JPH09235143A - Coating solution for forming reflection preventing film, reflection preventing film and cathode ray tube - Google Patents
Coating solution for forming reflection preventing film, reflection preventing film and cathode ray tubeInfo
- Publication number
- JPH09235143A JPH09235143A JP8043489A JP4348996A JPH09235143A JP H09235143 A JPH09235143 A JP H09235143A JP 8043489 A JP8043489 A JP 8043489A JP 4348996 A JP4348996 A JP 4348996A JP H09235143 A JPH09235143 A JP H09235143A
- Authority
- JP
- Japan
- Prior art keywords
- film
- coating liquid
- propylene glycol
- forming
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 87
- 238000000576 coating method Methods 0.000 title claims abstract description 87
- JDSQBDGCMUXRBM-UHFFFAOYSA-N 2-[2-(2-butoxypropoxy)propoxy]propan-1-ol Chemical compound CCCCOC(C)COC(C)COC(C)CO JDSQBDGCMUXRBM-UHFFFAOYSA-N 0.000 claims abstract description 13
- -1 alkyl silicate Chemical compound 0.000 claims abstract description 12
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000002253 acid Substances 0.000 claims abstract description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims abstract description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 239000007788 liquid Substances 0.000 claims description 73
- 239000006185 dispersion Substances 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 239000006229 carbon black Substances 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- 239000000049 pigment Substances 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 claims description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical group COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 2
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 claims description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical group COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 11
- 239000007787 solid Substances 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 120
- 238000000034 method Methods 0.000 description 19
- 239000002994 raw material Substances 0.000 description 13
- 230000007547 defect Effects 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 238000009835 boiling Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 208000003464 asthenopia Diseases 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、テレビジョン放送
等の受信に用いる陰極線管、液晶ディスプレイ、プラズ
マディスプレイ等の画像表示装置の、画像表示域外面に
設けられ、帯電防止効果又は電磁波遮蔽効果を付与でき
る反射防止膜形成用塗布液、反射防止膜及び陰極線管に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is provided on the outer surface of an image display area of an image display device such as a cathode ray tube, a liquid crystal display or a plasma display used for receiving television broadcasting or the like, and has an antistatic effect or an electromagnetic wave shielding effect. The present invention relates to a coating liquid for forming an antireflection film, an antireflection film, and a cathode ray tube that can be applied.
【0002】[0002]
【従来の技術】ブラウン管は作動電圧として25〜32
kV程度の高電圧が印加されるため、その表面に帯電し
た静電気により粉塵が付着し画像が見にくくなったり、
外表面に人体が触れた際の放電により電気ショックを受
けることがあるため、その表面に導電膜を形成してこれ
を防止することが広く行われている。2. Description of the Related Art A cathode ray tube has an operating voltage of 25 to 32.
Since a high voltage of about kV is applied, dust is attached to the surface due to static electricity charged, making it difficult to see images.
Since an electric shock may occur due to discharge when a human body touches the outer surface, it is widely practiced to form a conductive film on the surface to prevent this.
【0003】また、ブラウン管の前面ガラスであるパネ
ルの表面で外光が反射し、画像が見にくくなるので、長
時間の視覚は眼精疲労を招きやすい。その防止策とし
て、帯電防止処理とともに可視光域での低反射処理を行
うことも必要となっている。加えて、人体の安全性の点
から、ブラウン管のフライバックトランスと偏向ヨーク
コイルから発生する電磁波の漏洩の防止が望まれてき
た。Further, since external light is reflected on the surface of the panel, which is the front glass of the cathode ray tube, and the image becomes difficult to see, long-term vision easily causes eye strain. As a preventive measure, it is also necessary to carry out antireflection processing and low reflection processing in the visible light region. In addition, from the viewpoint of safety of the human body, it has been desired to prevent leakage of electromagnetic waves generated from the flyback transformer of the cathode ray tube and the deflection yoke coil.
【0004】電磁波の漏洩は、ブラウン管表面に透明導
電膜を形成することで防止できるが、一般に帯電防止に
は表面抵抗108 〜1010Ω/□、電磁波遮蔽には表面
抵抗102 〜108 Ω/□、特には102 〜103 Ω/
□の膜が用いられている。The leakage of electromagnetic waves can be prevented by forming a transparent conductive film on the surface of the cathode ray tube. Generally, surface resistance is 10 8 to 10 10 Ω / □ for antistatic and surface resistance 10 2 to 10 8 is for electromagnetic wave shielding. Ω / □, especially 10 2 to 10 3 Ω /
The film of □ is used.
【0005】従来、このような低反射帯電防止膜として
は、屈折率と膜厚を所定の値に制御した複数の薄膜をガ
ラス表面に形成する方法が一般に知られている。Conventionally, as such a low reflection antistatic film, a method of forming a plurality of thin films on a glass surface with the refractive index and the film thickness being controlled to predetermined values is generally known.
