JPH09188773A - Fluorocarbon resin surface modification method - Google Patents
Fluorocarbon resin surface modification methodInfo
- Publication number
- JPH09188773A JPH09188773A JP5696A JP5696A JPH09188773A JP H09188773 A JPH09188773 A JP H09188773A JP 5696 A JP5696 A JP 5696A JP 5696 A JP5696 A JP 5696A JP H09188773 A JPH09188773 A JP H09188773A
- Authority
- JP
- Japan
- Prior art keywords
- fluororesin
- light
- fluororesin body
- modifying
- modifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000002715 modification method Methods 0.000 title description 3
- 239000011347 resin Substances 0.000 title description 2
- 229920005989 resin Polymers 0.000 title description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 title 1
- 239000003607 modifier Substances 0.000 claims abstract description 17
- 238000001816 cooling Methods 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 230000001678 irradiating effect Effects 0.000 claims abstract description 7
- 239000007864 aqueous solution Substances 0.000 claims abstract description 5
- 239000000126 substance Substances 0.000 claims abstract description 4
- 238000010521 absorption reaction Methods 0.000 claims abstract description 3
- 239000012298 atmosphere Substances 0.000 claims abstract description 3
- 239000003795 chemical substances by application Substances 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 22
- 230000031700 light absorption Effects 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000007086 side reaction Methods 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000007872 degassing Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000000605 extraction Methods 0.000 description 8
- 238000009833 condensation Methods 0.000 description 7
- 230000005494 condensation Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000006552 photochemical reaction Methods 0.000 description 6
- 238000012986 modification Methods 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000002407 reforming Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、一般に、フッ素
樹脂表面改質方法に関するものであり、より特定的に
は、機械部品や電子部品などに用いられるフッ素樹脂成
形品またはコーティング膜などの表面を改質する方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention generally relates to a fluororesin surface modification method, and more specifically, to a surface of a fluororesin molded article or a coating film used for mechanical parts, electronic parts and the like. A method for reforming.
【０００２】[0002]
【従来の技術】従来より、光化学反応を用いたフッ素樹
脂体（本明細書では、フッ素樹脂で形成された成形品、
コーティング膜等の総称として、この語を用いる。）の
表面改質方法として、反応させるガス雰囲気中で、フッ
素樹脂体の表面に向けて、エキシマレーザ光を照射する
方法が知られている（矢部ら著『レーザによるフッ素樹
脂の精密加工・表面改質』（機能材料，１９９３年，１
０月号，第１３巻第１０号）。また、フッ素樹脂体の表
面に水または薬剤の入った水溶液を滴下して、その上か
ら、エキシマレーザを照射する方法も知られている（大
越ら『テフロンの光改質と接着性の向上（４）』（１９
９４年春季応用物理学学術講演会予稿集、番号２９ｐ−
ＺＦ−１３）。2. Description of the Related Art Conventionally, a fluororesin body using a photochemical reaction (in this specification, a molded article formed of a fluororesin,
This term is used as a general term for coating films and the like. ), A method of irradiating the surface of the fluororesin body with an excimer laser beam in a reaction gas atmosphere is known (Yabe et al. "Precision processing of fluororesin by laser, surface Modification ”(Functional materials, 1993, 1
(October issue, Vol. 13, No. 10). Further, a method is also known in which water or an aqueous solution containing a drug is dropped on the surface of a fluororesin body, and then an excimer laser is irradiated on the surface (Ogoshi et al. “Photo-modification of Teflon and improvement of adhesiveness ( 4) ”(19
1994 Spring Applied Physics Academic Lecture Proceedings, No. 29p-
ZF-13).
【０００３】[0003]
【発明が解決しようとする課題】従来の方法では、いず
れも、光化学反応を起こすための光は、フッ素樹脂体の
表面に到達するまでに、反応ガスや水溶液を透過する。
したがって、物質の光吸収が増大する真空紫外領域の光
を用いると、フッ素樹脂体の表面上に到達する光子数
が、極端に低下し、ひいては、反応効率も低下するとい
う問題点があった。In any of the conventional methods, the light for causing the photochemical reaction passes through the reaction gas and the aqueous solution before reaching the surface of the fluororesin body.
Therefore, when the light in the vacuum ultraviolet region where the light absorption of the substance is increased is used, there is a problem that the number of photons reaching the surface of the fluororesin body is extremely decreased, and the reaction efficiency is also decreased.
