JPH09160167A - Silver halide photosensitive material - Google Patents
Silver halide photosensitive materialInfo
- Publication number
- JPH09160167A JPH09160167A JP31500895A JP31500895A JPH09160167A JP H09160167 A JPH09160167 A JP H09160167A JP 31500895 A JP31500895 A JP 31500895A JP 31500895 A JP31500895 A JP 31500895A JP H09160167 A JPH09160167 A JP H09160167A
- Authority
- JP
- Japan
- Prior art keywords
- group
- mol
- carbon atoms
- added
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 99
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 51
- 239000004332 silver Substances 0.000 title claims abstract description 51
- 239000000463 material Substances 0.000 title claims abstract description 43
- 150000001875 compounds Chemical class 0.000 claims abstract description 86
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 44
- 125000003118 aryl group Chemical group 0.000 claims abstract description 33
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 24
- 125000005843 halogen group Chemical group 0.000 claims abstract description 12
- 125000000732 arylene group Chemical group 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 125000006575 electron-withdrawing group Chemical group 0.000 claims abstract description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 8
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 125000003342 alkenyl group Chemical group 0.000 abstract description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract description 6
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 3
- 229920006395 saturated elastomer Polymers 0.000 abstract description 3
- 125000004434 sulfur atom Chemical group 0.000 abstract description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 abstract description 2
- 230000006866 deterioration Effects 0.000 abstract description 2
- 125000004430 oxygen atom Chemical group O* 0.000 abstract description 2
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 102
- 125000004432 carbon atom Chemical group C* 0.000 description 88
- 230000015572 biosynthetic process Effects 0.000 description 60
- 238000003786 synthesis reaction Methods 0.000 description 59
- 238000003756 stirring Methods 0.000 description 55
- 239000000243 solution Substances 0.000 description 52
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 48
- 238000006243 chemical reaction Methods 0.000 description 45
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 34
- ZMXDDKWLCZADIW-UHFFFAOYSA-N Vilsmeier-Haack reagent Natural products CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 30
- 238000000034 method Methods 0.000 description 27
- 238000001914 filtration Methods 0.000 description 26
- 238000002844 melting Methods 0.000 description 26
- 230000008018 melting Effects 0.000 description 26
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 25
- KFZMGEQAYNKOFK-UHFFFAOYSA-N isopropyl alcohol Natural products CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 25
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 24
- 125000001424 substituent group Chemical group 0.000 description 24
- 239000012299 nitrogen atmosphere Substances 0.000 description 23
- 125000000217 alkyl group Chemical group 0.000 description 22
- 239000002244 precipitate Substances 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- 150000003839 salts Chemical class 0.000 description 17
- 239000012295 chemical reaction liquid Substances 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 14
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 13
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 12
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- 239000013076 target substance Substances 0.000 description 12
- 239000007787 solid Substances 0.000 description 11
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- 125000004442 acylamino group Chemical group 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 9
- 229910052801 chlorine Inorganic materials 0.000 description 9
- 125000001309 chloro group Chemical group Cl* 0.000 description 9
- 238000012937 correction Methods 0.000 description 9
- 239000012153 distilled water Substances 0.000 description 9
- 235000019441 ethanol Nutrition 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 125000002252 acyl group Chemical group 0.000 description 8
- 239000003638 chemical reducing agent Substances 0.000 description 8
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 8
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 8
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 7
- 239000000839 emulsion Substances 0.000 description 7
- 229910052740 iodine Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- MERLDGDYUMSLAY-UHFFFAOYSA-N 4-[(4-aminophenyl)disulfanyl]aniline Chemical compound C1=CC(N)=CC=C1SSC1=CC=C(N)C=C1 MERLDGDYUMSLAY-UHFFFAOYSA-N 0.000 description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 6
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 6
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000004423 acyloxy group Chemical group 0.000 description 6
- 125000004104 aryloxy group Chemical group 0.000 description 6
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 6
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 6
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 125000000304 alkynyl group Chemical group 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 125000002883 imidazolyl group Chemical group 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 5
- IJAPPYDYQCXOEF-UHFFFAOYSA-N phthalazin-1(2H)-one Chemical class C1=CC=C2C(=O)NN=CC2=C1 IJAPPYDYQCXOEF-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 125000004076 pyridyl group Chemical group 0.000 description 5
- 150000003378 silver Chemical class 0.000 description 5
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 5
- 125000001376 1,2,4-triazolyl group Chemical group N1N=C(N=C1)* 0.000 description 4
- 125000001781 1,3,4-oxadiazolyl group Chemical group 0.000 description 4
- 125000004520 1,3,4-thiadiazolyl group Chemical group 0.000 description 4
- 235000021357 Behenic acid Nutrition 0.000 description 4
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 4
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 4
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 4
- 235000021355 Stearic acid Nutrition 0.000 description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 150000001299 aldehydes Chemical class 0.000 description 4
- 125000004414 alkyl thio group Chemical group 0.000 description 4
- 150000001448 anilines Chemical class 0.000 description 4
- 229940116226 behenic acid Drugs 0.000 description 4
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 description 4
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 4
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 4
- 125000004541 benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 239000012954 diazonium Substances 0.000 description 4
- 150000001989 diazonium salts Chemical class 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 4
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 4
- 239000011941 photocatalyst Substances 0.000 description 4
- 125000005493 quinolyl group Chemical group 0.000 description 4
- 238000006479 redox reaction Methods 0.000 description 4
- 239000000344 soap Substances 0.000 description 4
- 229960004274 stearic acid Drugs 0.000 description 4
- 239000008117 stearic acid Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 125000003831 tetrazolyl group Chemical group 0.000 description 4
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 4
- 125000000335 thiazolyl group Chemical group 0.000 description 4
- 125000004306 triazinyl group Chemical group 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 125000001399 1,2,3-triazolyl group Chemical group N1N=NC(=C1)* 0.000 description 3
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 3
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical compound N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 3
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 3
- 125000005955 1H-indazolyl group Chemical group 0.000 description 3
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000005162 aryl oxy carbonyl amino group Chemical group 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 125000000259 cinnolinyl group Chemical group N1=NC(=CC2=CC=CC=C12)* 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 239000000284 extract Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 125000002632 imidazolidinyl group Chemical group 0.000 description 3
- 125000001041 indolyl group Chemical group 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229940100892 mercury compound Drugs 0.000 description 3
- 150000002731 mercury compounds Chemical class 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 125000004593 naphthyridinyl group Chemical group N1=C(C=CC2=CC=CN=C12)* 0.000 description 3
- 125000002971 oxazolyl group Chemical group 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoric acid amide group Chemical group P(N)(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 3
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 3
- 239000005077 polysulfide Substances 0.000 description 3
- 229920001021 polysulfide Polymers 0.000 description 3
- 150000008117 polysulfides Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 125000001042 pteridinyl group Chemical group N1=C(N=CC2=NC=CN=C12)* 0.000 description 3
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 3
- 125000003373 pyrazinyl group Chemical group 0.000 description 3
- 125000003226 pyrazolyl group Chemical group 0.000 description 3
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 3
- 125000002098 pyridazinyl group Chemical group 0.000 description 3
- 125000000714 pyrimidinyl group Chemical group 0.000 description 3
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 3
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 3
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 150000003852 triazoles Chemical class 0.000 description 3
- 125000006569 (C5-C6) heterocyclic group Chemical group 0.000 description 2
- HORKYAIEVBUXGM-UHFFFAOYSA-N 1,2,3,4-tetrahydroquinoxaline Chemical class C1=CC=C2NCCNC2=C1 HORKYAIEVBUXGM-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- HTSGKJQDMSTCGS-UHFFFAOYSA-N 1,4-bis(4-chlorophenyl)-2-(4-methylphenyl)sulfonylbutane-1,4-dione Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C(=O)C=1C=CC(Cl)=CC=1)CC(=O)C1=CC=C(Cl)C=C1 HTSGKJQDMSTCGS-UHFFFAOYSA-N 0.000 description 2
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 2
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Chemical compound C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 2
- XETRHNFRKCNWAJ-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanoyl 2,2,3,3,3-pentafluoropropanoate Chemical compound FC(F)(F)C(F)(F)C(=O)OC(=O)C(F)(F)C(F)(F)F XETRHNFRKCNWAJ-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- UYEMGAFJOZZIFP-UHFFFAOYSA-N 3,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC(O)=C1 UYEMGAFJOZZIFP-UHFFFAOYSA-N 0.000 description 2
- CWJJAFQCTXFSTA-UHFFFAOYSA-N 4-methylphthalic acid Chemical compound CC1=CC=C(C(O)=O)C(C(O)=O)=C1 CWJJAFQCTXFSTA-UHFFFAOYSA-N 0.000 description 2
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 2
- XDECIMXTYLBMFQ-UHFFFAOYSA-N 6-chloro-2h-phthalazin-1-one Chemical compound C1=NNC(=O)C=2C1=CC(Cl)=CC=2 XDECIMXTYLBMFQ-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
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- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
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- 125000000034 thioazolyl group Chemical group 0.000 description 1
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- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はハロゲン化銀感光材
料、熱現像感光材料に関する。TECHNICAL FIELD The present invention relates to a silver halide photosensitive material and a photothermographic material.
【0002】[0002]
【従来の技術】熱現像処理法を用いて写真画像を形成す
る熱現像感光材料は、例えば米国特許第3152904
号、3457075号、及びD.モーガン(Morgan)と
B.シェリー(Shely)による「熱によって処理される銀
システム(Thermally Processed Silver Systems) 」
(イメージング・プロセッシーズ・アンド・マテリアル
ズ(Imaging Processes and Materials) Neblette 第8
版、スタージ(Sturge) 、V.ウォールワース(Walwor
th) 、A.シェップ(Shepp)編集、第2頁、1969
年)に開示されている。このような熱現像感光材料は、
還元可能な銀源(例えば有機銀塩)、触媒活性量の光触
媒(例えばハロゲン化銀)、銀の色調を制御する色調剤
及び還元剤を通常(有機)バインダーマトリックス中に
分散した状態で含有している。熱現像感光材料は常温で
安定であるが、露光後高温(例えば、80℃以上)に加
熱した場合に還元可能な銀源(酸化剤として機能する)
と還元剤との間の酸化還元反応を通じて銀を生成する。
この酸化還元反応は露光で発生した潜像の触媒作用によ
って促進される。露光領域中の有機銀塩の反応によって
生成した銀は黒色画像を提供し、これは非露光領域と対
象をなし、画像の形成がなされる。2. Description of the Related Art A photothermographic material for forming a photographic image by using a heat development processing method is disclosed, for example, in US Pat. No. 3,152,904.
No. 3457075 and D.C. Morgan and B.A. "Thermally Processed Silver Systems" by Shely
(Imaging Processes and Materials Neblette 8
Edition, Sturge, V. Walworth
th), A. Edited by Shepp, page 2, 1969
Year). Such a photothermographic material is
It contains a reducible silver source (eg organic silver salt), a catalytically active amount of photocatalyst (eg silver halide), a toning agent controlling the color tone of silver and a reducing agent, usually dispersed in an (organic) binder matrix. ing. The photothermographic material is stable at room temperature, but it is a reducible silver source (functions as an oxidizing agent) when heated to a high temperature (for example, 80 ° C or higher) after exposure.
Silver is produced through a redox reaction between a reducing agent and a reducing agent.
This oxidation-reduction reaction is promoted by the catalytic action of the latent image generated by the exposure. The silver produced by the reaction of the organic silver salt in the exposed areas provides a black image, which contrasts with the unexposed areas and forms the image.
【0003】従来のかぶり防止技術として最も有効な方
法は、かぶり防止剤として水銀化合物を用いる方法であ
った。感光材料中にかぶり防止剤として水銀化合物を使
用することについては、例えば米国特許第358990
3号に開示されている。しかし、水銀化合物は環境的に
好ましくなく、非水銀系のかぶり防止剤の開発が望まれ
ていた。非水銀かぶり防止剤としては、これまで各種の
ポリハロゲン化合物(例えば米国特許第3874946
号、同4756999号、同5340712号、欧州特
許第605981A1号、同622666A1号、同6
31176A1号、特公昭54−165号、特開平7−
2781号)が開示されている。しかし、これら記載の
化合物は、かぶり防止の効果が低かったり、銀の色調を
悪化させるという問題があった。また、かぶり防止効果
が高いものは、感度低下を引き起こすなどの問題があ
り、改善が必要であった。The most effective conventional fog prevention technique has been a method using a mercury compound as an antifoggant. The use of mercury compounds as antifoggants in light-sensitive materials is described, for example, in US Pat. No. 3,589,990.
No. 3. However, mercury compounds are not environmentally preferable, and development of a non-mercury antifoggant has been desired. As non-mercury antifoggants, various polyhalogen compounds have hitherto been disclosed (for example, US Pat. No. 3,874,946).
No. 4,756,999, No. 5,340,712, European Patent Nos. 605981A1, 622666A1, 6
31176A1, JP-B-54-165, JP-A-7-
No. 2781). However, these compounds have problems that the effect of preventing fogging is low and that the color tone of silver is deteriorated. Further, those having a high antifogging effect have problems such as lowering of sensitivity, and thus need to be improved.
【0004】[0004]
【発明が解決しようとする課題】本発明の目的は、色調
の悪化、感度低下がなく、かぶりが低いハロゲン化銀感
光材料、熱現像感光材料を提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide a silver halide light-sensitive material and a photothermographic material which are free from deterioration of color tone and sensitivity and have low fog.
【0005】[0005]
【課題を解決するための手段】上記課題は、下記手段に
よって達成できた。 (1)下記一般式(I)で表される化合物を少なくとも
一種含有することを特徴とするハロゲン化銀感光材料。 一般式(I)The above-mentioned objects can be achieved by the following means. (1) A silver halide light-sensitive material containing at least one compound represented by the following general formula (I). General formula (I)
【0006】[0006]
【化3】 Embedded image
【0007】(式中、Rは脂肪族炭化水素基、アリール
基又はヘテロ環基を表す。Lは二価のアリーレン基又は
二価のヘテロ環基を表す。X1 及びX2 は、それぞれハ
ロゲン原子を表す。Aは水素原子、ハロゲン原子又は電
子吸引性基を表す。)(In the formula, R represents an aliphatic hydrocarbon group, an aryl group or a heterocyclic group. L represents a divalent arylene group or a divalent heterocyclic group. X 1 and X 2 are each a halogen. Represents an atom, and A represents a hydrogen atom, a halogen atom or an electron-withdrawing group.)
【0008】(2)前記一般式(I)で表される化合物
を少なくとも一種含有することを特徴とする熱現像感光
材料。(2) A photothermographic material containing at least one compound represented by the general formula (I).
【0009】(3)前記一般式(I)で表される化合物
を少なくとも一種と下記一般式(II)で表される化合物
を少なくとも一種含有することを特徴とする熱現像感光
材料。 一般式(II)(3) A photothermographic material comprising at least one compound represented by the general formula (I) and at least one compound represented by the following general formula (II). General formula (II)
【0010】[0010]
【化4】 Embedded image
【0011】(式中、R1 及びR2 は脂肪族炭化水素
基、アリール基又はヘテロ環基を表す。nは0ないし4
の整数を表す。) (4)赤外レーザー露光用であることを特徴とする
(2)又は(3)に記載の熱現像感光材料。(In the formula, R 1 and R 2 represent an aliphatic hydrocarbon group, an aryl group or a heterocyclic group. N is 0 to 4).
Represents an integer. (4) The photothermographic material according to (2) or (3), which is for infrared laser exposure.
【0012】[0012]
【発明の実施の形態】まず、一般式(I)で表される化
合物について詳細に説明する。Rで表される脂肪族炭化
水素基は、直鎖、分岐または環状のアルキル基(好まし
くは炭素数1〜20、より好ましくは1〜16、更に好
ましくは1〜12)、アルケニル基(好ましくは炭素数
2〜20、より好ましくは2〜16、更に好ましくは2
〜12)、アルキニル基(好ましくは炭素数2〜20、
より好ましくは2〜16、更に好ましくは2〜12)で
あり、置換基を有していてもよい。BEST MODE FOR CARRYING OUT THE INVENTION First, the compound represented by formula (I) will be described in detail. The aliphatic hydrocarbon group represented by R is a linear, branched or cyclic alkyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 and further preferably 1 to 12), an alkenyl group (preferably 2 to 20 carbon atoms, more preferably 2 to 16 and even more preferably 2
To 12), an alkynyl group (preferably having 2 to 20 carbon atoms,
It is more preferably 2 to 16 and even more preferably 2 to 12) and may have a substituent.
