JPH09290199A - Cup cleaning device and rotating type substrate processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cup cleaning device without deterioration in cleaning capability caused by the adhesion of processing fluid. SOLUTION: A plurality of upper face cleaning fluid nozzles 13a and lower face cleaning fluid nozzles 13b jetting the cleaning fluid are installed on the upper face and the lower face of a nozzle supporting components 12. Cleaning fluid feed pipings 25 are connected with the upper face cleaning fluid nozzles 13a and lower face cleaning nozzles 13b through a supporting component 12. The nozzle supporting component 12 is formed to be movable between the inside of a cup 5 and a standby position outside the cup 4 by a movement mechanism section 20. At the time of cleaning, the nozzle supporting component 12 is inserted into the cup 4 and moved in the up and down direction or the rotating direction while jetting the cleaning fluid to clean the inner wall of the cup 4.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cup cleaning device for cleaning the inner surface of a cup provided to prevent scattering of a processing liquid, and a rotary substrate processing device equipped with the cup cleaning device.

[0002]

2. Description of the Related Art Conventionally, a rotary coating apparatus has been used to spin coat a processing liquid on the surface of a substrate such as a semiconductor wafer. The rotary coating device is equipped with a rotation drive mechanism that holds the substrate horizontally and rotates it at a high speed, and applies a centrifugal force to the treatment liquid such as resist dropped on the surface of the substrate to apply the treatment liquid to the entire surface of the substrate. Perform the process of expanding. During this spin coating, most of the processing liquid supplied onto the substrate is scattered outside the substrate. Therefore, in the rotary coating apparatus, a hollow cup surrounding the substrate is provided to prevent the processing liquid from splashing outward.

The processing liquid scattered during spin coating adheres to the inner wall of the cup. When the processing liquid that has adhered to the substrate dries and solidifies, it may peel off from the wall surface of the cup due to vibration or shock, and may adhere to the surface of the substrate, causing processing defects or contamination of the substrate. Further, when the solidified material of the processing liquid is laminated on the inner wall of the cup, the surface shape becomes uneven, which disturbs the air flow in the cup during the rotation processing, and the turbulence of the air flow adversely affects the coating film formation on the outer peripheral edge of the substrate. May affect.

Therefore, various cup cleaning devices have been conventionally devised to clean the inner wall of the cup.

[0005]

FIG. 3 is a schematic view showing a cross-sectional structure of a rotary coating apparatus having a cup cleaning device according to a conventional example. The cup cleaning device according to this example is
The cleaning liquid flows down along the inner wall of the cup,
For example, it is disclosed in JP-A-5-169004.

In FIG. 3, the rotary coating apparatus comprises a spin motor 1 and a spin chuck 3 attached to the tip of a rotary shaft 2 of the spin motor 1 as a rotating mechanism for rotating a substrate. A hollow cup 30 is arranged around the spin chuck 3. Further, on the lower side of the spin chuck 3, a rectifying inclined plate 33 that is inclined outward is provided. Further, a drain pipe line 31 for discharging the waste liquid is connected to the lower portion of the cup 30.

In the rotary coating apparatus having such a structure, the cleaning conduit 32 for temporarily storing the cleaning liquid is provided on the outer peripheral surface of the upper portion of the cup 30. Further, a large number of small holes (not shown) are provided on the wall surface of the cup 30 provided with the cleaning conduit 32. Therefore, when the cleaning liquid is supplied into the cleaning conduit 32, the cleaning liquid leaks to the inner surface side of the cup 30 through the small holes provided on the wall surface of the cup 30, and flows down along the inner wall of the cup 30. At this time, the processing liquid adhering to the inside of the cup 30 is washed away by the cleaning liquid.

A cleaning conduit 34 for temporarily storing the cleaning liquid is also provided on the back surface of the flow straightening sloping plate 33 in the same manner as described above, and the wall surface of the flow straightening sloping plate 33 has a large number of small leaking liquids. A hole (not shown) is formed. Then, the cleaning liquid leaks to the surface of the rectifying inclined plate 33 through the small holes, and flows down while washing away the processing liquid adhering to the surface of the rectifying inclined plate 33.