【０００４】代表的なフッ素樹脂であるポリテトラフル
オロエチル（ＰＴＦＥ）を用いた場合、大きな光吸収は
波長１６５ｎｍ付近にある。したがって、上記矢部らの
方法で、波長１７０ｎｍ以上の光を用いた場合には、光
吸収が小さく、フッ素樹脂体の表面を十分に励起するこ
とが難しい。一方、波長１７０ｎｍ以下の光を用いる
と、水等の改質剤による光吸収が増大する。したがっ
て、従来の方法で、数十〜数百μｍの厚さの水の層を形
成した場合、光の減衰が問題となる。When polytetrafluoroethyl (PTFE), which is a typical fluororesin, is used, large light absorption is in the vicinity of a wavelength of 165 nm. Therefore, when light having a wavelength of 170 nm or more is used by the method of Yabe et al., The light absorption is small and it is difficult to sufficiently excite the surface of the fluororesin body. On the other hand, when light having a wavelength of 170 nm or less is used, light absorption by a modifier such as water increases. Therefore, when a water layer having a thickness of several tens to several hundreds of μm is formed by the conventional method, light attenuation becomes a problem.
【０００５】また、改質剤としてのガスの中で、光を照
射する場合、反応速度を上げるために、ガス圧力（密
度）を上げると、ガス中の、光の減衰が大きくなり、フ
ッ素樹脂体の表面に到達する光子数が減って、ひいては
反応速度を、逆に低下させるという問題点があった。Further, in the case of irradiating light in a gas as a modifier, if the gas pressure (density) is increased in order to increase the reaction rate, the attenuation of light in the gas increases, and the fluororesin There is a problem that the number of photons reaching the surface of the body is reduced, which in turn reduces the reaction rate.
【０００６】さらに、上記大越らの表面改質方法では、
フッ素樹脂体と水溶液との界面における光化学反応によ
って、フッ素樹脂体の表面から脱離したフッ素原子と反
応して生じた反応生成物にも、同時に、光が照射され
る。したがって、この反応生成物が光励起されることに
起因する化学反応が、既に改質された表面を、再び変化
させるという問題点があり、ひいては、もともとの表面
改質のための光化学反応の効率を低下させるという問題
点があった。Further, according to the surface modification method of Ogoshi et al.,
At the same time, the reaction product produced by reacting with the fluorine atoms desorbed from the surface of the fluororesin body by the photochemical reaction at the interface between the fluororesin body and the aqueous solution is also irradiated with light. Therefore, there is a problem that the chemical reaction resulting from the photoexcitation of this reaction product changes the already modified surface again, and thus the efficiency of the photochemical reaction for the original surface modification is increased. There was a problem of lowering it.
【０００７】この発明は、上記のような問題点を解決す
るためになされたもので、効率的にフッ素樹脂体の表面
を改質できるように改良された、フッ素樹脂表面の改質
方法を提供することにある。The present invention has been made to solve the above problems, and provides a method for modifying the surface of a fluororesin which is improved so that the surface of the fluororesin body can be efficiently modified. To do.
【０００８】[0008]
【課題を解決するための手段】この発明に従う、フッ素
樹脂の表面の改質方法においては、まず、改質すべきフ
ッ素樹脂体を準備する。上記フッ素樹脂体の表面を改質
させるために、該表面に反応させる改質剤を準備する。
上記フッ素樹脂体の表面に上記改質剤が凝縮してなる凝
縮層を形成する。In the method for modifying the surface of a fluororesin according to the present invention, first, a fluororesin body to be modified is prepared. In order to modify the surface of the fluororesin body, a modifier that reacts with the surface is prepared.
A condensed layer formed by condensing the modifier is formed on the surface of the fluororesin body.