【0013】置換基としては例えばアリール基(好まし
くは炭素数6〜30、より好ましくは炭素数6〜20、
特に好ましくは炭素数6〜12であり、例えばフェニ
ル、p−メチルフェニル、ナフチルなどが挙げられ
る。)、アミノ基(好ましくは炭素数0〜20、より好
ましくは0〜10、特に好ましくは0〜6であり、例え
ばアミノ、メチルアミノ、ジメチルアミノ、ジエチルア
ミノ、ジベンジルアミノなどが挙げられる。)、アルコ
キシ基(好ましくは炭素数1〜20、より好ましくは炭
素数1〜12、特に好ましくは炭素数1〜8であり、例
えばメトキシ、エトキシ、ブトキシなどが挙げられ
る。)、アリールオキシ基(好ましくは炭素数6〜2
0、より好ましくは炭素数6〜16、特に好ましくは炭
素数6〜12であり、例えばフェニルオキシ、2−ナフ
チルオキシなどが挙げられる。)、アシル基(好ましく
は炭素数1〜20、より好ましくは炭素数1〜16、特
に好ましくは炭素数1〜12であり、例えばアセチル、
ベンゾイル、ホルミル、ピバロイルなどが挙げられ
る。)、アルコキシカルボニル基(好ましくは炭素数2
〜20、より好ましくは炭素数2〜16、特に好ましく
は炭素数2〜12であり、例えばメトキシカルボニル、
エトキシカルボニルなどが挙げられる。)、アリールオ
キシカルボニル基(好ましくは炭素数7〜20、より好
ましくは炭素数7〜16、特に好ましくは炭素数7〜1
0であり、例えばフェニルオキシカルボニルなどが挙げ
られる。)、アシルオキシ基(好ましくは炭素数1〜2
0、より好ましくは炭素数2〜16、特に好ましくは炭
素数2〜10であり、例えばアセトキシ、ベンゾイルオ
キシなどが挙げられる。)、アシルアミノ基(好ましく
は炭素数1〜20、より好ましくは炭素数2〜16、特
に好ましくは炭素数2〜10であり、例えばアセチルア
ミノ、ベンゾイルアミノなどが挙げられる。)、アルコ
キシカルボニルアミノ基(好ましくは炭素数2〜20、
より好ましくは炭素数2〜16、特に好ましくは炭素数
2〜12であり、例えばメトキシカルボニルアミノなど
が挙げられる。)、アリールオキシカルボニルアミノ基
(好ましくは炭素数7〜20、より好ましくは炭素数7
〜16、特に好ましくは炭素数7〜12であり、例えば
フェニルオキシカルボニルアミノなどが挙げられ
る。)、スルホニルアミノ基(好ましくは炭素数1〜2
0、より好ましくは炭素数1〜16、特に好ましくは炭
素数1〜12であり、例えばメタンスルホニルアミノ、
ベンゼンスルホニルアミノ、メタンスルホンアミド、オ
クチルスルホニルアミノ、ドデカンスルホンアミド、ナ
フチルスルホニルアミノ、トルエンスルホニルアミノ、
p−メトキシフェニルスルホニルアミノ、2,4,6−
トリメチルフェニルスルホニルアミノなどが挙げられ
る。)、スルファモイル基(好ましくは炭素数0〜2
0、より好ましくは炭素数0〜16、特に好ましくは炭
素数0〜12であり、例えばスルファモイル、メチルス
ルファモイル、ジメチルスルファモイル、フェニルスル
ファモイルなどが挙げられる。)、カルバモイル基(好
ましくは炭素数1〜20、より好ましくは炭素数1〜1
6、特に好ましくは炭素数1〜12であり、例えばカル
バモイル、メチルカルバモイル、ジエチルカルバモイ
ル、フェニルカルバモイルなどが挙げられる。)、ウレ
イド基(好ましくは炭素数1〜20、より好ましくは炭
素数1〜16、特に好ましくは炭素数1〜12であり、
例えばウレイド、メチルウレイド、フェニルウレイドな
どが挙げられる。)、アルキルチオ基(好ましくは炭素
数1〜20、より好ましくは炭素数1〜16、特に好ま
しくは炭素数1〜12であり、例えばメチルチオ、エチ
ルチオなどが挙げられる。)、アリールチオ基(好まし
くは炭素数6〜20、より好ましくは炭素数6〜16、
特に好ましくは炭素数6〜12であり、例えばフェニル
チオなどが挙げられる。)、スルホニル基(好ましくは
炭素数1〜20、より好ましくは炭素数1〜16、特に
好ましくは炭素数1〜12であり、例えばメシル、トシ
ルなどが挙げられる。)、スルフィニル基(好ましくは
炭素数1〜20、より好ましくは炭素数1〜16、特に
好ましくは炭素数1〜12であり、例えばメタンスルフ
ィニル、ベンゼンスルフィニルなどが挙げられる。)、
リン酸アミド基(好ましくは炭素数1〜20、より好ま
しくは炭素数1〜16、特に好ましくは炭素数1〜12
であり、例えばジエチルリン酸アミド、フェニルリン酸
アミドなどが挙げられる。)、ヒドロキシ基、メルカプ
ト基、ハロゲン原子(例えばフッ素原子、塩素原子、臭
素原子、ヨウ素原子)、シアノ基、スルホ基、カルボキ
シ基、ニトロ基、ヒドロキサム酸基、スルフィノ基、ヒ
ドラジノ基、ヘテロ環基(例えばイミダゾリル、ピリジ
ル、フリル、ピペリジル、モルホリノなどが挙げられ
る。)などが挙げられる。これらの置換基は更に置換さ
れてもよい。また、置換基が二つ以上ある場合は、同じ
でも異なってもよい。The substituent is, for example, an aryl group (preferably having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms,
Particularly preferably, it has 6 to 12 carbon atoms, and examples thereof include phenyl, p-methylphenyl, and naphthyl. ), An amino group (preferably having a carbon number of 0 to 20, more preferably 0 to 10, particularly preferably 0 to 6, and examples thereof include amino, methylamino, dimethylamino, diethylamino, dibenzylamino, etc.), Alkoxy group (preferably having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, particularly preferably 1 to 8 carbon atoms, and examples thereof include methoxy, ethoxy, butoxy, etc.), aryloxy group (preferably 6 to 2 carbon atoms
It has 0, more preferably 6 to 16 carbon atoms, particularly preferably 6 to 12 carbon atoms, and examples include phenyloxy and 2-naphthyloxy. ), An acyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, for example, acetyl,
Examples thereof include benzoyl, formyl and pivaloyl. ), An alkoxycarbonyl group (preferably having 2 carbon atoms)
-20, more preferably 2-16 carbon atoms, particularly preferably 2-12 carbon atoms, for example, methoxycarbonyl,
Ethoxycarbonyl and the like. ), An aryloxycarbonyl group (preferably having 7 to 20 carbon atoms, more preferably having 7 to 16 carbon atoms, and particularly preferably having 7 to 1 carbon atoms.
0, for example, phenyloxycarbonyl and the like. ), An acyloxy group (preferably having 1 to 2 carbon atoms)
It has 0, more preferably 2 to 16 carbon atoms, and particularly preferably 2 to 10 carbon atoms, and examples thereof include acetoxy and benzoyloxy. ), An acylamino group (preferably having 1 to 20 carbon atoms, more preferably 2 to 16 carbon atoms, and particularly preferably 2 to 10 carbon atoms, and examples thereof include acetylamino and benzoylamino). (Preferably having 2 to 20 carbon atoms,
More preferably, it has 2 to 16 carbon atoms, particularly preferably 2 to 12 carbon atoms, such as methoxycarbonylamino. ), An aryloxycarbonylamino group (preferably having 7 to 20 carbon atoms, more preferably having 7 carbon atoms)
To 16, particularly preferably 7 to 12 carbon atoms, and examples thereof include phenyloxycarbonylamino. ), A sulfonylamino group (preferably having 1 to 2 carbon atoms)
0, more preferably 1 to 16 carbon atoms, particularly preferably 1 to 12 carbon atoms, for example, methanesulfonylamino,
Benzenesulfonylamino, methanesulfonamide, octylsulfonylamino, dodecanesulfonamide, naphthylsulfonylamino, toluenesulfonylamino,
p-methoxyphenylsulfonylamino, 2,4,6-
Trimethylphenylsulfonylamino and the like can be mentioned. ), A sulfamoyl group (preferably having a carbon number of 0 to 2)
It has 0, more preferably 0 to 16 carbon atoms, and particularly preferably 0 to 12 carbon atoms, and examples thereof include sulfamoyl, methylsulfamoyl, dimethylsulfamoyl, and phenylsulfamoyl. ), A carbamoyl group (preferably having 1 to 20 carbon atoms, and more preferably having 1 to 1 carbon atoms).
6, particularly preferably 1 to 12 carbon atoms, for example, carbamoyl, methylcarbamoyl, diethylcarbamoyl, phenylcarbamoyl and the like. ), An ureido group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms,
Examples thereof include ureido, methylureido, phenylureido and the like. ), An alkylthio group (preferably having a carbon number of 1 to 20, more preferably a carbon number of 1 to 16 and particularly preferably a carbon number of 1 to 12 and examples thereof include methylthio and ethylthio), and an arylthio group (preferably carbon). Number 6 to 20, more preferably carbon number 6 to 16,
Particularly preferably, it has 6 to 12 carbon atoms, and examples thereof include phenylthio. ), A sulfonyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms, and examples thereof include mesyl and tosyl), and a sulfinyl group (preferably carbon). It has 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms, and examples thereof include methanesulfinyl and benzenesulfinyl).
Phosphoric acid amide group (preferably having 1 to 20 carbon atoms, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 12 carbon atoms)
And examples thereof include diethylphosphoric acid amide and phenylphosphoric acid amide. ), Hydroxy group, mercapto group, halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), cyano group, sulfo group, carboxy group, nitro group, hydroxamic acid group, sulfino group, hydrazino group, heterocyclic group (For example, imidazolyl, pyridyl, furyl, piperidyl, morpholino and the like can be mentioned.) And the like. These substituents may be further substituted. When there are two or more substituents, they may be the same or different.
【0014】Rで表される脂肪族炭化水素基の置換基と
して好ましくは、アリール基、アルコキシ基、ヘテロ環
基であり、より好ましくはアリール基、ヘテロ環基であ
る。Rで表される脂肪族炭化水素基として好ましくはア
ルキル基であり、より好ましくは鎖状アルキル基であ
る。The substituent of the aliphatic hydrocarbon group represented by R is preferably an aryl group, an alkoxy group or a heterocyclic group, more preferably an aryl group or a heterocyclic group. The aliphatic hydrocarbon group represented by R is preferably an alkyl group, and more preferably a chain alkyl group.
【0015】Rで表されるアリール基としては、好まし
くは炭素数6〜30の単環または縮環のアリール基であ
り、より好ましくは炭素数6〜20の単環または縮環の
アリール基であり、例えばフェニル、ナフチル等が挙げ
られ、特に好ましくはフェニルである。Rで表されるア
リール基は置換基を有してもよく、置換基としては例え
ばRで表される脂肪族炭化水素基の置換基として挙げた
ものの他、アルキル基(好ましくは炭素数1〜20、よ
り好ましくは炭素数1〜12、特に好ましくは炭素数1
〜8であり、例えばメチル、エチル、iso−プロピ
ル、tert−ブチル、n−オクチル、tert−アミ
ル、シクロヘキシルなどが挙げられる。)、アルケニル
基(好ましくは炭素数2〜20、より好ましくは炭素数
2〜12、特に好ましくは炭素数2〜8であり、例えば
ビニル、アリル、2−ブテニル、3−ペンテニルなどが
挙げられる。)、アルキニル基(好ましくは炭素数2〜
20、より好ましくは炭素数2〜12、特に好ましくは
炭素数2〜8であり、例えばプロパルギル、3−ペンチ
ニルなどが挙げられる。)などが適用できる。The aryl group represented by R is preferably a monocyclic or condensed ring aryl group having 6 to 30 carbon atoms, and more preferably a monocyclic or condensed ring aryl group having 6 to 20 carbon atoms. Examples thereof include phenyl and naphthyl, and phenyl is particularly preferable. The aryl group represented by R may have a substituent, and examples of the substituent include those exemplified as the substituents of the aliphatic hydrocarbon group represented by R, and an alkyl group (preferably having a carbon number of 1 to 1). 20, more preferably 1 to 12 carbon atoms, particularly preferably 1 carbon atom
To 8 and examples thereof include methyl, ethyl, iso-propyl, tert-butyl, n-octyl, tert-amyl, cyclohexyl and the like. ), An alkenyl group (preferably having 2 to 20 carbon atoms, more preferably having 2 to 12 carbon atoms, particularly preferably having 2 to 8 carbon atoms, and examples thereof include vinyl, allyl, 2-butenyl, and 3-pentenyl. ), Alkynyl group (preferably having 2 to 2 carbon atoms)
It preferably has 20 carbon atoms, more preferably has 2 to 12 carbon atoms, and particularly preferably has 2 to 8 carbon atoms, and examples thereof include propargyl and 3-pentynyl. ) Etc. can be applied.
【0016】Rで表されるアリール基の置換基として好
ましくは、アルキル基、アリール基、アルコキシ基、ア
リールオキシ基、アシル基、アルコキシカルボニル基、
アシルオキシ基、アシルアミノ基、アルコキシカルボニ
ルアミノ基、アリールオキシカルボニルアミノ基、スル
ホニルアミノ基、スルファモイル基、カルバモイル基、
ウレイド基、アルキルチオ基、アリールチオ基、スルホ
ニル基、スルフィニル基、リン酸アミド基、ハロゲン原
子、シアノ基、ニトロ基、ヘテロ環基であり、より好ま
しくはアルキル基、アルコキシ基、アリールオキシ基、
アシル基、アルコキシカルボニル基、アシルオキシ基、
アシルアミノ基、アルコキシカルボニルアミノ基、アリ
ールオキシカルボニルアミノ基、スルホニルアミノ基、
スルファモイル基、カルバモイル基、ウレイド基、アル
キルチオ基、アリールチオ基、スルホニル基、スルフィ
ニル基、リン酸アミド基、ヘテロ環基であり、更に好ま
しくはアルキル基、アルコキシ基、アリールオキシ基、
アシルアミノ基、スルホニルアミノ基、スルファモイル
基、カルバモイル基、ウレイド基、リン酸アミド基、ヘ
テロ環基であり、特に好ましくはアルキル基、アルコキ
シ基、アリールオキシ基、アシルアミノ基、スルホニル
アミノ基、スルファモイル基、カルバモイル基、ウレイ
ド基である。The substituent of the aryl group represented by R is preferably an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyl group, an alkoxycarbonyl group,
Acyloxy group, acylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group,
Ureido group, alkylthio group, arylthio group, sulfonyl group, sulfinyl group, phosphoramide group, halogen atom, cyano group, nitro group, heterocyclic group, more preferably an alkyl group, an alkoxy group, an aryloxy group,
Acyl group, alkoxycarbonyl group, acyloxy group,
Acylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfonylamino group,
Sulfamoyl group, carbamoyl group, ureido group, alkylthio group, arylthio group, sulfonyl group, sulfinyl group, phosphoramide group, heterocyclic group, more preferably an alkyl group, an alkoxy group, an aryloxy group,
Acylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group, ureido group, phosphoric acid amide group, a heterocyclic group, particularly preferably an alkyl group, an alkoxy group, an aryloxy group, an acylamino group, a sulfonylamino group, a sulfamoyl group, A carbamoyl group and an ureido group.
【0017】Rで表されるアリール基の具体例として
は、フェニル、4−メチルフェニル、ナフチルなどが挙
げられる。Specific examples of the aryl group represented by R include phenyl, 4-methylphenyl and naphthyl.
【0018】Rで表されるヘテロ環基は、N、Oまたは
S原子の少なくとも一つを含む3ないし10員の飽和も
しくは不飽和のヘテロ環であり、これらは単環であって
もよいし、更に他の環と縮合環を形成してもよい。ヘテ
ロ環基として好ましくは、5ないし6員のヘテロ環基で
あり、より好ましくは窒素原子を含む5ないし6員のヘ
テロ環基であり、更に好ましくは窒素原子を1ないし2
原子含む5ないし6員の芳香族ヘテロ環基である。The heterocyclic group represented by R is a 3- to 10-membered saturated or unsaturated heterocyclic ring containing at least one N, O or S atom, which may be a monocyclic ring. , And may form a condensed ring with another ring. The heterocyclic group is preferably a 5- to 6-membered heterocyclic group, more preferably a 5- to 6-membered heterocyclic group containing a nitrogen atom, and further preferably 1 to 2 nitrogen atoms.
It is a 5- or 6-membered aromatic heterocyclic group containing atoms.
【0019】ヘテロ環基の具体例としては、例えばチエ
ニル、フリル、ピラニル、2H−ピロリル、ピロリル、
イミダゾリル、ピラゾリル、イソチアゾリル、イソオキ
サゾリル、チアゾリル、オキサゾリル、1,2,3−ト
リアゾリル、1,2,4−トリアゾリル、1,3,4−
オキサジアゾリル、1,3,4−チアジアゾリル、ピリ
ジル、ピラジニル、ピリミジニル、ピリダジニル、イン
ドリジニル、イソインドリル、3H−インドリル、イン
ドリル、1H−インダゾリル、プリニル、4H−キノリ
ジニル、イソキノリル、キノリル、フタラジニル、ナフ
チリジニル、キノキサリニル、キナゾリニル、シンノリ
ニル、プテリジニル、カルバゾリル、β−カルボニリ
ル、フェナントリジニル、アクリジニル、ペリミジニ
ル、フェナントロリニル、フェナジニル、フェナルサジ
ニル、フェノチアジニル、フラザニル、フェノキサジニ
ル、イソクロマニル、クロマニル、ピロリジニル、ピロ
リニル、イミダゾリジニル、イミダゾリニル、ピラゾリ
ジニル、ピラゾリニル、ピペリジル、ピペラジニル、イ
ンドリニル、イソインドリニル、キヌクリジニル、モル
ホリニル、テトラゾリル、ベンズイミダゾリル、ベンズ
オキサゾリル、ベンズチアゾリル、ベンズトリアゾリ
ル、トリアジニルなどが挙げられ、好ましくはピロリ
ル、イミダゾリル、ピラゾリル、チアゾリル、オキサゾ
リル、1,2,3−トリアゾリル、1,2,4−トリア
ゾリル、1,3,4−オキサジアゾリル、1,3,4−
チアジアゾリル、ピリジル、ピラジニル、ピリミジニ
ル、ピリダジニル、インドリル、1H−インダゾリル、
プリニル、イソキノリル、キノリル、フタラジニル、ナ
フチリジニル、キノキサリニル、キナゾリニル、シンノ
リニル、プテリジニル、テトラゾリル、ベンズイミダゾ
リル、ベンズオキサゾリル、ベンズチアゾリル、ベンズ
トリアゾリル、トリアジニルであり、更に好ましくイミ
ダゾリル、ピラゾリル、チアゾリル、オキサゾリル、
1,2,3−トリアゾリル、1,2,4−トリアゾリ
ル、1,3,4−オキサジアゾリル、1,3,4−チア
ジアゾリル、ピリジル、ピラジニル、ピリミジニル、ピ
リダジニル、インドリル、1H−インダゾリル、プリニ
ル、キノリル、フタラジニル、ナフチリジニル、キノキ
サリニル、キナゾリニル、シンノリニル、プテリジニ
ル、テトラゾリル、ベンズイミダゾリル、ベンズオキサ
ゾリル、ベンズチアゾリル、ベンズトリアゾリル、トリ
アジニルであり、特に好ましくはイミダゾリル、チアゾ
リル、オキサゾリル、1,2,4−トリアゾリル、1,
3,4−オキサジアゾリル、1,3,4−チアジアゾリ
ル、ピリジル、キノリル、テトラゾリル、ベンズイミダ
ゾリル、ベンズオキサゾリル、ベンズチアゾリル、ベン
ズトリアゾリル、トリアジニルなどが挙げられる。Specific examples of the heterocyclic group include thienyl, furyl, pyranyl, 2H-pyrrolyl, pyrrolyl,
Imidazolyl, pyrazolyl, isothiazolyl, isoxazolyl, thiazolyl, oxazolyl, 1,2,3-triazolyl, 1,2,4-triazolyl, 1,3,4-
Oxadiazolyl, 1,3,4-thiadiazolyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolizinyl, isoindolyl, 3H-indolyl, indolyl, 1H-indazolyl, purinyl, 4H-quinolidinyl, isoquinolyl, quinolyl, phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, Cinnolinyl, pteridinyl, carbazolyl, β-carbonylyl, phenanthridinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, phenalsazinyl, phenothiazinyl, flazanyl, phenoxazinyl, isochromanyl, chromanyl, pyrrolidinyl, pyrrolinyl, imidazolidinyl, imidazolidinyl, pyridolinidinyl, imidazolidinyl, pyridolinidinyl, imidazolinyl, , Piperidyl, piperazinyl, indolinyl, isoin Examples thereof include linyl, quinuclidinyl, morpholinyl, tetrazolyl, benzimidazolyl, benzoxazolyl, benzthiazolyl, benztriazolyl, triazinyl and the like, preferably pyrrolyl, imidazolyl, pyrazolyl, thiazolyl, oxazolyl, 1,2,3-triazolyl, 1 , 2,4-triazolyl, 1,3,4-oxadiazolyl, 1,3,4-
Thiadiazolyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolyl, 1H-indazolyl,
Purinyl, isoquinolyl, quinolyl, phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, cinnolinyl, pteridinyl, tetrazolyl, benzimidazolyl, benzoxazolyl, benzthiazolyl, benztriazolyl, triazinyl, and more preferable imidazolyl, pyrazolyl, thiazolyl, thioazolyl.