【0006】具体的には、特開平1−299887に記
載のように、湿式法(スプレー法、スピンコート法等に
よりガラス表面に透明導電膜及び低屈折率膜を形成する
方法)、乾式法(CVD法、スパッタリング法、真空蒸
着法等で複数の薄膜を形成する方法)、及び湿式法と乾
式法の両者を組み合わせた方法等が挙げられる。Specifically, as described in JP-A-1-299887, a wet method (a method of forming a transparent conductive film and a low refractive index film on a glass surface by a spray method, a spin coating method, etc.), a dry method ( A method of forming a plurality of thin films by a CVD method, a sputtering method, a vacuum vapor deposition method, etc., and a method of combining both a wet method and a dry method.
【0007】湿式法は、乾式法に比べ、高価な真空装置
を必要としないため、大量生産や設備コスト面で有利で
ある。湿式法の場合、周囲光に対するコントラストを向
上させるため、塗膜形成用の塗布液に無機顔料、有機顔
料、有機染料等を添加し、光吸収性を付与することが比
較的容易である。[0007] The wet method does not require an expensive vacuum apparatus as compared with the dry method, and thus is advantageous in terms of mass production and equipment costs. In the case of the wet method, it is relatively easy to add an inorganic pigment, an organic pigment, an organic dye, or the like to a coating solution for forming a coating film to impart light absorbency in order to improve contrast with respect to ambient light.
【0008】[0008]
【発明が解決しようとする課題】低反射帯電防止膜とし
ては、空気側に低屈折率材料膜、透明基材側に高屈折率
で導電性材料からなる膜の2層膜構成、又は3層以上の
多層膜構成による光干渉膜が一般的である。このような
多層膜構成による表面反射防止法には、精密な膜厚制御
と塗布面全体の膜均一性が必要である。As the low reflection antistatic film, a low refractive index material film is formed on the air side and a transparent base material side is formed of a conductive material having a high refractive index. An optical interference film having the above-mentioned multilayer film structure is generally used. The anti-reflection method using such a multilayer film configuration requires precise film thickness control and film uniformity over the entire coated surface.
【0009】スピンコートを行う際にパネル面上に異物
が存在すると、その周辺の膜厚が変化し干渉色の異なる
欠点が生じる。スピンコートの特徴として、ブラウン管
パネル表面に滴下された液は、パネルの回転によって生
じる遠心力により外周方向に広がるため、異物が存在す
るとそこを起点として外周方向に欠点が大きく拡大す
る。そこで、異物付着防止のために塗布環境のクリーン
化が必要となるが、高クリーン度を維持するコストが大
きいため、異物が存在しても欠点が拡大しにくい塗布液
が求められていた。[0009] If foreign matter is present on the panel surface during spin coating, the film thickness around the surface will change, resulting in different defects of interference colors. As a feature of the spin coating, the liquid dropped on the surface of the CRT panel spreads in the outer circumferential direction due to centrifugal force generated by the rotation of the panel. Therefore, if there is a foreign substance, the defect greatly expands in the outer circumferential direction starting there. Therefore, it is necessary to clean the coating environment in order to prevent foreign matter from adhering, but since the cost of maintaining a high degree of cleanliness is high, there has been a demand for a coating solution that is less likely to cause defects even when foreign matter is present.
【0010】一般に、塗布液をブラウン管に塗布後、塗
膜に焼成を施すが、ブラウン管に許容できる焼成温度は
200℃程度である。200℃程度の焼成温度は、充分
な膜強度を得るためには必ずしも高くないため、この程
度の温度でも充分に実用に耐える膜強度を付与する必要
がある。湿式法による2層膜の場合、耐擦傷試験を行う
と上層膜と下層膜の界面から剥離しやすい問題があっ
た。また上層膜は大気に接するため、耐擦傷性の他にも
耐候性等の安定性も要求されていた。Generally, after the coating liquid is applied to a cathode ray tube, the coating film is baked, and the baking temperature allowable for the cathode ray tube is about 200 ° C. Since a baking temperature of about 200 ° C. is not necessarily high in order to obtain sufficient film strength, it is necessary to give a film strength sufficient for practical use even at this temperature. In the case of the two-layer film by the wet method, there was a problem that the scratch resistance test was likely to cause peeling from the interface between the upper layer film and the lower layer film. Further, since the upper layer film is exposed to the atmosphere, stability such as weather resistance is required in addition to scratch resistance.
【0011】本発明の目的は、従来技術の前述の欠点を
解決するために、ブラウン管表面等に均一でかつ高強度
で耐候性に優れた、帯電防止効果及び電磁波遮蔽効果を
付与できる反射防止膜形成用塗布液を提供することであ
る。In order to solve the above-mentioned drawbacks of the prior art, an object of the present invention is to provide an antireflection film having uniform and high strength and excellent weather resistance on the surface of a cathode ray tube and the like, which can impart an antistatic effect and an electromagnetic wave shielding effect. It is to provide a coating solution for forming.