【０００９】この発明によれば、凝縮層の厚さを、上記
改質剤の凝縮の条件を（ガス、水蒸気の流量や、曝露す
る時間）を制御することによって精度よく、制御でき
る。その結果、吸収による光の減衰が問題にならないよ
うな、ごく薄い層を形成することができる。さらに、こ
の凝縮層を形成したフッ素樹脂体の表面に、フッ素樹脂
の光吸収が増大する真空紫外域の波長の光を照射して
も、光源から放出された光を、ほとんど減衰させず、フ
ッ素樹脂体の表面に到達させることができ、その結果、
光の利用効率が上がり、ひいては、光源の低パワー化や
処理時間の短縮が可能となる。また、照射する光の波長
を、フッ素樹脂体の光吸収が大きい波長にしているの
で、フッ素樹脂体と凝縮層の界面で起きる光化学反応の
量子効率が増大し、ひいては、同じ光量でも、より高い
改質効果が得られる。According to the present invention, the thickness of the condensation layer can be accurately controlled by controlling the conditions for condensation of the modifier (flow rate of gas and water vapor, and exposure time). As a result, it is possible to form a very thin layer in which attenuation of light due to absorption does not matter. Furthermore, even if the surface of the fluororesin body on which the condensed layer is formed is irradiated with light having a wavelength in the vacuum ultraviolet region where the light absorption of the fluororesin increases, the light emitted from the light source is hardly attenuated and Can reach the surface of the resin body, resulting in
The use efficiency of light is improved, which in turn makes it possible to reduce the power of the light source and shorten the processing time. Further, since the wavelength of the light to be irradiated is set to a wavelength at which the light absorption of the fluororesin body is large, the quantum efficiency of the photochemical reaction occurring at the interface between the fluororesin body and the condensation layer is increased, and even with the same light quantity, higher A reforming effect can be obtained.
【００１０】この発明の他の局面に従う、フッ素樹脂の
表面改質方法においては、まず、改質すべきフッ素樹脂
体を準備する。上記フッ素樹脂体の表面を改質させるた
め、該表面に反応させる改質剤を準備する。上記フッ素
樹脂体の表面に対し、真空中で、波長１７０ｎｍ以下の
光を照射する。次いで、光の照射を停止する。その後、
フッ素樹脂体の表面に上記改質剤を接触させる。In the method for modifying the surface of a fluororesin according to another aspect of the present invention, first, a fluororesin body to be modified is prepared. In order to modify the surface of the fluororesin body, a modifier that reacts with the surface is prepared. The surface of the fluororesin body is irradiated with light having a wavelength of 170 nm or less in a vacuum. Then, the irradiation of light is stopped. afterwards,
The modifier is brought into contact with the surface of the fluororesin body.
【００１１】この発明の他の局面に従う、フッ素樹脂表
面の改質方法によれば、フッ素樹脂体の表面に照射する
光として、波長１７０ｎｍ以下の高エネルギを有する光
を用いている。この波長の光はフッ素樹脂体の表面近傍
で集中的に吸収され、かつ、電子的にも、フッ素樹脂体
の表面を高いエネルギ状態へ励起できる。そのためフッ
素樹脂体の表面のラジカル化が、効率よく実現できる。
その後、光照射を停止してから、ガスや蒸気等の改質剤
を接触させるので、表面ラジカルと改質剤との化学反応
が進んでも、それによって発生する反応生成物が光励起
されて、新たな化学反応を起こすという、従来の方法で
生じていた問題点を避けることができる。According to the method for modifying the surface of a fluororesin according to another aspect of the present invention, light having a high energy of 170 nm or less is used as the light with which the surface of the fluororesin body is irradiated. Light of this wavelength is intensively absorbed in the vicinity of the surface of the fluororesin body, and electronically, the surface of the fluororesin body can be excited to a high energy state. Therefore, radicalization of the surface of the fluororesin body can be efficiently realized.
After that, since the light irradiation is stopped and the modifier such as gas or vapor is brought into contact with the surface radical, even if the chemical reaction between the surface radical and the modifier proceeds, the reaction product generated by the chemical reaction is photoexcited and new It is possible to avoid the problem that occurs in the conventional method of causing various chemical reactions.
【００１２】[0012]
【発明の実施の形態】以下、この発明の実施の形態を図
について説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.
【００１３】発明の実施の形態１ 図１は、発明の実施の形態１に係るフッ素樹脂表面の改
質方法を実現するための装置の概念図である。 Embodiment 1 of the Invention FIG. 1 is a conceptual diagram of an apparatus for realizing a method for modifying the surface of a fluororesin according to Embodiment 1 of the invention.
