラッピングすることに
なり、常温に戻せば、傾斜面が形成されることになる。
In this case, the air outflow end of the air bearing surface of the element protection film 73 is closer to the lap plate 90. Therefore, in this state, if both air bearing surfaces of the slider portion 71 and the element protective film 73 are lapped, the air outflow end side portion will be lapped more with respect to the processing of the air bearing surface of the element protective film 73, and the temperature can be returned to room temperature. If so, an inclined surface is formed.

【0039】上記一段目及び二段目のラッピング工程を
経ることで、スライダ部71の浮上面に対する素子保護
膜73の浮上面の段差を発生させることなく、しかも、
素子保護膜73の浮上面の加工に関し空気流出端側部分
をより多くラッピングできる。
By passing through the first and second lapping steps, no step is formed on the air bearing surface of the element protection film 73 with respect to the air bearing surface of the slider portion 71, and moreover,
Regarding the processing of the air bearing surface of the element protection film 73, the air outflow end side portion can be more lapped.

【0040】よって、素子保護膜73部分の浮上面がス
ライダ部71の浮上面に対して傾斜した略平面となり、
浮上時には、素子保護膜73の浮上面上の磁気ヘッド素
子位置での浮上量が、スライダ部71及び素子保護膜7
3の各浮上面上の空気流出端位置近傍での浮上量と略等
しい磁気ヘッドスライダを作製できる。
Therefore, the air bearing surface of the element protection film 73 becomes a substantially flat surface inclined with respect to the air bearing surface of the slider portion 71,
During flying, the flying height of the element protection film 73 at the magnetic head element position on the air bearing surface is determined by the slider portion 71 and the element protection film 7.
It is possible to manufacture a magnetic head slider having a flying height substantially equal to the flying height in the vicinity of the air outflow end position on each air bearing surface of No.

【0041】ここで、スライダ部71及び素子保護膜7
3の浮上面をラップ板90に押し付けるラップ圧力を、
一段目のラッピング工程の方が二段目のラッピング工程
よりも単位時間当たりのラップ仕上げ量が高くなるよう
に選択すれば、一段目のラッピング工程の加工時間を短
くできると共に、二段目のラッピング工程で予期しない
段差が生じてしまう事態を避けることができる。
Here, the slider portion 71 and the element protection film 7
Lap pressure for pressing the air bearing surface of 3 to the lap plate 90 is
If the first lapping process is selected so that the lapping amount per unit time is higher than that of the second lapping process, the processing time of the first lapping process can be shortened and the second lapping process can be performed. It is possible to avoid a situation where an unexpected step is generated in the process.

【0042】尚、本発明は上記実施の形態例に限定され
るものではない。例えば、スライダ部の材料(線膨張係
数α1)と素子保護膜の材料(線膨張係数α2)の組み合
わせは、α1>α2でもよいし、α1<α2でもよい。これ
らの相違は加熱と冷却が逆になるだけである。例えば、
スライダ部の材料としては、フェライトやその他のセラ
ミック等を用いることができ、素子保護膜としては、ダ
イヤモンドライクカーボン(DLC)やSiO2等を用
いることができる。具体的な組み合わせの一例を示せ
ば、Si(スライダ部)とAl23(素子保護膜)との
組み合わせや、ZrO2(スライダ部)とDLC(素子
保護膜)との組み合わせ等がある。
The present invention is not limited to the above embodiment. For example, the combination of the material of the slider portion (coefficient of linear expansion α 1 ) and the material of the element protective film (coefficient of linear expansion α 2 ) may be α 1 > α 2 or α 12 . These differences only reverse heating and cooling. For example,
Ferrite, other ceramics, or the like can be used as the material of the slider portion, and diamond-like carbon (DLC), SiO 2 or the like can be used as the element protective film. Specific examples of combinations include a combination of Si (slider portion) and Al 2 O 3 (element protective film), a combination of ZrO 2 (slider portion) and DLC (element protective film), and the like.