However, in the above-described method of dropping the cleaning liquid, the cleaning liquid has a slow flow rate, so that the cleaning capacity is limited, and a portion that cannot be cleaned remains depending on the degree of adhesion of the processing liquid. Further, the amount of the cleaning liquid used becomes relatively large. Further, there is a problem that a large number of small holes provided on the inner wall of the cup 30 are clogged due to the adhesion of the processing liquid, and the cleaning function is deteriorated.

FIG. 4 is a schematic view showing the cross-sectional structure of a rotary type coating device having a cup cleaning device according to another conventional example. The cup cleaning device according to this example includes a cup 30
The cleaning liquid discharge nozzle 35 is arranged inside the
A configuration equivalent to this is disclosed, for example, in Japanese Utility Model Publication No. 63-44989, Japanese Patent Application Laid-Open No. 64-81223 and Japanese Patent Application Laid-Open No. 4-81223.
It is disclosed in Japanese Patent No. 93844.

The cleaning liquid discharge nozzle 35 is fixed inside the cup 30. Then, the cleaning liquid is discharged from the discharge port directed to the inner wall of the cup 30 to wash away the processing liquid attached to the inner wall of the cup 30.

However, in this cup cleaning device, the cleaning liquid discharge nozzle 35 for discharging the cleaning liquid is always in the cup 30.
It is installed inside. Therefore, the treatment liquid may adhere to the cleaning liquid discharge nozzle 35 to cause clogging of the discharge port, and a defective cleaning liquid may cause a defective cleaning portion on the inner wall of the cup 30. Further, the cleaning liquid discharge nozzle 35 may become an obstacle to disturb the air flow in the cup 30, which may adversely affect the formation of the coating film on the peripheral portion of the substrate.

Further, FIG. 5 is a schematic view showing a cross-sectional structure of a rotary type coating apparatus having a cup cleaning apparatus according to still another conventional example. The cup cleaning device according to this example is provided with a cleaning jig 36 that is attachable to and detachable from the spin chuck 3, and is disclosed in, for example, Japanese Patent Laid-Open No. 5-82435.

A cleaning liquid is stored inside the cleaning jig 36, and a large number of discharge holes (not shown) are provided on the side surface thereof. Then, when cleaning the cup 30, the cleaning jig 3
6 is suction-fixed to the spin chuck 3 and is rotated at a high speed, so that the cleaning liquid is discharged from the discharge hole to the inner wall of the cup 30 by utilizing centrifugal force. Further, after the cleaning is completed, the cleaning jig 36 is taken out of the cup 30.

In this cup cleaning device, since the cleaning jig 36 is disposed inside the cup 30 only during cleaning, there is no inconvenience that the discharge holes of the cleaning jig 36 are clogged with the processing liquid. However, since the cleaning liquid is discharged by using the centrifugal force of the spin motor, the rotation of the spin motor needs to be controlled in order to change the discharge speed and the discharge amount of the cleaning liquid, and the operation is complicated. Further, since the discharge direction of the cleaning liquid is set to be constant depending on the direction of the discharge hole, there are cases where the portion that cannot be cleaned remains.

An object of the present invention is to provide a cup cleaning apparatus and a rotary substrate processing apparatus which do not cause deterioration of cleaning ability due to adhesion of a processing liquid. Still another object of the present invention is to provide a cup cleaning apparatus and a rotary substrate processing apparatus in which an uncleaned portion does not occur on the inner wall of the cup.

[0017]

The cup cleaning device according to the first aspect of the present invention is a cup cleaning device for cleaning the inner surface of a cup that surrounds a substrate holding member that holds and rotates a substrate. There is a nozzle that discharges the cleaning liquid, and the nozzle is arranged so that the cleaning liquid is discharged from the outside of the cup to a predetermined position inside the cup during cleaning so that the cleaning liquid is discharged from the nozzle to the inner surface of the cup. The nozzle moving means for moving the cleaning liquid to the outside of the nozzle and the cleaning liquid supplying means for supplying the cleaning liquid to the nozzle are provided.