【００１４】図１を参照して、当該装置は、真空チャン
バ８を備える。真空チャンバ８の内部は、真空ポンプ６
によって排気されるようになっている。真空チャンバ８
には、フランジ７が取付けられている。真空チャンバ８
内には、反応させるガスや水蒸気の凝固点または凝縮点
より低い温度に冷却できる冷凍機パネルまたは液化窒素
溜めなどで形成された冷却部５が設けられている。真空
チャンバ８には、光取出窓３が設けられており、光源２
から、光取出窓３を通って、真空チャンバ８内に光が照
射されるようになっている。光源２には、エキシマラン
プやシンクロトロン放射光、アンジュレーター放射光が
好ましく用いられる。真空チャンバ８には、真空チャン
バ８内にガスや水蒸気を供給するためのガス・水蒸気導
入口１が設けられている。Referring to FIG. 1, the apparatus comprises a vacuum chamber 8. The inside of the vacuum chamber 8 is a vacuum pump 6
It is supposed to be exhausted by. Vacuum chamber 8
A flange 7 is attached to the. Vacuum chamber 8
Inside, there is provided a cooling unit 5 formed by a refrigerator panel or a liquefied nitrogen reservoir capable of cooling to a temperature lower than the freezing point or condensation point of the gas or steam to be reacted. The vacuum chamber 8 is provided with a light extraction window 3, and the light source 2
From the above, the light is irradiated into the vacuum chamber 8 through the light extraction window 3. For the light source 2, an excimer lamp, synchrotron radiation light, or undulator radiation light is preferably used. The vacuum chamber 8 is provided with a gas / steam inlet 1 for supplying gas or steam into the vacuum chamber 8.
【００１５】冷却部５の上に、改質すべきフッ素樹脂体
４を配置する。これによってフッ素樹脂体４の表面は冷
却される。真空チャンバ８内に、ガス・水蒸気導入口１
より、反応させるガスまたは水蒸気を導入し、フッ素樹
脂体４の表面に凝縮層を形成する。その後、再度、真空
チャンバ８内を真空排気し、光源２より、真空紫外光を
真空チャンバ８内に照射する。The fluororesin body 4 to be modified is placed on the cooling section 5. As a result, the surface of the fluororesin body 4 is cooled. Inside the vacuum chamber 8, gas / steam inlet 1
Then, a gas or water vapor to be reacted is introduced to form a condensed layer on the surface of the fluororesin body 4. Then, the inside of the vacuum chamber 8 is evacuated again, and the vacuum ultraviolet light is irradiated from the light source 2 into the vacuum chamber 8.
【００１６】この発明の実施の形態１によれば、フッ素
樹脂体を反応させるガスや水蒸気の凝固点または凝縮点
より低い低温に冷却し、この表面に反応させるガスや水
蒸気を曝露、吸着させ、これらを凝縮させる。表面に吸
着形成された凝縮層の厚さは、ガス・水蒸気の流量や曝
露する時間で、精度よく制御され得る。その結果、改質
剤による光の吸収によって、光の減衰が問題とならない
ような極薄の凝縮層をフッ素樹脂体の表面に形成するこ
とができる。凝縮層が形成されたフッ素樹脂体の表面
に、真空紫外光を照射すると、光源２から放出された光
は、ほとんど減衰せず、フッ素樹脂体の表面に到達す
る。その結果、光の利用効率が上がり、光源の低パワー
化や、処理時間の短縮が可能となる。According to the first embodiment of the present invention, the fluororesin body is cooled to a low temperature lower than the freezing point or condensation point of the gas or water vapor to be reacted, and the gas or water vapor to be reacted is exposed or adsorbed on this surface, To condense. The thickness of the condensed layer adsorbed and formed on the surface can be accurately controlled by the flow rate of gas / water vapor and the exposure time. As a result, it is possible to form, on the surface of the fluororesin body, an extremely thin condensed layer in which the light attenuation due to the absorption of light by the modifier does not pose a problem. When the surface of the fluororesin body on which the condensed layer is formed is irradiated with vacuum ultraviolet light, the light emitted from the light source 2 reaches the surface of the fluororesin body with almost no attenuation. As a result, the utilization efficiency of light is improved, the power of the light source is reduced, and the processing time can be shortened.
【００１７】また、照射する光の波長を、フッ素樹脂体
の光吸収が大きい波長にすることで、フッ素樹脂体と凝
縮層の界面で起きる光化学反応の量子効率が増大し、ひ
いては同じ光量でも、より高い改質効果が得られる。Further, by setting the wavelength of the irradiation light to a wavelength at which the light absorption of the fluororesin body is large, the quantum efficiency of the photochemical reaction occurring at the interface between the fluororesin body and the condensation layer is increased, and even with the same light quantity, A higher modification effect can be obtained.