【0043】又、加工面の加熱・冷却方法としては、
ラップ盤にヒータを接続し電気的に加熱・冷却する、
加工する磁気ヘッドスライダ(ブロック)のホルダーに
ヒータを接続し電気的に加熱・冷却する、加工面に温
風・冷風を吹き付け加熱・冷却する、加熱・冷却した
ラップ剤(ラップ液)を用いる、ラップ盤を所定の温
度環境下(温度制御された室内)に置く、等種々のもの
が考えられる。
As a method of heating / cooling the processed surface,
Connect a heater to the lapping machine to electrically heat and cool,
A heater is connected to the holder of the magnetic head slider (block) to be processed and electrically heated / cooled, hot / cold air is blown to the processed surface for heating / cooling, and a heated / cooled lapping agent (lapping liquid) is used. Various things are conceivable such as placing the lapping machine in a predetermined temperature environment (in a temperature-controlled room).

【0044】更に、磁気ヘッド素子部等は前述の構成に
限らないし、レールの形状についても図2のものに限ら
ない。
Further, the magnetic head element portion and the like are not limited to the above-mentioned structure, and the shape of the rail is not limited to that shown in FIG.

【0045】[0045]

【発明の効果】以上説明したように、磁気ヘッドスライ
ダに関する本発明では、磁気ヘッドスライダの浮上時
に、スライダ部及び素子保護膜の各浮上面上の空気流出
端位置近傍での浮上量が、素子保護膜の浮上面上の磁気
ヘッド素子位置での浮上量と略等しくなる。このため、
磁気ヘッドスライダとしての最低浮上量と素子保護膜の
浮上面上の磁気ヘッド素子位置での浮上量とが略等しく
なり、スペーシングロスがほとんどなくなる。よって、
磁気ヘッド素子部の先端とディスク面との間隔を小さく
でき、スペーシングロスによる感度低下を避けることが
できる。
As described above, in the present invention relating to the magnetic head slider, when the magnetic head slider flies, the flying height near the air outflow end position on each air bearing surface of the slider portion and the element protection film is reduced. It is substantially equal to the flying height at the position of the magnetic head element on the air bearing surface of the protective film. For this reason,
The minimum flying height as a magnetic head slider and the flying height at the magnetic head element position on the air bearing surface of the element protection film become substantially equal, and spacing loss is almost eliminated. Therefore,
It is possible to reduce the distance between the tip of the magnetic head element and the disk surface, and avoid a decrease in sensitivity due to spacing loss.

【0046】素子保護膜部分の浮上面をスライダ部の浮
上面に対して傾斜した略平面とすれば、素子保護膜部分
の浮上面の加工が容易になる。磁気ヘッドスライダの製
造方法に関する第1の発明では、素子保護膜若しくはス
ライダ部の少なくとも一方の温度を制御し、スライダ部
の浮上面に対して素子保護膜の浮上面をラップ板から退
く方向に変位させた状態で、スライダ部及び素子保護膜
の両浮上面をラッピングする。このため、仮にラッピン
グ圧力を高くして加工速度を高めても、スライダ部の浮
上面に対する素子保護膜の浮上面の段差の発生を低減さ
せることができる。
If the air bearing surface of the element protective film portion is formed into a substantially flat surface inclined with respect to the air bearing surface of the slider portion, the air bearing surface of the element protective film portion can be easily processed. In the first invention relating to the method of manufacturing the magnetic head slider, the temperature of at least one of the element protective film and the slider portion is controlled, and the air bearing surface of the element protective film is displaced with respect to the air bearing surface of the slider portion in the direction of receding from the lap plate. In this state, both air bearing surfaces of the slider portion and the element protection film are lapped. Therefore, even if the lapping pressure is increased to increase the processing speed, it is possible to reduce the occurrence of a step on the air bearing surface of the element protection film with respect to the air bearing surface of the slider portion.