A cup cleaning device according to a second aspect of the present invention is the first aspect.
In the configuration of the cup cleaning device according to the invention, the nozzle is composed of a plurality of nozzles arranged along the inner surface of the cup during cleaning.

The cup cleaning device according to the third aspect of the present invention is the second aspect.
In the configuration of the cup cleaning device according to the invention, a nozzle holding member that holds a plurality of nozzles is further provided, and the nozzle moving means moves the nozzle holding member in a predetermined direction during cleaning, and the cleaning liquid is discharged from the nozzle. Is to change the discharge direction of.

The rotary substrate processing apparatus according to the fourth invention is
A substrate holding member for holding the substrate, a rotating means for rotating the substrate holding member, and the cup cleaning device according to any one of the first to third inventions are provided.

In the cup cleaning apparatus according to the first to third inventions and the rotary substrate processing apparatus according to the fourth invention, the nozzle is configured to be movable between the inside and the outside of the cup. Therefore, by keeping the nozzle on the outside of the cup except when cleaning the cup, it is possible to prevent the nozzle from being contaminated or clogged by the processing liquid used for the predetermined substrate processing in the cup. it can. Therefore, the desired cleaning ability can be maintained at all times. Furthermore, it is possible to prevent the air flow in the cup from being disturbed during the rotation processing of the substrate, which adversely affects the formation of the coating film on the substrate.

In particular, in the cup cleaning apparatus according to the second aspect of the present invention, by disposing a plurality of nozzles toward the inner surface of the cup, it is possible to clean over a wide area of the inner surface of the cup.

Particularly, in the cup cleaning apparatus according to the third aspect of the invention, the nozzle holding member having a plurality of nozzles is moved in the vertical direction or the circumferential direction to discharge the cleaning liquid in various directions, whereby Even if the inner surface has a complicated shape, it is possible to reliably perform cleaning without causing cleaning leakage.

[0024]

1 is a sectional view of a rotary coating apparatus according to an embodiment of the present invention. The rotary coating apparatus includes a spin motor 1 and a spin chuck 3 attached to a tip of a rotation shaft 2 of the spin motor 1 as a drive mechanism for horizontally holding and rotating a substrate.

A hollow cup 4 is arranged around the spin chuck 3. The cup 4 has an opening 4a in the upper part, and a drain conduit 5 for discharging the waste liquid is connected in the lower part. A rectifying slanting plate 6 is fixed below the spin chuck 3. The straightening sloping plate 6 is provided to regulate the flow of gas in the cup 4.

Further, the rotary coating device is provided with a cup cleaning device 10 as a structure for cleaning the cup 4 and the straightening sloping plate 6. The cup cleaning device 10 includes a cleaning liquid ejecting unit 11 that ejects the cleaning liquid, a moving mechanism unit 20 that moves the cleaning liquid ejecting unit 11, and a cleaning liquid supply conduit 25 for supplying the cleaning liquid to the cleaning liquid ejecting unit 11. .

FIG. 2 is a plan view of the cup cleaning device 10. 1 and 2, the cleaning liquid discharger 11 includes a disc-shaped nozzle support member 12 and a plurality of upper surface cleaning nozzles 13.
a and a lower surface cleaning nozzle 13b. The nozzle support member 12 is formed in a size that allows it to pass through the opening 4a of the cup 4. Then, the cleaning liquid supplied through the support arm 21 is provided inside the upper surface cleaning nozzle 13
a and the cleaning liquid passage 14 leading to the lower surface cleaning nozzle 13b
(Indicated by a dotted line in FIG. 2) is formed. Further, a plurality of upper surface cleaning nozzles 13 a connected to the cleaning liquid passage 14 are attached to the outer peripheral surface of the nozzle support member 12, and a plurality of lower surface cleaning nozzles 13 b also connected to the cleaning liquid passage 14 are attached to the back surface side. Is attached.