【００１８】発明の実施の形態２ 図２は発明の実施の形態２に係るフッ素樹脂表面の改質
方法を実現するための装置の概念図である。 Embodiment 2 of the Invention FIG. 2 is a conceptual diagram of an apparatus for realizing a method for modifying the surface of a fluororesin according to Embodiment 2 of the invention.
【００１９】当該装置は、照射容器１０を備え、照射容
器１０内に、フッ素樹脂体４を通過させることができる
ようになっている。フッ素樹脂体４は冷却部５によっ
て、その表面が冷却される。照射容器１０には、照射容
器１０内に、ガスや水蒸気を導入するためのガス・水蒸
気導入口１が設けられている。当該装置は、さらに、照
射容器２０内にヘリウムガスを導入するためのヘリウム
ガス導入口９が設けられている。照射容器１２には、光
取出窓３が設けられ、光源２から、光取出窓３を通っ
て、照射容器１０内に真空紫外光が照射される。The apparatus is equipped with an irradiation container 10, and the fluororesin body 4 can be passed through the irradiation container 10. The surface of the fluororesin body 4 is cooled by the cooling unit 5. The irradiation container 10 is provided with a gas / steam introducing port 1 for introducing gas or steam into the irradiation container 10. The apparatus is further provided with a helium gas inlet 9 for introducing helium gas into the irradiation container 20. A light extraction window 3 is provided in the irradiation container 12, and vacuum ultraviolet light is irradiated from the light source 2 through the light extraction window 3 into the irradiation container 10.
【００２０】発明の実施の形態２においては、真空排気
の代わりに、ヘリウムガス導入口９を取付け、照射容器
１０内にヘリウムガスを充満させて、真空紫外光を照射
する。真空排気する必要がないため、照射容器１０を開
けることなく、フッ素樹脂体４の送り込み、入れ換えが
可能である。この発明の実施の形態においても、凝縮層
の厚さは、ガス・水蒸気の流量や曝露する時間で精度よ
く制御され得る。In the second embodiment of the invention, instead of vacuum evacuation, a helium gas inlet 9 is attached, the irradiation container 10 is filled with helium gas, and vacuum ultraviolet light is irradiated. Since it is not necessary to evacuate, the fluororesin body 4 can be fed and replaced without opening the irradiation container 10. Also in the embodiment of the present invention, the thickness of the condensation layer can be accurately controlled by the flow rate of gas / water vapor and the exposure time.
【００２１】発明の実施の形態３ 図３は、発明の実施の形態３に係るフッ素樹脂表面の改
質方法を実現するための装置の概念図である。 Embodiment 3 of the Invention FIG. 3 is a conceptual diagram of an apparatus for realizing a method for modifying the surface of a fluororesin according to Embodiment 3 of the invention.
【００２２】当該装置は、真空チャンバ８を備える。真
空チャンバ８には、真空チャンバ８内にガス、蒸気を導
入するためのガス・蒸気導入口１が設けられる。真空チ
ャンバ８内には、冷却機構付試料台１２が設けられてい
る。改質すべきフッ素樹脂体４を、冷却機構付試料台１
２に配置する。真空チャンバ８には、該真空チャンバ８
内を排気するための真空ポンプ６が接続されている。真
空チャンバ８には、また、光取出窓３（またはバルブ）
が設けられている。光取出窓３の側方には光源２が設け
られている。光源２と光取出窓３との間に、光シャッタ
１１が設けられている。The apparatus comprises a vacuum chamber 8. The vacuum chamber 8 is provided with a gas / steam introducing port 1 for introducing gas and steam into the vacuum chamber 8. A sample table 12 with a cooling mechanism is provided in the vacuum chamber 8. The fluororesin body 4 to be modified is placed on the sample table 1 with a cooling mechanism.
Place in 2. The vacuum chamber 8 includes
A vacuum pump 6 for exhausting the inside is connected. The vacuum chamber 8 also has a light extraction window 3 (or valve).
Is provided. The light source 2 is provided on the side of the light extraction window 3. An optical shutter 11 is provided between the light source 2 and the light extraction window 3.