【0012】[0012]
【課題を解決するための手段】本発明は、アルキルシリ
ケート及びその加水分解物から選ばれる1種以上と、炭
素数が1〜3の低級アルコールを50〜80重量%と、
プロピレングリコールエーテル及びプロピレングリコー
ルエーテルアセテートから選ばれる1種以上を10〜3
0重量%以下と、ジアセトンアルコールを2〜20重量
%と、水と、酸とを含有することを特徴とする反射防止
膜形成用塗布液を提供する。The present invention comprises one or more selected from alkyl silicates and hydrolysates thereof, and 50 to 80% by weight of a lower alcohol having 1 to 3 carbon atoms,
10 to 3 of at least one selected from propylene glycol ether and propylene glycol ether acetate
Provided is a coating liquid for forming an antireflection film, which contains 0% by weight or less, 2 to 20% by weight of diacetone alcohol, water, and an acid.
【0013】また本発明は、透明基材の上に形成された
導電性酸化物被膜の表面に、前記反射防止膜形成用塗布
液を塗布、乾燥して形成してなることを特徴とする反射
防止膜を提供する。Further, the present invention is characterized in that the coating liquid for forming an antireflection film is applied to the surface of a conductive oxide film formed on a transparent substrate and dried to form a reflection film. Providing a barrier film.
【0014】さらに本発明は、陰極線管用パネルの画像
が表示されるフェース面に、前記反射防止膜が形成され
てなることを特徴とする陰極線管を提供する。Further, the present invention provides a cathode ray tube characterized in that the antireflection film is formed on a face surface of a panel for a cathode ray tube on which an image is displayed.
【0015】[0015]
【発明の実施の形態】本発明者らは、上記組成の反射防
止膜形成用塗布液(以下、塗布液という)を使用して低
反射帯電防止膜又は低反射電磁波遮蔽膜を形成すること
により、膜厚ムラがなく、塗布時にパネル表面に異物が
存在しても欠点が目立ちにくく、また耐擦傷試験におい
ても強度が高く、耐候性試験においても安定で信頼性の
高いものが得られることを見いだした。BEST MODE FOR CARRYING OUT THE INVENTION The present inventors have prepared a low reflection antistatic film or a low reflection electromagnetic wave shielding film by using a coating liquid for forming an antireflection film (hereinafter referred to as a coating liquid) having the above composition. In addition, there is no unevenness in film thickness, defects are not noticeable even if foreign substances are present on the panel surface at the time of application, and the strength is high in the scratch resistance test, and stable and reliable in the weather resistance test. I found it.
【0016】本発明において、塗布液におけるアルキル
シリケートの加水分解物の平均分子量は、ポチスチレン
換算で400〜2000であることが好ましい。400
未満では、沸騰水に浸漬した場合に膜表面が一部溶解す
るため膜の安定性に劣り、2000超では、2層膜の上
層とした際に下層膜の微細な凹凸に充分食い込むことが
できずに強度が低くなる。アルキルシリケート及びその
加水分解物から選ばれる1種以上の量は、固形物換算で
0.01〜20重量%が好ましい。In the present invention, the average molecular weight of the hydrolyzate of the alkyl silicate in the coating liquid is preferably 400 to 2000 in terms of pothistyrene. 400
If it is less than 2, the film surface will be partially dissolved when immersed in boiling water, and the stability of the film will be poor. If it exceeds 2000, when it is used as the upper layer of the two-layer film, it can sufficiently penetrate into the fine irregularities of the lower layer film. Without the strength. The amount of one or more selected from alkyl silicates and hydrolysates thereof is preferably 0.01 to 20% by weight in terms of solid matter.
【0017】本発明において、プロピレングリコールエ
ーテルは、プロピレングリコールモノメチルエーテル
(以下、PGMMEと略す)、プロピレングリコールモ
ノエチルエーテル(以下、PGMEEと略す)又はプロ
ピレングリコールモノプロピルエーテル(以下、PGM
PEと略す)であることが、均一な膜を得られる点で好
ましい。また、プロピレングリコールエーテルアセテー
トはプロピレングリコールモノメチルエーテルアセテー
ト(以下、PGMMEAと略す)であることが均一な膜
を得られる点で好ましい。In the present invention, propylene glycol ether means propylene glycol monomethyl ether (hereinafter abbreviated as PGMME), propylene glycol monoethyl ether (hereinafter abbreviated as PGMEE) or propylene glycol monopropyl ether (hereinafter PGM).
It is preferable that PE is abbreviated) because a uniform film can be obtained. Further, the propylene glycol ether acetate is preferably propylene glycol monomethyl ether acetate (hereinafter abbreviated as PGMMEA) from the viewpoint of obtaining a uniform film.
【0018】塗布液には硝酸が0.01〜5重量%含ま
れることが好ましく、0.01重量%未満ではシリケー
トが充分加水分解されない点で不都合であり、5重量%
超では経時的に重合が進んでしまう点で不都合である。The coating solution preferably contains 0.01 to 5% by weight of nitric acid. If the amount is less than 0.01% by weight, it is inconvenient because the silicate is not sufficiently hydrolyzed.
If it exceeds the above range, it is disadvantageous in that the polymerization proceeds with time.
【0019】またアルキルシリケート1モルに対し水を
4〜24モル含むことが好ましく、4モル未満では基材
に対する濡れ性が劣る点で不都合であり、24モル超で
も基材に対する濡れ性が劣る点で不都合である。Water is preferably contained in an amount of 4 to 24 mol per mol of the alkyl silicate, and if it is less than 4 mol, the wettability to the base material is inferior, and if it exceeds 24 mol, the wettability to the base material is inferior. It is inconvenient.