1,2,3-triazolyl, 1,2,4-triazolyl, 1,3,4-oxadiazolyl, 1,3,4-thiadiazolyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolyl, 1H-indazolyl, purinyl, quinolyl, Phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, cinnolinyl, pteridinyl, tetrazolyl, benzimidazolyl, benzoxazolyl, benzthiazolyl, benztriazolyl, triazinyl, particularly preferably imidazolyl, thiazolyl, oxazolyl, 1,2,4-triazolyl, 1,
3,4-oxadiazolyl, 1,3,4-thiadiazolyl, pyridyl, quinolyl, tetrazolyl, benzimidazolyl, benzoxazolyl, benzthiazolyl, benztriazolyl, triazinyl and the like can be mentioned.
【0020】Rで表されるヘテロ環基は置換基を有して
もよく、置換基としては例えばRで表される脂肪族炭化
水素基の置換基として挙げたものの他、アルキル基(好
ましくは炭素数1〜20、より好ましくは炭素数1〜1
2、特に好ましくは炭素数1〜8であり、例えばメチ
ル、エチル、iso−プロピル、tert−ブチル、n
−オクチル、tert−アミル、シクロヘキシルなどが
挙げられる。)、アルケニル基(好ましくは炭素数2〜
20、より好ましくは炭素数2〜12、特に好ましくは
炭素数2〜8であり、例えばビニル、アリル、2−ブテ
ニル、3−ペンテニルなどが挙げられる。)、アルキニ
ル基(好ましくは炭素数2〜20、より好ましくは炭素
数2〜12、特に好ましくは炭素数2〜8であり、例え
ばプロパルギル、3−ペンチニルなどが挙げられる。)
などが適用できる。The heterocyclic group represented by R may have a substituent, and examples of the substituent include those exemplified as the substituent of the aliphatic hydrocarbon group represented by R, and an alkyl group (preferably 1 to 20 carbon atoms, more preferably 1 to 1 carbon atoms
2, particularly preferably C 1-8, such as methyl, ethyl, iso-propyl, tert-butyl, n
-Octyl, tert-amyl, cyclohexyl and the like. ), An alkenyl group (preferably having 2 to 2 carbon atoms).
It preferably has 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms, and examples thereof include vinyl, allyl, 2-butenyl, and 3-pentenyl. ), An alkynyl group (preferably having 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms, and examples thereof include propargyl and 3-pentynyl).
Can be applied.
【0021】Rで表されるヘテロ環基の置換基として好
ましくは、アルキル基、アリール基、アルコキシ基、ア
リールオキシ基、アシル基、アルコキシカルボニル基、
アシルオキシ基、アシルアミノ基、スルホニルアミノ
基、スルファモイル基、カルバモイル基、ウレイド基、
アルキルチオ基、スルホニル基、スルフィニル基、ハロ
ゲン原子、シアノ基、ニトロ基、ヘテロ環基であり、よ
り好ましくはアルキル基、アルコキシ基、アシル基、ア
ルコキシカルボニル基、アシルオキシ基、アシルアミノ
基、スルホニルアミノ基、スルファモイル基、カルバモ
イル基、ヘテロ環基であり、より好ましくはアルキル
基、アリール基、アルコキシ基、アシル基、アルコキシ
カルボニル基、アシルオキシ基、アシルアミノ基、スル
ホニルアミノ基、スルファモイル基、カルバモイル基、
ウレイド基、ヘテロ環基である。The substituent of the heterocyclic group represented by R is preferably an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyl group, an alkoxycarbonyl group,
Acyloxy group, acylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group, ureido group,
Alkylthio group, sulfonyl group, sulfinyl group, halogen atom, cyano group, nitro group, a heterocyclic group, more preferably an alkyl group, an alkoxy group, an acyl group, an alkoxycarbonyl group, an acyloxy group, an acylamino group, a sulfonylamino group, Sulfamoyl group, carbamoyl group, a heterocyclic group, more preferably an alkyl group, an aryl group, an alkoxy group, an acyl group, an alkoxycarbonyl group, an acyloxy group, an acylamino group, a sulfonylamino group, a sulfamoyl group, a carbamoyl group,
It is an ureido group or a heterocyclic group.
【0022】Lで表される二価のアリーレン基として好
ましくは、炭素数6〜30のアリーレン基であり、より
好ましくは炭素数6〜20の単環又は縮環のアリーレン
基であり、更に好ましくはフェニレン、ナフチレンであ
り、特に好ましくはフェニレンである。The divalent arylene group represented by L is preferably an arylene group having 6 to 30 carbon atoms, more preferably a monocyclic or condensed ring arylene group having 6 to 20 carbon atoms, and further preferably Is phenylene or naphthylene, particularly preferably phenylene.
【0023】Lで表される二価のヘテロ環基は、N、O
又はS原子の少なくとも一つを含む3ないし10員の飽
和もしくは不飽和のヘテロ環であり、これらは単環であ
ってもよいし、更に他の環と縮合環を形成してもよい。
ヘテロ環として好ましくは、5ないし6員の芳香族ヘテ
ロ環であり、より好ましくは窒素原子を含む5ないし6
員の芳香族ヘテロ環であり、更に好ましくは窒素原子を
1ないし3原子含む5ないし6員の芳香族ヘテロ環であ
る。The divalent heterocyclic group represented by L is N, O
Or a 3- to 10-membered saturated or unsaturated heterocycle containing at least one S atom, which may be a monocycle or may form a condensed ring with another ring.
The heterocycle is preferably a 5- to 6-membered aromatic heterocycle, more preferably 5 to 6 containing a nitrogen atom.
A 5-membered aromatic heterocycle, more preferably a 5- to 6-membered aromatic heterocycle containing 1 to 3 nitrogen atoms.
【0024】ヘテロ環の具体例としては、例えばピロリ
ジン、ピペリジン、ピペラジン、モルフォリン、チオフ
ェン、フラン、ピロール、イミダゾール、ピラゾール、
ピリジン、ピラジン、ピリダジン、トリアゾール、トリ
アジン、インドール、インダゾール、プリン、チアジア
ゾール、オキサジアゾール、キノリン、フタラジン、ナ
フチリジン、キノキサリン、キナゾリン、シンノリン、
プテリジン、アクリジン、フェナントロリン、フェナジ
ン、チアゾール、オキサゾール、ベンズイミダゾール、
ベンズオキサゾール、ベンズチアゾールなどが挙げられ
る。ヘテロ環として好ましくは、チオフェン、フラン、
ピロール、イミダゾール、ピラゾール、ピリジン、ピラ
ジン、ピリダジン、トリアゾール、トリアジン、インド
ール、インダゾール、チアジアゾール、オキサジアゾー
ル、キノリン、フタラジン、ナフチリジン、キノキサリ
ン、キナゾリン、シンノリン、プテリジン、チアゾー
ル、オキサゾール、ベンズイミダゾール、ベンズオキサ
ゾール、ベンズチアゾール、インドレニンであり、より
好ましくはピロール、イミダゾール、ピラゾール、ピリ
ジン、ピラジン、ピリダジン、チアジアゾール、キノリ
ン、フタラジン、ナフチリジン、キノキサリン、チアゾ
ール、オキサゾール、ベンズイミダゾール、ベンズオキ
サゾール、ベンズチアゾール、インドレニンであり、特
に好ましくは、チアジアゾールである。Specific examples of the heterocycle include pyrrolidine, piperidine, piperazine, morpholine, thiophene, furan, pyrrole, imidazole, pyrazole,
Pyridine, pyrazine, pyridazine, triazole, triazine, indole, indazole, purine, thiadiazole, oxadiazole, quinoline, phthalazine, naphthyridine, quinoxaline, quinazoline, cinnoline,
Pteridine, acridine, phenanthroline, phenazine, thiazole, oxazole, benzimidazole,
Examples thereof include benzoxazole and benzthiazole. The heterocycle is preferably thiophene, furan,
Pyrrole, imidazole, pyrazole, pyridine, pyrazine, pyridazine, triazole, triazine, indole, indazole, thiadiazole, oxadiazole, quinoline, phthalazine, naphthyridine, quinoxaline, quinazoline, cinnoline, pteridine, thiazole, oxazole, benzimidazole, benzoxazole, Benzthiazole, indolenine, more preferably pyrrole, imidazole, pyrazole, pyridine, pyrazine, pyridazine, thiadiazole, quinoline, phthalazine, naphthyridine, quinoxaline, thiazole, oxazole, benzimidazole, benzoxazole, benzthiazole, indolenine. , And particularly preferably, thiadiazole.
【0025】Lで表される二価のアリーレン基、二価の
ヘテロ環基は置換基を有してもよく、置換基としては例
えばRで表される脂肪族炭化水素基の置換基として挙げ
たものの他、アルキル基(好ましくは炭素数1〜20、
より好ましくは炭素数1〜12、特に好ましくは炭素1
〜8であり、例えば、メチル、エチル、iso−プロピ
ル、tert−ブチル、n−オクチル、tert−アミ
ル、シクロヘキシルなどが挙げられる。)、アルケニル
基(好ましくは炭素数2〜20、より好ましくは炭素数
2〜12、特に好ましくは炭素数2〜8であり、例えば
ビニル、アリル、2−ブテニル、3−ペンテニルなどが
挙げられる。)、アルキニル基(好ましくは炭素数2〜
20、より好ましくは炭素数2〜12、特に好ましくは
炭素数2〜8であり、例えばプロパルギル、3−ペンテ
ニルなどが挙げられる。)等が適用できる。The divalent arylene group and divalent heterocyclic group represented by L may have a substituent, and examples of the substituent include the substituents of the aliphatic hydrocarbon group represented by R. In addition to the above, an alkyl group (preferably having 1 to 20 carbon atoms,
More preferably, it has 1 to 12 carbon atoms, and particularly preferably 1 carbon atom.
To 8 and examples thereof include methyl, ethyl, iso-propyl, tert-butyl, n-octyl, tert-amyl, cyclohexyl and the like. ), An alkenyl group (preferably having 2 to 20 carbon atoms, more preferably having 2 to 12 carbon atoms, particularly preferably having 2 to 8 carbon atoms, and examples thereof include vinyl, allyl, 2-butenyl, and 3-pentenyl. ), Alkynyl group (preferably having 2 to 2 carbon atoms)
It preferably has 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms, and examples thereof include propargyl and 3-pentenyl. ) Etc. are applicable.
【0026】Lで表される二価のアリーレン基、二価の
ヘテロ環基の置換基として好ましくは、アルキル基、ア
リール基、ハロゲン原子であり、より好ましくは炭素数
1〜10のアルキル基、6〜12のアリール基、ハロゲ
ン原子である。Lとして好ましくはフェニレン基、1,
3,4−チアジアゾリル基である。The substituent of the divalent arylene group or divalent heterocyclic group represented by L is preferably an alkyl group, an aryl group or a halogen atom, more preferably an alkyl group having 1 to 10 carbon atoms, 6 to 12 aryl groups and halogen atoms. L is preferably a phenylene group, 1,
It is a 3,4-thiadiazolyl group.
【0027】X1 、X2 で表されるハロゲン原子は、同
一又は互いに異なってもよくフッ素原子、塩素原子、臭
素原子、ヨウ素原子であり、好ましくは塩素原子、臭素
原子、ヨウ素原子であり、より好ましくは塩素原子、臭
素原子であり、特に好ましくは臭素原子である。The halogen atoms represented by X 1 and X 2 may be the same or different and are a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, preferably a chlorine atom, a bromine atom or an iodine atom, Chlorine atom and bromine atom are more preferable, and bromine atom is particularly preferable.
【0028】Aで表されるハロゲン原子はフッ素原子、
塩素原子、臭素原子、ヨウ素原子であり、好ましくは塩
素原子、臭素原子、ヨウ素原子であり、より好ましくは
塩素原子、臭素原子であり、特に好ましくは臭素原子で
ある。Aで表される電子吸引性基として好ましくは、σ
p 値が0.01以上の置換基であり、より好ましくはσ
p 値が0.1以上の置換基である。電子吸引性基として
は、例えばトリハロメチル基、シアノ基、ニトロ基、脂
肪族・アリール若しくは複素環スルホニル基、脂肪族・
アリール若しくは複素環アシル基、アルケニル基、アル
キニル基、脂肪族・アリール若しくは複素環オキシカル
ボニル基、カルバモイル基、スルファモイル基などが挙
げられ、好ましくは脂肪族・アリール若しくは複素環ス
ルホニル基、脂肪族・アリール若しくは複素環アシル
基、アルコキシカルボニル基、アリールオキシカルボニ
ル基である。Aとして好ましくはハロゲン原子であり、
より好ましくは塩素原子、臭素原子、ヨウ素原子であ
り、更に好ましくは塩素原子、臭素原子であり、特に好
ましくは、臭素原子である。The halogen atom represented by A is a fluorine atom,
Chlorine atom, bromine atom and iodine atom are preferable, chlorine atom, bromine atom and iodine atom are more preferable, chlorine atom and bromine atom are more preferable, and bromine atom is particularly preferable. The electron withdrawing group represented by A is preferably σ
Substituent having ap value of 0.01 or more, more preferably σ
It is a substituent having ap value of 0.1 or more. Examples of the electron-withdrawing group include trihalomethyl group, cyano group, nitro group, aliphatic aryl group or heterocyclic sulfonyl group, aliphatic group
Examples thereof include an aryl or heterocyclic acyl group, an alkenyl group, an alkynyl group, an aliphatic aryl or heterocyclic oxycarbonyl group, a carbamoyl group, a sulfamoyl group, etc., preferably an aliphatic aryl or heterocyclic sulfonyl group, an aliphatic aryl. Alternatively, it is a heterocyclic acyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group. A is preferably a halogen atom,
A chlorine atom, a bromine atom and an iodine atom are more preferable, a chlorine atom and a bromine atom are still more preferable, and a bromine atom is particularly preferable.
【0029】一般式(I)で表される化合物のうち、好
ましくは一般式(I−a)で表される化合物である。 一般式(I−a)Of the compounds represented by the general formula (I), the compounds represented by the general formula (Ia) are preferable. General formula (Ia)
【0030】[0030]
【化5】 Embedded image
【0031】式中、Lは一般式(I)におけるそれと同
義であり、また好ましい範囲も同様である。X3 及びX
4 は、それぞれ一般式(I)におけるX1 、X2 と同義
であり、また好ましい範囲も同様である。Aaは一般式
(I)におけるAと同義であり、また好ましい範囲も同
様である。In the formula, L has the same meaning as in formula (I), and the preferred range is also the same. X 3 and X
4 has the same meaning as X 1 and X 2 in formula (I), respectively, and the preferred range is also the same. Aa has the same meaning as A in formula (I), and the preferred range is also the same.
【0032】一般式(I)で表される化合物のうち、好
ましくは一般式(I−b)で表される化合物である。 一般式(I−b)Of the compounds represented by the general formula (I), the compounds represented by the general formula (Ib) are preferable. General formula (Ib)
【0033】[0033]
【化6】 [Chemical 6]
【0034】式中、Lは一般式(I)におけるそれと同
義であり、また好ましい範囲も同様である。以下に一般
式(I)で表される化合物の具体例を挙げるが本発明は
これらに限定されるものではない。In the formula, L has the same meaning as in formula (I), and the preferred range is also the same. Specific examples of the compound represented by the general formula (I) are shown below, but the present invention is not limited thereto.
【0035】[0035]
【化7】 Embedded image
【0036】[0036]
【化8】 Embedded image
【0037】[0037]
【化9】 Embedded image
【0038】[0038]
【化10】 Embedded image
【0039】[0039]
【化11】 Embedded image
【0040】本発明の一般式(I)で表される化合物
は、例えば特開平5−239015号等に記載の方法に
準じて合成できる。The compound represented by the general formula (I) of the present invention can be synthesized according to the method described in, for example, JP-A-5-239015.
【0041】以下に一般式(I)で表される化合物の合
成について具体例を示す。 合成例1.化合物I−2の合成 〔4−(フェニルチオ)フェニルチオ〕酢酸の合成 4−フェニルチオベンゼンチオール21.9g(0.1
0モル)、エタノール30ml及び水50mlを室温で
攪拌しているところへ、水酸化ナトリウム5.2g
(0.13モル)/水10mlの水溶液を滴下した。2
0分攪拌後、モノクロロ酢酸ナトリウム15.1g
(0.13モル)を加え、40℃に加熱した。同温度で
攪拌しているところへ、水酸化ナトリウム5.2g
(0.13モル)/水10mlの水溶液をゆっくり滴下
した。40℃にて6時間攪拌後、室温に冷却し、濃塩酸
でpHを約2に調整した。析出した固体を濾取し、2−
プロパノールで再結晶することにより、白色固体の〔4
−(フェニルチオ)フェニルチオ〕酢酸を21.6g
(0.078モル)得た。収率78%Specific examples of the synthesis of the compound represented by formula (I) are shown below. Synthesis Example 1 Synthesis of Compound I-2 Synthesis of [4- (phenylthio) phenylthio] acetic acid 2-phenylthiobenzenethiol 21.9 g (0.1
(0 mol), ethanol (30 ml) and water (50 ml) are stirred at room temperature, and then sodium hydroxide (5.2 g) is added.