【００２３】冷却機構付試料台１２にフッ素樹脂体４を
接触させ、光源２から光取出窓３を通して、光を真空チ
ャンバ８内に導き、この光をフッ素樹脂体４の表面に当
てる。このとき、フッ素樹脂体４の温度が上がりすぎな
いように、冷却機構付試料台１２によって、フッ素樹脂
体４を冷却する。一定量の光を照射した後、光シャッタ
１１を閉じて、光を遮断する。その後、ガス・蒸気導入
口１から、反応させたいガスや蒸気を真空チャンバ８内
に導き、フッ素樹脂体４の表面を改質させる。The fluororesin body 4 is brought into contact with the sample stand 12 with a cooling mechanism, light is guided from the light source 2 into the vacuum chamber 8 through the light extraction window 3, and the light is applied to the surface of the fluororesin body 4. At this time, the fluororesin body 4 is cooled by the sample stand 12 with a cooling mechanism so that the temperature of the fluororesin body 4 does not rise excessively. After irradiating a certain amount of light, the optical shutter 11 is closed to block the light. Then, the gas or vapor to be reacted is introduced into the vacuum chamber 8 through the gas / steam inlet 1, and the surface of the fluororesin body 4 is modified.
【００２４】本発明の実施の形態では、真空中でフッ素
樹脂表面に照射する光を、波長１７０ｎｍ以下の高エネ
ルギ光にすることにより、光は、フッ素樹脂体４の表面
近傍で集中的に吸収され、かつフッ素樹脂体４の表面
は、電子的に高いエネルギ状態へ励起され得る。その結
果、フッ素樹脂体４の表面のラジカル化が効率よく実現
できる。その後、光照射を停止してから、ガスや蒸気を
導入することで、フッ素樹脂体の表面ラジカルの化学反
応が進む。この化学反応が進んでも、これによって発生
する反応生成物は、光が遮断されているため、もはや、
フッ素樹脂体４の表面と反応しない。In the embodiment of the present invention, by irradiating the surface of the fluororesin with a high-energy light having a wavelength of 170 nm or less, the light is absorbed in the vicinity of the surface of the fluororesin body 4 in a concentrated manner. And the surface of the fluororesin body 4 can be electronically excited to a high energy state. As a result, radicalization of the surface of the fluororesin body 4 can be efficiently realized. After that, the light irradiation is stopped, and then a gas or vapor is introduced, whereby the chemical reaction of the surface radicals of the fluororesin body proceeds. Even if this chemical reaction proceeds, the reaction product generated by this is no longer light because it is blocked.
It does not react with the surface of the fluororesin body 4.
【００２５】[0025]
【発明の効果】以上説明したとおり、この発明によれ
ば、少ない光量でも、効率的にフッ素樹脂表面を改質で
きる。そのため、この発明を電気、電子部品に用いられ
るフッ素樹脂体の表面の親水化、接着性向上や、化学用
部品、医療用部品に用いるフッ素樹脂体の表面親水化な
ど、フッ素樹脂部品加工時の表面処理プロセスとして利
用すれば、処理時間の短縮、処理コストの低減という効
果が得られる。As described above, according to the present invention, the surface of the fluororesin can be efficiently modified with a small amount of light. Therefore, the present invention, the surface of the fluororesin body used for electrical and electronic parts, hydrophilicity, improved adhesion, chemical parts, surface hydrophilicization of the fluororesin body used for medical parts, etc. If it is used as a surface treatment process, the effect of shortening the treatment time and the treatment cost can be obtained.
【００２６】この発明の他の局面に従うフッ素樹脂表面
の改質方法によれば、副反応を起こさせず、本来の目的
とする改質反応を優先的に進めることができ、ひいて
は、改質特性の向上や安定化を図ることができる。According to the method for modifying the surface of a fluororesin according to another aspect of the present invention, the intended modification reaction can be preferentially promoted without causing a side reaction, and by extension, the modification characteristic. Can be improved and stabilized.
【図１】発明の実施の形態１に係るフッ素樹脂表面の改
質方法を実現するための装置の概念図である。FIG. 1 is a conceptual diagram of an apparatus for realizing a method for modifying a fluororesin surface according to a first embodiment of the invention.
【図２】発明の実施の形態２に係るフッ素樹脂表面の改
質方法を実現するための装置の概念図である。FIG. 2 is a conceptual diagram of an apparatus for realizing a method for modifying a fluororesin surface according to a second embodiment of the invention.