【0020】本発明のアルキルシリケートとしては、加
水分解反応によりシリカゾルとなりうるものであれば特
に限定されず、例えばメチルシリケート、エチルシリケ
ートに代表されるアルキルシリケートのモノマーや、メ
チルシリケート51(以下、MS51と略す)、エチル
シリケート40(以下、ES40と略す)、エチルシリ
ケート45(以下、ES45と略す)のような重合体が
好ましく使用できる。ここで、MS51はシリケート1
00g中にSiO2 (固形分)を51g含むものを意味
し、ES40、ES45も同様である。The alkyl silicate of the present invention is not particularly limited as long as it can be converted into silica sol by a hydrolysis reaction, and examples thereof include alkyl silicate monomers typified by methyl silicate and ethyl silicate, and methyl silicate 51 (hereinafter referred to as MS51). Polymers such as ethyl silicate 40 (hereinafter abbreviated as ES40) and ethyl silicate 45 (hereinafter abbreviated as ES45) can be preferably used. Here, MS51 is silicate 1
This means that 51 g of SiO 2 (solid content) is contained in 00 g, and the same applies to ES40 and ES45.
【0021】本発明の塗布液は、上記のような成分、組
成を有するため、基体に対する塗れ性が良く、異物が存
在しても均一に成膜でき、また耐擦傷性や耐候性の優れ
た膜が形成できる。特にアンチモンドープ酸化錫粉末の
分散液又はインジウム錫酸化物の分散液を塗布、乾燥し
て形成された高屈折率の導電性酸化物被膜の上に塗布す
る場合、前記効果を付与した低反射帯電防止膜又は低反
射電磁波遮蔽膜を形成できる。Since the coating liquid of the present invention has the above components and compositions, it has good wettability with respect to the substrate, can form a uniform film even in the presence of foreign matter, and has excellent scratch resistance and weather resistance. A film can be formed. In particular, when a dispersion liquid of antimony-doped tin oxide powder or a dispersion liquid of indium tin oxide is applied and then applied on a conductive oxide film having a high refractive index, which is formed by drying, a low reflection electrification which imparts the above effect is obtained. An anti-reflection film or a low reflection electromagnetic wave shielding film can be formed.
【0022】さらに高屈折率の導電性酸化物導電膜が、
黒色顔料としてカーボンブラック及び/又はチタンブラ
ックを含む着色膜である場合、前記効果を付与した高コ
ントラストの低反射帯電防止膜又は低反射電磁波遮蔽膜
を形成できる。Further, a conductive oxide conductive film having a high refractive index,
In the case of a colored film containing carbon black and / or titanium black as the black pigment, a high-contrast low-reflection antireflection film or low-reflection electromagnetic wave shielding film having the above-mentioned effect can be formed.
【0023】本発明の塗布液は、塗布液の表面張力、粘
度、乾燥速度を最適に制御でき、均一な膜を形成でき
る。湿式法のなかでも代表的な成膜法であるスピンコー
ト法により、ブラウン管用パネル表面に膜を形成する場
合について詳細に説明すると、一般的には、パネルフェ
ースの外表面を洗浄し乾燥した後30〜50℃の温度に
保ち、ブラウン管を100〜150rpmの低速で回転
させながらフェース面に対向して配置されたノズルから
塗布液を滴下する。The coating liquid of the present invention can optimally control the surface tension, viscosity and drying rate of the coating liquid and can form a uniform film. The case of forming a film on the surface of a cathode ray tube panel by a spin coating method, which is a typical film forming method among wet methods, will be described in detail. Generally, after the outer surface of the panel face is washed and dried, While maintaining the temperature at 30 to 50 ° C., the coating liquid is dropped from a nozzle arranged facing the face surface while rotating the cathode ray tube at a low speed of 100 to 150 rpm.
【0024】フェース面にかけられた塗布液は回転によ
って生じる遠心力により、フェース面の外表面に沿って
周辺方向に流れ、周辺部から余剰の塗布液が飛散し、フ
ェース外表面には均一な塗膜が形成される。ブラウン管
表面上に形成された導電性酸化物被膜の上に、反射防止
膜用低屈折率膜として塗布する際は、ガラス表面に塗布
する場合と異なり、微粒子による微細な凹凸が存在する
ため、塗布液が均一に塗れ広がるためには表面張力、粘
度、乾燥速度を最適に制御することを要する。The centrifugal force generated by the rotation causes the coating liquid applied to the face surface to flow in the peripheral direction along the outer surface of the face surface, and the excess coating liquid is scattered from the peripheral portion to uniformly coat the outer surface of the face. A film is formed. When coating as a low refractive index film for antireflection film on a conductive oxide film formed on the surface of a cathode ray tube, unlike when coating on a glass surface, there are fine irregularities due to fine particles, so coating It is necessary to optimally control the surface tension, the viscosity, and the drying speed in order for the liquid to be uniformly spread and spread.