An aqueous solution of (0.13 mol) / 10 ml of water was added dropwise. 2
After stirring for 0 minutes, sodium monochloroacetate 15.1 g
(0.13 mol) was added and heated to 40 ° C. 5.2 g of sodium hydroxide while stirring at the same temperature
An aqueous solution of (0.13 mol) / 10 ml of water was slowly added dropwise. After stirring at 40 ° C. for 6 hours, it was cooled to room temperature and the pH was adjusted to about 2 with concentrated hydrochloric acid. The precipitated solid was collected by filtration, and
By recrystallizing with propanol, a white solid [4
2 (1.6 g) of-(phenylthio) phenylthio] acetic acid
(0.078 mol) was obtained. Yield 78%
【0042】化合物I−2の合成 上記反応で得られた〔4−(フェニルチオ)フェニルチ
オ〕酢酸13.8g(0.05モル)と水60mlを攪
拌しているところへ、水酸化ナトリウム18.0g
(0.45モル)/水30mlの水溶液を滴下した。氷
冷下、臭素24.0g(0.15モル)をゆっくり滴下
し、2時間攪拌した後、室温で一夜放置した。析出した
結晶を濾取し、アセトニトリルで再結晶することによ
り、白色固体の目的化合物I−2を16.5g(0.0
31モル)得た。収率62% 融点 217〜218℃Synthesis of Compound I-2 13.8 g (0.05 mol) of [4- (phenylthio) phenylthio] acetic acid obtained in the above reaction and 60 ml of water were stirred, and 18.0 g of sodium hydroxide was added.
An aqueous solution of (0.45 mol) / water (30 ml) was added dropwise. Under ice cooling, 24.0 g (0.15 mol) of bromine was slowly added dropwise, the mixture was stirred for 2 hours, and then left overnight at room temperature. The precipitated crystals were collected by filtration and recrystallized from acetonitrile to give 16.5 g (0.0
31 mol) was obtained. Yield 62% Melting point 217-218 ° C
【0043】次に一般式(II)で表される化合物につい
て詳細に説明する。R1 及びR2 で表される脂肪族炭化
水素基は、一般式(I)におけるRが脂肪族炭化水素基
の場合と同義であり、また好ましい範囲も同様である。
R1 及びR2 で表されるアリール基は、一般式(I)に
おけるRがアリール基の場合と同義であり、また好まし
い範囲も同様である。R1 及びR2 で表されるアリール
基の置換基として好ましくは、アシルアミノ基、スルホ
ニルアミノ基、スルファモイル基、カルバモイル基、ウ
レイド基、リン酸アミド基であり、より好ましくはアシ
ルアミノ基、スルホニルアミノ基、スルファモイル基、
カルバモイル基、ウレイド基であり、特に好ましくはス
ルホニルアミノ基である。R1 及びR2 で表されるヘテ
ロ環基は、一般式(I)におけるRがヘテロ環基の場合
と同義であり、また好ましい範囲も同様である。Next, the compound represented by formula (II) will be described in detail. The aliphatic hydrocarbon group represented by R 1 and R 2 has the same meaning as in the case where R in the general formula (I) is an aliphatic hydrocarbon group, and the preferred range is also the same.
The aryl group represented by R 1 and R 2 has the same meaning as in the case where R in the general formula (I) is an aryl group, and the preferred range is also the same. The substituent of the aryl group represented by R 1 and R 2 is preferably an acylamino group, a sulfonylamino group, a sulfamoyl group, a carbamoyl group, a ureido group or a phosphoric acid amide group, more preferably an acylamino group or a sulfonylamino group. , A sulfamoyl group,
A carbamoyl group and a ureido group are preferable, and a sulfonylamino group is particularly preferable. The heterocyclic group represented by R 1 and R 2 has the same meaning as in the case where R in the general formula (I) is a heterocyclic group, and the preferred range is also the same.
【0044】nは、0〜4の整数を表し、好ましくは0
又は1であり、より好ましくは0である。N represents an integer of 0 to 4, preferably 0.
Or 1, and more preferably 0.
【0045】一般式(II)で表される化合物のうち、好
ましくは一般式(II−a)で表される化合物である。 一般式(II−a)Among the compounds represented by the general formula (II), the compounds represented by the general formula (II-a) are preferable. General formula (II-a)
【0046】[0046]
【化12】 Embedded image
【0047】(式中、Ra1、Ra2、Ra3、Ra4、Ra5、
Rb1、Rb2、Rb3、Rb4及びRb5は、それぞれ水素原子
又は置換基を表す。Ra1〜Rb5で表される置換基は、一
般式(I)で表されるRがアリール基の場合に有しても
よい置換基として挙げたものが適用でき、また好ましい
範囲も同様である。)(Wherein R a1 , R a2 , R a3 , R a4 , R a5 ,
R b1 , R b2 , R b3 , R b4 and R b5 each represent a hydrogen atom or a substituent. As the substituents represented by R a1 to R b5 , those exemplified as the substituents which R in the general formula (I) may have when R is an aryl group can be applied, and the preferred range is also the same. is there. )
【0048】一般式(II)で表される化合物のうち、好
ましくは一般式(II−b)で表される化合物である。 一般式(II−b)Among the compounds represented by the general formula (II), the compounds represented by the general formula (II-b) are preferable. General formula (II-b)
【0049】[0049]
【化13】 Embedded image
【0050】(式中、R2a1 及びR2a2 は、それぞれ脂
肪族炭化水素基、アリール基又はヘテロ環基を表す。R
2a3 及びR2a4 は、それぞれ水素原子、脂肪族炭化水素
基、アリール基又はヘテロ環基を表す。)(In the formula, R 2a1 and R 2a2 each represent an aliphatic hydrocarbon group, an aryl group or a heterocyclic group.
2a3 and R 2a4 each represent a hydrogen atom, an aliphatic hydrocarbon group, an aryl group or a heterocyclic group. )
【0051】R2a1 及びR2a2 で表される脂肪族炭化水
素基は、一般式(I)におけるRが脂肪族炭化水素基の
場合と同義である。R2a1 及びR2a2 で表される脂肪族
炭化水素基として好ましくはアルキル基であり、より好
ましくは炭素数1〜30、更に好ましくは炭素数1〜2
0、特に好ましくは炭素数1〜16のアルキル基であ
る。脂肪族炭化水素基の好ましい具体例としては、n−
ブチル、tert−ブチル、n−ヘキシル、2−エチル
ヘキシル、n−オクチル、n−デシル、n−ウンデシル
などが挙げられる。R2a1 及びR2a2 で表されるアリー
ル基は、一般式(I)におけるRがアリール基の場合と
同義であり、また好ましい範囲も同様である。R2a1 及
びR2a2 で表されるヘテロ環基は、一般式(I)におけ
るRがヘテロ環基の場合と同義であり、また好ましい範
囲も同様である。R2a1 、R2a2 として好ましくは、ア
ルキル基である。The aliphatic hydrocarbon group represented by R 2a1 and R 2a2 has the same meaning as the case where R in the general formula (I) is an aliphatic hydrocarbon group. The aliphatic hydrocarbon group represented by R 2a1 and R 2a2 is preferably an alkyl group, more preferably 1 to 30 carbon atoms, and further preferably 1 to 2 carbon atoms.
0, particularly preferably an alkyl group having 1 to 16 carbon atoms. Specific preferred examples of the aliphatic hydrocarbon group include n-
Butyl, tert-butyl, n-hexyl, 2-ethylhexyl, n-octyl, n-decyl, n-undecyl and the like can be mentioned. The aryl group represented by R 2a1 and R 2a2 has the same meaning as in the case where R in the general formula (I) is an aryl group, and the preferred range is also the same. The heterocyclic group represented by R 2a1 and R 2a2 has the same meaning as in the case where R in the general formula (I) is a heterocyclic group, and the preferred range is also the same. R 2a1 and R 2a2 are preferably alkyl groups.
【0052】R2a3 及びR2a4 で表される脂肪族炭化水
素基、アリール基、ヘテロ環基は、R2a1 、R2a2 で表
されるそれらと同義であり、また好ましい範囲も同様で
ある。R2a3 、R2a4 として好ましくは、水素原子、脂
肪族炭化水素基であり、より好ましくは、水素原子、ア
ルキル基である。[0052] aliphatic hydrocarbon group represented by R 2a3 and R 2a4, an aryl group, a heterocyclic group are the same as those represented by R 2a1, R 2a2, and the preferred ranges are also the same. R 2a3 and R 2a4 are preferably a hydrogen atom or an aliphatic hydrocarbon group, and more preferably a hydrogen atom or an alkyl group.
【0053】一般式(II)で表される化合物のうち、よ
り好ましくは一般式(II−c)で表される化合物であ
る。 一般式(II−c)Of the compounds represented by the general formula (II), the compound represented by the general formula (II-c) is more preferable. General formula (II-c)
【0054】[0054]
【化14】 Embedded image
【0055】(式中、R2a1 及びR2a2 は、一般式(II
−b)におけるそれらと同義であり、また好ましい範囲
も同様である。) 以下に一般式(II)で表される化合物の具体例を挙げる
が本発明はこれらに限定されるものではない。(In the formula, R 2a1 and R 2a2 are represented by the general formula (II
It has the same meaning as those in -b), and the preferred range is also the same. ) Specific examples of the compound represented by formula (II) are shown below, but the invention is not limited thereto.
【0056】[0056]
【化15】 Embedded image
【0057】[0057]
【化16】 Embedded image
【0058】[0058]
【化17】 Embedded image
【0059】[0059]
【化18】 Embedded image
【0060】[0060]
【化19】 Embedded image
【0061】[0061]
【化20】 Embedded image
【0062】[0062]
【化21】 Embedded image
【0063】[0063]
【化22】 Embedded image
【0064】[0064]
【化23】 Embedded image
【0065】[0065]
【化24】 Embedded image
【0066】[0066]
【化25】 Embedded image
【0067】[0067]
【化26】 Embedded image
【0068】[0068]
【化27】 Embedded image
【0069】[0069]
【化28】 Embedded image
【0070】[0070]
【化29】 Embedded image
【0071】本発明の一般式(II)で表される化合物
は、例えば、新実験化学講座(日本化学会編、丸善)1
4−III 、8章8.4あるいは、ORANIC FUNCTIONAL GR
OUP PREPARATIONS(Sandler,Karo , ACADEMIC PRESS Ne
w York and London )I-Chapt.18に記載のある様な種々
の方法によって合成することが可能である。それらの合
成法を大別すると以下の様になる。 (1)対応するメルカプタンの酸化による方法 (2)対応するアルキル(アリール)ハライドと多硫化
アルカリ金属塩との求核置換による方法 (3)対応するアニリン誘導体をジアジニウム塩に変換
した後に多硫化アルカリ金属塩との求核置換反応させる
方法The compound represented by the general formula (II) of the present invention is, for example, as described in New Experimental Chemistry Course (edited by The Chemical Society of Japan, Maruzen) 1
4-III, Chapter 8 8.4 or ORANIC FUNCTIONAL GR
OUP PREPARATIONS (Sandler, Karo, ACADEMIC PRESS Ne
w York and London) It can be synthesized by various methods such as those described in I-Chapt.18. The synthesis methods are roughly classified as follows. (1) Method by oxidation of corresponding mercaptan (2) Method by nucleophilic substitution of corresponding alkyl (aryl) halide with alkali metal polysulfide salt (3) Conversion of corresponding aniline derivative into diazinium salt and then alkali polysulfide Method for nucleophilic substitution reaction with metal salt
【0072】(1)の方法で使用されるメルカプタン類
とは、アルキル、アリールメルカプタン共に特に制限さ
れる事項はなく、酸化手段としては、空気酸化(酸素酸
化)、ジメチルスルホキシド酸化、過酸化水素酸化、次
亜塩素酸酸化などが挙げられる。これらの方法を行う
際、反応系中をアルカリ性にすることにより反応を加速
できる。また、銅、鉄などの金属触媒を添加することに
よっても反応を加速することができる事が知られてい
る。With respect to the mercaptans used in the method (1), there is no particular limitation on both alkyl and aryl mercaptans, and as oxidation means, there are air oxidation (oxygen oxidation), dimethyl sulfoxide oxidation, hydrogen peroxide oxidation. , Hypochlorous acid oxidation and the like. When performing these methods, the reaction can be accelerated by making the reaction system alkaline. It is also known that the reaction can be accelerated by adding a metal catalyst such as copper or iron.
【0073】(2)の方法で用いることができるアルキ
ルハライドとは、その分子内に求核攻撃を受けやすい官
能基(例えば、ケトン、アルデヒド、エノンなど)を持
たないものが好ましく、またアルキルハライドの級数は
1級が最も反応性が高く、2級、3級の順に反応性が低
下するので級数が低いもの程好ましい。(2)の方法で
用いることができるアリールハライドとは、一般的に電
子吸引的な性格を有する物が好ましく、ベンゼン環型ハ
ライドでは更にハロゲン、ニトロなどの置換基を持つも
のが反応性が高く効率的に目的物を得ることができる点
で好ましい。芳香環内にヘテロ原子を有するヘテロ芳香
族ハライドの場合には、ベンゼン環に比べて電子吸引的
であるため特に電子吸引性基をヘテロ芳香環内に持たな
くても目的物が得られることが多い。また、アルキルハ
ライドの場合と同様、これらのアリールハライドも分子
内に求核攻撃を受けやすい官能基(例えば、ケトン、ア
ルデヒド、エノンなど)を持たないものが好ましい。The alkyl halide that can be used in the method (2) is preferably one having no functional group (eg, ketone, aldehyde, enone, etc.) which is susceptible to nucleophilic attack in its molecule. As for the series, the first class has the highest reactivity, and the reactivity decreases in the order of the second class and the third class. The aryl halide that can be used in the method (2) is generally preferably one having an electron-withdrawing character, and a benzene ring-type halide having a substituent such as halogen or nitro is highly reactive. It is preferable in that the target product can be obtained efficiently. In the case of a heteroaromatic halide having a hetero atom in the aromatic ring, it is more electron-withdrawing than a benzene ring, so that the target product can be obtained without particularly having an electron-withdrawing group in the heteroaromatic ring. Many. Further, as in the case of the alkyl halide, it is preferable that these aryl halides do not have a functional group (for example, ketone, aldehyde, enone, etc.) which is susceptible to nucleophilic attack in the molecule.
【0074】(3)の方法で用いることができるアニリ
ン誘導体とは、特に制限される事項はないが、ジアゾニ
ウム塩を形成させ、水性条件下に多硫化アルカリ金属塩
と反応させる都合上、アニリン誘導体の塩、および形成
されるジアゾニウム塩が水溶性となるものが好ましい。
水溶性が比較的低く、ジアゾニウム塩が効率的に生成し
ないアニリン誘導体を用いる場合には溶媒としてアルコ
ール類を水に混合して用いることも可能である。また、
ジアゾニウム塩形成の際に用いる酸としては、塩酸、硫
酸が一般的であるが、形成された塩の安定性を上げる目
的からホウ弗化水素酸を用いる事もある。The aniline derivative which can be used in the method (3) is not particularly limited, but for the convenience of forming a diazonium salt and reacting it with an alkali metal polysulfide salt under aqueous conditions, the aniline derivative And the diazonium salt formed is water-soluble.
When using an aniline derivative which has relatively low water solubility and does not efficiently form a diazonium salt, it is also possible to use a mixture of alcohols with water as a solvent. Also,
Hydrochloric acid and sulfuric acid are generally used as the acid for forming the diazonium salt, but borofluoric acid may be used for the purpose of improving the stability of the salt formed.
【0075】(1)の方法で用いるメルカプタン類の合
成法としては、新実験化学講座(日本化学会編、丸善)
14−III 、8章8.1、ORANIC FUNCTIONAL GROUP PR
EPARATIONS(Sandler,Karo , ACADEMIC PRESS New York
and London )I-Chapt.18あるいはTHE CHEMISTRY OF F
UNCTINONAL GROUPS (Patai , JONE WILLY & SONS)"
The Chemistry of the thiol group"−Chapt.4 に記載
のある様な種々の方法によって合成することが可能であ
る。次に本発明の一般式(II)で表される化合物の代表
的な合成例を示す。As a method of synthesizing the mercaptans used in the method (1), a new experimental chemistry course (edited by the Chemical Society of Japan, Maruzen)
14-III, Chapter 8, 8.1, ORANIC FUNCTIONAL GROUP PR
EPARATIONS (Sandler, Karo, ACADEMIC PRESS New York
and London) I-Chapt.18 or THE CHEMISTRY OF F
UNCTINONAL GROUPS (Patai, JONE WILLY & SONS) "
It can be synthesized by various methods as described in The Chemistry of the thiol group "-Chapt. 4. Next, typical synthetic examples of the compound represented by the general formula (II) of the present invention Indicates.
【0076】合成例2 化合物II−13の合成 2,2’−ジチオアニリン25.0g(0.1モル)を
アセトニトリル250mlに溶解し、窒素雰囲気下に攪
拌しながらピリジン15.6ml(0.2モル)を加
え、更にアセチルクロライド20.4g(0.2モル)
をゆっくりと滴下した。室温で2時間攪拌したところ、
目的物が析出してきたのでアセトニトリル150mlを
加えて加熱、溶解させた後に氷冷、再結晶を行った。析
出物をろ取し、目的化合物II−13を28.0g(0.0
84モル)得た。収率84.2% 融点 167−168℃Synthesis Example 2 Synthesis of Compound II-13 25.0 g (0.1 mol) of 2,2'-dithioaniline was dissolved in 250 ml of acetonitrile, and 15.6 ml (0.2 20.4 g (0.2 mol) of acetyl chloride
Was slowly added dropwise. After stirring for 2 hours at room temperature,
Since the target substance was precipitated, 150 ml of acetonitrile was added, heated and dissolved, and then ice-cooled and recrystallized. The precipitate was collected by filtration and 28.0 g (0.0
84 mol) was obtained. Yield 84.2% Melting point 167-168 ° C
【0077】合成例3 化合物II−21の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にペンタフルオロベンゾ
イルクロライド9.2g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させたところ、目的物が析出
した。析出物をろ取し、ジメチルホルムアミド/イソプ
ロピルアルコールにて再結晶することによって目的化合
物II−21を10.5g(0.016モル)得た。収率8
2.7% 融点 218−219℃Synthesis Example 3 Synthesis of compound II-21 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 9.2 g (0.040 mol) of pentafluorobenzoyl chloride was further added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited. The precipitate was collected by filtration and recrystallized from dimethylformamide / isopropyl alcohol to obtain 10.5 g (0.016 mol) of the target compound II-21. Yield 8
2.7% melting point 218-219 ° C
【0078】合成例4 化合物II−45の合成 4,4’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.4ml
(0.044モル)を加え、更にベンゼンスルホニルク
ロライド7.4g(0.042モル)を反応液が10℃
を越えないように滴下した。滴下終了後、攪拌しながら
徐々に室温まで上昇させ、そのまま2時間反応させた。
反応液を水にあけ、酢酸エチル250mlを加えて抽出
した。抽出液を乾燥濃縮後、シリカゲルクロマトグラフ
ィー(酢酸エチル/ヘキサン=1/1)にて原点成分を
除去、精製することによって目的化合物II−45を9.