【0047】磁気ヘッドスライダの製造方法に関する第
2の発明では、素子保護膜若しくはスライダ部の少なく
とも一方の温度を制御し、スライダ部の浮上面に対して
素子保護膜の浮上面をラップ板に近づく方向に変位させ
た状態で、スライダ部及び素子保護膜の両浮上面をラッ
ピングする。このため、素子保護膜の浮上面の加工にお
いて、空気流出端側部分をより多くラッピングすること
ができる。
In the second invention relating to the method of manufacturing the magnetic head slider, the temperature of at least one of the element protective film and the slider portion is controlled so that the air bearing surface of the element protective film approaches the lap plate with respect to the air bearing surface of the slider portion. Both air bearing surfaces of the slider portion and the element protection film are lapped while being displaced in the direction. Therefore, in processing the air bearing surface of the element protective film, the air outflow end side portion can be more lapped.

【0048】磁気ヘッドスライダの製造方法に関する第
3の発明では、一段目のラッピング工程において、素子
保護膜若しくはスライダ部の少なくとも一方の温度を制
御し、スライダ部の浮上面に対して素子保護膜の浮上面
をラップ板から退く方向に変位させた状態で、スライダ
部及び素子保護膜の両浮上面をラッピングする。このラ
ッピング時に、仮にラッピング圧力を高くして加工速度
を高めても、スライダ部の浮上面に対する素子保護膜の
浮上面の段差を発生させることなく、加工を進めること
ができる。
In the third invention relating to the method of manufacturing the magnetic head slider, in the first lapping step, the temperature of at least one of the element protective film and the slider portion is controlled so that the element protective film is formed on the air bearing surface of the slider portion. While the air bearing surface is displaced in the direction of receding from the lap plate, both air bearing surfaces of the slider portion and the element protective film are lapped. At the time of this lapping, even if the lapping pressure is increased to increase the processing speed, the processing can be advanced without generating a step on the air bearing surface of the element protection film with respect to the air bearing surface of the slider portion.

【0049】続く二段目のラッピング工程においては、
素子保護膜若しくはスライダ部の少なくとも一方の温度
を制御し、スライダ部の浮上面に対して素子保護膜の浮
上面をラップ板に近づく方向に変位させた状態で、スラ
イダ部及び素子保護膜の両浮上面をラッピングする。こ
の工程では、素子保護膜の浮上面の加工に関し、空気流
出端側部分をより多くラッピングする。
In the subsequent second lapping step,
While controlling the temperature of at least one of the element protection film and the slider part and displacing the air bearing surface of the element protection film toward the wrap plate with respect to the air bearing surface of the slider part, both the slider part and the element protection film are Lapping the air bearing surface. In this step, regarding the processing of the air bearing surface of the element protection film, the air outflow end side portion is more lapped.

【0050】従って、一段目及び二段目のラッピング工
程を経ることで、スライダ部の浮上面に対する素子保護
膜の浮上面の段差を発生させることなく、しかも、素子
保護膜の浮上面の加工に関し空気流出端側部分をより多
くラッピングできる。よって、素子保護膜部分の浮上面
がスライダ部の浮上面に対して傾斜した略平面となり、
浮上時には、素子保護膜の浮上面上の磁気ヘッド素子位
置での浮上量が、スライダ部及び素子保護膜の各浮上面
上の空気流出端位置近傍での浮上量と略等しい磁気ヘッ
ドスライダを作製できる。
Therefore, by performing the lapping process of the first step and the second step, the step of the air bearing surface of the element protective film with respect to the air bearing surface of the slider portion is not generated, and the air bearing surface of the element protective film is processed. It is possible to wrap more of the air outflow end side portion. Therefore, the air bearing surface of the element protective film portion becomes a substantially flat surface inclined with respect to the air bearing surface of the slider portion,
When flying, a magnetic head slider is manufactured in which the flying height of the element protection film at the magnetic head element position on the air bearing surface is approximately the same as the flying height near the air outflow end position on the slider surface and each air bearing surface of the element protecting film. it can.