【0025】そこで、沸点が低く蒸気圧の高い炭素数が
1〜3の低級アルコール、これより沸点が高く蒸気圧の
低いプロピレングリコールエーテル又はプロピレングリ
コールエーテルアセテート、これらよりさらに沸点が高
く蒸気圧の低いジアセトンアルコール(以下、DAAと
略す)を、本発明のように配合することにより、フェー
ス全面で膜厚偏差の少ない均一な膜が得られる。Therefore, a lower alcohol having a low boiling point and a high vapor pressure and having 1 to 3 carbon atoms, a propylene glycol ether or a propylene glycol ether acetate having a higher boiling point and a lower vapor pressure, and a higher boiling point and a lower vapor pressure than these By blending diacetone alcohol (hereinafter abbreviated as DAA) as in the present invention, a uniform film with a small film thickness deviation can be obtained over the entire face.
【0026】また塗布時にフェース面に異物が存在する
と、外周方向に尾を引いたような欠点が発生するのが常
であるが、前記組成の塗布液は塗れ広がりと固化すなわ
ちゲル化の速度を最適に制御されているため、たとえ異
物が存在しても塗布液が固化する前に異物周辺に回り込
み、異物周辺における膜厚偏差を抑えうる。したがって
尾引きの長さも小さくきわめて目立ちにくく、大量生産
した場合の外観の歩留まりも飛躍的に向上させうる。Further, when foreign matter is present on the face surface during coating, a defect such as a trailing edge is usually generated. However, the coating solution having the above composition has a spreading and solidifying or gelling speed. Since it is optimally controlled, even if a foreign substance is present, the coating liquid wraps around the foreign substance before it solidifies, and the deviation in film thickness around the foreign substance can be suppressed. Therefore, the length of the tailing is small and extremely inconspicuous, and the yield of the appearance in mass production can be dramatically improved.
【0027】低反射帯電防止膜又は低反射電磁波遮蔽膜
は、下層に導電性酸化物微粒子を含む高屈折率の導電性
酸化物被膜を形成し、上層に本発明の塗布液からなる低
屈折率層を形成することにより構成される。この低反射
帯電防止膜又は低反射電磁波遮蔽膜の耐擦傷試験により
認められた傷を顕微鏡観察すると、一般には上層膜と下
層膜との界面から剥離する場合が多いことがわかる。The low-reflection antistatic film or the low-reflection electromagnetic wave shielding film has a conductive oxide film having a high refractive index containing conductive oxide fine particles formed on the lower layer, and a low refractive index comprising the coating liquid of the present invention on the upper layer. It is constructed by forming layers. Microscopic observation of scratches observed in the scratch resistance test of the low-reflection antistatic film or the low-reflection electromagnetic wave shielding film reveals that the scratches are often peeled from the interface between the upper layer film and the lower layer film.
【0028】本発明は、水分量及び酸濃度を前述の通り
とすることにより、アルキルシリケートの加水分解率が
高く、平均分子量が400〜2000に制御された塗布
液が得られ、上層膜が下層膜の微細な凹凸に食い込み密
着性の高い膜が得られる。In the present invention, by setting the water content and the acid concentration as described above, a coating solution in which the hydrolysis rate of alkyl silicate is high and the average molecular weight is controlled to 400 to 2000 is obtained, and the upper layer film is the lower layer. A film having a high adhesiveness is obtained by biting into fine irregularities of the film.
【0029】酸としては、硝酸、塩酸以外にも硫酸、酢
酸等が挙げられるが、硫酸は揮発しにくく、酢酸は弱酸
で反応の進行が遅いので、硝酸又は塩酸が好ましい。Examples of the acid include sulfuric acid, acetic acid and the like in addition to nitric acid and hydrochloric acid. Sulfuric acid is difficult to volatilize, and acetic acid is a weak acid and the reaction proceeds slowly, so nitric acid or hydrochloric acid is preferable.
【0030】本発明の塗布液を、アンチモンドープ酸化
錫粉末の分散液又はインジウム錫酸化物の分散液を塗
布、乾燥して形成した高屈折率の導電性酸化物被膜(下
層膜)の上に塗布し、100〜200℃で焼成すること
により、均一性の高い、高強度の低反射帯電防止膜又は
低反射電磁波遮蔽膜となしうる。The coating liquid of the present invention is applied on a dispersion liquid of antimony-doped tin oxide powder or a dispersion liquid of indium tin oxide and dried to form a conductive oxide film (underlayer film) having a high refractive index. By coating and baking at 100 to 200 ° C., a highly uniform and high-strength low reflection antistatic film or low reflection electromagnetic wave shielding film can be formed.
【0031】下層膜に黒色顔料としてカーボンブラック
及び/又はチタンブラックを含有させることにより、外
光が吸収され反射特性がさらに向上し、周囲光に対する
コントラストも向上する。By including carbon black and / or titanium black as a black pigment in the lower layer film, external light is absorbed, the reflection characteristics are further improved, and the contrast to ambient light is also improved.
【0032】本発明の反射防止膜を設けた陰極線管は、
低反射帯電防止効果、低反射電磁波遮蔽効果、高コント
ラスト等の優れた作用効果を有する。The cathode ray tube provided with the antireflection film of the present invention is
It has excellent effects such as low reflection antistatic effect, low reflection electromagnetic wave shielding effect, and high contrast.