3g(0.017モル)得た。収率87.7% 融点
166−167℃Synthesis Example 4 Synthesis of Compound II-45 5.0 g (0.020 mol) of 4,4'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring, pyridine 3.4 ml
(0.044 mol) was added, and 7.4 g (0.042 mol) of benzenesulfonyl chloride was added to the reaction solution at 10 ° C.
It was dropped so that it would not exceed. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours.
The reaction solution was poured into water and 250 ml of ethyl acetate was added for extraction. After the extract was dried and concentrated, the starting compound was removed and purified by silica gel chromatography (ethyl acetate / hexane = 1/1) to give the desired compound II-45.
3 g (0.017 mol) was obtained. Yield 87.7% Melting point 166-167 ° C
【0079】合成例5 化合物II−46の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.4ml
(0.044モル)を加え、更にベンゼンスルホニルク
ロライド7.4g(0.042モル)を反応液が15℃
を越えないように滴下した。滴下終了後、攪拌しながら
徐々に室温まで上昇させ、そのまま2時間反応させた。
反応液を水にあけ、析出した固体をろ取し、酢酸エチル
/イソプロピルアルコールにて再結晶することによって
目的化合物II−46を8.4g(0.016モル)得
た。収率79.0% 融点 148−149℃Synthesis Example 5 Synthesis of compound II-46 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring, pyridine 3.4 ml
(0.044 mol) was added, and 7.4 g (0.042 mol) of benzenesulfonyl chloride was added to the reaction solution at 15 ° C.
It was dropped so that it would not exceed. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours.
The reaction solution was poured into water, and the precipitated solid was collected by filtration and recrystallized from ethyl acetate / isopropyl alcohol to obtain 8.4 g (0.016 mol) of the target compound II-46. Yield 79.0% Melting point 148-149 ° C
【0080】合成例6 化合物II−48の合成 4,4’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にジフェニルリン酸クロ
ライド10.7g(0.040モル)を反応液が15℃
を越えないように滴下した。滴下終了後、攪拌しながら
徐々に室温まで上昇させ、そのまま2時間反応させた。
反応液を水にあけ、析出した固体をろ取し、ジメチルホ
ルムアミド/イソプロピルアルコールにて再結晶するこ
とによって目的化合物II−48を8.9g(0.012
モル)得た。収率62.2% 融点 183−185
℃Synthesis Example 6 Synthesis of compound II-48 5.0 g (0.020 mol) of 4,4'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 10.7 g (0.040 mol) of diphenylphosphoric acid chloride was added to the reaction liquid at 15 ° C.
It was dropped so that it would not exceed. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours.
The reaction solution was poured into water, the precipitated solid was collected by filtration, and recrystallized from dimethylformamide / isopropyl alcohol to obtain 8.9 g (0.012) of the target compound II-48.
Mol). Yield 62.2% Melting point 183-185
° C
【0081】合成例7 化合物II−6の合成 2,2’−ジチオアニリン7.45g(0.030モ
ル)をアセトニトリル50mlに溶解し、窒素雰囲気
下、5℃以下に冷却し、攪拌しながらフェニルイソシア
ネート7.14g(0.060モル)を反応液が15℃
を越えないように滴下した。滴下終了後、攪拌しながら
徐々に室温まで上昇させたところ、目的物が析出した。
析出物をろ取し、アセトニトリルにて洗浄目的化合物II
−6を13.6g(0.028モル)得た。収率93.
0% 融点 209−211℃Synthesis Example 7 Synthesis of compound II-6 7.45 g (0.030 mol) of 2,2'-dithioaniline was dissolved in 50 ml of acetonitrile, cooled to 5 ° C or lower under a nitrogen atmosphere, and stirred with phenyl. 7.14 g (0.060 mol) of isocyanate was added to the reaction solution at 15 ° C.
It was dropped so that it would not exceed. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited.
The precipitate is collected by filtration and washed with acetonitrile. Target compound II
-1 was obtained (13.6 g, 0.028 mol). Yield 93.
0% melting point 209-211 ° C
【0082】合成例8 化合物II−60の合成 4,4’−ジチオアニリン7.45g(0.030モ
ル)をアセトニトリル50mlに溶解し、窒素雰囲気
下、5℃以下に冷却し、攪拌しながらフェニルイソシア
ネート7.14g(0.060モル)を反応液が15℃
を越えないように滴下した。滴下終了後、攪拌しながら
徐々に室温まで上昇させたところ、目的物が析出した。
析出物をろ取し、アセトニトリルにて洗浄目的化合物II
−60を14.0g(0.029モル)得た。収率95.
9% 融点 250℃以上Synthesis Example 8 Synthesis of compound II-60 7.45 g (0.030 mol) of 4,4'-dithioaniline was dissolved in 50 ml of acetonitrile, cooled to 5 ° C or lower under a nitrogen atmosphere, and stirred with phenyl. 7.14 g (0.060 mol) of isocyanate was added to the reaction solution at 15 ° C.
It was dropped so that it would not exceed. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited.
The precipitate is collected by filtration and washed with acetonitrile. Target compound II
-60 was obtained (14.0 g, 0.029 mol). Yield 95.
9% melting point 250 ° C or higher
【0083】合成例9 化合物II−61の合成 4,4’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にペンタフルオロプロピ
オン酸無水物12.4g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させたところ、目的物が析出
した。析出物をろ取し、酢酸エチル/エチルアルコール
にて再結晶することによって目的化合物II−61を4.6
g(0.0085モル)得た。収率42.6% 融点
210−211℃Synthesis Example 9 Synthesis of compound II-61 5.0 g (0.020 mol) of 4,4'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 12.4 g (0.040 mol) of pentafluoropropionic anhydride was added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited. The precipitate was collected by filtration and recrystallized from ethyl acetate / ethyl alcohol to give the target compound II-61 (4.6).
g (0.0085 mol) was obtained. Yield 42.6% Melting point
210-211 ° C
【0084】合成例10 化合物II−62の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にペンタフルオロプロピ
オン酸無水物12.4g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させ、そのまま2時間反応さ
せた。反応液を水にあけ、析出した固体をろ取し、エチ
ルアルコール/水にて再結晶することによって目的化合
物II−62を6.0g(0.011モル)得た。収率5
6.0% 融点 97−97.5℃Synthesis Example 10 Synthesis of compound II-62 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 12.4 g (0.040 mol) of pentafluoropropionic anhydride was added dropwise so that the reaction liquid did not exceed 15 ° C. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours. The reaction solution was poured into water, and the precipitated solid was collected by filtration and recrystallized from ethyl alcohol / water to obtain 6.0 g (0.011 mol) of the target compound II-62. Yield 5
6.0% melting point 97-97.5 ° C
【0085】合成例11 化合物II−63の合成 4,4’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にペンタフルオロベンゾ
イルクロライド9.2g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させたところ、目的物が析出
した。析出物をろ取し、ジメチルホルムアミド/イソプ
ロピルアルコールにて再結晶することによって目的化合
物II−63を8.2g(0.013モル)得た。収率6
4.6% 融点 236−238℃Synthesis Example 11 Synthesis of compound II-63 5.0 g (0.020 mol) of 4,4'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 9.2 g (0.040 mol) of pentafluorobenzoyl chloride was further added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited. The precipitate was collected by filtration and recrystallized from dimethylformamide / isopropyl alcohol to obtain 8.2 g (0.013 mol) of target compound II-63. Yield 6
4.6% melting point 236-238 ° C
【0086】合成例12 化合物II−64の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更に1−ナフタレンスルホ
ニルクロライド9.1g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させたところ、目的物が析出
した。析出物をろ取し、ジメチルホルムアミド/イソプ
ロピルアルコールにて再結晶することによって目的化合
物II−64を5.4g(0.0086モル)得た。収率4
2.8% 融点 220−222℃Synthesis Example 12 Synthesis of Compound II-64 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 9.1 g (0.040 mol) of 1-naphthalenesulfonyl chloride was further added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited. The precipitate was collected by filtration and recrystallized from dimethylformamide / isopropyl alcohol to obtain 5.4 g (0.0086 mol) of the target compound II-64. Yield 4
2.8% melting point 220-222 ° C
【0087】合成例13 化合物II−65の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更に2−ナフタレンスルホ
ニルクロライド9.1g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させ、そのまま2時間反応さ
せた。反応液を水にあけ析出した固体をろ取し、ジメチ
ルホルムアミド/イソプロピルアルコールにて再結晶す
ることによって目的化合物II−65を8.3g(0.01
3モル)得た。収率65.9% 融点 171−17
2℃Synthesis Example 13 Synthesis of compound II-65 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 9.1 g (0.040 mol) of 2-naphthalenesulfonyl chloride was further added dropwise so that the reaction liquid did not exceed 15 ° C. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours. The reaction solution was poured into water and the precipitated solid was collected by filtration and recrystallized from dimethylformamide / isopropyl alcohol to obtain 8.3 g (0.01%) of the target compound II-65.
3 mol) was obtained. Yield 65.9% Melting point 171-17
2 ℃
【0088】合成例14 化合物II−66の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にp−トルエンスルホニ
ルクロライド7.6g(0.040モル)を反応液が1
5℃を越えないように滴下した。滴下終了後、攪拌しな
がら徐々に室温まで上昇させ、そのまま2時間反応させ
た。反応液を水にあけ、酢酸エチル250mlを加えて
抽出した。抽出液を乾燥、濃縮すると目的物が析出し
た。析出物をろ取し、酢酸エチル/ヘキサンにて再結晶
することによって目的化合物II−66を9.0g(0.0
16モル)得た。収率80.8% 融点 164−166℃Synthesis Example 14 Synthesis of Compound II-66 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 7.6 g (0.040 mol) of p-toluenesulfonyl chloride was added to the reaction solution to give 1
It was added dropwise so as not to exceed 5 ° C. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours. The reaction solution was poured into water and 250 ml of ethyl acetate was added for extraction. When the extract was dried and concentrated, the target product was precipitated. The precipitate was collected by filtration and recrystallized from ethyl acetate / hexane to give 9.0 g (0.0) of the target compound II-66.
16 mol) was obtained. Yield 80.8% Melting point 164-166 ° C
【0089】合成例15 化合物II−68の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル100mlに溶解し、窒素雰囲気下、
5℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にp−メトキシベンゼン
スルホニルクロライド8.3g(0.040モル)を反
応液が15℃を越えないように滴下した。滴下終了後、
攪拌しながら徐々に室温まで上昇させ、そのまま2時間
反応させた。反応液を水にあけ、酢酸エチル250ml
を加えて抽出した。抽出液を乾燥濃縮し、得られたオイ
ル状生成物を酢酸エチルに溶解させた後、ヘキサンを加
えて晶析させることによって目的化合物II−68を6.8
g(0.012モル)得た。収率58.0% 融点 1
31−132℃Synthesis Example 15 Synthesis of compound II-68 5.0 g (0.020 mol) of 2,2'-dithioaniline
Is dissolved in 100 ml of acetonitrile, and under a nitrogen atmosphere,
Cool to below 5 ° C and agitate 3.1 ml of pyridine
(0.040 mol) was added, and 8.3 g (0.040 mol) of p-methoxybenzenesulfonyl chloride was further added dropwise so that the reaction liquid did not exceed 15 ° C. After dropping,
The temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours. Pour the reaction mixture into water and add 250 ml of ethyl acetate.
And extracted. The extract was dried and concentrated, the obtained oily product was dissolved in ethyl acetate, and then hexane was added to cause crystallization to give 6.8 of the target compound II-68.
g (0.012 mol) was obtained. Yield 58.0% Melting point 1
31-132 ° C
【0090】合成例16 化合物II−69の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更に2,4,5−トリクロ
ロベンゼンスルホニルクロライド11.2g(0.04
0モル)を反応液が15℃を越えないように滴下した。
滴下終了後、攪拌しながら徐々に室温まで上昇させ、そ
のまま2時間反応させた。反応液を水にあけ析出した固
体をろ取し、ジメチルホルムアミド/イソプロピルアル
コールにて再結晶することによって目的化合物II−69を
9.9g(0.013モル)得た。収率67.3% 融
点 228−229℃Synthesis Example 16 Synthesis of Compound II-69 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 11.2 g (0.04 mol) of 2,4,5-trichlorobenzenesulfonyl chloride was further added.
0 mol) was added dropwise so that the reaction liquid did not exceed 15 ° C.
After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours. The reaction solution was poured into water and the precipitated solid was collected by filtration and recrystallized from dimethylformamide / isopropyl alcohol to obtain 9.9 g (0.013 mol) of the target compound II-69. Yield 67.3% Melting point 228-229 ° C
【0091】合成例17 化合物II−70の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更に2−メシチレンスルホ
ニルクロライド8.7g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させ、一晩放置したところ、
目的物が析出した。析出物をろ取し、酢酸エチル/イソ
プロピルアルコールにて再結晶することによって目的化
合物II−70を8.2g(0.013モル)得た。収率6
6.7% 融点 140−141℃Synthesis Example 17 Synthesis of compound II-70 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 8.7 g (0.040 mol) of 2-mesitylene sulfonyl chloride was further added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring and left overnight,
The target substance was deposited. The precipitate was collected by filtration and recrystallized from ethyl acetate / isopropyl alcohol to obtain 8.2 g (0.013 mol) of the target compound II-70. Yield 6
6.7% melting point 140-141 ° C
【0092】合成例18 化合物II−71の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更に2−ナフタレンカルボ
ン酸クロライド7.6g(0.040モル)を反応液が
15℃を越えないように滴下した。滴下終了後、攪拌し
ながら徐々に室温まで上昇させ、2時間反応させたとこ
ろ、目的物が析出した。析出物にアセトニトリル50m
lを加えて加熱、溶解させた後に氷冷、再結晶を行っ
た。析出物をろ取し、目的化合物II−71を10.6g
(0.019モル)得た。収率95.5% 融点 1
78−179℃Synthesis Example 18 Synthesis of compound II-71 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and further 7.6 g (0.040 mol) of 2-naphthalenecarboxylic acid chloride was added dropwise so that the reaction liquid did not exceed 15 ° C. After completion of the dropping, the temperature was gradually raised to room temperature with stirring and the reaction was carried out for 2 hours, whereupon the target product was precipitated. 50m acetonitrile in the precipitate
1 was added, heated and dissolved, and then ice-cooled and recrystallized. The precipitate was collected by filtration, and 10.6 g of the target compound II-71 was obtained.
(0.019 mol) was obtained. Yield 95.5% Melting point 1
78-179 ° C
【0093】合成例19 化合物II−72の合成 2,2’−ジチオアニリン5.0g(0.020モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながらピリジン3.1ml
(0.040モル)を加え、更にジフェニルリン酸クロ
ライド10.7g(0.040モル)を反応液が15℃
を越えないように滴下した。滴下終了後、攪拌しながら
徐々に室温まで上昇させ、そのまま2時間反応させたと
ころ、目的物が析出した。析出物にアセトニトリル50
mlを加えて加熱、溶解させた後に氷冷、再結晶を行っ
た。析出物をろ取し、目的化合物II−72を4.6g
(0.0065モル)得た。収率32.2% 融点
121−123℃Synthesis Example 19 Synthesis of compound II-72 5.0 g (0.020 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
Cool down below ℃, and with stirring 3.1 ml pyridine
(0.040 mol) was added, and 10.7 g (0.040 mol) of diphenylphosphoric acid chloride was added to the reaction liquid at 15 ° C.
It was dropped so that it would not exceed. After the completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was allowed to proceed for 2 hours. Acetonitrile 50 for precipitate
After adding ml, heating and dissolving, ice-cooling and recrystallization were performed. The precipitate was collected by filtration and 4.6 g of the target compound II-72 was obtained.
(0.0065 mol) was obtained. Yield 32.2% Melting point
121-123 ° C
【0094】合成例20 化合物II−73の合成 1)(2,2’−ジアミノ−5,5’−ジクロロジフェ
ニル)ジスルフィドの合成 水酸化カリウム50gにエチレングリコール100ml
を加え、90℃に加熱溶解させた後に2−アミノ−6−
クロロベンゾチアゾール10.3g(0.056モル)
をアルカリ溶液に添加した。反応液を165℃に加熱
し、24時間反応させた。反応液を室温まで放冷し水
1.5lを加えて希釈した後に空気を24時間通じ酸化
を行った。沈澱物をろ別した後に塩酸を加えてpHを6
〜7に調整し析出した固体をろ取し、エチルアルコール
/水にて再結晶することで目的物を5.6g(0.01
8モル)得た。収率63%Synthesis Example 20 Synthesis of compound II-73 1) Synthesis of (2,2'-diamino-5,5'-dichlorodiphenyl) disulfide 50 g of potassium hydroxide and 100 ml of ethylene glycol
Was added and dissolved by heating at 90 ° C., and then 2-amino-6-
Chlorobenzothiazole 10.3 g (0.056 mol)
Was added to the alkaline solution. The reaction solution was heated to 165 ° C. and reacted for 24 hours. The reaction solution was allowed to cool to room temperature, 1.5 l of water was added for dilution, and then air was passed through for 24 hours for oxidation. After filtering off the precipitate, hydrochloric acid was added to adjust the pH to 6
Adjusted to -7, the precipitated solid was collected by filtration and recrystallized with ethyl alcohol / water to obtain 5.6 g (0.01
8 mol) was obtained. 63% yield
【0095】2)II−73の合成 (2,2’−ジアミノ−5,5’−ジクロロジフェニ
ル)ジスルフィド2g(0.0063モル)をアセトニ
トリル25mlに溶解し、窒素雰囲気下、5℃以下に冷
却し、攪拌しながらピリジン1ml(0.013モル)
を加え、更にベンゾイルクロライド1.8g(0.01
28モル)を反応液が15℃を越えないように滴下し
た。滴下終了後、攪拌しながら徐々に室温まで上昇させ
たところ、目的物が析出した。析出物をろ取し、ジメチ
ルホルムアミド/エチルアルコールにて再結晶すること
によって目的化合物II−73を3.3g(0.0063モ
ル)得た。収率99.7% 融点 192−193℃2) Synthesis of II-73 2 g (0.0063 mol) of (2,2'-diamino-5,5'-dichlorodiphenyl) disulfide was dissolved in 25 ml of acetonitrile and cooled to 5 ° C or lower under a nitrogen atmosphere. And, with stirring, 1 ml of pyridine (0.013 mol)
Was added, and benzoyl chloride 1.8 g (0.01
28 mol) was added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited. The precipitate was collected by filtration and recrystallized from dimethylformamide / ethyl alcohol to obtain 3.3 g (0.0063 mol) of target compound II-73. Yield 99.7% Melting point 192-193 ° C
【0096】合成例21 化合物II−74の合成 II−73の項で合成した(2,2’−ジアミノ−5,5’
−ジクロロジフェニル)ジスルフィド2g(0.006
3モル)をアセトニトリル25mlに溶解し、窒素雰囲
気下、5℃以下に冷却し、攪拌しながらピリジン1ml
(0.013モル)を加え、更にベンゼンスルホニルク
ロライド2.2g(0.0125モル)を反応液が15
℃を越えないように滴下した。滴下終了後、攪拌しなが
ら徐々に室温まで上昇させ、そのまま一晩放置したとこ
ろ、目的物が析出した。析出物をろ取し、酢酸エチル/
メチルアルコールにて再結晶することによって目的化合
物II−74を1.2g(0.0020モル)得た。収率3
1.8% 融点 175−178℃Synthesis Example 21 Synthesis of Compound II-74 (2,2'-diamino-5,5 'was synthesized in the section of II-73.