【0051】ここで、スライダ部及び素子保護膜の浮上
面をラップ板に押し付けるラップ圧力を、一段目のラッ
ピング工程の方が二段目のラッピング工程よりも単位時
間当たりのラップ仕上げ量が高くなるように選択すれ
ば、一段目のラッピング工程の加工時間を短くできると
共に、二段目のラッピング工程で予期しない段差が生じ
てしまう事態を避けることができる。
Here, the lapping pressure for pressing the air bearing surface of the slider portion and the element protective film against the lapping plate is higher in the lapping process per unit time in the first lapping process than in the second lapping process. With such selection, it is possible to shorten the processing time of the first lapping process and avoid the situation where an unexpected step is generated in the second lapping process.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る磁気ヘッドスライダの実施の形態
例における浮上姿勢を概略的に示す図である。
FIG. 1 is a diagram schematically showing a flying posture in an embodiment of a magnetic head slider according to the present invention.

【図2】本発明に係る磁気ヘッドスライダの実施の形態
例を示す斜視図である。
FIG. 2 is a perspective view showing an embodiment of a magnetic head slider according to the present invention.

【図3】本発明に係る製造方法におけるラッピングの説
明図である。
FIG. 3 is an explanatory diagram of lapping in the manufacturing method according to the present invention.

【図4】本発明に係る製造方法におけるラッピングの説
明図である。
FIG. 4 is an explanatory diagram of lapping in the manufacturing method according to the present invention.

【図5】磁気ヘッドスライダの主要部の一例を示す図で
ある。
FIG. 5 is a diagram showing an example of a main part of a magnetic head slider.

【図6】図5中の磁気抵抗効果素子部及び導体層を示す
平面図である。
FIG. 6 is a plan view showing a magnetoresistive effect element portion and a conductor layer in FIG.

【図7】図5における磁気ヘッドスライダをディスク側
から見たときのギャップ近傍の積層構造を示す断面図で
ある。
7 is a cross-sectional view showing a laminated structure near the gap when the magnetic head slider in FIG. 5 is viewed from the disk side.

【図8】磁気ヘッドスライダの製造工程の説明図であ
る。
FIG. 8 is an explanatory diagram of the manufacturing process of the magnetic head slider.

【図9】従来の磁気ヘッドスライダの浮上姿勢を示す図
である。
FIG. 9 is a diagram showing a flying posture of a conventional magnetic head slider.

【図10】従来の他の磁気ヘッドスライダの浮上姿勢を
示す図である。
FIG. 10 is a diagram showing a flying posture of another conventional magnetic head slider.

【符号の説明】[Explanation of symbols]

10:記録トラック 20:記録ヘッド部 30:再生ヘッド部 51,73:素子保護膜 52,71:スライダ部 53,72:磁気ヘッド素子部 90:ラップ板 10: recording track 20: recording head part 30: reproducing head part 51, 73: element protective film 52, 71: slider part 53, 72: magnetic head element part 90: lap plate