【0033】[0033]
【実施例】以下に実施例(例1〜8)、比較例(例9、
10)を具体的に説明するが、本発明は以下の実施例に
限定されない。EXAMPLES Examples (Examples 1 to 8) and Comparative Examples (Example 9, below)
10) will be specifically described, but the present invention is not limited to the following examples.
【0034】(1)成膜法 ブラウン管フェースの外表面を洗浄し、乾燥後、30〜
50℃の温度に保ち、ブラウン管を100〜150rp
mの低速で回転させながら、フェース面に対向して配置
されたノズルから導電性酸化物被膜形成用塗布液を滴下
した。塗膜の乾燥後、再度ブラウン管を100〜150
rpmの低速で回転させながら本発明の反射防止膜形成
用塗布液を滴下した。次に、ブラウン管フェース面を1
60℃で30分保持することにより、表面に低反射帯電
防止膜又は低反射電磁波遮蔽膜を形成した。(1) Film forming method The outer surface of the cathode ray tube face is washed and dried,
Keep the temperature at 50 ℃, CRT 100 ~ 150 rp
While rotating at a low speed of m, the coating liquid for forming a conductive oxide film was dropped from a nozzle arranged facing the face surface. After drying the coating film, place the CRT again at 100-150.
The coating liquid for forming an antireflection film of the present invention was dropped while rotating at a low speed of rpm. Next, set the CRT face face to 1
By holding at 60 ° C. for 30 minutes, a low-reflection antistatic film or a low-reflection electromagnetic wave shielding film was formed on the surface.
【0035】(2)評価 (平均分子量)塗布液の平均分子量は、次の装置を用い
ゲル浸透クロマトグラフィで測定した。装置:ゲル・パ
ーミエイション・クロマトグラフHLC−8020(東
ソー社製)、カラム:TSK−ゲル 2500H及び3
000H、溶媒:テトラヒドロフラン。(2) Evaluation (Average molecular weight) The average molecular weight of the coating solution was measured by gel permeation chromatography using the following apparatus. Device: Gel Permeation Chromatograph HLC-8020 (manufactured by Tosoh Corporation), Column: TSK-Gel 2500H and 3
000H, solvent: tetrahydrofuran.
【0036】(パネル面内の膜厚ムラ)イージー・アン
ド・ガンマ・サイエンス社製分光反射率測定システムに
より、パネル面内の反射特性を測定し、パネル面内にお
けるボトム波長の最大値と最小値を測定した。膜厚が厚
いほどボトム波長は長波長側にシフトし、膜厚が薄いほ
どボトム波長は短波長側にシフトするため、最大値と最
小値の差が少ないほど、均一な膜であるとした。(Thickness unevenness in panel plane) The reflection characteristic in the panel plane was measured by a spectral reflectance measurement system manufactured by Easy & Gamma Science Co., and the maximum and minimum values of the bottom wavelength in the panel plane were measured. Was measured. Since the bottom wavelength shifts to the long wavelength side as the film thickness increases, and the bottom wavelength shifts to the short wavelength side as the film thickness decreases, the smaller the difference between the maximum value and the minimum value, the more uniform the film.
【0037】(外観欠点の目立ちやすさ)クリーン度1
000のブースの下で作成した膜の外観検査を行い、2
mm以上の尾引きを伴う欠点の個数を数えた。(Easyness of appearance defect) Cleanliness 1
The appearance of the film made under the 000 booth was inspected.
The number of defects with a trailing length of mm or more was counted.
【0038】(耐擦傷性)1kgの荷重の下で、消しゴ
ムで膜表面を50回往復後、その表面の傷の付き方を目
視で判定した。判定基準は、○:傷なし、△:多少傷あ
り、×:傷多数あり、とした。(Scratch resistance) After a reciprocation of the film surface 50 times with an eraser under a load of 1 kg, how the surface was scratched was visually determined. The criteria for judgment were as follows: ○: no scratches, Δ: some scratches, ×: many scratches.
【0039】(耐沸騰水性)膜を形成した5cm角のガ
ラスピースを沸騰水に30分浸漬し、浸漬前後のボトム
波長の変化を測定した。(Boiling-resistant water resistance) A 5 cm square glass piece on which a film was formed was immersed in boiling water for 30 minutes, and the change in bottom wavelength before and after immersion was measured.
【0040】(3)塗布液の調製 導電性酸化物被膜形成用塗布液を次のようにして調製し
た。表1のA欄の原料をB欄のイオン交換水中に分散さ
せた後、C欄の原料を撹拌混合してD欄の名称の均一な
分散液を得た。なお表1の数字は原料量(単位:重量量
%)を示す。(3) Preparation of coating liquid A coating liquid for forming a conductive oxide film was prepared as follows. After the raw materials in the A column of Table 1 were dispersed in the ion-exchanged water in the B column, the raw materials in the C column were mixed by stirring to obtain a uniform dispersion having the name in the D column. The numbers in Table 1 indicate the amounts of raw materials (unit:% by weight).