-Dichlorodiphenyl) disulfide 2 g (0.006
3 mol) in 25 ml of acetonitrile, cooled to 5 ° C. or lower under a nitrogen atmosphere, and stirred with 1 ml of pyridine.
(0.013 mol) was added, and 2.2 g (0.0125 mol) of benzenesulfonyl chloride was added to the reaction solution to give 15
It was added dropwise so as not to exceed ℃. After the dropwise addition was completed, the temperature was gradually raised to room temperature with stirring, and the mixture was allowed to stand overnight, whereupon the target substance was precipitated. The precipitate was collected by filtration, and ethyl acetate /
By recrystallization from methyl alcohol, 1.2 g (0.0020 mol) of the target compound II-74 was obtained. Yield 3
1.8% melting point 175-178 ° C
【0097】合成例22 化合物II−75の合成 1)(2,2’−ジアミノ−5,5’−ジメチルジフェ
ニル)ジスルフィドの合成 水酸化カリウム50gにエチレングリコール100ml
を加え、90℃に加熱溶解させた後に2−アミノ−6−
メチルベンゾチアゾール10.0g(0.061モル)
をアルカリ溶液に添加した。反応液を165℃に加熱
し、24時間反応させた。反応液を室温まで放冷し水
1.5lを加えて希釈した後に空気を24時間通じ酸化
を行った。析出物をろ別し目的物を4.1g(0.01
5モル)得た。収率49%Synthesis Example 22 Synthesis of Compound II-75 1) Synthesis of (2,2'-diamino-5,5'-dimethyldiphenyl) disulfide 50 g of potassium hydroxide and 100 ml of ethylene glycol
Was added and dissolved by heating at 90 ° C., and then 2-amino-6-
Methylbenzothiazole 10.0 g (0.061 mol)
Was added to the alkaline solution. The reaction solution was heated to 165 ° C. and reacted for 24 hours. The reaction solution was allowed to cool to room temperature, 1.5 l of water was added for dilution, and then air was passed through for 24 hours for oxidation. The precipitate was filtered off and 4.1 g (0.01
5 mol). Yield 49%
【0098】2)II−75の合成 (2,2’−ジアミノ−5,5’−ジメチルジフェニ
ル)ジスルフィド2g(0.0072モル)をアセトニ
トリル25mlに溶解し、窒素雰囲気下、5℃以下に冷
却し、攪拌しながらピリジン1.1ml(0.0144
モル)を加え、更にベンゾイルクロライド2.0g
(0.0144モル)を反応液が15℃を越えないよう
に滴下した。滴下終了後、攪拌しながら徐々に室温まで
上昇させたところ、目的物が析出した。析出物をろ取
し、ジメチルホルムアミド/エチルアルコールにて再結
晶することによって目的化合物II−75を3.0g(0.
0062モル)得た。収率86.0% 融点 158
−159℃2) Synthesis of II-75 Dissolve 2 g (0.0072 mol) of (2,2'-diamino-5,5'-dimethyldiphenyl) disulfide in 25 ml of acetonitrile and cool to 5 ° C or lower under a nitrogen atmosphere. Then, 1.1 ml of pyridine (0.0144) with stirring.
Mol), and further 2.0 g of benzoyl chloride
(0.0144 mol) was added dropwise so that the reaction liquid did not exceed 15 ° C. After the dropping was completed, the temperature was gradually raised to room temperature with stirring, and the target substance was deposited. The precipitate was collected by filtration and recrystallized from dimethylformamide / ethyl alcohol to give 3.0 g (0.
(0062 mol) was obtained. Yield 86.0% Melting point 158
-159 ° C
【0099】合成例23 化合物II−76の合成 II−75の項で合成した(2,2’−ジアミノ−5,5’
−ジメチルジフェニル)ジスルフィド2g(0.007
2モル)をアセトニトリル25mlに溶解し、窒素雰囲
気下、5℃以下に冷却し、攪拌しながらピリジン1.1
ml(0.0144モル)を加え、更にベンゼンスルホ
ニルクロライド2.5g(0.0144モル)を反応液
が15℃を越えないように滴下した。滴下終了後、攪拌
しながら徐々に室温まで上昇させ、そのまま2時間反応
させた。反応液を水にあけ、析出した固体をろ取し、ジ
メチルホルムアミド/エチルアルコールにて再結晶する
ことによって目的化合物II−76を3.6g(0.006
5モル)得た。収率89.8% 融点 164−16
5℃Synthesis Example 23 Synthesis of Compound II-76 Synthesized in the section of II-75 (2,2′-diamino-5,5 ′).
-Dimethyldiphenyl) disulfide 2 g (0.007
2 mol) in 25 ml of acetonitrile, cooled to 5 ° C. or lower under a nitrogen atmosphere, and stirred with pyridine 1.1.
ml (0.0144 mol) was added, and 2.5 g (0.0144 mol) of benzenesulfonyl chloride was further added dropwise so that the temperature of the reaction solution did not exceed 15 ° C. After completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was continued for 2 hours. The reaction solution was poured into water, and the precipitated solid was collected by filtration and recrystallized from dimethylformamide / ethyl alcohol to give 3.6 g (0.006) of the target compound II-76.
5 mol). Yield 89.8% Melting point 164-16
5 ℃
【0100】合成例24 化合物II−77の合成 2,2’−ジチオ安息香酸9.2g(0.030モル)
をトルエン100mlに懸濁し、攪拌下にピリジン1m
l、塩化チオニル4.8ml(0.066モル)を加え
た。反応液を80℃に加熱し3時間反応させた後に反応
系内を減圧にしてトルエンを留去し乾固させた。得られ
た固形物を放冷後、アセトニトリル50ml、テトラヒ
ドロフラン50mlを加えて溶解させ、そこにアニリン
6.6g(0.060モル)とピリジン4.7ml
(0.060モル)のアセトニトリル溶液(50ml)
を滴下した。室温で3時間反応させた後、反応液を水に
あけ、析出した固体をジメチルホルムアミド/エチルア
ルコールにて再結晶することによって目的物II−77を1
0.8g得た。収率78.8% 融点 239−242
℃。Synthesis Example 24 Synthesis of Compound II-77 9.2 g (0.030 mol) of 2,2'-dithiobenzoic acid
Is suspended in 100 ml of toluene, and 1 m of pyridine is added with stirring.
1, thionyl chloride 4.8 ml (0.066 mol) were added. The reaction solution was heated to 80 ° C. and reacted for 3 hours, and then the pressure in the reaction system was reduced to distill off toluene to dryness. After cooling the obtained solid, 50 ml of acetonitrile and 50 ml of tetrahydrofuran were added and dissolved, and 6.6 g (0.060 mol) of aniline and 4.7 ml of pyridine were added thereto.
(0.060 mol) in acetonitrile (50 ml)
Was dripped. After reacting at room temperature for 3 hours, the reaction solution was poured into water, and the precipitated solid was recrystallized from dimethylformamide / ethyl alcohol to give the target compound II-77 as 1
0.8 g was obtained. Yield 78.8% Melting point 239-242
° C.
【0101】合成例25 化合物II−78の合成 2,2’−ジチオアニリン8.7g(0.035モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながら1−ナフタレンイソシア
ネート12.4g(0.0735モル)を反応液が15
℃を越えないように滴下した。滴下終了後、攪拌しなが
ら徐々に室温まで上昇させ、そのまま一晩放置したとこ
ろ、目的物が析出した。析出物をろ取し、アセトニトリ
ルにて洗浄目的化合物II−78を18.2g(0.031
モル)得た。収率88.8% 融点 220−224℃Synthesis Example 25 Synthesis of Compound II-78 8.7 g (0.035 mol) of 2,2'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
The reaction liquid was cooled to below 1 ° C and stirred with 12.4 g (0.0735 mol) of 1-naphthalene isocyanate.
It was added dropwise so as not to exceed ℃. After the dropwise addition was completed, the temperature was gradually raised to room temperature with stirring, and the mixture was allowed to stand overnight, whereupon the target substance was precipitated. The precipitate was collected by filtration and washed with acetonitrile to obtain 18.2 g (0.031) of the target compound II-78.
Mol). Yield 88.8% Melting point 220-224 ° C
【0102】合成例26 化合物II−79の合成 4,4’−ジチオアニリン8.7g(0.035モル)
をアセトニトリル50mlに溶解し、窒素雰囲気下、5
℃以下に冷却し、攪拌しながら1−ナフタレンイソシア
ネート12.4g(0.0735モル)を反応液が15
℃を越えないように滴下した。滴下終了後、攪拌しなが
ら徐々に室温まで上昇させ、そのまま2時間反応させた
ところ、目的物が析出した。析出物をろ取し、アセトニ
トリルにて洗浄目的化合物II−79を18.8g(0.0
32モル)得た。収率91.7% 融点 256−259℃Synthesis Example 26 Synthesis of Compound II-79 8.7 g (0.035 mol) of 4,4'-dithioaniline
Was dissolved in 50 ml of acetonitrile, and was dissolved in a nitrogen atmosphere for 5
The reaction liquid was cooled to below 1 ° C and stirred with 12.4 g (0.0735 mol) of 1-naphthalene isocyanate.
It was added dropwise so as not to exceed ℃. After the completion of the dropping, the temperature was gradually raised to room temperature with stirring, and the reaction was allowed to proceed for 2 hours. The precipitate was collected by filtration, and washed with acetonitrile. 18.8 g (0.0) of the target compound II-79 was washed.
32 mol) was obtained. Yield 91.7% Melting point 256-259 ° C
【0103】本発明の一般式(I)又は(II)で表わさ
れる化合物は感光層でも非感光層でも添加することがで
きる。好ましくは感光層である。本発明の一般式
(I)、(II)で表される化合物とも所望の目的により
異なるが10-4モル〜1モル/Agモル、好ましくは1
0-3モル〜0.3モル/Agモル添加すると良い。いず
れの化合物も有機溶剤に溶かして添加することが好まし
い。The compound represented by formula (I) or (II) of the present invention can be added in either the light-sensitive layer or the non-light-sensitive layer. It is preferably a photosensitive layer. The compounds represented by the general formulas (I) and (II) of the present invention also differ depending on the desired purpose, but are from 10 −4 mol to 1 mol / Ag mol, preferably 1 mol.
It is advisable to add 0 −3 mol to 0.3 mol / Ag mol. It is preferable that any compound be dissolved in an organic solvent and added.
【0104】本発明の熱現像感光材料は、地球へのやさ
しさから、好ましくはモノシート型(画像形成するため
に供与した材料は全て観察される画像シートとして完成
される型)熱現像感光材料である。また、赤外レーザー
露光用熱現像感光材料であることが好ましい。さらに赤
外レーザー露光の波長が750nm以上、さらに好まし
くは800nm以上であるとよい。このような波長域の
レーザーに対応されるためには、これらの波長域、即
ち、赤外域に感度を有するように分光増感されている必
要がある。赤外増感色素としては公知のものを用いれば
よい。The photothermographic material of the present invention is preferably a monosheet type (a type in which all the materials donated to form an image are completed as an image sheet to be observed) because of its goodness to the earth. is there. Further, it is preferably a photothermographic material for infrared laser exposure. Further, the wavelength of infrared laser exposure is 750 nm or more, more preferably 800 nm or more. In order to be compatible with a laser in such a wavelength range, it is necessary to be spectrally sensitized so as to have sensitivity in these wavelength ranges, that is, in the infrared range. Known infrared sensitizing dyes may be used.
【0105】本発明の熱現像感光材料は、熱現像処理法
を用いて写真画像を形成するものである。このような熱
現像感光材料としては前述のとおり例えば米国特許第3
152904号、3457075号、及びD.モーガン
(Morgan) とB.シェリー(Shely)による「熱によって
処理される銀システム(Thermally Processed SilverSy
stems) 」(イメージング・プロセッシーズ・アンド・
マテリアルズ(Imaging Processes and Materials )Neb
lette 第8版、スタージ(Sturge) 、V.ウォールワー
ス(Walworth) 、A.シェップ(Shepp)編集、第2頁、
1969年)等に開示されている。The photothermographic material of the present invention forms a photographic image using a photothermographic method. Such a photothermographic material is disclosed in, for example, US Pat.
No. 152904, 3457075, and D.C. Morgan and B.A. "Thermally Processed SilverSy" by Shely
stems) "(Imaging Processors and
Materials (Imaging Processes and Materials) Neb
lette 8th edition, Sturge, V. Walworth, A. Edited by Shepp, page 2,
1969) and the like.
【0106】本発明の熱現像感光材料は、熱現像処理を
用いて写真画像を形成するものであればよいが、還元可
能な銀源(例えば有機銀塩)、触媒活性量の光触媒(例
えばハロゲン化銀)、銀の色調を制御する色調剤及び還
元剤を通常(有機)バインダーマトリックス中に分散し
た状態で含有している熱現像感光材料であることが好ま
しい。本発明の熱現像感光材料は常温で安定であるが、
露光後高温(例えば、80℃以上)に加熱することで現
像される。加熱することで還元可能な銀源(酸化剤とし
て機能する)と還元剤との間の酸化還元反応を通じて銀
を生成する。この酸化還元反応は露光で発生した潜像の
触媒作用によって促進される。露光領域中の有機銀塩の
反応によって生成した銀は黒色画像を提供し、これは非
露光領域と対照をなし、画像の形成がなされる。The heat-developable light-sensitive material of the present invention may be any one capable of forming a photographic image by using a heat-development treatment, including a reducible silver source (eg organic silver salt) and a catalytically active amount of photocatalyst (eg halogen). It is preferably a photothermographic material containing silver halide), a color tone controlling agent for controlling the color tone of silver, and a reducing agent in a state of being normally dispersed in an (organic) binder matrix. The photothermographic material of the present invention is stable at room temperature,
After exposure, development is performed by heating to a high temperature (for example, 80 ° C. or higher). Heating produces silver through a redox reaction between a reducible silver source (which functions as an oxidizing agent) and the reducing agent. This oxidation-reduction reaction is promoted by the catalytic action of the latent image generated by the exposure. The silver formed by the reaction of the organic silver salt in the exposed areas provides a black image, which contrasts with the unexposed areas, resulting in the formation of an image.
【0107】本発明の熱現像感光材料は支持体上に少な
くとも一層の感光層を有している。支持体の上に感光層
のみを形成しても良いが、感光層の上に少なくとも1層
の非感光層を形成することが好ましい。感光層に通過す
る光の量または波長分布を制御するために感光層と同じ
側または反対側にフィルター層を形成しても良いし、感
光層に染料または顔料を含ませても良い。感光層は複数
層にしても良く、また階調の調節のため感度を高感層/
低感層または低感層/高感層にしても良い。各種の添加
剤は感光層、非感光層、またはその他の形成層のいすれ
に添加しても良い。The photothermographic material of the invention has at least one photosensitive layer on a support. Although only the photosensitive layer may be formed on the support, it is preferable to form at least one non-photosensitive layer on the photosensitive layer. A filter layer may be formed on the same side or on the opposite side of the photosensitive layer in order to control the amount or wavelength distribution of light passing through the photosensitive layer, or the photosensitive layer may contain a dye or a pigment. The photosensitive layer may be composed of multiple layers, and the sensitivity is high for adjusting the gradation.
It may be a low sensitive layer or a low sensitive layer / high sensitive layer. Various additives may be added to any of the light-sensitive layer, the non-light-sensitive layer, and other forming layers.
【0108】本発明の熱現像感光材料に適用できる支持
体には、例えば紙、ポリエチレンを被覆した紙、ポリプ
ロピレンを被覆した紙、羊皮紙、布等の材料;例えば、
アルミニウム、銅、マグネシウム、亜鉛のような金属の
シート又は薄膜;ガラス又は、クロム合金、スチール、
銀、金、白金のような金属で被覆したガラス;ポリ(ア
ルキルメタクリレート類)(例えば、ポリ(メチルメタ
クリレート))、ポリ(エステル類)(例えば、ポリ
(エチレンテレフタレート))、ポリ(ビニルアセター
ル類)、ポリ(アミド類)(例えば、ナイロン)、セル
ロースエステル類(例えば、セルロースニトレート、セ
ルロースアセテート、セルロースアセテートプロピオネ
ート、セルロースアセテートブチレート)等の合成ポリ
マー状材料がある。本発明の熱現像感光材料には例え
ば、界面活性剤、酸化防止剤、安定化剤、可塑剤、紫外
線吸収剤、被覆助剤等を用いても良い。The support applicable to the photothermographic material of the present invention includes, for example, paper, polyethylene-coated paper, polypropylene-coated paper, parchment, cloth, etc .;
Sheets or films of metals such as aluminum, copper, magnesium, zinc; glass or chromium alloy, steel,
Glass coated with a metal such as silver, gold, platinum; poly (alkyl methacrylates) (eg, poly (methyl methacrylate)), poly (esters) (eg, poly (ethylene terephthalate)), poly (vinyl acetal) ), Poly (amides) (eg, nylon), and cellulose esters (eg, cellulose nitrate, cellulose acetate, cellulose acetate propionate, cellulose acetate butyrate). The photothermographic material of the invention may contain, for example, a surfactant, an antioxidant, a stabilizer, a plasticizer, an ultraviolet absorber, and a coating aid.