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 スライダ部の浮上面と略直交する空気流
出端側の端面に、磁気ヘッド素子部が形成され、この磁
気ヘッド素子部が素子保護膜で覆われた磁気ヘッドスラ
イダにおいて、 浮上時に、前記スライダ部及び前記素子保護膜の各浮上
面上の空気流出端位置近傍での浮上量が、前記素子保護
膜の浮上面上の磁気ヘッド素子位置での浮上量と略等し
くなるように、前記素子保護膜部分の浮上面を加工した
ことを特徴とする磁気ヘッドスライダ。
1. A magnetic head slider in which a magnetic head element portion is formed on an end surface on the air outflow end side substantially orthogonal to the air bearing surface of the slider portion, and the magnetic head element portion is covered with an element protective film, when flying. So that the flying height of the slider portion and the element protection film near each air outflow end position on each air bearing surface is substantially equal to the flying height of the element protection film at the magnetic head element position on the air bearing surface, A magnetic head slider characterized in that the air bearing surface of the element protective film portion is processed.
【請求項2】 前記素子保護膜部分の浮上面が前記スラ
イダ部の浮上面に対して傾斜した略平面となるように、
前記素子保護膜部分の浮上面を加工したことを特徴とす
る請求項1記載の磁気ヘッドスライダ。
2. The air bearing surface of the element protective film portion is a substantially flat surface inclined with respect to the air bearing surface of the slider portion,
2. The magnetic head slider according to claim 1, wherein the air bearing surface of the element protective film portion is processed.
【請求項3】 スライダ部の浮上面と略直交する空気流
出端側の端面に、磁気ヘッド素子部が形成され、この磁
気ヘッド素子部が素子保護膜で覆われた磁気ヘッドスラ
イダの製造方法であって、前記スライダ部及び前記素子
保護膜の両浮上面をラッピングする工程を含む磁気ヘッ
ドスライダの製造方法において、 前記スライダ部及び前記素子保護膜の材料として、線膨
張係数が異なるものを選択すると共に、前記スライダ部
及び前記素子保護膜の両浮上面をラッピングする工程時
に、前記素子保護膜若しくは前記スライダ部の少なくと
も一方の温度を制御することにより、前記スライダ部の
浮上面に対して前記素子保護膜の浮上面をラップ板から
退く方向に変位させ、この状態で、前記スライダ部及び
前記素子保護膜の両浮上面をラッピングすることを特徴
とする磁気ヘッドスライダの製造方法。
3. A method of manufacturing a magnetic head slider, wherein a magnetic head element portion is formed on an end surface of the slider portion on the air outflow end side substantially orthogonal to the air bearing surface, and the magnetic head element portion is covered with an element protective film. And a method of manufacturing a magnetic head slider including a step of lapping both air bearing surfaces of the slider portion and the element protective film, wherein materials having different linear expansion coefficients are selected as materials of the slider portion and the element protective film. At the same time, at the time of lapping both the air bearing surfaces of the slider portion and the element protective film, the temperature of at least one of the element protective film and the slider portion is controlled to control the air bearing surface of the slider portion with respect to the air bearing surface. The air bearing surface of the protective film is displaced in the direction of receding from the lap plate, and in this state, both air bearing surfaces of the slider portion and the element protective film are lapped. Method of manufacturing a magnetic head slider according to claim Rukoto.
【請求項4】 スライダ部の浮上面と略直交する空気流
出端側の端面に、磁気ヘッド素子部が形成され、この磁
気ヘッド素子部が素子保護膜で覆われた磁気ヘッドスラ
イダの製造方法であって、前記スライダ部及び前記素子
保護膜の両浮上面をラッピングする工程を含む磁気ヘッ
ドスライダの製造方法において、 前記スライダ部及び前記素子保護膜の材料として、線膨
張係数が異なるものを選択すると共に、前記スライダ部
及び前記素子保護膜の両浮上面をラッピングする工程時
に、前記素子保護膜若しくは前記スライダ部の少なくと
も一方の温度を制御することにより、前記スライダ部の
浮上面に対して前記素子保護膜の浮上面をラップ板に近
づく方向に変位させ、この状態で、前記スライダ部及び
前記素子保護膜の両浮上面をラッピングすることを特徴
とする磁気ヘッドスライダの製造方法。