【図３】発明の実施の形態３に係るフッ素樹脂表面の改
質方法を実現するための装置の概念図である。FIG. 3 is a conceptual diagram of an apparatus for realizing a method for modifying a fluororesin surface according to a third embodiment of the invention.
１ ガス・水蒸気導入口 ２ 光 ４ フッ素樹脂体 ５ 冷却部 1 Gas / steam inlet 2 Light 4 Fluororesin 5 Cooling part
Claims (6)
と、 前記フッ素樹脂体の表面を改質させるために、該表面に
反応させる改質剤を準備する工程と、 前記フッ素樹脂体の表面に前記改質剤が凝縮してなる凝
縮層を形成する工程と、 前記フッ素樹脂体の表面に向けて、前記フッ素樹脂体の
光吸収が増大する真空紫外域の光を照射する工程と、を
備えた、フッ素樹脂表面の改質方法。1. A step of preparing a fluororesin body to be modified, a step of preparing a modifier to react with the surface of the fluororesin body to modify the surface of the fluororesin body, and a surface of the fluororesin body A step of forming a condensed layer formed by condensing the modifier, and a step of irradiating the surface of the fluororesin body with light in the vacuum ultraviolet region in which the light absorption of the fluororesin body increases. A method for modifying the surface of a fluororesin provided.
または凝固する温度まで、前記フッ素樹脂体の表面を冷
却し、その後、該フッ素樹脂体の表面を前記改質剤にさ
らすことによって行なわれる、請求項１に記載の、フッ
素樹脂表面の改質方法。2. The formation of the condensed layer comprises cooling the surface of the fluororesin body to a temperature at which the modifier condenses or solidifies, and then exposing the surface of the fluororesin body to the modifier. The method for modifying the surface of a fluororesin according to claim 1, which is carried out by.
請求項１に記載の、フッ素樹脂表面の改質方法。3. The light irradiation is performed under vacuum.
The method for modifying the surface of a fluororesin according to claim 1.
収が小さいガス雰囲気中で行なわれる、請求項１に記載
の、フッ素樹脂表面の改質方法。4. The method for modifying the surface of a fluororesin according to claim 1, wherein the irradiation of light is performed in a gas atmosphere in which absorption is small in the vacuum ultraviolet light region.
び、薬剤の入った水溶液からなる群より選ばれる、請求
項１に記載の、フッ素樹脂表面の改質方法。5. The method for modifying the surface of a fluororesin according to claim 1, wherein the modifying agent is selected from the group consisting of a reactive gas, water, and an aqueous solution containing a chemical.
と、 前記フッ素樹脂体の表面を改質させるため、該表面に反
応させる改質剤を準備する工程と、 前記フッ素樹脂体の表面に、波長１７０ｎｍ以下の光を
照射する工程と、 前記光の照射を停止する工程と、 前記フッ素樹脂体の表面に前記改質剤を接触させる工程
と、を備えた、フッ素樹脂表面の改質方法。6. A step of preparing a fluororesin body to be modified, a step of preparing a modifier to react with the surface of the fluororesin body for modifying the surface of the fluororesin body, and A method for modifying a fluororesin surface, comprising: a step of irradiating light having a wavelength of 170 nm or less; a step of stopping the irradiation of the light; and a step of bringing the modifier into contact with the surface of the fluororesin body. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5696A JPH09188773A (en) | 1996-01-04 | 1996-01-04 | Fluorocarbon resin surface modification method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5696A JPH09188773A (en) | 1996-01-04 | 1996-01-04 | Fluorocarbon resin surface modification method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09188773A true JPH09188773A (en) | 1997-07-22 |
Family
ID=11463570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5696A Withdrawn JPH09188773A (en) | 1996-01-04 | 1996-01-04 | Fluorocarbon resin surface modification method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09188773A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006274176A (en) * | 2005-03-30 | 2006-10-12 | Univ Of Miyazaki | Plastic surface modification method, plastic surface plating method, plastic, plastic surface modification equipment |
-
1996
- 1996-01-04 JP JP5696A patent/JPH09188773A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006274176A (en) * | 2005-03-30 | 2006-10-12 | Univ Of Miyazaki | Plastic surface modification method, plastic surface plating method, plastic, plastic surface modification equipment |
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