【0109】本発明の熱現像感光材料中の化学薬品と共
にそれぞれのバインダー層(例えば、合成ポリマー)は
自己支持フィルムを形成してもよい。支持体を、公知の
補助材料、例えば、塩化ビニリデン、アクリル酸モノマ
ー(例えば、アクリロニトリルやメチルアクリレート)
及び不飽和ジカルボン酸(例えば、イタコン酸、アクリ
ル酸)、カルボキシメチルセルロース、ポリ(アクリル
アミド)のコポリマー及びターポリマー;及び類似のポ
リマー状材料で補助的に被覆してもよい。Each binder layer (for example, synthetic polymer) together with chemicals in the photothermographic material of the present invention may form a self-supporting film. The support is made of known auxiliary materials, for example, vinylidene chloride, acrylic acid monomers (for example, acrylonitrile and methyl acrylate)
And copolymers and terpolymers of unsaturated dicarboxylic acids (eg, itaconic acid, acrylic acid), carboxymethylcellulose, poly (acrylamide); and similar polymeric materials.
【0110】好適なバインダーは透明又は半透明で、一
般に無色であり、天然ポリマー合成樹脂やポリマー及び
コポリマー、その他フィルムを形成する媒体、例えば:
ゼラチン、アラビアゴム、ポリ(ビニルアルコール)、
ヒドロキシエチルセルロース、セルロースアセテート、
セルロースアセテートブチレート、ポリ(ビニルピロリ
ドン)、カゼイン、デンプン、ポリ(アクリル酸)、ポ
リ(メチルメタクリル酸)、ポリ(塩化ビニル)、ポリ
(メタクリル酸)、コポリ(スチレン−無水マレイン
酸)、コポリ(スチレン−アクリロニトリル)、コポリ
(スチレン−ブタジエン)、ポリ(ビニルアセタール)
類(例えば、ポリ(ビニルホルマール)及びポリ(ビニ
ルブチラール))、ポリ(エステル)類、ポリ(ウレタ
ン)類、フェノキシ樹脂、ポリ(塩化ビニリデン)、ポ
リ(エポキシド)類、ポリ(カーボネート)類、ポリ
(ビニルアセテート)、セルロースエステル類、ポリ
(アミド)類がある。バインダーは水又は有機溶媒また
はエマルションから被覆形成してもよい。Suitable binders are transparent or translucent, generally colorless, and include natural polymeric synthetic resins, polymers and copolymers, and other film-forming media such as:
Gelatin, gum arabic, poly (vinyl alcohol),
Hydroxyethyl cellulose, cellulose acetate,
Cellulose acetate butyrate, poly (vinylpyrrolidone), casein, starch, poly (acrylic acid), poly (methyl methacrylic acid), poly (vinyl chloride), poly (methacrylic acid), copoly (styrene-maleic anhydride), copoly (Styrene-acrylonitrile), copoly (styrene-butadiene), poly (vinyl acetal)
(Eg, poly (vinyl formal) and poly (vinyl butyral)), poly (esters), poly (urethanes), phenoxy resins, poly (vinylidene chloride), poly (epoxides), poly (carbonates), There are poly (vinyl acetate), cellulose esters, and poly (amide) s. The binder may be coated from water or an organic solvent or an emulsion.
【0111】色調剤の添加は非常に望ましい。好適な色
調剤の例は調査報告第17029号に開示されており、
次のものがある:イミド類(例えば、フタルイミド);
環状イミド類、ピラゾリン−5−オン類、及びキナゾリ
ノン(例えば、スクシンイミド、3−フェニル−2−ピ
ラゾリン−5−オン、1−フェニルウラゾール、キナゾ
リン及び2,4−チアゾリジンジオン);ナフタールイ
ミド類(例えば、N−ヒドロキシ−1,8−ナフタール
イミド);コバルト錯体(例えば、コバルトのヘキサミ
ントリフルオロアセテート)、メルカプタン類(例え
ば、3−メルカプト−1,2,4−トリアゾール);N
−(アミノメチル)アリールジカルボキシイミド類(例
えば、N−(ジメチルアミノメチル)フタルイミド);
ブロックされたピラゾール類、イソチウロニウム(isot
hiuronium)誘導体及びある種の光漂白剤の組み合わせ
(例えば、N,N’ヘキサメチレン(1−カルバモイル
−3,5−ジメチルピラゾール)、1,8−(3,6−
ジオキサオクタン)ビス(イソチウロニウムトリフルオ
ロアセテート)、及び2−(トリブロモメチルスルホニ
ル)ベンゾチアゾールの組み合わせ);メロシアニン染
料(例えば、3−エチル−5−((3−エチル−2−ベ
ンゾチアゾリニリデン(benzothiazolinylidene)) −1
−メチルエチリデン)−2−チオ−2,4−オキサゾリ
ジンジオン(oxazolidinedione));フタラジノン、フタ
ラジノン誘導体又はこれらの誘導体の金属塩(例えば、
4−(1−ナフチル)フタラジノン、6−クロロフタラ
ジノン、5,7−ジメチルオキシフタラジノン、及び
2,3−ジヒドロ−1,4−フタラジンジオン);フタ
ラゾン;フタラジノンとスルフィン酸誘導体の組み合わ
せ(例えば、6−クロロフタラジノン+ベンゼンスルフ
ィン酸ナトリウム又は8−メチルフタラジノン+p−ト
リスルホン酸ナトリウム);フタラジン+フタル酸の組
み合わせ;フタラジン(フタラジンの付加物を含む)と
マレイン酸無水物、及びフタル酸、2,3−ナフタレン
ジカルボン酸又はo−フェニレン酸誘導体及びその無水
物(例えば、フタル酸、4−メチルフタル酸、4−ニト
ロフタル酸及びテトラクロロフタル酸無水物)から選択
される少なくとも1つの化合物との組み合わせ;キナゾ
リンジオン類、ベンズオキサジン、ナルトキサジン誘導
体;ベンズオキサジン−2,4−ジオン類(例えば、
1,3−ベンズオキサジン−2,4−ジオン);ピリミ
ジン類及び不斉−トリアジン類(例えば、2,4−ジヒ
ドロキシピリミジン)、及びテトラアザペンタレン誘導
体(例えば、3,6−ジメロカプト−1,4−ジフェニ
ル−1H、4H−2,3a,5,6a−テトラアザペン
タレン。好ましい色調剤としては、The addition of toning agents is highly desirable. Examples of suitable toning agents are disclosed in Research Report No. 17029,
There are the following: imides (eg, phthalimide);
Cyclic imides, pyrazolin-5-ones, and quinazolinones (eg, succinimide, 3-phenyl-2-pyrazolin-5-one, 1-phenylurazole, quinazoline, and 2,4-thiazolidinedione); naphthalimides (eg, , N-hydroxy-1,8-naphthalimide); cobalt complexes (eg, hexamine trifluoroacetate of cobalt), mercaptans (eg, 3-mercapto-1,2,4-triazole); N
-(Aminomethyl) aryldicarboximides (eg, N- (dimethylaminomethyl) phthalimide);
Blocked pyrazoles, isothiuronium (isot
hiuronium) derivatives and certain photobleaching combinations (eg, N, N'hexamethylene (1-carbamoyl-3,5-dimethylpyrazole), 1,8- (3,6-
A combination of dioxaoctane) bis (isothiuronium trifluoroacetate) and 2- (tribromomethylsulfonyl) benzothiazole; a merocyanine dye (e.g., 3-ethyl-5-((3-ethyl-2-benzothia) Zolinylidene (benzothiazolinylidene) -1
-Methylethylidene) -2-thio-2,4-oxazolidinedione); phthalazinone, phthalazinone derivatives or metal salts of these derivatives (e.g.,
4- (1-naphthyl) phthalazinone, 6-chlorophthalazinone, 5,7-dimethyloxyphthalazinone, and 2,3-dihydro-1,4-phthalazinedione); phthalazone; a combination of phthalazinone and a sulfinic acid derivative (For example, 6-chlorophthalazinone + sodium benzenesulfinate or 8-methylphthalazinone + sodium p-trisulfonate); a combination of phthalazine + phthalic acid; phthalazine (including an adduct of phthalazine) and maleic anhydride, And at least one selected from phthalic acid, 2,3-naphthalenedicarboxylic acid or o-phenylene acid derivative and its anhydride (for example, phthalic acid, 4-methylphthalic acid, 4-nitrophthalic acid and tetrachlorophthalic anhydride). Combination with two compounds; quinazolinediones, benzene Oxazine, Narutokisajin derivatives; benzoxazine-2,4-diones (e.g.,
1,3-benzoxazine-2,4-dione); pyrimidines and asymmetric-triazines (eg, 2,4-dihydroxypyrimidine), and tetraazapentalene derivatives (eg, 3,6-dimerocapto-1, 4-diphenyl-1H, 4H-2,3a, 5,6a-tetraazapentalene.
【0112】[0112]
【化30】 Embedded image
【0113】であり、より好ましくは、フタラジンであ
る。還元剤としては、いわゆる写真現像剤、例えばフェ
ニドン、ヒドロキノン類、カテコール等を含有してもよ
いが、ヒンダードフェノールが好ましい。米国特許第4
460681号に開示されているようなカラー感光材料
も、本発明の実現では考えられる。And more preferably phthalazine. The reducing agent may contain a so-called photographic developer, for example, phenidone, hydroquinones, catechol and the like, but hindered phenol is preferred. US Patent No. 4
A color light-sensitive material as disclosed in 460681 is also conceivable in the realization of the present invention.
【0114】好適な還元剤の例は、米国特許第3770
448号、3773512号、3593863号、及び
調査報告(Research Disclosure)第17029及び29
963に記載されており、次のものがある:アミノヒド
ロキシシクロアルケノン化合物(例えば、2−ヒドロキ
シ−ピペリジノ−2−シクロヘキセノン);現像剤の前
駆体としてアミノリダクトン類(reductones) エステル
(例えば、ピペリジノヘキソースリダクトンモノアセテ
ート);N−ヒドロキシ尿素誘導体(例えば、N−p−
メチルフェニル−N−ヒドロキシ尿素);アルデヒド又
はケトンのヒドラゾン類(例えば、アントラセンアルデ
ヒドフェニルヒドラゾン);ホスファーアミドフェノー
ル類;ホスファーアミドアニリン類;ポリヒドロキシベ
ンゼン類(例えば、ヒドロキノン、t−ブチル−ヒドロ
キノン、イソプロピルヒドロキノン及び(2,5−ジヒ
ドロキシ−フェニル)メチルスルホン);スルフヒドロ
キサム酸類(例えば、ベンゼンスルフヒドロキサム
酸);スルホンアミドアニリン類(例えば、4−(N−
メタンスルホンアミド)アニリン);2−テトラゾリル
チオヒドロキノン類(例えば、2−メチル−5−(1−
フェニル−5−テトラゾリルチオ)ヒドロキノン);テ
トラヒドロキノキサリン類(例えば、1,2,3,4−
テトラヒドロキノキサリン);アミドオキシン類;アジ
ン類(例えば、脂肪族カルボン酸アリールヒドラザイド
類とアスコルビン酸の組み合わせ);ポリヒドロキシベ
ンゼンとヒドロキシルアミンの組み合わせ、リダクトン
及び/又はヒドラジン;ヒドロキサン酸類;アジン類と
スルホンアミドフェノール類の組み合わせ;α−シアノ
フェニル酢酸誘導体;ビス−β−ナフトールと1,3−
ジヒドロキシベンゼン誘導体の組み合わせ;5−ピラゾ
ロン類;スルホンアミドフェノール還元剤;2−フェニ
リンダン(phenylindane) −1,3−ジオン等;クロマ
ン;1,4−ジヒドロピリジン類(例えば、2,6−ジ
メトキシ−3,5−ジカルボエトキシ−1,4−ジヒド
ロピリジン);ビスフェノール類(例えば、ビス(2−
ヒドロキシ−3−t−ブチル−5−メチルフェニル)メ
タン、ビス(6−ヒドロキシ−m−トリ)メシトール
(mesitol)、2,2−ビス(4−ヒドロキシ−3−メチ
ルフェニル)プロパン、4,4−エチリデン−ビス(2
−t−ブチル−6−メチル)フェノール)、紫外線感応
性アスコルビン酸誘導体及び3−ピラゾリドン類。好ま
しい現像剤は一般式(A)のヒンダードフェノールであ
る:Examples of suitable reducing agents are described in US Pat. No. 3,770.
Nos. 448, 3773512, 3959633, and Research Disclosure Nos. 17029 and 29.
963, and include: aminohydroxycycloalkenone compounds (eg, 2-hydroxy-piperidino-2-cyclohexenone); aminoreductones esters (eg, Piperidinohexose reductone monoacetate); N-hydroxyurea derivatives (for example, Np-
Methylphenyl-N-hydroxyurea); aldehyde or ketone hydrazones (eg, anthracene aldehyde phenylhydrazone); phosphoramidophenols; phosphoramidoanilines; polyhydroxybenzenes (eg, hydroquinone, t-butyl-hydroquinone) , Isopropylhydroquinone and (2,5-dihydroxy-phenyl) methyl sulfone); sulfhydroxamic acids (eg, benzenesulfhydroxamic acid); sulfonamide anilines (eg, 4- (N-
Methanesulfonamido) aniline); 2-tetrazolylthiohydroquinones (for example, 2-methyl-5- (1-
Phenyl-5-tetrazolylthio) hydroquinone); tetrahydroquinoxalines (e.g., 1,2,3,4-
Tetrahydroquinoxaline); amidooxins; azines (for example, aliphatic carboxylic acid aryl hydrazides and ascorbic acid); polyhydroxybenzene and hydroxylamine, reductone and / or hydrazine; hydroxanoic acids; azines and sulfones Combination of amidophenols; α-cyanophenylacetic acid derivative; bis-β-naphthol and 1,3-
5-pyrazolones; sulfonamidophenol reducing agents; 2-phenylindane-1,3-dione and the like; chromans; 1,4-dihydropyridines (e.g., 2,6-dimethoxy-3) , 5-dicarbethoxy-1,4-dihydropyridine); bisphenols (for example, bis (2-
Hydroxy-3-t-butyl-5-methylphenyl) methane, bis (6-hydroxy-m-tri) mesitol, 2,2-bis (4-hydroxy-3-methylphenyl) propane, 4,4 -Ethylidene-bis (2
-T-butyl-6-methyl) phenol), ultraviolet-sensitive ascorbic acid derivatives and 3-pyrazolidones. Preferred developers are hindered phenols of the general formula (A):
【0115】[0115]
【化31】 Embedded image
【0116】ここで;Rは水素原子、又は炭素原子数1
〜10のアルキル基(例えば、−C 4 H9 、2,4,4
−トリメチルペンチル)を表し、R5 及びR6 は炭素原
子数1〜5のアルキル基(例えば、メチル、エチル、t
−ブチル)を表す。Here; R is a hydrogen atom or 1 carbon atom.
To 10 alkyl groups (for example, -C FourH9, 2,4,4
-Trimethylpentyl);FiveAnd R6Is carbon source
An alkyl group having 1 to 5 children (for example, methyl, ethyl, t
-Butyl).
【0117】触媒活性量の光触媒として有用なハロゲン
化銀は感光性のいかなるハロゲン化銀(例えば、臭化
銀、ヨウ化銀、銀化銀、塩臭化銀、ヨウ臭化銀、塩ヨウ
臭化銀等)であってもよいがヨウ素イオンを含むことが
好ましい。このハロゲン化銀はいかなる方法で画像形成
層に添加されてもよく、このときハロゲン化銀は還元可
能な銀源に近接するように配置する。一般にハロゲン化
銀は還元可能銀源に対して0.75〜30重量%の量を
含有することが好ましい。ハロゲン化銀は、ハロゲンイ
オンとの反応による銀石鹸部の変換によって調製しても
よく、予備形成して石鹸の発生時にこれを添加してもよ
く、またはこれらの方法の組み合わせも可能である。後
者が好ましい。A silver halide useful as a catalytically active amount of a photocatalyst is any photosensitive silver halide (eg, silver bromide, silver iodide, silver silver, silver chlorobromide, silver iodobromide, chloroiodo). However, it is preferable that the iodide ion is contained. The silver halide may be added to the imaging layer in any manner, with the silver halide being placed in close proximity to the reducible silver source. In general, it is preferred that the silver halide contains from 0.75 to 30% by weight, based on the reducible silver source. Silver halide may be prepared by conversion of the silver soap portion by reaction with a halide ion, may be preformed and added during the generation of the soap, or a combination of these methods is possible. The latter is preferred.
【0118】還元可能な銀源は還元可能な銀イオン源を
含有するいかなる材料でもよい。有機及びヘテロ有機酸
の銀塩、特に長鎖(10〜30、好ましくは15〜25
の炭素原子数)の脂肪族カルボン酸が好ましい。配位子
が、4.0〜10.0の銀イオンに対する総安定定数を
有する有機又は無機の銀塩錯体も有用である。好適な銀
塩の例は、調査報告(Research Disclosure)第1702
9及び29963に記載されており、次のものがある:
有機酸の塩(例えば、没食子酸、シュウ酸、ベヘン酸、
ステアリン酸、パルミチン酸、ラウリン酸等);銀のカ
ルボキシアルキルチオ尿素塩(例えば、1−(3−カル
ボキシプロピル)チオ尿素、1−(3−カルボキシプロ
ピル)−3,3−ジメチルチオ尿素等);アルデヒドと
ヒドロキシ置換芳香族カルボン酸とのポリマー反応生成
物の銀錯体(例えば、アルデヒド類(ホルムアルデヒ
ド、アセトアルデヒド、ブチルアルデヒド)、ヒドロキ
シ置換酸類(例えば、サリチル酸、安息香酸、3,5−
ジヒドロキシ安息香酸、5,5−チオジサリチル酸)、
チオエン類の銀塩又は錯体(例えば、3−(2−カルボ
キシエチル)−4−ヒドロキシメチル−4−チアゾリン
−2−チオエン、及び3−カルボキシメチル−4−チア
ゾリン−2−チオエン)、イミダゾール、ピラゾール、
ウラゾール、1,2,4−チアゾール及び1H−テトラ
ゾール、3−アミノ−5−ベンジルチオ−1,2,4−
トリアゾール及びベンゾトリアゾールから選択される窒
素酸と銀との錯体また塩;サッカリン、5−クロロサリ
チルアルドキシム等の銀塩;及びメルカプチド類の銀
塩。好ましい銀源はステアリン酸及びベヘン酸銀であ
り、ベヘン酸が特に好ましい。還元可能な銀源は好まし
くは銀量として3g/m2以下である。さらに好ましくは
2g/m2以下である。The reducible silver source can be any material containing a source of reducible silver ions. Silver salts of organic and heteroorganic acids, especially long chains (10-30, preferably 15-25
) Aliphatic carboxylic acids are preferred. Organic or inorganic silver salt complexes wherein the ligand has a total stability constant for silver ions of 4.0 to 10.0 are also useful. Examples of suitable silver salts are described in Research Disclosure No. 1702.