4. A method of manufacturing a magnetic head slider, wherein a magnetic head element portion is formed on an end surface of the slider portion on the air outflow end side substantially orthogonal to the air bearing surface, and the magnetic head element portion is covered with an element protective film. And a method of manufacturing a magnetic head slider including a step of lapping both air bearing surfaces of the slider portion and the element protective film, wherein materials having different linear expansion coefficients are selected as materials of the slider portion and the element protective film. At the same time, at the time of lapping both the air bearing surfaces of the slider portion and the element protective film, the temperature of at least one of the element protective film and the slider portion is controlled to control the air bearing surface of the slider portion with respect to the air bearing surface. The air bearing surface of the protective film is displaced toward the lap plate, and in this state, the air bearing surfaces of the slider section and the element protective film are lapped. Method of manufacturing a magnetic head slider according to claim Rukoto.
【請求項5】 スライダ部の浮上面と略直交する空気流
出端側の端面に、磁気ヘッド素子部が形成され、この磁
気ヘッド素子部が素子保護膜で覆われた磁気ヘッドスラ
イダの製造方法であって、前記スライダ部及び前記素子
保護膜の両浮上面をラッピングする工程を含む磁気ヘッ
ドスライダの製造方法において、 前記スライダ部及び前記素子保護膜の材料として、線膨
張係数が異なるものを選択すると共に、前記スライダ部
及び前記素子保護膜の両浮上面をラッピングする工程を
少なくとも二段構成とし、 一段目のラッピング工程では、前記素子保護膜若しくは
前記スライダ部の少なくとも一方の温度を制御すること
により、前記スライダ部の浮上面に対して前記素子保護
膜の浮上面をラップ板から退く方向に変位させ、この状
態で、前記スライダ部及び前記素子保護膜の両浮上面を
ラッピングし、 二段目のラッピング工程では、前記素子保護膜若しくは
前記スライダ部の少なくとも一方の温度を制御すること
により、前記スライダ部の浮上面に対して前記素子保護
膜の浮上面をラップ板に近づく方向に変位させ、この状
態で、前記スライダ部及び前記素子保護膜の両浮上面を
ラッピングすることを特徴とする磁気ヘッドスライダの
製造方法。
5. A method of manufacturing a magnetic head slider, wherein a magnetic head element portion is formed on an end surface on the air outflow end side substantially orthogonal to the air bearing surface of the slider portion, and the magnetic head element portion is covered with an element protective film. And a method of manufacturing a magnetic head slider including a step of lapping both air bearing surfaces of the slider portion and the element protective film, wherein materials having different linear expansion coefficients are selected as materials of the slider portion and the element protective film. At the same time, the step of lapping both the air bearing surfaces of the slider portion and the element protective film is made into at least two stages, and in the first lapping step, by controlling the temperature of at least one of the element protective film and the slider portion. , The air bearing surface of the element protection film is displaced with respect to the air bearing surface of the slider portion in the direction of receding from the lap plate, and in this state, Lapping both the air bearing surface of the lid portion and the element protective film, and in the second lapping step, by controlling the temperature of at least one of the element protective film and the slider portion, the air bearing surface of the slider portion is The magnetic head slider is manufactured by displacing the air bearing surface of the element protective film in a direction closer to the lap plate and lapping both the air bearing surfaces of the slider portion and the element protective film in this state.
【請求項6】 ラッピング工程時に前記スライダ部及び
前記素子保護膜の浮上面をラップ板に押し付けるラップ
圧力は、一段目のラッピング工程の方が二段目のラッピ
ング工程よりも単位時間当たりのラップ仕上げ量が高く
なるように選択することを特徴とする請求項5記載の磁
気ヘッドスライダの製造方法。
6. The lapping pressure for pressing the air bearing surfaces of the slider portion and the element protection film against the lapping plate during the lapping step is such that the lapping step in the first step is more lapping per unit time than the lapping step in the second step. 6. The method of manufacturing a magnetic head slider according to claim 5, wherein the amount is selected to be high.
JP10548296A 1996-04-25 1996-04-25 Magnetic head slider and method of manufacturing the same Withdrawn JPH09293221A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10548296A JPH09293221A (en) 1996-04-25 1996-04-25 Magnetic head slider and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10548296A JPH09293221A (en) 1996-04-25 1996-04-25 Magnetic head slider and method of manufacturing the same