As shown in FIG. 1, the upper surface cleaning nozzle 13a.
The nozzle port of is directed so that the cleaning liquid is discharged above the inner wall of the cup 4. This is because the treatment liquid is likely to remain above the inner wall of the cup 4 and the lower portion of the inner wall is easily washed by the washing liquid flowing down. Further, the nozzle port of the lower surface cleaning nozzle 13b is oriented so that the cleaning liquid is discharged above the inclined surface of the rectifying inclined plate 6.

Further, the cleaning liquid discharge angle and the number of installed cleaning liquids of the upper surface cleaning nozzle 13a and the lower surface cleaning nozzle 13b are as follows.
The cleaning liquid discharged from the upper surface cleaning nozzle 13a or the lower surface cleaning nozzle 13b adjacent to each other is set so as to adhere to the wall surface without a gap. Top and bottom cleaning nozzle 1
For example, spray nozzles are used as 3a and 13b.

The moving mechanism section 20 includes a support arm 21 for holding the nozzle support member 12, a swing arm 22 for moving the nozzle support member 12, and a drive section for generating a driving force for moving the nozzle support member 12. And 23.
The drive unit 23 includes a motor for swinging the swing arm 22, and a lifting mechanism provided with an air cylinder or the like for moving the swing arm 22 in the vertical direction.

As shown in FIG. 2, the motor of the drive unit 23 moves the swing arm 22 from the position where the nozzle support member 12 stands outside the cup 4 to the position above the opening 4a of the cup 4. Further, as shown in FIG. 1, the elevating mechanism of the drive unit 23 moves the nozzle support member 12 up and down between the position inserted inside the cup 4 and the position carried out above the cup 4. Further, during cleaning, the nozzle support member 12 is moved vertically in the cup 4.

Further, the support arm 21 is the swing arm 2
It is connected to a motor 24 provided on the upper part of the 2. The motor 24 is provided around the support arm 21 so that the nozzle support member 1
2 is rocked or rotated.

The cleaning liquid supply line 25 is connected to a cleaning liquid supply source provided outside the rotary coating apparatus. Further, the cleaning liquid supply pipeline 25 passes through the inside of the swing arm 22 and the support arm 21 and is connected to the inlet of the cleaning liquid passage 14 (see FIG. 2) provided in the nozzle support member 12.
In addition, the opening / closing valve 2 is provided in the middle of the cleaning liquid supply line 25.
6, a flow meter 27 and a filter 28 are provided.
The opening / closing valve 26 opens and closes the cleaning liquid supply pipe 25, and controls the supply amount of the cleaning liquid to control the discharge pressure of the cleaning liquid from the upper surface cleaning liquid nozzle 13a and the lower surface cleaning liquid nozzle 13b.

Here, the moving mechanism section 20 constitutes the nozzle moving means of the present invention, and the cleaning liquid supply pipeline 25 constitutes the cleaning liquid supply means of the present invention. The cup cleaning device 10 having the above structure is stopped at the standby position outside the cup 4 during the substrate processing. The cleaning process of the cup 4 is performed, for example, after processing one lot (25 or 50 substrates). In this case, as shown in FIG.
3 is driven to move the swing arm 22 from the standby position to above the opening 4a of the cup 4. Further, as shown in FIG. 1, the lifting mechanism of the drive unit 23 lowers the swing arm 22. As a result, the nozzle support member 12 is inserted into the cup 4 through the opening 4a of the cup 4. And
The nozzle support member 12 is stopped at a position where the upper surface cleaning liquid nozzle 13 a can discharge the cleaning liquid above the inner wall of the cup 4. At this time, the lower surface cleaning nozzle 13b is stopped at a position where the cleaning liquid can be discharged above the straightening sloping plate 6. Then, the cleaning liquid is supplied from the cleaning liquid supply conduit 25.

As a result, the cleaning liquid is supplied to the upper surface cleaning liquid nozzle 1.
3a and the lower surface cleaning liquid nozzle 13b, and is sprayed on the inner wall of the cup 4 and the surface of the rectifying inclined plate 6. The discharge pressure of the cleaning liquid can be changed by adjusting the opening degree of the opening / closing valve 26. Therefore, the cleaning liquid can be discharged in an optimum state by adjusting the discharge pressure of the cleaning liquid according to the degree and state of adhesion of the processing liquid.