【0041】[例1]表2に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−1)。
塗布液A−1(下層)と塗布液B−1(上層)を組み合
わせて、ブラウン管の表面に低反射電磁波遮蔽膜を形成
した。得られた膜の特性を表4に示す。Example 1 The kinds and amounts (unit: wt%) of raw materials shown in Table 2 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). B-1).
The coating liquid A-1 (lower layer) and the coating liquid B-1 (upper layer) were combined to form a low reflection electromagnetic wave shielding film on the surface of the Braun tube. The characteristics of the obtained film are shown in Table 4.
【0042】[例2]表2に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−2)。
塗布液A−2と塗布液B−2を組み合わせて、ブラウン
管の表面に低反射帯電防止膜を形成した。得られた膜の
特性を表4に示す。[Example 2] Raw materials of the types and amounts (unit:% by weight) shown in Table 2 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). B-2).
The coating liquid A-2 and the coating liquid B-2 were combined to form a low reflection antistatic film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0043】[例3]表2に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−3)。
塗布液A−3と塗布液B−3を組み合わせて、ブラウン
管の表面に低反射帯電防止膜を形成した。得られた膜の
特性を表4に示す。[Example 3] Raw materials of the types and amounts (unit:% by weight) shown in Table 2 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). B-3).
The coating liquid A-3 and the coating liquid B-3 were combined to form a low reflection antistatic film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0044】[例4]表2に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−4)。
塗布液A−4と塗布液B−4を組み合わせて、ブラウン
管の表面に低反射帯電防止膜を形成した。得られた膜の
特性を表4に示す。[Example 4] Raw materials of the types and amounts (unit:% by weight) shown in Table 2 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid. B-4).
The coating liquid A-4 and the coating liquid B-4 were combined to form a low reflection antistatic film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0045】[例5]表2に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−5)。
塗布液A−5と塗布液B−5を組み合わせて、ブラウン
管の表面に低反射電磁波遮蔽膜を形成した。得られた膜
の特性を表4に示す。Example 5 Raw materials of the types and amounts (unit: wt%) shown in Table 2 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). B-5).
The coating liquid A-5 and the coating liquid B-5 were combined to form a low reflection electromagnetic wave shielding film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0046】[例6]表3に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−6)。
塗布液A−5と塗布液B−6を組み合わせて、ブラウン
管の表面に低反射電磁波遮蔽膜を形成した。得られた膜
の特性を表4に示す。[Example 6] Raw materials of the types and amounts (unit: wt%) shown in Table 3 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). B-6).
The coating liquid A-5 and the coating liquid B-6 were combined to form a low reflection electromagnetic wave shielding film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0047】[例7]表3に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液B−7)。
塗布液A−5と塗布液B−7を組み合わせて、ブラウン
管の表面に低反射帯電防止膜を形成した。得られた膜の
特性を表4に示す。[Example 7] Raw materials of the types and amounts (unit:% by weight) shown in Table 3 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). B-7).
The coating liquid A-5 and the coating liquid B-7 were combined to form a low reflection antistatic film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0048】[例8]表3に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い均一
な反射防止膜形成用塗布液を得た(塗布液B−8)。塗
布液A−1と塗布液B−8を組み合わせて、ブラウン管
の表面に低反射電磁波遮蔽膜を形成した。得られた膜の
特性を表4に示す。[Example 8] Raw materials of the types and amounts (unit:% by weight) shown in Table 3 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid B). -8). The coating liquid A-1 and the coating liquid B-8 were combined to form a low reflection electromagnetic wave shielding film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0049】[例9]表3に示す種類と量(単位:重量
%)の原料を混合、撹拌して加水分解、重合を行い、均
一な反射防止膜形成用塗布液を得た(塗布液C−1)。
塗布液A−1と塗布液C−1を組み合わせて、ブラウン
管の表面に低反射帯電防止膜を形成した。得られた膜の
特性を表4に示す。[Example 9] Raw materials of the types and amounts (unit: wt%) shown in Table 3 were mixed, stirred and hydrolyzed and polymerized to obtain a uniform coating liquid for forming an antireflection film (coating liquid). C-1).
The coating liquid A-1 and the coating liquid C-1 were combined to form a low reflection antistatic film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0050】[例10]表3に示す種類と量(単位:重
量%)の原料を混合、撹拌して加水分解、重合を行い、
均一な反射防止膜形成用塗布液を得た(塗布液C−
2)。塗布液A−1と塗布液C−2を組み合わせて、ブ
ラウン管の表面に低反射帯電防止膜を形成した。得られ
た膜の特性を表4に示す。[Example 10] Raw materials of the types and amounts (unit: wt%) shown in Table 3 were mixed, stirred and hydrolyzed and polymerized,
A uniform coating liquid for forming an antireflection film was obtained (coating liquid C-
2). The coating liquid A-1 and the coating liquid C-2 were combined to form a low reflection antistatic film on the surface of the cathode ray tube. The characteristics of the obtained film are shown in Table 4.