Publications (1)

Publication Number Publication Date
JPH09293221A true JPH09293221A (en) 1997-11-11

Family

ID=14408817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10548296A Withdrawn JPH09293221A (en) 1996-04-25 1996-04-25 Magnetic head slider and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JPH09293221A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6679762B2 (en) * 2001-04-19 2004-01-20 Hitachi Global Storage Technologies Netherlands B.V. Recession control via thermal expansion coefficient differences in recording heads during lapping
US7362533B2 (en) 2004-07-30 2008-04-22 Hitachi Global Storage Technologies Netherlands B.V. Disk drive with slider burnishing-on-demand
US7481697B2 (en) 2001-04-05 2009-01-27 Fujitsu Limited Head slider and method of manufacturing same
US7495856B2 (en) 2004-10-29 2009-02-24 Hitachi Global Storage Technologies Netherlands B.V. Disk drive slider design for thermal fly-height control and burnishing-on-demand
US8286334B2 (en) 2006-07-14 2012-10-16 Hitachi Global Storage Technologies, Netherlands B.V. Method of manufacturing pre-sliders for read write heads by annealing to saturation

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7481697B2 (en) 2001-04-05 2009-01-27 Fujitsu Limited Head slider and method of manufacturing same
US6679762B2 (en) * 2001-04-19 2004-01-20 Hitachi Global Storage Technologies Netherlands B.V. Recession control via thermal expansion coefficient differences in recording heads during lapping
US7362533B2 (en) 2004-07-30 2008-04-22 Hitachi Global Storage Technologies Netherlands B.V. Disk drive with slider burnishing-on-demand
US7495856B2 (en) 2004-10-29 2009-02-24 Hitachi Global Storage Technologies Netherlands B.V. Disk drive slider design for thermal fly-height control and burnishing-on-demand
US8286334B2 (en) 2006-07-14 2012-10-16 Hitachi Global Storage Technologies, Netherlands B.V. Method of manufacturing pre-sliders for read write heads by annealing to saturation

Similar Documents

Publication Publication Date Title
US8146237B2 (en) Method of manufacturing a magnetic head
US6842308B1 (en) Thermal compensation for head protrusion in a magnetic drive
JP4516386B2 (en) Thin film magnetic head structure, method for manufacturing the same, and method for manufacturing a thin film magnetic head
US20080212234A1 (en) Magnetic head slider
US6679762B2 (en) Recession control via thermal expansion coefficient differences in recording heads during lapping
JP3990197B2 (en) Thin film magnetic head
US7100269B2 (en) Method of manufacturing slider of thin-film magnetic head
US20070236836A1 (en) Magnetic head slider
JPH09293221A (en) Magnetic head slider and method of manufacturing the same
US6945847B2 (en) Method of lapping medium-opposing surface in thin-film magnetic head
US7035047B2 (en) Magnetic recording heads having thin thermally conductive undercoating
US20090165287A1 (en) Manufacturing method for magnetic head slider
US6934124B2 (en) Rotating recording medium and slider of thin-film magnetic head device
US7185416B2 (en) Method of manufacturing a slider for a thin-film magnetic head
JP2006040447A (en) Method for manufacturing slider
JP2008146787A (en) Method of manufacturing slider
US20050168873A1 (en) Magnetic head substrate material, magnetic head substrate, head slider, and method of making magnetic head substrate
JP2006059501A (en) Manufacturing method of slider
JP2003141704A (en) Thin film magnetic head
CN103295593B (en) Method and apparatus for manufacturing magnetic head slider
JP2000005938A (en) Method of manufacturing magnetic head and ion polishing apparatus
JPH07272214A (en) Thin film magnetic head slider
JP2007250118A (en) Manufacturing method of magnetic head for performing chamfering by surface plate
JP2004087056A (en) Thin film magnetic head and manufacturing method
JP2008226298A (en) Bar for manufacturing magnetic head slider and manufacturing method of magnetic head slider

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20030701