9 and 29996, and include the following:
Salts of organic acids (eg gallic acid, oxalic acid, behenic acid,
Stearic acid, palmitic acid, lauric acid, etc.); carboxyalkylthiourea salt of silver (for example, 1- (3-carboxypropyl) thiourea, 1- (3-carboxypropyl) -3,3-dimethylthiourea); aldehyde Silver complexes (e.g., aldehydes (formaldehyde, acetaldehyde, butyraldehyde), hydroxy-substituted acids (e.g., salicylic acid, benzoic acid, 3,5-
Dihydroxybenzoic acid, 5,5-thiodisalicylic acid),
Silver salts or complexes of thioenes (eg, 3- (2-carboxyethyl) -4-hydroxymethyl-4-thiazoline-2-thioene and 3-carboxymethyl-4-thiazoline-2-thioene), imidazole, pyrazole ,
Urazole, 1,2,4-thiazole and 1H-tetrazole, 3-amino-5-benzylthio-1,2,4-
Complexes or salts of silver and nitrogen acids selected from triazoles and benzotriazoles; silver salts such as saccharin and 5-chlorosalicylaldoxime; and silver salts of mercaptides. Preferred silver sources are stearic acid and silver behenate, with behenic acid being especially preferred. The reducible silver source preferably has a silver content of 3 g / m 2 or less. More preferably, it is 2 g / m 2 or less.
【0119】本発明の熱現像感光材料には、例えば特開
昭63−159841号、同60−140335号、同
63−231437号、同63−259651号、同6
3−304242号、同63−15245号、米国特許
4639414号、同4740455号、同47419
66号、同4751175号、同4835096号に記
載された増感色素が使用できる。本発明の一般式(I)
で表わされる化合物は、通常のハロゲン化銀感光材料に
用いることができる。ハロゲン化銀感光材料について
は、支持体上に感光性ハロゲン化銀乳剤層を有するもの
であればよい。The photothermographic material of the present invention includes, for example, JP-A Nos. 63-159841, 60-140335, 63-231437, 63-259651 and 6-63.
Nos. 3-304242, 63-15245, U.S. Pat. Nos. 4,639,414, 4,740,455, and 4,419.
Sensitizing dyes described in JP-A Nos. 66, 4751175 and 48335096 can be used. General formula (I) of the present invention
The compound represented by can be used in ordinary silver halide light-sensitive materials. Any silver halide light-sensitive material may be used as long as it has a light-sensitive silver halide emulsion layer on a support.
【0120】[0120]
実施例1 感光性乳剤Aの調製 溶液 ステアリン酸 135g ベヘン酸 635g 蒸留水 13リットル 85℃ 15分で混合 溶液 NaOH 89g 蒸留水 1500ml 溶液 濃 HNO3 21ml 蒸留水 50ml 溶液 AgNO3 365g 蒸留水 2500ml 溶液 ポリビニルブチラール 86g 酢酸エチル 4300ml 溶液 ポリビニルブチラール 290g イソプロパノール 3580ml 溶液 N−ブロモサクシンイミド 9.7g アセトン 700mlExample 1 Preparation of Photosensitive Emulsion A Solution Stearic acid 135 g Behenic acid 635 g Distilled water 13 liter Mixed at 15 minutes at 85 ° C. Solution NaOH 89 g Distilled water 1500 ml Solution concentrated HNO 3 21 ml Distilled water 50 ml Solution AgNO 3 365 g Distilled water 2500 ml Solution polyvinyl butyral 86 g Ethyl acetate 4300 ml solution Polyvinyl butyral 290 g Isopropanol 3580 ml solution N-Bromosuccinimide 9.7 g Acetone 700 ml
【0121】溶液を85℃に保温した状態で激しく攪
拌しながら溶液を5分かけて添加しその後溶液を2
5分かけて添加する。そのまま20分攪拌した後、35
℃に降温する。35℃でより激しく攪拌しながら溶液
を5分かけて添加し、そのまま90分間攪拌し続ける。
その後、溶液を加え、攪拌をとめて放置し、水相を含
まれる塩とともに抜き、油相を得、脱溶媒して痕跡の水
を抜いた後、溶液を添加して50℃で激しく攪拌した
後、溶液を20分かけて添加し、105分攪拌して感
光性乳剤Aを得た。The solution was added over 5 minutes with vigorous stirring while the temperature was kept at 85 ° C., and then the solution was added to 2
Add over 5 minutes. After stirring for 20 minutes as it is, 35
Cool down to ° C. Add the solution over 5 minutes with more vigorous stirring at 35 ° C. and continue stirring for 90 minutes.
Then, the solution was added, and the mixture was left without stirring, and the aqueous phase was removed together with the salt contained therein to obtain an oil phase, which was desolvated to remove traces of water, and then the solution was added and vigorously stirred at 50 ° C. Then, the solution was added over 20 minutes and stirred for 105 minutes to obtain a photosensitive emulsion A.
【0122】染料−Aによって青色に着色された二軸延
伸された175μの厚みのポリエチレンテレフタレート
の支持体(下塗り層なし)の上に以下の各層を順次形成
していった。乾燥は各々75℃5分間で行った。The following layers were sequentially formed on a biaxially stretched 175 μm thick polyethylene terephthalate support (without an undercoat layer) which was colored blue with Dye-A. Drying was performed at 75 ° C. for 5 minutes each.
【0123】 <バック面側塗布> ○アンチハレーション層(湿潤厚さ 80ミクロン) ポリビニルブチラール(10%イソプロパノール溶液) 150ml 染料−C(溶媒はDMF) 70mg<Back side coating> ○ Antihalation layer (wet thickness 80 micron) Polyvinyl butyral (10% isopropanol solution) 150 ml Dye-C (solvent DMF) 70 mg
【0124】 <感光層面側塗布> ○感光層(湿潤厚さ 140ミクロン) 感光性乳剤A 73g 増感色素−1(0.1%DMF溶液) 2ml カブリ防止剤−1(0.01% メタノール溶液) 3ml フタラゾン(4.5% DMF溶液) 8ml 還元剤−1(10% アセトン溶液) 13ml 化合物 表1、2に記載<Photosensitive layer side coating> ○ Photosensitive layer (wet thickness 140 micron) Photosensitive emulsion A 73 g Sensitizing dye-1 (0.1% DMF solution) 2 ml Antifoggant-1 (0.01% methanol solution) ) 3 ml Phthalazone (4.5% DMF solution) 8 ml Reducing agent-1 (10% acetone solution) 13 ml Compounds described in Tables 1 and 2.
【0125】 ○表面保護層(湿潤厚さ 100ミクロン) アセトン 175ml 2−プロパノール 40ml メタノール 15ml セルロースアセテート 8.0g フタラジン 1.0g 4−メチルフタル酸 0.72g テトラクロロフタル酸 0.22g テトラクロロフタル酸無水物 0.5gSurface protection layer (wet thickness 100 micron) Acetone 175 ml 2-Propanol 40 ml Methanol 15 ml Cellulose acetate 8.0 g Phthalazine 1.0 g 4-Methylphthalic acid 0.72 g Tetrachlorophthalic acid 0.22 g Tetrachlorophthalic anhydride Thing 0.5g
【0126】[0126]
【化32】 Embedded image
【0127】[0127]
【化33】 Embedded image
【0128】セシトメトリー 上記で作成した熱現像感光材料を半切サイズに加工し、
830nmのレーザーダイオードを垂直面より13°傾
いたビームで露光した。その後ヒートドラムを用いて1
20℃×10秒と125℃×15秒熱現像処理した。そ
してその時のカブリ値の測定と色調の目視評価を行なっ
た。また、表1における試料No.1の最高濃度を100 とし
たとき、各試料の最高濃度を相対値で評価した。結果を
表1、2に示す。Cesitometry The photothermographic material prepared above was processed into a half-cut size,
An 830 nm laser diode was exposed with a beam tilted 13 ° from the vertical. Then use a heat drum for 1
Heat development treatment was carried out at 20 ° C. for 10 seconds and 125 ° C. for 15 seconds. Then, the fog value at that time was measured and the color tone was visually evaluated. Further, when the maximum concentration of Sample No. 1 in Table 1 was set to 100, the maximum concentration of each sample was evaluated as a relative value. The results are shown in Tables 1 and 2.
【0129】[0129]
【表1】 [Table 1]
【0130】[0130]
【表2】 [Table 2]
【0131】[0131]
【化34】 Embedded image
【0132】表1、2より本発明の試料は十分な感度が
あり、かつ、カブリが低く、色調が黒く良いことがわか
る。From Tables 1 and 2, it is understood that the samples of the present invention have sufficient sensitivity, low fog, and good black color tone.
【0133】実施例2 感光性乳剤Bの調製 溶液 ステアリン酸 135g ベヘン酸 635g 蒸留水 13リットル 85℃ 15分で混合 溶液A 前もって作られた立方体AgBrI(I=4モル%) 0.06μ(Agとして0.22モル) 蒸留水 1250ml 溶液 NaOH 89g 蒸留水 1500ml 溶液 濃 HNO3 19ml 蒸留水 50ml 溶液 AgNO3 365g 蒸留水 2500ml 溶液 ポリビニルブチラール 86g 酢酸エチル 4300ml 溶液 ポリビニルブチラール 290g イソプロパノール 3580mlExample 2 Preparation of Photosensitive Emulsion B Solution Stearic acid 135 g Behenic acid 635 g Distilled water 13 liters 85 ° C. mixing for 15 minutes Solution A Preformed cubic AgBrI (I = 4 mol%) 0.06 μ (as Ag) 0.22 mole) distilled water 1250ml solution NaOH 89 g distilled water 1500ml solution of concentrated HNO 3 19 ml of distilled water 50ml solution AgNO 3 365 g distilled water 2500ml solution polyvinylbutyral 86g ethyl acetate 4300ml solution polyvinylbutyral 290g isopropanol 3580ml
【0134】溶液を85℃に保温した状態で激しく攪
拌しながら溶液Aを10分かけて添加し、続いて溶液
を5分かけて添加し、その後、溶液を25分かけて添
加する。そのまま20分攪拌した後、35℃に降温す
る。35℃でより激しく攪拌しながら溶液を5分かけ
て添加し、そのまま90分間攪拌し続ける。その後、溶
液を加え、攪拌をとめて放置し、水相を含まれる塩と
ともに抜き、油相を得、脱溶媒して痕跡の水を抜いた
後、溶液を添加して50℃で激しく攪拌した後、10
5分攪拌して乳剤Bを得た。Solution A was added over 10 minutes with vigorous stirring while keeping the solution at 85 ° C., followed by addition of solution over 5 minutes, and then over 25 minutes. After stirring for 20 minutes as it is, the temperature is lowered to 35 ° C. Add the solution over 5 minutes with more vigorous stirring at 35 ° C. and continue stirring for 90 minutes. Thereafter, the solution was added, the stirring was stopped and the mixture was left to stand, and the aqueous phase was extracted together with the salt contained therein to obtain an oil phase. After removing the traces of water by removing the solvent, the solution was added and the mixture was stirred vigorously at 50 ° C. Later, 10
Emulsion B was obtained by stirring for 5 minutes.
【0135】実施例1と同様に(但しアンチハレーショ
ン層を感光層面側の感光層の下に設けた。)テストを行
なった。本発明の化合物を用いた試料は実施例1と同様
にカブリが低く色調が黒く良かった。A test was conducted in the same manner as in Example 1, except that the antihalation layer was provided below the photosensitive layer on the side of the photosensitive layer. As in the case of Example 1, the sample using the compound of the present invention had good fog and black color tone.
【0136】[0136]
【発明の効果】本発明の感光材料は感度が高く、カブリ
が低く、かつ色調が良い。The light-sensitive material of the present invention has high sensitivity, low fog and good color tone.
─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成8年1月4日[Submission date] January 4, 1996
【手続補正1】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0060[Correction target item name] 0060
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【0060】[0060]
【化19】 Embedded image
【手続補正2】[Procedure amendment 2]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0112[Correction target item name] 0112
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【0112】[0112]
【化30】 Embedded image
【手続補正3】[Procedure 3]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0117[Correction target item name] 0117
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【0117】触媒活性量の光触媒として有用なハロゲン
化銀は感光性のいかなるハロゲン化銀(例えば、臭化
銀、ヨウ化銀、塩臭化銀、ヨウ臭化銀、塩ヨウ臭化銀
等)であってもよいがヨウ素イオンを含むことが好まし
い。このハロゲン化銀はいかなる方法で画像形成層に添
加されてもよく、このときハロゲン化銀は還元可能な銀
源に近接するように配置する。一般にハロゲン化銀は還
元可能銀源に対して0.75〜30重量%の量を含有す
ることが好ましい。ハロゲン化銀は、ハロゲンイオンと
の反応による銀石鹸部の変換によって調製してもよく、
予備形成して石鹸の発生時にこれを添加してもよく、ま
たはこれらの方法の組み合わせも可能である。後者が好
ましい。A silver halide useful as a catalytically active amount of a photocatalyst is any photosensitive silver halide (eg, silver bromide, silver iodide, silver chlorobromide, silver iodobromide, silver chloroiodobromide, etc.). However, it is preferable that iodine ions are contained. The silver halide may be added to the imaging layer in any manner, with the silver halide being placed in close proximity to the reducible silver source. In general, it is preferred that the silver halide contains from 0.75 to 30% by weight, based on the reducible silver source. The silver halide may be prepared by conversion of the silver soap part by reaction with halogen ions,
It may be preformed and added as the soap evolves, or a combination of these methods is possible. The latter is preferred.
Claims (4)
なくとも一種含有することを特徴とするハロゲン化銀感
光材料。 一般式(I) 【化1】 (式中、Rは脂肪族炭化水素基、アリール基又はヘテロ
環基を表す。Lは二価のアリーレン基又は二価のヘテロ
環基を表す。X1 及びX2 は、それぞれハロゲン原子を
表す。Aは水素原子、ハロゲン原子又は電子吸引性基を
表す。)1. A silver halide light-sensitive material containing at least one compound represented by the following general formula (I). General formula (I) (In the formula, R represents an aliphatic hydrocarbon group, an aryl group or a heterocyclic group. L represents a divalent arylene group or a divalent heterocyclic group. X 1 and X 2 each represent a halogen atom. A represents a hydrogen atom, a halogen atom or an electron-withdrawing group.)
る化合物を少なくとも一種含有することを特徴とする熱
現像感光材料。2. A photothermographic material comprising at least one compound represented by formula (I) according to claim 1.
る化合物を少なくとも一種と下記一般式(II)で表され
る化合物を少なくとも一種含有することを特徴とする熱
現像感光材料。 一般式(II) 【化2】 (式中、R1 及びR2 は脂肪族炭化水素基、アリール基
又はヘテロ環基を表す。nは0ないし4の整数を表
す。)3. A photothermographic material comprising at least one compound represented by the general formula (I) according to claim 1 and at least one compound represented by the following general formula (II). . General formula (II) (In the formula, R 1 and R 2 represent an aliphatic hydrocarbon group, an aryl group or a heterocyclic group. N represents an integer of 0 to 4.)
する請求項2、3に記載の熱現像感光材料。4. The photothermographic material according to claim 2, which is for infrared laser exposure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31500895A JP3583529B2 (en) | 1995-12-04 | 1995-12-04 | Silver halide photosensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31500895A JP3583529B2 (en) | 1995-12-04 | 1995-12-04 | Silver halide photosensitive material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09160167A true JPH09160167A (en) | 1997-06-20 |
JP3583529B2 JP3583529B2 (en) | 2004-11-04 |
Family
ID=18060314
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JP31500895A Expired - Fee Related JP3583529B2 (en) | 1995-12-04 | 1995-12-04 | Silver halide photosensitive material |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0990946A1 (en) * | 1998-09-30 | 2000-04-05 | Fuji Photo Film Co., Ltd. | Heat-developable photosensitive material |
US6703191B1 (en) | 2003-01-14 | 2004-03-09 | Eastman Kodak Company | Thermally developable emulsions and materials containing tirazine-thione compounds |
US6737227B1 (en) | 2003-03-07 | 2004-05-18 | Eastman Kodak Company | Thermally developable emulsions and materials containing heterocyclic disulfide compounds |
JP2005514456A (en) * | 2002-01-15 | 2005-05-19 | シグマ−タウ・インドゥストリエ・ファルマチェウチケ・リウニテ・ソシエタ・ペル・アチオニ | Derivatives of α-phenylthiocarboxylic acid and α-phenyloxycarboxylic acid useful for the treatment of diseases that respond to PPARα activation |
EP1582919A1 (en) | 2004-03-23 | 2005-10-05 | Fuji Photo Film Co. Ltd. | Silver halide photosensitive material and photothermographic material |
EP1635216A1 (en) | 2004-09-14 | 2006-03-15 | Fuji Photo Film Co., Ltd. | Photothermographic material |
-
1995
- 1995-12-04 JP JP31500895A patent/JP3583529B2/en not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0990946A1 (en) * | 1998-09-30 | 2000-04-05 | Fuji Photo Film Co., Ltd. | Heat-developable photosensitive material |
US6329134B1 (en) | 1998-09-30 | 2001-12-11 | Fuji Photo Film Co., Ltd. | Heat-developable photosensitive material |
JP2005514456A (en) * | 2002-01-15 | 2005-05-19 | シグマ−タウ・インドゥストリエ・ファルマチェウチケ・リウニテ・ソシエタ・ペル・アチオニ | Derivatives of α-phenylthiocarboxylic acid and α-phenyloxycarboxylic acid useful for the treatment of diseases that respond to PPARα activation |
US6703191B1 (en) | 2003-01-14 | 2004-03-09 | Eastman Kodak Company | Thermally developable emulsions and materials containing tirazine-thione compounds |
US6849392B2 (en) | 2003-01-14 | 2005-02-01 | Eastman Kodak Company | Thermally developable emulsions and materials containing triazine-thione compounds |
US6737227B1 (en) | 2003-03-07 | 2004-05-18 | Eastman Kodak Company | Thermally developable emulsions and materials containing heterocyclic disulfide compounds |
EP1582919A1 (en) | 2004-03-23 | 2005-10-05 | Fuji Photo Film Co. Ltd. | Silver halide photosensitive material and photothermographic material |
EP1635216A1 (en) | 2004-09-14 | 2006-03-15 | Fuji Photo Film Co., Ltd. | Photothermographic material |
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