【0051】[0051]
【表1】 [Table 1]
【0052】[0052]
【表2】 [Table 2]
【0053】[0053]
【表3】 [Table 3]
【0054】[0054]
【表4】 [Table 4]
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C09K 3/00 C09K 3/00 R G02B 1/11 G02F 1/1335 G02F 1/1335 H01J 9/20 A H01J 9/20 29/88 29/88 G02B 1/10 A ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location C09K 3/00 C09K 3/00 R G02B 1/11 G02F 1/1335 G02F 1/1335 H01J 9/20 A H01J 9/20 29/88 29/88 G02B 1/10 A
Claims (8)
ら選ばれる1種以上と、炭素数が1〜3の低級アルコー
ルを50〜80重量%と、プロピレングリコールエーテ
ル及びプロピレングリコールエーテルアセテートから選
ばれる1種以上を10〜30重量%以下と、ジアセトン
アルコールを2〜20重量%と、水と、酸とを含有する
ことを特徴とする反射防止膜形成用塗布液。1. One or more selected from alkyl silicates and hydrolysates thereof, 50 to 80% by weight of a lower alcohol having 1 to 3 carbon atoms, and one selected from propylene glycol ether and propylene glycol ether acetate. A coating liquid for forming an antireflection film, characterized in that it contains 10 to 30% by weight or less of the above, 2 to 20% by weight of diacetone alcohol, water, and an acid.
子量が、ポリスチレン換算で400〜2000である請
求項1記載の反射防止膜形成用塗布液。2. The coating liquid for forming an antireflection film according to claim 1, wherein the hydrolyzate of the alkyl silicate has an average molecular weight of 400 to 2000 in terms of polystyrene.
レングリコールモノメチルエーテル、プロピレングリコ
ールモノエチルエーテル又はプロピレングリコールモノ
プロピルエーテルである請求項1又は2記載の反射防止
膜形成用塗布液。3. The coating liquid for forming an antireflection film according to claim 1, wherein the propylene glycol ether is propylene glycol monomethyl ether, propylene glycol monoethyl ether or propylene glycol monopropyl ether.
がプロピレングリコールモノメチルエーテルアセテート
である請求項1、2、又は3記載の反射防止膜形成用塗
布液。4. The coating liquid for forming an antireflection film according to claim 1, 2 or 3, wherein the propylene glycol ether acetate is propylene glycol monomethyl ether acetate.
膜の表面に、請求項1、2、3又は4記載の反射防止膜
形成用塗布液を塗布、乾燥して形成してなることを特徴
とする反射防止膜。5. An antireflection film-forming coating solution according to claim 1, 2, 3 or 4 is applied to the surface of a conductive oxide film formed on a transparent substrate and dried to form the coating. An antireflection film characterized by being.
化錫粉末の分散液又はインジウム錫酸化物の分散液を塗
布、乾燥して形成されてなることを特徴とする請求項5
記載の反射防止膜。6. The conductive oxide film is formed by applying a dispersion liquid of antimony-doped tin oxide powder or a dispersion liquid of indium tin oxide and drying the applied coating liquid.
The antireflection film according to the above.
ボンブラック及びチタンブラックから選ばれる1種以上
を含むことを特徴とする請求項5又は6記載の反射防止
膜。7. The antireflection film according to claim 5, wherein the conductive oxide film contains at least one selected from carbon black and titanium black as a black pigment.
ース面に、請求項5、6又は7記載の反射防止膜が形成
されてなることを特徴とする陰極線管。8. A cathode ray tube characterized in that the antireflection film according to claim 5, 6 or 7 is formed on a face surface of a panel for a cathode ray tube on which an image is displayed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8043489A JPH09235143A (en) | 1996-02-29 | 1996-02-29 | Coating solution for forming reflection preventing film, reflection preventing film and cathode ray tube |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8043489A JPH09235143A (en) | 1996-02-29 | 1996-02-29 | Coating solution for forming reflection preventing film, reflection preventing film and cathode ray tube |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09235143A true JPH09235143A (en) | 1997-09-09 |
Family
ID=12665138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8043489A Pending JPH09235143A (en) | 1996-02-29 | 1996-02-29 | Coating solution for forming reflection preventing film, reflection preventing film and cathode ray tube |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09235143A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1205961A1 (en) * | 2000-11-09 | 2002-05-15 | Matsushita Electric Industrial Co., Ltd. | Method of treating surface of face panel used for image display device, and image display device comprising the treated face panel |
JP2002294150A (en) * | 2001-03-29 | 2002-10-09 | Sumitomo Osaka Cement Co Ltd | Coating material for electroconductive film and electroconductive film using the same, cathode-ray tube |
JP2015199916A (en) * | 2014-04-02 | 2015-11-12 | Jsr株式会社 | Film-forming composition and pattern-forming method |
-
1996
- 1996-02-29 JP JP8043489A patent/JPH09235143A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1205961A1 (en) * | 2000-11-09 | 2002-05-15 | Matsushita Electric Industrial Co., Ltd. | Method of treating surface of face panel used for image display device, and image display device comprising the treated face panel |
JP2002294150A (en) * | 2001-03-29 | 2002-10-09 | Sumitomo Osaka Cement Co Ltd | Coating material for electroconductive film and electroconductive film using the same, cathode-ray tube |
JP2015199916A (en) * | 2014-04-02 | 2015-11-12 | Jsr株式会社 | Film-forming composition and pattern-forming method |
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