Further, the lifting mechanism of the drive unit 23 moves the nozzle support member 12 in the vertical direction. Also, the motor 2
4 swings or rotates the nozzle support member 12 around the support arm 21. This makes it possible to change the discharge direction of the cleaning liquid from the upper surface cleaning liquid nozzle 13a and the lower surface cleaning liquid nozzle 13b, and supply the cleaning liquid to the inner wall of the cup 4 and the entire surface of the rectifying inclined plate 6 for cleaning.

When the cleaning process of the cup 4 is completed, the supply of the cleaning liquid is stopped. Then, the nozzle support member 12 is discharged above the cup 4, and is returned to the standby position outside the cup 4 by the drive unit 23.

As described above, the cup cleaning apparatus 10 according to the above embodiment stands by outside the cup 4 during the rotation processing of the substrate. Therefore, the substrate is not contaminated by the processing liquid, and therefore the cleaning ability is not deteriorated. Moreover, the air flow in the cup 4 is not disturbed. Further, since the nozzle support member 12 is configured to be vertically movable or rotatable during cleaning, the discharge direction of the cleaning liquid can be changed. For this reason, cup 4
Even if the inner wall of the device has a complicated shape, the cleaning liquid can be supplied to every corner for cleaning.

In the above embodiment, the shape of the nozzle support member 12 can be appropriately changed depending on the shape of the cup 4. Further, the cup cleaning device 10 according to the present invention
Can be applied not only to the rotary coating apparatus having the spin chuck 3 but also to the rotary coating apparatus having a chuck that mechanically holds the outer peripheral edge of the substrate. In this case, the shape of the nozzle support member 12 may be changed appropriately.

Further, the cup cleaning apparatus according to the present invention can be applied not only to the rotary coating apparatus but also to the rotary developing apparatus.

[Brief description of drawings]

FIG. 1 is a sectional view of a rotary coating apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view of the rotary coating device shown in FIG.

FIG. 3 is a cross-sectional view of a rotary coating device including a cup cleaning device according to a conventional example.

FIG. 4 is a cross-sectional view of a rotary coating device including a cup cleaning device according to another conventional example.

FIG. 5 is a cross-sectional view of a rotary coating device including a cup cleaning device according to still another conventional example.

[Explanation of symbols]

 Reference Signs List 3 spin chuck 4 cup 4a opening 6 rectifying inclined plate 10 cup cleaning device 11 cleaning liquid discharge part 12 nozzle support member 13a upper surface cleaning liquid nozzle 13b lower surface cleaning liquid nozzle 14 cleaning liquid passage 20 moving mechanism part 21 supporting arm 22 swinging arm 23 driving part 24 Motor 25 Cleaning liquid supply line

Claims (4)

[Claims] 1. A cup cleaning device for cleaning an inner surface of a cup that surrounds a substrate holding member that holds and rotates a substrate, comprising: a nozzle for ejecting a cleaning liquid; Nozzle moving means for moving the nozzle to a predetermined position in the cup from one side so that the cleaning liquid is discharged from the nozzle to the inner surface of the cup, and moving the nozzle to the outside of the cup after cleaning, A cup cleaning device comprising: a cleaning liquid supply unit that supplies the cleaning liquid to the nozzle. 2. The cup cleaning apparatus according to claim 1, wherein the nozzle comprises a plurality of nozzles arranged along the inner surface of the cup during the cleaning. 3. A nozzle holding member for holding the plurality of nozzles is further provided, wherein the nozzle moving means moves the nozzle holding member in a predetermined direction during cleaning to remove the cleaning liquid discharged from the nozzles. The cup cleaning device according to claim 2, wherein the discharge direction is changed. 4. A rotary type comprising: a substrate holding member for holding a substrate; rotating means for rotating the substrate holding member; and the cup cleaning device according to claim 1. Substrate processing equipment.